TWI285136B - Substrate processing equipment - Google Patents
Substrate processing equipment Download PDFInfo
- Publication number
- TWI285136B TWI285136B TW095107164A TW95107164A TWI285136B TW I285136 B TWI285136 B TW I285136B TW 095107164 A TW095107164 A TW 095107164A TW 95107164 A TW95107164 A TW 95107164A TW I285136 B TWI285136 B TW I285136B
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate
- processing chamber
- air knife
- disposed
- gas
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
- H01L21/02052—Wet cleaning only
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67706—Mechanical details, e.g. roller, belt
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Nonlinear Science (AREA)
- Optics & Photonics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning In General (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005097719A JP4494269B2 (ja) | 2005-03-30 | 2005-03-30 | 基板処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200637666A TW200637666A (en) | 2006-11-01 |
TWI285136B true TWI285136B (en) | 2007-08-11 |
Family
ID=37030120
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095107164A TWI285136B (en) | 2005-03-30 | 2006-03-03 | Substrate processing equipment |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4494269B2 (ja) |
KR (1) | KR100770503B1 (ja) |
CN (1) | CN100440446C (ja) |
TW (1) | TWI285136B (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI618905B (zh) * | 2015-01-28 | 2018-03-21 | Shibaura Mechatronics Corp | Substrate processing device |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4730286B2 (ja) * | 2006-11-24 | 2011-07-20 | トヨタ自動車株式会社 | 異物除去装置および異物除去方法 |
KR101043830B1 (ko) * | 2008-11-12 | 2011-06-22 | 주식회사 엘지실트론 | 반도체 제조 설비 |
KR200452969Y1 (ko) * | 2008-12-29 | 2011-04-04 | 주식회사 케이씨텍 | 대면적 기판의 건조장치 |
CN101697665B (zh) * | 2009-11-06 | 2011-04-06 | 深南电路有限公司 | 用于加工电路板的热风整平机 |
CN102679696A (zh) * | 2011-03-14 | 2012-09-19 | 无锡康力电子有限公司 | 超薄玻璃清洗后的干燥装置 |
DE102011109568A1 (de) * | 2011-08-05 | 2013-02-07 | Rena Gmbh | Abluftsystem und Verfahren dazu |
CN103851887B (zh) * | 2012-12-07 | 2016-01-27 | 深南电路有限公司 | Pcb干燥机 |
JP6259372B2 (ja) * | 2014-07-31 | 2018-01-10 | AvanStrate株式会社 | ガラス基板の製造方法、及び、ガラス基板の製造装置 |
CN104442037B (zh) * | 2014-11-29 | 2017-02-22 | 河南国花彩印包装有限公司 | 一种用于印刷机的封闭式除尘装置 |
CN107008695A (zh) * | 2016-01-28 | 2017-08-04 | 深圳长城开发科技股份有限公司 | 除尘装置 |
CN205692805U (zh) * | 2016-05-09 | 2016-11-16 | 合肥鑫晟光电科技有限公司 | 基板处理设备 |
CN108074835A (zh) * | 2016-11-09 | 2018-05-25 | 盟立自动化股份有限公司 | 湿式制程装置 |
CN107065433B (zh) * | 2017-05-08 | 2021-01-26 | 京东方科技集团股份有限公司 | 干燥装置 |
CN106925568B (zh) * | 2017-05-16 | 2019-12-06 | 捷开通讯(深圳)有限公司 | 粉尘自动清除装置及分板机 |
CN107144120B (zh) * | 2017-05-19 | 2019-06-28 | 惠科股份有限公司 | 一种显示面板干燥装置 |
CN107388785A (zh) * | 2017-07-28 | 2017-11-24 | 武汉华星光电技术有限公司 | 基板热干燥设备 |
JP2019042694A (ja) * | 2017-09-05 | 2019-03-22 | シャープ株式会社 | 基板処理装置 |
CN112868090A (zh) * | 2019-09-12 | 2021-05-28 | 铠侠股份有限公司 | 基板处理装置 |
CN110779320A (zh) * | 2019-09-17 | 2020-02-11 | 苏州晶洲装备科技有限公司 | 一种新型风干系统及具有该系统的oled基板剥离设备 |
JP7055839B2 (ja) * | 2020-06-25 | 2022-04-18 | 芝浦メカトロニクス株式会社 | 基板処理装置 |
JP7031831B1 (ja) | 2021-03-16 | 2022-03-08 | 株式会社アルフテクノ | 乾燥装置 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05296572A (ja) * | 1992-04-24 | 1993-11-09 | Nippon Upro Kk | 給湯機の消音器構造 |
JP3526692B2 (ja) * | 1995-07-21 | 2004-05-17 | 大日本スクリーン製造株式会社 | 基板の液切り装置 |
JPH11354487A (ja) * | 1998-06-03 | 1999-12-24 | Dainippon Screen Mfg Co Ltd | 基板乾燥装置および基板乾燥方法 |
JP2000252254A (ja) * | 1999-02-26 | 2000-09-14 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
JP2002022359A (ja) * | 2000-07-07 | 2002-01-23 | Matsushita Electric Ind Co Ltd | 基板の乾燥装置 |
JP2002130756A (ja) * | 2000-10-24 | 2002-05-09 | Yoshinosuke Tabata | 換気扇 |
JP2003017457A (ja) * | 2001-07-03 | 2003-01-17 | Dainippon Screen Mfg Co Ltd | 基板洗浄方法及び装置 |
KR100432053B1 (ko) * | 2001-07-05 | 2004-05-17 | (주)케이.씨.텍 | 건조장치 |
JP3754905B2 (ja) * | 2001-09-10 | 2006-03-15 | 東京エレクトロン株式会社 | 基板乾燥装置 |
KR100904278B1 (ko) * | 2001-11-12 | 2009-06-25 | 도쿄엘렉트론가부시키가이샤 | 기판처리장치 |
JP3865717B2 (ja) * | 2003-06-27 | 2007-01-10 | 東京応化工業株式会社 | 基板乾燥装置および基板乾燥方法 |
KR100527789B1 (ko) * | 2003-07-08 | 2005-11-09 | 태화일렉트론(주) | 엘씨디 패널 건조장치의 에어나이프 구조 |
JP2005071632A (ja) * | 2003-08-25 | 2005-03-17 | Fujitsu Hitachi Plasma Display Ltd | プラズマディスプレイパネルの製造方法及びその装置 |
JP4152871B2 (ja) * | 2003-12-03 | 2008-09-17 | 東京エレクトロン株式会社 | ノズル及び基板処理装置 |
-
2005
- 2005-03-30 JP JP2005097719A patent/JP4494269B2/ja not_active Expired - Fee Related
-
2006
- 2006-03-03 TW TW095107164A patent/TWI285136B/zh not_active IP Right Cessation
- 2006-03-29 CN CNB2006100714929A patent/CN100440446C/zh not_active Expired - Fee Related
- 2006-03-29 KR KR1020060028426A patent/KR100770503B1/ko not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI618905B (zh) * | 2015-01-28 | 2018-03-21 | Shibaura Mechatronics Corp | Substrate processing device |
Also Published As
Publication number | Publication date |
---|---|
KR100770503B1 (ko) | 2007-10-25 |
JP4494269B2 (ja) | 2010-06-30 |
KR20060106754A (ko) | 2006-10-12 |
TW200637666A (en) | 2006-11-01 |
JP2006278859A (ja) | 2006-10-12 |
CN100440446C (zh) | 2008-12-03 |
CN1840997A (zh) | 2006-10-04 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |