TWI347245B - Method of polishing wafer and wafer polishing apparatus - Google Patents

Method of polishing wafer and wafer polishing apparatus

Info

Publication number
TWI347245B
TWI347245B TW094109729A TW94109729A TWI347245B TW I347245 B TWI347245 B TW I347245B TW 094109729 A TW094109729 A TW 094109729A TW 94109729 A TW94109729 A TW 94109729A TW I347245 B TWI347245 B TW I347245B
Authority
TW
Taiwan
Prior art keywords
wafer
polishing
polishing apparatus
wafer polishing
polishing wafer
Prior art date
Application number
TW094109729A
Other languages
English (en)
Other versions
TW200531789A (en
Inventor
Nakamura Yoshio
Ogawa Mitsue
Hashizume Kenji
Original Assignee
Fujikoshi Machinery Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujikoshi Machinery Corp filed Critical Fujikoshi Machinery Corp
Publication of TW200531789A publication Critical patent/TW200531789A/zh
Application granted granted Critical
Publication of TWI347245B publication Critical patent/TWI347245B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/27—Work carriers
    • B24B37/30—Work carriers for single side lapping of plane surfaces

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
TW094109729A 2004-03-31 2005-03-29 Method of polishing wafer and wafer polishing apparatus TWI347245B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004104535 2004-03-31
JP2005053148A JP4520327B2 (ja) 2004-03-31 2005-02-28 吸水方法及び吸水装置

Publications (2)

Publication Number Publication Date
TW200531789A TW200531789A (en) 2005-10-01
TWI347245B true TWI347245B (en) 2011-08-21

Family

ID=34889458

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094109729A TWI347245B (en) 2004-03-31 2005-03-29 Method of polishing wafer and wafer polishing apparatus

Country Status (5)

Country Link
US (1) US7201640B2 (zh)
EP (1) EP1582294B1 (zh)
JP (1) JP4520327B2 (zh)
KR (1) KR101114200B1 (zh)
TW (1) TWI347245B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108527070A (zh) * 2018-05-25 2018-09-14 哈尔滨奥瑞德光电技术有限公司 一种用于陶瓷手机背板抛光加工的工装

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2001642C2 (nl) * 2008-05-30 2009-12-01 Fico Bv Inrichting en werkwijze voor het drogen van gesepareerde elektronische componenten.
DE102008045534B4 (de) * 2008-09-03 2011-12-01 Siltronic Ag Verfahren zum Polieren einer Halbleiterscheibe
JP5648954B2 (ja) * 2010-08-31 2015-01-07 不二越機械工業株式会社 研磨装置
CN106057711B (zh) * 2016-08-04 2018-10-02 中山德华芯片技术有限公司 一种应用于晶圆片涂胶清洗设备的除水雾装置
KR20200016175A (ko) 2018-08-06 2020-02-14 가부시키가이샤 에바라 세이사꾸쇼 기판 보유 지지 장치, 기판 흡착 판정 방법, 기판 연마 장치, 기판 연마 방법, 연마되는 웨이퍼의 상면으로부터 액체를 제거하는 방법, 및 웨이퍼를 연마 패드에 압박하기 위한 탄성막, 기판 릴리스 방법 및 정량 기체 공급 장치
CN117140236B (zh) * 2023-10-25 2024-01-26 苏州博宏源机械制造有限公司 一种晶圆厚度在线测量装置及方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4193226A (en) * 1977-09-21 1980-03-18 Kayex Corporation Polishing apparatus
JPS6022500B2 (ja) 1980-05-23 1985-06-03 株式会社デイスコ 位置合せ載置方法
US4521995A (en) 1980-05-23 1985-06-11 Disco Co., Ltd. Wafer attracting and fixing device
JPS6114854A (ja) * 1984-06-28 1986-01-23 Toshiba Corp 研磨治具
US5558111A (en) * 1995-02-02 1996-09-24 International Business Machines Corporation Apparatus and method for carrier backing film reconditioning
JPH09262763A (ja) * 1996-03-28 1997-10-07 Shin Etsu Handotai Co Ltd バッキングパッドの製造方法および装置
JP3696690B2 (ja) * 1996-04-23 2005-09-21 不二越機械工業株式会社 ウェーハの研磨装置システム
JPH11188617A (ja) * 1997-12-26 1999-07-13 Nippon Daasu Bondo Kk 被研磨体の保持部材及びこの保持部材を用いた被研磨体の研磨方法
KR100286980B1 (ko) 1998-02-11 2001-04-16 윤종용 웨이퍼 연마 설비 및 웨이퍼 연마 방법
JP3963083B2 (ja) * 2001-06-27 2007-08-22 信越半導体株式会社 ワークの研磨方法及び研磨装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108527070A (zh) * 2018-05-25 2018-09-14 哈尔滨奥瑞德光电技术有限公司 一种用于陶瓷手机背板抛光加工的工装

Also Published As

Publication number Publication date
EP1582294A3 (en) 2006-04-12
KR101114200B1 (ko) 2012-02-22
KR20060012246A (ko) 2006-02-07
US20050221725A1 (en) 2005-10-06
EP1582294A2 (en) 2005-10-05
JP4520327B2 (ja) 2010-08-04
EP1582294B1 (en) 2012-03-21
TW200531789A (en) 2005-10-01
JP2005313312A (ja) 2005-11-10
US7201640B2 (en) 2007-04-10

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