TWI340356B - Defect display apparatus - Google Patents

Defect display apparatus

Info

Publication number
TWI340356B
TWI340356B TW093119098A TW93119098A TWI340356B TW I340356 B TWI340356 B TW I340356B TW 093119098 A TW093119098 A TW 093119098A TW 93119098 A TW93119098 A TW 93119098A TW I340356 B TWI340356 B TW I340356B
Authority
TW
Taiwan
Prior art keywords
display apparatus
defect display
defect
display
Prior art date
Application number
TW093119098A
Other languages
Chinese (zh)
Other versions
TW200511148A (en
Inventor
Takaaki Onishi
Shuji Akiyama
Original Assignee
Olympus Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Olympus Corp filed Critical Olympus Corp
Publication of TW200511148A publication Critical patent/TW200511148A/en
Application granted granted Critical
Publication of TWI340356B publication Critical patent/TWI340356B/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/958—Inspecting transparent materials or objects, e.g. windscreens
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1306—Details
    • G02F1/1309—Repairing; Testing
TW093119098A 2003-06-30 2004-06-29 Defect display apparatus TWI340356B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003187854A JP4079841B2 (en) 2003-06-30 2003-06-30 Defect display device

Publications (2)

Publication Number Publication Date
TW200511148A TW200511148A (en) 2005-03-16
TWI340356B true TWI340356B (en) 2011-04-11

Family

ID=33549735

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093119098A TWI340356B (en) 2003-06-30 2004-06-29 Defect display apparatus

Country Status (5)

Country Link
JP (1) JP4079841B2 (en)
KR (1) KR100791195B1 (en)
CN (1) CN100476416C (en)
TW (1) TWI340356B (en)
WO (1) WO2005001455A1 (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007071678A (en) * 2005-09-07 2007-03-22 Hitachi High-Technologies Corp Inspection system
JP2008033306A (en) * 2006-07-03 2008-02-14 Olympus Corp Defect correcting device
JP4956077B2 (en) * 2006-07-19 2012-06-20 株式会社メック Defect inspection apparatus and defect inspection method
JP4843399B2 (en) * 2006-07-31 2011-12-21 株式会社日立ハイテクノロジーズ Inspection apparatus and inspection method
JP4913838B2 (en) 2008-04-14 2012-04-11 日東電工株式会社 Optical display device manufacturing system and optical display device manufacturing method
CN102937594B (en) * 2012-11-02 2015-01-21 上海华力微电子有限公司 Defect detecting system and method
CN103489817B (en) * 2013-09-30 2016-01-27 上海华力微电子有限公司 defect detecting system and method
CN103809309B (en) * 2014-01-22 2016-07-06 北京京东方显示技术有限公司 Substrate detection equipment and method
CN103792705B (en) * 2014-01-28 2017-02-01 北京京东方显示技术有限公司 Detecting method and detecting device for detecting substrate defects
KR20180052246A (en) * 2016-11-10 2018-05-18 (주) 지펙케이앤디 Manually or automatically brightness controlling display device by sensor value setting of illuminance sensor
CN107040725B (en) * 2017-05-15 2021-04-30 惠科股份有限公司 Coordinate correction method of image acquisition device and image acquisition device
CN110132979A (en) * 2019-05-05 2019-08-16 东方电气集团东方锅炉股份有限公司 A kind of analysis method of metal material microscopic defect

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59192943A (en) * 1983-04-15 1984-11-01 Hitachi Ltd Defect inspecting device repetitive pattern
JPH07119704B2 (en) * 1986-03-18 1995-12-20 オムロン株式会社 Board inspection equipment
JP2647502B2 (en) * 1989-06-30 1997-08-27 株式会社日立製作所 Pattern comparison inspection method and apparatus
JPH0357241A (en) * 1989-07-26 1991-03-12 Hitachi Ltd Automatic external-appearance inspection apparatus
JPH0776757B2 (en) * 1990-12-14 1995-08-16 インターナショナル・ビジネス・マシーンズ・コーポレイション Optical inspection device
JPH05172548A (en) * 1991-12-25 1993-07-09 Honda Motor Co Ltd Data output method and work surface inspection device
JPH0614959U (en) * 1992-06-01 1994-02-25 エヌオーケー株式会社 Image processing device
JP2710527B2 (en) * 1992-10-21 1998-02-10 大日本スクリーン製造株式会社 Inspection equipment for periodic patterns
JPH08219721A (en) * 1995-02-14 1996-08-30 Sony Corp Image processor
JP2981434B2 (en) * 1997-01-27 1999-11-22 株式会社日立製作所 Pattern defect detection method and apparatus
JP3288613B2 (en) * 1997-09-25 2002-06-04 株式会社クボタ Defect detection device and defect removal device
JPH11346308A (en) * 1998-06-02 1999-12-14 Olympus Optical Co Ltd Image reader for transparent original
JP2000193594A (en) * 1998-12-24 2000-07-14 Hitachi Ltd Circuit pattern inspecting method and its device
JP2000188075A (en) * 1998-12-22 2000-07-04 Hitachi Ltd Inspection method and inspection device for circuit pattern
JP4588138B2 (en) * 1999-07-23 2010-11-24 株式会社日立製作所 Circuit pattern inspection device
JP3869588B2 (en) * 1999-09-01 2007-01-17 株式会社日立製作所 Circuit pattern inspection device
JP2001141601A (en) * 1999-11-11 2001-05-25 Sony Corp Method and system for evaluating/sorting display or imaging device
JP2001156135A (en) * 1999-11-29 2001-06-08 Hitachi Ltd Method and device for sorting defective image and manufacturing method of semiconductor device using them
JP2001256480A (en) * 2000-03-09 2001-09-21 Hitachi Ltd Automatic picture classifying method and its device
JP2002228606A (en) * 2001-01-31 2002-08-14 Hitachi Ltd Electron beam circuit pattern inspecting method and apparatus therefor

Also Published As

Publication number Publication date
WO2005001455A1 (en) 2005-01-06
JP4079841B2 (en) 2008-04-23
CN1813185A (en) 2006-08-02
KR20060031645A (en) 2006-04-12
JP2005024312A (en) 2005-01-27
KR100791195B1 (en) 2008-01-02
CN100476416C (en) 2009-04-08
TW200511148A (en) 2005-03-16

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees