TW477777B - A method for the manufacture of a quartz glass body and holder element of quartz glass - Google Patents

A method for the manufacture of a quartz glass body and holder element of quartz glass Download PDF

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Publication number
TW477777B
TW477777B TW089122677A TW89122677A TW477777B TW 477777 B TW477777 B TW 477777B TW 089122677 A TW089122677 A TW 089122677A TW 89122677 A TW89122677 A TW 89122677A TW 477777 B TW477777 B TW 477777B
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Taiwan
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quartz glass
concentration
patent application
blank
item
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TW089122677A
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Chinese (zh)
Inventor
Klaus Dittmer
Heinz Fabian
Susanne Elsesser
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Heraeus Quarzglas Gmbh & Amp C
Shinetsu Quartz Prod
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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00Other methods of shaping glass
    • C03B19/14Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1484Means for supporting, rotating or translating the article being formed
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00Other methods of shaping glass
    • C03B19/14Other methods of shaping glass by gas- or vapour- phase reaction processes
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00Type of glass produced
    • C03B2201/02Pure silica glass, e.g. pure fused quartz
    • C03B2201/03Impurity concentration specified

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Glass Melting And Manufacturing (AREA)

Abstract

In a known method for the manufacture of a quartz glass body, SiO2 particles are deposited on the cylinder jacket surface of a cylindrical mandrel rotating about its longitudinal axis, by forming an essentially cylindrical porous blank with a holder element of quartz glass being provided in the area of one of the ends of the blank. To improve, on this basis, the reproducibility of characteristics of the products manufactured from the quartz glass body, it is proposed according to the invention that a holder element with a metastable OH concentration of less than 30 wtppm is used, and that the holder element is subjected to a thermal pretreatment. A suitable holder element for holding a blank of porous quartz glass is characterized in that it consists of quartz glass of a metastable OH concentration of less than 30 wtppm.

Description

477777 案號 89122677 曰 修正 五、發明說明(1) 本發明係關一種石英玻璃體之製法,包括澱積S i 02粒子 於一繞其繼軸旋轉的圓筒心軸之汽缸套表面上形成一本質 上圓筒形素燒坯料與一石英玻璃之夾座元件聯接應用在坯 料一端區内並坯料之熔結。 本發明又關一種石英玻璃夾座元件,連接坯料的一端以 夾持一素燒石英玻璃之圓筒形坯料。 此物類的一種方法與夾持元件由DE-A 1 1 9 6 49 9 3 5得477777 Case No. 89122677 Amendment V. Description of the Invention (1) The present invention relates to a method for manufacturing a quartz glass body, which includes depositing Si 02 particles on the surface of a cylinder liner of a cylindrical mandrel rotating around its secondary axis to form an essence The upper cylindrical plain sintered blank is connected with a quartz glass clamping element to be applied in one end region of the blank and the blank is sintered. The invention also relates to a quartz glass clamp seat component, which is connected to one end of the blank to hold a cylindrical blank of plain-fired quartz glass. A method and clamping element for this type is obtained from DE-A 1 1 9 6 49 9 3 5

知。其所述方法中根據所謂n OV D法π (外面蒸汽澱積)製造 一中空圓筒素燒石英玻璃坯,將細S i 02粒子層澱積於繞其 縱軸旋轉的載體管上。澱積過程中將一石英玻璃管狀座架 藏入製作中的坯端之一内。移去坯料中載管後坯料能保持 在垂直定向的埋藏夾座上留待坯料之進一步處理步驟一例 如在亞氯氛圍内作脫水處理。自素燒坯料熔結成透明石英 玻璃預坯。玻璃化反應期間,夾座先保持雛形,然後移出 雛形之適當部分。 由D E 1 9 6 4 9 9 3 5 ( A 1 )得知石英玻璃體的製法,其中 S i 02粒子經含$夕始材料之火焰水解作用產生殿.積於一旋轉 心軸作成素燒链(烟灰體)。一石英玻璃管實體埋藏在链料 一端區内,此區内坯料密度經調整於至少60 %的石英玻璃 理論密度。know. In the method described, a hollow cylindrical plain-fired quartz glass blank is manufactured according to the so-called n OV D method π (outside vapor deposition), and a layer of fine Si 02 particles is deposited on a carrier tube rotating about its longitudinal axis. During the deposition process, a quartz glass tubular mount was concealed into one of the billet ends in production. After removing the carrier tube from the billet, the billet can be held on a vertically-oriented burial holder for further processing steps of the billet, such as dehydration treatment in a chlorineous atmosphere. The self-fired ingot is fused into a transparent quartz glass preform. During the vitrification reaction, the holder first maintains the embryo and then removes the appropriate part of the embryo. From DE 1 9 6 4 9 9 3 5 (A 1), a method for manufacturing quartz glass is known, in which Si 02 particles are produced by flame hydrolysis of the material containing the starting material. A sintered chain is formed on a rotating mandrel ( Soot body). A quartz glass tube is buried in one end of the chain material. The density of the blank in this area is adjusted to at least 60% of the theoretical density of quartz glass.

由於預坯與夾座(或各別管)係石英玻璃製,於是避免一 切膨脹差別及玻璃化反應間其共存問題。惟曾表現自運用 已知夾座所製預坯得到有部分變異光學性質之光纖。 圖式簡單說明 圖1係本發明胚料製造乏斷面表現;以及Because the preform and the holder (or individual tubes) are made of quartz glass, the coexistence of all expansion differences and the vitrification reaction is avoided. However, it has been shown that optical fibers with partially mutated optical properties are obtained from the use of preforms made of known clamps. Brief description of the drawings Figure 1 shows the lack of cross-section performance of the blank material manufacturing of the present invention; and

O:\67\67135.ptc 第5頁 477777 案號 89122677 曰 修正 五、發明說明(2) 圖2係此技術現狀之胚料製造之斷面表現。 圖式符號簡單說明 1 表不^一述料, 2 表示一管狀夾座; 3 表不一链料的如面, 4 表示一心軸; 5 表示一澱積燈; 6 表示一澱積燈之移動方向; 7 表示一額外燈; 8 表示一影線區;以及O: \ 67 \ 67135.ptc Page 5 477777 Case No. 89122677 Revision V. Description of the invention (2) Figure 2 shows the cross-sectional performance of the blank manufacturing of the current technology. Brief description of the drawing symbols 1 indicates a material, 2 indicates a tubular clamp seat; 3 indicates the surface of a chain material, 4 indicates a mandrel; 5 indicates a deposition lamp; 6 indicates the movement of a deposition lamp Direction; 7 for an extra light; 8 for a hatched area; and

1 2 表示一夾座。 本發明係根據由石英玻璃體所製產品復現性質方面改善 已知方法之工作。本發明進一步根據指定一適宜支座元件 作炎持素燒石英玻璃埋料的工作。 有關此法,其工作係根據本發明依起始指定方法解決此 工作藉採用一有3 0 w t p p m以下亞穩性Ο Η濃度之夾座元件, 並使夾座元件接受一預先熱處理。 已經顯示上述光學性質的變異乃由於坯料在其羥基濃度 (後文亦以Ο Η濃度指示)方面有軸向梯度之事實。用已知方 法,在坯料-及用其所製的石英玻璃體-區中0Η濃度最 大’爽座元件用以聯結。1 2 represents a clamp seat. The present invention is based on the work of improving a known method based on the reproduction properties of a product made of a quartz glass body. According to the present invention, a suitable supporting element is designated for the work of flammable quartz glass burial. Regarding this method, its work is to solve this problem according to the initial designated method according to the present invention by using a clamping element having a metastability 0 Η below 30 w t p p m and subjecting the clamping element to a pre-heat treatment. It has been shown that the above-mentioned variation in optical properties is due to the fact that the billet has an axial gradient in its hydroxyl concentration (also referred to hereinafter as a concentration of 0 Η). In a known method, the 0 ° -concentration seat element having a maximum concentration of 0 中 in the blank-and the quartz vitreous body made therefrom-is used for bonding.

此點能追溯事實即-製造過程期間,特別在高溫製程步 驟間_0Η基由夾座元件中擴散放出至坯料及至石英玻璃 體。不過意外地此項Ο Η基排出未必與石英玻璃之羥基濃度 相關。反而極使石英玻璃的經基濃度包含化學固定之Ο Η濃This can be traced back to the fact that during the manufacturing process, especially during the high-temperature process steps, the base is diffused from the holder element to the blank and to the quartz glass body. However, unexpectedly, the emission of this base is not necessarily related to the hydroxyl concentration of quartz glass. On the contrary, the base concentration of quartz glass contains chemically fixed

O:\67\67135.ptc 第6頁 477777 _案號89122677 年(X月 曰—修正 _· . 五、發明說明(3) 度與一亞穩0H濃度,而僅後者在〇H基排放方面成問題。故 此根據本發明方法得以使用高0 H濃度的石英玻璃夾座元 件,只要其亞穩性〇 Η濃度低於3 0 w t p p m (重量比p p m)。 由於事實上所用夾座元件有最低可能亞穩性OH濃度(低) 於30 wtppm,大為消除0Η基之排放以致坯料内及其所製透, 明石英玻璃體中確保羥基的實質轴向均勻分布。 一般了解π亞穩性〇 Η濃度π為能經石英玻璃溫度處理脫除-之經基濃度。石英玻璃中亞穩性0 Η基的溶液須要一定活化 能。無論如何,由石英玻璃組份中亞穩性0Η基的擴散係經 溫度程度、溫度處理持續期及擴散路徑長度等決定。組份 愈大、擴散路徑愈長(=組份内一點至自由組份表面之最大 距離)。在本發明意義内羥基濃度解釋為於104(rc溫度加« 熱歷時48小時在5 mm的擴散路徑處可脫除之"亞穩〇H濃度 Η Λ 用一 亞穩OH 期間必 夾座元 玻璃之 造夾座 玻璃作 玻璃的 夹座元 施。 較佳 由相當 濃度。 要特殊 件在其 亞穩0H 元件儉 夾座元 較高亞 件製作 低0H 但此 措施 特定 濃度 省的 件。 穩0H 期間 濃度 項石 以保 用途 0可 石英 應用 濃度 不需 指定的 英玻璃 持低0H 前接受見,以 玻璃。 夾座元 並根據 有關石 石英 常頗 濃度 熱預 一起 起初 件前 本發 英玻O: \ 67 \ 67135.ptc Page 6 477777 _ Case No. 89122677 (Xue Yue—Amendment _ ·. V. Description of the invention (3) degrees and a metastable 0H concentration, but only the latter in terms of 0H-based emissions It is a problem. Therefore, according to the method of the present invention, it is possible to use a quartz glass clamping element with a high 0 H concentration, as long as its metastability is less than 30 wtppm (weight ratio ppm). Due to the fact that the clamping element used is the lowest possible The metastable OH concentration (low) is 30 wtppm, which greatly eliminates the emission of 0% radicals so that the material and the system made it transparent. The substantially uniform axial distribution of hydroxyl groups in the clear quartz glass body is generally known. π is the concentration of radicals that can be removed by the temperature treatment of quartz glass. The solution of metastable 0 Η groups in quartz glass requires a certain activation energy. In any case, the diffusion system of metastable 0 Η groups in the quartz glass component requires The degree of temperature, the duration of temperature treatment, the length of the diffusion path, etc. are determined. The larger the component, the longer the diffusion path (= the maximum distance between a point within the component and the surface of the free component). In the sense of the present invention, the hydroxyl concentration is interpreted as 104 (rc temperature plus «hot It can be removed at a diffusion path of 5 mm at 48 hours. &Quot; Metastable OH concentration Η Λ Use a metastable OH during the metastable glass. Equivalent concentration. Special pieces are required to be made in the metastable 0H component. The higher subpieces are made with lower 0H, but this measure has a specific concentration in the province. The concentration item is stable during the 0H period to ensure the use of 0. Quartz application concentration does not need to be specified. British glass held low 0H before seeing to glass. Hold the base element and preheat the original piece together according to the often quite concentrated concentration of stone quartz

玻璃 思主 叩貝 。因 處理 始較 用亞 藉加 明調 璃0H 夾座 且於 此根 。於 高亞 穩0H 熱後 整。 濃度 元件 夾座 據本 是可 穩0H 濃度 處理 由於 之特 可達 元件 發明 降低 濃度 高之 降低 後處 殊警 到低 製作 主張 石英 能製 石英 石英 理 , 戒措 用一亞穩0H濃度 小於1 wtppm之夹座元件。考慮以The glass is thought of by the master. Because of the processing, it is better to use the Asian lending plus clear glass 0H clamp base and stop here. Yu Gao stabilized after 0H heat. The concentration element holder can be stabilized at 0H. Due to the special reachable element invention, the concentration can be reduced after the reduction of the concentration is high. The production is advocated by quartz. Quartz can be made of quartz. Use a metastable 0H concentration less than 1 wtppm. Of the clamping element. Consider

477777477777

修正 案號 89122677 五、發明說明(4) 。上疋義’此係一石英玻螭組份其原來〇 H濃度經加熱至丨〇 4 〇 C度度歷4 8小時(擴散路徑5 mm )最多減輕丨%重量。因此, 大為避免亞穩性Ο Η基之排放,所得係迷料中經基之基本上 軸向均勻分布及在用其所製的透明石英玻璃體内。 一加熱後處理之溫度愈高及處理期愈久,經後處理的夾座 元件之亞穩Ο Η濃度愈低。熱後處理證明成功包括在至少 9 0 0 °C溫度加熱夾座元件。夾座元件有利地於至少丨〇 〇 〇它 溫度加熱。在加熱後處理範圍内加熱時期適宜5小時,較 佳2 0小時以上。 根據本發明方法於使用圓筒形夾座元件局部埋藏在所製 坯料的一末端區域内時證明特別有利。 關於夾座兀件,上述工作係根據本發明解決,以起始 述物類之夾座元件開始,用含亞穩0H濃度低於 = 石英玻璃之夾座元件。 MPPm的 一夾座元件之石英玻璃有最低可能亞穩〇H濃度者並 散任何或僅極少0H基於欲夾持的坯料上或在石英玻 x 使坯料内或其所製透明石英玻璃體中確保本質上轴 上 ,均勻分佈。一方面靠低經基石英玻璃Γ另二方面經γ 熱後處理有起始較高亞穩OH濃度的石英玻璃能择… 田 0H濃度。 、 b又侍低亞穩 鑒於上述技術工作及其定義有關低"亞穩〇H濃度,, 一 步優點與效應請參考以上根據本發明方法的解釋' 進一 考慮链料内與石英玻璃體中0H基之最低可能排放盥 度的最低可能轴向梯度、一夹座元件較佳以亞穩〇11濃户《 = 於lwtppm之石英玻璃組戒。 又低Amendment No. 89122677 V. Description of Invention (4). The above meaning ’This is a quartz glass fiber component whose original OH concentration has been reduced to a maximum weight of 丨% by heating to 〇 4 〇 C degrees for 48 hours (diffusion path 5 mm). Therefore, in order to avoid the emission of metastable oxonyl radicals, the obtained warp radicals are distributed substantially uniformly in the axial direction and are used in the transparent quartz glass body made with them. The higher the temperature and the longer the treatment period after a heating, the lower the metastable concentration of the post-treated clamping element. Thermal post-treatment proved successful including heating the clamp element at a temperature of at least 900 ° C. The clamp seat element is advantageously heated at least at a temperature. The heating period within the heating post-treatment range is suitable for 5 hours, and more preferably 20 hours or more. The method according to the invention proves to be particularly advantageous when the cylindrical holder element is used for local burial in an end region of the produced blank. Regarding the clamping element, the above work is solved according to the present invention. Starting from the clamping element of the above-mentioned type, a clamping element containing metastable 0H concentration lower than = quartz glass is used. The quartz glass of a clip element of MPPm has the lowest possible metastability 0H concentration and disperse any or only 0H based on the blank to be clamped or in the quartz glass x to ensure the essence in the blank or the transparent quartz glass body On the upper axis, evenly distributed. On the one hand, low-based quartz glass Γ; on the other hand, after the γ thermal post-treatment, the quartz glass with a relatively high initial metastable OH concentration can be chosen ... 0H concentration. In view of the above-mentioned technical work and its definition of low metastable OH concentration, please refer to the explanation of the method according to the present invention for further advantages and effects. Further consideration of the 0H group in the chain and the quartz glass body The lowest possible axial gradient of the lowest possible emission degree, a clamping seat element is preferably a metastable 011 thick household "= quartz glass ring at lwtppm. Low again

477777 _一$0年U月 曰 修正 _· 五、發明說明(5) 根據本發明失座元件宜具特色圓筒區,至少局部埋藏於 依其用途將其夾持的坯料中。圓筒區埋藏在坯料内確保穩 固結合。 ^心 以下根據具體例與圖繪將較詳解說本發明。圖内細說圖 解表現: 、° . 圖1澱積Si 〇2粒子之製程步驟,自素燒石英玻璃作成坯 料,根據本發明有一夾座埋藏在正面上;及 - 圖2如圖1相同製程步驟;但用技術現況的夾座,指出链 料區賦於預链内提高〇H濃度。 具體例 圖1係二由素繞石英玻璃坯料1製造之斷面表現,將一管 狀夾座2式之夾持器埋藏於坯料1的前面3區内。坯料1外徑· 約80 mm,長約7 0 0 mm,係根據已知OVD法用31(:14與〇6(:14 之火焰水解作用在繞其縱轴旋轉的心軸4上澱積S i 02粒子 層製成。述料1之内面以二氧化鍺塗覆。置一殿積燈5沿述 料1表面前後移動澱積S i 〇2粒子(與G e 02粒子)成層。殺積製 法過程中,夾座2堅定埋藏其一部分長度於坯料1的前端邊1 3區内。夾座2有外徑25 mm及壁厚9 mm。夾座2之亞穩〇H基 擴散作用途徑因此為4 · 5 m m。夾座2的特別穩固埋藏可藉 一額外燈7調整至前端邊3區内較高溫度,遂亦調節至較高 密度俾使夾座2表面上與坯料1熔化。 如此所製坯料1重量能超過2 kg。取出心軸2後可處理这> 料猎自埋料1中堆出夾座2 —部分再加工。 製造夾座2用電熔之石英玻璃。此石英玻璃的〇H濃度約 8 0 wtppm。在48小時期間調節溫度於1 〇4〇 °C,降低OH濃度477777 _ 一 $ 0年 U 月 约 Revision _ · V. Description of the invention (5) The lost component according to the present invention should have a characteristic cylindrical area, at least partially buried in the blank held by it according to its purpose. The cylindrical area is buried in the blank to ensure a firm bond. The following will explain the present invention in more detail based on specific examples and drawings. The diagram illustrates the graphical representation in detail: °. Figure 1. Process steps for depositing Si 〇2 particles, made from sintered quartz glass as a blank, according to the present invention, a holder is buried on the front side; and-Figure 2 is the same process as Figure 1 Steps; but with the current state of the technology, it is pointed out that the chain zone is added to the pre-chain to increase the 0H concentration. Specific example Figure 1 is a cross-sectional representation of two made of plain-wound quartz glass blank 1. A tube-shaped holder 2 type holder is buried in the front 3 areas of the blank 1. The outer diameter of the blank 1 is about 80 mm, and the length is about 700 mm. It is deposited on the mandrel 4 rotating around its longitudinal axis by flame hydrolysis of 31 (: 14 and 〇6 (: 14) according to the known OVD method. The Si 02 particle layer is made. The inner surface of the material 1 is coated with germanium dioxide. A pedestal lamp 5 is moved back and forth along the surface of the material 1 to deposit S i 〇2 particles (with Ge 02 particles) to form a layer. Kill During the manufacturing method, the clamp base 2 is buried firmly in a part of the length in the front edge 1 of the blank 1. The clamp base 2 has an outer diameter of 25 mm and a wall thickness of 9 mm. The metastable OH-based diffusion path of the clamp base 2 Therefore, it is 4.5 mm. The particularly stable burial of the clamp base 2 can be adjusted to a higher temperature in the front side 3 by an additional lamp 7, and then adjusted to a higher density, so that the surface of the clamp base 2 is melted with the blank 1. The weight of the blank 1 produced in this way can exceed 2 kg. After removing the mandrel 2, the material can be processed. The material holder 2 is piled up from the buried material 1-partly reprocessed. The fused quartz glass is used to manufacture the holder 2. The OH concentration of quartz glass is about 80 wtppm. The temperature is adjusted to 104 ° C during 48 hours to reduce the OH concentration

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-j號 89122677 五、發明說明(6) 至4.8 wtppm。意謂夾座2之亞穩〇H濃度於調節前約75 wtppm。適當運用夾座,並依據以上定義(溫度=1〇4() t, 處理時期=48小時,擴散路徑<5 mm),夾座2於是不再含一 切可測的亞穩〇H濃度。 殿積程序後清洗坯料,在9 〇 〇它亞氯氛内乾燥後於約 1 3 5 0 °C溫度熔結。由此所得芯棒用"套管”覆蔽作成所謂單 式纖維之預坯。自此預模拉出的纖維可於纖維全長上顯現 均勻光學性質。尤其在1 3 8 5 nm波長(在〇H吸收帶區内)光 學农減低於0.7 dB/km。 對照具體例 一對照具體例内按具體例1所述進行製造坯料1 ,惟用失 座12(見圖2)施用前未經調溫。夾座12之OH濃度約55 wtppm。自用夹座12所製預坯亦拉出單式光纖。其光衰減 現象不均勻。波長1385 nm時其衰減率在0·6 dB/km與 7 dB/km間,最大衰減值出現在原來接近夾座12的預坯區 内。使用後夾座1 2之Ο Η濃度測量結果〇 Η濃度僅5. 6 w t p p m。其結果係因約5 〇 w t p p m之"亞穩〇 Η基π於製程期間 自夾座12中釋出,溶於述料1而在預场中’遂於1385 nm處 投入上述高衰減值。 圖2内影線區8表示增加〇 Η濃度區簡圖,有如在根據技術 現狀的方法中坯料熔結後典型出現之增加ΟΗ濃度區。ΟΗ濃 度增加反應坯料1内〇 Η基的分配係於澱積程序過程中自夾 座12釋出。此等釋出之0Η基擴散入素燒石英玻璃圍繞夾座 12,於是在其後預坯及自其拉出的光纖内產生一軸向〇Η梯, 度。特別重要為諸處理步~驟於較高溫度如約9 0 0 °C氯化及-j number 89122677 V. Description of the invention (6) to 4.8 wtppm. This means that the metastable OH concentration of clamp seat 2 is about 75 wtppm before adjustment. With proper use of the holder, and according to the above definition (temperature = 104 (t), processing period = 48 hours, diffusion path < 5 mm), holder 2 no longer contains all measurable metastable OH concentrations. After the Dianji program, the billet was cleaned, dried in a 900 ° C chlorine atmosphere, and sintered at a temperature of about 1350 ° C. The mandrel thus obtained is covered with a "sleeve" to make a so-called single fiber preform. The fibers drawn from the pre-mold can exhibit uniform optical properties over the entire length of the fiber. Especially at the wavelength of 1 3 5 5 nm (in the 〇H absorption band) The optical agricultural reduction is less than 0.7 dB / km. Comparative Specific Example 1 In the comparative specific example, the blank 1 was manufactured as described in Specific Example 1, but the misplacement 12 (see Figure 2) was not adjusted before application. Temperature. The OH concentration of the holder 12 is about 55 wtppm. The preform made by the holder 12 is also pulled out of the single fiber. The optical attenuation is not uniform. At a wavelength of 1385 nm, the attenuation rate is 0 · 6 dB / km and 7 Between dB / km, the maximum attenuation value appeared in the preform area that was originally close to the clamp base 12. After using the clamp base 1 2 〇 Ο concentration measurement results 〇Η concentration was only 5.6 wtppm. The result is about 5 〇wtppm The "metastable" π is released from the holder 12 during the manufacturing process, dissolves in the reference material 1 and then puts the above-mentioned high attenuation value at 1385 nm in the pre-field. Figure 2 shows the inner hatched area 8 A simplified diagram of increasing the concentration range of 0%, as in the method according to the current state of technology, which typically occurs after the billet is sintered. The distribution of the 0Η group in the reaction mixture 1 with increasing concentration was released from the holder 12 during the deposition process. The released 0Η group diffused into the plain calcined quartz glass around the holder 12, and then the preform and A fiber with an axial gradient of 0 ° is generated in the fiber drawn from it. It is particularly important for the processing steps to be performed at higher temperatures such as about 900 ° C and

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Claims (1)

477777 修正 案號89122677 年(1月日 ft▼請i利範圍 1. 一種製造石英玻璃體之方法,包括在一繞其縱軸旋 轉的圓筒形心轴汽缸套表面上殿積S i 0 2粒子,作成一本質 上圓筒形素燒坯料與一石英玻璃夾座元件施用於坯料一末 端者連接並熔結此坯料;特徵在於用一亞穩0H濃度低於30 wtppm之夾座元件,又其夾座元件接受加熱預處理。 2. 根據申請專利範圍第1項之方法,其中係採用亞穩性 OH濃度低於1 wtppm之夾座元件。 3. 根據申請專利範圍第1或2項之方法,其中加熱預處 理包括於至少9 0 0 °C之溫度加熱該夾座元件。 4. 根據申請專利範圍第3項之方法,其中該夾座元件在 至少1 0 0 0 °C的溫度下加熱。 其中加熱預處理包 其中加熱該夾座元 5. 根據申請專利範圍第1項之方法 括加熱該夾座元件至少5小時。 6. 根據申請專利範圍第5項之方法 件至少2 0小時。 7. 根據申請專利範圍第1項之方法,其中用一圓筒形夾 座元件,其部分埋藏於欲製作坯料的一端區内。 8 . 一種石英玻璃與述料的一端聯結以夾持素燒石英玻 璃之圓筒形坯料之夾座元件,其特徵在於該夾座元件由一 亞穩OH濃度低於30 wtppm的石英玻璃構成。 9. 根據申請專利範圍第8項之夾座元件,其中亞穩OH濃 度低於1 wtppm 〇 10. 根據申請專利範圍第8或9項之夾座元件,其中其特 顯一至少局部埋藏其中以夾持此坯料之圓筒區。477777 Amendment No. 89122677 (January date ft ▼ Please range: 1. A method for manufacturing a quartz glass body, including the accumulation of S i 0 2 particles on the surface of a cylindrical mandrel cylinder sleeve rotating about its longitudinal axis, An essentially cylindrical plain sintered billet and a quartz glass clamp seat element are applied to one end of the billet to connect and fuse the billet; it is characterized by using a metastable 0H concentration of less than 30 wtppm, and its clamp The base element undergoes heat pretreatment. 2. The method according to item 1 of the scope of the patent application, which uses a meta-stable OH concentration of less than 1 wtppm. 3. The method according to item 1 or 2 of the scope of patent application, The heating pretreatment includes heating the clamp base element at a temperature of at least 900 ° C. 4. The method according to item 3 of the patent application scope, wherein the clamp base element is heated at a temperature of at least 1000 ° C. The heating pretreatment package includes heating the clamping element 5. The method according to item 1 of the patent application scope includes heating the clamping element for at least 5 hours. 6. The method according to item 5 of the patent application scope requires at least 20 hours. 7 According to Shen The method according to item 1 of the patent application, wherein a cylindrical clamping seat element is partially buried in an end region of the blank to be made. 8. A quartz glass is connected with one end of the material to hold the circle of plain-fired quartz glass. The clamping element of the cylindrical blank is characterized in that the clamping element is made of a quartz glass with a metastable OH concentration of less than 30 wtppm. 9. According to the clamping element of the eighth aspect of the patent application, the metastable OH concentration is low At 1 wtppm 〇 10. According to the patent application scope item 8 or 9 of the clamping seat element, wherein it features a cylindrical area at least partially buried therein to hold the blank. O:\67\67135.ptc 第13頁O: \ 67 \ 67135.ptc Page 13
TW089122677A 1999-11-24 2000-10-27 A method for the manufacture of a quartz glass body and holder element of quartz glass TW477777B (en)

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JPS5355130A (en) * 1976-10-29 1978-05-19 Fujikura Ltd Production of optical fiber base material
CA1271316A (en) * 1984-12-21 1990-07-10 Koichi Abe Optical waveguide manufacture
JPS6283326A (en) * 1985-10-08 1987-04-16 Furukawa Electric Co Ltd:The Production of synthetic quartz tube
FR2600327B1 (en) * 1986-06-20 1992-04-17 Lenoane Georges METHOD FOR MANUFACTURING PREFORMS FOR OPTICAL FIBERS AND CHUCK FOR USE IN THE IMPLEMENTATION OF THIS METHOD, APPLICATION TO THE MANUFACTURE OF SINGLE-MODE OPTICAL FIBERS
JP3191418B2 (en) * 1992-07-09 2001-07-23 住友電気工業株式会社 Optical fiber manufacturing method
CA2099942C (en) * 1992-07-09 2004-10-26 Sumio Hoshino Method and apparatus for drawing glass preform for optical fiber
DE4236578A1 (en) * 1992-10-29 1994-06-23 Deutsche Bundespost Telekom Method and device for preform production for quartz glass optical fibers
DE19649935C2 (en) * 1996-12-02 1999-09-16 Heraeus Quarzglas Process for the production of quartz glass bodies
DE19736949C1 (en) * 1997-08-25 1999-01-21 Heraeus Quarzglas Quartz glass articles production
US6133178A (en) * 1997-12-03 2000-10-17 Tosoh Corporation High purity transparent silica glass
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