TWD177006S - 半導體製造裝置用附設研磨部之清洗刷之部分 - Google Patents
半導體製造裝置用附設研磨部之清洗刷之部分Info
- Publication number
- TWD177006S TWD177006S TW104303363D01F TW104303363D01F TWD177006S TW D177006 S TWD177006 S TW D177006S TW 104303363D01 F TW104303363D01 F TW 104303363D01F TW 104303363D01 F TW104303363D01 F TW 104303363D01F TW D177006 S TWD177006 S TW D177006S
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate
- parts
- design
- article
- cleaning
- Prior art date
Links
- 238000004140 cleaning Methods 0.000 title abstract 7
- 238000004519 manufacturing process Methods 0.000 title abstract 4
- 239000004065 semiconductor Substances 0.000 title abstract 3
- 238000005498 polishing Methods 0.000 title abstract 2
- 239000000758 substrate Substances 0.000 abstract 6
- 239000000853 adhesive Substances 0.000 abstract 1
- 230000001070 adhesive effect Effects 0.000 abstract 1
- 230000002411 adverse Effects 0.000 abstract 1
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPD2014-29094F JP1528261S (cs) | 2014-12-25 | 2014-12-25 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWD177006S true TWD177006S (zh) | 2016-07-11 |
Family
ID=53779669
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW104303363D01F TWD177006S (zh) | 2014-12-25 | 2015-06-23 | 半導體製造裝置用附設研磨部之清洗刷之部分 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP1528261S (cs) |
| TW (1) | TWD177006S (cs) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD931240S1 (en) | 2019-07-30 | 2021-09-21 | Applied Materials, Inc. | Substrate support pedestal |
-
2014
- 2014-12-25 JP JPD2014-29094F patent/JP1528261S/ja active Active
-
2015
- 2015-06-23 TW TW104303363D01F patent/TWD177006S/zh unknown
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD931240S1 (en) | 2019-07-30 | 2021-09-21 | Applied Materials, Inc. | Substrate support pedestal |
Also Published As
| Publication number | Publication date |
|---|---|
| JP1528261S (cs) | 2016-06-27 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWD179672S (zh) | 基板保持環之部分 | |
| USD808349S1 (en) | Elastic membrane for semiconductor wafer polishing apparatus | |
| TWD162133S (zh) | 基板洗淨用輥子軸桿之部分 | |
| TWD180337S (zh) | 修整器碟片 | |
| TWD179095S (zh) | 基板保持環 | |
| EP2762274A3 (en) | Method of polishing back surface of substrate and substrate processing apparatus | |
| TWD188262S (zh) | Part of the cleaning brush with the grinding part for the semiconductor manufacturing equipment | |
| JP2015160250A5 (cs) | ||
| TWD167109S (zh) | 基板保持環 | |
| TWD162134S (zh) | 基板洗淨用輥子軸桿之部分 | |
| TWD179673S (zh) | 基板洗淨用海綿之部分 | |
| TWD184278S (zh) | 基板洗淨用海綿之部分 | |
| USD770990S1 (en) | Elastic membrane for semiconductor wafer polishing apparatus | |
| TWD177006S (zh) | 半導體製造裝置用附設研磨部之清洗刷之部分 | |
| TWD173082S (zh) | 半導體製造裝置用附設研磨部之清洗刷之部分 | |
| TWD173084S (zh) | 半導體製造裝置用附設研磨部之清洗刷之部分 | |
| TWD172247S (zh) | 半導體加工機用基板移載機之清淨組件之部分 | |
| TWD170203S (zh) | 基板洗淨用滾軸桿之部分 | |
| TWD179918S (zh) | 基板洗淨用滾子之部分 | |
| TWD177222S (zh) | 基板洗淨用滾軸桿之部分 | |
| TWD179916S (zh) | 基板洗淨用滾子之部分 | |
| TWD179919S (zh) | 基板洗淨用滾子之部分 | |
| TWD179917S (zh) | 基板洗淨用滾子之部分 | |
| TWD177223S (zh) | 基板洗淨用滾軸桿之部分 | |
| TWD168373S (zh) | 半導體晶圓硏磨裝置用彈性膜之部分 |