TW570290U - Uniform pressing device for nanometer transfer-print - Google Patents

Uniform pressing device for nanometer transfer-print

Info

Publication number
TW570290U
TW570290U TW092208080U TW92208080U TW570290U TW 570290 U TW570290 U TW 570290U TW 092208080 U TW092208080 U TW 092208080U TW 92208080 U TW92208080 U TW 92208080U TW 570290 U TW570290 U TW 570290U
Authority
TW
Taiwan
Prior art keywords
print
pressing device
uniform pressing
nanometer transfer
nanometer
Prior art date
Application number
TW092208080U
Other languages
English (en)
Inventor
Yung-Jen Jung
Jia-Hung Lin
Jia-Jiun Shiu
Chuan-Feng Chen
Wen-Hung Feng
Original Assignee
Ind Tech Res Inst
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ind Tech Res Inst filed Critical Ind Tech Res Inst
Priority to TW092208080U priority Critical patent/TW570290U/zh
Priority to US10/663,830 priority patent/US6994541B2/en
Publication of TW570290U publication Critical patent/TW570290U/zh

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
    • B29C2059/023—Microembossing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S425/00—Plastic article or earthenware shaping or treating: apparatus
    • Y10S425/019—Flexible fluid pressure

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW092208080U 2003-05-02 2003-05-02 Uniform pressing device for nanometer transfer-print TW570290U (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
TW092208080U TW570290U (en) 2003-05-02 2003-05-02 Uniform pressing device for nanometer transfer-print
US10/663,830 US6994541B2 (en) 2003-05-02 2003-09-17 Uniform pressing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW092208080U TW570290U (en) 2003-05-02 2003-05-02 Uniform pressing device for nanometer transfer-print

Publications (1)

Publication Number Publication Date
TW570290U true TW570290U (en) 2004-01-01

Family

ID=32591762

Family Applications (1)

Application Number Title Priority Date Filing Date
TW092208080U TW570290U (en) 2003-05-02 2003-05-02 Uniform pressing device for nanometer transfer-print

Country Status (2)

Country Link
US (1) US6994541B2 (zh)
TW (1) TW570290U (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102103283B (zh) * 2009-12-18 2013-07-03 乐金显示有限公司 制造平板显示器的装置和方法

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US7066234B2 (en) 2001-04-25 2006-06-27 Alcove Surfaces Gmbh Stamping tool, casting mold and methods for structuring a surface of a work piece
CA2380114C (en) * 2002-04-04 2010-01-19 Obducat Aktiebolag Imprint method and device
US7179079B2 (en) * 2002-07-08 2007-02-20 Molecular Imprints, Inc. Conforming template for patterning liquids disposed on substrates
US20080160129A1 (en) * 2006-05-11 2008-07-03 Molecular Imprints, Inc. Template Having a Varying Thickness to Facilitate Expelling a Gas Positioned Between a Substrate and the Template
US6939120B1 (en) * 2002-09-12 2005-09-06 Komag, Inc. Disk alignment apparatus and method for patterned media production
JP2005153091A (ja) * 2003-11-27 2005-06-16 Hitachi Ltd 転写方法及び転写装置
US7686606B2 (en) 2004-01-20 2010-03-30 Wd Media, Inc. Imprint embossing alignment system
JPWO2005075184A1 (ja) * 2004-02-04 2007-10-11 住友重機械工業株式会社 加圧成形装置、金型及び加圧成形方法
US7730834B2 (en) * 2004-03-04 2010-06-08 Asml Netherlands B.V. Printing apparatus and device manufacturing method
US8025831B2 (en) * 2004-05-24 2011-09-27 Agency For Science, Technology And Research Imprinting of supported and free-standing 3-D micro- or nano-structures
US7641468B2 (en) * 2004-09-01 2010-01-05 Hewlett-Packard Development Company, L.P. Imprint lithography apparatus and method employing an effective pressure
US20070164476A1 (en) * 2004-09-01 2007-07-19 Wei Wu Contact lithography apparatus and method employing substrate deformation
JP2006165371A (ja) * 2004-12-09 2006-06-22 Canon Inc 転写装置およびデバイス製造方法
US7676088B2 (en) 2004-12-23 2010-03-09 Asml Netherlands B.V. Imprint lithography
US7686970B2 (en) * 2004-12-30 2010-03-30 Asml Netherlands B.V. Imprint lithography
US7490547B2 (en) * 2004-12-30 2009-02-17 Asml Netherlands B.V. Imprint lithography
CN100541326C (zh) * 2004-12-30 2009-09-16 中国科学院电工研究所 纳米级别图形的压印制造方法及其装置
US20060144274A1 (en) * 2004-12-30 2006-07-06 Asml Netherlands B.V. Imprint lithography
US20060144814A1 (en) * 2004-12-30 2006-07-06 Asml Netherlands B.V. Imprint lithography
US7354698B2 (en) * 2005-01-07 2008-04-08 Asml Netherlands B.V. Imprint lithography
US7798801B2 (en) * 2005-01-31 2010-09-21 Molecular Imprints, Inc. Chucking system for nano-manufacturing
US7922474B2 (en) * 2005-02-17 2011-04-12 Asml Netherlands B.V. Imprint lithography
US7523701B2 (en) * 2005-03-07 2009-04-28 Asml Netherlands B.V. Imprint lithography method and apparatus
US7762186B2 (en) * 2005-04-19 2010-07-27 Asml Netherlands B.V. Imprint lithography
US7611348B2 (en) * 2005-04-19 2009-11-03 Asml Netherlands B.V. Imprint lithography
TWI271777B (en) * 2005-04-27 2007-01-21 Ind Tech Res Inst Uniform pressing micro-nano transfer printing apparatus
US7442029B2 (en) 2005-05-16 2008-10-28 Asml Netherlands B.V. Imprint lithography
US20060267231A1 (en) * 2005-05-27 2006-11-30 Asml Netherlands B.V. Imprint lithography
US7692771B2 (en) * 2005-05-27 2010-04-06 Asml Netherlands B.V. Imprint lithography
US7708924B2 (en) * 2005-07-21 2010-05-04 Asml Netherlands B.V. Imprint lithography
US7418902B2 (en) * 2005-05-31 2008-09-02 Asml Netherlands B.V. Imprint lithography including alignment
US7377764B2 (en) * 2005-06-13 2008-05-27 Asml Netherlands B.V. Imprint lithography
US20070023976A1 (en) * 2005-07-26 2007-02-01 Asml Netherlands B.V. Imprint lithography
DE102005041505B3 (de) * 2005-09-01 2007-04-26 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zum Abformen von Strukturen
US7316554B2 (en) * 2005-09-21 2008-01-08 Molecular Imprints, Inc. System to control an atmosphere between a body and a substrate
US8011915B2 (en) 2005-11-04 2011-09-06 Asml Netherlands B.V. Imprint lithography
US7878791B2 (en) * 2005-11-04 2011-02-01 Asml Netherlands B.V. Imprint lithography
CN100498526C (zh) * 2005-12-15 2009-06-10 中国科学院光电技术研究所 多铰链纳米压印压模倾斜校正机构
US7517211B2 (en) 2005-12-21 2009-04-14 Asml Netherlands B.V. Imprint lithography
US20070138699A1 (en) * 2005-12-21 2007-06-21 Asml Netherlands B.V. Imprint lithography
CN100498527C (zh) * 2005-12-27 2009-06-10 中国科学院光电技术研究所 圆弧导轨纳米压印倾斜校正机构
US7377765B2 (en) * 2006-02-14 2008-05-27 Hitachi Global Storage Technologies System, method, and apparatus for non-contact and diffuse curing exposure for making photopolymer nanoimprinting stamper
US20070200276A1 (en) * 2006-02-24 2007-08-30 Micron Technology, Inc. Method for rapid printing of near-field and imprint lithographic features
US8318253B2 (en) * 2006-06-30 2012-11-27 Asml Netherlands B.V. Imprint lithography
US8015939B2 (en) * 2006-06-30 2011-09-13 Asml Netherlands B.V. Imprintable medium dispenser
US7830498B2 (en) * 2006-10-10 2010-11-09 Hewlett-Packard Development Company, L.P. Hydraulic-facilitated contact lithography apparatus, system and method
US7768628B2 (en) * 2006-10-12 2010-08-03 Hewlett-Packard Development Company, L.P. Contact lithography apparatus and method
CN101600993B (zh) 2007-02-06 2013-01-16 佳能株式会社 刻印方法和刻印装置
WO2008142784A1 (ja) * 2007-05-23 2008-11-27 Pioneer Corporation インプリント装置
US20090038636A1 (en) * 2007-08-09 2009-02-12 Asml Netherlands B.V. Cleaning method
US7854877B2 (en) 2007-08-14 2010-12-21 Asml Netherlands B.V. Lithography meandering order
US8144309B2 (en) * 2007-09-05 2012-03-27 Asml Netherlands B.V. Imprint lithography
US7462029B1 (en) * 2007-10-22 2008-12-09 Jung-Chung Hung Uniform pressing apparatus for use in a micro-nano imprint process
EP2348359B1 (en) * 2008-02-27 2013-04-24 Sharp Kabushiki Kaisha Roller nanoimprint apparatus
TWI342270B (en) * 2008-07-15 2011-05-21 Univ Nat Taiwan Specific-light-cured and pressure-differential embossing apparatus
US20100015270A1 (en) * 2008-07-15 2010-01-21 Molecular Imprints, Inc. Inner cavity system for nano-imprint lithography
US20100239701A1 (en) * 2009-03-20 2010-09-23 Ren Haw Chen Molding structure with independent thermal control and its molding method
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US8261660B2 (en) * 2009-07-22 2012-09-11 Semprius, Inc. Vacuum coupled tool apparatus for dry transfer printing semiconductor elements
US9330685B1 (en) 2009-11-06 2016-05-03 WD Media, LLC Press system for nano-imprinting of recording media with a two step pressing method
US8496466B1 (en) 2009-11-06 2013-07-30 WD Media, LLC Press system with interleaved embossing foil holders for nano-imprinting of recording media
US8402638B1 (en) 2009-11-06 2013-03-26 Wd Media, Inc. Press system with embossing foil free to expand for nano-imprinting of recording media
KR101309865B1 (ko) * 2009-12-23 2013-09-16 엘지디스플레이 주식회사 평판 표시 소자의 제조 장치 및 방법
TWI395657B (zh) * 2010-06-30 2013-05-11 Univ Nat Taiwan Science Tech 微奈米轉印製程之夾持裝置
NL2006929A (en) * 2010-08-05 2012-02-13 Asml Netherlands Bv Imprint lithography.
WO2013044181A1 (en) * 2011-09-23 2013-03-28 1366 Technologies Inc. Methods and apparati for handling, heating and cooling a substrate upon which a pattern is made by a tool in heat flowable material coating, including substrate transport, tool laydown, tool tensioning, and tool retraction
US20140239529A1 (en) * 2012-09-28 2014-08-28 Nanonex Corporation System and Methods For Nano-Scale Manufacturing
CN102866582B (zh) * 2012-09-29 2014-09-10 兰红波 一种用于高亮度led图形化的纳米压印装置和方法

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US5967030A (en) * 1995-11-17 1999-10-19 Micron Technology, Inc. Global planarization method and apparatus
DE19648844C1 (de) 1996-11-26 1997-09-18 Jenoptik Jena Gmbh Einrichtung und Verfahren zur Abformung mikrosystemtechnischer Strukturen
SE515607C2 (sv) 1999-12-10 2001-09-10 Obducat Ab Anordning och metod vid tillverkning av strukturer

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102103283B (zh) * 2009-12-18 2013-07-03 乐金显示有限公司 制造平板显示器的装置和方法

Also Published As

Publication number Publication date
US6994541B2 (en) 2006-02-07
US20040219249A1 (en) 2004-11-04

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Legal Events

Date Code Title Description
GD4K Issue of patent certificate for granted utility model filed before june 30, 2004
MK4K Expiration of patent term of a granted utility model