TW533559B - Chip package structure and its manufacturing process - Google Patents

Chip package structure and its manufacturing process Download PDF

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Publication number
TW533559B
TW533559B TW090131210A TW90131210A TW533559B TW 533559 B TW533559 B TW 533559B TW 090131210 A TW090131210 A TW 090131210A TW 90131210 A TW90131210 A TW 90131210A TW 533559 B TW533559 B TW 533559B
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Taiwan
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layer
scope
patent application
item
packaging process
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TW090131210A
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Chinese (zh)
Inventor
Mau-Shiung Lin
Jin-Yuan Li
Jin-Cheng Huang
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Megic Corp
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/93Batch processes
    • H01L24/95Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
    • H01L24/97Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/04105Bonding areas formed on an encapsulation of the semiconductor or solid-state body, e.g. bonding areas on chip-scale packages
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/12Structure, shape, material or disposition of the bump connectors prior to the connecting process
    • H01L2224/12105Bump connectors formed on an encapsulation of the semiconductor or solid-state body, e.g. bumps on chip-scale packages
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/18High density interconnect [HDI] connectors; Manufacturing methods related thereto
    • H01L2224/19Manufacturing methods of high density interconnect preforms
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/18High density interconnect [HDI] connectors; Manufacturing methods related thereto
    • H01L2224/20Structure, shape, material or disposition of high density interconnect preforms
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/1515Shape
    • H01L2924/15153Shape the die mounting substrate comprising a recess for hosting the device

Abstract

A chip package structure and its manufacturing process are disclosed in the present invention. In the invention, a chip is bonded to a glass substrate, and a laminated circuit layer having an external circuit is formed on the chip and the glass substrate. Part of the external circuit is electrically connected to metal pad of the chip and is extended to the region except that above the active surface of the chip for fanning out the metal pad of the chip to the region except that above the active surface of the chip. In addition, the active surface of the chip even has an internal circuit and plural active devices such that signal can be transmitted from an active device to the external circuit via the internal circuit and is transmitted from the external circuit to the other active device via the internal circuit. Furthermore, it is capable of integrating the chips having the same function or different functions in a packaging body so as to make the chips electrically connect with each other through the external circuit.

Description

533559 AS B8 C8 D8 六 申請專利範園 2. 一種晶片封裝結構’至少包括: 一破璃基板; 複數個晶片,每一該些晶片分別具有一主動表面及 對應之一背面,且每一該些晶片更分別具有複數侗 金屬墊,其配置於對應之該主動表面上,而該些晶 片係以該背面貼附於該玻璃基板上;以及 —阳 一積層線路層’配置於該玻璃基板及該些晶片上, 該積層線路層具有一外部線路,其中該些外部線路 係電性連接該些晶片之該些金屬墊,且至少部分該 外部線路係延伸至該晶片之該主動表面上方以外= 區域並且該外部線路具有複數個接合墊,其位於 該稽層線路層之表層,而每一該些接合墊係分別電 性連接至該些晶片之部分該些金屬墊之一,其中該 '積層線路層至少包括一圖案化導線層、一介電層2 .複數個導電插塞,而該介電層係配置於該玻璃純 及該晶片之上,且該圖案化導線層係配置於該介電 層之上’並且該些導電插塞係分別貫穿該介電層, 而電性連接該圖案化導線層及該晶片之該些金屬塾 ,其中該圖案化導線層及該些導電插塞係構成該外 部線路,旦該圖案化導線層係形.成該些接合塾,該 外部線路更包括至少-被動元件,其中該被動元件 係由該圖案化導.線層之部分結構所構成,其中該圖 '案化導線層之材質為銅。 142981-1001111.doc 本紙張尺度適用中國國家標準(CNS) Α4规格(210 X 297公釐) 533559 A8 B8 C8 D8 六、申請專利範園 3 · 一種晶片封裝製程,至少包括: 提供一玻璃基板’該玻璃基板具有一 提供複數個晶片,每一該些晶片分別 面及對應之一背面,且每一該些晶片 數個金屬墊,其分別配置於對應之該 並將該些晶片以該背面貼附於該玻璃 配置一第_介電層於該玻璃基板之該 片之該主動表面之上,其中該第一介 個第一貫孔,其分別對應該些金屬墊 介電層; 填入導電材料於該些第一貫孔,而分 第一導電插塞;以及 配置一第一圖案化導線層於該第一介 中該第一圖案化導線層係透過該些第 該些第一導電插塞,而與該些金屬墊 且部分該第一圖案化導線層係延伸至 主動表面上方以外的區域,其中該第 層更具有複數個第一接合蟄。 4.如申請專利-範圍第_3項所述之晶片封 該玻璃基板更具有複數個tHJ穴’其分 璃基板之該表面,而該些晶片係以該 於該些凹六之一的底壁。 142981-1001111.doc .本纸張尺度適用中國國家標車(CNS) A4規格(210 X 297公釐). 表面; 具有一主動表 更分別具有複 主動表面上., 基板之該表面 表面及該些晶 電層具有複數 而貫穿該第一 別形成複數個 電層之上,其 一貫孔之内的 相電性連接, 該些晶片之.該 一圖案化導線 裝製程,其中 別凹陷於該玻 背面分別貼附533559 AS B8 C8 D8 Six-patent patent fan park 2. A chip packaging structure 'at least includes: a broken glass substrate; a plurality of wafers, each of which has an active surface and a corresponding back surface, and each of these The wafers each have a plurality of metal pads, which are disposed on the corresponding active surface, and the wafers are attached to the glass substrate with the back surface; and-a laminated circuit layer is disposed on the glass substrate and the On these chips, the laminated circuit layer has an external circuit, wherein the external circuits are electrically connected to the metal pads of the chips, and at least part of the external circuits extend beyond the active surface of the chip = area In addition, the external circuit has a plurality of bonding pads, which are located on the surface layer of the wiring layer, and each of the bonding pads is electrically connected to one of the metal pads and a part of the wafers respectively. The layer includes at least a patterned wire layer, a dielectric layer 2. A plurality of conductive plugs, and the dielectric layer is disposed on the glass substrate and the wafer, and the pattern The wire layer is disposed on the dielectric layer, and the conductive plugs respectively penetrate the dielectric layer, and are electrically connected to the patterned wire layer and the metal ridges of the chip, wherein the patterned wire layer And the conductive plugs form the external circuit, and once the patterned wire layer is formed. To form the bonding pads, the external circuit further includes at least a passive element, wherein the passive element is guided by the patterned wire layer. It is composed of a part of the structure, in which the material of the patterned wire layer is copper. 142981-1001111.doc This paper size is applicable to Chinese National Standard (CNS) A4 specification (210 X 297 mm) 533559 A8 B8 C8 D8 VI. Patent application park 3 · A chip packaging process, including at least: Provide a glass substrate ' The glass substrate has a plurality of wafers provided, each of the wafers has a corresponding surface and a corresponding one of the back surfaces, and each of the wafers has a plurality of metal pads, which are respectively disposed on the corresponding ones and the wafers are pasted on the back surface Attached to the glass is a first dielectric layer on the active surface of the sheet of the glass substrate, where the first dielectric first through holes respectively correspond to the metal pad dielectric layers; filled with conductive The first through-holes are divided into the first conductive plugs by a material; and a first patterned conductive layer is disposed in the first intermediary, and the first patterned conductive layer passes through the first conductive plugs. Plug, and the metal pads and part of the first patterned wire layer extend to areas beyond the active surface, wherein the first layer further has a plurality of first bonding pads. 4. According to the patent-scope item _3, the glass substrate has a plurality of tHJ holes, the surface of the glass substrate, and the wafers are based on the bottom of one of the recesses. wall. 142981-1001111.doc. This paper size applies to China National Standard Car (CNS) A4 specification (210 X 297 mm). Surface; has an active watch and more complex active surface, respectively, the surface of the substrate and the surface The crystalline electrical layers have a plurality of electrical layers that pass through the first layer to form a plurality of electrical layers, and are electrically connected within a through hole, the wafer, the patterned wire assembly process, and do not dent in the glass. Separately attached on the back

533559 AS B8 C8 D8 六、申請專利範圍 5 ·如申請專利範圍第4項所述之晶片封裝 該些凹穴的深度係分別等於該些晶片的 6. 如申請專利範圍第4項所述之晶片封裝 該些凹穴係利用微影蝕刻的方式形成。 7. 如申請專利範圍第5項所述之晶片封裝 該玻璃基板係包括由圖案化之一玻璃層 相叠合而成,·而該表面係為該玻璃層之 .層之一面,且該玻璃層具有複數個開口 玻璃層,並,且該些開口之側壁與該導熱 別構成該些凹穴,而該些晶片係以該背 凹穴之一的底壁。 '8.如申請專利範圍第7項所述之晶片封裝 該些開口係以微影蝕刻的方式,並以該 刻終點,而.形成於該玻璃層上。 9.如申請專利範圍第7項所述之晶片封裝 該玻璃層的厚度係等於該些晶片的厚度 1 0.如申請專利範圍第7項所述之晶片封裝 該導熱層之材質包括金屬。 1 1 ·如申請專利範圍第3項所述之晶片封裝 在貼附該些晶片之後,並在配置該第一 .,更包括形成一填充層於該玻璃基板之 ,且環繞於該些晶片之周緣,並且該填 係對齊該些晶片之該主動表面。 '142981-10011Il.doc -4- 本纸張尺度適用中國國家標準(CMS) A4規格(210X297公釐). 製程,其中 厚度。 製程,其中 製程,其中 及一導熱層 遠離該導熱 ,其貫穿該 層之表面分 面貼附於該 製程,其中 導熱層.為蝕 I 製程,.其中 Ο 製程,其中 製程,其中 介電層之前 該表面之土 充層之頂面 533559533559 AS B8 C8 D8 6. Application for patent scope 5 · The depth of the recesses encapsulated by the chip as described in item 4 of the patent application scope is equal to the wafers respectively 6. The chip as described in item 4 of the patent application scope The cavities are formed by lithographic etching. 7. The chip package according to item 5 of the scope of the patent application, the glass substrate comprises a patterned glass layer, and the surface is one of the layers of the glass layer, and the glass The layer has a plurality of opening glass layers, and the side walls of the openings and the thermal conductor constitute the cavities, and the wafers are bottom walls of one of the back cavities. '8. The chip package as described in item 7 of the scope of the patent application. The openings are formed on the glass layer by lithographic etching and ending at the moment. 9. The chip package according to item 7 in the scope of the patent application. The thickness of the glass layer is equal to the thickness of the wafers. 10. The chip package according to item 7 in the scope of the patent application. The material of the thermally conductive layer includes metal. 1 1 · The chip package as described in item 3 of the scope of patent application, after attaching the wafers, and configuring the first one, further includes forming a filling layer on the glass substrate and surrounding the wafers. The perimeter, and the pad is aligned with the active surface of the wafers. '142981-10011Il.doc -4- The size of this paper applies to the Chinese National Standard (CMS) A4 specification (210X297 mm). Process, including thickness. Process, in which the process and a thermally conductive layer are far away from the thermal conductivity, which is attached to the process through the surface of the layer, wherein the thermally conductive layer is the etch I process, where the 0 process, the process, and the dielectric layer before Top surface of soil filling layer on this surface 533559

AS B8 C8 D8 六、申請專利範圍 12.如申請專利範圍第1 1項所述之晶片封裝製程,其中 該填充層之材質包括環氧化物及聚合物其中之一。 1 3.如申請專利範圍第3項所述之晶片封裝製程,其中 該第一介電層之材質包括聚醯亞胺、苯基環丁烯、 多孔性介電材料及彈性緩衝材料其中之一。 1 4.如申請專利範圍第3項所述之晶片封裝製程,其中 配置該第一圖案化導線層於該第一介電層之上的方 法包括濺鍍、有電電鍍及無電電鍍其中之一。 15. 如申請專利範圍第3項所述.之晶片封裝製程,其中 在配置第一圖案化導電層於該第一介電層之上時, .可一併將該第一圖案化導線層之導電材料填入該些 第一貫孔内,而分別形成該些第一導電插塞。 16. 如申請專利範圍第14項所述之晶片封裝製程,更包 括配置圖案化之一保護層於該第一介電層及該第一 圖案化導線層之上,.並暴露出該些第一接合墊。 1 7.如申請專利範圍第3項所述之晶片封裝製程,更包 括分別配置一接點於該些第一接合墊上。 1 8.如申請專利範圍第1 7項所述之晶片封裝製程,其中 該些接點之型態包括銲球、凸塊及針腳其中之一。 1 9.如申請專利範圍第3項所述之晶片封裝製程,在分 別配置該些接點於該些接合墊上之後,更包括分割 該些晶片之封裝結構。 20.如申請專利範圍第19項所述之晶片封裝製程,其中 142981-1001111.doc -5- 本紙張尺度適用中國國家標準(CNS) A4規格(210X 297公釐)· 533559 AS B8 C8 D8 、申請專利範圍 在分割該些晶片之封裝結構時,係以單顆晶片為單 位進行分割。 2 1.如申請專利範圍第20項所述之晶片封裝製程,其中 在分割該些晶片之封裝結構時,係以多顆晶片為單 位進行分割。 2 2.如申請專利範圍第3項所述之晶片封裝製程,更包 括: (a) 配置一第二介電層於該第一介電層及該第一圖 案化導線層之上,其中 '該第二介電層具有複數個第 二貫孔,其分別對應該第一接合墊而貫穿該第二介 .電層; (b) 填入導電材料於該些第二貫孔,而分別形成複 數個第二導電插塞;以及 (c) 配置一第二圖案化導線層於該第二介電層之上 ,其中該第二圖案化導線層係經由該些第二導電插 線.〕 •.」 塞,而與該第一圖案化導線層相電性連接,且部分 該第二圖案化導線層係延伸至該些晶片之該主動表 面上方以外的區域,其中該第二圖案化導線層更具 有複數個第二接合墊。 23 ·如申請專利範圍第22項所述之晶片封裝製程,其中 該第二介電層之材質包括聚乙醢胺、苯基環丁烯、 多孔性介電材料及彈性缓衝材料其中之一。 24.如申請專利範圍第22項所述之晶片封裝製程,其中 14298M001111.doc 本紙張尺度適用中國國家標準(CNS) Α4規格(210Χ 297公釐). 533559AS B8 C8 D8 6. Scope of patent application 12. The chip packaging process according to item 11 of the scope of patent application, wherein the material of the filling layer includes one of epoxy and polymer. 1 3. The chip packaging process according to item 3 of the scope of patent application, wherein the material of the first dielectric layer includes one of polyimide, phenylcyclobutene, porous dielectric material, and elastic buffer material. . 1 4. The chip packaging process according to item 3 of the scope of patent application, wherein the method of disposing the first patterned wire layer on the first dielectric layer includes one of sputtering, electroplating, and electroless plating. . 15. The chip packaging process as described in item 3 of the scope of patent application, wherein when the first patterned conductive layer is disposed on the first dielectric layer, the first patterned conductive layer can be combined with A conductive material is filled in the first through holes to form the first conductive plugs respectively. 16. The chip packaging process according to item 14 of the scope of patent application, further comprising configuring a patterned protective layer on the first dielectric layer and the first patterned conductive layer, and exposing the first A bonding pad. 1 7. The chip packaging process as described in item 3 of the scope of patent application, further comprising disposing a contact on the first bonding pads, respectively. 1 8. The chip packaging process according to item 17 of the scope of patent application, wherein the types of the contacts include one of a solder ball, a bump, and a pin. 1 9. According to the chip packaging process described in item 3 of the scope of the patent application, after the contacts are respectively arranged on the bonding pads, the packaging structure of the chips is further divided. 20. The chip packaging process as described in item 19 of the scope of patent application, of which 142981-1001111.doc -5- This paper size applies to China National Standard (CNS) A4 specifications (210X 297 mm) · 533559 AS B8 C8 D8, The scope of the patent application is to divide the packaging structure of these wafers by dividing them by a single wafer. 2 1. The chip packaging process as described in item 20 of the scope of patent application, wherein when dividing the packaging structure of these wafers, multiple wafers are used as the unit for division. 2 2. The chip packaging process according to item 3 of the scope of patent application, further comprising: (a) disposing a second dielectric layer on the first dielectric layer and the first patterned wire layer, wherein ' The second dielectric layer has a plurality of second through-holes, which respectively penetrate the second dielectric layer corresponding to the first bonding pad; (b) filling the second through-holes with a conductive material and forming the second through-holes respectively. A plurality of second conductive plugs; and (c) a second patterned conductive layer is disposed on the second dielectric layer, wherein the second patterned conductive layer passes through the second conductive plugs.] • . "Plug, and is electrically connected to the first patterned wire layer, and part of the second patterned wire layer extends to an area other than above the active surface of the chips, wherein the second patterned wire layer It also has a plurality of second bonding pads. 23 · The chip packaging process according to item 22 of the scope of patent application, wherein the material of the second dielectric layer includes one of polyethylenamine, phenylcyclobutene, a porous dielectric material, and an elastic buffer material . 24. The chip packaging process described in item 22 of the scope of application for patents, of which 14298M001111.doc This paper size applies the Chinese National Standard (CNS) A4 specification (210 × 297 mm). 533559

AS B8 C8 D8 六、申請專利範圍 , 配置該第二圖案化導線層於該第二介電層之上的方 法包括濺鍍、有電電鍍及無電電鍍其中之一。 25 ·如申請專利範圍第3項所述之晶片封裝製程,其中 在配置該第二圖案化導電層於該第二介電層之上時 ,可一併將該第二圖案化導線層之導電材料填入該 ‘ 些第二貫孔内,而分別形成該些第二導電插塞。 2 6.如申請專利範圍第22項所述之晶片封裝製程,更包 .括配置圖案化之一保護層於該第二介電層及該第二 圖案化導線層之上,並暴露出該些第二接合墊。 27. 如申請專利範圍第22項所述之晶片封裝製程,更包 .括分別配置一接點於該些第二接合墊上。 28. 如申請專利範圍第27項所述之晶片封裝製程,其中 該些接點之型態包括銲球、凸塊及針腳其中之一。 29. 如申請專利範圍第27項所述之晶片封裝製程,在分 別配置該些接點於該些第二接合墊上之後,更包括 分割該些晶片之封裝結構。. '30.如申請專利範圍第29項所述之晶片封裝製程,其中 在分割該些晶片之封裝結構時,係以單顆晶片為單 位進行分割。 3 1.如申請專利範圍第29項所述之晶片封裝製程·,其中 '在分割該些晶片之封裝結構時,係以多顆晶片為單 位進行分割。 32.如申請專利範圍第24項所述之晶片封裝製程,更包 142981-1001111.doc -7- 本纸張尺度適用中國國家標準(CNS) A4規格(210X297公釐. 533559AS B8 C8 D8 6. The scope of patent application. The method of arranging the second patterned wire layer on the second dielectric layer includes one of sputtering, electroplating, and electroless plating. 25. The chip packaging process as described in item 3 of the scope of patent application, wherein when the second patterned conductive layer is disposed on the second dielectric layer, the second patterned conductive layer can be electrically conductive. Material fills the second through holes to form the second conductive plugs. 2 6. The chip packaging process as described in item 22 of the scope of patent application, further comprising a patterned protective layer disposed on the second dielectric layer and the second patterned wire layer, and exposing the Some second bonding pads. 27. The chip packaging process as described in item 22 of the scope of the patent application, further including arranging a contact on the second bonding pads, respectively. 28. The chip packaging process according to item 27 of the scope of patent application, wherein the types of the contacts include one of a solder ball, a bump, and a pin. 29. According to the chip packaging process described in item 27 of the scope of the patent application, after the contacts are respectively disposed on the second bonding pads, the packaging structure of the chips is further divided. . '30. The chip packaging process as described in item 29 of the scope of patent application, wherein when the packaging structure of these wafers is divided, a single wafer is used as a unit for division. 3 1. The chip packaging process described in item 29 of the scope of patent application, wherein 'When dividing the packaging structure of these wafers, multiple wafers are used as the unit for division. 32. The chip packaging process described in item 24 of the scope of patent application, more package 142981-1001111.doc -7- This paper size applies to China National Standard (CNS) A4 specifications (210X297 mm. 533559

AS B3 C8 D8 六、申請專利範圍 括重複(a)〜(c)的步驟複數次。 3 3.如申請專利範圍第32項所述之晶片封裝製程,其中 該些第二介電層之材質包括琺乙醯胺、苯基環丁烯 、多孔性介電材料及彈性缓衝材料其中之一。 3 4.如申請專利範圍第32項所述之晶片封裝製程,其中 配置該些第二圖案化導線層於該些第二介電層之上 的方法包括濺鍍、有電電鍍及無電電鍍其中之一。 3 5.如申請專利範圍第32項所述之晶片封裝製程,其中 在配置該些第二圖案化導電層於該些第二介電層之 上時,可一併填入該些第二圖案化導線層之導電材 .料於該些第二貫孔内,而分別形成該些第二導電插 塞。 3 6.如申請專利範圍第3 2項所述之晶片封裝製程,更包 括配置圖案化之一保護層於該些第二介電層之最遠 離該玻璃基板者及該第二圖案化導線層之最遠離該 玻璃基板者之上,並暴露出該第二圖案化導線層之 最遠離該玻璃基板者的該些第二接合墊。 37·如申請專利範圍第32項所述之晶片封裝製程,更包 括分別配置一接點於該第二圖案化導線層之最遠離 該玻璃基板者的該些第二接合墊上。 3 8.如申請專利範圍第37項所述之晶片封裝製程,其中 該些接點之型態包括銲球、凸塊及針腳其中之一。 39.如申請寻利範圍第37項所述之晶片封裝製程,在分 142981-1001111.doc -8- 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐). ASB^OD'AS B3 C8 D8 6. Scope of patent application includes repeating steps (a) to (c) multiple times. 3 3. The chip packaging process according to item 32 of the scope of the patent application, wherein the materials of the second dielectric layers include acetaminophen, phenylcyclobutene, porous dielectric materials, and elastic buffer materials. one. 3 4. The chip packaging process according to item 32 of the scope of patent application, wherein the method of disposing the second patterned wire layers on the second dielectric layers includes sputtering, electroplating, and electroless plating. one. 3 5. The chip packaging process according to item 32 of the scope of patent application, wherein when the second patterned conductive layers are arranged on the second dielectric layers, the second patterns may be filled together. The conductive material of the conductive layer is formed in the second through holes to form the second conductive plugs. 3 6. The chip packaging process as described in item 32 of the scope of the patent application, further comprising configuring a patterned protective layer on the second dielectric layers farthest from the glass substrate and the second patterned conductive layer. Above the glass substrate, and the second bonding pads of the second patterned wire layer that are farthest from the glass substrate are exposed. 37. The chip packaging process according to item 32 of the scope of the patent application, further comprising arranging a contact point on the second bonding pads of the second patterned wire layer farthest from the glass substrate. 3 8. The chip packaging process according to item 37 of the scope of patent application, wherein the types of the contacts include one of a solder ball, a bump, and a pin. 39. As for the chip packaging process described in item 37 of the scope of application for profit, it is divided into 142981-1001111.doc -8- This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm). ASB ^ OD '

申請專利範園 別配置該些接點於該些接合墊上之後’更包括分割 該些晶#之封裝結構。 40. 如申請專利範圍第”項所述之晶片封裝製程,其中 在分割該些晶片之封裝結構時,係以單顆晶片為單 位進行分割。 41. 如申凊專利範圍第μ項所述之晶片封裝製程.,其中 在刀軎1】該些晶片之封麥结構時’係以多顆晶片為單 位進行分割。 4 2. —種晶片封裝製程,至少包括: 提供一第一玻璃基板,該第.一玻璃基板具有一第— .表面; 知·供複數個晶片,每一該些晶片分別具有一主動表 面及對應.之一背面.,且每一該些晶片更分別具.有複 數個金屬墊,其分別配置於對應之該主動表面,並 將該些晶片以該主動表面貼附於該第一玻璃基板之 該第一表面; 全面性形成一填充層於該第一玻璃基板之該第一表 面之上,並包覆該些晶片; 平整化及薄化該填充層及該些晶片; 、 提供一第二玻璃基板,該第二玻璃基板具有一第二 表面’並將該第二玻璃基扳以該第二表面貼附於該 填充層及該些晶片上; 圖案化該第一玻璃基板而形成複數個第一貫孔,其 14298M001111.doc .卜 本紙張尺度適用中國國家標準(CNS) Α4規格(210X297公釐).After applying the patent, don't arrange the contacts on the bonding pads, and then include the packaging structure that divides the crystals. 40. The chip packaging process as described in the "Scope of Patent Application", wherein the division of the package structure of these wafers is divided by a single wafer. 41. Wafer packaging process. In the case of the sealing structure of these wafers, the wafers are divided into multiple wafers. 4 2. A wafer packaging process, including at least: providing a first glass substrate, the The first glass substrate has a first surface. Known for a plurality of wafers, each of these wafers has an active surface and a corresponding one of the back, and each of these wafers has a plurality of respectively. Metal pads are respectively disposed on the corresponding active surfaces, and the wafers are attached to the first surface of the first glass substrate with the active surfaces; a filling layer is comprehensively formed on the first glass substrate. Overlying the first surface and covering the wafers; planarizing and thinning the filling layer and the wafers; and providing a second glass substrate having a second surface ′ and Glass substrate The second surface is affixed to the filling layer and the wafers; the first glass substrate is patterned to form a plurality of first through holes, 14298M001111.doc. The paper size applies to the Chinese National Standard (CNS) A4 specification (210X297 mm).

533559 AB B3 C8 D8533559 AB B3 C8 D8

六、申請專利範園 分別對應暴露出該些金屬墊; 填入導電材質於該些第一貫孔内’而形成複數個第 一導電插塞;以及 配置一第一圖案化導線層於該第<玻璃基板上,其 中該第一圖案化導線層係經由該些導電插塞,而與 該些金屬墊相電性連接,且部分該第一圖案.化導線 層係延伸至該些晶片之該主動表面上方以外的區域 ’其中該第一圖案化導線層更具.有複數個第—接合 塾。 43 _如申請專利範圍第42項所述之晶片封裝製程,其中 該填充層之材質包括環氧化物及聚合物其中之一。 44.如申請專利範圍第42項所述之晶片封裝製程,其中 該第一玻.璃基板之厚度約為2〜150微求。 45 _如申請專利範圍第42項所述之晶片封裝製程,其中 在貼附該第二玻璃基板之後,並在圖案化該第一玻 璃基板之前更包括薄化該第一玻璃基基板之厚度。 46_如申請專利範圍第42項所述之晶片封裝製程,其.辛 該第一玻璃基板於薄化之後的厚度約為2〜150微米 〇 47. 如申請專利範圍第42項所述之晶片封裝製程,其中 配置該第一崮案化導線層於該第一玻璃基板之上的 方法包括濺鍍、有電電鍍及無電電鍍其中之一。 48. 如申請專利範圍第42項所述之晶片封裝製程,其中 I42981-100111I.doc -10- 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐). 裝 訂 線 5335596. The patent application patent garden respectively exposes the metal pads; filling a conductive material in the first through holes to form a plurality of first conductive plugs; and disposing a first patterned wire layer on the first < On the glass substrate, the first patterned conductive layer is electrically connected to the metal pads through the conductive plugs, and part of the first patterned conductive layer extends to the wafers. The area other than above the active surface 'wherein the first patterned wire layer is more. There are a plurality of first-joint ridges. 43 _ The chip packaging process according to item 42 of the scope of patent application, wherein the material of the filling layer includes one of epoxide and polymer. 44. The chip packaging process according to item 42 of the scope of patent application, wherein the thickness of the first glass substrate is about 2 to 150 micrometers. 45 _ The wafer packaging process according to item 42 of the scope of patent application, wherein after attaching the second glass substrate and before patterning the first glass substrate, the method further includes thinning the thickness of the first glass substrate. 46_ The wafer packaging process described in item 42 of the scope of patent application, wherein the thickness of the first glass substrate after thinning is about 2 ~ 150 microns. 47. The wafer described in item 42 of scope of patent application In a packaging process, a method of disposing the first patterned conductive layer on the first glass substrate includes one of sputtering, electroplating, and electroless plating. 48. The chip packaging process described in item 42 of the scope of patent application, in which I42981-100111I.doc -10- This paper size applies to the Chinese National Standard (CNS) A4 specification (210X297 mm). Binding line 533559

AB β'3 C8 _______DS^____ 六、申請專利範園 在配置該第—圖案化導電層於該第一玻璃基板之上 時’可—併將該第一圖案化導線層之導電材料填入 該些第一貫孔内,而分別形成該些第一導電插塞。 4 9 ·如申請專利範圍第4 2項戶斤述之晶片封裝製程,其中 該填充層之材質包括環氧化物及聚含物其中之一。 5 0.如申請專利範圍第42項所述之晶片封裝製程,更包 括配置圖案化之一保護廣於該第一玻璃基板及該第 一圖‘案化導線層之上,炎暴露出該些第一接合墊。 5 1.如申請專郫範圍第42項所述之晶片封裝製程’更包 括分別配置—接點於該珐第一接合塾上。 5 2.如申請專利範圍第5 J項所述之晶片封裝製程,其中 該些接點之型態包括銲球、凸塊及針腳其中之一。 5 3 .如申請專利範圍第5丨項所述之晶片封裝製程,在分 | 別配置該些接點於該些接合墊上之後’更包括分割 該些晶片之封裝結構。 54.如申請專利範圍第53項所述之晶片封裝製程’其中 在分割該些晶片之封裝結構.時,係以單顆晶片為單 位進行分割。 5 5.如申請專利範圍第5 3項所述之晶片封裝製程,其中 在分割該些晶片之封裝結構時’係以多顆晶片為單 位進行分割。' 56.如申請專利範圍第44項所述之晶片封裝製程,更包 括: 142981-1001111.doc 本紙張尺度適用中國國家標準(CNS) A4规格(210 X 297公釐) 、申請專利範園 (a) 配置一介電層於該第一玻璃基板及該第一圖案 化導線層之上,其中’該介電層具有複數個第二貫孔 ’其分別對應該第一接合墊而貫穿該介電層; (b) 填入導電材料於讀些第二貫孔而分別形成複 數個第二導電插塞;以及 (c) 配置一第二圖案化導線層於該介電層之上,其 中該第二圖案化導電層係經由該些第二導電插塞, 而與該第一圖案化導線層相電性連接,且部分該第 二圖案化導線層係延伸至該些晶片之該主動表面上 方以外的區域,其中該第二圖案化導線層更具有複 數個第二接合墊。 其中 .多孔 其中 5 7.如申請專利範圍第5 6項所述之晶片封裝製程 該介電層之材質包括聚乙醯胺、苯基環丁烯 性介電材料層彈性緩衝材料其中之一。 58. 如申請專利範圍第56項所述之晶片封裝製程开甲 配置該第二圖案化導線層於該第二介電層之上的方 法包括濺鍍、有,電電鑛及無電電鍍其中之—。 59. 如申請專利範圍第56項所述之晶片封裝製程,其中 在配置該第二圖案化導電層於該介電層之上時,可 一併將該第二圖案化導線層之導電材料填入該杜1笛 —— 二貫孔内,而分別形成該些第二導電插塞。 60. 如申請專利範圍第56項所述之晶片封裝製程,更包 括配置圖案化之保護層於该第二介電層及該第二圖 12- 142981-1001111.doc 本紙張尺度適用中國國家標準(CNS> A4規格(210X297公釐) 533559 A8 B8 C8 D8 六、申請專利範園 案化導線層之上’並暴露出該些第二接合塾。 61. 如申請專利範圍第56項所述之晶片封裝製程,更包 括分別配置一接點於該些第二接合墊上。 62. 如申請專利範圍第6 1項所述之晶片封裝製程,其中 該些接點之型態包括銲球、凸塊及針腳其中之一。 63 ·如申請專利範圍第6 1項所述之晶片封裝製程,在分 別配置該些接點於該些第二接合墊上之後,更包括 .分割該些晶片之封裝結構。 64.如申請專利範圍第63項所述之晶片.封裝製程,其中 在分割該些晶片之封裝結構時,係以單顆晶片為單 .位進行分割。 65 ·如申請專利範圍第63項所述之晶片封裝製程,其中 在分割該些晶片之封裝結構時,係以多顆晶片為單 位進行分割。 / 66 ·如申請專利範圍第56項所述之晶片封裝製程,更包 括重複(a)〜(c)的步驟複數次。 .67.如申請專利範圍第66項所述之晶片封裝製程,其中 該些介電層之材質包括聚乙醯胺、苯基環丁烯、多 孔性介電材料及彈性缓衝材料其中之一。 68. 如申請專利範圍第66項所述之晶片封裝製程,其中 配置該些第二圖案化導線層於該些介電層之上的方 法包括濺鍍、有電電鍍及無電電鍍其中之一。 69. 如申請專利範圍第66項所述之晶片封裝製程,其中 \ 142981-1001111.doc -13- 本紙張尺度適用中國國家標準(CNS) A4規格(210X 297公釐). 533559 A8 B8 C8 D8 六、申請專利範圍 在配置該些第二圖案化導電層於該些介電層之上時 ,可一併填入該些第二圖案化導線層之導電材料於 該些第二貫孔内,而分別形成該些第二導電插塞。 70.如申請專利範圍第66項所述之晶片封裝製程,更包 括配置圖案化之一保護層於該些第二介電層之最遠 離該玻璃基板者及該第二圖案化導線層之最遠離該 玻璃基板者之上,並暴露出該第二圖案化導線層之 .最遠離該玻璃基板者的該些第二接合墊。 7 1.如申請專利範圍第66項所述之晶片封裝製程,更包 括分別配置一接點於該第二圖案化導線層之最遠離 .該玻璃基板者的該些第二接合墊上。 72.如申請專利範圍第7 1項所述之晶片封裝製程,其中 該些接點之型態包括銲球、凸塊及針腳其中之一。 73 ·如申請專利範圍第7 1項所述之晶片封裝製程,在分 別配置該些接點於該些接合墊上之後,更包括分割 該些晶片之封裝結構。 74. 如申請專利範圍第73項所述之晶片封裝製程,其中 在分割該些晶片之對裝結構時,係以單顆晶片為單 位進行分割。 75. 如申請專利範圍第73項所述之晶片封裝製程,其中 在分割該些晶片之封裝結構時,係以多顆晶片為單 位進行分割。 76. —種晶片封裝製程,至少包括: 142981-1001111.doc - 14- 本纸張尺度適用中國國家標準(CNS) A4規格(210X297公釐). 533559 A8 B8 C8 __D8____ 六、申請專利範圍 提供一第一玻璃基板,該第一玻璃基板具有一第一 表面; 择供至少一晶片,該晶片具有一主動表面及對應之 一背面,且該晶片更具有複數個銲墊,其配置於該 晶片之該主動表面,並將該晶片以該主動表面貼附 於該第一玻璃基板之該第一表面; 全面性形成一第一填充層於該第一玻璃基板之該第 .一表面之上,並包覆該晶片; ' 平整化及薄化該第一填充層及該晶片; 提供一第二玻璃基板’該第二玻璃基板具有一第二 表面,並將該第二玻璃基板以該第二表面貼附於該 第一填充層及該晶片上; 移除該第一填充層及該第一玻璃基板; 配置一第一介電層於該玻璃基板之該表面及該晶片 之該主動表面之上’其中該第一介電層具有複數個 第一貫孔’其分別對應該些金屬塾而貫穿該第一介 電層; 填入導電材料於該些第一貫孔,而分別形成複數個 第一導電插塞;以及 配置一第一圖案化導線層於該第一介電層之上,其 中該第一圖案化導線層係透過該些第一貫孔之内的 該些第一導電插塞,而與該些金屬墊相電性連接, 且部分該第一圖案化導線層係延伸至該晶片之該主 142981-1001111.doc .-15- _本紙張尺度適用中國國家標準(CNS) A4规格(210X297公釐). : 'AB β'3 C8 _______ DS ^ ____ VI. When applying for a patent, the park may 'fill' the first patterned conductive layer on the first glass substrate and fill the first patterned conductive layer with the conductive material. The first through holes are formed in the first through holes, respectively. 4 9 · According to the chip packaging process described in item 42 of the patent application scope, wherein the material of the filling layer includes one of epoxide and polymer. 50. The chip packaging process as described in item 42 of the scope of the patent application, further comprising a patterned configuration to protect the first glass substrate and the first patterned wiring layer, which exposes these First bonding pad. 5 1. The chip packaging process as described in item 42 of the application scope further includes separate arrangement-contacts on the first bonding pad of the enamel. 5 2. The chip packaging process as described in item 5 J of the scope of patent application, wherein the types of these contacts include one of a solder ball, a bump, and a pin. 5 3. According to the chip packaging process described in item 5 丨 of the scope of patent application, after disposing the contacts on the bonding pads separately, it further includes a packaging structure that divides the chips. 54. The chip packaging process described in item 53 of the scope of application for patents, wherein when the packaging structure of the chips is divided, a single wafer is used as a unit for division. 5 5. The chip packaging process as described in item 53 of the scope of the patent application, wherein when dividing the packaging structure of these wafers', division is performed by using a plurality of wafers as a unit. '56. The chip packaging process as described in item 44 of the scope of patent application, including: 142981-1001111.doc This paper size is applicable to China National Standard (CNS) A4 specifications (210 X 297 mm), patent application park ( a) A dielectric layer is disposed on the first glass substrate and the first patterned wire layer, wherein 'the dielectric layer has a plurality of second through holes' which respectively penetrate the dielectric layer corresponding to the first bonding pad. An electrical layer; (b) filling a conductive material into the second through holes to form a plurality of second conductive plugs respectively; and (c) disposing a second patterned wire layer on the dielectric layer, wherein the The second patterned conductive layer is electrically connected to the first patterned conductive layer through the second conductive plugs, and a portion of the second patterned conductive layer extends above the active surfaces of the wafers. In other regions, the second patterned wire layer further has a plurality of second bonding pads. Among them. Porous. 5 7. The chip packaging process as described in Item 56 of the scope of the patent application. The material of the dielectric layer includes one of polyethylenamine and phenylcyclobutene-based dielectric material layer elastic buffer material. 58. The method for disposing the second patterned wire layer on the second dielectric layer in the chip package manufacturing process described in item 56 of the scope of patent application includes sputtering, yes, electro-electric ore and electroless plating— . 59. The chip packaging process according to item 56 of the scope of patent application, wherein when the second patterned conductive layer is disposed on the dielectric layer, the conductive material of the second patterned conductive layer can be filled together. Enter the Du 1 flute-two through holes, and form the second conductive plugs respectively. 60. The chip packaging process described in item 56 of the scope of the patent application, further includes configuring a patterned protective layer on the second dielectric layer and the second figure 12-142981-1001111.doc This paper size applies Chinese national standards (CNS > A4 specification (210X297 mm) 533559 A8 B8 C8 D8 VI. Apply for patent on the patented wire layer and expose these second junctions. 61. As described in item 56 of the scope of patent application The chip packaging process further includes disposing a contact on the second bonding pads. 62. The chip packaging process as described in item 61 of the patent application scope, wherein the types of the contacts include solder balls and bumps And one of the pins. 63 · According to the chip packaging process described in item 61 of the scope of patent application, after the contacts are respectively arranged on the second bonding pads, the packaging structure of the chips is further divided. 64. The wafer. Packaging process as described in item 63 of the scope of patent application, wherein when the packaging structure of these wafers is divided, a single wafer is used as the unit. 65. Said chip packaging process, When dividing the packaging structure of these wafers, the division is performed by using multiple wafers as a unit. / 66 · The wafer packaging process described in item 56 of the scope of patent application, including repeating steps (a) to (c) Plural times. 67. The chip packaging process as described in item 66 of the scope of patent application, wherein the materials of the dielectric layers include polyethylenamine, phenylcyclobutene, porous dielectric materials, and elastic buffer materials. 68. The chip packaging process according to item 66 of the scope of patent application, wherein the method of disposing the second patterned conductor layers on the dielectric layers includes sputtering, electroplating, and electroless plating. One of them. 69. The chip packaging process described in item 66 of the scope of application for patents, in which \ 142981-1001111.doc -13- This paper size applies to the Chinese National Standard (CNS) A4 specification (210X 297 mm). 533559 A8 B8 C8 D8 6. Scope of patent application When the second patterned conductive layers are arranged on the dielectric layers, the conductive materials of the second patterned conductive layer may be filled in the second patterned conductive layers together. Through the holes to form the second 70. The chip packaging process described in item 66 of the scope of patent application, further comprising a patterned protective layer disposed on the second dielectric layers farthest from the glass substrate and the second patterned The second bonding pads which are the farthest from the glass substrate and are exposed from the second patterned conductive layer are the second bonding pads which are the farthest from the glass substrate. 7 1. As described in item 66 of the scope of patent application The chip packaging process further includes arranging a contact point on the second patterned conductive wire layer farthest from the second bonding pad of the glass substrate. 72. The chip packaging process according to item 71 of the scope of patent application, wherein the types of the contacts include one of a solder ball, a bump, and a pin. 73 · According to the chip packaging process described in item 71 of the scope of patent application, after the contacts are arranged on the bonding pads, respectively, the packaging structure for dividing the chips is further included. 74. The chip packaging process as described in item 73 of the scope of the patent application, wherein when the paired structure of the wafers is divided, the single wafer is used as the unit for division. 75. The wafer packaging process described in item 73 of the scope of the patent application, wherein when the packaging structure of the wafers is divided, multiple wafers are used as the unit for division. 76. — A kind of chip packaging process, including at least: 142981-1001111.doc-14- This paper size is applicable to China National Standard (CNS) A4 specification (210X297 mm). 533559 A8 B8 C8 __D8____ 6. Application scope A first glass substrate, the first glass substrate having a first surface; at least one wafer is selected, the wafer has an active surface and a corresponding back surface, and the wafer further has a plurality of solder pads arranged on the wafer; The active surface, and attaching the wafer to the first surface of the first glass substrate with the active surface; forming a first filling layer on the first surface of the first glass substrate comprehensively, and Covering the wafer; 'planarizing and thinning the first filling layer and the wafer; providing a second glass substrate' The second glass substrate has a second surface, and the second glass substrate is formed on the second surface Attached to the first filling layer and the wafer; removing the first filling layer and the first glass substrate; disposing a first dielectric layer on the surface of the glass substrate and the active surface of the wafer 'among them The first dielectric layer has a plurality of first through holes, which respectively penetrate the first dielectric layer in response to some metal rhenium; a conductive material is filled in the first through holes to form a plurality of first conductive holes, respectively. A plug; and disposing a first patterned wire layer on the first dielectric layer, wherein the first patterned wire layer passes through the first conductive plugs within the first through holes, and It is electrically connected to the metal pads, and part of the first patterned wire layer is extended to the main part of the chip 142981-1001111.doc .-15- _ This paper size applies to China National Standard (CNS) A4 specifications ( 210X297 mm) .: ''

A BCD 533559 六、申請專利範圍 動表面上方以外的區域,其中該第一圖案化導線層 更具有複數個第一接合墊。 77. 如申請專利範圍第7'6項所述之晶片封裝製程,其中 諒玻璃基板更具有複數個凹穴,其分別凹陷於該玻 璃基板之該表面,而該些晶片係以該背面分別貼附 於該些凹穴之一的底壁。 78. 如申請專利範圍第77項所述之晶片封裝製程,其中 該些凹穴的深度係分別等於該些晶片的厚度。 79. 如申請專利範圍第77項所述之晶片封裝製程,其中 該些凹穴係利用微影蝕刻的方式形成。 80. 如申請專利範圍第76項所述之晶片封裝製程,其中 該玻璃基板係包括由圖案化之一玻璃層及一導熱層 相疊合而成,而該表面係為該玻璃層之遠離該導熱 層之一面.,且該玻璃層具有複數個開口,其貫穿該 玻璃層,並且該些開口之側壁與該導熱層之表面分 別構成該些凹穴,而該些晶片係以該背面貼附於該 凹穴之一的底壁。 8 1 ·如申請專利範圍第80項所述之晶片封裝製程,其中 該些開口係以微影蝕刻的方式,並以該導熱層為蝕 刻終點,而形成於該玻璃層上。 8 2.如申請專利範圍第80項所述之晶片封裝製程,其中 該玻璃層的厚度係等於該些晶片的厚度。 83.如申請專利範圍第80項所述.之晶片封裝製程,其中 142981-1001111.doc - 16- 本纸張尺度適用中國國家標準(CNS) A4規格(210X297公釐).. 533559 A8 B8 C8 D8 、申請專利範圍 該導熱層之材質包括金屬。 - 84. 如申請專利範圍第76項所述之晶片封裝製程,其中 該第一介電層之材質包括聚醯亞胺、苯基環丁烯、 多孔性介電材料及彈性緩衝材料其中之一。 85. 如申請專利範圍第76項所述之晶片封裝製程,其中 配置該第一圖案化導線層於該第一介電層之上的方 法包括濺鍍、有電電鍍及無電電鍍其中之一。 86. 如申請專利範圍第76項所述之晶片封裝製-程,其中 在配置第一圖案化導電層於該第一介電層之上時, 可一併將該第一圖案化導線層之導電材料填入該些 .第一貫孔内,而分別形成該些第一導電插塞。 8 7.如申請專利範圍第76項所述之晶/片封裝製程,更包 括配置圖案化之一保護層於該第一介電層及該第一 圖案化導線層之上5並暴露出該些第一接合塾。 88. 如申請專利範圍第76項所述之晶片封裝製程,更包 括分別配置一接點於該些第一接合墊上。 89. 如申請專利範圍第88項所述之晶片封裝製程,其中 該些接點之型態包括銲球、ΰ;塊及針腳其中之一。 9 0.如申請專利範圍第88項所述之晶片封裝製程,在分 別配置該些接點於該些接合墊上之後,更包括分割 該些晶片之封裝結構。 9 1.如申請專利範圍第90項所述之晶片封裝製程,其中 在分割該些晶片之封裝結構時,係以單顆晶片為單 ! 142981-1001111.doc -17- 本纸張尺度適用中國國家標準(CNS) Α4規格(210 X 297公釐). 533559 A8 B8 C8 D8 -18· 、申請專利範圍 位進行分割。 92. 如申請專利範圍第90項所述之晶片封裝製程,其中 在分割該些晶片之封裝結構時,係以多顆晶片為單 位進行分割。 93. 如申請專利範圍第76項所述之晶片封裝製程,更包 括: (a)配置一第二介電層於該第一介電層及該第一圖 案化導線層之上,其中該第二介電層具有複數個第 二貫孔,其分別對應該第一接合墊而貫穿該第二介 電層; .(b)填入導電材料於該些第二貫孔,而分別形成複 數個第二導電插塞;以及 (c)配置一第二圖案化導線層於該第二介電層之上 ,其中該第二圖案化導線層係經由該些第二導電插 塞,而與該第一圖案化導線層相電性連接,且部分 該第二圖案化導線層係延伸至該些晶片之該主動表 面上方以外的區域,其中該第二圖案化導線層更具 有複數個第二接合墊。 94. 如申請專利範圍第93項所述之晶片封裝製程,其中 該第二介電層之材質包括聚乙醯胺、苯基環丁烯、 多孔性介電材料及彈性缓衝材料其中之一。 95. 如申請專利範圍第93項所述之晶片封裝製程,其中 配置該第二圖案化導線層於該第二介電層之上的方 142981-1001111.doc 本纸張尺度適用中國國家標準(CNS) A4規格(210X297公釐). 裝 玎 線 533559 B8 C8 D8 六、申請專利範園 法包括濺鍍、有 電電鍍及無電電鐘 其中之一 〇 96 如申請專利範圍 第93項所述之晶片 封裝製程 » 其 中 在配置該第二圖 案化導電層於該第 二介電層 之 上 時 ,可一併將該第 二圖案化導線層之 導電材料 填 入 該 些第二貫孔内, 而分別形成該些第 二導電插 塞 0 97. 如申請專利範圍 第93項所述之晶片 封裝製程 9 更 包 括配置圖案化之 一保護層於該第二 介電層及 該 第 二 圖案化導線層之 上,並暴露出該些 第二接合 墊 〇 9 8 .如申請專利範圍 第93項所述之晶片 封裝製程 9 更 包 括分別配置一接 點於該些第二接合 塾上。 99. 如申請專利範圍 第98項所述之晶片 封裝製程 其 中 該些接點之型態 包括鲜球、凸塊及 針腳其中 之 一 〇 100 .如申請專利範圍 第98項所述之晶片 封裝製程 在 分 別配置該些接點 於些第二接合塾上 之後,更 包 括 分 割該些晶片之封 裝結構。 101 .如申請專利範圍 第100項所述之晶 片封裝製 程 ) 其 中在分割該些晶 片之封裝結構時, 係以單顆 晶 片 為 單位進行分割。 102 如申請專利範圍 第100項所述之晶 片封裝製 程 J 其 中在分割該些晶 片之封裝結構時, 係以多顆 晶 片 為 單位進行分割。 103. 如申請專利範圍 第93項所述之晶片 封裝製程 ) 更 包 括重複(a)〜(c)的 步驟複數次。 142981-1001111.doc' -19- 本紙張尺度適用中國國家標準(CNS) A4規格(210X 297公釐). 533559 A8 B8 C8 D8 六、申請專利範園 104. 如申請專利範圍弟103項所述之晶片封裝製程,其 中該些第二介電層之材質包括聚乙醯胺、苯基環丁 烯、多孔性介電材料及彈性缓衝材料其中之一。 105. 如申請專利範圍第103項所述之晶片封裝製程,其 中配置該些第二圖案化導線層於該些第二介電層之 上的方法包括濺鍍、有電電鍍及無電電鍍其中之一 〇 裝 106. 如申請專利範圍第103項所述之晶片封裝製程,其 中在配置該些第‘二圍案化導電層於該些第二介電層 之上時’可一併填入該些第二圖案化導線層之導電 .材料於該些第二貫孔内,而分別形成該些第二導電 插塞。 訂 107. 如申請專利範圍第103項所述之晶片封裝製程,更 包括配置圖案化之一保護層於該些第二介電層之最 遠離該玻璃基板者及該第二圖案化導線層之最遠離 該玻璃基板者之上,並暴露出該第二圖案化導線層 之最遠離該玻璃基板者的該些第二接合墊。 更遠 其一 » 最. ’.之 程之 程中 製層製其 裝線 裝腳 封導。封針 片化上片及 晶案墊晶塊 之圖合之凸 述二接述、 所第二所球 項該第項鲜 03於.些08括 1 點該 1 包 第接的第態 圍一者圍型 範置板範之 矛配基矛點 專別璃專接 請分玻請些 申括該申該 如包離如中。 » -20- 142981-1001111.doc 本纸張尺度適用中國國家標準(CNS) A4規格(210 X 297公釐). AS B8 C8 D8 申請專利範園 11〇·如申請專利範圍第108項所述之晶片封裝製程,在 分別配置該些接點於該些接合墊上之後,更包括分 割該些晶片之封裝結構。 111 •如申睛專利範圍第1 1 0項所述之晶片封裝製程,其 中在分割該些晶片之封裝結構時,係以單顆晶片及 多顆晶片其中之一為單位進行分割。 112·一種晶片封裝結構,至少包括: .一玻璃基板; —晶片組’該晶片組具有一主動表面及對應之一背 面’且該晶片組更具有複數個金屬墊,其配置於該 . · < 主動表面上,而該晶片組係以該背面貼附於該玻璃 基板上; 一填充層.,形成於該玻璃基板之上,並環繞於該晶 片組之周圍,且該填充層之高度係對齊於該晶片組 之該主動.表面的高度; —玻璃薄層,配置於該填充層及該晶片組之上,其 中該玻璃薄層具有複數個第一導電插塞,其分別電 性連接該些金屬塾之一;以及 一積層線路層,配置於該玻璃薄層上,該積層線路 層具有一外部線路,其中該些外部線路係經由該些 導電插基而電性連接該晶片組之該些金屬塾,且至 少部分該外部線路係延伸至該晶片組之該主動表面 上方以外的區域’並且該外部線路具有複數個接合 -21 - 14298M001111.doc 533559 A8 B8 C8 D8 、申請專利範圍 墊,其位於該積層線路層之表層,而每一該些接合 墊係分別電性連接至該晶片組之部分該些金屬墊之 一,其中該積層線路層至少包括一圖案化導線層, 譚圖案化導線層係配置於該玻璃薄層之上,並且經 由該些第一導電插塞而電性連接該圖案化導線層及 該晶片組之該些金屬墊,其中該圖案化導線層及該 些第一導電插塞係構成該外部線路,且該圖案化導 線層係形成該些接合墊,該外部線路更包括’至少一 被動元件,其中該被動元件係由該圖案化導線層之 部分結構所構成,其中該圖案化導線層之材質為銅 •22- 14298M001111.doc 本纸張尺度適用中國國家標準(CNS) A4規格(210X297公釐)A BCD 533559 6. Scope of patent application The area other than above the moving surface, wherein the first patterned wire layer further has a plurality of first bonding pads. 77. The chip packaging process described in item 7'6 of the scope of patent application, wherein the glass substrate further has a plurality of recesses, which are recessed on the surface of the glass substrate, respectively, and the wafers are respectively pasted on the back surface. Attached to the bottom wall of one of these pockets. 78. The chip packaging process described in item 77 of the scope of the patent application, wherein the depths of the cavities are respectively equal to the thickness of the wafers. 79. The chip packaging process according to item 77 of the scope of the patent application, wherein the recesses are formed by means of lithographic etching. 80. The chip packaging process as described in item 76 of the patent application scope, wherein the glass substrate comprises a patterned glass layer and a thermally conductive layer superimposed, and the surface is a distance from the glass layer One surface of the thermally conductive layer, and the glass layer has a plurality of openings penetrating through the glass layer, and the side walls of the openings and the surface of the thermally conductive layer form the recesses respectively, and the wafers are attached with the back surface On the bottom wall of one of the cavities. 8 1 · The chip packaging process according to item 80 of the scope of patent application, wherein the openings are formed on the glass layer by lithographic etching, and the thermal conductive layer is used as an etching end point. 8 2. The wafer packaging process according to item 80 of the scope of patent application, wherein the thickness of the glass layer is equal to the thickness of the wafers. 83. The chip packaging process as described in item 80 of the scope of application for patents, of which 142981-1001111.doc-16- This paper size applies to China National Standard (CNS) A4 specifications (210X297 mm): 533559 A8 B8 C8 D8. Scope of patent application The material of the thermally conductive layer includes metal. -84. The chip packaging process according to item 76 of the scope of patent application, wherein the material of the first dielectric layer includes one of polyimide, phenylcyclobutene, porous dielectric material and elastic buffer material . 85. The chip packaging process according to item 76 of the scope of patent application, wherein the method of disposing the first patterned conductive layer on the first dielectric layer includes one of sputtering, electroplating, and electroless plating. 86. The chip packaging process according to item 76 of the scope of patent application, wherein when the first patterned conductive layer is disposed on the first dielectric layer, the first patterned conductive layer can be combined with the first patterned conductive layer. A conductive material is filled in the first through holes, and the first conductive plugs are respectively formed. 8 7. The wafer / chip packaging process as described in item 76 of the scope of patent application, further comprising configuring a patterned protective layer on the first dielectric layer and the first patterned wire layer 5 and exposing the Some first joints. 88. The chip packaging process described in item 76 of the scope of the patent application, further includes disposing a contact on the first bonding pads, respectively. 89. The chip packaging process according to item 88 of the scope of patent application, wherein the types of the contacts include one of a solder ball, a wafer, a block, and a pin. 90. According to the chip packaging process described in item 88 of the scope of the patent application, after the contacts are respectively disposed on the bonding pads, the packaging structure of the chips is further divided. 9 1. The chip packaging process described in item 90 of the scope of application for patents, wherein when dividing the packaging structure of these chips, a single chip is used as a unit! 142981-1001111.doc -17- This paper size applies to China National Standard (CNS) Α4 specification (210 X 297 mm). 533559 A8 B8 C8 D8 -18 ·, divided by the scope of patent application. 92. The chip packaging process described in item 90 of the scope of the patent application, wherein when the packaging structure of the wafers is divided, multiple wafers are used as the unit for division. 93. The chip packaging process as described in item 76 of the scope of patent application, further comprising: (a) configuring a second dielectric layer on the first dielectric layer and the first patterned wire layer, wherein the first The two dielectric layers have a plurality of second through holes, which respectively penetrate the second dielectric layer corresponding to the first bonding pad; (b) Filling the second through holes with a conductive material to form a plurality of each A second conductive plug; and (c) disposing a second patterned conductive layer on the second dielectric layer, wherein the second patterned conductive layer is connected to the first conductive plug through the second conductive plugs. A patterned wire layer is electrically connected, and a portion of the second patterned wire layer extends beyond the active surface of the wafers. The second patterned wire layer further includes a plurality of second bonding pads. . 94. The chip packaging process according to item 93 of the scope of patent application, wherein the material of the second dielectric layer includes one of polyethylenamine, phenylcyclobutene, a porous dielectric material, and an elastic buffer material . 95. The chip packaging process as described in item 93 of the scope of patent application, wherein the second patterned wire layer is disposed on the second dielectric layer 142981-1001111.doc This paper size applies Chinese national standards ( CNS) A4 specification (210X297 mm). Decoration line 533559 B8 C8 D8 6. The patent application method includes one of sputtering, electroplating and non-electric clock. 96 As described in item 93 of the scope of patent application Chip packaging process »Wherein, when the second patterned conductive layer is disposed on the second dielectric layer, the conductive material of the second patterned conductive layer can be filled into the second through holes, and The second conductive plugs are respectively formed. 97. The chip packaging process 9 described in item 93 of the patent application scope further includes configuring a patterned protective layer on the second dielectric layer and the second patterned wire layer. The second bonding pads 098 are exposed on top. The chip packaging process 9 described in item 93 of the patent application scope further includes disposing a contact on the second bonding pads respectively. 99. The chip packaging process described in item 98 of the scope of patent application, wherein the types of these contacts include one of fresh balls, bumps and pins. 0100. The chip packaging process described in item 98 of scope of patent application After the contacts are respectively disposed on the second bonding pads, a package structure for dividing the chips is further included. 101. The wafer packaging process as described in item 100 of the scope of the patent application) In the packaging structure of the wafers, the wafers are divided by a single wafer. 102 The wafer packaging process described in item 100 of the scope of the patent application. J When dividing the packaging structure of these wafers, the wafers are divided in units of multiple wafers. 103. The chip packaging process described in item 93 of the scope of patent application) further includes repeating steps (a) to (c) multiple times. 142981-1001111.doc '-19- This paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X 297 mm). 533559 A8 B8 C8 D8 VI. Patent application park 104. As described in the scope of the patent application In the chip packaging process, the materials of the second dielectric layers include one of polyethylenamine, phenylcyclobutene, a porous dielectric material, and an elastic buffer material. 105. The chip packaging process as described in item 103 of the scope of patent application, wherein the method of disposing the second patterned conductive layer on the second dielectric layers includes sputtering, electroplating, and electroless plating. 10. Packing 106. The chip packaging process as described in item 103 of the scope of the patent application, wherein the 'second enclosure conductive layers are disposed on the second dielectric layers' may be filled in together The conductive materials of the second patterned wire layers are formed in the second through holes, and the second conductive plugs are respectively formed. Order 107. The chip packaging process as described in item 103 of the scope of patent application, further includes configuring a patterned protective layer on the second dielectric layer farthest from the glass substrate and the second patterned wire layer. Those farthest from the glass substrate, and the second bonding pads of the second patterned wire layer farthest from the glass substrate are exposed. Farther one »The most.’. In the course of the process of layering its installation line, foot, seal and guide. The pinned top sheet and the crystal block cushion block are inscribed in two, the second item in the ball item is fresh, the first item is 03. Some 08 include 1 point, and the first packet is the first state of the first round. Zhe Fan Fan Ban Ban's spear with a spear point, special glasses, special points, please subdivide them, please apply for them should be included and included. »-20- 142981-1001111.doc This paper size applies to Chinese National Standard (CNS) A4 (210 X 297 mm). AS B8 C8 D8 Patent Application Park 11 10. As described in the 108th patent application In the wafer packaging process, after the contacts are respectively disposed on the bonding pads, the packaging structure of the wafers is further divided. 111 • The chip packaging process as described in item 110 of Shenyan's patent scope, in which the packaging structure of these wafers is divided by a single wafer or one of multiple wafers as a unit. 112. A chip packaging structure, including at least: a glass substrate;-a chip set 'the chip set has an active surface and a corresponding back side' and the chip set further has a plurality of metal pads, which are arranged in the On the active surface, and the chipset is attached to the glass substrate with the back surface; a filling layer. Formed on the glass substrate and surrounding the chipset, and the height of the filling layer is Aligned to the height of the active surface of the chipset; a thin glass layer is disposed on the filling layer and the chipset, wherein the thin glass layer has a plurality of first conductive plugs, which are electrically connected to the One of the metal plutoniums; and a laminated circuit layer disposed on the thin glass layer, the laminated circuit layer having an external circuit, wherein the external circuits are electrically connected to the chipset via the conductive inserts. Some metal plutonium, and at least part of the external circuit extends beyond the active surface of the chipset 'and the external circuit has a plurality of joints -21-14298M001111.doc 533559 A8 B8, C8, and D8. Patent-applied pads are located on the surface layer of the multilayer circuit layer, and each of the bonding pads is electrically connected to one of the metal pads of the chipset, wherein the multilayer circuit layer includes at least A patterned wire layer is arranged on the thin glass layer, and the patterned wire layer and the metal pads of the chipset are electrically connected through the first conductive plugs, wherein The patterned wire layer and the first conductive plugs form the external circuit, and the patterned wire layer forms the bonding pads. The external circuit further includes' at least one passive component, wherein the passive component is formed by the Part of the structure of the patterned wire layer, in which the material of the patterned wire layer is copper • 22-14298M001111.doc This paper size applies to the Chinese National Standard (CNS) A4 specification (210X297 mm)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8089155B2 (en) 1998-12-21 2012-01-03 Megica Corporation High performance system-on-chip discrete components using post passivation process
TWI415202B (en) * 2010-07-30 2013-11-11 Taiwan Semiconductor Mfg Embedded wafer-level bonding approaches
TWI574355B (en) * 2012-08-13 2017-03-11 矽品精密工業股份有限公司 Semiconductor package and method of forming same

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8089155B2 (en) 1998-12-21 2012-01-03 Megica Corporation High performance system-on-chip discrete components using post passivation process
US8129265B2 (en) 1998-12-21 2012-03-06 Megica Corporation High performance system-on-chip discrete components using post passivation process
TWI415202B (en) * 2010-07-30 2013-11-11 Taiwan Semiconductor Mfg Embedded wafer-level bonding approaches
US8580614B2 (en) 2010-07-30 2013-11-12 Taiwan Semiconductor Manufacturing Company, Ltd. Embedded wafer-level bonding approaches
TWI574355B (en) * 2012-08-13 2017-03-11 矽品精密工業股份有限公司 Semiconductor package and method of forming same

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