TW573389B - Six to ten KHz, or greater gas discharge laser system - Google Patents

Abstract

The present invention provides gas discharge laser systems capable of reliable long-term operation in a production line capacity at repetition rates in the range of 6,000 to 10,0000 pulses power second. Preferred embodiments are configured as KrF, ArF and F2 lasers used for light sources for integrated circuit lithography. Improvements include a modified high voltage power supply capable for charging an initial capacitor of a magnetic compression pulse power system to precise target voltages 6,000 to 10,0000 times per second and a feedback control for monitoring pulse energy and determining the target voltages on a pulse-by-pulse basis. Several techniques are disclosed for removing discharge created debris from the discharge region between the laser electrodes during the intervals between discharges. In one embodiment the width of the discharge region is reduced from about 3 mm to about 1 mm so that a gas circulation system designed for 4,000 Hz operation could be utilized for 10,000 Hz operation. In other embodiments the gas flow between the electrodes is increased sufficiently to permit 10,000 Hz operation with a discharge region width of 3 mm. To provide these substantial increased gas flow rates, Applicants have disclosed preferred embodiments utilize tangential forms of the prior art but with improved and more powerful motors and novel bearing designs. New bearing designs include both ceramic bearings and magnetic bearings. In other embodiments, some or all of the gas circulation power is provided with a blower located outside the laser chamber. The outside blower can be located in the laser cabinet or in separate location.

Description

573389 A7, ____ B7 ________ ______ .-. -...-V. Description of the invention (1) Relevant technical description (please read the notes on the back before filling out this page) The present invention is an application numbered May 7, 2002 w / 141,216, application number 10 / 〇36,676 on December 21, 2001, application number 10 / 〇12,002, filed on November 30, 2001, October 17, 2001 • Application No. ^ / 029,319, Application No. ^ / 029,319, August 29, 2001 _ No. 09 / 943,343, Application No. φ 09 / 854,097, May 11, 2001, Submitted on February 27, 2001 Please No. 09 / 794,782 •, No. | Application, No. 09 / 768,753 filed on January 23, 2001, Application No. 09/684 629 filed on October 6, 2000 No., and June 19, 2000, the application number No. 09 / 597,812 and other parts of the application continued. The present invention deals with some discharge gas lasers, and specifically deals with some high repetition rate gas discharge lasers. BACKGROUND OF THE INVENTION Discharge gas lasers: Lines 丨 Discharge gas lasers are well known and will be available shortly after the laser was invented in I960. The high voltage discharge between their two electrodes can excite a laser gas' to produce a gaseous gain medium. A resonant cavity containing this gain medium allows the light wave to be excited and amplified, which is then extracted from the cavity as a laser beam. Most of these discharge gas lasers operate in a pulse mode. Excimer lasers Excimer lasers are a special type of discharge gas laser, and they have been known since the mid-1970s. A description of excimer lasers that can be used in integrated circuit lithography, which states that in June 1991, this paper size applied the Chinese National Standard (CNS) A4 specification (210X297 mm) 4 573389 A7 __ —___ B7 _ 5 2. Description of the invention (2) US Patent No. 5,023,884, entitled "Compact Exeimer Laser." (Pocket Excimer Laser), was issued on the 11th. This patent has been transferred to the applicant's employer, and this patent is incorporated into this specification by reference. The excimer laser described in this patent, 884, is a pulse laser with a high repetition rate. In figures 丨 and 2, the main components of the laser 10 are shown. (Figure 1 corresponds to the patent, Figure 1 to 884, and Figure 2 corresponds to Figure 7). The discharge 22 is between two elongated (about 23 inches) electrodes 18 and 20 separated by about 5/8 inches. The repetition rate of their prior art lasers, as illustrated, is typically in the range of about 100 to 2000 pulses per second. These high repetition rate lasers are usually provided with a gas circulation system. In the lasers referred to above, this is accomplished with an elongated squirrel-cage fan 46 having approximately 23 blades 48. This fan blade structure is slightly longer than its electrodes, 8 and 20, and can provide sufficient circulation so that at the operating speed of their pulse waves, the discharge between these electrodes disturbs the gas, which can be between their pulse waves. Be purified. The shaft 130 of the fan 46 is supported by two ball bearings 132, as shown in Figure 2A of Figure 9 of Figure 884. The gas used in the laser contains extremely active fluorine gas. The fan rotor drives the fan shaft 130, and the sealing member 136 explained in the 9th row and the 45th column of the patent, 884 is sealed in the same environmental system provided by their shell structural members 12 and 14, And its motor stator 140 is external to its sealing member 136 and can therefore be protected from the corrosive effects of fluorine gas. However, its bearing 132 and the lubricant used in this bearing will be corroded by the discharge chamber gas. Corrosion of its bearings and bearing lubricants will pollute its gases. 0 This paper size is applicable to China National Standard (CNS) A4 specifications (210X297 public love) (Please read the precautions on the back before filling this page). : Line 丨 573389 A7 B7 V. Description of the invention (Modular design These excimer lasers, when used in integrated circuit lithography, typically operate on, and continuously, ”integrated circuit manufacturing production lines In China, thousands of valuable integrated circuits are produced per hour; therefore, downtime will be very expensive. For this reason, most of its components are organized into modules, which can be used within minutes Line narrowing. Excimer lasers that are used in lithography, typically must have their output beams shortened to less than a micron in bandwidth. This "line narrowing" is typically based on A line narrowing module (called a `` line narrowing module, or "LNp") is formed by internal elements, which are formed as the back of the laser cavity. This LNp is composed of some special optical components. Some of them , Some mirrors, and a grating. As the repetition rate increases, the stable performance maintained by its LNP will become a serious challenge. Pulse Power Discharge gas of the type described in US Patent No. 5,023,884 Laser uses a pulsed power system similar to the one shown in Figure 3 to generate a discharge between its two electrodes. In this prior art system, there is a DC power supply 22, which can be called a "Charging capacitors, or capacitor banks of" C0 "42, are charged to a predetermined and controlled voltage referred to as" charging voltage "for each pulse. The magnitude of this charging voltage is stored here first. In the technical unit, it may be in the range of about 500 to 1,000 volts. After C0 has been charged to its predetermined voltage, a solid state switch 46 will be closed, allowing the electrical energy stored on C0 to Very quickly looped through a series of 6 (Please read the notes on the back before filling this page)

， 可 I: Line 丨 This paper size is applicable to Chinese National Standard (CNS) A4 specification (210X297 mm) 573389 A7 ^ _ ^ B7_ V. Description of the invention (4) Capacitor row groups 52, 62, and 82, and inductor 48 A magnetic compression circuit consisting of, 54 ,, and 64 and a transformer 56 are used to generate a high voltage potential in the range of about 16,000 volts between these electrodes, which will generate a discharge that can last for about 50 ns. In the state-of-the-art systems on the market, the time between the closing and discharging of the solid-state switch is in the range of about 5 microseconds; however, c0 is accurately charged to its pre-selected voltage, which in the past required about 40%. 0 microseconds, which is fast enough for pulse repetition rates of less than about 2,000 Hz. The reader should understand that the precise charging of C0 is extremely important because the control of the voltage level above Cg is the only actual control of its discharge voltage by its laser operator in these systems. The basic determinant of laser pulse energy. Existing state-of-the-art excimer lasers used in heat exchanger integrated circuit lithography typically require a system to cool their laser gas due to electrical discharges and the energy they input via the above-mentioned fan. Both are heated. This is typically done with a water-cooled heat exchanger with fins shown at 58 in Figure 1. A laser doubling or higher repetition rate will more than double the amount of heat generated in the laser. This is mainly because the power required to circulate the laser gas will be as long as it needs it. The cube of gas velocity increases. Beam quality control When used as a light source for integrated circuit lithography, its laser beam parameters (ie, pulse wave energy, wavelength, and bandwidth) are typically subject to this paper's standards and apply Chinese national standards (CNS) A4 specification (210X297 mm) (Please read the precautions on the back before filling this page)

573389 A7 ------------ £ 7 ______ V. Description of the invention (5) Strict specification restrictions. This will require its pulse-wave energy pulse-by-pulse feedback control 'and its line-narrowing output beam's slightly slower feedback control. Doubling or more of this pulse rate will require these feedback control systems to perform faster. It is desirable to have a better laser design for a pulsed gas discharge laser to 'operate at a repetition rate in the range of approximately 4,000 pulses per second. SUMMARY OF THE INVENTION The present invention provides a number of Reliable and long-term gas discharge laser system in production line capacity at repetition rates in the range of 10,000 pulse powers. In their preferred embodiments, KrF, ArF, and F2 lasers are used as the light source for integrated circuit lithography. The improvement includes a modified high-voltage power supply capable of charging a starting capacitor of a magnetic compression pulse wave power system to a precise target voltage of 6,000 to 10,000 times per second, and a pulse wave energy monitoring device. The feedback control of these target voltages is determined pulse by pulse. The disclosed techniques can remove debris created by the discharge from the discharge area between the laser electrodes during the discharge interval. In one embodiment, the width of the discharge area is reduced from about 3 mm to about 1 mm, so that a gas circulation system designed for operation at 4,000 Hz can be used for operation at 10,000 Hz. In other embodiments, the airflow between the electrodes is increased enough to allow a discharge area width of 3 mm to operate at 10,000 Hz. In order to provide these greatly increased gas flow rates, our applicants have disclosed some preferred embodiments. They are tangential fans using their pre-existing techniques, but they have an improved and more powerful paper standard applicable to China. National Standard (CNS) A4 Specification (210X297 mm) (Please read the precautions on the back before filling this page)

573389 A7 --------- Β7 V. Description of the invention (6) Design of motor and new bearing. These new bearing designs include both ceramic and magnetic bearings. In other embodiments, some or all of the gas circulation power is provided by a blower placed outside the laser discharge chamber. The external blower can be located inside its laser enclosure or in a separate location. The present invention also provides some improvements to allow removal of the extra heat caused by its increased discharge rate and the extra heat caused by its increased fan power. The embodiments of the present invention can be applied to a single-chamber gas discharge laser system, and to some similar dual-chamber laser systems, such as the eight laser system. In this application, our applicant first explained a laser system specifically designed for operation at 4,000 Hz, and discussed some minor improvements to allow for a substantial increase in its pulse repetition rate. Our applicant then goes on to explain some of the major modifications that can significantly increase heat removal from its laser system, and its substantial increase in laser gas flow. Our applicants have explained in detail the design of the pulse wave power system that can provide accurate electrical pulses at rates up to 10,000 Hz or more, and specify that they can monitor and control laser pulses at these pulse wave repetition rates Wavelength and control equipment for the spectral properties of waves, and extremely fast response line narrowing equipment that details our applicants. Our applicants also explain better laser technology and equipment, application examples of the present invention for MOPA systems, and these high repetition rate systems for other useful information including a beam transmission system and a pulse multiplier. Improvement. The diagram briefly illustrates that Figures 1, 2, and 2A show the characteristics of a pre-existing technology laser system; this paper size applies the Chinese National Standard (CNS) Α4 specification (210X297 public love) 9 (Please read the note on the back first Please fill in this page again)-, \ ding | 573389 A7 B7 V. Inventive note (l〇) to control its laser function, • A compression head module 3K, which is part of the laser pulse power system And pulse wave compression which can provide the final stage of its electrical pulse wave, which can charge a crest capacitor bank above the top of its laser discharge chamber, • a stabilization module 4K, also known as a wavelength meter, which Can monitor these laser pulses, and can provide some feedback signals to control the wavelength and pulse energy, • An automatic light valve module 5K with a power meter, • An MFT power supply 6K, which can provide high Voltage power to a metal fluoride trap (filter) located on top of its laser discharge chamber module, • a left blower motor 7K, • a laser discharge chamber module 8K, • an interface module 9K, It can provide some interface circuits to The laser control works closely with the control of the lithographic printing machine. • A cooling water supply module 10K, • a cooling water distribution module 11K, • a laser gas supply module 12K, • a ventilation group 13K, which includes A smoke and dust detector, so that the laser chamber gas can be discharged to the outside atmosphere. • A right blower motor 14K, • a line narrowing module 15K, which is also known as a line narrowing module or LNP, • a right blower motor control 16K, this paper size applies Chinese National Standard (CNS) A4 specification (210X297 mm) 13 (Please read the precautions on the back before filling this page) 丨 · Packing—

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573389 A7 _________B7 V. Description of the Invention (11) • A left blower motor controller 17K, • a rectifier module 18K, which contains a Co charging capacitor bank (please read the precautions on the back before filling this page) Group 'and A circuit that can initiate electrical pulses and provide early pulse compression and pulse voltage amplification. • A resonant charger module 19K that provides extremely fast resonant charging to Co capacitor banks. • A high-voltage power supply module. Group 20k, which can generate high-voltage dc power from standard electric power three-phase AC power, • an AC / DC power distribution module 21K, • a helium purification module (not shown), • a waveform stabilization module Group (not shown). FIG. 4A is a cross-sectional view of the laser discharge cell 1a according to the first preferred embodiment of the present invention. Its main discharge chamber components are: shell structural members 12A and 14A, cathode 18A and anode 20A, upstream pre-ionizer tube 60, crest capacitor bank 62, and electrostatic trap unit 64 (all of them and the first figure) The corresponding components of the prior art shown are similar). The discharge chamber system includes a new anode base airflow shaping structure 48, a new upper airflow shaping structure 50, a gas turning blade 52, a new 5-inch diameter tangential fan blade structure 46A, and four water-cooled heat exchangers. $ 5 8 A. Fig. 13 shows a similar configuration of another type of discharge cell with a novel current loop 548. Fig. 16 is a block diagram showing that the laser system controls important features of the output beam wavelength and pulse energy. Important improvements that are superior to pre-existing gas discharge lasers include: This paper is sized for China National Standard (CNS) A4 (210X297 mm) -14 _ 573389 A7 ---------! 1 _ 5. Description of the invention (12) Surface 1) Improved flow path for laser gas circulation in discharge chamber 2) Water-cooled pulse wave power system 3) Ultra-fast wavelength meter with fast control algorithm

4) New high duty cycle LNP combined with PZT and stepper motor driven modulation mirror 5) Large tangential fan with special controller with dual water-cooled brushless DC driver blower motor 6) Ultra-pure for optical device protection Nitrogen purification system 7) Sealed light valve with wattmeter 8) Improved heat exchanger configuration 9) Beam sealing system 10) LNP related helium purification 11) Current loop with some ribs parallel to the air flow 12) Inductive plate for optimization of discharge chamber impedance. 13) Optimization of electrode for performance life. Narrow Discharge Width A preferred embodiment of the present invention can be designed by using a laser system designed for operation at 4,000 Hz, and operated at 40,000 to 100,000. Pulse repetition rate. In this embodiment, the discharge area has been narrowed to about 1 to 111111 from the previous design of the discharge area of about 3% mm. (A better electrode design to provide a narrow discharge width is explained in the next section). This will allow the discharge area between these electrodes 18A and 20A to be cleaned at a gas velocity of about 67 m / s. At this gas rate, the debris from the pulses of each pulse in front of the collar is at the time of discharge, and the paper size downstream of its discharge area applies the Chinese National Standard (CNS) A4 specification (210X297 mm)

(Please read the notes on the back before filling this page)

573389 A7 B7 Closing 5. Description of the invention (about 0.5 cm. In order to achieve these rates, 5 pairs of diameter tangential fan units (with a blade structure of 26 inches in length) and the rotation rate have been increased to approximately 3500 rpm. In order to achieve this performance, this embodiment uses two motors with a rating of about 2 kw each, which can collectively transmit a driving power up to about 4 kw to the fan blade structure. For example, in At a pulse rate of 800 Hz, its discharge will add about 12 kw of thermal energy to its laser gas. In order to remove the heat generated by its discharge and the heat added by its fan, it is provided with four Free-standing water-cooled heat exchanger unit with heat sink 5 8A. These motors and heat exchangers will be described in detail below. Heat exchanger assembly A cross-sectional view of one of the above heat exchangers is shown in Figure 21 The middle section of this heat exchanger is cut away, but its ends are shown. Figure 21A is an enlarged view showing the ends where the heat exchanger can accommodate thermal expansion and contraction. The components of the heat exchanger, System The structure of the hot plate is 302. Its mechanism is from solid copper (CU 11000), and it is a political heat plate 303 including 12 pieces per inch. The water flow is through an axial channel with a hole diameter of 33.33. The plastic turbulator 306 in the axial channel can prevent the stratification of water in the axial channel, and can prevent the formation of the thermal interface layer on the inner surface of the channel. Its bending flange early element 304 is a welded unit, which is composed of an inner flange 304A, an expansion bladder 304B, and an outer flange 304c. The heat exchanger unit includes three c-shaped sealing layers 308. It can seal the water flowing in the heat exchanger, and isolate it from the laser gas. Its telescopic bladder 304B allows the expansion of the heat exchanger relative to the discharge chamber, and this paper size applies the Chinese National Standard (CNS) A4 specifications (210X297). (Please read the precautions on the back before filling out this page.)… Install-•, Yiding 丨 573389 A7 _B7_ 5. Description of the invention (I4). Its dual-port nut 400 can make Its heat exchanger channel is connected to a standard 5/16 inch positioning elbow joint. It is connected to a water source. Its 0-ring 402 can provide a sealing layer between its nut 400 and its heat sink structure 302. In a preferred embodiment, Rui Liuyi has four turbulators in stock. Consists of elongated coaxial mixing elements, which are typically used to phase-mix the epoxy resin composition, and are available from 3M Company (Static Mixer, Part No. 06-131229-00). This coaxial mixer It is shown at 306 in Figures 21 and 21A. This coaxial mixer forces water to flow along a general spiral path that reverses its clockwise direction at every pitch distance (which is 0.3 pairs). This turbulator can significantly improve the performance of its heat exchanger. Tests performed by our applicants have shown that adding the turbulent can reduce the water flow required to maintain its equivalent gas temperature conditions by a factor of approximately 5. Better cooling water flow control. For the preferred embodiment of the present invention, our applicant has added a clutch solenoid water control valve to its discharge chamber cooling water supplier. In its previous design, the cooling water was controlled by a proportional valve that was controlled based on a fast-acting temperature that sensed the temperature of its laser gas. These proportional valves usually perform extremely well at flow rates within the operating range of some similar valves between 50 and 100%. In order to provide good control over the entire cooling water flow range, a digital clutch flow control valve is added in series with the proportional valve. These digital valves can be programmed to operate in specific cycles, such as one-second cycles, to open the valves for one second. The paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) 17 ( (Please read the notes on the back before filling out this page) • Order ·

573389 A7

573389 A7 ___B7 V. Description of the invention (I6) The cooling effect outside the bottom of the discharge chamber is not occupied by the fan's entire volume and the anode base, which are made by the machine into some large 0.5mm thick heat sinks, and along the Its discharge chamber, which is approximately 70 cm long, centers the heat sinks 2 mm apart. Preferably, there are about eight precise holes drilled through the fins and some cooling water pipes of the same material as the bottom of the discharge chamber, which are heat fit into these holes to provide the cooling required by the discharge chamber. effect. Water can be injected from both sides, and as discussed above, there is half the flow in each direction. Increasing Laser Gas Flow Velocity Laser Gas Flow Path In this preferred embodiment, the gas flow rate into and out of the discharge area has been significantly improved in their prior art laser discharge cells. The blade structure 66 is designed to standardize the gas velocity in its area 68 so that it is approximately 20 m / s downstream of the fan blade structure. In the embodiment of Fig. 13, the top of the discharge chamber is machined to provide a similar gas flow shaping surface. The velocity of its gas will then be accelerated to a design velocity of 67 m / s in its discharge area. At about 4 pairs downstream of the center of its discharge area, its flow cross-section is from about 5/8 pairs, and at an angle of 20 degrees, increases to about 4 inches before its gas is rotated by the four turning blades 52. This will allow for a large percentage of the pressure drop across its discharge area. The whale-shaped current circuit 548 shown in Figure 13A (1) is a laser mechanism made from a 015-inch-thick nickel alloy (UNS N04400), and is bent as shown in Figures 13A (3) to 13A. (8) The shape shown in the figure, so that the 23 fins show the least resistance to the gas flow. The cross-section of each fin is 0.015 inches by 0.99 inches, with its long dimension in a direction parallel to the gas flow direction. This paper is standard Gu Guguan Fresh (CNS) A4 size ⑽χ297 public love) 19 (Please read the precautions on the back before filling this page)

573389 A7 _B7_ V. Description of the Invention (I7) The integrated main insulator is used to improve the flow path in the discharge area. The preferred embodiment of the present invention uses a main insulator with one or more pre-ionizers integrated in it. . This basically combines the pre-ionizer tube shown at 60 in Figure 4A with the earlier version of the main insulator shown at 50 in Figure 4A. A cross-sectional view of the main insulator of a preferred embodiment is shown in Figure 4C. The main insulator system is shown at 50A, and the slot system associated with a ground rod is shown at 60A. The position of the cathode is shown at 18A1. This insulation system is composed of high-density alumina, which was purchased from the company's LTD Ceramics in Newark, California and other suppliers. This design can greatly reduce the resistance of the gas flow, while allowing the flow speed to be increased significantly at the same blower power. Figure 4D shows a cathode-anode configuration that can show this modified flow path, compared to the configurations shown in Figures 4A and even Figures 13A (1) and 13A (2) . Increasing the gas flow rate If the width of the discharge area is maintained at about 3.5 mm, its repetition rate will be increased to the range of 10,000 Hz. Compared with the current commercial gas discharge lasers operating at 4,000 Hz, its lightning will need to be significantly increased. Eject gas flow. This manual will describe several techniques to increase the necessary gas flow to remove some of the discharge debris that comes out of their discharge area between their pulses. Downstream arcing In a preexisting state-of-the-art excimer discharge cell related to a given gas flow rate, the pulse repetition rate is limited by its downstream arcing. The following paper size applies to China National Standard (CNS) A4 (210X297 mm) 20 (Please read the precautions on the back before filling this page)

573389 A7 __B7_ V. Description of the Invention (I8) The arcing effect of the wave is caused by the debris of its previous pulse, just when the voltage potential between these electrodes approaches its discharge voltage, but just after it emerges from its discharge area, Will happen. Their arc will extend from their cathode to their anode along the path defined by the trailing edge of the debris. This downstream arc will generate some laser pulses with low energy and poor quality. Therefore, this downstream arcing must be avoided, and it is a phenomenon that limits the pulse rate. The suction at the anode Figure 13A (3) shows a better technique specifically for improving the flow in the area immediately next to the anode, which is exactly the design shown in Figure 13A (2). The difference is the tight A suction is provided downstream of the anode 542. In this embodiment, a slot communication channel 544C is arranged along the length of its anode 542 between the anode 542 and the insulator spacer 544B, and through its anode base rod 546, until its cylindrical force is communicated. Wind between 547. This forced ventilation room 547, as shown in Fig. 13D, is connected to a pipe 549 outside its discharge chamber. The blower 550 shown in FIG. 13E will extract laser gas from its forced ventilation chamber 552 and discharge it at a pressure of about 1 atmosphere higher than the pressure of its discharge chamber through its water-cooled heat exchanger 551. Enter this forced ventilation room 547. The forced ventilation chamber 552 was constructed by drilling a 2.5 cm diameter hole in the discharge chamber wall parallel to the longitudinal direction of the electrode. There are eight injection nozzles 553, which can inject the high-pressure gas from its forced ventilation chamber 552 into the gas stream downstream of its fan 46A at a rate much higher than the general gas velocity at that location. Therefore, this paper size applies to the Chinese National Standard (CNS) A4 (210X297 mm) 21 (Please read the precautions on the back before filling this page)

573389 A7 _B7_ V. Description of the Invention (l9) The additional flow circuit can provide additional gas cooling effect. However, its main advantages are that this additional flow circuit can provide laminar flow, and can also clean discharge debris in the area immediately downstream of its anode, and the result can allow for a given general gas flow rate, allowing Significantly increase its arc-free repetition rate downstream. Suction can also be placed downstream of its cathode by creating a forced-air chamber similar to the forced-air chamber 552 near its cathode. The forced ventilation chamber may be built in a modified version of the main insulator 50 or in a cavity built between the cathodes 541 and the insulator. Its blower 550 can provide the suction required for both forced ventilation rooms. The designs shown in Figures 13D and 13E will greatly increase the complexity of the design of the discharge chamber, and require an additional blower, which will preferably need to have a device similar to those used to drive the fan 46A. Motor of the sealed rotor of the motor. A simpler solution that provides suction at its anode is shown in Figure 13F. This design has been tested by our applicants and it can significantly improve the gas flow in the area immediately downstream of the anode. However, its general gas flow will be slightly reduced because a part of the fan suction 555 is specially made to provide its suction through the anode base rod 547. A preferred embodiment of the present invention can provide a large tangential fan driven by a dual motor to circulate the laser gas. The components shown in Figure 4A, Figure 13, Figure 18, and Figure 18A provide a 67 m / sec airflow between these electrodes, which is sufficient for pulses of 4,000 Hz. Between waves, clear about 1.7 cm of space in the discharge area. At 10,000 Hz, the cleared space is approximately 6.7 mm. This is approximately 22 of the typical 3 to 3.5 mm discharge area of KrF and ArF lasers currently used by laser lithography (please read the precautions on the back before filling this page) This paper size applies to Chinese national standards ( CNS) A4 specification (210X297 mm) 5. Description of the invention (20) Double the visibility. This fan; the surface of the blade structure is shown as 64A in Figure 4a. A perspective view is shown in Figure 18A. The blade structure has a diameter of 5 inches, and the mechanism is made of a solid aluminum alloy 6061-T6 bar. The individual blades in each section, as shown in Figure 8A, are slightly offset from adjacent sections, thereby minimizing the pressure disturbance caused by the blades in their discharge area. The individual blades preferably have some leading edges that are tapered to the cutting edge to reduce the reflection of the discharge sound waves that leave the leading edge of the blade during operation. This embodiment, as shown in FIG. 18, uses two 3-phase brushless DC motors, each of which has a magnetic rotor housed in a metal pressure cover. The latter can be used as in US Patent No. 4,950,840. As described in the above, the stator part of these motors is isolated from its laser gas environment. In this embodiment, the pressure cover is a 0.0016-inch thin-walled nickel alloy 400, which acts as a barrier for its laser gas. Its two motors, 53 and 532, drive the same shaft and are programmed to rotate in opposite directions. These two motors are sensorless motors (i.e., they have no position sensor in operation). It is used to control the right motor controller 534 of the right motor 530. It acts as a master controller and can control its slave motor controller 5 3 6 'through some analog and digital signals to establish start / stop and current commands. , Current feedback, etc. It communicates with the laser controller 24A through an RS-232 serial port and enters its main controller 534. Larger motors The tangential fans illustrated in Figures 18, 18A, and 18B are 2 and 2A. The paper size applies to the Chinese National Standard (CNS) A4 specification (210X297 mm) -23-573389 A7 ____ B7_ V. Invention Note (2i) The basic fan technology shown in the figure is a patent approved by our applicant's employer in 991 (see US Patent No. 5,023,884). Other improvements that can be used to increase the velocity of the laser gas in its discharge area are larger ones of the type described in U.S. Patent No. 09 / 747,316 (which is incorporated herein by reference). A fan of a more powerful motor. The rated value of this motor is 4.5 kw, so that two such motors, compared to the two 2 kw motors described above, can provide a driving power of about 9 kw to the above 5-inch fan. These larger fans can increase the gas velocity 'in the discharge area to about 90 m / s. Better ceramic bearings Faster fan speeds will put extra stress on their bearings. Deep grooved silicon nitride ball bearings have proven to perform very well, and can support reasonable blowers and fans when supporting some blower fans in fluorine-containing excimer laser discharge chambers. The structure of this bearing requires some silicon nitride balls and groove plates plus a snap ring, which is typically made of PTFE (trade name Teflon) and can be used during operation. Isolated from each other. The failure mode of this bearing is the wear of its positioning ring. Therefore, any improvement that can minimize the wear of the positioning ring will promote a durable bearing. An improvement can be achieved by changing the material of the collar to another fluorine gas compatible material with better mechanical (including abrasion resistance) and thermal properties. In this way, the geometry of the positioning ring is preserved. A suitable material is PCTFE (trade name Kel_F, which softens at a temperature of 35F and is higher than PTFE). The test shows that compared with TeflOn, Kel_F's paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) 24 (Please read the precautions on the back before filling this page)-Order |

573389 A7 _ B7_ V. Description of the invention (22) Corrosion has been greatly reduced. Another reasonable choice for the material of the above-mentioned positioning ring will be silicon nitride, because it can perform very well when used as a ball and groove plate. However, this will require a change in its geometry, as silicon nitride is not flexible and will not be snapped in like PCTFE. Figure 18B shows how this can be accomplished by constructing one or two pieces of positioning rings 540A and 540B, and locking the two pieces together with a locking pin 542A. The locking pin can be made of a flexible material like PTFE or PCTFE. Their ceramic balls are shown at 541. The other configuration is the Shixi ball bearings and smaller isolated balls arranged staggered in a grooveless plate. These isolation balls are also silicon nitride. They can act as spacers without load, and they can rotate in opposite directions to the bearing balls. Another potential bearing material is samarium oxide or stainless steel coated with diamonds, such as coatings (DLC) supplied by Timkin Branch, Mineral Precision Bearing, of similar companies in Keen, New Hampshire. Both the groove plate and the ball are DLC-coated. Its liner can also be hafnium oxide. Their tests show that this bearing will exhibit extremely low friction in an F 2 atmosphere; therefore, the operation of these bearings without lubricants will be feasible. Magnetic bearings In their preferred embodiments, some magnetic bearings may be provided to avoid that the bearings will limit the useful life of their discharge cells and / or allow higher speed operation. Descriptions of their magnetic bearing systems are described in U.S. Patent No. 6,104,735, which is incorporated herein by reference. In another preferred embodiment, the paper size of the fans and the main heat exchanger is in accordance with Chinese National Standard (CNS) A4 (210X297 mm) 25 (Please read the precautions on the back before filling this page) • Order ·: Line · 573389 A7 _B7_ V. Description of the Invention (23), which has been removed from its discharge chamber, and its gas circulation, is provided by high-pressure injection of a circulating gas flow of about 10 to 20%. This configuration is depicted in Figure 25. Figure 25 shows a cross-section of a discharge cell formed by two cylinders which essentially consist of 70 cm long cylinders. Its outer cylinder has a diameter of about 30 cm, and its inner cylinder has a diameter of about 20 cm. These electrode systems are located at 604 as shown, and they have traditionally had a pitch of about 1.7 cm and a length of about 50 cm. The inner cylinder 602 can pass through a nozzle-type slit 606 to provide an exhaust forced ventilation room required for a gas flow of about 10 to 20%. This 10 to 20% air flow exits from one or both ends of its cylinder 602 to its gas pump 608, where it is pumped through its water-cooled heat exchanger 610 and forced to its inlet The ventilating chamber 612 is formed by a third cylinder, also approximately 70 cm long, and a plate welded to its outer cylinder 600. The gas system enters one or both ends of its forced ventilation chamber 612, and is injected into its circulating gas flow path through a slit-type nozzle 614. The gas pressure between its two cylinders is at an average pressure of about 3 atmospheres, and its gas pump 608, preferably a centrifugal blower, so that its size can establish a sufficient pressure difference to ensure that between these electrodes, Have a proper flow rate to achieve the desired discharge repetition rate in the range of 6,000 Hz to 10,000 Hz or more. All parts of the flow circuit that are exposed to laser gas are preferably made of some fluorine gas-phase capacitive materials. In their preferred embodiment, the drive required for their blower 608 is a brushless DC motor with a sealed rotor, which is similar to that described above and shown in Figure 18 to drive a tangential fan The motors 530 and 532 are similar. One-way laser gas flow 26 (Please read the precautions on the back before filling this page) This paper size applies to Chinese National Standard (CNS) A4 (210X297 mm) 573389 A7 V. Description of the invention (24) Another between the electrodes The technology that provides higher flow speeds is to provide a one-way laser gas flow. In these embodiments, the blower is also separated from its laser discharge chamber, but all the airflow passing through the electrode is led from its discharge chamber 62o to its blower unit 622. This type of system is shown in Fig. 26. The heat exchanger can be a separate unit, or it can be installed in its discharge chamber, or in the same container as its blower unit in other embodiments. As mentioned above, the motor driver required for its blower preferably includes a sealed rotor. The blower may also be a turbine-driven blower similar to that described in U.S. Patent No. 5,471,965 (incorporated by reference herein). In this case, a magnetic coupling can be used to isolate the turbine drive from its fluorine-containing laser gas. This drive will require an electric high-pressure hydraulic fluid pump. Its blower unit and heat exchanger, together with its discharge chamber, can be housed in a laser enclosure, or they can be housed in a separate enclosure, or even in a separate room within the manufacturing plant. For this embodiment, it is provided with some appropriate ducts and / or blades, so that the laser gas flow can follow the length of the 20 mm X 50 mm space between the electrodes 541A and 541B, etc. Allotment. Its blower 622 and heat exchanger, plus the above-mentioned ducts and blades, are designed using some well-known technologies to provide a gas flow rate of up to about 90 to 100 m / s, so that these electrodes pass And "⑶ discharge area. All parts of its flow path must also be made of fluorine-compatible materials. The drive required for its blower 622 may be an electric motor, or it may be a water turbine such as the drive described in U.S. Patent No. 5,471,965. This paper size applies to China National Standard (CNS) A4 (210X297)

--------------------- # —— .- ·-♦-(Please read the notes on the back before filling this page) -Order -----

573389 A7

V. Description of the invention (25) Requirements for fast response of pulse wave power from 6.000 Hz to 10,000 Hz. The operation of the laser system according to the present invention will require precise control between 6,000 Hz and 10, A potential in the range of approximately 12.000 V to 30,000 V is applied to the electrodes at a repetition rate in the range of 1000 Hz (that is, at time intervals as short as about ΙΟΟμsec). As instructed by Ichiro in the background of the invention, in the pre-existing technology pulse wave power system, a charging capacitor bank is used to charge to a precisely predetermined control voltage, and its discharge is caused by closing a solid-state switch. The energy stored on the above-mentioned charging capacitor is circulated through a compression-amplification circuit to generate the potential that it desires across the electrodes. The time between the closing of the switch and the completion of its discharge is only a few microseconds (that is, about 5 microseconds), but the charge of C0 in the prior art system requires a length longer than 100 microseconds. Many time intervals. It is possible to reduce the charging time by using a larger power supply or several parallel power supplies. For example, our applicant uses a multi-parallel pre-existing technology power supply, which can operate at 100,000 HZ. Increasing the voltage on its power supply can also shorten its charging time. In this preferred embodiment, as shown in FIG. 5, as far as the pulse power system part of the solid-state switch is concerned, our applicant uses the same pre-existing technology as shown in FIG. Basic design, but our applicant charges C0, using a completely different technology. Resonant Charging Our applicants utilize two types of resonant charging systems for extremely fast charging. These systems are described by referring to Figures 6A and 6B. 28 (Please read the notes on the back before filling out this page.). Mark |: Line _ This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 (Mm) 573389 A7 B7 V. Description of the invention (26). The first resonance charger (please read the precautions on the back before filling out this page)-order-: line 丨 a circuit that can show this preferred embodiment, is Shown in Figure 6A. In this case, a standard DC power supply 200 with a 400 or 460 VDC / 90 amp input and 1200 VDC amp output is used. This power supply is a Adjustable DC power supply of about 600 volts to 1200 volts. This power supply is directly connected to C_1, which eliminates the need for voltage feedback to this power supply. When this power supply is enabled, It will be turned on 'and a fixed voltage is adjusted on its C-1 capacitor. The performance of this system is somewhat independent of the voltage regulation rate on its C-1'. Therefore, in this power supply, only The most basic control loop is required. The power supply 'can add the energy to this system at the voltage above C-1, once it drops below its voltage setting value. This will allow the power supply to be fully charged between the start of the laser pulse. During the time (and during the laser pulse period), the energy transferred from Cd to c0 is supplemented. This can further reduce the peak current requirements of its power supply compared to its pre-existing art pulse system. The need for a power supply with the most basic control loop, and minimizing the peak current rating of this power supply, combined with the average power requirements of its system, will reduce the cost of its power supply to a 50 % Estimated value. In addition, this better design can provide manufacturers with additional flexibility 'because fixed current, fixed output voltage power supplies can be easily purchased from multiple sources. These power supplies can be purchased from some Similar to suppliers such as Elgar, UniversalVoltronics, Kaiser, and EMI, etc. Control panel This paper size is suitable for financial and family care standards (Ca> Ege χ297 Male 573389 A7 _B7_ V. Description of the invention (27) The power supply will continuously charge a 1033 // F capacitor 202 to the voltage level commanded by the control panel 204. The control panel 204 can also command its IGBT control panel switch 206 to be turned on and off. In order to transfer energy from capacitor 202 to capacitor 42. Its control panel inductor 208 can cooperate with these capacitors 202 and 42 to establish its transfer time constant, the control panel and the inductance value that can limit its peak charging sensor. It has been reduced from 140 microhenry for the control panel used above 4,000 Hz to 48 microhenry to achieve the extremely fast charging of its C0 capacitor 42 (small control panel at 100 // s). The control panel 204 can receive a voltage feedback signal 212 that is proportional to the voltage on the control panel surface of its capacitor 42, and a current feedback signal 214 that is proportional to the current control panel flowing through its inductor 208. Based on the two feedback signals, the control panel 204 can calculate the voltage of the control panel on its capacitor 202 once the IGBT switch 206 is turned off at this moment. Therefore, a command voltage 210 is fed into the control panel 204, and the controllable control panel can accurately calculate the energy stored in its capacitor 42 and inductor 208, and compare it with the required control panel charging command voltage 210. This control panel 204 can determine a correct time for turning off its IGBT switch 206 during the charging cycle of its control panel by a calculation. System accuracy After the IGBT switch 206 is turned off, the amount of control panel stored in the magnetic field of its inductor 208 will be transferred to its capacitance control panel via its free-wheeling diode path 215器 42。 42. The accuracy of this instant energy calculation determines the amount of flicker jitter modulation spectrum that will exist on the control panel surface of the final voltage of its capacitor 42. Due to the extremely high charging rate of this system, the paper size is in accordance with the Chinese National Standard (CNS) A4 specification (210X297 mm) 30 (Please read the precautions on the back before filling this page)… installation 丨

573389 A7 _B7_ V. Description of the Invention (28) The control panel may have too many trembling tunings, which meets the needs of a system regulation rate control panel that expects ± 0.05%. If so, an additional electronic circuit can be utilized, such as a Q-removing circuit, or a power-distribution step-down circuit, as discussed in the control panel below. Second resonant charger A second resonant charger is shown in Figure 6B. This circuit is similar to that shown in Figure 6A. Its main circuit components are: II-a three-phase power supply 300 with a fixed DC current output; C-1-a power capacitor 302, whose order of magnitude is equal to or greater than its original C0 capacitor 42;

Ql, Q2, and Q3- switches that can control the current flow related to charging and can maintain a regulated voltage above C0; D1, D2, and D3- can make the current flow in one direction; R1, and R2- The voltage can be fed back to its control electronic circuit; R3- can allow the voltage on C0 to be discharged quickly in the event of a small overcharge; L1- a resonance between C-1 capacitor 302 and C0 capacitor bank 42 The inductor can limit the flow of current and the timing of establishing charge transfer. Control panel 304- based on some circuit feedback parameters to command Q1, Q2, and Q3 to open and close. An example of its operation is as follows: The difference between the circuit in Figure 6B and that in Figure 6A is the addition of a switch Q2 and a diode D3, which is named a Q switch. This switch can be adapted to the Chinese National Standard (CNS) A4 specification (210X297 mm) at its resonant charging paper size 31 (Please read the precautions on the back before filling this page) Order 丨 丨! Line 丨 573389 A7 ---- ------ B7 V. Send (29) — ^ ^ (Please read the precautions on the back before filling this page) During the power, allow its control unit to short its inductor, And improve the regulation of this circuit. This "de-Q" function prevents the extra energy stored in the current of its charging inductor from being transferred to its capacitor C0. Before a laser pulse is needed, the voltage on its C-1 is charged to 600-800 volts and their switches Q1_Q3 are turned off. Upon command from its laser, Q1 will close. At this moment, the current will flow from C-1 to C0 via the charging inductor L1. As discussed in the previous section, one of the calculators on the control panel will evaluate the voltage on its C0 and the current flowing in its l1 relative to a command voltage set point from the laser. When the voltage above it plus the effective amount stored in its inductor L1 is equal to its desired command voltage, Q1 will be open. Its calculation formula is:

Vf = [Vc〇s2H (U · Ilis2) / C〇)] 0 * 5 where,

Vf = voltage above C0 after Q1 turns off and the current in it becomes zero.

Ilis = The current that flows through when Q1 is turned off. After Q1 is turned off, the energy stored in L1 will begin to be transferred to the CGs through 〇2, until the voltage above the C0 is approximately equal to the above The command voltage is reached. At this moment, Q2 will be closed, and the current will stop flowing to C0, and will be led through D3. In addition to this "go to Q" circuit, it comes from Q3 and R3 can allow other fine adjustments to the voltage above C0. The switch Q3 of its power-dissipation step-down circuit 216 will be closed by the instruction of its control panel when the current flowing through the inductor L1 stops. , And its paper size applies Chinese National Standard (CNS) A4 specification (210X297 mm) _ 32-573389 A7 1 ------------ V. Description of invention (30) -

The voltage on Co will be divided to reduce the voltage to its desired control voltage, and then its switch Q3 will be turned off. The time constants of the capacitors c0 and ㈣ should be sufficiently fast so as to reduce the voltage of the capacitor Co to the command voltage under a total charge cycle with no detectable amount. As a result, its resonance charger 'can be configured as a three-level regulation control. Its slightly rough adjustment is provided by its energy calculator and its switch-like disconnection during the electrical cycle. When the voltage above it is close to its mesh titanium value, the above q switch will be closed, and when the voltage above its C0 is at or slightly higher than its target value, its resonance charging is stopped. In a preferred embodiment, its switch Q 1 and q open relationship are used to provide an adjustment effect of accuracy +/- 0 · 1/0. If additional adjustments are required, a third type of voltage regulation control can be used. This is the switch-off circuit of the switch ⑴ and 叫 (shown at 216 in the figure), which can discharge q to its precise target value. C. Downstream improvement As mentioned above, the preferred embodiment of the pulse wave power system of the present invention, as shown in FIG. 5A, uses the same as that used in the pre-existing technology system described in FIG. 3. basic design. However, in this basic design, some important improvements need to be made to increase the thermal load by a factor of approximately 6 in response to its greatly increased repetition rate. These improvements are described below. Detailed description of the rectifier and compression head The main components of the rectifier 40 and compression head 60 are shown in Figure 3 and discussed in the background section of the invention regarding the operation of this system. In this note, I will explain the manufacturing details of these rectifiers and compression heads. 0 33 (Please read the precautions on the back before filling out this page) This paper size applies to China National Standard (CNS) A4 (210X297 mm) 573389 A7 B7 V. Description of the Invention (31) Solid State Switch The solid state switch 46 is a P / N CM 800 HA-34H IGBT switch supplied by Powerex, a company located in Youngwood, Pennsylvania. In a preferred embodiment, two such switches are used in parallel. Inductors Inductors 48, 54, and 64 are saturable inductors similar to the prior art systems described in U.S. Patent Nos. 5,448,580 and 5,315,611. Figure 7 shows a preferred design L0 inductor 48. In this inductor, there are four conductors from two IGBT switches 46B, which pass through sixteen ceramic ferromagnetic rings 49 to form an 8-inch hollow cylindrical part with a very high permeability material 48A So that its inner diameter is approximately 1 inch and its outer diameter is approximately 1.5 inches. Each of the four conductors is then wound two times' around an insulating toroidal core to form its part 48B. These four conductors' are then connected to a board which is connected to the high voltage side of its Ci capacitor bank 52. A preferred sketch of one of its saturable inductors 54 is shown in FIG. In this case, its inductor is a single-turn geometry, and here its top and bottom covers 541 and 542 and the central mandrel 543 are all under high voltage, forming one through five Single resistance of inductor core. Its case 545 is at ground potential. Its five magnetic cores are made of 50-50% Ni-Fe alloy wrapped with 0.0005 ’, supplied by Magnetics, Butler, PA or National Arnold, Adelanto, CA. The heat sink 'on the inductor case will help conduct the heat dissipated inside it for forced ventilation cooling. In addition, there is a ceramic disc-shaped sheet. The paper size is applicable to the Chinese national standard (° ^) A4 size (210X297 mm) 34 (Please read the precautions on the back before filling in this page)., OK | 丨! Line 丨 573389 A7 __—__ B7_ V. Description of the Invention (32) (not shown) 'is installed under the bottom cover of its reactor to assist the heat from the central section of this group to the module frame Floor. Figure 8 also shows a high-voltage lead connected to one of its capacitors in the C1 capacitor bank 52 and to one of its inductor units in the 1:25 boost pulse transformer 56. The casing 545 is connected to the ground lead of the above unit 56. A top view and a sectional view of the saturable inductor 64 are shown in Figs. 9A and 9B, respectively. In the inductor of this embodiment, as shown in FIG. 9B, some magnetic flux repellent metal blocks 301, 302, 303, and 304 'are added to reduce the leakage magnetic flux in the inductor. These magnetic flux repellent metal blocks' can greatly reduce the area through which their magnetic flux can penetrate, and thus help to minimize the saturation inductance of their inductors. The current flows around its magnetic core 307, and passes through the vertical conductor rods in the inductor body to become five circuits. Its current enters from 305, and as shown in Fig. 9A, it goes down along a large-diameter conductor in the center marked "1", and along it also marked "丨", the six upper parts on the periphery The small conductor goes up. This current will then flow down into the two conductors marked 2 on its inner side, and then up into the six conductors marked 2 on its outer side. 'Then it flows upwards into the six conductors marked 3 on its outer side, then flows down into the two conductors marked 3 on its inner side, then flows upwards into the six conductors marked 4 on its outer side, and then flows down The inside of the conductor is marked with 4. The magnetic flux-rejecting metal block assembly is kept at half its full pulse voltage across the conductors to allow the magnetic flux-rejecting metal block parts and other turns to be reduced. Keep a safe distance between metal rods. Its magnetic core 307 is made of three coils 307A, B and C, and it is Butler, Penn. This paper size applies to Chinese National Standard (CNS) A4 (210X297 mm) 35 (Please read the precautions on the back before filling this page) · _ · Installation — •, OK |: Thread 573389 A7 ___B7_ V. Description of Invention (33) Magnetics, Inc. of the city or National Arnold of Adelanto, California One of 0.0005 "thick magnetic permeability tapes wrapped with 80-20% Ni-Fe alloy. Readers should pay attention to nanocrystals such as VITROPERMTM supplied by VACUUM SCHITELZE GmbH in Germany and FINEMETTM supplied by Hitachi Metals in Japan. Materials can be used as their inductors 54 and 64. In their pre-existing pulse-type power systems, oil leakage from their electrical components is a potential problem. In this preferred embodiment, Their oil-insulated components are limited to their saturable inductors. In addition, their saturable inductors 64 as shown in Figure 9B are housed in a can-type oil-containing housing, all of which are sealed The connections are all above its oil level to substantially eliminate the possibility of oil leakage. For example, the lowest seal in its inductor 64 is shown at 308 in Figure 9B. Because of its normal oil Face tied Under the top cover of its case 306, it is almost impossible for its oil to leak out of the group, as long as its case can be kept in an upright position. 62 and 82 (that is, CO, C1, Cp-1, and Cp) are all composed of banks of spot products connected in parallel. The capacitors 42 and 52 are some companies in North Carolina. Film capacitors from suppliers such as Tetsville or Vishay Roederstein of Weimar, Germany. Our applicant's preferred method of connecting capacitors and inductors is to solder them to positive and negative terminals on some specific printed circuit boards, the latter of which are copper leads coated with a thick nickel layer, in a manner similar to US patent numbers The paper size of No. 5,448,580 applies to the Chinese national standard (CNS) A4 specification (210X297 mm) 36 (Please read the precautions on the back before filling this page)-! 装-. 、 可 | V. Description of the invention (34 ) Explainer. The four power valley device groups 62 and 64 are typically composed of parallel arrays of high-voltage ceramic capacitors from manufacturers such as Murata or TDK, both of which are in Japan. In a preferred embodiment used for this ArF laser, the capacitor bank 82 (ie, Cp) is composed of thirty-three 0.3 · ηρ capacitor banks to obtain a 9.9 nF Cp-1 is composed of 24 banks of 0.40 nF capacitors to obtain a total capacitance of 9.6 nF; C1 is a bank of 5.7 / F capacitors, and c. It is a capacitor bank of 5.3. Pulse Transformer This pulse transformer 56 is similar to the pulse transformer described in US Patent Nos. 5,448,580 and 5,313,481; however, the pulse transformer of this embodiment has only one single turn and 24 secondary windings. The inductance unit is equivalent to 1/24 of a single primary turn related to a 1:24 equivalent boost ratio. The drawing of this pulse wave transformer 56 is shown in FIG. 10. Each of the 24 inductor units includes an aluminum spool 568, which has two flanges (each with a flat edge and some patterned bolt holes), and they are not attached as shown in Figure 10. The bottom edge is bolted to the positive and negative terminals of the printed circuit board 56B (the negative terminals are the high-voltage terminals of the twenty-four primary windings). These insulators 56C allow the positive terminal of each spool to be separated from the negative terminal of an adjacent spool. Between the flanges of its spools, a long inch hollow cylinder is attached, with an outer diameter of 0.875 inches and a wall thickness of about 1/32 inches. The spool is wound with a 1-inch-thick MetglasTM 2605 S3A and a 0.1-mil Mylar (polyester) film until the outer diameter of the insulating MetglasTM coating reaches 2.24. Inches. One forms a primary winding 573389 A7 B7 V. A perspective view of a single covered spool of the invention description (35) is shown in Figure 10A. The secondary of the transformer is a single-time outer diameter stainless steel rod installed in a tight-fitting PTFE (TeflonR) insulation tube. This winding is shown in Figure 10 as four segments. The low-voltage end of the stainless steel secondary as shown at 56D in Fig. 10 is connected to the primary HV lead at 56E above its printed circuit board 56B, and its high-voltage terminal is shown at 56F. As a result, the transformer appears as an autotransformer configuration and its boost ratio becomes 1:25 instead of 1:24. Therefore, a pulse of approximately -1400 volts between the + and-terminals of these inductor units will produce a pulse of approximately -3 5,000 volts at terminal 56F above the secondary side. This single-turn secondary winding design provides extremely low leakage inductance while allowing extremely fast output rise times. Details of the electrical components of the laser discharge chamber. The Cp capacitor 82 capacitor is composed of thirty-three 0.3nf capacitors installed on the top of the pressure vessel of the discharge chamber. These electrodes are about 28 inches long, and they are about 0.5 to 1.0 inches apart. Some preferred electrode systems are described below. In this embodiment, the top electrode is referred to as the cathode, and the bottom electrode is connected to the ground as shown in FIG. 5, and is referred to as the anode. The preferred gap interval for KrF is 16.5 mm. (The preferred gap interval for ArF is 13.5 mm). Some preferred electrodes will be described below. In this embodiment, the top electrode is called the cathode, and the bottom electrode is connected to the ground, as shown in Figure 5, and the anode is called the anode. The inductor labeled Lp in Figure 5 is referred to by our applicant as the "compression head inductor". This inductor indicates the wiring between its Cp and cathode 84, its discharge area, and its anode and Cp. A paper size similar to the one in Figure 13A (1) applies the Chinese National Standard (CNS) A4 specification (210X297 mm) 38 (Please read the precautions on the back before filling this page) 丨 _ 装 丨

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573389 A7 B7 V. Description of the invention (36) —-* The inductance of the circuit formed by the wiring formed by the current loop structure shown at 548. The water cooling of the components is a large heat load. In addition to the normal ventilation cooling provided by the cooling fan provided inside the laser casing, their pulse power components are also provided with water cooling to support Operation in this higher average power mode. One disadvantage of water cooling has traditionally been the possibility of leakage near its electrical components or high-voltage wiring. This particular embodiment substantially avoids this potential problem by using a single homogenous segment of cooling tubes to route it in a module, thereby cooling these normally dissipated most of the deposits in the mold. Thermal components within a group. Because there are no seams or joints inside the module enclosure, and its cooling pipe is a continuous piece of integral metal (such as copper, stainless steel, etc.), the chance of leakage in the module is greatly reduced. . The connection between the module and the cooling water is completed outside the metal plate shell of the assembly. Here, the detailed description of the cooling pipe system and a quick-disconnect type connector with rectifier is as described above in Figure 4B. In the case of the rectifier module 18 shown in the figure, a water-cooled saturable inductor 54A is set as shown in FIG. N, similar to the inductor 54 shown in FIG. 8 except that it is different from this. The heat sink of the inductor 54 is replaced by a water-cooled bushing 54 1 as shown in FIG. 11. Its cooling line 54A2 is wired in its module, and surrounds its sleeve 54A1, and passes through the engraved baseplate on which these IGBT switches and series diodes are installed. These three components constitute the majority of the power consumption paper in the module. The paper size applies to the Chinese National Standard (CNS) A4 specification (210X297 mm) 39 (Please read the precautions on the back before filling out this page). SUMMARY OF THE INVENTION (37) Consumption. Other items that dissipate heat (buffer diodes and resistors, capacitors, etc.) are cooled by forced ventilation provided by two fans in the back of the module. Because its sleeve 54A1 is kept at the ground potential, its cooling pipe is directly connected to its reactor casing, and there is no problem of voltage isolation. This is accomplished by making its cooling tube, as shown at 54A3, press fit into the dovetail groove cut into the outside of its casing, and using a thermally conductive compound to assist its cooling tube and casing, which can have a good Thermal contact. Although the cooling of high-voltage components is based on the IGBT floating connection π under high voltage, they are installed on a engraved base plate, and a 1 / 16-inch thick aluminum oxide plate is electrically isolated from the switches. . This base plate has the function of a heat sink, and it operates below the ground potential, and is easily cooled, because high voltage isolation is not required in its cooling circuit. A drawing of a water-cooled aluminum base plate is shown in Figure 7A. In this case, the cooling tube is pressed into a groove in an aluminum base plate on which the IGBT is mounted. Regarding the inductor 54A, a thermally conductive compound is used to improve the overall joint between the pipe and the base plate. These series diodes are also “floating” at high potential during normal operation. In this case, the two-pole outer case typically used in its design does not provide high voltage isolation. To provide this necessary insulation, a polar ice hockey assembly is clamped in a heat sink assembly, which is mounted on top of a ceramic base plate, which is mounted on its water-cooled aluminum The top of the bottom plate. This ceramic base plate is just thick enough

573389 A7 ______B7 V. Description of the invention (38) Provide the necessary electrical isolation, but it will not be too thick and cause more than necessary thermal impedance. Regarding this particular design, the ceramic is 1/16 ”thick alumina, although other materials that are more exotic like creped oxide can also be used to further reduce the heat between the diode junction and the cooling water. Impedance. The second embodiment of a water-cooled rectifier uses a single cooling plate assembly that is connected to the chassis base plate required for the IGBTs and diodes. The cooling plate can be made by a single piece of nickel Copper rods are manufactured to two aluminum "top," and "bottom," plates. As noted above, the IG] BT and diodes are designed by using the previously mentioned The ceramic discs under the assembly are used to conduct their heat into the cooling plate. In a preferred embodiment of the present invention, the cooling method of the cooling plate is also used to cool the resonance charger. IGBT and a pole body. A heat conduction rod or heat pipe can also be used to conduct heat from the outer shell to its casing plate. Detailed description of the compression head Water-cooled compression head (see the components of the compression head in Figure 5) Electrical design is similar to air cooling of a pre-existing technology (The same type of ceramic capacitors are used, and similar materials are used in the design of saturable inductor materials.) The basic difference in this case is that this group must operate at a higher repetition rate. And therefore at a higher average power. In the case of this compression head module, most of its heat is dissipated in its modified saturable inductor 64A. Cooling this group is not a simple event Because its entire casing is operated by short pulses of extremely high voltage. The solution to this problem, as shown in Figures 12, 12, and ⑽, is that the casing is connected to the ground potential on the inductor. Isolation. This paper size applies to Zhongguanjia Standard (CNS) A4 specification (210X297 public magic 41 (Please read the precautions on the back before filling this page)

You can wire 573389 A7 __B7_ V. Description of the invention (39) The inductor is set by winding its cooling tube so as to surround the two cylindrical shapes that contain a certain ferromagnetic core. The input and output cooling lines are both coiled around a ceramic ferromagnetic core formed by two cylindrical portions and two ceramic ferromagnetic blocks as shown in Figures 12, 12A, and 12B. These ceramic ferromagnetic parts are made of CN-20 materials manufactured by Magnetics Corporation of Fairfield, New Jersey. A single copper tube (0.187 "in diameter) is press-fitted and wound around a winding profile, surrounding the 64A1 case of its inductor 64A, and surrounding its secondary winding profile. Tethered at these ends It has sufficient length to extend through the fittings in the gold cover of its compression head plate, so that there is no cooling pipe joint in its base. Its inductor 64 A series includes an ant tail groove as shown at 64 A2, It is similar to the user of the first-stage reactor shell of the water-cooled rectifier mentioned above. This shell is very similar to the previous air-cooled type, except that this dovetail groove is different. Its copper cooling water pipe, pressure It fits into this groove, so that there is a good thermal connection between its shell and the cooling water pipe. In order to minimize its thermal resistance, a thermally conductive compound is also added. The electrical design of its inductor 64A is related to the 9A and The 64 shown in 9B is slightly changed. This inductor 64A is provided with only two loops (instead of five loops) around its magnetic core 64A3, which is composed of four loops of tape (instead of three). by As a result of the conduction path from the output potential to the grounded water-cooled pipe, its bias current circuit will now be slightly different from that shown in Figure 5. As above, its bias current is determined by the voltage in a rectifier. One dc-dc This paper size is applicable to Chinese National Standard (CNS) A4 specification (210X297 mm) 42 (Please read the precautions on the back before filling this page)

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573389 A7 ~~ ------ __ 5. Description of the invention (40) The converter is supplied into its compression head via a cable. This current will flow through its "positive '' bias inductor" 2 and be connected to its Cp lt voltage node. This current is then split and a portion of it is returned to its rectifier via its Hv cable (passing through its transformer secondary to ground and back to its dc_dc converter). The other part will pass through its compression head reactor. 〖(Bias its magnetic control switch), and then pass through its cooling water pipe "negatively, bias the inductor LB3, and return to the ground and its dc_dc converter. By balancing each of the branches The resistor whose designer will be able to ensure that it has sufficient bias current to supply both its compression head reactor and rectifier transformer. Its "positive" bias inductor, Lm, is its "negative," bias inductor. The device ίΒ3 is very similar. In this case, the same ceramic ferromagnetic rods and components are used as a magnetic core. However, there are two 0.125π-thick plastic spacers that are used to create a gap in their magnetic circuit so that their cores will not be saturated by the current. Instead of winding its inductor with a cooling water pipe, an 18 AWG Teflon wire is wrapped around its shape. Quick connection In this preferred embodiment, there are three pulse wave power electrical modules, which are sealed with electrical connectors, so that all electrical connections to the laser system in this part are made by sliding this module only Its positioning into the laser case can be done. Among them are AC power distribution modules, power supply modules, and resonant charging modules. In each case, a male or female plug on the module can be mated with a heterosexual plug mounted on the back of the case. In each case, two vertebral pins about 3 inches long on the module can guide the module into its precise position so that these electrical plugs can fit properly. The 43 (Please read the precautions on the back before filling this page): Line · This paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) 573389 A7 __B7_ 5. Description of the invention (Μ) and other similar AMP models 194242 -1 and other sealing mating connectors are listed by the company at AMP Inc. in Harrisburg, Pennsylvania. In this embodiment, their connectors can be used in a variety of power circuits, such as 208 volt AC, 400 volt AC, 1000 volt DC (power supply output and resonant charging input), and several signal voltages. These seals, coupled with the connectors, allow these modules to be removed in seconds or minutes for repair and replacement. In this embodiment, their sealing and mating connectors are not used for their rectifier modules because the output voltage of this module is in the range of 20 to 30,000 volts. Instead, a typical high voltage connector is used. Feed to the cathode (technology related to increasing inductance) As indicated in Figure 5 and explained above, its peak capacitor bank Cp, 82 is composed of 33 banks of 0.3 nF capacitors. The bottom of these capacitors is connected to the ground (i.e., the head of the discharge cell), and the top is connected to a metal plate called a corona shield. This corona shield is connected to its cathode with 15 metal rods, which are called downflow rods, which pass through a single piece of main insulator and are screwed into the cathode shown in Figure 13A Inside the top of 541. This one-piece insulation system is described in U.S. Patent No. 6,208,674, which is incorporated herein by reference. In some cases, it is desirable to increase its inductance in the high voltage portion of its pulsed power circuit. Such an increase would result in an increase in the laser pulse width. Our applicants have decided that a better way to generate this increased inductance is to set short (for example, about 1% inches) rods and capacitors to which each capacitor in the CP capacitor bank is connected. Go down to the corona plate. Therefore, the paper size applies the Chinese National Standard (CNS) Α4 specification (210X297 mm) 44 (Please read the precautions on the back before filling this page)

573389 A7 ----- One __B7_ V. Invention Day 7 ^ 42) One '" " ~ — Can increase the length of the electrical path between CP and cathode, and can greatly increase the inductance in this part of the circuit . The increase in the inductance can be modified by selecting the length of these rods. Another technique to increase inductance is to remove the current loop ribs shown in Fig. 13A (3) and / or some of the 15 downflow bars that connect the corona shield to the cathode. Removing some downflow rods at each end of its cathode has another advantage of about 3.5 mm. Discharge Modules Figures 13 and 13 A (l) show details of an improved discharge configuration utilized in a preferred embodiment of the present invention. This configuration includes an electrode configuration that our applicants call one of the blade-dielectric electrodes. In this design, its anode 54 includes a blunt blade-shaped electrode 542, and as shown on both sides of its anode, some dielectric spacers 544 are installed to improve the gas flow in its discharge area. These spacers are screwed to their anode support rods 546 so that the screws at each end of the spacers exceed their discharge area. These screws allow thermal expansion and sliding between the spacers and the support rod. Its anode is 26.4 inches long and 0.439 inches high. The bottom is 284 inches wide, and the width at the top is selected to roughly determine its desired discharge width. For this embodiment of 10,000 Hz, the width is approximately 0 to 5 mm. It is attached to its airflow shaping anode support rod 546 by passing a screw through the socket, which allows differential thermal expansion of its electrode from its center position. The anode is made of a copper-based alloy, preferably C360000, C95400, or C19400 '. The cathode 541 has a cross-sectional shape as shown in FIG. A preferred cathode material is C360000. Additional details of the dielectric configuration of this blade are provided in US Patent No. 09 / 768,753. The paper size applies to the Chinese National Standard (CNS) A4 (210X297). 45

.Order 丨: Line 丨 (Please read the notes on the back before filling this page)… install-573389 A7 ----------- B7 —_ V. Invention System (43) " --- ---- It is incorporated into this manual by reference. The current loop 548 in this configuration is composed of a whale-shaped portion and has 27 equally spaced ribs along the length of the electrode 542 ', and its cross section is shown in the figure M⑴. As mentioned above, its current loop is made from a metal sheet, and its red bone-shaped ribs (each with a cross-sectional dimension of about 0.5 to χ 〇009) are twisted so that -The long dimension of the ribs, shown in Figure 13A2 in the direction of its current flow, shows that its anode is one of the other types of dielectric spacer designs that can be further improved. In this case, the separators and their air-shaping anode support rods are more fully matched, thereby providing—a better gas flow path. We call this their "tight back" blade dielectric negative anode design. Insulator Covered Electrode A preferred electrode configuration is shown in Figure 13B. In this case, both the cathode 541C and the anode 542C are made of brass. Some or all of the surfaces of these electrodes are coated with alumina layers 600 and 602 up to about 125 microns thick. This alumina is preferably applied to its surface by a plasma spraying technique. There are a large number of holes 604 and 606, drilled through this alumina, and as shown at 604 and 606 in Figure 13B, to its brass substrate. The diameter of these holes on both the cathode and anode is preferably between 50 microns and 200 microns. A preferred size is about 100 microns. These holes can be drilled with an excimer laser. Our applicant will suggest a pore density of about 10 holes per square millimeter for an area of about 5-10% of the exposed area. Such electrodes are not expected to provide extremely long life electrodes. It can also allow this paper size to apply Chinese National Standard (CNS) A4 specifications (210X297 public directors)

! -Pack-,? Τ— cable 丨 (Please read the precautions on the back before filling this page) 573389 A7 B7 ~~ 丨 ._ 5. Description of the invention (44) Control the width of the discharge accurately. Its corrosion rate is reduced by several orders of magnitude, because its discharge surface is largely protected by its alumina cover, which is free from the attack of fluorine gas. Corrosion of the cathode due to sputtering can also be greatly reduced, because its cathode configuration can provide the effect of a hollow cathode, in which the sputtered metal ions will recombine with the brass matrix in their pores instead of forming Some metal fluorides. Ultra-fast wavelength meter with fast control algorithm controls pulse energy, wavelength, and bandwidth. Pre-existing state-of-the-art excimer lasers used in integrated circuit lithography are strictly regulated in terms of laser beam parameters. Restrictions. This typically requires measurement of the pulse energy, bandwidth, and center wavelength associated with each pulse, and feedback control of its pulse energy and bandwidth. In its pre-existing technical devices, the feedback control of its pulse wave energy is based on the condition of pulse wave to pulse wave, that is, the pulse wave energy of each pulse wave is measured quickly enough so that The completed data can be used in its control algorithm to control the energy of the pulse wave. For a 1,000 Hz system, this means the measurement and control of the next pulse, which must take less than 1/1000 second. For a 4.000 Hz system, their rates will need to be four times faster, and for a 10.000 Hz system, their rates will need to be 10 times faster. A technique that can be used to control its center wavelength and measure its wavelength and bandwidth is described in U.S. Patent No. 5,025,455 `` System, and Method of Regulating the Wavelength of a Light Beam '' ), And U.S. Patent No. 5,978,394 `` Wavelength and System for an Excimer Laser ”(excimer paper size applies to Chinese National Standard (CNS) A4 specification (210X297 public love) 47 (Please read the precautions on the back first) (Fill in this page again!)-Binding-Binding-573389 A7 B7 V. Description of the invention (45 laser-related wavelengths and systems). These patents are incorporated into this specification by reference. The wavelength and bandwidth are Each pulse is measured on a pulse-by-pulse basis, but the feedback control of its wavelength will typically take about 7 milliseconds, because the technology of the pre-existing technology to control the central wavelength uses milliseconds. It is faster Control is necessary. A preferred embodiment related to the rapid measurement and control of beam parameters. A preferred embodiment of the present invention is an excimer laser system. It can operate in the range of 4,000 Hz to 10,000 Hz, and can measure their laser beam parameters very quickly, and can control their pulse energy and center wavelength very quickly. Measurement and control of this laser-related beam parameters, The wavelength meter used in this example is similar to that described in U.S. Patent No. 5,978,394, and some of the following descriptions are extracted from the patent. Measuring beam parameters Figure 14 The layout of a preferred wavelength meter unit 12 (), an absolute wavelength reference correction unit 190, and a wavelength meter processor 197 is shown. The optical equipment in these units can measure pulse wave energy, wavelength, and bandwidth. This Isometry is used by their feedback circuits to maintain pulse energy and wavelengths within their desired limits. This device can be based on instructions from its laser system control processor by referring to an atomic reference source Self-calibration. As shown in Figure 14, part of the laser output beam and its anti-paper size apply Chinese National Standard (CNS) M specification (2K) X297 mm -48-( (Read the precautions on the back before filling in this page) ——Installation 丨: Line 丨 573389 A7 _B7_ V. Description of the invention (46) The mirror 170 intersects, which can pass about 95.5% of the beam energy into its output beam 33, and can reflect about 4.5% for pulse wave energy, wavelength, and bandwidth measurement. About 4% of the pulse wave energy reflected beam, will be reflected by its mirror 171 to its energy detector 172, The latter consists of a very fast light-emitting diode 69, which measures the energy of individual pulses occurring at pulse rates of 4,000 to 10,000 Hz per second. This pulse wave energy is about 7.5 mJ, and the output of its detector 69 is fed to a computer controller, which uses a specific algorithm to adjust its laser charging voltage based on the stored pulse The energy data is used to precisely control the pulse wave energy of their future pulse waves, thereby limiting the changes in the energy of individual pulse waves and the integrated energy of the pulse train. Linear Light Emitting Diode Array The photosensitive surface of linear light emitting diode array 180 is depicted in Figure 14A. The array is an integrated circuit chip, which includes 1024 independent light-emitting diode volume circuits, and an associated sample and hold readout circuit (not shown). These light-emitting diodes are spaced at a distance of 25.6 mm, so that the total length is 25.6 mm (about 1 inch). Each light-emitting diode system is 500 microns long. Such light-emitting diode arrays are supplied from several sources. A better supplier is Hamamatsu. In our preferred embodiment, we use the model S3903-1024Q, which can be read at a rate of 4 X 106 pixels / second based on the FIFO, of which all 1024 pixels are scanned , Can be read at a rate of 4,000 Hz or above. The PDA is designed for 2 paper sizes. It is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) 49 (Please read the precautions on the back before filling this page).

573389 V. Description of the invention (47 χίο 6 pixels / second operation, but our applicants found that it may speed up the clock signal and make the operation faster, that is, up to 4 X 106 pixels For pulse rates greater than 4,000 Hz, our applicants can use the same PDA, but usually only a portion (for example 60%) of the pixels are bought out per scan. Faster linearity For the operation of the 10,000 Hz array, the calculation of the wavelength and bandwidth has pulse wave-to-pulse data analysis available. At 5 χ 〇 06 pixels per second, above its 1024 pixel array, about Half of the pixels can be read between the pulses used to read the data for all the time of each pulse. One solution is to monitor the wavelength and bandwidth based on less than each pulse , Such as the mother-fourth pulse, or every second pulse. Another solution is to program the control of its wavelength meter so that only some selected pixels are read, which is based on Use a predictive algorithm that can use historical data to predict Location of the stripe data above. A more advantageous solution is to find a faster array. Our applicants have decided that a back-illuminated CCD array can be used to provide approximately 10 to 15 per second. X 10 pixel response time. A better array is the Model SXXX1002 supplied by the company's Hamamatsu in Tokyo, Japan. Another technology that can accelerate its wavelength analysis is to use a digital digit located at «ten places of its wavelength 彳§ No. processor 'and perform the calculation of the wavelength of the basin as described above. Approximately 4% of the coarse wavelength measurement passes through the mirror 171 and will be reflected by the mirror 173. (Please read the precautions on the back first Fill out this page again)

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573389 A7 ____ Β7_ V. Description of the invention (48) Through the slit 177, to the mirror 174, to the mirror 175, to the mirror 174, and to the middle step grating 176. This beam is collimated by a lens 178 with a focal length of 458.4 mm. The light waves reflected back from the grating 176 through the lens 178 will be reflected again from the mirrors 174, 175, and 174 again, and then reflected from the mirror 179, and will be focused as shown in the upper part of Figure 14B. In the area of pixels 600 to 950 (pixels 0-599 are reserved for fine-tuning wavelength measurement and bandwidth), the upper left side of the 1024 pixel linear light emitting diode array 180. The spatial position of the light beam above the light emitting diode array is a coarse adjustment measurement of the relative nominal wavelength of its output light beam. For example, as shown in Figure 14B, a light wave with a wavelength range around 193.350 pm will be focused on pixel 750 and its vicinity. Calculation of Coarse Tuning Wavelength The coarse tuning wavelength optics in its wavelength meter module 120 can produce a rectangular image of approximately 0.25 x 3 mm on the left side of the diode array 180. The eleven or eleven light-emitting diodes that are irradiated will produce some signals that are proportional to the intensity of their received illuminance (as shown in Figure 14C), and these signals will be controlled by their wavelength meter controller. Read and digitized by one of the processors. Using this information and an interpolation algorithm, its controller 197 can calculate the center position of the image. This position (measured in pixels) will be converted to a coarse wavelength value using two correction factors and assuming a linear relationship between position and wavelength. These correction factors are determined as described below by referring to an atomic wavelength reference source. For example, the relationship between the image position and the wavelength can be the following algorithm: This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) 51 (Please read the precautions on the back before filling this page )

573389 A7 _______B7_ V. Description of the invention (49) λ = (2.3pm / pixel) P + 191? 625 pm Among them, P = coarse adjustment of the center position of the image. Or you can add additional precision by adding a secondary term like '' + () p2 if you need to right. The measurement of the fine-tuning wavelength is shown in FIG. 14. About 95% of the light beam passing through the mirror 173 will be reflected away from the mirror 182, pass through the lens 183, and reach the astigmatism sheet at the input of an etalon assembly 184 (It is best to use the diffractive diffusing sheet as explained in the section entitled "Improved etalon" below.) The beam leaving the etalon assembly will be focused by a focal length of 458 within the etalon assembly. The 4 mm lens is focused and will produce some interference fringes on the middle and right side of its linear light emitting diode array 180 after reflecting off the two mirrors as shown in Figure 14. Its light splitting The meter must be able to measure its wavelength and bandwidth in real time. Because its laser repetition rate may be 4,000 Hz to 6,000 Hz, it is necessary to use some correct but not computationally intensive algorithms in order to be economical and compact. Process electronic circuits to achieve their desired performance. Therefore, their computational algorithms should preferably use integer math instead of floating point math, and their mathematical operations should be computationally efficient (do not use square root, sine ,logarithm Etc.) The specific details of the preferred algorithm used in this preferred embodiment_ will be explained. Figure 14D shows a curve with 5 peaks as shown, which represents its linear light emitting diode array One of the typical etalon stripe signals measured at 180. The height of its central peak is lower than that of the other. When it is not a standard paper standard _ A4 size __ 7 Gong Chu) " Π9 ~ *-(Please read first Note on the back, please fill out this page again) ', ^ Ti line 丨 573389 A7 B7 V. Description of the invention (when light waves with the same wavelength enter this etalon, the central peak will rise and fall' sometimes becomes Zero. This feature makes this central peak unsuitable for wavelength measurement. Other peaks will move toward or away from this central peak in response to changes in wavelength, so that the position of these peaks can be used to determine the wavelength, and they The width of the laser can measure the bandwidth of the laser. Figure 14D shows two areas marked as data windows. These data windows are positioned so that they are closest to the central peak of the stripe, which is usually used for analysis Yes. However When the wavelength changes so that the fringe moves too close to its central peak (which will cause distortion and errors), its first peak will be outside this window, but its second closest peak will be in this window And its software can control the processor in module 197 to use this second peak. Conversely, when the wavelength changes so that the current peak moves away from its central peak and out of the window, its software will jump To the internal fringes in its data window. These data windows are also depicted in Figure 14B. The fast calculation of the spectral value is based on the frequency of each pulse at a repetition rate in the range of up to 4,000 Hz to 6,000 Hz. For extremely fast calculations, a preferred embodiment uses the hardware indicated in Figure 15. This hardware system includes: a microprocessor 400, model MPC 823 supplied by the company's Motorola in Phoenix, Arizona;-a programmable logic device 402, supplied by the company's Altera in San Jose, California Model EP 6016QC240;-Executing program and data memory bank 404;-Special extremely fast RAM 406 that can temporarily store data of light emitting diode arrays in table form;-Third 4 X 1024 pixel RAM operating as a memory buffer Memory bank 408; and an analog digital conversion (please read the precautions on the back before filling this page)… install 丨 .—order—… line 丨 This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) ) 53 573389 A7 --------- V. Description of the invention (5; 1) " --''---Device 410 〇 As explained in US Patent No. 5,025,446 and US Patent No. 5,978,394, These pre-existing techniques are required to analyze a large number of PDA data pixel intensity data representing the interference fringes generated on a light-emitting diode array 180 on its etalon 184 to determine its centerline wavelength and frequency. width . This is a very time-consuming process, even if a computer processor is used, because to find and explain the etalon fringes associated with each calculation of wavelength and bandwidth, it is necessary to analyze about 400 pixel intensity values. A preferred embodiment of the present invention can greatly speed up this process by providing a processor that can operate in parallel with its processor for calculating wavelength information to find these important fringes. This basic technology uses a programmable logic device 402, which can continuously generate a stripe data table from the pixel data when the PDA pixel data is generated. This logic device 402 can also identify which set of stripe data is the stripe data of interest. Then, when it is necessary to calculate the center wavelength and bandwidth, its microprocessor simply picks up the information from the identification pixels of interest and calculates the values required for its center wavelength and bandwidth. This procedure can reduce the calculation time required by the microprocessor by a factor of approximately 10. The specific steps in a better procedure for calculating the center wavelength and bandwidth are as follows: 1) Under the clock signal of PDA 180 operating at 2.5 MHz, this pda 180 is controlled by its processor 400 at 4,00. Collect data from pixels 1 to 600 at a scan rate of Hz, and read pixels 1 to 1028 at a rate of 100 Hz. This paper size is in accordance with Chinese National Standard (CNS) A4 (210X297mm) 54 f Please read the notes on the back before filling in this page j

573389 A7 _ B7_ V. Description of the invention (52) 2) The analog pixel intensity data generated by its PDA 180 will be converted from some analog intensity values to some digital 8-bit by its analog-to-digital converter 41 〇 The values (0 to 255), as well as these digital data, will be temporarily stored in its RAM buffer 408 and become some bit values indicating the intensity at each pixel of its light emitting diode array 180. 3) Its programmable logic device 402 can continuously analyze the data flowing from its RAM buffer 408 on an almost real-time basis, in order to find their stripes, and can store all data in its RAM memory 406, Can identify all stripes related to each pulse, can generate a fringe table for each pulse, and can store these tables in its ram 406, and can identify two stripes related to an optimal group for each pulse . The technology used by its logic device 402 is as follows: A) its PLD 402 will analyze the pixel value of each line passing through its buffer 408 in order to determine whether it exceeds a critical threshold, while keeping track of its minimum Pixel intensity value. If the critical value is exceeded, this is the indication of the arrival of a fringe peak. Its PLD will identify the first pixel that exceeds its critical value as its "rising edge", the number of pixels, to store the smallest pixel value of the pixel leading the "rising edge," the pixel. The intensity value of this pixel is confirmed as the "minimum value" of the stripe. B) The PLD 402 then monitors the intensity of subsequent pixels to search for the peak of the fringe. This is done by keeping track of its highest intensity value until its intensity is below its critical value. C) When a pixel with a value lower than the critical value is found, its paper size applies the Chinese National Standard (CNS) A4 specification (210X297). 55 (Please read the precautions on the back before filling in this Page) * Yes-Line · 573389 A7 B7 V. Description of Invention (53) The PLD will confirm its number of falling edge pixels and store this maximum value. Its PLD then calculates the "width" of the stripe by subtracting the number of pixels from its falling edge from the number of pixels from its falling edge. D) The four values of the number of rising edge pixels, the maximum fringe intensity, the minimum fringe intensity, and the width of the fringe are stored in the circular table of the striped segments of its RAM memory bank 406. It can store data representing up to 15 stripes for each pulse, although most pulses will only produce 2 to 5 stripes in the last two windows. E) The PLD 402 is also programmed to identify the "best" two stripes for each pulse with respect to each pulse. This is done by confirming that it is completely in the last stripe within the window of 0 to 199 and that it is completely in the first stripe within the window of 400 to 599. After a pulse wave, it (1) collects its pixel data and (2) the total time required to form a circular table of the pulse wave-related stripes is less than 200 microseconds. The main advantage of this technology in saving time is that its search for stripes occurs when its stripes are being read out, digitized, and stored. Once two optimal stripes of a particular pulse are identified, its microprocessor 400 will obtain the original pixel data in the upper two stripes from its RAM memory bank 406, and will And other data to calculate its bandwidth and center wavelength. To further reduce the calculation time, its microprocessor 400 can be replaced with a fast digital signal processor (called a DSP) of one of the types made by Motorola and Texas Instruments (such as Motorola chip DPS56303). This DPS can be located at its wavelength meter so that it transmits the only information from the wavelength meter to the laser master control, which is required for its beam control. This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) 56 (Please read the precautions on the back before filling out this page) Order — 573389 A7 B7 V. The final description of the invention (54. This allows the calculation time to be greatly shortened to less than microseconds. The calculation is as follows: The typical shapes of these etalon stripes are shown in Figure 14D. Based on its previous work on PLD402, it has stripes with a maximum value at prime 18 (), and it has-at approximately The stripe at the maximum value will be confirmed by its microprocessor 400. The pixel material surrounding the two maximum values will be analyzed by its microprocessor 400 to define the shape and position of the stripe The completion of this is as follows: A) The decision of its half-maximum value (half unitary value) is to divide its difference value by 2 by subtracting its minimum value from its maximum value, and the result. Add to this stripe minimum. For each rising edge and each falling edge of the two upper stripes, the two pixels having the closest value exceeding the half-maximum value and the closest value below the half-maximum value will be counted differently. In each case, its microprocessor will then find the extrapolation between the two pixels to define the endpoints of D1 and D2 as shown in Figure 8B, and have a 1/32 pixel. The accuracy. The inner diameter D1 and outer diameter D2 of the cyclic stripe can be determined from this equivalent value. Calculation of the fine-tuning wavelength The calculation of the fine-tuning wavelength is really completed by using the measured values of the coarse-tuning wavelength and the measured values of these D1 and D2. The basic equation of its wavelength is: λ = (2 * n * d / m) cos (R / f) ⑴ Among which, the paper size is applicable to China National Standard (CNS) A4 (210X297 mm) 57 (Please read first (Notes on the back then fill out this page)

May, I ---- line 丨 573389 A7 _ ^ _ B7_ V. Description of the invention (55) The input is the wavelength, in micrometers, η is the internal refractive index of the etalon, about 1.0003, and d is The interval of the etalon is about 1542 / zm for KrF laser and about 934 // m for ArF laser. It is controlled within the range of +/- l # m, where m is the valence and the peak of the fringe The integer of the wavelength is approximately 12440, R is the radius of the fringe, 130 to 280 PDA pixels, one pixel is 25 microns, and f is the focal length from its lens to the PDA plane. Expanding the cos term and discarding their higher order terms that are small enough to be ignored will yield: λ = (2 * n * d / m) [l- (l / 2) (R / f) 2] (2) by diameter D = 2 * R rewrite this equation to get: λ = (2 * n * d / m) [l- (l / 8) (D / f) 2] (3) The main task of its wavelength meter is D calculates λ. This would require f, n, d, and m to be known. Since both η and d are intrinsic values of their etalons, we can combine them into a single correction constant that is ND. We regard f as another correction constant named FD with the unit of pixel to match the unit of D to get a pure number ratio. Its integer valence m varies depending on the wavelength and the stripe pair we have chosen. m is used to determine the wavelength of its coarse-adjusted fringes, which is sufficiently accurate for this purpose. Some good things about these equations are that all their large numbers are positive. Its WCM microcontroller can maintain almost 32-bit precision. The paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm). · 58 · (Please read the precautions on the back before filling this page) — —Equipment- ---- line 丨 573389 A7 _____B7_ V. Description of the invention (56) Calculate it. We call the items in square brackets FRAC. FRAC = [1- (1/8) (D / FD) 2] (4) Internally, FRAC is represented as an unsigned 32-bit value with its decimal point to the left of the most significant bit. FRAC is always less than 1, so that we get the most precision here. For D in the range of {560 ~ 260} pixels, the range of FRAC is from [1-120E-6] to [1-25E-6]. When entering its ND correction, its wavelength meter will calculate an internal unsigned 64-bit value of 2ND = 2 * ND, and its internal wavelength unit is nanometer (fm) = 10 15 meters = 0.001 pm. Internally, in terms of fine-tuning the wavelength, we have expressed the wavelength as FWL again, and the unit is fm. Rewrite the equation with these variables: FWL = FRAC * 2ND / m ⑺ This arithmetic formula deals with the shift of the decimal point in FRAC, and produces FWL in units of fm. We will solve the problem by shuffling the equation and inserting its known coarse tuning wavelength, which is also named CWL in fm: m = closest integer (FRAC * 2ND / CWL) (6) take the closest An integer equal to adding or subtracting FSR from the old plan until the fine tuning wavelength closest to the coarse tuning wavelength is reached. By solving equation (4) followed by equation (6) followed by equation (5), the wavelength can be calculated. We calculate WL for its inner and outer diameters, respectively. Its average value is its line center wavelength, and its difference is its line width. Bandwidth calculation The bandwidth of the laser is calculated as (λ 2- and 丨) / 2. There is a fixed correction factor, which is applied to take into account the intrinsic width of the peak of the etalon, and it is added to this paper standard to apply Chinese National Standard (CNS) Α4 specification (210X297 mm) -59-(Please read the precautions on the back before (Fill in this page), machi | ---- line · 573389 A7-" "-------_____ V. Description of the invention (57) Its true thunder band width. Mathematically, a deconvolution algorithm is a system used to remove the intrinsic width of the etalon from its measured width, but the calculation is too complicated, so that it subtracts a fixed correction value "λ ε, It can provide sufficient accuracy. Therefore, its bandwidth is: ^ λ = [(Ό2 ^ όυ) / 2] ^ χ e J λ e depends on both the standard of its etalon and the bandwidth of the real laser. For the application described in this specification, it is typically in the range of 0.1-1 pm. A better bandwidth measurement is determined by the bandwidth value λ in the section, which refers to the so-called M full-width half-height, or FWHM bandwidth. It refers to the laser beam spectrum (that is, the intensity is a function of wavelength) ) At its half-maximum intensity. This is the current bandwidth value, which is typically monitored by lasers used in integrated circuit lithography. If the precise shape of its spectrum is known (for example If it is known as Gaussian distribution), these FWHM values can be used to determine the entire spectrum of the laser beam (that is, the intensity of the laser beam at all wavelengths within its beam range). However, in general, the correct shape of its spectrum cannot be accurately known, so that using this FWHM value to represent its laser spectrum will have some associated uncertainty. Another is used to monitor its laser The solution to the beam spectrum is to try to measure the so-called 95% integration value (called j_95). However, this also involves uncertainty, because the measurement of low intensity values in the "wing" of its spectrum will Difficult to be accurately measured due to instrument noise Moreover, a good 195 measurement will require some extremely precise etalons. These extremely precise etalons are sturdy and durable, typically not enough for a lifetime 丨 one-., _________ — _ paper Standards are applicable to China National Standard (CNS) A4 specifications (210X297 mm) " 60: (Please read the precautions on the back before filling this page) Order--line: ·-573389 A7 B7 V. Description of the invention (58 products For line lasers. The better alternative technology is to make good use of the extremely fast detectors and processing H and storage headers described above. These technologies can collect and analyze a large amount of data and identify the operation of the laser system. In a pulse train mode, for example, a pulse train of 2000 pulse waves in a 0.2 second time width, and these pulse trains are separated by an interruption time of 0.2 seconds. A similar to pDA4〇 Second-level logic device can store all the fringe data related to each pulse wave in the pulse wave train in its storage device 4 during each pulse wave. Immediately after the pulse wave train (in its 〇 2 seconds interrupt time), its processor 400 will calculate every Pulse wave related spectrum, and then calculate one or more average spectrum values (for example, eleven averages, that is, the average of the first, second to tenth percentages of the pulses; plus The total average spectrum). The algorithm used to calculate the spectrum should preferably be corrected for noise from various sources, especially in the wings of its spectrum, and any intensity distribution from adjacent stripes should also be subtracted. Its spectrum can be defined as an integral of a wavelength function, or it can be defined as a series of integrals such as 10% 1, 20% 1, ..., 90% 1, etc., or from this data, its processor can be programmed To calculate and report more familiar frequency values such as FWHM and 95 ° /. 1. Its processor can be programmed to calculate, report, and / or store the average value associated with each pulse train, and can be periodically Reports the average of the pulse train period over the selected window scale. Enhanced Illumination When the repetition rate is increased from the range of 4,000 Hz to the range of 10,000 Hz, the optical components in its wavelength meter will be exposed to a large increase in ultraviolet radiation. To counteract this potential problem, our applicants have already responded to this wave 61 (please read the precautions on the back before filling this page) This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) 573389 A7- -^ ____ B7_ 5. Description of the Invention (59) The long meter has been improved, which can reduce the exposure rate of each pulse by as much as a factor of -28. The details of these improvements are described in the U.S. patent number entitled "Gas Discharge Ultraviolet Wavemeter with Enhanced Illumination," which was filed most recently in June 2002. This reference is incorporated by reference. Figure 141 is a plot of modified wavelengths with enhanced illumination. The most important new feature is a diffractive astigmatism sheet 181D and a miniature telescope formed by lenses 181A and 181C. The latter can shrink the cross section of the light beam so that the two reflections produced by the two sides of the beam splitter 170 are The divided sampling beams are combined at the output surface of its diffractive diffusing sheet 181D. Its lens 181E causes the output surface of this diffractive astigmatism sheet to be imaged on its traditional astigmatism sheet 181G, and its combined two diffused beams. A very small part will be selected by its slit 181H and its etalon 184 , Converted into some spectral fringes, and they are imaged on the light emitting diode array 180 by their lens 181L. Its beam splitter 181F can split the diffused beam from its lens 181E into two parts. The first part, as described above, will illuminate its etalon 184, and the second part, will be diffused by its astigmatic sheet 181. , And this two-diffusing beam is used as a correction beam to calibrate it based on some metal vapor in its vapor compartment 198 (platinum in the case of ArF and iron in the case of KrF). Wavelength meter. Pulse energy and wavelength feedback control is based on the measurement of the pulse energy of each pulse as described above. The pulse energy of their subsequent pulses can be controlled to maintain the desired pulse energy, plus a certain The desired total integrated dose for a specific number of pulses, the paper size of which applies the Chinese National Standard (CNS) A4 (210X297 mm) 62 (Please read the precautions on the back before filling this page)

573389 A7 B7 V. Description of the invention (60) The whole description is in US Patent No. 6,005,879, "Pulse Energy Control for Excimer Laser" (Pulse Energy Control for Excimer Laser), which is made by reference. Incorporated into this manual. The wavelength of the laser can be measured using their measured wavelengths and some of their pre-existing techniques similar to US Patent No. 5,978,394, "Wavelength System for an Excimer Laser" (wavelength system related to excimer lasers) ) (Which is also incorporated into this specification by reference) and other technologies are controlled in a feedback configuration. Our applicants have recently developed a number of wavelength modulation techniques that use a piezoelectric actuator to provide extremely fast motion of mirror modulation. Some of these technologies are US Patent No. 608,543 filed on June 30, 2000, "Bandwidth Control Technique for a Laser", which is incorporated by reference Into this manual. Figures 16A and 16B are excerpts from the application and show the main elements of this technology. A piezoelectric stack is used for extremely fast mirror adjustment, and some larger and slower adjustments are provided by a pre-existing state-of-the-art stepper motor that operates a lever arm. Its piezoelectric tube group can adjust the position of the fulcrum of its lever arm. Detailed design related to the new LNP piezoelectric driver with a combined PZT-stepper motor-driven modulation mirror. Figure 16 is a block diagram showing the characteristics of the laser system described above. The control system of wave energy is important. The shown line narrowing module 15K is composed of a three chirped beam expander, a modulation mirror 14, and a grating. Its wavelength meter 104 can monitor its 63 (please read the precautions on the back before filling this page) This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) Invention description (61) Wavelength of the output beam 'And it can provide a feedback signal to its LNP processor 106, which can control the position of its modulating mirror 14 by the operation of a stepping motor and a ρζτ tube set as described below. Their operating wavelengths can be selected by their laser controller 102. Pulse wave energy can also be measured in its wavelength meter 104, which can provide a signal for use by its controller 102 to control the pulse wave energy in a feedback configuration as described above. Fig. 16A is a block diagram showing the PZT stack 80, the stepping motor 82, the mirror 14, and the mirror base%. Figure 16B1 is a drawing showing the detailed features of a preferred embodiment of the present invention. The large change in the position of the face mirror 14 is produced by a stepping motor through a 26.5 to 1 lever arm 84. In this case, the diamond pad η at the end of the piezoelectric actuator 80 is arranged so as to contact the spherical cutter ball at the fulcrum of the phase cup arm 84 thereof. The contact between the top of the lever arm 84 and the mirror base 86 is provided on the lever arm with a cylindrical engaging pin arm, and as shown at 85 on the mirror base, the women's wear has four balls Ball bearings (only two of them are shown). The piezoelectric driver 80 is mounted on the LNP with a piezoelectric seat 80A, and the stepping motor is mounted on the frame with a stepping motor frame 82A. The mirror 14 uses three aluminum spheres (only one of which is shown in Figure 16B1), and is mounted in a mirror base% with a three-point mount. There are three springs 14A, which can apply a compressive force to keep the mirror pressed to the spheres. Fig. 16B2 is a preferred embodiment which is slightly different from that shown in Fig. 16B1. This embodiment includes a bellows 87 to isolate its piezoelectric actuator from the environment within its LNP. This isolation can prevent its piezoelectric element 573389 A7 _ _B7 ____ V. Description of the Invention (62) UV damage and the possible pollution caused by the gas escaping from its piezoelectric material. See also Figure 19D and the main article attached below for an alternative LNP design that provides a significantly improved LNP seal. LNP purification technology purification line narrowing components are well-known; however, 'its predecessor technology teaches that its purification airflow does not flow directly onto its grating surface' so that its purification airflow is typically passed through some behind its grating surface The port at the location is provided. However, our applicants have discovered that, at extremely high repetition rates, a layer of hot gas (gas) will develop on its grating surface and its wavelength will be distorted. This distortion can be at least partially corrected by the active wavelength control described above. Another solution is to purify the surface of the grating as shown in FIG. 17. In Fig. 17, some small holes (1 mm to 1/4 inch interval) in the top of a 10-inch-long 3 / 8-inch diameter purification pipe 61 can provide the above-mentioned purification airflow. This purge gas ' as described in the following section ' may be nitrogen from a pure nitrogen supplier. Moreover, in a preferred embodiment, the LNP is purified with helium. Other technologies are shown in Figures 17 A, 17B, and 17C. Some specific techniques that can be used to control wavelength and bandwidth are described in the following patent applications incorporated by reference into this specification: US Patent No. 09 / 794,782, filed on February 27, 2001 "Laser Wavelength Control With Piezoelectric Driver"; US Patent No. 10 / 〇27,210 filed on February 27, 2001, entitled "Laser Wavelength Control With Piezoelectric Driver" "(Plasma driver is used to make laser wave 65 (please read the precautions on the back before filling this page) This paper size is applicable to Chinese National Standard (CNS) A4 specification (210X297 public love) 573389 5. Description of invention (63) long Control); US Patent No. 36, filed on December 21, 2001, titled "Laser Spec⑽ 如 如 响 Ｍ"

Uthographic Process ”(laser spectrum engineering technology related to lithography process). Compensation related to pressure change of LNP Under the operation of extremely high repetition rate and pulse train mode, the LNP will suffer during wafer irradiation A large amount of heating, and during other periods, will not be heated. This will cause the pressure change of the purified gas towel, which will affect its wavelength. Our applicants have decided that every The change in the pressure of the bracket will have a wavelength change of about pm. Typically, the change in the wavelength can be corrected very quickly during the laser operation, the wavelength feedback control described above. However, when the laser is not in There is no feedback during operation, and immediately after the highly repetitive operation when the wavelength is changing most rapidly. One of the better solutions to this problem is to pressurize the LNp slightly with a purge gas (such as a meter with 1 atmosphere pressure) Pressure) in order to monitor its pressure and correct the change in air pressure during non-operation. Figure 16F shows it separately. Its lnp purification gas (NO pressure in this case is subject to Its pressure gauge is monitored by 200. In any period exceeding a specific time such as 5 seconds when the laser is not ignited, its controller 202 can instruct its modulation control to 204, as shown in Figure 16B2 , Adjust the position of its PZT80 and / or stepping motor 82, so as to position the position of its modulating mirror 14 to compensate for the change in air pressure. This compensation is based on: "λ (pm) = (P-P0) a, this The paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) (Please read the precautions on the back before filling this page) Order: Line 丨 573389 A7 __B7 V. Description of the invention (64 of which: P = Air pressure P〇 = Gas house before ignition stop a = pressure coefficient = 5 λ / δ?

Λ / Λ X = pm / torr @ λ = 248 nm η = refractive index of purified gas = 1.0003 for nitrogen This λ is applied to (plus) any other appropriate modulation during the interruption period, for example Compensate for some events such as thermal drift] 1 > ^ components, or pre-drive instructions, or open-circuit wavelength changes. Laser purification system This first embodiment of the present invention includes an ultra-pure ν2 purification system, which can provide greatly improved performance and greatly increase the life of its components. Fig. 19 is a block diagram showing important features of the first embodiment of the present invention. The five excimer laser components purged with nitrogen in this embodiment of the system are: LNP 2P, some high-voltage components 4P installed above the laser discharge chamber 6ρ, and one such high-voltage components 4P A high-voltage cable 8P, an output coupler 12ρ, and a wavelength meter 14P connected to the upstream pulse wave power module 10P. Each module 2P, 4P, 8P, 12P, and 14P is installed in its sealed container or compartment, and each of them has only two ports, an intake port and an A exhaust port. One is usually a large A slot at a integrated circuit manufacturing plant (typically maintained at the temperature of the liquid gas). The source of N2 is 16P, but it may be a Chinese standard (CNS) A4 specification (210X297 mm) for this paper size. 67 (Please read the precautions on the back before filling this page) -Binding 丨 Binding-: Line- 573389 A7 —---- ^ ___ V. Description of the Invention (65) A rather small Qin bottle. This Qinyuan gas system flows out from its source, flows into its N2 purification mold, fel7P, and passes through its & filter 18p, to its distribution panel 20P, which contains a flow control valve, to control it to The stream of cleaned components. Regarding each component, this purge air will be directed backwards to its module 17P, and to a flow monitoring unit 22p, where the return flow from each purification unit will be monitored, and when the monitored flow is In the case of a predetermined value, an alarm (not shown) is activated. Figure 19A is a line diagram showing specific components of this embodiment, and includes some additional N2 features that are not particularly relevant to the purification features of the present invention. N2 filter An important feature of the present invention is that its A filter 18 is incorporated. In the past, the manufacturer of excimer lasers for integrated circuit lithography believed that filters related to N2 purification gas were not necessary because the specifications of A gas related to commercially available N2 were almost always good enough, so that The compliant gas system is clean enough. However, our applicants have discovered that sometimes the source gas may be out of specification, or the piping line to the purification system may contain pollutants. Furthermore, their pipelines may be contaminated during maintenance or operation procedures. Our applicants have decided that the cost of this filter is an excellent insurance against damage caused by extremely low probability contamination. One of the better N2 filters is supplied by the company Aeronex in San Diego, California] ^ 0 (^ 1 50000K inert gas purifier. This filter can remove Η20, 〇2, C0, c 〇2, &, and non-methane hydrocarbons, and reached the level of several parts per billion. It can remove 99 9999999% of all 〇03 micro-paper standards applicable to China National Standard (CNS) A4 specifications (210X297 public love) -68

------------------ »! :: install——-.,-(Please read the precautions on the back before filling this page) 、 线 _ 573389 A7 B7 5. Description of the invention (66) particles of rice or more. Flow monitor-A flow monitor in unit 22 is provided for each of the five purified components. Some of these are commercially available units with low flow-related alarm features. Piping Preferably all piping is constructed of stainless steel (316SST) with electronically polished interior. Some types of plastic tubes made of PFA 400 or ultra-high purity Teflon can also be used. Recirculate some or all of the purge gas, as shown in Figure 19B. In this case, a blower and a water-cooled heat exchanger are added to the purification module. For example, the purge air flow from the optical component can be recirculated, and the purge air flow from the electrical component can be discharged, or a part of the combined air flow can be discharged. LNP helium purification In some preferred embodiments, the LNP is purged with helium, and the remaining beam paths are purged with nitrogen. Helium has a lower refractive index than nitrogen, so that the use of helium can minimize the thermal effects in its LNP. However, helium is about 1,000 times more expensive than nitrogen. Improved Sealing Layers Our applicants have discovered the main advantage of providing an extremely "clean" beam path. Their laser optics, in the presence of high-energy ultraviolet radiation, combined with many forms including pollutants such as oxygen, are easy to degrade quickly. This paper is sized to the Chinese National Standard (CNS) A4 (210X297 mm). -(Please read the precautions on the back before filling this page) -Installation 573389 A7 B7 V. Description of the invention (67). Some of the better techniques for sealing the beam path are described on November 14, 2001. U.S. Patent No. 10 / 00,991, filed on the same day, is entitled "Gas

Discharge Laser With Improved Beam Path, (Gas Discharge Laser with Improved Beam Path) is incorporated into this manual by reference. Figures 19C, D, E, and F are excerpts from the application. Fig. 19c is a drawing showing a bellows seal between various components of a gas discharge system similar to the master-controlled vibrator described above. Fig. 19D shows a modified body in a telescoping arrangement including one to its LNP stepper motor and sealing the interface between the motor and the lNP envelope. Fig. 19E shows a thermal decoupling hole related to LNp, which can minimize the heat generation in the above LNP, and also can seal the entrance of the LNP, so that it can be purified by extremely inexpensive helium. Turbulent gas leaves its LNP via the discharge cell window unit shown at 95 in Fig. 19C. Figures 19F1, 2, 3, 4, and 5 show some easy-to-seal retractable capsule seals, which are used to provide a seal between the laser modules, but they can be quickly and easily separated. Modules to allow quick module replacement. Figure 19G shows a specific purification configuration that purifies the high-intensity portion of a wavelength meter. This particular purification is described below. Advantages of this system The system described in this manual represents a major improvement in the long-term excimer laser performance of krF and particularly of ArF and F2 lasers. Their pollution problems can basically be eliminated, which can significantly increase the lifetime and beam quality of their components. In addition, since its leakage except through the outlet port has been eliminated, its flow can be controlled to the desired value, which can reduce the demand for N2 by about 50%. This paper size is applicable to Chinese National Standard (CNS) A4 specification (210X297 mm) 70; ...:-: ... VI: installed ...:.-.. (Please read the precautions on the back before filling this page), order — — Line 丨 573389 V. Description of the invention (68) Sealed light unit with wattmeter This first-best embodiment includes a built-in wattage as shown in Figures 20, 20a, and 20B. Table sealed light valve single ㈣g. Under this important improvement, its light valve system has two functions. First, it is a light valve that can block the laser beam, and second, it is a full beam wattmeter that can monitor the beam power when measurement is needed. . Fig. 20 is a top view showing the main components of the light valve unit. Among them are a light valve 502, a beam collector 504, and a wattmeter 506. The path of its laser output beam to its light valve in the closed position is shown at 510 in Figure 20. Its path with the light valve open is shown at 512. The active surface of the light valve of the beam stopping component 5 16 is 45 with the direction in which the light beam leaves the discharge. , And when its light valve is closed, the light beam will be absorbed in the surface of its light valve, and will be reflected to its beam collector 504. Both the active surface of its light beam collector and the active surface of its light valve are shovel-treated for high absorption of the laser beam. In this embodiment, its beam stop assembly 516 is mounted on its flexible spring steel arm 518. The light valve of the light valve is to apply a current to the coil 514 shown in FIG. 20B, so that the flexible arms 5 18 and the beam stopping element 5 16 are pulled toward this coil, thereby causing its beam stopping element 516, It leaves the path of its output laser beam and is turned on. The light valve is closed by stopping the current flowing through its coil 5 14 to cause the permanent magnet 520 'to return the special flexible arm 518 and the beam stop element 516 to their closed positions. In a preferred embodiment, the current flow is carefully trimmed so that the element and arm can be easily changed between open and closed positions. 71 This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) 573389 A7 --------- V. Faxian Ming (69) '~' Its wattmeter 506 is similar to It operates in the mode, and its thermoelectric light detector is placed in the path of the output laser beam shown in Figures 20 and 20A. In this case, the coils 52 and the magnets 522 can pull their detector unit 524 and their flexible arms 526 into and out of their beam paths for the measurement of output power. This wattmeter can be operated with the light open and the light valve closed. The current to the coil is controlled like its light valve, so that its unit 524 can easily transition into its beam path. Improved wavelength meter purification. In this preferred embodiment, a specific purification technique is used to provide additional purification of the high ultraviolet flux portion of its wavelength meter and output coupler and the output window block of the discharge chamber. . This technique is shown in Figure 22. As explained above, part of its laser output beam intersects with its reflective mirror 170 (see also Figure 14), which can pass through 95% of the energy in the beam into an output beam. Approximately 4% of the reflected beam will be reflected from its mirror 171 to its energy detector 172, where its pulse energy will be measured. (The other part of the reflected beam, as shown at 61A, will pass through its mirror 171, and will go to other monitors in this wavelength meter). At 4,000 Hz, this 5% output energy represents a large number of UV light waves, so special conditions must be taken to ensure that the gas in the path of this beam part can be extremely clean and pure. For this reason, its wavelength meter is modified to seal the area between the upstream side of its mirror 170, the upstream side of its mirror 171, and the front side of the window of its detector 172, so as to communicate with the rest of the wavelength meter Partially separated. The specific purge air flow back and forth in this area is shown in Figure 62 on the setup. The Bourbon paper size is in accordance with the Chinese National Standard (CNS) A4 specification (210X297). 72 · ------- V: installed ----- .- shame_ (Please read the notes on the back before filling (This page)

• 、 I. Line 丨, ’573389 A7 I --- V. The remaining part of the description of the invention (70) '--- is purified by the second purification air stream as shown in 6 from here. -The purge air 62A 'is via a mirror 170, m, and a detector window. , Sealed and confined to its wavelength meter. This purification airflow will leave this area 'along its laser output beam path, and return to its output clutch module 68A via a telescoping area 6A ^ to purify it. This will flow through its expansion capsule unit 7qa, and will enter its window area W2A 'via the exit port in the f-port block and the expansion capsule unit 70a: exit port, and then as At 74A and shown in FIG. 19, it is returned to its A purification module 17 via a pipe. The downstream side of its window 170 is cleaned with a purifying air stream of 5K from its light valve. & Purge air may not be as shown in Figure 19, from its module j 7, or in some cases, except for its window 76A, and the output of its light valve module, is open and cleaned The user beam line is connected. In this case, the outlet purification line at 78A can be directed to a user purification circuit system or discharged to the atmosphere. Other high repetition rate improvements Fixed optical parameters I ^ When lasers and other lithography equipment are new, their high repetition rate as described in this specification will provide more illuminance than needed. As their lithography lasers age, the quality characteristics of their optical beams may change. Generally, its quality tends to deteriorate gradually. When their beam quality no longer meets the specifications even after repair, their main components (such as their laser discharge cells, LNP, and / or wavelengths are usually required to be replaced. This paper applies the Chinese National Standard (CNS) A4 specification ( 210X297 mm) ---

、 Τ · (Please read the precautions on the back before filling this page):. Line 丨 573389 A7 B7 V. Description of the invention (71) ~ ^ 'count). Therefore, 'the quality of its laser beam may change significantly within its specifications throughout its lifetime. This may be a problem related to their use of integrated circuit lithographic printing for some lithographic equipment designed for optical sigma beam laser beams. This is "better" than normal laser quality, and it will cause improper changes in the quality of the integrated circuit. One solution is to provide a beam quality that can be maintained substantially constant throughout the life of the laser. Laser system. The technology described in US Patent No. 10 / 036,727, filed on December 21, 2001, can be used for this purpose, in which a mirror driven by a piezoelectric actuator can be used to provide The wavelength stability value and bandwidth value corresponding to its expected nominal value, rather than the optimal value allowed by its laser. Pulse energy can also be controlled using the feedback control described above, The energy stability value to maintain a desired nominal value, rather than its best possible value. The fluorine gas concentration and laser gas pressure can also be adjusted to produce the desired beam quality value, rather than its The most stable value of pulse wave energy and wavelength, and its narrowest possible bandwidth value. High repetition rate MOPA In a preferred embodiment of the present invention, it is applied to a main control oscillator _ power amplifier (MOPA) gas discharge Laser system Such as those described in the patent applications assigned to the assignee of this application: US Patent Nos. 09 / 943,343, 10 / 012,002, 10,056,619, and 10 / 141,216, all of which It is incorporated into this description by reference. Figure 23 is a drawing of the MOPA system 4K designed by our applicants and colleagues. Its beam quality is controlled in its main control oscillator 8K, and its pulse wave The power is controlled within 10K of its power amplifier. By increasing its pulse wave repetition rate, this paper size applies the Chinese National Standard (CNS) A4 specification (21〇 > < 297mm) 74 (Please read the back Note for this page, please fill in this page again) • Order —…… line 573389 A7 B7 V. Description of the invention (72) It can provide the same UV energy with less energy per pulse. Reducing the energy per pulse can make it Expensive lithography optical equipment has a longer effective life. This embodiment, as shown in Figure 23, also includes the pulse wave stretching equipment (referred to as the pulse multiplier 12K) required by the above MOPA, and a Beam output as discussed below Unit 40A. The pulse multiplier has backup energy, which allows equipment to be added to extend the duration of its laser pulse. A technique to extend the pulse duration is to separate each pulse into two or more Part of it, delaying all but its first part, and then bringing them back together. One such technology is described in US Patent No. 6,067,311, which has been assigned to our applicant's employer , And is incorporated into this specification by reference. Another such technology is described in US Patent No. 10 / 006,913, filed on November 29, 2001, which is incorporated by reference into this specification in. Drawings 24A, 24B, and 24C are excerpted from the drawing of the application, illustrating the technique. Figures 24A and 24C show the results before and after their pulse wave expansion. Various modifications can be made in the present invention without changing its defined scope. A person skilled in the art will understand many other possible variations. This system is designed for any high pulse repetition rate ranging from approximately 3000 Hz up to 6000 Hz to 10,000 Hz. The laser system described above specifically for KrF can be used as an Ar * F laser by changing its gas mixture and modifying its LNP and wavelength meter for 193 nm operation. The preferred electrode spacing is reduced from 16.5 mm to 13.5 mm. For example, the active feedback control of its bandwidth can be achieved by using a motor drive 75 (please read the precautions on the back before filling this page): Line 丨 This paper size applies the Chinese National Standard (CNS) A4 specification ( 210X297 mm) 573389 A7 B7 V. Description of the invention (73 actuators to adjust the bending mechanism shown in Figure 22A, so as to adjust the curvature of the line narrowing grating, and is set to. Or its bandwidth is faster The control can be set by using a piezoelectric device to control the curvature of its grating. The design of other heat exchangers should be a modification of the configuration shown in this manual. For example, four The unit can be combined into a single unit. On its heat exchanger, the use of larger heat sinks has significant advantages, which can mitigate the sharpness of its gas temperature due to the operation of its laser pulse train mode. The effect caused by the change. The reader should understand that at very high pulse rates, the feedback control above the pulse energy is not necessarily fast enough to use the pulses immediately before it to control a specific Pulse wave Pulse energy. For example, some control techniques can be provided, in which the measured pulse energy of a particular pulse is used to control the pulse of the second or third pulse. There are many possible variations and modifications in the algorithm of converting the wavelength etalon and grating data into some wavelength values. For example, our applicants have discovered that the focus error in the etalon optical system , It will cause a small amount of error, which will make the measured line width larger than its range. This error will increase slightly with the diameter of the etalon stripes being measured being increased. This can be corrected by sweeping the cat's laser and a range of wavelengths and paying attention to the step changes of the measured stripes as they leave the windows. A correction factor can then be based on the measured stripes in the window. Therefore, the above disclosure is not intended to be restrictive, and the scope of the invention should be determined by the scope of its patent application and their legal equivalents. Paper size applies Chinese National Standard (OJS) Α4 specification (21〇χ297 mm) 76 ------------- · ----- J ;: installed -----., · -(Please read the precautions on the back before filling in this page)-,? Τ— —line 丨 573389 A7 ------- B7 V. Description of the invention (74) Component number comparison 1K ... Status lamp 12K ... Pulse Multiplier 2K ... Control module 11K ... Cooling water distribution module 2P-LNP 12K ... Laser gas supply module 3K ... Compression head module 12P ... Output coupler 4K ... Stabilization module 13K ... Ventilation group 4K ... MPO system 14 ... Modulation mirror 4P ... High voltage assembly 14A ... Spring 5K ... Automatic light valve module 14K ... Right blower motor 6A ... Telescopic bag area 14P ... Wavelength meter 6K ... MFT power supply 15K ... Line narrowing module 6P ... Laser discharge chamber 16K ... Right blower motor controller 7K ... Left blower motor 16P ... N2 source 8K ... Laser discharge chamber module 17 ... Called purification module 8K ... Main control oscillator 17K · · · Left blower motor controller 8P ... High voltage cable 17P ... N2 purification module 9K ... · Interface module 18 ... Ν2 filter 10 ... laser 18A ... cathode 10AA ... laser discharge chamber 18K ... rectifier module 10K ... power amplifier 18P ... N2 filter 10K ... cooling water supply module 12, 14 ... · Shell structural member 10P ... · Pulse wave power components 18,20… Electrode 12A, 14Α ··· Case structure member 18Α1… Cathode (Please read the precautions on the back before filling this page) Applicable to China National Standard (CNS) A4 specification (210X297 public love) 77 573389 A7 B7 V. Description of the invention (75) 19K ... Resonant charger module 48A ... Hollow cylindrical body part 20A ... Anode 48B ... Part 20K ... High Voltage power supply module 49 ... Pottery ferromagnetic ring 20P ... Distribution panel 52 ... C1 capacitor bank 21K ... AC / DC power distribution module 54 ... Saturable inductor 22 ... Discharge 48 ... Anode block gas flow shaping structure 22 " * DC power supply 48,54,64 ··· Inductor 22 ... Flow monitoring unit 50 ... Main insulator 22P ... Flow monitoring unit 50 ... Upper gas flow shaping structure 24A ... Laser controller 50A ... Main insulator 33 ... Beam 52—C1 capacitor bank 40 ... rectifier 52 ... gas turning blade 40A ... beam delivery unit 54A ... water-cooled saturable inductor 42 ... charging capacitor C〇54A1 ... water-cooled bushing 42 ... capacitor 54A2 ... · Cooling line 42,52,62,82 ··· Capacitor bank 54A3 ··· Dovetail slot 46… Solid mode switch 56… Boost pulse transformer 46… Cage fan 56… Transformer 46… Solid state switch 56A · ·· Aluminum spool 46A ... Tangential fan blade structure 56B ··· Printed circuit board 46A ... Fan 56C ... Insulators 46A, 46B ... IGBT switch 56D ··· Stainless steel secondary coil low voltage end portion 48 ... Blade 56E ... Primary coil HV leads 48,54,64… Inductors 56F ··· High-voltage terminals (please read the precautions on the back before filling in this page), order-wire 丨 丨. 丨 This paper size applies to China National Standard (CNS) A4 specifications (210X297 mm) 78 573389 A7 B7 V. Description of the invention (76) 58A ... Water-cooled heat exchanger unit 80 ... Piezo actuator 60 ... Compression head 80 ... PTZ (piezo actuator) 60 ... Upstream pre-ionizer tube 80A ... Piezo base 60 A ... Slot 81 ... Golden stone 61 ... Purification tube 82 ... Stepper motor 62 ... Surge capacitor bank 82A ... Stepper motor frame 62A ... Specific purification air flow 84 ... Cathode 64 ... Electric trap unit 84 ... Leverage Arm 64 ... Saturable inductor 85 ... Spherical ball bearing 64A ... Second purge air flow 86 ... Mirror mount 64A ... Saturable inductor 86 ... Mirror mount 64A1 ... Housing 87 ... Retractable capsule 64A2 ... Dovetail Slot 95 ··· Discharge chamber window unit 64 A3 ··· Magnetic 102 ... Laser controller 66 ... Blade structure 104 ... Wavelength meter 68 ... Area 106 ... LNP processor 68A ... Output coupler module 120 ... Wavelength meter unit 69 ... light emitting diode 130 ... shaft 70A ... retractable capsule unit 132 ... ball bearing 72A ... window block 136 ... sealing member 74A ... tube 140 ... motor stator 76A ... window 170 ... splitter 78A ... exhaust purification Pipe 170 ... Window 80 ... PTZ Tube group 170 ... Reflective mirror (Please read the precautions on the back before filling out this page)… Binding 丨 _ _ Line 丨 This paper size applies to Chinese National Standards (CNS) A4 size (210X297 mm) 79 573389 A7 B7 V. Description of the invention (77) 171 ... mirror 197 ... wavelength meter processor 172 ... energy detector 198 ... steam compartment 173 ... mirror 200 ... standard DC power supply 174 ... mirror 200 ... manometer 175 ... face mirror 202 ... capacitor 176 ... middle step grating 202 ... controller 177 ... slot 204 ... modulation control 178 ... lens 204 ... control panel 179 ... face mirror 206 ... IGBT switch 180 ... linear light emitting diode Body array 208 ... inductor 180 ... light emitting diode array 210 ... command voltage 181 ... astigmatism sheet 212 ... voltage feedback signals 181A, 181C ... lens 214 ... current feedback signal 181D ... diffractive astigmatism sheet 215 ... custom Moving diode path 181E ... lens 216 ... distribution step-down circuit 181F ... splitter 300 ... three-phase power supply 181G ... conventional astigmatism sheet 301, 302,303,304 ... magnetic flux 181H ... slit rejection metal block 182 ... face mirror 302 ... power capacitor 183 ... lens 302 ... structure with heat sink 181L ... lens 303 ... heat sink 184 ... etalon 304 ... control board 190 ... absolute wavelength reference correction unit 304 ... flexible flange sheet 197 ??? wavelength meter controller 304A ··· internal flange (Read the back of the precautions to fill out this page), installed Shu

• 、 Can I; line 丨 丨. 丨

If · This paper size is in accordance with Chinese National Standard (CNS) A4 specification (210X297 mm) 80 573389 A7 B7 V. Description of the invention (78) 304B ... telescopic bag 518 ... flexible spring steel arm 304C ... outer flange 520 … Permanent magnets 306 ·· plastic turbulators 522 ... magnets 307 ... cores 524 ... detector units 307A, B, C ... coil 526 ... flexible arms 308 ... c-shaped seals 530,532 ... motors 400 ... Double port nut 534 ... Right motor controller 400 ... Microprocessor 536 ... Driven motor controller 402 ... 0-ring 540A, 540B ... " Positioning ring 402 ... Programmable logic device 540 ... Anode 404 ... Execution program and data memory bank 541 ... Cathode 404 ... Storage device 541 ... Ceramic ball 406 ... Special extremely fast RAM 541 ... Top cover 408 ... Picture RAM memory bank 541A, 541B ... Electrode 410 ... Analog digital Converter 542 ... blunt blade electrode 500 ... sealed light valve unit 542 ... bottom cover 502 ... light valve 542 ... anode 504 ... beam collector 542A ... locking pin 506 ... Wattmeter 541C ... cathode 510 ... path 542C ... anode 512 ... path 54 3 ... central mandrel 514 ... coil 544 ... dielectric spacer 516 ... beam stop assembly 544B ... insulator spacer 518 ... flexible arm 544C ... channel communication (please read the precautions on the back before filling (This page)… installed ·, can be used for… line 丨 This paper size applies to the Chinese National Standard (CNS) A4 specification (210X297 mm) 81 573389 A7 B7 V. Description of the invention (79) 545 ... Housing 600 ... Outer cylinder 546 · ·· Anode support rods 600, 602 ... Oxide layer 546 ··· Heat fin 602 ... Inner cylinder 546 ... Anode socket rods 604,606 ... Hole 547 ... Forced vented chamber 604 ... Electrode 547 ... Anode socket rod 606 ... Nozzle slit 548 · ·· Current circuit 608 ... Gas pump 549 ... Pipe line 608 ... Blower 550 ... Blower 610 ... Water-cooled heat exchanger 551 ... Water-cooled heat exchanger 612 ... Forced ventilation room 552 ... Forced ventilation room 614 ... Slit Type nozzle 553 ... injection nozzle 620 ... discharge chamber 555 ... fan suction 622 ... blower unit (please read the precautions on the back before filling this page), can | ---- line_ f This paper size is applicable to China National Standard (CNS) A4 Regulation (210X297 mm) 82

Claims (1)

6. Scope of Patent Application 1. A gas discharge laser system with extremely high repetition rate, which can operate at a pulse wave repetition rate of more than 4,000 pulses per second. This type of laser system includes: A) — contains one Laser gas and laser discharge chamber with two elongated electrodes, which can define a discharge area, B)-prostitute fan system, which can generate laser gas with sufficient gas velocity in the above discharge area, so that When operating at a repetition rate in the range of 6,000 pulses per second or more, immediately after each pulse, before the next pulse, the discharge area from the discharge area is substantially cleared. All ions, C) a thermal parent converter system, which can remove at least 16 kw of thermal energy from the laser gas described above, D) a pulse wave power system, which can provide some electrical pulse waves to the configuration Electrode, sufficient to generate laser pulses with precisely controlled pulse energy in the range of approximately 5 mJ at a rate of approximately 6,000 pulses per second, and E) a laser beam measurement Cum control system, which can pulse energy and wave The feedback control, or to measure the pulse wave of each pulse energy substantially, wavelength, and bandwidth of each pulse. 2. If the gas discharge laser system of item 1 of the patent application scope, wherein the discharge laser system is KrF, excimer laser system, and its laser gas is composed of radon gas, fluorine gas and neon gas . 3. The gas discharge laser system according to item 1 of the patent application scope, wherein the discharge laser system is ArF, the excimer laser system, and the laser gas is composed of argon, fluorine and neon. . 83 (21 () X297). For example, the oldest gas discharge laser system in the scope of patent application, of which the electric laser system is F2, and it includes fluorine gas and a buffer gas. • If the gas discharge laser system in the scope of patent application No.1, the discharge of which is upstream of its discharge area, it also includes a _blade structure, which can normalize the gas velocity upstream of its discharge area. 6 · If the scope of patent application is the first! The gas discharge laser system of the item, in which the wind ▽ fan 'comprises a shaft driven by two brushless DC motors. 7. If the gas discharge laser system of item 6 of the patent application, the motors are some water-cooled motors. 8. If the gas-discharge laser system of item 6 of the scope of the patent application, each of the motors includes a stator, and each of these motors includes a rotor, which is mounted on-which can make its stator and "Laser gas phase pressure shield". 9. The tangential fan of the gas discharge laser system in item 6 of the patent application includes a blade structure made of aluminum. 10. The gas discharge laser system of item 9 of the patent application, wherein the blade structure has an outer diameter of about five inches. 11. The gas discharge laser system according to item 6 of the patent application, wherein the motor is a sensorless motor, and further includes a main control motor controller that can control one of the motors, and a Slave motor controller for controlling other motors. 12. The gas discharge laser system according to item i of the patent application range, wherein the heat exchanger system with fins is water-cooled. 13. The gas discharge laser system according to item 12 of the patent application, wherein the heat of the patent application includes a volume exchanger system including at least four independent water-cooled heat exchangers. 14. The gas discharge laser system according to item 12 of the patent application, wherein the heat exchanger system includes at least one heat exchanger having a tubular water flow channel, and at least one turbulent system is located in the path . I5. The gas discharge laser system according to item 13 of the scope of the patent application, wherein each of the four heat exchangers is a tubular water flow channel including a full flow device. 16. The gas discharge laser system according to item 1 of the scope of patent application, wherein the pulse wave power system includes some water-cooled electrical components. P. For example, the gas discharge laser system of the patent application No. 16 wherein at least one water-cooled module is a module operating at a high voltage exceeding 12,000 volts. 18. The gas discharge laser system according to item 17 of the scope of patent application, wherein the high voltage is separated from the ground by an inductor in which cooling water flows. 19. The gas discharge laser system according to item 1 of the scope of the patent application, wherein the pulse wave power system includes a resonance charging system, which can charge a charging capacitor to a voltage that is precisely controlled. 20. The gas discharge laser system according to item 19 of the patent application scope, wherein the resonance charging system 'includes a Q-removing circuit. 21. The gas discharge laser system according to item 19 of the patent application scope, wherein the resonance charging system includes a power distribution circuit. 22. The gas discharge laser system according to item 19 of the patent application scope, wherein the resonance charging system includes a Q-removing circuit and a power distribution circuit. 23. Such as the scope of patent application! The gas discharge laser system of the item, wherein the pulse power system includes a charging system, which is composed of at least three power supplies arranged in parallel. 24. For example, the gas discharge laser system in the scope of the patent application, the laser beam measurement and control system includes an etalon unit, a light emitting diode array, a programmable logic device, and An optical device that enables the laser light wave from its etalon unit to focus on its light emitting diode array. The programmable logic device can be programmed to analyze the data from its light emitting diode array. Determine the position of the 10th etalon stripe on its light-emitting diode array. 25. If the gas discharge laser system of the 24th scope of the patent application, the measurement and control system therein also includes a microprocessor, which can be programmed to facilitate the stripe data located by its programmable logic device Calculate the true wavelength and bandwidth. 26. For the gas discharge laser system in the scope of patent application No. 24, the privatizable logic device can be programmed with an algorithm to calculate the wavelength and bandwidth based on the measured values of these stripes. 27. For the gas discharge laser system in the scope of patent application No. 26, the programmable logic device in the configuration can be used to calculate the wave length and bandwidth in faster than 丨 / ⑺ ... leap second. 28. The gas discharge laser system according to item 26 of the patent application, wherein the standard tool unit is composed of a diffractive diffusing element. 29. The gas discharge laser system according to item 1 of the scope of patent application, and further comprising a device driven by a PZT driver at least partially A8 B8 C8 D8 Patent application scope A line narrowing unit composed of a modulation mirror. 30. If the gas discharge laser system according to item 29 of the patent application scope, the adjustment mirror is also partially driven by a stepping motor. 5 31. The gas discharge laser system according to item 29 of the patent application, and further comprising a pre-modulator. 32. The gas discharge laser system according to item 29 of the patent application, and further comprising an active modulator, which includes a learning algorithm. 33. For example, the gas discharge laser system in the scope of patent application No. 29, and the system further includes an adaptive feedforward algorithm. Revision 34. If the gas discharge laser system of item 29 of the patent application scope, the linearization unit το includes a grating that can define a grating surface, and a purifier that can force the purification gas to be adjacent to the grating surface. 35. If the gas discharge laser system of item 34 of the patent application scope, the purified gas is nitrogen. Line 36. If the gas discharge laser system of item 34 of the patent application scope, the purification gas is helium. 37. The gas discharge laser system according to the scope of the patent application, and further comprising a nitrogen purifying system, which includes a nitrogen purifying system composed of a nitrogen filter. 20 38. The gas discharge laser system according to item 1 of the scope of patent application, and further includes a nitrogen purifying module, which includes some flow monitors, and the laser system includes some which can be used to transport the laser gas from it. Exhaust gas purifying exhaust pipe. 39. For example, the gas discharge laser system in the scope of the patent application, and the paper-like Zhongguanjia Standard (CNS) A4 specification UlGX297 Gong Chuding 87 The vI includes a light valve unit, which includes an electrically operated light valve and a wattmeter that is positioned into a laser output beam path. 5 The gas discharge laser system of claim 29 and the system for enclosing and closing the beam, which can provide a first beam seal between the first window and the second line of the discharge chamber of the discharge chamber, A second beam seal is provided between the second window of the discharge 2 and an output coupler unit, and each of these beam seals includes a metal telescoping bag. 10 If the gas discharge laser system of claim 40 is patented, each of the first and second beams is sealed in the configuration, allowing the laser discharge chamber to be easily replaced. 42. If the gas discharge laser system of the scope of patent application No. 4Q, each beam is sealed and does not contain an elastomer, which can provide vibration isolation from its discharge chamber, which can isolate the beam array from large gasses, and can Allows unlimited replacement of its laser discharge chamber without disturbing its LNP or output light-coupler unit. 43. If the gas discharge laser system according to the scope of the patent application, the measurement and control system includes: a primary beam splitter, which can separate a small percentage of the output pulse from the laser; Two beam splitters, 20 of which can direct a small percentage of the above, to their pulse energy detector, and a tool 'which enables a primary beam splitter, a second beam splitter, and its The volume of a window of the pulse energy primary detector is isolated from other parts of this measurement and control system, thereby defining an isolated area. This paper size applies the Chinese National Standard (CNS) A4 specification (210X297). &Quot; I ~~ 7- 1 year (ο month, QG positive '__ ^ Supplementary patent application scope 44. ^ Patent application scope item 43 Gas discharge laser system, and 32 TIL · * 1§ 0 45 which is purged by VL including TK gas to purify the isolation area. 45. For example, the gas discharge laser system of the 44th scope of the patent application, the laser system is It further includes an output surface coupler unit and an output window unit. The purifier is configured so that the exhaust gas from the isolated area can also be used to purify the output light coupler unit and the output window unit. 46 · If the oldest gas discharge laser system in the scope of the patent application, the discharge chamber also includes a current circuit, which has some ribs with a generally rectangular cross section 'their elongated directions are tied to their lasers In the direction of the gas flow. C. For example, the oldest gas discharge laser system in the scope of the patent application, wherein the discharge chamber includes an anode and dielectric spacers on both sides of the anode, so as to improve the space between the two electrodes. Laser airflow in the area. The oldest gas-discharge laser system, such as the patent application scope, in which the pulsed power system includes a corona plate, which is electrically connected to a wave crest by some metal rods. The capacitors of the capacitor bank, and one of the electrodes, the metal rods are selected in length so as to provide an increased inductance. 49. The gas discharge laser system of item 1 in the scope of patent application, where The discharge area can be defined by an average width, and the configuration of the electrodes can be limited to an average width of less than 2 mm. 50. For example, the gas discharge laser system of the 49th scope of the patent application, each of which Scope of patent application The electrode 'may define a discharge surface, and at least one electrode system is composed of a conductor whose discharge surface is covered with an insulating material having a plurality of discharge holes. 51. The gas discharge laser system according to item 50 of the patent application, wherein the system is a substantially circular hole having a diameter ranging from 50 to 200 m. 52. The gas discharge laser system according to item 51 of the patent application, wherein the diameter is about 100 microns. 53. In the case of a gas discharge laser system of the scope of application for patent No. 50, two of the electrodes are such that their discharge surfaces are covered with an insulating material having a plurality of discharge holes. 54. The gas discharge laser system of claim 50, wherein the insulating material is alumina. 55. The gas discharge laser system as described in the first item of the patent application scope, wherein the thermal parent converter system includes at least one water-cooled heat exchanger with fins, which has a dual-channel cooling water flow direction. The direction of water flow 'is opposite to that in the other tube. 56. For example, the gas discharge laser system of the scope of patent application, wherein the heat exchanger system includes at least a water-cooled heat exchanger with fins, and a proportional valve and a fast-acting digital clutch Valve water flow control system. 57. For example, the oldest gas discharge laser system in the scope of the patent application, where the heat exchanger line is composed of a single unit heat exchange ^, which is made by cooling some heat sinks in a part of the discharge chamber. And was built into. 5 & For example, the gas discharge laser system of the 57th in the scope of patent application, where ‘the scope of the patent application, the body heat exchange11, includes most of the cooling tubes that are in thermal contact with the cooling > 59. For example, the gas discharge laser system W in the scope of the patent application, and the pre-ionizer that has been incorporated into a long conductor integrally formed in an electric dust insulator, the conductor is located next to and Parallel one of the elongated electrodes. 60. The gas discharge laser system according to the scope of the patent application, and further comprising a suction device, which is downstream of at least one long electrode, can be used to improve the laser gas flow in the discharge area. 61. The gas discharge laser system according to the scope of the patent application, and further comprising a ceramic bearing for supporting a shaft of one of its blowers. 62. The gas discharge laser system according to item 61 of the patent application, wherein the ceramic bearing includes some ceramic positioning rings. 63. The gas discharge laser system according to item 61 of the patent application, wherein the ceramic bearing system includes: a non-locating ring groove plate, some ceramic ball bearings, and some isolated balls with a diameter smaller than that of the ceramic ball bearings. 64. If the gas discharge laser system of the first patent application scope, the blower system includes an injection circulator, in which a part of the laser gas flow in the discharge chamber, will be from the discharge chamber. It is drawn out, pressurized and injected back into its discharge chamber, thereby generating a circulating laser gas flow. 65. The gas discharge laser system according to item 1 of the patent application scope, wherein the blower system includes a blower outside the laser discharge chamber. 66. If the gas discharge laser system of the scope of patent application No. 65, the heat of which is 573389 Patent Application Scope The parent switch system 'includes a heat exchanger co-located with its blower. 67. The gas discharge laser system according to item 65 of the patent application, wherein the heat exchanger system includes a heat exchanger inside the laser discharge chamber. . 68. The gas discharge laser system according to item 1 of the patent application scope, wherein the blower system is composed of a blower driven by a turbine driver. Installation 69. The gas discharge laser system according to item 68 of the patent application, wherein the hydraulic turbine driver includes a magnetic coupling which can couple its driving force to the shaft of a laser gas blower. Alignment The paper size is applicable to the 11-county standard (CNS) A4 specification (210X2974 ^) II—92 一 Γ