TW324831B - Plasma generating device - Google Patents

Plasma generating device

Info

Publication number
TW324831B
TW324831B TW086106111A TW86106111A TW324831B TW 324831 B TW324831 B TW 324831B TW 086106111 A TW086106111 A TW 086106111A TW 86106111 A TW86106111 A TW 86106111A TW 324831 B TW324831 B TW 324831B
Authority
TW
Taiwan
Prior art keywords
wall
generating device
plasma generating
chamber
sealing area
Prior art date
Application number
TW086106111A
Other languages
English (en)
Inventor
Edelstein Sergio
Subramani Mani
Xu Zheng
Grunes Howard
Tepman Avi
John H Frost
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Application granted granted Critical
Publication of TW324831B publication Critical patent/TW324831B/zh

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32458Vessel
    • H01J37/32477Vessel characterised by the means for protecting vessels or internal parts, e.g. coatings
    • H01J37/32504Means for preventing sputtering of the vessel
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082Radio frequency generated discharge
    • H01J37/321Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H01J37/3211Antennas, e.g. particular shapes of coils
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082Radio frequency generated discharge
    • H01J37/321Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32623Mechanical discharge control means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32623Mechanical discharge control means
    • H01J37/32651Shields, e.g. dark space shields, Faraday shields
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/34Gas-filled discharge tubes operating with cathodic sputtering
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082Radio frequency generated discharge
    • H01J37/32137Radio frequency generated discharge controlling of the discharge by modulation of energy

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Power Engineering (AREA)
  • Plasma Technology (AREA)
  • Electron Sources, Ion Sources (AREA)
TW086106111A 1996-05-09 1997-05-08 Plasma generating device TW324831B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US64718296A 1996-05-09 1996-05-09

Publications (1)

Publication Number Publication Date
TW324831B true TW324831B (en) 1998-01-11

Family

ID=24596001

Family Applications (1)

Application Number Title Priority Date Filing Date
TW086106111A TW324831B (en) 1996-05-09 1997-05-08 Plasma generating device

Country Status (5)

Country Link
EP (1) EP0845151A1 (zh)
JP (1) JP3175835B2 (zh)
KR (1) KR100489917B1 (zh)
TW (1) TW324831B (zh)
WO (1) WO1997042648A1 (zh)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0908921A1 (en) * 1997-10-10 1999-04-14 European Community Process chamber for plasma enhanced chemical vapour deposition and apparatus employing said process chamber
US6146508A (en) * 1998-04-22 2000-11-14 Applied Materials, Inc. Sputtering method and apparatus with small diameter RF coil
KR100649278B1 (ko) * 1998-10-15 2006-11-24 어플라이드 머티어리얼스, 인코포레이티드 플라즈마 챔버용 수냉 코일
US6139679A (en) * 1998-10-15 2000-10-31 Applied Materials, Inc. Coil and coil feedthrough
US6221221B1 (en) * 1998-11-16 2001-04-24 Applied Materials, Inc. Apparatus for providing RF return current path control in a semiconductor wafer processing system
US6284110B1 (en) * 1999-04-14 2001-09-04 Tokyo Electron Limited Method and apparatus for radio frequency isolation of liquid heat transfer medium supply and discharge lines
US6192829B1 (en) * 1999-05-05 2001-02-27 Applied Materials, Inc. Antenna coil assemblies for substrate processing chambers
US6277253B1 (en) 1999-10-06 2001-08-21 Applied Materials, Inc. External coating of tungsten or tantalum or other refractory metal on IMP coils
US6139696A (en) 1999-10-25 2000-10-31 Motorola, Inc. Method and apparatus for forming a layer on a substrate
DE50112009D1 (de) * 2000-04-12 2007-03-22 Aixtron Ag Reaktionskammer mit wenigstens einer hf-durchführung
US6652713B2 (en) 2001-08-09 2003-11-25 Applied Materials, Inc. Pedestal with integral shield
US8617672B2 (en) 2005-07-13 2013-12-31 Applied Materials, Inc. Localized surface annealing of components for substrate processing chambers
US7942969B2 (en) 2007-05-30 2011-05-17 Applied Materials, Inc. Substrate cleaning chamber and components
CN102437003B (zh) * 2011-12-07 2015-01-21 宁波江丰电子材料股份有限公司 聚焦环组合、imp溅射设备
US10342114B2 (en) * 2017-09-15 2019-07-02 Axcelis Technologies, Inc. RF resonator for ion beam acceleration
KR102378722B1 (ko) * 2020-08-06 2022-03-28 (주)아이작리서치 플라즈마 처리 장치 및 이의 rf 전원 공급 장치

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1263582A (en) * 1969-09-19 1972-02-09 Barr & Stroud Ltd Improvements in or relating to thin film deposition
JPH0562936A (ja) * 1991-09-03 1993-03-12 Mitsubishi Electric Corp プラズマ処理装置およびプラズマクリーニング方法
DE4235064A1 (de) * 1992-10-17 1994-04-21 Leybold Ag Vorrichtung zum Erzeugen eines Plasmas mittels Kathodenzerstäubung
US6296743B1 (en) * 1993-04-02 2001-10-02 Applied Materials, Inc. Apparatus for DC reactive plasma vapor deposition of an electrically insulating material using a shielded secondary anode
DE69403386T2 (de) * 1993-05-19 1997-09-18 Applied Materials Inc Vorrichtung und Verfahren zur Erhöhung der Zerstäubungsrate in einem Zerstäubungsgerät

Also Published As

Publication number Publication date
KR100489917B1 (ko) 2005-08-05
JPH10510676A (ja) 1998-10-13
WO1997042648A1 (en) 1997-11-13
JP3175835B2 (ja) 2001-06-11
EP0845151A1 (en) 1998-06-03
KR19990028803A (ko) 1999-04-15

Similar Documents

Publication Publication Date Title
TW324831B (en) Plasma generating device
TW326617B (en) Plasma generator and surface treatment apparatus using this plasma generator
TW348269B (en) Inductively coupled parallel-plate plasma reactor with a conical dome
CA2262581A1 (en) Electrohydraulic pressure wave projectors
TW376547B (en) Method and apparatus for plasma processing
TW327267B (en) RF induction plasma source for plasma processing
TW345771B (en) Power source unit employing piezoelectric transformer a high power source unit employing a piezoelectric transformer detects whether the output of the piezoelectric transformer reaches a predetermined value or not.
TW347549B (en) Plasma processor for large workpieces
TW283250B (en) Plasma enhanced chemical processing reactor and method
WO2003036700A1 (fr) Dispositif et procede de traitement au plasma par micro-ondes, et dispositif d'alimentation micro-ondes
TWI348335B (en) Vacuum plasma generator
EP0985105A4 (en) METHOD AND DEVICE FOR IMPROVING VIBRATION INSULATION
DE69604212D1 (de) Plasmareaktor
PL332619A1 (en) Method of neutralising a detonation from and detonation neutralising apparatus
EP1061364A3 (en) Method for the inspection of steam generator tubing utilizing nonaxisymmetric guided waves
HK1005892A1 (en) Pipe end fitting
EP0895245A3 (en) Synchronous semiconductor memory device
TW256779B (zh)
AP2003002769A0 (en) Device for producing a plasma, ionisation method, use of said method and production processes using said device
EP0820087A3 (en) RF plasma reactor with hybrid conductor and multi-radius dome ceiling
AU5988099A (en) Electrical appliance for heating liquids, comprising a heating base and glass walls
IL144190A0 (en) Welding fixture
DE69503874D1 (de) Hochdruckentladungslampe und wärmeschild für eine solche lampe
BG105694A (en) Electron beam projection reaction device
US6162405A (en) Arrangement for sterilizing a container with low-pressure plasma

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees