TW201302879A - Thermoplastic resin composition, resin molding, and process for producing resin molding having plating layer attached thereto - Google Patents
Thermoplastic resin composition, resin molding, and process for producing resin molding having plating layer attached thereto Download PDFInfo
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- TW201302879A TW201302879A TW101109261A TW101109261A TW201302879A TW 201302879 A TW201302879 A TW 201302879A TW 101109261 A TW101109261 A TW 101109261A TW 101109261 A TW101109261 A TW 101109261A TW 201302879 A TW201302879 A TW 201302879A
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- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/04—Reinforcing macromolecular compounds with loose or coherent fibrous material
- C08J5/0405—Reinforcing macromolecular compounds with loose or coherent fibrous material with inorganic fibres
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- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
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- C08G69/02—Polyamides derived from amino-carboxylic acids or from polyamines and polycarboxylic acids
- C08G69/26—Polyamides derived from amino-carboxylic acids or from polyamines and polycarboxylic acids derived from polyamines and polycarboxylic acids
- C08G69/265—Polyamides derived from amino-carboxylic acids or from polyamines and polycarboxylic acids derived from polyamines and polycarboxylic acids from at least two different diamines or at least two different dicarboxylic acids
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- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
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- C23C18/1607—Process or apparatus coating on selected surface areas by direct patterning
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- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
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- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1635—Composition of the substrate
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- C23C18/1641—Organic substrates, e.g. resin, plastic
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- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/2006—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
- C23C18/2026—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by radiant energy
- C23C18/204—Radiation, e.g. UV, laser
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01Q—ANTENNAS, i.e. RADIO AERIALS
- H01Q1/00—Details of, or arrangements associated with, antennas
- H01Q1/36—Structural form of radiating elements, e.g. cone, spiral, umbrella; Particular materials used therewith
- H01Q1/38—Structural form of radiating elements, e.g. cone, spiral, umbrella; Particular materials used therewith formed by a conductive layer on an insulating support
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- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
- H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
- H05K3/182—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
- H05K3/185—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method by making a catalytic pattern by photo-imaging
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- H05K1/0366—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement reinforced, e.g. by fibres, fabrics
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Abstract
Description
本發明係關於一種雷射直接成型用熱塑性樹脂組合物(以下有時簡稱為「熱塑性樹脂組合物」)。進而,本發明係關於一種使該熱塑性樹脂組合物成形而成之樹脂成形品、及於該樹脂成形品之表面上形成鍍敷層的附鍍敷層之樹脂成形品之製造方法。 The present invention relates to a thermoplastic resin composition for laser direct structuring (hereinafter sometimes simply referred to as "thermoplastic resin composition"). Furthermore, the present invention relates to a resin molded article obtained by molding the thermoplastic resin composition, and a method for producing a resin molded article having a plating layer on which a plating layer is formed on the surface of the resin molded article.
近年來,隨著包括智能手機(Smart Phone)在內之行動電話之開發,對在行動電話內部製造天線之方法進行了各種研究。尤其要求於行動電話中製造可進行立體設計之天線之方法。作為形成此種立體天線之技術之一,雷射直接成型(以下有時稱作「LDS,Laser Direct Structuring」)技術備受關注。LDS技術係例如於含有LDS添加劑之樹脂成形品之表面上照射雷射而僅使經雷射照射之部分活化,且於該得以活化之部分上應用金屬,藉此形成鍍敷層之技術。該技術之特徵在於:可不使用接著劑等而於樹脂基材表面上直接製造天線等金屬結構體。例如,於日本專利特表2000-503817號公報、日本專利特表2004-534408號公報及日本專利特表2004-534408號公報等中揭示有該LDS技術。 In recent years, with the development of mobile phones including smart phones, various studies have been conducted on methods of manufacturing antennas inside mobile phones. In particular, a method of manufacturing an antenna capable of three-dimensional design in a mobile phone is required. As one of techniques for forming such a stereoscopic antenna, laser direct structuring (hereinafter sometimes referred to as "LDS, Laser Direct Structuring") technology has attracted attention. The LDS technique is a technique in which, for example, a laser-molded article containing an LDS additive is irradiated with a laser to activate only a portion irradiated with laser light, and a metal is applied to the activated portion, thereby forming a plating layer. This technique is characterized in that a metal structure such as an antenna can be directly produced on the surface of a resin substrate without using an adhesive or the like. The LDS technology is disclosed in, for example, Japanese Patent Laid-Open Publication No. 2000-503817, Japanese Patent Laid-Open No. 2004-534408, and Japanese Patent Laid-Open No. 2004-534408.
此處,本發明者進行了研究,結果發現:於調配有無機纖維之熱塑性樹脂中調配LDS添加劑之情形時,雖適當形 成鍍敷層,但根據LDS添加劑之種類,無法達成無機纖維原本達成之機械強度。 Here, the inventors conducted research and found that, in the case of formulating an LDS additive in a thermoplastic resin formulated with inorganic fibers, although it is appropriate The plating layer is formed, but depending on the type of the LDS additive, the mechanical strength originally achieved by the inorganic fiber cannot be achieved.
本發明係以解決該先前技術之問題為目的者,其目的在於提供一種調配有無機纖維與LDS添加劑之熱塑性樹脂組合物,其可適當形成鍍敷層,且機械強度優異。 The present invention has been made in an effort to solve the problems of the prior art, and an object of the invention is to provide a thermoplastic resin composition containing an inorganic fiber and an LDS additive, which can form a plating layer as appropriate and which is excellent in mechanical strength.
基於該狀況,本發明者進行了銳意研究,結果發現上述機械強度差劣之原因在於無機纖維與LDS添加劑之莫氏硬度之關係。本發明係根據該見解而完成者,具體而言,上述課題係藉由以下方法而得以解決。 Based on this situation, the inventors conducted intensive studies and found that the above mechanical strength is poor because of the relationship between the inorganic fibers and the Mohs hardness of the LDS additive. The present invention has been completed based on the above findings, and specifically, the above problems are solved by the following methods.
<1>一種雷射直接成型用熱塑性樹脂組合物,其相對於熱塑性樹脂100重量份,含有無機纖維10~150重量份、及雷射直接成型添加劑1~30重量份,並且上述雷射直接成型添加劑含有銅、銻及錫之至少1種且具有比無機纖維之莫氏硬度小1.5以上之莫氏硬度。 <1> A thermoplastic resin composition for laser direct molding comprising 10 to 150 parts by weight of inorganic fibers and 1 to 30 parts by weight of a laser direct molding additive with respect to 100 parts by weight of the thermoplastic resin, and the above laser direct molding The additive contains at least one of copper, bismuth and tin and has a Mohs hardness which is 1.5 or more smaller than the Mohs hardness of the inorganic fiber.
<2>如<1>之雷射直接成型用熱塑性樹脂組合物,其中無機纖維為玻璃纖維。 <2> A thermoplastic resin composition for laser direct structuring according to <1>, wherein the inorganic fibers are glass fibers.
<3>如<1>或<2>之雷射直接成型用熱塑性樹脂組合物,其中熱塑性樹脂為聚醯胺樹脂。 <3> A thermoplastic resin composition for laser direct structuring according to <1> or <2>, wherein the thermoplastic resin is a polyamide resin.
<4>如<1>至<3>中任一項之雷射直接成型用熱塑性樹脂組合物,其相對於上述熱塑性樹脂組合物100重量份,含有CIELAB中之L*值為80以上且莫氏硬度比無機纖維小1.5以上之無機顏料1~20重量份。 The thermoplastic resin composition for laser direct structuring according to any one of <1> to <3> which contains the L * value of 80 or more in CIELAB with respect to 100 parts by weight of the above-mentioned thermoplastic resin composition. The inorganic pigment having a hardness of 1.5 or more is 1 to 20 parts by weight smaller than the inorganic fiber.
<5>如<1>至<4>中任一項之雷射直接成型用熱塑性樹脂組 合物,其相對於上述熱塑性樹脂組合物100重量份,含有滑石1~20重量份。 <5> A thermoplastic resin group for laser direct structuring according to any one of <1> to <4> The compound contains 1 to 20 parts by weight of talc based on 100 parts by weight of the thermoplastic resin composition.
<6>如<1>至<4>中任一項之雷射直接成型用熱塑性樹脂組合物,其相對於上述熱塑性樹脂組合物100重量份,含有滑石1~20重量份,且雷射直接成型添加劑之調配量相對於熱塑性樹脂100重量份為1~15重量份。 The thermoplastic resin composition for laser direct structuring according to any one of <1> to <4>, which contains 1 to 20 parts by weight of talc per 100 parts by weight of the thermoplastic resin composition, and the laser is directly The amount of the molding additive to be added is 1 to 15 parts by weight based on 100 parts by weight of the thermoplastic resin.
<7>如<1>至<6>中任一項之雷射直接成型用熱塑性樹脂組合物,其中上述無機纖維之莫氏硬度為5.5以上,上述雷射直接成型添加劑含有銅且莫氏硬度為5.0以下。 The thermoplastic resin composition for laser direct structuring according to any one of <1> to <6> wherein the inorganic fiber has a Mohs hardness of 5.5 or more, and the laser direct molding additive contains copper and Mohs hardness. It is 5.0 or less.
<8>如<7>之雷射直接成型用熱塑性樹脂組合物,其進而含有鹼。 <8> The thermoplastic resin composition for laser direct structuring according to <7>, which further contains a base.
<9>如<7>或<8>之雷射直接成型用熱塑性樹脂組合物,其中上述無機顏料之莫氏硬度為5.0以下。 <9> The thermoplastic resin composition for direct laser molding of <7> or <8>, wherein the inorganic pigment has a Mohs hardness of 5.0 or less.
<10>如<7>至<9>中任一項之雷射直接成型用熱塑性樹脂組合物,其中上述雷射直接成型添加劑為Cu3(PO4)2Cu(OH)2。 The thermoplastic resin composition for laser direct structuring according to any one of <7> to <9> wherein the above-mentioned laser direct structuring additive is Cu 3 (PO 4 ) 2 Cu(OH) 2 .
<11>如<1>至<6>中任一項之雷射直接成型用熱塑性樹脂組合物,其中上述雷射直接成型添加劑含有銻及錫。 The thermoplastic resin composition for laser direct structuring according to any one of <1> to <6> wherein the above-mentioned laser direct structuring additive contains bismuth and tin.
<12>如<11>之雷射直接成型用熱塑性樹脂組合物,其中上述雷射直接成型添加劑含有銻及錫,且錫之含量多於銻。 <12> The thermoplastic resin composition for laser direct structuring according to <11>, wherein the above-mentioned laser direct structuring additive contains bismuth and tin, and the content of tin is more than cerium.
<13>如<11>或<12>之雷射直接成型用熱塑性樹脂組合物,其中上述LDS添加劑含有包含氧化銻及/或氧化錫之氧化物。 <13> The thermoplastic resin composition for direct laser molding of <11> or <12>, wherein the LDS additive contains an oxide containing cerium oxide and/or tin oxide.
<14>如<13>之雷射直接成型用熱塑性樹脂組合物,其中上 述雷射直接成型添加劑含有36~50重量%之(Sb/Sn)O2、35~53重量%之雲母與SiO2之混合物、及11~15重量%之TiO2。 <14> The thermoplastic resin composition for laser direct structuring according to <13>, wherein the laser direct structuring additive contains 36 to 50% by weight of (Sb/Sn)O 2 , 35 to 53 % by weight of mica and SiO 2 a mixture of 11 to 15% by weight of TiO 2 .
<15>一種樹脂成形品,其係使如<1>至<14>中任一項之雷射直接成型用熱塑性樹脂組合物成形而成。 <15> A resin molded article obtained by molding the thermoplastic resin composition for laser direct structuring according to any one of <1> to <14>.
<16>如<15>之樹脂成形品,其進而於表面上包含鍍敷層。 <16> The resin molded article according to <15>, which further comprises a plating layer on the surface.
<17>如<15>或<16>之樹脂成形品,其為可攜式電子機器零件。 <17> A resin molded article such as <15> or <16>, which is a portable electronic machine part.
<18>如<16>或<17>之樹脂成形品,其中上述鍍敷層具有作為天線之性能。 <18> A resin molded article according to <16> or <17>, wherein the plating layer has properties as an antenna.
<19>一種附鍍敷層之樹脂成形品之製造方法,其包括如下步驟:於使如<1>至<14>中任一項之雷射直接成型用熱塑性樹脂組合物成形而成之樹脂成形品之表面上照射雷射後,應用金屬而形成鍍敷層。 <19> A method of producing a resin molded article with a plating layer, comprising the step of forming a resin obtained by molding a thermoplastic resin composition for direct laser molding according to any one of <1> to <14> After the surface of the molded article is irradiated with a laser, a metal is applied to form a plating layer.
<20>如<19>之附鍍敷層之樹脂成形品之製造方法,其中上述鍍敷層為鍍銅層。 <20> The method for producing a resin molded article with a plating layer according to <19>, wherein the plating layer is a copper plating layer.
<21>一種具有天線之可攜式電子機器零件之製造方法,其包含如<19>或<20>之附鍍敷層之樹脂成形品之製造方法。 <21> A method of manufacturing a portable electronic machine component having an antenna, comprising a method of producing a resin molded article having a plating layer of <19> or <20>.
藉由本發明可提供一種彎曲強度、彎曲彈性模數及夏比衝擊強度優異且可於表面上適當地形成鍍敷層之熱塑性樹脂成形品。 According to the present invention, it is possible to provide a thermoplastic resin molded article which is excellent in bending strength, flexural modulus, and Charpy impact strength and which can form a plating layer on the surface.
以下,詳細說明本發明之內容。再者,於本案說明書 中,「~」係以包含其前後所記載之數值作為下限值及上限值之含義而使用。 Hereinafter, the contents of the present invention will be described in detail. Furthermore, in the case of this case In the above, "~" is used in the sense that the numerical values described before and after are used as the lower limit and the upper limit.
本發明中之莫氏硬度係使用通常被用作礦物之硬度指標之10階段莫氏硬度。 The Mohs hardness in the present invention uses a 10-stage Mohs hardness which is generally used as a hardness index of a mineral.
本發明之熱塑性樹脂組合物之特徵在於:相對於熱塑性樹脂100重量份,含有無機纖維10~150重量份、LDS添加劑1~30重量份,並且上述LDS添加劑含有銅、銻及錫之至少1種且具有比無機纖維之莫氏硬度小1.5以上之莫氏硬度。 The thermoplastic resin composition of the present invention contains 10 to 150 parts by weight of an inorganic fiber and 1 to 30 parts by weight of an LDS additive, and the LDS additive contains at least one of copper, bismuth and tin, based on 100 parts by weight of the thermoplastic resin. And has a Mohs hardness which is 1.5 or more smaller than the Mohs hardness of the inorganic fiber.
以下,詳細說明本發明。 Hereinafter, the present invention will be described in detail.
本發明之熱塑性樹脂組合物含有熱塑性樹脂。熱塑性樹脂之種類並無特別規定,例如可列舉:聚碳酸酯樹脂、聚苯醚樹脂與聚苯乙烯系樹脂之合金、聚苯醚樹脂與聚醯胺樹脂之合金、熱塑性聚酯樹脂、甲基丙烯酸甲酯/丙烯腈/丁二烯/苯乙烯共聚合樹脂、甲基丙烯酸甲酯/苯乙烯共聚合樹脂、甲基丙烯酸甲酯樹脂、橡膠強化甲基丙烯酸甲酯樹脂、聚醯胺樹脂、聚縮醛樹脂、聚乳酸系樹脂、聚烯烴樹脂、及聚苯硫醚樹脂等。於本發明中,可較佳地使用聚醯胺樹脂、熱塑性聚酯樹脂、及聚苯硫醚樹脂,進而較佳為聚醯胺樹脂。熱塑性樹脂可僅使用1種,亦可併用2種以上。 The thermoplastic resin composition of the present invention contains a thermoplastic resin. The type of the thermoplastic resin is not particularly limited, and examples thereof include a polycarbonate resin, an alloy of a polyphenylene ether resin and a polystyrene resin, an alloy of a polyphenylene ether resin and a polyamide resin, a thermoplastic polyester resin, and a methyl group. Methyl acrylate/acrylonitrile/butadiene/styrene copolymer resin, methyl methacrylate/styrene copolymer resin, methyl methacrylate resin, rubber-reinforced methyl methacrylate resin, polyamide resin, Polyacetal resin, polylactic acid based resin, polyolefin resin, and polyphenylene sulfide resin. In the present invention, a polyamide resin, a thermoplastic polyester resin, and a polyphenylene sulfide resin are preferably used, and further preferably a polyamide resin. The thermoplastic resin may be used alone or in combination of two or more.
作為聚碳酸酯樹脂,可參考日本專利特開2008-120866號公報之段落編號0008~0013之記載。 As the polycarbonate resin, the descriptions of paragraph numbers 0008 to 0013 of JP-A-2008-120866 can be referred to.
作為熱塑性聚酯樹脂,可參考日本專利特開2010-174223號公報之段落編號0013~0016之記載。 As the thermoplastic polyester resin, the descriptions of paragraph numbers 0013 to 0016 of JP-A-2010-174223 can be referred to.
作為聚縮醛樹脂,可參考日本專利特開2003-003041號公報之段落編號0011、日本專利特開2003-220667號公報之段落編號0018~0020之記載。 As the polyacetal resin, the descriptions of paragraph numbers 0011 to JP-A-2003-003041 and paragraph numbers 0018 to 0020 of JP-A-2003-220667 can be referred to.
作為聚苯硫醚樹脂,可參考日本專利特開平10-292114號公報之段落編號0014~0016之記載、日本專利特開平10-279800號公報之段落編號0011~0013之記載、及日本專利特開2009-30030號公報之段落編號0011~0015之記載。 As a polyphenylene sulfide resin, the descriptions of paragraphs 0014 to 0016 of JP-A-10-292114, paragraphs 0011 to 0013 of Japanese Patent Laid-Open No. Hei 10-279800, and Japanese Patent Laid-Open The description of paragraph number 0011 to 0015 of the Japanese Patent Publication No. 2009-30030.
本發明之熱塑性樹脂組合物含有無機纖維。於本發明中,其特徵在於:LDS添加劑之莫氏硬度比無機纖維之莫氏硬度小1.5以上,即無機纖維之莫氏硬度比LDS添加劑之莫氏硬度大1.5以上。無機纖維與LDS添加劑之莫氏硬度之差較佳為1.5~6.5,更佳為1.5~5.5。無機纖維可僅使用1種,亦可併用2種以上。 The thermoplastic resin composition of the present invention contains inorganic fibers. In the present invention, the Mohs hardness of the LDS additive is 1.5 or more less than the Mohs hardness of the inorganic fiber, that is, the Mohs hardness of the inorganic fiber is 1.5 or more larger than the Mohs hardness of the LDS additive. The difference between the Mohs hardness of the inorganic fiber and the LDS additive is preferably from 1.5 to 6.5, more preferably from 1.5 to 5.5. The inorganic fibers may be used alone or in combination of two or more.
本發明之熱塑性樹脂組合物於使用含有銅者作為LDS添加劑之情形時,較佳為包含莫氏硬度為5.5以上之無機纖維,更佳為包含莫氏硬度為5.5~8之無機纖維,進而較佳為包含莫氏硬度為5.5~7.5之無機纖維。藉由設為此種構成,存在可更有效地發揮本發明之效果之傾向。 When the thermoplastic resin composition of the present invention is used as an LDS additive, it is preferable to contain an inorganic fiber having a Mohs hardness of 5.5 or more, more preferably an inorganic fiber having a Mohs hardness of 5.5 to 8. Preferably, the inorganic fiber comprises a Mohs hardness of 5.5 to 7.5. With such a configuration, there is a tendency that the effects of the present invention can be exhibited more effectively.
於本發明之熱塑性樹脂組合物中,通常熱塑性樹脂與無機纖維佔總成分之60重量%以上。 In the thermoplastic resin composition of the present invention, the thermoplastic resin and the inorganic fiber are usually 60% by weight or more of the total components.
本發明之熱塑性樹脂組合物含有銅、銻及錫之至少1種,且具有比無機纖維之莫氏硬度小1.5以上之莫氏硬度。LDS添加劑可僅使用1種,亦可併用2種以上。 The thermoplastic resin composition of the present invention contains at least one of copper, bismuth and tin, and has a Mohs hardness which is 1.5 or more smaller than the Mohs hardness of the inorganic fiber. The LDS additive may be used alone or in combination of two or more.
本發明中之LDS添加劑係指如下化合物,即相對於三菱瓦斯化學公司(Mitsubishi Gas Chemical Company)製造之PA-MP6(於下述實施例中合成之MAMP6)樹脂100重量份,添加被認為是LDS添加劑之添加劑4重量份,使用波長為1064 nm之釔鋁石榴石雷射(Yttrium-Aluminum-Garnet Laser)以輸出為10 W、頻率為80 kHz、速度為3 m/s之條件進行照射,其後於Mac Dermid(麥德美)公司製造之非電解之M-Copper85之鍍敷槽中實施鍍敷步驟,當於該雷射照射面上應用金屬時,可形成鍍敷層。本發明中所使用之LDS添加劑可為合成品,亦可為市售品。又,市售品除作為LDS添加劑而市售者以外,只要滿足本發明中之LDS添加劑之必要條件,則亦可為作為其他用途而銷售之物質。公知之LDS添加劑多數為黑色者,於本發明中,亦可廣泛採用非黑色之LDS添加劑,因此可對樹脂成形品著色。 The LDS additive in the present invention means a compound which is considered to be LDS in relation to 100 parts by weight of PA-MP6 (MAMP6 synthesized in the following examples) resin manufactured by Mitsubishi Gas Chemical Company. 4 parts by weight of the additive of the additive, irradiated with a Yttrium-Aluminum-Garnet Laser having a wavelength of 1064 nm at an output of 10 W, a frequency of 80 kHz, and a speed of 3 m/s. Thereafter, a plating step is performed in a plating bath of an electroless M-Copper 85 manufactured by Mac Dermid, and a plating layer is formed when a metal is applied to the laser irradiation surface. The LDS additive used in the present invention may be a synthetic product or a commercially available product. Further, in addition to being commercially available as an LDS additive, the commercially available product may be a product that is sold as another use as long as it satisfies the requirements of the LDS additive in the present invention. Most of the known LDS additives are black. In the present invention, a non-black LDS additive can also be widely used, so that the resin molded article can be colored.
LDS添加劑之莫氏硬度較佳為1.0~5.0,更佳為2.0~5.0。LDS添加劑之平均粒徑較佳為0.01~50 μm,更佳為0.05~30 μm。藉由設為此種構成,存在適應鍍敷時之鍍敷層表面狀態之均一性趨於良好之傾向。 The Mohs hardness of the LDS additive is preferably from 1.0 to 5.0, more preferably from 2.0 to 5.0. The average particle diameter of the LDS additive is preferably from 0.01 to 50 μm, more preferably from 0.05 to 30 μm. With such a configuration, there is a tendency that the uniformity of the surface state of the plating layer at the time of plating tends to be good.
本發明之熱塑性樹脂組合物中的LDS添加劑之調配量相對於熱塑性樹脂100重量份,為1~30重量份,較佳為2~25重量份,更佳為3~18重量份。又,如下文所述,藉由使其 與滑石組合,可以較少之添加量形成鍍敷層。 The blending amount of the LDS additive in the thermoplastic resin composition of the present invention is 1 to 30 parts by weight, preferably 2 to 25 parts by weight, more preferably 3 to 18 parts by weight, per 100 parts by weight of the thermoplastic resin. Again, as described below, by making it In combination with talc, the plating layer can be formed in a small amount.
以下,闡述本發明中所使用之LDS添加劑之較佳之實施形態。藉由使用此種實施形態之LDS添加劑,存在可更有效地發揮本發明之效果之傾向。然而,本發明當然並非限定於該等實施形態者。 Hereinafter, preferred embodiments of the LDS additive used in the present invention will be described. By using the LDS additive of such an embodiment, there is a tendency that the effects of the present invention can be exhibited more effectively. However, the invention is of course not limited to the embodiments.
本發明中所使用之LDS添加劑之第一實施形態係含有銅之LDS添加劑。於第一實施形態之情形時,LDS添加劑中之金屬成分中銅之含量較佳為20~95重量%。作為含有銅之LDS添加劑之較佳例,可列舉Cu3(PO4)2Cu(OH)2。 The first embodiment of the LDS additive used in the present invention is a copper-containing LDS additive. In the case of the first embodiment, the content of copper in the metal component in the LDS additive is preferably from 20 to 95% by weight. A preferred example of the copper-containing LDS additive is Cu 3 (PO 4 ) 2 Cu(OH) 2 .
本發明中所使用之LDS添加劑之第二實施形態係含有銻及/或錫之LDS添加劑。作為金屬成分,僅含有銻或錫之一者之LDS添加劑中之金屬成分中銻或錫之含量分別較佳為1~95重量%,更佳為1.5~60重量%。於含有銻及錫兩者之態樣中,LDS添加劑之金屬成分中銻及錫之合計量較佳為90重量%以上,更佳為90~100重量%。 The second embodiment of the LDS additive used in the present invention is an LDS additive containing bismuth and/or tin. As the metal component, the content of bismuth or tin in the metal component of the LDS additive containing only one of bismuth or tin is preferably from 1 to 95% by weight, more preferably from 1.5 to 60% by weight. In the aspect containing both antimony and tin, the total amount of antimony and tin in the metal component of the LDS additive is preferably 90% by weight or more, more preferably 90 to 100% by weight.
於LDS添加劑之第二實施形態中,可較佳地例示含有銻及錫之LDS添加劑。於本實施形態中,更佳之態樣為含有銻及錫兩者且錫之含量多於銻,進而較佳之態樣為含有銻及錫兩者且含有氧化銻及/或氧化錫,並且錫之含量多於銻。 In the second embodiment of the LDS additive, an LDS additive containing bismuth and tin is preferably exemplified. In this embodiment, a more preferable aspect is that both tin and tin are contained, and the content of tin is more than yttrium. Further, it is preferable to contain both bismuth and tin and contain cerium oxide and/or tin oxide, and tin is used. More than 锑.
作為本發明中所使用之LDS添加劑,可例示摻雜有銻之錫、摻雜有銻之氧化錫、摻雜有氧化銻之氧化錫。 The LDS additive used in the present invention may, for example, be tin doped with antimony, tin oxide doped with antimony, or tin oxide doped with antimony oxide.
本發明之熱塑性樹脂組合物亦可含有鹼。當本發明中所 使用之LDS添加劑為酸性物質(例如pH值為6以下)之情形時,存在根據不同組合自身發生還原而使色調成為斑紋之情況,但藉由添加鹼可使所得之樹脂成形品之色調更均勻。鹼之種類並無特別規定,可使用氫氧化鈣、氫氧化鎂等。鹼可僅使用1種,亦可併用2種以上。例如,上述含有銅之LDS添加劑(Cu3(PO4)2Cu(OH)2)符合酸性物質之LDS添加劑。 The thermoplastic resin composition of the present invention may also contain a base. When the LDS additive used in the present invention is an acidic substance (for example, a pH of 6 or less), there is a case where the color tone becomes a streak depending on the reduction of the combination itself, but the obtained resin can be formed by adding a base. The color of the product is more uniform. The type of the base is not particularly limited, and calcium hydroxide, magnesium hydroxide or the like can be used. The base may be used alone or in combination of two or more. For example, the above-mentioned copper-containing LDS additive (Cu 3 (PO 4 ) 2 Cu(OH) 2 ) conforms to an acidic substance LDS additive.
本發明之熱塑性樹脂組合物中之鹼之調配量亦取決於LDS添加劑之種類及鹼之種類,但較佳為LDS添加劑之調配量之0.01~3重量%,更佳為0.05~1重量%。 The amount of the base in the thermoplastic resin composition of the present invention is also dependent on the type of the LDS additive and the type of the base, but is preferably from 0.01 to 3% by weight, more preferably from 0.05 to 1% by weight, based on the amount of the LDS additive.
本發明之熱塑性樹脂組合物亦可含有無機顏料。於本發明中,藉由添加無機顏料,可對樹脂成形品著色。無機顏料可僅使用1種,亦可併用2種以上。作為無機顏料,較佳為CIELab中之L*值為80以上且莫氏硬度為5.0以下之無機顏料。L*值更佳為50~100。無機顏料之莫氏硬度更佳為2~5,進而較佳為2.5~4.5。 The thermoplastic resin composition of the present invention may also contain an inorganic pigment. In the present invention, the resin molded article can be colored by adding an inorganic pigment. The inorganic pigment may be used alone or in combination of two or more. As the inorganic pigment, an inorganic pigment having an L * value of 80 or more and a Mohs hardness of 5.0 or less in CIELab is preferable. The L * value is preferably from 50 to 100. The Mohs hardness of the inorganic pigment is more preferably 2 to 5, and further preferably 2.5 to 4.5.
作為此種無機顏料,可例示ZnS(L*值:(87~95)、莫氏硬度:3~3.5)、ZnO(L*值:(88~96)、莫氏硬度:4~5),較佳為ZnS。 Examples of such an inorganic pigment include ZnS (L * value: (87 to 95), Mohs hardness: 3 to 3.5), ZnO (L * value: (88 to 96), and Mohs hardness: 4 to 5). It is preferably ZnS.
於本發明之熱塑性樹脂組合物中使用含有銅者作為LDS添加劑之情形時,特佳為使用莫氏硬度為5.0以下者。藉由使用此種無機顏料,存在可更有效地發揮本發明之效果之傾向。 When a copper-containing additive is used as the LDS additive in the thermoplastic resin composition of the present invention, it is particularly preferred to use a Mohs hardness of 5.0 or less. By using such an inorganic pigment, there is a tendency that the effects of the present invention can be exhibited more effectively.
本發明之熱塑性樹脂組合物中的無機顏料之調配量相對於熱塑性樹脂組合物100重量份,較佳為0.1~20重量份,更佳為0.3~15重量份,進而較佳為0.5~12重量份。 The amount of the inorganic pigment in the thermoplastic resin composition of the present invention is preferably 0.1 to 20 parts by weight, more preferably 0.3 to 15 parts by weight, still more preferably 0.5 to 12 parts by weight based on 100 parts by weight of the thermoplastic resin composition. Share.
本發明之熱塑性樹脂組合物亦可含有滑石。於本發明中,藉由調配滑石,即便減少LSD添加劑之添加量亦可形成適當之鍍敷層。 The thermoplastic resin composition of the present invention may also contain talc. In the present invention, by blending talc, a suitable plating layer can be formed even if the amount of addition of the LSD additive is reduced.
本發明之熱塑性樹脂組合物中的滑石之調配量相對於熱塑性樹脂組合物100重量份,較佳為1~20重量份,更佳為2~15重量份,進而較佳為2~10重量份。藉由調配滑石,可使LDS添加劑之調配量相對於熱塑性樹脂100重量份例如設為1~15重量份,進而設為1~10重量份。 The amount of the talc in the thermoplastic resin composition of the present invention is preferably from 1 to 20 parts by weight, more preferably from 2 to 15 parts by weight, still more preferably from 2 to 10 parts by weight, per 100 parts by weight of the thermoplastic resin composition. . The blending amount of the LDS additive can be, for example, 1 to 15 parts by weight, and further preferably 1 to 10 parts by weight, based on 100 parts by weight of the thermoplastic resin.
本發明之熱塑性樹脂組合物亦可於無損本發明之效果之範圍內進而含有各種添加劑。作為此類添加劑,可列舉:脫模劑、光穩定劑、熱穩定劑、抗氧化劑、紫外線吸收劑、阻燃劑、染顏料、螢光增白劑、抗滴下劑、抗靜電劑、防霧劑、潤滑劑、抗結塊劑、流動性改良劑、塑化劑、分散劑、抗菌劑等。 The thermoplastic resin composition of the present invention may further contain various additives within the range which does not impair the effects of the present invention. As such additives, there may be mentioned mold release agents, light stabilizers, heat stabilizers, antioxidants, ultraviolet absorbers, flame retardants, dyes, fluorescent whitening agents, anti-dripping agents, antistatic agents, and anti-fogging agents. Agents, lubricants, anti-caking agents, fluidity improvers, plasticizers, dispersants, antibacterial agents, and the like.
又,該等成分可僅使用1種,亦可併用2種以上。本發明之熱塑性樹脂組合物較佳為無機纖維以外之成分之99重量%以上莫氏硬度低於無機纖維,更佳為無機纖維以外之所有成分之莫氏硬度均低於無機纖維成分。 Further, these components may be used alone or in combination of two or more. The thermoplastic resin composition of the present invention preferably has a Mohs hardness of less than 99% by weight or more of the components other than the inorganic fibers, and more preferably all of the components other than the inorganic fibers have a Mohs hardness lower than that of the inorganic fibers.
作為光穩定劑,例如可列舉:二苯甲酮系化合物、水楊 酸酯系化合物、苯并三唑系化合物、及氰基丙烯酸酯系化合物等具有紫外線吸收效果之化合物、以及受阻胺系化合物及受阻酚系化合物等具有自由基捕捉能力之化合物。 Examples of the light stabilizer include a benzophenone compound and a water yang. A compound having an ultraviolet absorbing effect such as an acid ester compound, a benzotriazole compound, or a cyanoacrylate compound, and a compound having a radical scavenging ability such as a hindered amine compound or a hindered phenol compound.
作為光穩定劑,藉由將具有紫外線吸收效果之化合物與具有自由基捕捉能力之化合物併用,可使其發揮更高之穩定化效果。 As a light stabilizer, a compound having an ultraviolet absorbing effect and a compound having a radical scavenging ability can be used in combination to exert a higher stabilizing effect.
作為光穩定劑,可使用1種,亦可組合2種以上而使用。 One type of the light stabilizer may be used, or two or more types may be used in combination.
作為二苯甲酮系化合物,並無特別限定,例如可列舉:2-羥基-4-正辛氧基二苯甲酮、2,2'-二羥基-4-甲氧基二苯甲酮、2,2'-二羥基-4,4'-二甲氧基二苯甲酮、2,2'4,4'-四羥基二苯甲酮、2-羥基-4-甲氧基二苯甲酮、2,4-二羥基二苯甲酮、及2-羥基-4-辛氧基二苯甲酮等。 The benzophenone-based compound is not particularly limited, and examples thereof include 2-hydroxy-4-n-octyloxybenzophenone and 2,2'-dihydroxy-4-methoxybenzophenone. 2,2'-dihydroxy-4,4'-dimethoxybenzophenone, 2,2'4,4'-tetrahydroxybenzophenone, 2-hydroxy-4-methoxybenzophenone Ketone, 2,4-dihydroxybenzophenone, and 2-hydroxy-4-octyloxybenzophenone.
作為水楊酸酯系化合物,並無特別限定,例如可列舉:水楊酸苯酯、水楊酸對第三丁基苯酯、及水楊酸對辛基苯酯等。 The salicylate-based compound is not particularly limited, and examples thereof include phenyl salicylate, p-tert-butylphenyl salicylate, and p-octylphenyl salicylate.
作為苯并三唑系化合物,並無特別限定,例如可列舉:2-(2'-羥基-5'-甲基苯基)苯并三唑、2-(3-第三丁基-5-甲基-2-羥基苯基)-5-氯苯并三唑、2-(2'-羥基-3',5'-二-第三丁基苯基)苯并三唑、2-(2'-羥基-5'-第三辛基苯基)苯并三唑、2-(2'-羥基-3'-第三丁基-5'-甲基苯基)-5-氯苯并三唑、2-(2'-羥基-3',5'-二-第三丁基苯基)-5-氯苯并三唑、2-(2'-羥基-3',5'-二-第三胺基苯基)苯并三唑、2-{2'-羥基-3'-(3",4",5",6"-四氫鄰苯二甲醯亞胺甲基)-5'-甲基苯基}苯并三唑、2,2-亞甲基雙{4-(1,1,3,3-四甲基丁基)-6-(2H-苯并三 唑-2-基)苯酚}、及6-(2-苯并三唑基)-4-第三辛基-6'-第三丁基-4'-甲基-2,2'-亞甲基雙苯酚等。 The benzotriazole-based compound is not particularly limited, and examples thereof include 2-(2'-hydroxy-5'-methylphenyl)benzotriazole and 2-(3-tert-butyl-5-). Methyl-2-hydroxyphenyl)-5-chlorobenzotriazole, 2-(2'-hydroxy-3',5'-di-t-butylphenyl)benzotriazole, 2-(2 '-Hydroxy-5'-trioctylphenyl)benzotriazole, 2-(2'-hydroxy-3'-t-butyl-5'-methylphenyl)-5-chlorobenzotriene Oxazole, 2-(2'-hydroxy-3',5'-di-t-butylphenyl)-5-chlorobenzotriazole, 2-(2'-hydroxy-3',5'-di- Third aminophenyl)benzotriazole, 2-{2'-hydroxy-3'-(3",4",5",6"-tetrahydrophthalimidomethyl)-5 '-Methylphenyl}benzotriazole, 2,2-methylenebis{4-(1,1,3,3-tetramethylbutyl)-6-(2H-benzotriene Zin-2-yl)phenol}, and 6-(2-benzotriazolyl)-4-thanooctyl-6'-tert-butyl-4'-methyl-2,2'-methylene Bisphenol and the like.
作為氰基丙烯酸酯系化合物,並無特別限定,例如可列舉:2-氰基-3,3'-二苯基丙烯酸2-乙基己酯、及2-氰基-3,3'-二苯基丙烯酸乙酯等。 The cyanoacrylate compound is not particularly limited, and examples thereof include 2-cyano-3,3'-diphenyl 2-ethylhexyl acrylate and 2-cyano-3,3'-di Ethyl phenyl acrylate or the like.
作為受阻胺系化合物,並無特別限定,例如可列舉:癸二酸雙(2,2,6,6-四甲基-4-哌啶基)酯、丁二酸雙(2,2,6,6-四甲基-4-哌啶基)酯、癸二酸雙(1,2,2,6,6-五甲基-4-哌啶基)酯、癸二酸雙(1-辛氧基-2,2,6,6-四甲基-4-哌啶基)酯、正丁基-3,5-二-第三丁基-4-羥基苄基丙二酸雙(1,2,2,6,6-五甲基-4-哌啶基)酯、1-(2-羥基乙基)-2,2,6,6-四甲基-4-羥基哌啶與琥珀酸之縮合物、N,N'-雙(2,2,6,6-四甲基-4-哌啶基)己二胺與4-第三辛基胺基-2,6-二氯-1,3,5-三之直鏈狀或環狀縮合物、次氮基三乙酸三(2,2,6,6-四甲基-4-哌啶基)酯、四(2,2,6,6-四甲基-4-哌啶基)-1,2,3,4-丁烷四甲酸酯、1,1'-(1,2-乙烷二基)-雙(3,3,5,5-四甲基哌酮)、4-苯甲醯基-2,2,6,6-四甲基哌啶、4-硬脂氧基-2,2,6,6-四甲基哌啶、2-正丁基-2-(2-羥基-3,5-二-第三丁基苄基)丙二酸雙(1,2,2,6,6-五甲基哌啶基)酯、3-正辛基-7,7,9,9-四甲基-1,3,8-三氮雜螺[4.5]癸烷-2,4-二酮、癸二酸雙(1-辛氧基-2,2,6,6-四甲基哌啶基)酯、丁二酸雙(1-辛氧基-2,2,6,6-四甲基哌啶基)酯、N,N'-雙(2,2,6,6-四甲基-4-哌啶基)-1,3-苯二甲醯胺、N,N'-雙(2,2,6,6-四甲基-4-哌啶基)-己二胺與4-啉基-2,6-二氯-1,3,5-三之直鏈狀或環狀縮合物、2-氯- 4,6-雙(4-正丁基胺基-2,2,6,6-四甲基哌啶基)-1,3,5-三與1,2-雙(3-胺基丙基胺基)乙烷之縮合物、2-氯-4,6-二-(4-正丁基胺基-1,2,2,6,6-五甲基哌啶基)-1,3,5-三與1,2-雙-(3-胺基丙基胺基)乙烷之縮合物、8-乙醯基-3-十二烷基-7,7,9,9-四甲基-1,3,8-三氮雜螺[4.5]癸烷-2,4-二酮、3-十二烷基-1-(2,2,6,6-四甲基-4-哌啶基)吡咯啶-2,5-二酮、3-十二烷基-1-(1,2,2,6,6-五甲基-4-哌啶基)吡咯啶-2,5-二酮、4-十六烷氧基-與4-硬脂氧基-2,2,6,6-四甲基哌啶之混合物、N,N'-雙(2,2,6,6-四甲基-4-哌啶基)己二胺與4-環己基胺基-2,6-二氯-1,3,5-三之縮合物、1,2-雙(3-胺基丙基胺基)乙烷與2,4,6-三氯-1,3,5-三及4-丁基胺基-2,2,6,6-四甲基哌啶之縮合物(CAS登錄編號[136504-96-6])、1,6-己二胺與2,4,6-三氯-1,3,5-三、N,N-二丁基胺及4-丁基胺基-2,2,6,6-四甲基哌啶之縮合物(CAS登錄編號[192268-64-7])、N-(2,2,6,6-四甲基-4-哌啶基)-正十二烷基丁二醯亞胺、N-(1,2,2,6,6-五甲基-4-哌啶基)-正十二烷基丁二醯亞胺、2-十一烷基-7,7,9,9-四甲基-1-氧雜-3,8-二氮雜-4-氧代-螺[4.5]癸烷、7,7,9,9-四甲基-2-環十一烷基-1-氧雜-3,8-二氮雜-4-氧代-螺[4.5]癸烷與表氯醇之反應產物、1,1-雙(1,2,2,6,6-五甲基-4-哌啶基氧基羰基)-2-(4-甲氧基苯基)乙烯、N,N'-雙-甲醯基-N,N'-雙(2,2,6,6-四甲基-4-哌啶基)己二胺、4-甲氧基亞甲基丙二酸與1,2,2,6,6-五甲基-4-羥基哌啶之二酯、聚[甲基丙基-3-氧基-4-(2,2,6,6-四甲基-4-哌啶基)]矽氧烷、順丁烯二酸酐-α-烯烴共聚物與2,2,6,6-四甲 基-4-胺基哌啶或1,2,2,6,6-五甲基-4-胺基哌啶之反應產物、2,4-雙[N-(1-環己氧基-2,2,6,6-四甲基哌啶-4-基)-N-丁基胺基]-6-(2-羥基乙基)胺基-1,3,5-三、1-(2-羥基-2-甲基丙氧基)-4-十八碳醯氧基-2,2,6,6-四甲基哌啶、5-(2-乙基己醯基)氧基甲基-3,3,5-三甲基-2-啉酮、Sanduvor(科萊恩(Clariant);CAS登錄編號[106917-31-1])、5-(2-乙基己醯基)氧基甲基-3,3,5-三甲基-2-啉酮、2,4-雙[(1-環己氧基-2,2,6,6-哌啶-4-基)丁基胺基]-6-氯-均三與N,N'-雙(3-胺基丙基)乙二胺)之反應產物、1,3,5-三(N-環己基-N-(2,2,6,6-四甲基哌啶-3-酮-4-基)胺基)-均三、1,3,5-三(N-環己基-N-(1,2,2,6,6-五甲基哌-3-酮-4-基)胺基)-均三、N,N',N",N'''-四-(4,6-雙-(丁基-(N-甲基-2,2,6,6-四甲基哌啶-4-基)胺基)-三-2-基)-4,7-二氮雜癸烷-1,10-二胺、聚[[6-(1,1,3,3-四甲基丁基)胺基-1,3,5-三-2,4-二基][(2,2,6,6-四甲基-4-哌啶基)亞胺基]六亞甲基{(2,2,6,6-四甲基-4-哌啶基)亞胺基}]等,尤其可列舉:癸二酸雙(2,2,6,6-四甲基-4-哌啶基)酯、丁二酸雙(2,2,6,6-四甲基-4-哌啶基)酯、癸二酸雙(1,2,2,6,6-五甲基-4-哌啶基)酯、N,N'-雙(2,2,6,6-四甲基-4-哌啶基)-1,3-苯二甲醯胺、N,N',N",N'''-四-(4,6-雙-(丁基-(N-甲基-2,2,6,6-四甲基哌啶-4-基)胺基)-三-2-基)-4,7-二氮雜癸烷-1,10-二胺等。 The hindered amine compound is not particularly limited, and examples thereof include bis(2,2,6,6-tetramethyl-4-piperidyl) sebacate and bis(2,2,6 succinate). ,6-tetramethyl-4-piperidinyl), bis(1,2,2,6,6-pentamethyl-4-piperidinyl) sebacate, bis (1-octyl) sebacate Oxy-2,2,6,6-tetramethyl-4-piperidinyl), n-butyl-3,5-di-t-butyl-4-hydroxybenzylmalonate bis (1, 2,2,6,6-pentamethyl-4-piperidinyl), 1-(2-hydroxyethyl)-2,2,6,6-tetramethyl-4-hydroxypiperidine and succinic acid Condensate, N,N'-bis(2,2,6,6-tetramethyl-4-piperidyl)hexanediamine and 4-t-octylamino-2,6-dichloro-1 , 3,5-three a linear or cyclic condensate, tris(2,2,6,6-tetramethyl-4-piperidyl) nitrilotriacetate, tetrakis(2,2,6,6-tetramethyl) 4-piperidinyl)-1,2,3,4-butane tetracarboxylate, 1,1'-(1,2-ethanediyl)-bis(3,3,5,5-tetra Methylpiper Ketone), 4-benzylidene-2,2,6,6-tetramethylpiperidine, 4-stearyloxy-2,2,6,6-tetramethylpiperidine, 2-n-butyl 2-(2-hydroxy-3,5-di-tert-butylbenzyl)malonic acid bis(1,2,2,6,6-pentamethylpiperidyl) ester, 3-n-octyl -7,7,9,9-tetramethyl-1,3,8-triazaspiro[4.5]decane-2,4-dione, sebacic acid bis(1-octyloxy-2,2 ,6,6-tetramethylpiperidinyl), bis(1-octyloxy-2,2,6,6-tetramethylpiperidyl) succinate, N,N'-bis (2 ,2,6,6-tetramethyl-4-piperidinyl)-1,3-benzenedimethylamine, N,N'-bis(2,2,6,6-tetramethyl-4-piperidin Pyridyl)-hexanediamine and 4- Lolinyl-2,6-dichloro-1,3,5-three Linear or cyclic condensate, 2-chloro-4,6-bis(4-n-butylamino-2,2,6,6-tetramethylpiperidinyl)-1,3,5- three Condensate with 1,2-bis(3-aminopropylamino)ethane, 2-chloro-4,6-di-(4-n-butylamino-1,2,2,6,6 -pentamethylpiperidinyl)-1,3,5-three a condensate with 1,2-bis-(3-aminopropylamino)ethane, 8-ethylindenyl-3-dodecyl-7,7,9,9-tetramethyl-1, 3,8-triazaspiro[4.5]decane-2,4-dione, 3-dodecyl-1-(2,2,6,6-tetramethyl-4-piperidinyl)pyrrole Pyridine-2,5-dione, 3-dodecyl-1-(1,2,2,6,6-pentamethyl-4-piperidinyl)pyrrolidine-2,5-dione, 4 a mixture of hexadecyloxy- and 4-stearyloxy-2,2,6,6-tetramethylpiperidine, N,N'-bis(2,2,6,6-tetramethyl- 4-piperidinyl) hexamethylenediamine and 4-cyclohexylamino-2,6-dichloro-1,3,5-tri Condensate, 1,2-bis(3-aminopropylamino)ethane and 2,4,6-trichloro-1,3,5-tri And a condensate of 4-butylamino-2,2,6,6-tetramethylpiperidine (CAS registration number [136504-96-6]), 1,6-hexanediamine and 2,4,6 -Trichloro-1,3,5-three , N,N-dibutylamine and 4-butylamino-2,2,6,6-tetramethylpiperidine condensate (CAS registration number [192268-64-7]), N-(2 ,2,6,6-tetramethyl-4-piperidinyl)-n-dodecylbutaneimine, N-(1,2,2,6,6-pentamethyl-4-piperidine Base)-n-dodecylbutanediamine, 2-undecyl-7,7,9,9-tetramethyl-1-oxa-3,8-diaza-4-oxo - Spiro[4.5]decane, 7,7,9,9-tetramethyl-2-cycloundecyl-1-oxa-3,8-diaza-4-oxo-spiro[4.5] Reaction product of decane with epichlorohydrin, 1,1-bis(1,2,2,6,6-pentamethyl-4-piperidinyloxycarbonyl)-2-(4-methoxyphenyl) Ethylene, N,N'-bis-methylindenyl-N,N'-bis(2,2,6,6-tetramethyl-4-piperidyl)hexanediamine, 4-methoxymethylene Dimer of malonic acid and 1,2,2,6,6-pentamethyl-4-hydroxypiperidine, poly[methylpropyl-3-oxy-4-(2,2,6,6 -tetramethyl-4-piperidinyl)]nonane, maleic anhydride-α-olefin copolymer and 2,2,6,6-tetramethyl-4-aminopiperidine or 1,2 , 2,6,6-pentamethyl-4-aminopiperidine reaction product, 2,4-bis[N-(1-cyclohexyloxy-2,2,6,6-tetramethylpiperidine) 4-yl)-N-butylamino]-6-(2-hydroxyethyl)amino-1,3,5-three , 1-(2-hydroxy-2-methylpropoxy)-4-octadecyloxy-2,2,6,6-tetramethylpiperidine, 5-(2-ethylhexyl) )oxymethyl-3,3,5-trimethyl-2- Lulinone, Sanduvor (Clariant; CAS accession number [106917-31-1]), 5-(2-ethylhexyl)oxymethyl-3,3,5-trimethyl-2 - Chlorinone, 2,4-bis[(1-cyclohexyloxy-2,2,6,6-piperidin-4-yl)butylamino]-6-chloro-all three Reaction product with N,N'-bis(3-aminopropyl)ethylenediamine), 1,3,5-tris(N-cyclohexyl-N-(2,2,6,6-tetramethyl) Piperidin-3-one-4-yl)amino)--three 1,3,5-tris(N-cyclohexyl-N-(1,2,2,6,6-pentamethylpiperidine -3-keto-4-yl)amino)--three ,N,N',N",N'''-tetra-(4,6-bis-(butyl-(N-methyl-2,2,6,6-tetramethylpiperidin-4-yl) Amino)-three -2-yl)-4,7-diazadecane-1,10-diamine, poly[[6-(1,1,3,3-tetramethylbutyl)amino-1,3, 5-three -2,4-diyl][(2,2,6,6-tetramethyl-4-piperidinyl)imido]hexamethylene {(2,2,6,6-tetramethyl-) 4-piperidinyl)imine}], etc., particularly, bis(2,2,6,6-tetramethyl-4-piperidyl) sebacate, bis(2,2) ,6,6-tetramethyl-4-piperidinyl), bis(1,2,2,6,6-pentamethyl-4-piperidinyl) sebacate, N,N'-double (2,2,6,6-tetramethyl-4-piperidinyl)-1,3-benzenedimethylamine, N,N',N",N'''-tetra-(4,6- Bis-(butyl-(N-methyl-2,2,6,6-tetramethylpiperidin-4-yl)amino)-three -2-yl)-4,7-diazadecane-1,10-diamine, and the like.
作為受阻酚系化合物,並無特別限定,例如可列舉:季戊四醇基-四{3-(3,5-二-第三丁基-4-羥基苯基)丙酸酯}、N,N-六亞甲基雙(3,5-二-第三丁基-4-羥基-苯丙醯胺)、三 乙二醇-雙{3-(3-第三丁基-5-甲基-4-羥基苯基)丙酸酯}、3,9-雙{2-[3-(3-第三丁基-4-羥基-5-甲基苯基)丙炔氧基]-1,1-二甲基乙基}-2,4,8,10-四氧雜螺[5,5]十一烷、膦酸3,5-二-第三丁基-4-羥基-苄酯-二乙酯、1,3,5-三甲基-2,4,6-三(3,5-二-第三丁基-4-羥基苄基)苯、1,3,5-三(4-第三丁基-3-羥基-2,6-二甲基苄基)異氰酸酯等。 The hindered phenol-based compound is not particularly limited, and examples thereof include pentaerythritol-tetrakis {3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate}, and N,N-hexa. Methylene bis(3,5-di-t-butyl-4-hydroxy-phenylpropanamide), three Ethylene glycol-bis{3-(3-tert-butyl-5-methyl-4-hydroxyphenyl)propionate}, 3,9-bis{2-[3-(3-t-butyl) 4-hydroxy-5-methylphenyl)propynyloxy]-1,1-dimethylethyl}-2,4,8,10-tetraoxaspiro[5,5]undecane, Phosphonic acid 3,5-di-t-butyl-4-hydroxy-benzyl ester-diethyl ester, 1,3,5-trimethyl-2,4,6-tris(3,5-di-third Butyl-4-hydroxybenzyl)benzene, 1,3,5-tris(4-t-butyl-3-hydroxy-2,6-dimethylbenzyl)isocyanate, and the like.
本實施形態之樹脂組合物亦可進而含有熱穩定劑。作為熱穩定劑,可為選自由酚系化合物、亞磷酸酯系化合物、受阻胺系化合物、三系化合物、及硫系化合物所組成之群中之至少1種。 The resin composition of the present embodiment may further contain a heat stabilizer. The heat stabilizer may be selected from the group consisting of a phenol compound, a phosphite compound, a hindered amine compound, and three At least one of a group consisting of a compound and a sulfur-based compound.
作為熱穩定劑,可使用1種,亦可組合2種以上而使用。 One type of the heat stabilizer may be used, or two or more types may be used in combination.
作為酚系化合物,並無特別限定,例如可列舉受阻酚系化合物。作為受阻酚系化合物,例如可列舉:N,N'-己烷-1,6-二基雙[3-(3,5-二-第三丁基-4-羥基苯基丙醯胺)、季戊四醇基-四[3-(3,5-二-第三丁基-4-羥基苯基)丙酸酯]、N,N'-六亞甲基雙(3,5-二-第三丁基-4-羥基-苯丙醯胺)、三乙二醇-雙[3-(3-第三丁基-5-甲基-4-羥基苯基)丙酸酯]、3,9-雙{2-[3-(3-第三丁基-4-羥基-5-甲基苯基)丙炔氧基]-1,1-二甲基乙基}-2,4,8,10-四氧雜螺[5.5]十一烷、膦酸3,5-二-第三丁基-4-羥基苄酯-二乙酯、1,3,5-三甲基-2,4,6-三(3,5-二-第三丁基-4-羥基苄基)苯、及1,3,5-三(4-第三丁基-3-羥基-2,6-二甲基苄基)異氰尿酸等。 The phenolic compound is not particularly limited, and examples thereof include hindered phenol compounds. Examples of the hindered phenol-based compound include N,N'-hexane-1,6-diylbis[3-(3,5-di-t-butyl-4-hydroxyphenylpropionamide), Pentaerythritol-tetrakis[3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate], N,N'-hexamethylenebis(3,5-di-third 4-hydroxy-phenylpropanamide), triethylene glycol-bis[3-(3-tert-butyl-5-methyl-4-hydroxyphenyl)propionate], 3,9-double {2-[3-(3-Tert-butyl-4-hydroxy-5-methylphenyl)propynyloxy]-1,1-dimethylethyl}-2,4,8,10- Tetraoxaspiro[5.5]undecane, 3,5-di-t-butyl-4-hydroxybenzyl ester-diethyl phosphonate, 1,3,5-trimethyl-2,4,6- Tris(3,5-di-t-butyl-4-hydroxybenzyl)benzene, and 1,3,5-tris(4-t-butyl-3-hydroxy-2,6-dimethylbenzyl ) Isocyanuric acid, etc.
作為亞磷酸酯系化合物,並無特別限定,例如可列舉: 亞磷酸三辛酯、亞磷酸三月桂酯、亞磷酸三癸酯、亞磷酸辛基二苯酯、亞磷酸三異癸酯、亞磷酸苯基二異癸酯、亞磷酸苯基二(十三烷基)酯、亞磷酸二苯基異辛酯、亞磷酸二苯基異癸酯、亞磷酸二苯基(十三烷基)酯、亞磷酸三苯酯、亞磷酸三(壬基苯基)酯、亞磷酸三(2,4-二-第三丁基苯基)酯、亞磷酸三(2,4-二-第三丁基-5-甲基苯基)酯、亞磷酸三(丁氧基乙基)酯、二亞磷酸4,4'-亞丁基-雙(3-甲基-6-第三丁基苯基-四-十三烷基)酯、4,4'-異亞丙基二苯基二亞磷酸四(C12~C15混合烷基)酯、二(壬基苯基)亞磷酸4,4'-異亞丙基雙(2-第三丁基苯基)酯、亞磷酸三(聯苯)酯、四(十三烷基)-1,1,3-三(2-甲基-5-第三丁基-4-羥基苯基)丁烷二亞磷酸酯、4,4'-亞丁基雙(3-甲基-6-第三丁基苯基)二亞磷酸四(十三烷基)酯、4,4'-異亞丙基二苯基二亞磷酸四(C1~C15混合烷基)酯、亞磷酸三(單、二混合壬基苯基)酯、二(壬基苯基)亞磷酸4,4'-異亞丙基雙(2-第三丁基苯基)酯、9,10-二-氫-9-氧雜-9-氧雜-10-磷雜菲-10-氧化物、亞磷酸三(3,5-二-第三丁基-4-羥基苯基)酯、氫化-4,4'-異亞丙基二苯基聚亞磷酸酯、雙(辛基苯基).雙(4,4'-亞丁基雙(3-甲基-6-第三丁基苯基)).1,6-己醇二亞磷酸酯、1,1,3-三(2-甲基-4-羥基-5-第三丁基苯基)二亞磷酸六(十三烷基)酯、亞磷酸三(4,4'-異亞丙基雙(2-第三丁基苯基))酯、亞磷酸三(1,3-硬脂醯氧基異丙基)酯、亞磷酸2,2-亞甲基雙(4,6-二-第三丁基苯基)辛酯、2-乙基己基亞磷酸2,2-亞甲基雙(3-甲基-4,6-二-第三丁基苯基)酯、4,4'-伸聯苯基二亞磷酸 四(2,4-二-第三丁基-5-甲基苯基)酯、及4,4'-伸聯苯基二亞磷酸四(2,4-二-第三丁基苯基)酯等。 The phosphite-based compound is not particularly limited, and examples thereof include: Trioctyl phosphite, trilauryl phosphite, tridecyl phosphite, octyl diphenyl phosphite, triisodecyl phosphite, phenyl diisononyl phosphite, phenyl diphosphite (13 Alkyl) ester, diphenyl isooctyl phosphite, diphenylisodecyl phosphite, diphenyl (tridecyl) phosphite, triphenyl phosphite, tris(phenyl) phosphite ) ester, tris(2,4-di-tert-butylphenyl) phosphite, tris(2,4-di-tert-butyl-5-methylphenyl) phosphite, tris (phosphoric acid) Butoxyethyl) ester, 4,4'-butylene-bis(3-methyl-6-t-butylphenyl-tetra-tridecyl) diphosphite, 4,4'-iso Propylene diphenyl diphosphite tetra(C12-C15 mixed alkyl) ester, bis(nonylphenyl)phosphite 4,4'-isopropylidene bis(2-t-butylphenyl) ester , tris(biphenyl) phosphite, tetrakis(tridecyl)-1,1,3-tris(2-methyl-5-t-butyl-4-hydroxyphenyl)butane diphosphite 4,4'-butylenebis(3-methyl-6-tert-butylphenyl)diphosphite tetrakis(tridecyl)ester, 4,4'-isopropylidenediphenyldiphenyl Tetraphosphate (C1~C15 mixed alkyl) ester, triphosphite tris(mono- and di-mixed fluorenyl) Ester, bis(nonylphenyl)phosphite 4,4'-isopropylidene bis(2-tert-butylphenyl) ester, 9,10-di-hydro-9-oxa-9- Oxa-10-phosphaphenanthrene-10-oxide, tris(3,5-di-tert-butyl-4-hydroxyphenyl) phosphite, hydrogenated-4,4'-isopropylidene diphenyl Polyphosphite, bis(octylphenyl). Bis(4,4'-butylene bis(3-methyl-6-t-butylphenyl)). 1,6-hexanol diphosphite, 1,1,3-tris(2-methyl-4-hydroxy-5-t-butylphenyl)diphosphoric acid hexatridecyl ester, sub Tris(4,4'-isopropylidenebis(2-tert-butylphenyl)) phosphate, tris(1,3-stearyloxyisopropyl) phosphite, phosphorous acid 2,2 -methylenebis(4,6-di-t-butylphenyl)octyl ester, 2-ethylhexylphosphite 2,2-methylenebis(3-methyl-4,6-di- Tributylphenyl)ester, 4,4'-extended biphenyl diphosphoric acid Tetrakis(2,4-di-t-butyl-5-methylphenyl) ester, and 4,4'-extended biphenyl diphosphite tetrakis(2,4-di-t-butylphenyl) Ester and the like.
作為亞磷酸酯系化合物,並無特別限定,例如亦可列舉季戊四醇型亞磷酸酯化合物。作為季戊四醇型亞磷酸酯化合物,例如可列舉:2,6-二-第三丁基-4-甲基苯基.苯基.季戊四醇二亞磷酸酯、2,6-二-第三丁基-4-甲基苯基.甲基.季戊四醇二亞磷酸酯、2,6-二-第三丁基-4-甲基苯基.2-乙基己基.季戊四醇二亞磷酸酯、2,6-二-第三丁基-4-甲基苯基.異癸基.季戊四醇二亞磷酸酯、2,6-二-第三丁基-4-甲基苯基.月桂基.季戊四醇二亞磷酸酯、2,6-二-第三丁基-4-甲基苯基.異十三烷基.季戊四醇二亞磷酸酯、2,6-二-第三丁基-4-甲基苯基.硬脂基.季戊四醇二亞磷酸酯、2,6-二-第三丁基-4-甲基苯基.環己基.季戊四醇二亞磷酸酯、2,6-二-第三丁基-4-甲基苯基.苄基.季戊四醇二亞磷酸酯、2,6-二-第三丁基-4-甲基苯基.乙基溶纖劑.季戊四醇二亞磷酸酯、2,6-二-第三丁基-4-甲基苯基.丁基卡必醇.季戊四醇二亞磷酸酯、2,6-二-第三丁基-4-甲基苯基.辛基苯基.季戊四醇二亞磷酸酯、2,6-二-第三丁基-4-甲基苯基.壬基苯基.季戊四醇二亞磷酸酯、雙(2,6-二-第三丁基-4-甲基苯基)季戊四醇二亞磷酸酯、雙(2,6-二-第三丁基-4-乙基苯基)季戊四醇二亞磷酸酯、2,6-二-第三丁基-4-甲基苯基.2,6-二-第三丁基苯基.季戊四醇二亞磷酸酯、2,6-二-第三丁基-4-甲基苯基.2,4-二-第三丁基苯基.季戊四醇二亞磷酸酯、2,6-二-第三丁基-4-甲基苯基.2,4-二-第三辛基苯基.季戊四醇二亞磷 酸酯、2,6-二-第三丁基-4-甲基苯基.2-環己基苯基.季戊四醇二亞磷酸酯、2,6-二-第三戊基-4-甲基苯基.苯基.季戊四醇二亞磷酸酯、雙(2,6-二-第三戊基-4-甲基苯基)季戊四醇二亞磷酸酯、及雙(2,6-二-第三辛基-4-甲基苯基)季戊四醇二亞磷酸酯等。 The phosphite-based compound is not particularly limited, and examples thereof include a pentaerythritol-type phosphite compound. Examples of the pentaerythritol type phosphite compound include 2,6-di-t-butyl-4-methylphenyl group. Phenyl. Pentaerythritol diphosphite, 2,6-di-tert-butyl-4-methylphenyl. methyl. Pentaerythritol diphosphite, 2,6-di-tert-butyl-4-methylphenyl. 2-ethylhexyl. Pentaerythritol diphosphite, 2,6-di-tert-butyl-4-methylphenyl. Heterogeneous base. Pentaerythritol diphosphite, 2,6-di-tert-butyl-4-methylphenyl. Laurel. Pentaerythritol diphosphite, 2,6-di-tert-butyl-4-methylphenyl. Isotridecyl. Pentaerythritol diphosphite, 2,6-di-tert-butyl-4-methylphenyl. Stearyl. Pentaerythritol diphosphite, 2,6-di-tert-butyl-4-methylphenyl. Cyclohexyl. Pentaerythritol diphosphite, 2,6-di-tert-butyl-4-methylphenyl. Benzyl. Pentaerythritol diphosphite, 2,6-di-tert-butyl-4-methylphenyl. Ethyl cellosolve. Pentaerythritol diphosphite, 2,6-di-tert-butyl-4-methylphenyl. Butyl carbitol. Pentaerythritol diphosphite, 2,6-di-tert-butyl-4-methylphenyl. Octylphenyl. Pentaerythritol diphosphite, 2,6-di-tert-butyl-4-methylphenyl. Nonylphenyl. Pentaerythritol diphosphite, bis(2,6-di-tert-butyl-4-methylphenyl)pentaerythritol diphosphite, bis(2,6-di-tert-butyl-4-ethylbenzene Base) pentaerythritol diphosphite, 2,6-di-tert-butyl-4-methylphenyl. 2,6-di-t-butylphenyl. Pentaerythritol diphosphite, 2,6-di-tert-butyl-4-methylphenyl. 2,4-di-t-butylphenyl. Pentaerythritol diphosphite, 2,6-di-tert-butyl-4-methylphenyl. 2,4-di-third octylphenyl. Pentaerythritol diphosphorus Acid ester, 2,6-di-tert-butyl-4-methylphenyl. 2-cyclohexylphenyl. Pentaerythritol diphosphite, 2,6-di-third amyl-4-methylphenyl. Phenyl. Pentaerythritol diphosphite, bis(2,6-di-third-pentyl-4-methylphenyl)pentaerythritol diphosphite, and bis(2,6-di-th-octyl-4-methyl) Phenyl) pentaerythritol diphosphite, and the like.
作為季戊四醇型亞磷酸酯化合物,較佳為雙(2,6-二-第三丁基-4-甲基苯基)季戊四醇二亞磷酸酯、雙(2,6-二-第三丁基-4-乙基苯基)季戊四醇二亞磷酸酯、雙(2,6-二-第三戊基-4-甲基苯基)季戊四醇二亞磷酸酯、及雙(2,6-二-第三辛基-4-甲基苯基)季戊四醇二亞磷酸酯等,更佳為雙(2,6-二-第三丁基-4-甲基苯基)季戊四醇二亞磷酸酯。 As the pentaerythritol type phosphite compound, bis(2,6-di-tert-butyl-4-methylphenyl)pentaerythritol diphosphite, bis(2,6-di-t-butyl-) is preferred. 4-ethylphenyl)pentaerythritol diphosphite, bis(2,6-di-third-pentyl-4-methylphenyl)pentaerythritol diphosphite, and bis(2,6-di-third An octyl-4-methylphenyl)pentaerythritol diphosphite or the like is more preferably a bis(2,6-di-tert-butyl-4-methylphenyl)pentaerythritol diphosphite.
作為受阻胺系化合物,並無特別限定,例如可列舉:4-乙醯氧基-2,2,6,6-四甲基哌啶、4-硬脂醯氧基-2,2,6,6-四甲基哌啶、4-丙烯醯氧基-2,2,6,6-四甲基哌啶、4-(苯基乙醯氧基)-2,2,6,6-四甲基哌啶、4-苯甲醯氧基-2,2,6,6-四甲基哌啶、4-甲氧基-2,2,6,6-四甲基哌啶、4-硬脂氧基-2,2,6,6-四甲基哌啶、4-環己氧基-2,2,6,6-四甲基哌啶、4-苄氧基-2,2,6,6-四甲基哌啶、4-苯氧基-2,2,6,6-四甲基哌啶、4-(乙基胺甲醯氧基)-2,2,6,6-四甲基哌啶、4-(環己基胺甲醯氧基)-2,2,6,6-四甲基哌啶、4-(苯基胺甲醯氧基)-2,2,6,6-四甲基哌啶、碳酸雙(2,2,6,6-四甲基-4-哌啶基)酯、乙二酸雙(2,2,6,6-四甲基-4-哌啶基)酯、丙二酸雙(2,2,6,6-四甲基-4-哌啶基)酯、癸二酸雙(2,2,6,6-四甲基-4-哌啶基)酯、己二酸雙(2,2,6,6-四甲基-4-哌啶基)酯、對苯二甲酸雙(2,2,6,6- 四甲基-4-哌啶基)酯、1,2-雙(2,2,6,6-四甲基-4-哌啶氧基)-乙烷、α,α'-雙(2,2,6,6-四甲基-4-哌啶氧基)-對二甲苯、雙(2,2,6,6-四甲基-4-哌啶基)甲苯-2,4-二胺基甲酸酯、雙(2,2,6,6-四甲基-4-哌啶基)-六亞甲基-1,6-二胺基甲酸酯、三(2,2,6,6-四甲基-4-哌啶基)-苯-1,3,5-三甲酸酯、三(2,2,6,6-四甲基-4-哌啶基)-苯-1,3,4-三甲酸酯、1-[2-{3-(3,5-二-第三丁基-4-羥基苯基)丙醯氧基}丁基]-4-[3-(3,5-二-第三丁基-4-羥基苯基)丙醯氧基]2,2,6,6-四甲基哌啶、以及1,2,3,4-丁烷四甲酸與1,2,2,6,6-五甲基-4-哌啶醇及β,β,β'β'-四甲基-3,9-[2,4,8,10-四氧雜螺(5,5)十一烷]二乙醇之縮合物等。 The hindered amine compound is not particularly limited, and examples thereof include 4-ethyloxy-2,2,6,6-tetramethylpiperidine and 4-stearyloxy-2,2,6. 6-Tetramethylpiperidine, 4-propenyloxy-2,2,6,6-tetramethylpiperidine, 4-(phenylethenyloxy)-2,2,6,6-tetramethyl Piperidine, 4-benzylideneoxy-2,2,6,6-tetramethylpiperidine, 4-methoxy-2,2,6,6-tetramethylpiperidine, 4-stearyl Oxy-2,2,6,6-tetramethylpiperidine, 4-cyclohexyloxy-2,2,6,6-tetramethylpiperidine, 4-benzyloxy-2,2,6, 6-Tetramethylpiperidine, 4-phenoxy-2,2,6,6-tetramethylpiperidine, 4-(ethylaminemethyloxy)-2,2,6,6-tetramethyl Piperidine, 4-(cyclohexylaminemethyloxy)-2,2,6,6-tetramethylpiperidine, 4-(phenylaminecarbamoxy)-2,2,6,6- Tetramethylpiperidine, bis(2,2,6,6-tetramethyl-4-piperidyl)carbonate, bis(2,2,6,6-tetramethyl-4-piperidine) Ester, bis(2,2,6,6-tetramethyl-4-piperidyl)malonate, bis(2,2,6,6-tetramethyl-4-piperidine) Ester), bis(2,2,6,6-tetramethyl-4-piperidyl) adipate, bis (2,2,6,6-) Tetramethyl-4-piperidinyl), 1,2-bis(2,2,6,6-tetramethyl-4-piperidinyloxy)-ethane, α,α'-bis (2, 2,6,6-Tetramethyl-4-piperidinyloxy)-p-xylene, bis(2,2,6,6-tetramethyl-4-piperidyl)toluene-2,4-diamine Carbamate, bis(2,2,6,6-tetramethyl-4-piperidinyl)-hexamethylene-1,6-dicarbamate, tris (2,2,6, 6-tetramethyl-4-piperidinyl)-benzene-1,3,5-triformate, tris(2,2,6,6-tetramethyl-4-piperidinyl)-benzene-1, 3,4-triformate, 1-[2-{3-(3,5-di-t-butyl-4-hydroxyphenyl)propenyloxy}butyl]-4-[3-(3 ,5-di-t-butyl-4-hydroxyphenyl)propanoxy]2,2,6,6-tetramethylpiperidine, and 1,2,3,4-butanetetracarboxylic acid and 1 , 2,2,6,6-pentamethyl-4-piperidinol and β,β,β'β'-tetramethyl-3,9-[2,4,8,10-tetraoxaspiro ( 5,5) a condensate of undecane]diethanol.
作為三系化合物,並無特別限定,例如可列舉羥基苯基三類。 As three The compound is not particularly limited, and examples thereof include hydroxyphenyl three. class.
作為羥基苯基三類,例如可列舉:2,4,6-三(2'-羥基-4'-辛氧基-苯基)-1,3,5-三、2-(2'-羥基-4'-己氧基-苯基)-4,6-二苯基-1,3,5-三、2-(2'-羥基-4'-辛氧基苯基)-4,6-雙(2',4'-二甲基苯基)-1,3,5-三、2-(2',4'-二羥基苯基)-4,6-雙(2',4'-二甲基苯基)-1,3,5-三、2,4-雙(2'-羥基-4'-丙氧基-苯基)-6-(2',4'-二甲基苯基)-1,3,5-三、2-(2-羥基-4-辛氧基苯基)-4,6-雙(4'-甲基苯基)-1,3,5-三、2-(2'-羥基-4'-十二烷氧基苯基)-4,6-雙(2',4'-二甲基苯基)-1,3,5-三、2,4,6-三(2'-羥基-4'-異丙氧基苯基)-1,3,5-三、2,4,6-三(2'-羥基-4'-正己氧基苯基)-1,3,5-三、及2,4,6-三(2'-羥基-4'-乙氧基羰基甲氧基苯基)-1,3,5-三等。 Hydroxyphenyl three For the class, for example, 2,4,6-tris(2'-hydroxy-4'-octyloxy-phenyl)-1,3,5-tri ,2-(2'-hydroxy-4'-hexyloxy-phenyl)-4,6-diphenyl-1,3,5-three , 2-(2'-hydroxy-4'-octyloxyphenyl)-4,6-bis(2',4'-dimethylphenyl)-1,3,5-three ,2-(2',4'-dihydroxyphenyl)-4,6-bis(2',4'-dimethylphenyl)-1,3,5-three , 2,4-bis(2'-hydroxy-4'-propoxy-phenyl)-6-(2',4'-dimethylphenyl)-1,3,5-three , 2-(2-hydroxy-4-octyloxyphenyl)-4,6-bis(4'-methylphenyl)-1,3,5-three , 2-(2'-hydroxy-4'-dodecyloxyphenyl)-4,6-bis(2',4'-dimethylphenyl)-1,3,5-three , 2,4,6-tris(2'-hydroxy-4'-isopropoxyphenyl)-1,3,5-three , 2,4,6-tris(2'-hydroxy-4'-n-hexyloxyphenyl)-1,3,5-three And 2,4,6-tris(2'-hydroxy-4'-ethoxycarbonylmethoxyphenyl)-1,3,5-three Wait.
作為硫系化合物,並無特別限定,例如可列舉:季戊四醇四(3-月桂基硫代丙酸)酯、3,3'-硫代二丙酸二月桂酯、3,3'-硫代二丙酸二肉豆蔻酯、及3,3'-硫代二丙酸二硬脂酯等。 The sulfur-based compound is not particularly limited, and examples thereof include pentaerythritol tetrakis(3-laurylthiopropionic acid) ester, 3,3′-thiodipropionate dilauryl ester, and 3,3′-thiodi Dimyristyl propionate, and distearyl 3,3'-thiodipropionate.
繼而,依據圖1對在使本發明之熱塑性樹脂組合物成形所得的樹脂成形品之表面上設置鍍敷層之步驟進行說明。圖1係表示藉由雷射直接成型技術而於樹脂成形品1之表面上形成鍍敷層之步驟的概略圖。於圖1中,樹脂成形品1為平坦之基板,但無需一定為平坦之基板,亦可為一部分或全部呈曲面狀之樹脂成形品。又,樹脂成形品不限於最終製品,亦旨在包括各種零件。作為本發明之樹脂成形品,較佳為可攜式電子機器零件。可攜式電子機器零件具有如下特徵:不僅同時具有較高之耐衝擊特性與剛度、及優異之耐熱性,而且各向異性較小、翹曲較小,作為電子記事簿、攜帶用電腦等PDA(Personal Digital Assistant,個人數位助理)、呼叫器(Pocket Bell)、行動電話、PHS(Personal Handy-phone System,個人手持式電話系統)等之內部結構物及殼體極為有效,尤其適合於成形品除阻隔壁以外之平均厚度為1.2 mm以下(下限值並無特別限定,例如為0.4 mm以上)之平板狀可攜式電子機器用零件,其中尤其適合作為殼體。 Next, a step of providing a plating layer on the surface of the resin molded article obtained by molding the thermoplastic resin composition of the present invention will be described with reference to Fig. 1 . Fig. 1 is a schematic view showing a step of forming a plating layer on the surface of a resin molded article 1 by a laser direct structuring technique. In FIG. 1, the resin molded article 1 is a flat substrate, but it is not necessarily a flat substrate, and may be a resin molded article having a part or all of a curved shape. Further, the resin molded article is not limited to the final product, and is intended to include various parts. As the resin molded article of the present invention, a portable electronic machine part is preferable. The portable electronic machine parts have the following features: not only high impact resistance and rigidity, but also excellent heat resistance, and small anisotropy and small warpage, as a PDA for electronic notebooks and portable computers. (Personal Digital Assistant, personal digital assistant), pager (Pocket Bell), mobile phone, PHS (Personal Handy-phone System, personal touch phone system) and other internal structures and housings are extremely effective, especially suitable for molded products A flat-plate portable electronic device component having an average thickness of 1.2 mm or less (the lower limit is not particularly limited, for example, 0.4 mm or more), and is particularly suitable as a casing.
再次返回至圖1,對樹脂成形品1照射雷射2。此處之雷射並無特別規定,可適當地選自釔鋁石榴石雷射、準分子雷射、電磁線等公知之雷射,較佳為釔鋁石榴石雷射。 又,雷射之波長亦無特別規定,較佳之波長範圍為200~1200 nm,特佳為800~1200 nm。 Returning again to Fig. 1, the resin molded article 1 is irradiated with the laser 2. The laser here is not particularly specified, and may be suitably selected from a known laser such as a yttrium aluminum garnet laser, an excimer laser, or a magnet wire, and is preferably a yttrium aluminum garnet laser. Moreover, the wavelength of the laser is not particularly specified, and the preferred wavelength range is 200 to 1200 nm, and particularly preferably 800 to 1200 nm.
若受到雷射照射,則樹脂成形品1之僅照射雷射之部分3得以活化。於該活化之狀態下將樹脂成形品1應用於鍍敷液4。作為鍍敷液4,並無特別規定,可廣泛地採用公知之鍍敷液,作為金屬成分,較佳為混合有銅、鎳、金、銀、鈀者,更佳為銅。 When exposed to laser light, the laser-only portion 3 of the resin molded article 1 is activated. The resin molded article 1 is applied to the plating solution 4 in this activated state. The plating solution 4 is not particularly limited, and a known plating solution can be widely used. As the metal component, copper, nickel, gold, silver, or palladium is preferably mixed, and copper is more preferable.
將樹脂成形品1應用於鍍敷液4之方法亦無特別規定,例如可列舉投入至調配有鍍敷液之液體中之方法。應用鍍敷液後之樹脂成形品僅於經雷射照射之部分形成鍍敷層5。 The method of applying the resin molded article 1 to the plating solution 4 is not particularly limited, and examples thereof include a method of introducing it into a liquid in which a plating solution is prepared. The resin molded article after the application of the plating solution forms the plating layer 5 only in the portion irradiated with the laser.
於本發明之方法中,可形成1 mm以下、進而150 μm以下之寬度之線路間距(下限值並無特別規定,例如為30 μm以上)。該線路可較佳地用作可攜式電子機器零件之天線。即,作為本發明之樹脂成形品之較佳實施形態之一例,可列舉設置於可攜式電子機器零件之表面上之鍍敷層具有作為天線之性能的樹脂成形品。 In the method of the present invention, a line pitch of a width of 1 mm or less and further 150 μm or less can be formed (the lower limit is not particularly specified, for example, 30 μm or more). This circuit can be preferably used as an antenna for portable electronic machine parts. In other words, as an example of a preferred embodiment of the resin molded article of the present invention, a plating layer provided on the surface of a portable electronic device component has a resin molded article having an antenna performance.
除此之外,可於不脫離本發明之宗旨之範圍內參考日本專利特開2011-219620號公報、日本專利特開2011-195820號公報、日本專利特開2011-178873號公報、日本專利特開2011-168705號公報、及日本專利特開2011-148267號公報之記載。 In addition, Japanese Patent Laid-Open No. 2011-219620, Japanese Patent Laid-Open No. 2011-195820, Japanese Patent Laid-Open No. 2011-178873, and Japanese Patent No. The descriptions of JP-A-2011-168705 and JP-A-2011-148267 are disclosed.
以下,列舉實施例進一步具體地說明本發明。只要不脫離本發明之宗旨,則可適當地變更以下實施例中所示之材 料、使用量、比例、處理內容、處理步驟等。因此,本發明之範圍並不限定於以下所示之具體例。 Hereinafter, the present invention will be specifically described by way of examples. The materials shown in the following examples can be appropriately changed without departing from the gist of the present invention. Materials, usage, ratio, processing content, processing steps, etc. Therefore, the scope of the present invention is not limited to the specific examples shown below.
將己二酸於氮氣環境下之反應罐內加熱溶解後,一面攪拌內容物,一面於加壓(0.35 Mpa)條件下將對苯二甲胺(三菱瓦斯化學股份有限公司製造)與間苯二甲胺(三菱瓦斯化學股份有限公司製造)之莫耳比為3:7之混合二胺以二胺與己二酸(Rhodia公司製造)之莫耳比成為約1:1之方式緩慢滴加,同時將溫度上升至270℃。滴加結束後,減壓至0.06 MPa持續反應10分鐘而調整分子量為1,000以下之成分量。其後,將內容物呈股線狀取出且於製粒機中進行顆粒化,而獲得聚醯胺。以下稱作「PAMP6」。 After heating and dissolving adipic acid in a reaction tank under a nitrogen atmosphere, the contents were stirred while p-xylylenediamine (manufactured by Mitsubishi Gas Chemical Co., Ltd.) and isophthalic acid were pressed under pressure (0.35 Mpa). Methylamine (manufactured by Mitsubishi Gas Chemical Co., Ltd.) is a 3:7 mixed diamine which is slowly added dropwise in such a manner that the molar ratio of diamine to adipic acid (Rhodia) is about 1:1. At the same time, the temperature is raised to 270 °C. After completion of the dropwise addition, the pressure was reduced to 0.06 MPa for 10 minutes, and the amount of the component having a molecular weight of 1,000 or less was adjusted. Thereafter, the contents were taken out in a strand shape and pelletized in a granulator to obtain polyamine. Hereinafter referred to as "PAMP6".
將癸二酸於氮氣環境下之反應罐內加熱溶解後,一面攪拌內容物,一面於加壓(0.35 Mpa)條件下將對苯二甲胺(三菱瓦斯化學股份有限公司製造)與間苯二甲胺(三菱瓦斯化學股份有限公司製造)之莫耳比為3:7之混合二胺以二胺與己二酸之莫耳比成為約1:1之方式緩慢滴加,同時將溫度上升至235℃。滴加結束後,繼續反應60分鐘而調整分子量為1,000以下之成分量。反應結束後,將內容物呈股線狀取出且於製粒機中進行顆粒化,而獲得聚醯胺。以下稱作「PAMP10」。 After the azelaic acid was heated and dissolved in a reaction tank under a nitrogen atmosphere, the contents were stirred, and p-xylylenediamine (manufactured by Mitsubishi Gas Chemical Co., Ltd.) and isophthalic acid were added under pressure (0.35 MPa). A mixed diamine having a molar ratio of 3:7 in methylamine (manufactured by Mitsubishi Gas Chemical Co., Ltd.) is slowly added dropwise in such a manner that the molar ratio of diamine to adipic acid becomes about 1:1, and the temperature is raised to 235 ° C. After completion of the dropwise addition, the reaction was continued for 60 minutes to adjust the amount of the component having a molecular weight of 1,000 or less. After the completion of the reaction, the contents were taken out in a strand form and pelletized in a granulator to obtain polyamine. Hereinafter referred to as "PAMP10".
於包含攪拌機、分凝器、冷凝器、溫度計、滴加裝置、及氮氣導入管、股線模頭之內容積為50升之反應容器內稱量裝入經準確稱量之癸二酸(伊藤製油股份有限公司製造,商品名:癸二酸TA)8950 g(44.25 mol)、次亞磷酸鈣12.54 g(0.074 mol)、及乙酸鈉6.45 g(0.079 mol)。對反應容器內充分進行氮氣置換後,以氮氣加壓至0.4 MPa,一面攪拌,一面將溫度自20℃升溫至190℃而使癸二酸於55分鐘內均勻地熔融。繼而,於攪拌下用110分鐘滴加對苯二甲胺(三菱瓦斯化學股份有限公司製造)5960 g(43.76 mol)。於此期間,使反應容器內之溫度連續上升至293℃。於滴加步驟中將壓力控制為0.42 MPa,生成之水通過分凝器及冷凝器排除至系統外。分凝器之溫度控制於145~147℃之範圍內。對苯二甲胺滴加結束後,於反應容器內之壓力為0.42 MPa之條件下持續進行20分鐘之聚縮合反應。於此期間,使反應容器內之溫度上升至296℃。其後,於30分鐘內將反應容器內之壓力自0.42 MPa減壓至0.12 MPa。於此期間,使內部溫度升高至298℃。其後,以0.002 MPa/min之速度減壓,於20分鐘內減壓至0.08 MPa,調整分子量為1,000以下之成分量。減壓結束時之反應容器內之溫度為301℃。其後,以氮氣對系統內部進行加壓,於反應容器內之溫度為301℃、樹脂溫度為301℃之條件下,自股線模頭呈股線狀取出聚合物且於20℃之冷卻 水中進行冷卻,將其顆粒化,而獲得約13 kg之聚醯胺樹脂。再者,將於冷卻水中之冷卻時間設為5秒、股線之抽取速度設為100 m/min。以下稱作「PAP10」。 Weigh accurately weighed sebacic acid (Ito) in a reaction vessel containing a mixer, a condenser, a condenser, a thermometer, a dropping device, a nitrogen inlet tube, and a strand die with a volume of 50 liters. Made by Oil Co., Ltd., trade name: azelaic acid TA) 8950 g (44.25 mol), calcium hypophosphite 12.54 g (0.074 mol), and sodium acetate 6.45 g (0.079 mol). After sufficiently replacing the inside of the reaction vessel with nitrogen, the mixture was pressurized to 0.4 MPa with nitrogen gas, and the temperature was raised from 20 ° C to 190 ° C while stirring, and the sebacic acid was uniformly melted in 55 minutes. Then, 5960 g (43.76 mol) of p-xylylenediamine (manufactured by Mitsubishi Gas Chemical Co., Ltd.) was added dropwise thereto under stirring for 110 minutes. During this time, the temperature in the reaction vessel was continuously increased to 293 °C. The pressure was controlled to 0.42 MPa in the dropping step, and the generated water was removed to the outside of the system through the dephlegmator and the condenser. The temperature of the partial condenser is controlled within the range of 145 to 147 °C. After the dropwise addition of p-xylylenediamine, the polycondensation reaction was continued for 20 minutes under the pressure of 0.42 MPa in the reaction vessel. During this time, the temperature inside the reaction vessel was raised to 296 °C. Thereafter, the pressure in the reaction vessel was reduced from 0.42 MPa to 0.12 MPa in 30 minutes. During this time, the internal temperature was raised to 298 °C. Thereafter, the pressure was reduced at a rate of 0.002 MPa/min, and the pressure was reduced to 0.08 MPa in 20 minutes to adjust the component amount of the molecular weight of 1,000 or less. The temperature in the reaction vessel at the end of the pressure reduction was 301 °C. Thereafter, the inside of the system was pressurized with nitrogen gas, and the polymer was taken out from the strand die in a strand shape under the conditions of a temperature of 301 ° C in the reaction vessel and a resin temperature of 301 ° C and cooled at 20 ° C. The water was cooled and pelletized to obtain about 13 kg of polyamide resin. Further, the cooling time in the cooling water was set to 5 seconds, and the extraction speed of the strands was set to 100 m/min. Hereinafter referred to as "PAP10".
聚酯樹脂:NOVAPEX(商品編號:GG500D)(三菱化學製造) Polyester resin: NOVAPEX (product number: GG500D) (Mitsubishi Chemical)
聚苯硫醚樹脂(PPS):TORELINA(商品編號:A670X01(N))(東麗(Toray)製造) Polyphenylene sulfide resin (PPS): TORELINA (product number: A670X01(N)) (manufactured by Toray)
03T-296GH:玻璃纖維(日本電氣硝子製造)(莫氏硬度:6.5) 03T-296GH: Glass fiber (made by Nippon Electric Glass) (Mohs hardness: 6.5)
03T-187:玻璃纖維(日本電氣硝子製造)(莫氏硬度:6.5) 03T-187: Glass fiber (made by Nippon Electric Glass Co., Ltd.) (Mohs hardness: 6.5)
JA-FT2A:玻璃纖維(Owens Corning製造)(莫氏硬度:6.5) JA-FT2A: Glass fiber (manufactured by Owens Corning) (Mohs hardness: 6.5)
(1)Lazerflair 8840:Cu3(PO4)2Cu(OH)2(默克(Merck)製造)(莫氏硬度為5以下) (1) Lazerflair 8840: Cu 3 (PO 4 ) 2 Cu(OH) 2 (manufactured by Merck) (Mohs hardness of 5 or less)
(2)Lazerflair 820:塗佈有(Sb/Sn)O2(36~50重量%)之雲母+SiO2(35~53重量%)及TiO2(11~15重量%)之混合物(默克製造)(莫氏硬度:5.0以下) (2) Lazerflair 820: a mixture of (Sb/Sn)O 2 (36-50% by weight) of mica + SiO 2 (35 to 53% by weight) and TiO 2 (11 to 15% by weight) (Merck Manufacturing) (Mohs hardness: 5.0 or less)
(3)Black 1G:CuCr2O4(Shepherd color company(薛特顏料公司)製造)(莫氏硬度為5.5~6) (3) Black 1G: CuCr 2 O 4 (manufactured by Shepherd Color Company) (Mohs hardness of 5.5 to 6)
(4)Black 30C965:CuCr2O4(Shepherd color company製造)(莫氏硬度為5.5~6) (4) Black 30C965: CuCr 2 O 4 (manufactured by Shepherd color company) (Mohs hardness is 5.5 to 6)
(5)42-920A:Bi2O3(98~99重量%)及Nd2O3(0.3~1.0重量%)之混合物(東罐材料製造)(莫氏硬度:5.0以下) (5) 42-920A: a mixture of Bi 2 O 3 (98 to 99% by weight) and Nd 2 O 3 (0.3 to 1.0% by weight) (manufactured by East can material) (Mohs hardness: 5.0 or less)
CaV102:Clariant Japan(日本科萊恩)公司製造(褐煤酸鈣混合物) CaV102: manufactured by Clariant Japan (Calmelite Mixture)
405MP:三井化學製造(聚乙烯蠟) 405MP: Mitsui Chemicals Manufacturing (polyethylene wax)
Ca(OH)2 Ca(OH) 2
Mg(OH)2 Mg(OH) 2
滑石:林化成製造,Micron White 5000S Talc: Made by Lin Huacheng, Micron White 5000S
以成為下述表所示之組成之方式分別稱量各成分,將除無機纖維以外之成分於滾筒內混合並自雙軸擠出機(東芝機械公司製造,TEM26SS)之根部投入,熔融後自旁側投入無機纖維而製成樹脂顆粒。擠出機之溫度設定一律設為相同溫度,根據樹脂之種類變更設定。於如下條件下實施:於PAMP6及PAMP10時設為280℃、於PAP10時設為300℃、於NOVAPET時設為280℃、於PPS時設為310。 Each component was weighed in a manner as shown in the following table, and the components other than the inorganic fibers were mixed in a drum and charged from the root of a twin-screw extruder (TEM26SS, manufactured by Toshiba Machine Co., Ltd.). The inorganic fibers are introduced into the side to form resin pellets. The temperature setting of the extruder is always set to the same temperature, and the setting is changed according to the type of the resin. It was carried out under the following conditions: 280 ° C for PAMP 6 and PAMP 10 , 300 ° C for PAP 10 , 280 ° C for NOVAPET, and 310 for PPS.
將以上述製造方法所得之顆粒於80℃下乾燥5小時後,使用Fanuc公司製造之射出成形機(100T),於圓筒溫度為280℃、模具溫度為130℃之條件下,將ISO拉伸試片(3 mm厚、4 mm厚)射出成形。 The pellet obtained by the above production method was dried at 80 ° C for 5 hours, and then subjected to an ISO stretching apparatus using an injection molding machine (100T) manufactured by Fanuc Co., Ltd. at a cylinder temperature of 280 ° C and a mold temperature of 130 ° C. The test piece (3 mm thick, 4 mm thick) was injection molded.
射出速度:根據ISO拉伸試片中央部之截面面積計算樹脂流速,設定為300 mm/s。於填充約95%時以變為VP (Velocity-to-Pressure)切換之方式切換為保壓壓力。於不出現毛邊之範圍內提高保壓壓力,將保壓壓力為500 kgf/cm2之時間設為25秒。 Injection speed: The resin flow rate was calculated from the cross-sectional area of the center portion of the ISO tensile test piece, and was set to 300 mm/s. When the filling is about 95%, it is switched to the holding pressure in a manner of changing to VP (Velocity-to-Pressure). The holding pressure was increased within the range where no burrs were present, and the holding pressure was 500 kgf/cm 2 for 25 seconds.
依據ISO178,使用上述ISO拉伸試片(4 mm厚)於23℃之溫度下測定彎曲強度(單位:MPa)及彎曲彈性模數(單位:MPa)。 The flexural strength (unit: MPa) and the flexural modulus (unit: MPa) were measured according to ISO 178 using the above ISO tensile test piece (4 mm thick) at a temperature of 23 °C.
依據ISO179,使用以上述方法所得之ISO拉伸試片(3 mm厚)於23℃之條件下測定夏比缺口衝擊強度及夏比無缺口衝擊強度。將結果示於下述表中。 The Charpy notched impact strength and the Charpy notched impact strength were measured according to ISO 179 using an ISO tensile test piece (3 mm thick) obtained by the above method at 23 °C. The results are shown in the following table.
於作為模具之100×100 mm且厚度為2 mm之模腔內,自一邊為100 mm、厚度為0.8 mm之扇形澆口填充樹脂而進行成形。切掉澆口部分而獲得平板試片。 In a cavity of 100 × 100 mm and a thickness of 2 mm as a mold, a fan-shaped gate having a side of 100 mm and a thickness of 0.8 mm was filled with a resin to be molded. The gate portion was cut off to obtain a flat test piece.
以目視確認以上述方法所得之平板試片,而作出如下評價。將結果示於下述表中。 The flat test piece obtained by the above method was visually confirmed, and the following evaluation was made. The results are shown in the following table.
○:整體顯示均勻之顏色 ○: The overall color is uniform
×:一部分或全部無均勻感。 ×: Some or all of them have no uniformity.
使用波長為1064 nm之釔鋁石榴石雷射,於輸出為10 W、頻率為80 kHz、速度為3 m/s之條件下對以上述方法所得之平板試片之10×10 mm範圍進行照射。其後之鍍敷步驟係於Mac Dermid公司製造之非電解之M-Copper85的鍍敷 槽中實施。鍍敷性能係以目視判斷於特定時間內所鍍敷之銅之厚度。 Irradiation of a 10 × 10 mm range of the flat test piece obtained by the above method was carried out using a yttrium aluminum garnet laser having a wavelength of 1064 nm at an output of 10 W, a frequency of 80 kHz, and a speed of 3 m/s. . The subsequent plating step is based on the plating of the electroless M-Copper 85 manufactured by Mac Dermid. Implemented in the tank. The plating performance is to visually judge the thickness of the copper plated at a specific time.
作出如下評價。將結果示於下述表中。 Make the following evaluation. The results are shown in the following table.
◎:非常良好之外觀(確認到銅之顏色較濃而覆蓋較厚之鍍敷層之樣態) ◎: Very good appearance (confirm that the color of copper is thicker and covers the thicker plating layer)
○:良好之外觀 ○: Good appearance
△:雖然覆蓋有鍍敷層,但為較薄之樣態(實用水準) △: Although it is covered with a plating layer, it is a thinner state (practical level)
×:完全未覆蓋鍍敷層之樣態 ×: The state of the plating layer is not completely covered.
由上述表可明確,於使用有本發明中所規定之LDS添加劑之情形時,可獲得彎曲強度、彎曲彈性模數、夏比衝擊強度及鍍敷外觀之任一者均優異之熱塑性樹脂組合物(實施例1-1~1-10、2-1~2-5、3-1~3-3)。 It is clear from the above table that a thermoplastic resin composition excellent in any of bending strength, flexural modulus, Charpy impact strength, and plating appearance can be obtained when the LDS additive specified in the present invention is used. (Examples 1-1 to 1-10, 2-1 to 2-5, 3-1 to 3-3).
與此相反,於使用有即便含有銅但莫氏硬度較高之LDS添加劑之情形時(比較例1~3、9、10)、夏比衝擊強度較差。另一方面,於即便含有LDS添加劑但不含銅、銻及錫之任一者之情形時(比較例4)、或完全不含LDS添加劑之情形時(比較例5、6),鍍敷外觀較差。又,於不含玻璃纖維之情形時(比較例7、8),彎曲強度及彎曲彈性模數較差。 On the contrary, when the LDS additive having a high Mohs hardness even if it contained copper was used (Comparative Examples 1 to 3, 9, 10), the Charpy impact strength was inferior. On the other hand, in the case of containing no LDS additive but not containing any of copper, bismuth and tin (Comparative Example 4) or completely without the LDS additive (Comparative Examples 5 and 6), the plating appearance Poor. Further, in the case where the glass fiber was not contained (Comparative Examples 7 and 8), the bending strength and the bending elastic modulus were inferior.
進而,於使用酸性物質作為LDS添加劑且添加鹼之情形 時(實施例1-3、1-4及1-7),雖然添加有酸性物質,但仍可達成平板之顏色之均一性。再者,於本發明中,如下述實施例所示,由於可以無機顏料進行著色,故著色前平板之顏色之均一性無需太高。 Further, when an acidic substance is used as an LDS additive and a base is added At the time (Examples 1-3, 1-4, and 1-7), although the acidic substance was added, the uniformity of the color of the flat plate was achieved. Further, in the present invention, as shown in the following examples, since the coloring can be carried out by the inorganic pigment, the uniformity of the color of the flat plate before coloring need not be too high.
進而可知,若增加LDS添加劑之調配量(實施例1-5、2-3),則可達成更良好之鍍敷外觀。又可知,即便不增加LDS添加劑之調配量,亦可藉由添加滑石(實施例1-10、2-5)達成更良好之鍍敷外觀。其原因在於:滑石可吸收雷射而容易形成鍍敷層。 Further, it can be seen that by increasing the blending amount of the LDS additive (Examples 1-5 and 2-3), a better plating appearance can be achieved. It is also known that even if the amount of the LDS additive is not increased, a better plating appearance can be achieved by adding talc (Examples 1-10, 2-5). The reason is that talc absorbs laser light and easily forms a plating layer.
又可知,本發明之效果於使用聚醯胺樹脂作為熱塑性樹脂時尤其有效。 Further, it is understood that the effects of the present invention are particularly effective when a polyamide resin is used as the thermoplastic resin.
於實施例1-1及2-1中,於混合時添加6重量份之ZnS(L*值:90%,莫氏硬度:3),此外同樣地進行。其結果,可分別維持與實施例1-1及2-1相同水準之彎曲強度、彎曲彈性模數、夏比衝擊強度、及鍍敷外觀,且可形成著色為白色之顆粒。 In Examples 1-1 and 2-1, 6 parts by weight of ZnS (L * value: 90%, Mohs hardness: 3) was added during mixing, and the same procedure was carried out in the same manner. As a result, the bending strength, the flexural modulus, the Charpy impact strength, and the plating appearance at the same level as in Examples 1-1 and 2-1 were maintained, and particles colored in white were formed.
1‧‧‧樹脂成形品 1‧‧‧Resin molded products
2‧‧‧雷射 2‧‧‧Laser
3‧‧‧經雷射照射之部分 3‧‧‧Parts irradiated by laser
4‧‧‧鍍敷液 4‧‧‧ plating solution
5‧‧‧鍍敷層 5‧‧‧ plating layer
圖1係表示於樹脂成形品之表面上設置鍍敷層之步驟的概略圖。於圖1中,1表示樹脂成形品,2表示雷射,3表示經雷射照射之部分,4表示鍍敷液,5表示鍍敷層。 Fig. 1 is a schematic view showing a step of providing a plating layer on the surface of a resin molded article. In Fig. 1, 1 denotes a resin molded article, 2 denotes a laser, 3 denotes a portion irradiated with laser light, 4 denotes a plating solution, and 5 denotes a plating layer.
1‧‧‧樹脂成形品 1‧‧‧Resin molded product
2‧‧‧雷射 2‧‧‧Laser
3‧‧‧經雷射照射之部分 3‧‧‧Parts irradiated by laser
4‧‧‧鍍敷液 4‧‧‧ plating solution
5‧‧‧鍍敷層 5‧‧‧ plating layer
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- 2012-03-16 EP EP12760231.6A patent/EP2676799B1/en active Active
- 2012-03-16 WO PCT/JP2012/056886 patent/WO2012128219A1/en active Application Filing
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
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TWI659062B (en) * | 2013-12-20 | 2019-05-11 | 瑞士商恩斯 專利股份有限公司 | Polyamidformmasse und deren verwendung |
TWI660656B (en) * | 2013-12-20 | 2019-05-21 | 瑞士商恩斯 專利股份有限公司 | Kunststoffformmasse und deren verwendung |
Also Published As
Publication number | Publication date |
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CN103443328B (en) | 2016-02-24 |
EP2676799A1 (en) | 2013-12-25 |
US8933161B2 (en) | 2015-01-13 |
US20140002311A1 (en) | 2014-01-02 |
WO2012128219A1 (en) | 2012-09-27 |
JP2013144767A (en) | 2013-07-25 |
TWI531601B (en) | 2016-05-01 |
JP5912704B2 (en) | 2016-04-27 |
EP2676799B1 (en) | 2014-06-11 |
EP2676799A4 (en) | 2013-12-25 |
CN103443328A (en) | 2013-12-11 |
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