TWI267195B - Switching device for a pixel electrode and methods for fabricating the same - Google Patents

Switching device for a pixel electrode and methods for fabricating the same

Info

Publication number
TWI267195B
TWI267195B TW094120412A TW94120412A TWI267195B TW I267195 B TWI267195 B TW I267195B TW 094120412 A TW094120412 A TW 094120412A TW 94120412 A TW94120412 A TW 94120412A TW I267195 B TWI267195 B TW I267195B
Authority
TW
Taiwan
Prior art keywords
gate
fabricating
methods
pixel electrode
switching device
Prior art date
Application number
TW094120412A
Other languages
English (en)
Other versions
TW200701464A (en
Inventor
Kuo-Lung Fang
Wen-Ching Tsai
Kuo-Yuan Tu
Han-Tu Lin
Original Assignee
Au Optronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Au Optronics Corp filed Critical Au Optronics Corp
Priority to TW094120412A priority Critical patent/TWI267195B/zh
Priority to US11/247,345 priority patent/US7332383B2/en
Application granted granted Critical
Publication of TWI267195B publication Critical patent/TWI267195B/zh
Publication of TW200701464A publication Critical patent/TW200701464A/zh
Priority to US11/964,174 priority patent/US7786514B2/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40—Electrodes ; Multistep manufacturing processes therefor
    • H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/49—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET
    • H01L29/4908—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET for thin film semiconductor, e.g. gate of TFT
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/66007—Multistep manufacturing processes
    • H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
    • H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
    • H01L29/66409—Unipolar field-effect transistors
    • H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
    • H01L29/66742—Thin film unipolar transistors
    • H01L29/6675—Amorphous silicon or polysilicon transistors
    • H01L29/66765—Lateral single gate single channel transistors with inverted structure, i.e. the channel layer is formed after the gate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/78—Field effect transistors with field effect produced by an insulated gate
    • H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • H01L29/78651—Silicon transistors
    • H01L29/7866—Non-monocrystalline silicon transistors
    • H01L29/78663—Amorphous silicon transistors
    • H01L29/78669—Amorphous silicon transistors with inverted-type structure, e.g. with bottom gate

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Thin Film Transistor (AREA)
TW094120412A 2005-06-20 2005-06-20 Switching device for a pixel electrode and methods for fabricating the same TWI267195B (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
TW094120412A TWI267195B (en) 2005-06-20 2005-06-20 Switching device for a pixel electrode and methods for fabricating the same
US11/247,345 US7332383B2 (en) 2005-06-20 2005-10-11 Switching device for a pixel electrode and methods for fabricating the same
US11/964,174 US7786514B2 (en) 2005-06-20 2007-12-26 Switching device for a pixel electrode

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW094120412A TWI267195B (en) 2005-06-20 2005-06-20 Switching device for a pixel electrode and methods for fabricating the same

Publications (2)

Publication Number Publication Date
TWI267195B true TWI267195B (en) 2006-11-21
TW200701464A TW200701464A (en) 2007-01-01

Family

ID=37572526

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094120412A TWI267195B (en) 2005-06-20 2005-06-20 Switching device for a pixel electrode and methods for fabricating the same

Country Status (2)

Country Link
US (2) US7332383B2 (zh)
TW (1) TWI267195B (zh)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI255363B (en) * 2005-02-04 2006-05-21 Quanta Display Inc Liquid crystal display
TWI261929B (en) * 2005-06-13 2006-09-11 Au Optronics Corp Switching device for a pixel electrode and methods for fabricating the same
US20070231974A1 (en) * 2006-03-30 2007-10-04 Hsien-Kun Chiu Thin film transistor having copper line and fabricating method thereof
CN101710586B (zh) * 2009-01-09 2011-12-28 深超光电（深圳）有限公司 提高开口率的储存电容及其制作方法
DE102009038589B4 (de) 2009-08-26 2014-11-20 Heraeus Materials Technology Gmbh & Co. Kg TFT-Struktur mit Cu-Elektroden
KR101847656B1 (ko) * 2009-10-21 2018-05-24 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치 및 그 제조 방법
US8270178B2 (en) * 2010-03-22 2012-09-18 Au Optronics Corporation Active device array substrate
KR102233958B1 (ko) 2010-07-02 2021-03-29 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치 및 그 제작 방법
US9385238B2 (en) 2011-07-08 2016-07-05 Semiconductor Energy Laboratory Co., Ltd. Transistor using oxide semiconductor
US20150079727A1 (en) * 2013-09-17 2015-03-19 Intermolecular, Inc. Amorphous IGZO Devices and Methods for Forming the Same
CN104952930A (zh) * 2014-03-27 2015-09-30 深圳莱宝高科技股份有限公司 薄膜晶体管及其制作方法
US10128438B2 (en) * 2016-09-09 2018-11-13 Arm Limited CEM switching device

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4175437B2 (ja) * 1997-09-16 2008-11-05 株式会社半導体エネルギー研究所 半導体装置およびその作製方法
TW469484B (en) * 1999-03-26 2001-12-21 Semiconductor Energy Lab A method for manufacturing an electrooptical device
US6562668B2 (en) * 2000-08-12 2003-05-13 Jin Jang Method of fabricating thin film transistor using buffer layer and the thin film transistor
KR100643038B1 (ko) * 2000-08-31 2006-11-10 엘지.필립스 엘시디 주식회사 박막트랜지스터형 광센서 어레이 기판
US6583440B2 (en) * 2000-11-30 2003-06-24 Seiko Epson Corporation Soi substrate, element substrate, semiconductor device, electro-optical apparatus, electronic equipment, method of manufacturing the soi substrate, method of manufacturing the element substrate, and method of manufacturing the electro-optical apparatus
US6709938B2 (en) * 2001-08-21 2004-03-23 Texas Instruments Incorporated Source/drain extension fabrication process with direct implantation
JP4198906B2 (ja) * 2001-11-15 2008-12-17 株式会社ルネサステクノロジ 半導体装置および半導体装置の製造方法
TWI261929B (en) * 2005-06-13 2006-09-11 Au Optronics Corp Switching device for a pixel electrode and methods for fabricating the same

Also Published As

Publication number Publication date
US20060284176A1 (en) 2006-12-21
TW200701464A (en) 2007-01-01
US7332383B2 (en) 2008-02-19
US20080099766A1 (en) 2008-05-01
US7786514B2 (en) 2010-08-31

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees