TW201818057A - 閥體異常偵測裝置及其閥體異常偵測之方法 - Google Patents
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Abstract
一種閥體異常偵測裝置及其閥體異常偵測之方法。閥體異常偵測裝置包括進液部、感測部及排液部。進液部包括第一管段以及第一開關閥,第一開關閥係連通第一管段。感測部包括第二管段以及液體偵測件,液體偵測件係設置於第二管段,第二管段係連通第一開關閥。排液部包括第三管段,第三管段與第二管段連通。第二管段的設置高度分別低於第一管段以及第三管段,當第一開關閥關閉,但處理液通過第一開關閥且儲存於第二管段時,液體偵測件偵測到處理液時即判斷第一開關閥異常。
Description
本發明係關於一種閥體異常偵測裝置及其閥體異常偵測之方法,特別是一種可以偵測是否有處理液流出的閥體異常偵測裝置及其閥體異常偵測之方法。
隨著科技的進步,對於基板、晶圓等半導體相關的製造處理設備已經是常見的技術,例如於先前技術中已經揭示一種濕式處理設備。濕式處理設備可以用於半導體製程,以利用處理液來進行晶圓的蝕刻或清洗等流程,處理液可以為氫氟酸(HF)、硝酸(HNO3)、硫酸(H2SO4)、磷酸(H3PO4)、鹽酸(HCl)及氨(NH3)等等的酸鹼溶液。於濕式處理設備中,各個設備間須透過管路來進行連接,且於管路上設有控制閥體來進行液體流量的控制。當控制閥體異常時,例如內建的結構毀損,即使控制閥體已經處於關閉狀態,處理液仍然流過控制閥體而進入其他管路。此結果易造成製程上的缺失進而影響產品良率,亦可能因不同化學液體的接觸而產生高溫造成設備毀損。
因此,有必要發明一種新的閥體異常偵測裝置及其閥體異常偵測之方法,以解決先前技術的缺失。
本發明之主要目的係在提供一種閥體異常偵測裝置,其具有可以偵測是否有處理液流出的效果。
本發明之另一主要目的係在提供一種用於上述裝置的閥體異常偵測之方法。
為達成上述之目的,本發明之閥體異常偵測裝置係用於濕式處理設備內以供處理液進行輸送。閥體異常偵測裝置包括進液部、感測部及排液部。進液部包括第一管段以及第一開關閥,第一開關閥係連通第一管段。感測部包括第二管段以及液體偵測件,液體偵測件係設置於第二管段,第二管段具有第一端及第二端,第二管段之第一端係連通第一開關閥,使第一開關閥位於第一管段及第二管段之間。排液部包括第三管段,第三管段之一端與第二管段之第二端連通。第二管段的設置高度分別低於第一管段以及第三管段,當第一開關閥關閉,若處理液通過第一開關閥且儲存於第二管段時,液體偵測件偵測到處理液時即判斷第一開關閥異常。
本發明之閥體異常偵測之方法包括以下步驟:提供處理液至第一管段、第二管段以及第三管段;將第一開關閥關閉以阻擋處理液繼續提供至第二管段以及第三管段;透過排液流程以將第二管段內的處理液排出;以及當液體偵測件於第二管段內偵測到處理液時即判斷第一開關閥異常。
為能讓 貴審查委員能更瞭解本發明之技術內容,特舉較佳具體實施例說明如下。
以下請先參考圖1係本發明之閥體異常偵測裝置用於濕式處理設備內之架構示意圖。
本發明之閥體異常偵測裝置10,係用於一濕式處理設備1內以供一處理液進行輸送。濕式處理設備1可以用於半導體製程,以利用處理液來進行晶圓的蝕刻或清洗等流程,處理液可以為氫氟酸(HF)、硝酸(HNO3)、硫酸(H2SO4)、磷酸(H3PO4)、鹽酸(HCl)及氨(NH3)等等的酸鹼溶液,本發明並不限於此。由於濕式處理設備1的應用已經被本發明所屬技術領域中具通常知識者所熟悉,故在此不再贅述。濕式處理設備1可以包括處理液供應單元2、反應槽3及閥體異常偵測裝置10。處理液供應單元2用以供應處理液到閥體異常偵測裝置10,之後再流到反應槽3以供後續處理製程使用。
閥體異常偵測裝置10包括進液部20、感測部30及排液部40。進液部20包括第一管段21以及第一開關閥22。該第一開關閥22係連通該第一管段21,且處理液供應單元2與該第一管段21遠離該第一開關閥22之一端連通。感測部30包括第二管段31以及液體偵測件32。該第二管段31具有第一端311及第二端312,該第二管段31之該第一端311係連通該第一開關閥22,如此一來,第一開關閥22係位於第一管段21及第二管段31之間。排液部40包括一第三管段41,該第三管段41之一端與該第二管段31之該第二端312連通,而該反應槽3與該第三管段41遠離該第二管段31之一端連通,以接收經由該第三管段41排出的該處理液。第三管段41與反應槽3之間還可以具有第三開關閥42,可控制處理液能否由第三管段41排出,但本發明並不限定要設置第三開關閥42。由此可知,處理液供應單元2所供應的處理液於正常狀況下,會經過第一管段21、第一開關閥22、第二管段31、第三管段41,最後流出到反應槽3內。而當第一開關閥22關閉時,正常狀況下就不會有新的處理液再流到第二管段31及第三管段41,且此時可以透過一排液流程以將該第二管段31內的該處理液排出,例如透過一虹吸而將該第二管段31內的該處理液往該第三管段41的方向排出。
液體偵測件32係設置於該第二管段31之處,用以偵測第二管段31內處理液的量。於本發明之一實施例中,液體偵測件32可以為一光遮斷液位偵測器,而第二管段31為一可透光管,因此液體偵測件32可以設置於該第二管段31之一外緣,而不與該處理液接觸,藉由光遮斷液位偵測器來判斷處理液的量。而於本發明之另外的實施例中,液體偵測件32也可以為靜電容液位偵測器,本發明並不限於此。
於本發明之一實施例中,第二管段31的一設置高度分別低於該第一管段21以及該第三管段41。當該第一開關閥22關閉,若該處理液仍會通過該第一開關閥22的話,就會儲存於該第二管段31內部。此時若液體偵測件32偵測到第二管段31內部具有該處理液時,即判斷該第一開關閥22異常。
於本發明之一實施例中,該感測部30還可更包括第二開關閥33及第四管段34。該第二開關閥33透過該第四管段34與該第二管段31其中一部分連通。當該第一開關閥22關閉時,該第二開關閥33就可以打開以排出該第二管段31內的處理液。於本發明之另一實施例中,感測部30更包括氣壓供應單元35。該氣壓供應單元35係提供氣壓源至該第二管段31,此氣壓源可以為一正氣壓或一負氣壓,以吹出或吸出處理液,但本發明並不限於此。藉此,液體偵測件32判斷該第一開關閥22異常時,該液體偵測件32發出一異常訊號至該氣壓供應單元35,以將該第二管段31內的該處理液從第二開關閥33或第三開關閥42排出。另外,液體偵測件32也可以發出異常訊號至一監控單元36,以警告使用者。
需注意的是,該第一管段21、該第二管段31以及該第三管段41分別具有一第一管徑、一第二管徑以及一第三管徑,該些管徑可以具有相同或不同的管徑,例如該第二管段31的第二管徑係分別大於該第一管徑以及該第三管徑,供更多的處理液存放,以增加使用者於該第一開關閥22異常時的反應處理時間,但本發明並不限於此。於本發明中,係為了說明閥體異常偵測之處理液流動方式而定義不同管段,然而,不同管段之間可為一體成形的管體(包含不同管段),或亦可由不同管段連接而成的管體,並不以本案之舉例為限。
接著請參考圖2係本發明之閥體異常偵測之方法之步驟流程圖。此處需注意的是,以下雖以上述閥體異常偵測裝置10為例說明本發明之閥體異常偵測之方法,但本發明之閥體異常偵測之方法並不以使用在上述相同結構的閥體異常偵測裝置10為限。
首先進行步驟201:提供該處理液至該第一管段21、該第二管段31以及該第三管段41。其中,處理液可由處理液供應單元2供應,此處理液就會依序流經第一管段21、第二管段31到第三管段41。
接著進行步驟202:將該第一開關閥22關閉以阻擋該處理液繼續提供至該第二管段31以及該第三管段41。
接著進行步驟203:透過一排液流程以將該第二管段31內的該處理液排出。於步驟203中所述的該排液流程可分別為步驟204a,第二開關閥33透過該第四管段34與該第二管段31連通,透過開啟該第二開關閥33,以將該第二管段31內的該處理液排出;或者步驟204b,排液流程為該氣壓供應單元35提供該氣壓源至該第二管段31,以將該第二管段31內的該處理液排出;或者步驟204c,該排液流程為透過一虹吸而將該第二管段31內的該處理液往該第三管段41的方向排出。排液流程可以至少包括上述的步驟204a、204b以及204c之其中之一,但本發明可執行的排液流程並不僅限於上述的步驟。
接著進行步驟205:當該液體偵測件32於該第二管段31內偵測到該處理液時即判斷該第一開關閥22異常。於本步驟中,由於步驟203已將第二管段31內的處理液排出,因此液體偵測件32仍偵測到第二管段31具有處理液時,即判斷第一開關閥22異常。
於步驟205之後更包括步驟206,步驟206:當判斷該第一開關閥22異常時,透過該排液流程以將該第二管段31內的該處理液排出。
於此步驟206中,同樣可以執行步驟204a到步驟204c所述的排液流程。
除了執行步驟204a到步驟204c排液流程外,於步驟206之後更包括步驟207,步驟207:藉由該液體偵測件32發出異常訊號至一監控單元36以警告使用者。
此處需注意的是,本發明之閥體異常偵測之方法並不以上述之步驟次序為限,只要能達成本發明之目的,上述之步驟次序亦可加以改變。
藉由本案的閥體異常偵測裝置10及閥體異常偵測之方法,可以即刻偵測出第一開關閥22是否異常排出處理液,以避免處理液汙染濕式處理設備1的其他部分。
需注意的是,上述實施方式僅例示本發明之較佳實施例,為避免贅述,並未詳加記載所有可能的變化組合。然而,本領域之通常知識者應可理解,上述各模組或元件未必皆為必要。且為實施本發明,亦可能包括其他較細節之習知模組或元件。各模組或元件皆可能視需求加以省略或修改,且任兩模組間未必不存在其他模組或元件。只要不脫離本發明基本架構者,皆應為本專利所主張之權利範圍,而應以專利申請範圍為準。
201~207‧‧‧步驟
1‧‧‧濕式處理設備
10‧‧‧閥體異常偵測裝置
2‧‧‧處理液供應單元
3‧‧‧反應槽
20‧‧‧進液部
21‧‧‧第一管段
22‧‧‧第一開關閥
30‧‧‧感測部
31‧‧‧第二管段
311‧‧‧第一端
312‧‧‧第二端
32‧‧‧液體偵測件
33‧‧‧第二開關閥
34‧‧‧第四管段
35‧‧‧氣壓供應單元
36‧‧‧監控單元
40‧‧‧排液部
41‧‧‧第三管段
42‧‧‧第三開關閥
圖1係本發明之閥體異常偵測裝置用於濕式處理設備內之架構示意圖。 圖2係本發明之閥體異常偵測之方法之步驟流程圖。
Claims (13)
- 一種閥體異常偵測裝置,係用於一濕式處理設備內以供一處理液進行輸送,該閥體異常偵測裝置包括: 一進液部,包括一第一管段以及一第一開關閥,該第一開關閥係連通該第一管段; 一感測部,包括一第二管段以及一液體偵測件,該液體偵測件係設置於該第二管段,該第二管段具有一第一端及一第二端,該第二管段之該第一端係連通該第一開關閥,使該第一開關閥位於該第一管段及該第二管段之間;以及 一排液部,包括一第三管段,該第三管段之一端與該第二管段之該第二端連通; 其中,該第二管段的一設置高度分別低於該第一管段以及該第三管段,當該第一開關閥關閉,若該處理液通過該第一開關閥且儲存於該第二管段時,該液體偵測件偵測到該處理液時即判斷該第一開關閥異常。
- 如申請專利範圍第1項所述之閥體異常偵測裝置,其中該感測部更包括一第二開關閥及一第四管段,該第二開關閥透過該第四管段與該第二管段連通,當該第一開關閥關閉時,該第二開關閥打開以排出該第二管段內的該處理液。
- 如申請專利範圍第1項所述之閥體異常偵測裝置,其中該感測部更包括一氣壓供應單元,該氣壓供應單元係提供一氣壓源至該第二管段,以將該第二管段內的該處理液排出。
- 如申請專利範圍第1項所述之閥體異常偵測裝置,該閥體異常偵測裝置透過一虹吸而將該第二管段內的該處理液往該第三管段的方向排出。
- 如申請專利範圍第1項所述之閥體異常偵測裝置,其中該濕式處理設備更包括一處理液供應單元以及一反應槽,該處理液供應單元與該第一管段遠離該第一開關閥之一端連通以供應該處理液至該第一管段,該反應槽與該第三管段遠離該第二管段之一端連通以接收經由該第三管段排出的該處理液。
- 如申請專利範圍第1項所述之閥體異常偵測裝置,其中該液體偵測件進一步發出一異常訊號至一監控單元,以警告使用者。
- 如申請專利範圍第1項所述之閥體異常偵測裝置,其中該液體偵測件係設置於該第二管段之一外緣,而不與該處理液接觸。
- 如申請專利範圍第1項所述之閥體異常偵測裝置,其中該液體偵測件係為一光遮斷液位偵測器或一靜電容液位偵測器。
- 如申請專利範圍第8項所述之閥體異常偵測裝置,其中該第二管段為一可透光管,並藉由該光遮斷液位偵測器進行液位偵測。
- 如申請專利範圍第1項所述之閥體異常偵測裝置,其中該第一管段、該第二管段以及該第三管段分別具有一第一管徑、一第二管徑以及一第三管徑,該些管徑為一相同管徑。
- 如申請專利範圍第1項所述之閥體異常偵測裝置,其中該第一管段、該第二管段以及該第三管段分別具有一第一管徑、一第二管徑以及一第三管徑,該第二管徑係分別大於該第一管徑以及該第三管徑。
- 一種用於如申請專利範圍第1至11項中任一項所述之閥體異常偵測裝置之閥體異常偵測之方法,該方法包括以下步驟: 提供該處理液至該第一管段、該第二管段以及該第三管段; 將該第一開關閥關閉以阻擋該處理液繼續提供至該第二管段以及該第三管段; 透過一排液流程以將該第二管段內的該處理液排出;以及 當該液體偵測件於該第二管段內偵測到該處理液時即判斷該第一開關閥異常。
- 如申請專利範圍第12項所述之閥體異常偵測之方法,更包括當判斷該第一開關閥異常時,透過該排液流程以將該第二管段內的該處理液排出之步驟。
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CN203250724U (zh) * | 2013-04-25 | 2013-10-23 | 盛美半导体设备(上海)有限公司 | 晶圆清洗装置 |
TWI556878B (zh) * | 2014-02-26 | 2016-11-11 | 辛耘企業股份有限公司 | 流體加速裝置 |
TWM505052U (zh) * | 2015-01-22 | 2015-07-11 | Scientech Corp | 流體製程處理裝置 |
JP6320945B2 (ja) * | 2015-01-30 | 2018-05-09 | 東京エレクトロン株式会社 | 基板処理装置および基板処理方法 |
CN205527751U (zh) * | 2015-12-21 | 2016-08-31 | 赵志峰 | 高纯氮气纯化装置 |
TWM529937U (zh) * | 2016-07-12 | 2016-10-01 | 吳振維 | 吸附裝置 |
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2017
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