TWI361142B - - Google Patents
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- Publication number
- TWI361142B TWI361142B TW96141869A TW96141869A TWI361142B TW I361142 B TWI361142 B TW I361142B TW 96141869 A TW96141869 A TW 96141869A TW 96141869 A TW96141869 A TW 96141869A TW I361142 B TWI361142 B TW I361142B
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate
- glass
- solution
- mixed
- self
- Prior art date
Links
- 239000002120 nanofilm Substances 0.000 claims description 28
- 239000000758 substrate Substances 0.000 claims description 27
- 239000011259 mixed solution Substances 0.000 claims description 15
- 239000000243 solution Substances 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 11
- UMUVKMNHJFWLQT-UHFFFAOYSA-N C(CCCCCCCCCCCCCCCCC)C(C(OC)(OC)OC)CCCCCCCC Chemical compound C(CCCCCCCCCCCCCCCCC)C(C(OC)(OC)OC)CCCCCCCC UMUVKMNHJFWLQT-UHFFFAOYSA-N 0.000 claims description 6
- ORTRWBYBJVGVQC-UHFFFAOYSA-N hexadecane-1-thiol Chemical compound CCCCCCCCCCCCCCCCS ORTRWBYBJVGVQC-UHFFFAOYSA-N 0.000 claims description 6
- ZJCZFAAXZODMQT-UHFFFAOYSA-N 2-methylpentadecane-2-thiol Chemical compound CCCCCCCCCCCCCC(C)(C)S ZJCZFAAXZODMQT-UHFFFAOYSA-N 0.000 claims description 5
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 claims description 4
- 238000004140 cleaning Methods 0.000 claims description 4
- 239000000203 mixture Substances 0.000 claims description 4
- -1 octadecyl dimethoxy oxalate Chemical compound 0.000 claims description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 2
- 239000000356 contaminant Substances 0.000 claims description 2
- 239000004519 grease Substances 0.000 claims description 2
- 238000007781 pre-processing Methods 0.000 claims 1
- 238000002791 soaking Methods 0.000 claims 1
- 239000011521 glass Substances 0.000 description 65
- 238000002834 transmittance Methods 0.000 description 17
- 239000000463 material Substances 0.000 description 13
- 239000010408 film Substances 0.000 description 11
- 230000004048 modification Effects 0.000 description 11
- 238000012986 modification Methods 0.000 description 11
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 125000000524 functional group Chemical group 0.000 description 3
- 239000008267 milk Substances 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- CINOYIQWMMQTGN-UHFFFAOYSA-N 1,1,1-trichlorononadecane Chemical compound C(CCCCCCCCCCCCCCCCC)C(Cl)(Cl)Cl CINOYIQWMMQTGN-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 229910052681 coesite Inorganic materials 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 230000002209 hydrophobic effect Effects 0.000 description 2
- 210000004080 milk Anatomy 0.000 description 2
- 235000013336 milk Nutrition 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 229910052682 stishovite Inorganic materials 0.000 description 2
- 229910052905 tridymite Inorganic materials 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- XGDOLBICZRSFFR-UHFFFAOYSA-N 4-octadecyltriazine Chemical compound C(CCCCCCCCCCCCCCCCC)C1=NN=NC=C1 XGDOLBICZRSFFR-UHFFFAOYSA-N 0.000 description 1
- UJKXRNZOWZRAHG-UHFFFAOYSA-N C(CCCCCCCCCCCCCCCCC)C(C(OC)(OC)OC)CCCCCCC Chemical compound C(CCCCCCCCCCCCCCCCC)C(C(OC)(OC)OC)CCCCCCC UJKXRNZOWZRAHG-UHFFFAOYSA-N 0.000 description 1
- PMSDDRDKQQSRRG-UHFFFAOYSA-N C(CCCCCCCCCCCCCCCCC)C(CCCCCCCCC)(OC)OC Chemical compound C(CCCCCCCCCCCCCCCCC)C(CCCCCCCCC)(OC)OC PMSDDRDKQQSRRG-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 108010038083 amyloid fibril protein AS-SAM Proteins 0.000 description 1
- 229910000416 bismuth oxide Inorganic materials 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- UQPMPIOLEABWGZ-UHFFFAOYSA-N chloroform octadecane Chemical compound ClC(Cl)Cl.CCCCCCCCCCCCCCCCCC UQPMPIOLEABWGZ-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 210000003298 dental enamel Anatomy 0.000 description 1
- TYIXMATWDRGMPF-UHFFFAOYSA-N dibismuth;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Bi+3].[Bi+3] TYIXMATWDRGMPF-UHFFFAOYSA-N 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 239000002052 molecular layer Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 150000003573 thiols Chemical class 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Landscapes
- Surface Treatment Of Glass (AREA)
- Laminated Bodies (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW96141869A TW200920602A (en) | 2007-11-06 | 2007-11-06 | Composite self-assembly molecular thin film and its manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW96141869A TW200920602A (en) | 2007-11-06 | 2007-11-06 | Composite self-assembly molecular thin film and its manufacturing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200920602A TW200920602A (en) | 2009-05-16 |
| TWI361142B true TWI361142B (https=) | 2012-04-01 |
Family
ID=44727545
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW96141869A TW200920602A (en) | 2007-11-06 | 2007-11-06 | Composite self-assembly molecular thin film and its manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TW200920602A (https=) |
-
2007
- 2007-11-06 TW TW96141869A patent/TW200920602A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| TW200920602A (en) | 2009-05-16 |
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