TW201231219A - Grinding/polishing device for polygonal column member and grinding/polishing method - Google Patents

Grinding/polishing device for polygonal column member and grinding/polishing method Download PDF

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Publication number
TW201231219A
TW201231219A TW100107831A TW100107831A TW201231219A TW 201231219 A TW201231219 A TW 201231219A TW 100107831 A TW100107831 A TW 100107831A TW 100107831 A TW100107831 A TW 100107831A TW 201231219 A TW201231219 A TW 201231219A
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TW
Taiwan
Prior art keywords
grinding
workpiece
polishing
block
measuring
Prior art date
Application number
TW100107831A
Other languages
Chinese (zh)
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TWI535531B (en
Inventor
Shigeru Tanahashi
Masao Hirano
Shouta Sawai
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Sintokogio Ltd
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Publication of TW201231219A publication Critical patent/TW201231219A/en
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Publication of TWI535531B publication Critical patent/TWI535531B/en

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B29/00Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents
    • B24B29/005Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents using brushes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B51/00Arrangements for automatic control of a series of individual steps in grinding a workpiece
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B7/00Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
    • B24B7/20Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
    • B24B7/22Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain

Abstract

Provided are: a silicon block grinding/polishing device comprising a grinding function capable of grinding a square column-shaped silicon block within tolerance ranges of +-0.5 mm for the cross-section dimensions thereof and +-0.1 DEG for the perpendicular angles thereof, said block having been formed by cutting a silicon ingot using a wire saw, and comprising a polishing function capable of removing micro cracks in the surface layer of the cut silicon block (W); and a processing method therefor. The device comprises: a holding means (1) that holds the silicon block (W); a measuring means (2) that measures the cross-section dimensions of the silicon block (W); a grinding means (3) that grinds the planar sections (F) and the angular sections (C) of the silicon block (W); a polishing means (4) that polishes the planar sections (F) and the angular sections (C) of the silicon block (W) which has completed grinding and removes micro cracks; a transfer means (5) that transfers the holding means (1) holding the silicon block (W), between the measuring means (2), the grinding means (3), and the polishing means (4); and a control means (6) that operates each of the means.

Description

201231219 六、發明說明: 【發明所屬之技術領域】 本發明係關於一種硬脆材料之研削/研磨加工裝置及研 削/研磨加卫方法’更詳言之,本發明係具備研削及研磨該 被加工物之平面部與角部功能之研削/研磨加卫裝置及研削 /研磨加工方法。 夕,在使用本發明之裝置之研削步驟中該被加工 物被加工成具有既定規格尺寸之剖面形狀,在研磨步驟 中,將存在於該被加工物表層之微裂縫加以除去者。 【先前技術】 本發明之被加工物即硬脆材料在製造例如太陽電池面 板之基體即石夕晶圓之步驟中’有藉由從石夕鍵切出所獲得之 石夕塊。錢存在有結晶構造不同之多晶及單晶兩種。以下, 雖以剖面形狀為四角形之多晶及單⑭塊之研削/研磨為例 加以說明,但本發明之姑‘ β之破加工物之剖面形狀並非限於四角 形,即使係由四角以上之偶數角構成之多角柱亦可適用。 多晶石夕塊,係藉由帶鑛或線鑛,將將炫融原料流入成 形模而成形呈立方體形之石夕錠之表層部(6面)加以切除後, 進-步將剖面切成四角形之角柱狀,形成4平面部,並且 形:該2平面部彼此交又成直角之角部,在該角部形成有 微小之平面(倒角加工部)。 單晶石夕塊,係將藉由拉晶法製造之圓柱形石夕旋之兩端 表層部以與該矽錠之柱軸成直角,且彼此平行之方式,使 用帶鑛或線鑛加以切成平端面後,進一步使用帶鑛或線 3 201231219201231219 VI. Description of the Invention: [Technical Field] The present invention relates to a grinding/grinding apparatus for a hard and brittle material and a grinding/grinding method. More specifically, the present invention is provided with grinding and grinding. Grinding/grinding and lifting device and grinding/grinding method for the plane and corner functions of the object. Further, in the grinding step using the apparatus of the present invention, the workpiece is processed into a cross-sectional shape having a predetermined size, and in the grinding step, the micro-crack existing in the surface layer of the workpiece is removed. [Prior Art] The hard and brittle material of the present invention, which is a hard and brittle material, has a stone block obtained by cutting out from the Shi Xi key in the step of manufacturing a substrate such as a solar cell panel. There are two kinds of polycrystals and single crystals with different crystal structures. Hereinafter, although the cross-sectional shape is a tetragonal polycrystal and a single 14-piece grinding/polishing is described as an example, the cross-sectional shape of the broken workpiece of the present invention is not limited to a quadrangular shape, even if it is an even angle of four or more corners. A polygonal column can also be used. The polycrystalline stone block is cut into a step by step by cutting the surface layer portion (6 sides) of the cube-shaped stone ingot into a forming mold by stripping the molten material into a forming mold. The corner of the square has a columnar shape and forms a four-plane portion, and the shape is such that the two planar portions intersect each other at right angles, and a minute plane (chamfered portion) is formed at the corner portion. The single crystal stone block is formed by cutting the crystal surface of the cylindrical stellate by the crystal pulling method at a right angle to the column axis of the bismuth ingot, and parallel to each other, using a belt ore or wire ore to cut After the flat end face, further use belt or mine 3 201231219

錯’為將4面分A . 4 , 形成直角,將圓桎表層部加以切除◊此 ’, 面形成之4角部,圓柱表層邱 弧面殘留方式進杆^ Μ才表層之一部分以微小圓 、%订加工,g玄破切险 傲刀除之面係以4平面部形成。 :者,將有關石夕塊之加工之公知技術分要件表示。 η於石夕塊之保持機構與其旋轉機構,在專利文獻1之 :1及ϋ 6已揭不有具備保持機構與旋轉機構者;該 保持機構係用以保持石夕塊 μ 1U * w而(長邊方向之兩端部),該旋 轉機構㈣該保持機構進行旋轉控制,以使石夕塊之加工部Wrong' is to divide 4 sides into A. 4, form a right angle, and cut the surface part of the round ◊ ◊ ' , , , , , , , , , , , 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 4 , % set processing, g Xuan broken and dangerous arrogant knife in addition to the face is formed by 4 planes. : For those who know the technical requirements of the processing of Shi Xi block. η在石夕块的保持机构 and its rotating mechanism, in Patent Document 1: 1 and ϋ 6 have not disclosed a holding mechanism and a rotating mechanism; the holding mechanism is used to hold the stone block μ 1U * w ( Both ends of the longitudinal direction), the rotating mechanism (4) the holding mechanism performs rotation control to make the processing part of the stone block

平/面部與各角部)成為與加卫手段相對向之m HFlat/face and corners) become opposite to the means of reinforcement

面進行研磨加工—而胳石々抬认u T 將夕鬼於水平方向(矽塊之長邊方向) 已揭示於專利文獻1之段落_0及圖6。關於相反 地一面進行研磨加卫—面將研削/研磨加卫裝置於水平方向 (矽塊之長邊方向)移動亦已公知。 ;研磨步驟,由研磨粒之粗度較粗之粗研磨步驟與 :磨粒之粗度較細之精研磨步驟之兩步驟構成、或其研磨 治具由使鑽石研磨粒混在樹脂製刷中形成環狀之旋轉刷構 成亦已公知β 關於進行加工之石夕塊之種類,將多晶或單晶之石夕塊中 , 種進行加工 '或使用其研磨治具中含有研磨粒之圓 形研磨石或鑽石輪(研磨輪)進行研肖彳,可獲得高尺寸精度亦 已公知。 又,關於從矽錠切斷成形時,將發生於矽塊表層之微 裂縫或微小凹凸加以除去’將該石夕塊進行切割加工,使形 成夕Β曰圆時之裂縫、缺損所引起之不良品之發生率降低之 201231219 矽塊之加工方法亦已成為公知。 又’關於將矽塊進行切割加工,形成矽晶圓亦已公知。 專利文獻1 :日本發明專利4133935號公報 【發明内容】 如上所述,由多晶或單晶構成之石夕塊,為以將剖面形 狀作成四角形而成為四角柱狀之方式,將矽錠切斷形成 者,其大小有:具有剖面尺寸一邊125mm(稱為:5吋卜一 邊156mm(稱為·· 6吋)、一邊21〇麵(稱為:8吋)之正方形 剖面3種’柱軸方向之長度可在15〇〜__之間切成任意 長度。 在切斷該矽錠之方法中,有使用帶鋸或線鋸之方法, 但藉由複數條鋼絲同時切斷之線鋸之切斷效率較帶鋸為 问,该線鋸之切斷方法一般係一面藉由壓力水之喷射壓將 研磨粒噴向切斷部一面使鋼絲接觸旋轉,用以進行切斷之 游離研磨粒方式,近年來,以更提高切斷效率為目的,開 發了將研磨粒熔融固定於鋼絲,作為固定研磨粒方式之新 鋼絲’使用此新線鋸之新切斷方法已逐漸被採用。 發明人等為確認新線錯之切斷效率之提高,使用習知 線鋸及新線鋸,將多晶矽錠及單晶矽錠進行切斷為,如圖9 及圖11所示,以縱5行X橫5行=合計25條之剖面,形成 具有稱為6吋(具有一邊156mm之正方形剖面)、長度3〇〇mm 之外形尺寸之矽塊之結果’確認其切斷所需時間,習知之 線鋸需要8小時以上,新線鋸只要約3小時就結束,確認 了可大幅縮短其切斷時間。 201231219 作為可縮短該切斷時間之理由,可推測係習知之游離 研磨粒方式之線鋸’在切斷加工時,若使鋼絲高速旋轉, 研磨粒就會飛散而使切斷效率降低,但新線鋸,由於研磨 粒熔融固定於鋼絲,因此隨著鋼絲之旋轉之研磨粒不會飛 散。 然而,當以該新線鋸切斷多晶矽錠時,關於位於圖9 之四角落之4根矽塊(A)、與位於矽塊(A)之間之3根以部 位=12根之矽塊(B)’在面對矽錠之外周面側之切斷面(矽塊 (△I中有2面,矽塊(B)中有】面)之中央成為往外側凸出之 狀態(參照圖10)。又,用該新線鋸切斷單晶矽錠時如圖 U所示,由於矽塊分別單獨獨立進行切斷,因此如圖^所 不,以單晶矽塊之四個剖面之中央往外側凸出之狀態進行 切斷,會產生其剖面尺寸不在規定外形尺寸公差内I新問 題。為解決此種問題,已要求有將該矽塊之外形尺寸成為 規定外形尺寸公差内之研削加工裝置。 又,如上所述,從矽錠切斷形成之矽塊,在其平面部 與角部之表層部,表面粗度為”⑺〜川卜爪⑴沾%…:1994) 凸與從表層面之深度為80〜ΙΟΟμΓη之微裂縫會發生 =氣造步驟中而存在。因此,在其後步驟中,用線鋸進行 :割加工,進行加工成矽晶圓時,有時會發生因該凹凸、 U裂縫原因而產生裂縫、缺損之不良品。因此已要求有 =備:粗研磨能力與微細研磨能力之加工裝置;該粗研磨 係在進行切割加工前’將從該矽塊之表層部到丨〇叫m 右之冰度加以研磨除去,藉此用以除去從該表層面存在 6 201231219 於深度80〜1 ΟΟμηι之微裂縫,該微細研磨能力係用以將具 有RylO〜20μπι左右之表面粗度之表面研磨成數μιη以下之 表面粗度。 - 又,在該習知技術文獻中,並未揭示具備該研削加工 與研磨加工兩者功能之加工裝置之公知技術。 本發明係解決該問題點者’其目的在於,提供石夕塊之 研肖彳/研磨加工裝置及其研削/研磨方法,係以丨台之加工裝 置可進行研削加工功能與研磨加工功能者,可提高生產效 率;該研削加工功能係將將矽錠切斷形成之四角柱狀之多 晶矽塊或單晶矽塊研削成,一邊為i 25mm(稱為:5吋)、一 邊為156mm(稱為:6吋)、一邊為21〇mm(稱為:8吋)中任 一種剖面尺寸;該研磨加工功能係將矽塊之平面部及角呷 之表面粗度微細化’並且將形成於表層内部之微裂縫加二 本發明之多角柱狀構件之加工裝置具備:把持手段 ⑴,用以把持被加工物即多角柱狀之硬脆材料;測量手: 把)持二被加工物之剖面尺寸之測量、用以將把持該 把持手奴⑴之被加工物之位置定心之中心位置b 研削手段(3)與研磨手段⑷之切人量係、「零 “ $、及 置之測量;研削手段(3),將令' $」 即基點位 乎奴()將°玄破加工物之平面部(F)及角部 ()進:丁研削加工使其剖面尺寸及剖面形狀成為公差内·二 磨手段(4) ’將結束該研削加工之 ’研 部⑹進行研磨力…用以除去存在於其:之^ -手段⑺’為將被該把持手段⑴所把持之被加工物:平: 201231219 4 (F)及角4 (〇進行測量、研肖卜研磨,使把持該被加工物 之把持手奴⑴移送至配置有該測量手段(2)、研削手段(3)、 研磨手段(4)之位置;以及控制手段⑹,依據開始加工前所 ,入之W始⑶疋項目及該測量手段(2)之測量訊號,進行運 算處理,對該各手段輸出動作訊號(第i發明)。 依據3玄第1發明,本發明之多角柱狀構件之研削/研磨 裳置具備研削加工功能及研磨加工功能,該研削加工 力此係面對被加工物將一定之切入施加於該研削手段 (3) ’用以修整該被加工物之變形等形狀,一面將外形尺寸 切削成公差内,該研磨加工功能係對被加工物將一定廢力 施加於該研磨手段(4),沿該被加工物之表面進行仿形加 將其表層研磨數_〜數十㈣,用以將凹凸及龜裂加以 2 ’並且將表面粗度研磨為微細’因此在錢(W)等之多 角:狀,件之製造線中,即使剖面尺寸與直角度偏離公差 角柱構件搬入時,亦可將其剖面尺寸及剖面形狀 “差内後,將表層部之微裂縫確實加以除去。 :’該研削手段(3)亦可作為研磨石;該研磨石係由炫 :固=磨粒所形成之研磨粒部(32)之表面與該被加工物 ==接觸進行旋轉之旋轉#A(31)、及對該旋轉盤 = :::源之旋轉之㈣軸_)構成;該研磨手段⑷ ⑷)之毛 /、該研磨刷係由炼融固定研磨粒之刷毛材 植設之旋=與5亥被加工物之加工面接觸進行旋轉之方式 之旋轉:心⑷)、及對該旋轉盤B(41)傳達旋轉驅動源 疋轉之%轉軸B(43)構成(第2發明)。 8 201231219 依據第2發明,由於研削手段(3)具備:藉由選用具有 剛:生之研磨石,將被加工物之變形等削除且修整形狀之切 削月匕力&將外形尺寸切削成公差内之研削加工能力,因 此可確實進行研削加工。又,研磨手段⑷藉由選用以將熔 融固定研磨粒之原料作為刷毛材(4取研磨刷,在研磨加工 ^一面將該刷毛材(42)按壓於被加工物之加卫面,將其毛 端部進行仿形,一面接觸旋轉,將該被加工物之表層研磨 數μηι〜數十_ ’用以將微裂縫加以除去,並且可確實進行 將表面加工為微細之研磨加工。 另外’在該研磨手段⑷之研磨刷巾,有兩種形式,一 種係將混合研磨粒之刷毛材(42)紮束,以可拆裝方式安裝於 紅轉盤Β(41),當刷毛材(42)消耗時,㈣換該刷毛材(42) 之形式(參照圖7及實施例),另_種係將未圖示之刷毛材固 定安裝於旋轉盤’當刷毛材消耗時,與旋轉盤共一體替換 之形式(未圖示)’可使用任一形式。 又,該研削手段⑺之研磨石亦可將炫融固定於該研磨 粒部(32)之研磨粒之粒度設定為丨種或2種以上;該研磨手 段⑷之研磨财可㈣㈣^於該刷毛材(42)之研磨粒之 粒度設定為2種以上(第3發明)。 又’該研磨手段⑷之研磨刷亦可將溶融固定於該刷毛 材⑷)之研磨粒之粒度設定為2種以上;粒之㈣ 粗之刷毛材(42)植設於靠近旋轉盤β(41)之旋轉中心之内圈 部’並^該研磨粒之粒度細之刷毛材(42)植設於離旋轉盤 Β之旋轉中心較遠之之外圈部(第4發明)。 201231219 關於研磨手段(4)所採用之研磨刷之構成,當熔融固定 之研磨粒之粒度設定2種時’以往,每一研磨粒之粒度必 須設置2台之研磨刷,但依攄第4發明,將研磨粒之粒度 粗之刷毛材(42)植設於靠近旋轉盤β(41)之旋轉中心之内圈 部,並且可將研磨粒之粒度細之刷毛材(42)植設於離旋轉盤 B之旋轉中心較遠之外圈部,只要設置具備研磨粒之粒度不 同之2種刷毛材(42)之1台研磨刷即可,可謀求降低生產成 本及裝置之小型化。 又°亥研削手段(3)亦可作為由研磨粒之粒度為F90〜 F220(JISR6001 : 1998)及#24〇〜#5〇〇卬此6〇〇1 : Η%)所構 成研磨石;該研磨手段(4)亦可具備:由研磨粒之粒度為#24〇 〜#5_ISR_ : 1998)所構成之粗研磨用研磨刷及由研 磨粒之粒度為#800〜#l200(JISR6〇〇1 : 1998)所構成之精研 磨用之研磨刷(第5發明)。 在該第3發明及第5發明巾,針對將該研料段⑽ 研磨粒之粒度選用職6〇〇1: 1998所規定之_〜f22〇戈 粗粒區分、及#24〇〜#5〇〇之精密研磨區分之2組之優點办 以說明。前步驟中,切成四角私 x 月柱狀之矽塊時,進行加工居 其剖面尺寸稱為:5吋時一袼】μ Λ 遺 125mm±〇.5mm,稱為:6 °寸 κ 一邊 156mm±〇.5mm,稱為.a &The surface is subjected to a grinding process - and the scorpion scorpion raises the U T in the horizontal direction (the long side direction of the block). It is disclosed in paragraphs _0 and 6 of Patent Document 1. It is also known to carry out the grinding and grinding on the opposite side, and the grinding/grinding and grinding device is moved in the horizontal direction (longitudinal direction of the block). The grinding step consists of a coarse grinding step in which the coarseness of the abrasive grains is coarse and a two-step polishing step in which the coarseness of the abrasive grains is finer, or the grinding fixture is formed by mixing the diamond abrasive grains in the resin brush. It is also known that a ring-shaped rotating brush is known for the type of the stone block to be processed, and the seed is processed in a polycrystalline or single crystal stone block or a circular grinding machine containing abrasive grains in the polishing jig. Stone or diamond wheels (grinding wheels) are also known for obtaining high dimensional accuracy. In addition, when the bismuth ingot is cut and formed, the micro-cracks or minute irregularities occurring on the surface layer of the bismuth block are removed, and the slab is cut and processed to form a crack or a defect caused by the flaw. The processing method of the 201231219 block with a reduced incidence of good products has also become known. Further, it has been known to form a tantalum wafer by cutting a tantalum block. [Patent Document 1] Japanese Patent Publication No. 4133935 (Discussion of the Invention) As described above, the slabs of polycrystalline or single crystals are cut into a square shape so that the cross-sectional shape is quadrangular. The size of the formation is: a square section having a cross-sectional dimension of 125 mm (referred to as: 5 吋 156 156 mm (referred to as · 6 吋), and one side 21 〇 (called: 8 吋)) The length can be cut to any length between 15 〇 and __. In the method of cutting the bismuth ingot, there is a method of using a band saw or a wire saw, but the wire saw is cut by a plurality of wires at the same time. The cutting efficiency is higher than that of the band saw. The cutting method of the wire saw is generally a method of separating the abrasive grains by spraying the abrasive grains to the cutting portion by the pressure of the pressure water, and the free abrasive grains for cutting. In recent years, in order to improve the cutting efficiency, a new steel wire in which the abrasive grains are melted and fixed to the steel wire as a fixed abrasive grain method has been developed. The new cutting method using this new wire saw has been gradually adopted. Confirm the cutting efficiency of the new line error In the improvement, the polycrystalline tantalum ingot and the single crystal tantalum ingot are cut by a conventional wire saw and a new wire saw, as shown in FIG. 9 and FIG. 11 , with a vertical line of 5 lines, a width of 5 lines, and a total of 25 sections. The result of forming a block having a size of 6 吋 (having a square cross section of 156 mm) and a dimension of 3 〇〇 mm in length 'to confirm the time required for cutting, the conventional wire saw needs more than 8 hours, and the new wire saw is only required When it is completed in about 3 hours, it is confirmed that the cutting time can be greatly shortened. 201231219 As a reason why the cutting time can be shortened, it is estimated that the wire saw of the conventional free-grain type is a high-speed steel wire during cutting. When the rotation, the abrasive grains will scatter and the cutting efficiency will be lowered. However, since the new wire saw is melted and fixed to the steel wire, the abrasive grains which are rotated with the wire do not scatter. However, when the wire is cut by the new wire saw In the case of polycrystalline germanium ingots, the four crucibles (A) located at the corners of Fig. 9 and the three crucibles (B) that are located between the crucibles (A) and the portion of the crucible (A) are facing the crucible. The cut surface on the outer peripheral side (the block (there are 2 sides in △I, and there are in the block (B)) The center of the surface is in a state of protruding outward (see Fig. 10). When the single wire saw is cut by the new wire saw, as shown in Fig. U, since the blocks are individually and independently cut, the figure is as shown in the figure. ^No, the center of the four sections of the single crystal block is cut out to the outside, resulting in a new problem that the cross-sectional dimension is not within the specified dimensional tolerance. To solve this problem, it has been required The outer shape of the cymbal block is a grinding processing device within a predetermined outer dimension tolerance. As described above, the slab formed by cutting the bismuth ingot has a surface roughness of "(7) in the surface portion of the flat portion and the corner portion. ~川卜爪(1)%%::1994) The micro-cracks with a depth of 80~ΙΟΟμΓη from the surface of the surface will occur = in the gas-making step. Therefore, in the subsequent step, it is carried out with a wire saw: cutting When processing into a tantalum wafer, a defective product may be generated due to the unevenness or the U crack. Therefore, it has been required to have a preparation device for rough grinding ability and fine grinding ability; the coarse grinding system is used to grind and remove the ice from the surface portion of the block to the right of the bark before the cutting process. This is for removing microcracks having a depth of 80 to 1 ΟΟμηι from the surface of the surface of the surface of the surface of the surface of the surface of the surface of the surface of the surface of the surface of the surface of the surface. Further, in the prior art document, a known technique of a processing apparatus having both the grinding processing and the polishing processing is not disclosed. The present invention has been made in view of the above problems, and an object thereof is to provide a grinding machine/grinding processing device and a grinding/grinding method thereof, which are capable of performing a grinding process function and a grinding process function by a processing device of a ring machine. The production efficiency can be improved; the grinding function is to grind a square columnar polycrystalline block or a single crystal block formed by cutting a bismuth ingot, one side is i 25 mm (referred to as: 5 吋), and one side is 156 mm (referred to as :6吋), one side is 21〇mm (referred to as: 8吋) in any of the cross-sectional dimensions; the grinding processing function is to refine the surface roughness of the flat portion and the corner of the ' block and will be formed inside the surface layer The processing device for the micro-crack plus two polygonal columnar members of the present invention comprises: a holding means (1) for holding a hard and brittle material of a multi-angle column, which is a workpiece; the measuring hand: holding the cross-sectional dimension of the two workpieces Measurement, center position b for holding the position of the workpiece of the holding hand slave (1) b grinding means (3) and grinding means (4) cutting amount, "zero" $, and measuring; grinding means (3), will make '$" The base point is in the slave (). The flat part (F) and the corner () of the sinusoidal workpiece are processed: the slab is ground to make the cross-sectional dimension and the cross-sectional shape into tolerances. (2) 'The grinding will be finished. The processing 'the grinding part (6) performs the grinding force... to remove the presence of: - the means (7)' is the workpiece to be held by the holding means (1): flat: 201231219 4 (F) and angle 4 (〇 Measuring and grinding the grinding, and transferring the gripper (1) holding the workpiece to a position where the measuring means (2), the grinding means (3), the grinding means (4) are disposed, and the controlling means (6), according to the start Before the processing, the measurement signal of the start (3)疋 item and the measurement means (2) is subjected to arithmetic processing, and an operation signal (the i invention) is output to each means. According to the 3th invention, the present invention is The grinding/grinding skirt of the angular columnar member has a grinding processing function and a grinding processing function, and the grinding processing force applies a certain cutting to the workpiece (3) to trim the workpiece. Shapes such as deformation, cutting the outer dimensions into one The polishing processing function applies a certain waste force to the workpiece (4) to the workpiece, and performs contouring along the surface of the workpiece to grind the surface layer to tens to tens (four) for embossing And the crack is 2' and the surface roughness is ground to be fine'. Therefore, in the multi-angle: shape of the money (W), etc., even if the cross-sectional dimension and the straight angle deviate from the tolerance angle, the column member can be moved. After the difference between the cross-sectional size and the cross-sectional shape, the micro-cracks in the surface layer are removed. : 'The grinding means (3) can also be used as a grinding stone; the grinding stone is made of damascene: solid = abrasive grains. The surface of the portion (32) is formed by the rotation of the workpiece == contact rotation #A (31), and the rotation of the rotary disk = ::: source (four) axis _); the polishing means (4) (4)) The hair/, the abrasive brush is rotated by the brush material of the smelting fixed abrasive grain; the rotation of the workpiece in contact with the processing surface of the workpiece 5: the core (4)), and the rotating disk B (41) It is configured to convey the % rotation axis B (43) of the rotary drive source (the second invention). 8 201231219 According to the second aspect of the invention, the grinding means (3) is provided by cutting the deformation of the workpiece, cutting the deformation of the workpiece, and cutting the shape and cutting the outer diameter into a tolerance. The grinding and machining capabilities are within, so the grinding process can be carried out. Further, the polishing means (4) is selected such that the raw material of the melt-fixed abrasive grains is used as a bristle material (4 is a polishing brush, and the bristle material (42) is pressed against the reinforcing surface of the workpiece in the polishing process, and the hair is removed. The end portion is contoured, and the surface is rotated by a contact, and the surface layer of the workpiece is polished by a number of μm to tens of _ to remove the microcrack, and the surface can be processed into a fine grinding process. The abrasive brush of the grinding means (4) has two forms, one is bundled with the bristle material (42) of the mixed abrasive grains, and is detachably mounted on the red turntable cymbal (41), when the brush material (42) is consumed (4) changing the form of the brush material (42) (refer to FIG. 7 and the embodiment), and fixing the brush material (not shown) to the rotating disk. When the brush material is consumed, the disk is replaced with the rotating disk. The form (not shown) may be used in any form. Further, the grinding stone of the grinding means (7) may be set to have a particle size of two or more kinds of abrasive grains fixed to the abrasive grain portion (32); The grinding means (4) can be used to grind (4) (4) to the bristles The particle size of the abrasive grains of the material (42) is set to two or more types (third invention). Further, the polishing brush of the polishing means (4) may be set to have two or more types of abrasive grains which are melt-fixed and fixed to the bristle material (4). (4) The coarse brush material (42) is implanted in the inner ring portion near the center of rotation of the rotating disk β (41) and the fine-grained brush material (42) of the abrasive grain is planted in the rotating disk. The outer circumference of the rotation center is farther away (the fourth invention). 201231219 Regarding the configuration of the polishing brush used in the polishing method (4), when the particle size of the melt-fixed abrasive grains is set to two types, "in the past, two polishing brushes must be provided for each abrasive grain size, but according to the fourth invention , the coarse-grained brush material (42) of the abrasive grain is implanted in the inner ring portion near the rotation center of the rotating disk β (41), and the fine-grained brush material (42) of the abrasive grain can be implanted in the rotation. It is only necessary to provide one polishing brush having two types of bristle materials (42) having different particle sizes of the abrasive grains, and it is possible to reduce the production cost and the downsizing of the apparatus. Further, the method of grinding (3) can also be used as a grinding stone composed of abrasive grains having a particle size of F90 to F220 (JISR6001: 1998) and #24〇~#5〇〇卬6〇〇1: Η%); The polishing means (4) may be provided with a polishing brush for rough polishing composed of abrasive grains having a particle size of #24〇~#5_ISR_: 1998) and a particle size of the abrasive grains of #800 to #l200 (JISR6〇〇1: 1998) A polishing brush for fine polishing (the fifth invention). In the third invention and the fifth invention, the size of the abrasive grains of the sifting section (10) is selected from the _~f22 〇戈 coarse grain division specified by the 〇〇6〇〇1:1998, and #24〇〜#5〇 The advantages of the two groups of precision grinding are described. In the previous step, when cutting into a rectangular block of four corners, the section size is called: 5吋一袼】μ Λ 125mm±〇.5mm, called: 6 ° inch κ side 156mm ±〇.5mm, called .a &

冉兩8寸時一邊210mm±0.5mm之A 一尺寸,依情形,有係該公差 左I慣形、或該四角柱狀4 石夕塊(W)之剖面形狀$ __ 1¾. . ^ 狀不樣’各角部(C)之直角度為90±0. 度之角度容許公差外之掩报 ^ ^ 卜之It升y。此種情形,依據第3發明2 第5發明’為將其剖面尺+命 】面尺寸與剖面形狀設定在該公差内 10 201231219 有可選擇F90〜F220之粗粒區分及#24〇〜#5〇〇之精密研磨 區分使用之優點,該F90〜 F22〇之粗粒區分可進行研削加 工且提高切削效率,該#240〜#5〇〇之精密研磨區分,當進 行容易發生稱為碎屬之裂縫、缺損之部位(多晶矽塊(w):角 部(C)等)之研削加工時,可防止該碎屑之發生,進行研削加 工。又,當在研削手段(3)之研磨粒部(32)適用具有2種粒度 之熔融固化之研磨粒時,例如在研磨粒部之研削加工面 設置圓形或圈帶狀之内圈㈣、及設置於該内圈區域外側 之圈帶狀之外圈區,或’將粒度細之研磨粒熔融固化於該内 圈區域,將粒度粗之研磨粒炼融固化於外圈區域,並且使 内圈區域比外圈區域突$,可形成該突出量以作為細之研 磨粒切入量。 =,作為該研磨手段(4)之研磨粒,將JISR6〇〇丨:Η% 所規疋之#240〜#5〇〇之粒度適用於粗研磨用之研磨刷,將 #800〜#12G()之粒度適用於精研磨用之研磨刷,具備2種研 磨刷’藉此藉由該粗研磨用之研磨刷之高研磨能力,將存 在灸矽塊(被加工物)之表層部之微裂縫高效率確實加以除 去後’藉由該精研磨用之研磨刷之微細研磨能力,將經該 粗研磨加工後粗的表層部之表面粗度研磨為微細,可消除 後步驟中所發生之裂縫或缺損。 又邊測®手段(2)係由基準塊(15)、測量具八⑴^叫、 及測量具B(22)構成; .、°亥基準塊(15)具備:形成於兩側,具有已知間隔之基準 面;為使基準塊⑴)之柱軸方向與進行加卫之被加工物之枉 201231219 轴方向平行’在把持手段⑴之夾軸(13)之—方設置成一體 型; 測量具A(21)(21),係從與該被加卫物之柱軸方向正交 之兩側方向在水平方向測量該基準塊(15)之對向基準面之 位置 '及與被加工物相對向之平面部(F)之位置或相對向之 角部位置,藉此測量被加工物之外形尺寸; 測量具B(22),亦可測量該被加工物之上面側平面部⑺ 或上面側角部(C)之垂直方向之高度位置(第6發明)。 依據第6發明,以例如該被加工物為四角柱狀之石夕塊㈤ 時為例加以說明,從與柱軸方向正交之兩側方向(圖i及圖 4之Y方向),藉由測量具a(21)(21),測量具備於把持手段 ⑴之基準塊(15)之基準面位置與錢(w)之平面部⑺或角 部(c)之位置’藉此測量該錢(w)之相對向之平面部⑺或 角部⑹之間隔之實際尺寸(圖丨及圖…方向之尺寸): 並且可測量相對向之平面部(F)之中心位置。又,藉由測量 具B叫,測量該錢(W)之上面側平面部(F)或上面側角部 ⑹之垂直方向(圖2及圖4之2方向)之高度位置藉此可 測量垂直方向(圖2及圖4之2方向)之該石夕塊㈤之中心位 置。 針對該第曰i發明所揭示之測量手段⑺之作用使用該 6發明之測1手段(2)所揭示之構成要件加以補充說明 &lt;1&gt;所謂剖面尺寸之測量’係藉由該測量呈 A(21)⑺),測量該石夕塊㈤之2平面部⑺或2角部_之 貫際尺寸,將其結果儲存於控制手段(6), 12 201231219 &lt; 2〉^把持手段(1)把持該石夕塊(w)時,所謂用以將把 持位置定心之中心位置係載置於把持手段(1)之基台(丨丨)之 該石夕塊(W)之圖1及圖4所示之γ方向之中心位置。該中心 位置係依據測量手段(2)之測量具a(2 1)之測量值進行算 出。又,為使所算出之矽塊(W)之中心位置與把持手段(1) 之中心一致,圖1及圖3所示之按壓具(12)(12)前後移動, 進行該矽塊(W)之定位。 又,圖2及圖4所示之z方向之中心位置係依據測量 手段(2)之測量具B(22)之測量值進行算出。又,為使所算出 之該矽塊(W)之高度方向中心位置與把持手段(〇之高度方 向中心一致,基台(11)上下移動進行定位。以這種方式,使 έ亥矽塊(W)之柱軸方向之兩端面之中心位置與夹軸(13)(13) 之中心位置一致,以使可進行把持。 &lt; 3&gt;為儲存相當於研削手段(3)與研磨手段(4)之切入 量成為「零」之位置之基點位置,進行以下之處理。 首先,藉由圖i及圖4所示之測量手段⑺之測量具 A(21)(21)測量該基準塊(15)之相對向之基準面之間隔尺寸 (該間隔尺寸係已知,預先輸入於控制手段⑹),使儲存於控 制手段(6)。 接著’使該研削手段(3)及研料段(4)之前端部分別襄 觸於基準塊(15)之基準面,依據其接觸位置、及藉由該〈 &gt;測量後使儲存於控制手段(6)之研削/研磨加工前之該句 塊(W)之2平面部⑺或2角部(c)間之實際尺寸,將相者方 研削手段(3)與研磨手段⑷之切人量成為「零」之位置: 13 201231219 點位置進行運算處理並加以求出,將結果儲存於控制手段 (6)。 另外,在制量手段(2)巾,雖有使直接接觸測量部位 用以進行測量之接觸式、及放射雷射光用以進行測量之非 接觸式’但可使用任一種。 又,依據輸入揭示於該第!發明之控制手段(6)之初始 設:項目及測量手段(2)之測量訊號,藉由該控制手段⑹進 運算處理,藉由依據其運算結果之動作訊號,控制把持手 段⑴'測量手段(2)、研削手段(3)、研磨手段⑷、移送手段 (5)之各手段。 亦即,在有關上述之測量手段⑺之作用之補充說明中 所述之&lt; 1 &gt;&lt; 2 &gt;&lt; 3 &gt;之各步驟中,控制手段(6)進行運算 處理’並且儲存結果,依據㈣存之結果及輸人於控制手 段(6)之研削/研磨加工後之剖面尺寸,自動設定研削手段 (3)、研磨手段(4)之切入量。當進行加工之矽塊(w)之種類(多 晶或早晶)為多晶時,為成為後述之第丨3發明所揭示之加工 步驟,使用以移送把持該矽塊(w)之把持手段(1)之移送手段 (5)動作,又,為單晶時,為成為後述之第〗4發明所揭示之 加工步驟,使用以移送把持該矽塊(w)之把持手段(1)之移送 手(5)動作。又,為單晶矽塊(w)時,在角部(c)之加工中, 亦如該旋轉機構(14)之「連續旋轉」之說明中所述,以另外 輸入。X定於控制手段(6)之旋轉速度,使把持該單晶矽塊(w) 之夾軸(13)連續旋轉。 又,該控制手段(6)具備: 201231219 使研削手段(3)之前端及研磨手段(4)之前端分別接觸該 基準塊(15)兩側之基準面,將該研削手段(3)之前端及研磨手 段(4)之前端之基點(切入量「零」之位置)進行運算處理之功 能; 藉由該測量具A(21),測量該基準塊(15)兩側之基準面 與被加工物兩側之2平面部(F)或2角部(c)之位置,將被加 工物之剖面尺寸進行運算處理之功能; 將該被加工物載置於把持手段(1)之基台(11),藉由按壓 具02)將其兩側定位之狀態,藉由該測量具八(21)及測量具 B(22),同時測量該被加工物之側面位置,進行使把持被加 工物兩端面之該夾軸(13)之軸心位置與該被加工物之柱軸 —致之定位之運算處理之功能;以及 藉由開始加工則輸入之該初始設定項目與該測量手段 (2)輸出之測量訊號進行運算處理,並料研削/研磨加工裝 置之各手段輸出動作訊號之功能(第7發明)。 •十對將》亥第7發明所揭示之研削手段與研磨手段之前 端之基點(切入量「零」之位置)進行運算處理之頻度加以說 明。 母當研削手段進行研削加工時,使研削手段之前端接 ,方、基準塊兩側之基準面,進行切入量「零」之位置之運 异處理後,設定切入量,進行研削研磨手段係僅在替換 為新研磨刷時,使研磨手段之前端接觸於基準塊兩側之基 準面,進行切入蚩「贲 » 零」之位置之運算處理。因此,研磨 加工中之研磨刷之切入量之設定係計算於研磨加工使用研 15 201231219 磨刷之次數,調整刷毛材前端之切入量,進行研磨加工。 «第7發明’由於在控制手段⑹設置㈣以將本發 明之夕角部狀構件之研削/研磨加工裝置自動化之各功能, 因此可確實進行被加工物之平面部(f)與角部⑹之研削加 工與研磨加工,並且可謀求省力化。 又’該被加工物之剖面係四角形,可將進行研削/研磨 加工之四角柱狀被加卫物之剖面尺寸與其公差設定為一邊 125麵土〇_5_(稱為:5仆―邊156_士〇5画(稱為:6 口寸)、- it 2H)鄉〇.5mm(稱為:8叶)中之任一種亦可將 該四角柱狀被加工物之2平面部⑺彼此交叉之角部⑼之直 角度作為剖面形狀之公差,設定為%度士 〇1度(第8發明” 依據第8發明’可依據開始加工前輸入控制手段⑹之 初始設定項目中之被加工物之研削/研磨加工後之剖面尺寸 及其公差’進行研肖彳/研磨 力口工。 又,該把持手段(1)具備: 基台(11),能將被加工物載置成其柱軸成水平而在垂直 方向上下移動; 按壓具(12),在隔著該基台⑴)之兩側進退移動於與該 被加工物之柱軸正交之方肖,將被加工物之兩側按壓,將 被加工物之柱軸定位於該基台(丨丨)之中心; 夾軸(13)(13),將軸芯配置於與該被加工物之柱軸相同 之方向’西己置於該被加工物之柱軸方向兩端側,使該夹軸 (13)(13卜方前進’用以把持定位於該基台⑴)中心之被加 工物之兩端面;以及 16 201231219 紅轉機構(14) ’使該夾軸(13)(13)以其軸芯為中心進行 間歇旋轉或連續旋轉(第9發明)。 該夹軸。3)(13)具備:把持被加工物之柱軸方向兩端 面,並且測量該被加工物柱轴方向之尺寸,使儲存於控制 手段(6)之功能。因此,可控制為依據該被加工物柱軸方向 之尺寸測量結果’將被加工物進行測量、研削加工、研磨 加工’移达至配置有測量手段(2)、研削手段⑺、研磨手段 ⑷之各手段之位置之移送手段⑺之移送距離。又,夹轴 (13)(13)1方連結於旋轉機構(14),可旋轉驅動該被加工 物。又,另一方成為從動側夾軸。 所謂該旋轉機構(14)之「間歇旋轉」,係使被加工物應 加工面旋轉’以使成為與研削手段(3)或研磨手段⑷相對向 之位置’用以進行旋轉方向對位者。亦即,依據開始加工 前輸入控制手段(6)之石夕塊(w)之種類決定加工順序,依昭泫 加工順序’對旋轉機構⑽輸出動作訊號。旋轉機構⑽: 依據該動作訊號使夾師3)旋轉,因此可使被失軸⑽把持 之矽塊(W)之應施以研削加工或研磨加工之兩個平面部 或角部(C)旋轉,使成為與研削手段(3)或研磨手段⑷相對向 之位置。以下,以加工多晶矽塊(w)時為例加以說明。 打卞曲邵(F)加 畜相對向 ' 〜”利卜之 1對 平面部(F)之加工時,使矽塊(w)旋轉9〇度,加工剩下之1 對平面部(F)。之後,2對平面部(F)亦即4平面部⑺之加工 結束後,該矽塊(W)旋轉45度,加工相對向之i對角部(〇。 接著,該矽塊(w)再旋轉90度,進行剩下之i對角部⑷)之 17 201231219 加工’所有之平面部(F)及角部(C)之加工結束。 所謂該旋轉機構(14)之「連續旋轉」,係將加卫面之形 狀為圓弧狀之被加工物(例如單晶矽塊(W))之角部(c)進行 研肖!力或研磨加工時,一面使該被加工物連續旋轉,一 面進仃加工者。把持該被加工物之夾軸(13)係依照另行輸入 设定之旋轉速度連續旋轉。 依據該第9發明,並用該第6發明之測量手段(2)之各 力月b藉此進行與載置於基台(11)之被加工物之柱軸方向正 、尺平方向(圖1及圖4之Y方向)與垂直方向(圖2及圖 之Z方向)之定心後,夾軸(丨3)(1 3)可確實把持於被加工物 之柱軸兩端面之中心位置’ χ,當研削加工或研磨加工被 加工物時’可將被加工物如前述確實進行「間歇旋轉」或 「連續旋轉」。 在第1發明中,亦可將該被加工物作為四角柱狀 之矽塊(第1 〇發明)。 又,藉由多角柱狀構件之研肖彳/研磨加工裝置之多角柱 狀構件之研削/研磨加工方法於具備·· 把持手段⑴,用以把持被加工物即多角柱狀之硬脆材 料; 測置手段(2) ’使用於進行該被加工物之剖面尺寸之測 量、該把持手段(1)把持被加工物之位置之定心測量、及將 研削手段(3)與研磨手段(4)之切入量當作「零」之基點位置 之測量時; 研削手段(3) ’用以研削加工該被加工物之平面部(?)及 18 201231219 角部(c); 工物之平面部(F)及 研磨手段(4),用以研磨加工該被加 角部(C); 之位置;以及 ‘制手奴(6) ’依據開始加工前所輸入之初始設定項目 及該測量手段(2)所測量之測量值’進行運算處理,對該各 手段輸出動作訊號;之多角柱狀構件之研削/研磨加工裝置 中, 藉由。亥研削手段(3)將該被加工物進行研肖彳加卫後,藉 由該研磨手段(4)將該被加工物進行研磨加工(第u發明)。曰 又在。亥第1 1發明中,該被加工物之剖面係四角形, 將該研削手段(3)所使用之研磨石之研磨粒之粒度設定為 f9〇〜F22〇(JISR6001:1998)&amp;#24〇〜#5〇〇(jisr6〇〇i: 1998);將該研磨手段之粗研磨用之研磨刷所使用之研磨粒 之粒度設定為#24〇〜#500(JISR6〇〇丨:丨998),將該研磨手段 (4)之精研磨用之研磨刷所使用之研磨粒之粒度設定為判〇〇 〜#1200〇18116001:1998),將進行研削/研磨加工之四角柱 狀之被加工物之剖面尺寸與其公差設定為一邊125爪爪+ 0.5mm(稱為:5 吋)、一邊 156mm±〇 5mm(稱為:6 吋)、_ 邊21〇mm±0.5mm(稱為:8吋)中之任一種,將該四角杈狀之 被加工物之2平面部(F)彼此交又之角部(c)之直角度作為剖 面形狀之公差’設定為90度土〇· 1度(第12發明)。 19 201231219 又在3玄第1 1發明或第i 2發明中,將該研削手段⑺ 中之切削量設定為20/zm〜700 &quot;m,在研削手段⑺中將 被加工物之表面粗度研削加工成A Ry2.〇〜10.” _腦06〇1:1 994)後,將言亥研磨手段⑷中之切削量設定為 75 ρ以上’在研磨手段⑷中,將被加1物之表面粗度研 磨加工成為Ryl.Um(JISB〇6〇1 :丨994)以下(第丨3發明)。 第1發明中’ s亥被加工物係四角柱狀之石夕第 1 4發明)。 又,在第13發明中’該被加工物係多晶矽塊㈤,依 照平面部(F)之研削加工、角部(c)之研削加工 '平面部⑺ ▲ 進仃°玄多日日矽塊之加工步驟(第15發明)〇 在-亥第15發明中’進行研磨加工的只有4平面部⑺, 關於角部⑹’不進行研磨加卫之原因在於,微I縫之發生 部位大體上係平面部(F),角部(〇中,由於在與平面部⑺ 之接合部位附近存在有微裂縫,因此若將4平面部(F)進行 “ .5陶以上,存在於角部(C)與平面部(F)接合部位 附近之微裂縫亦可同時加以除去。 又,在該第U發明中,該被加工物係單 亦可依照平面部⑺之研削加工、角部⑹之研削加工、角部 (C)之研磨加工、平面部(F)之研磨加工之順序,進行該單曰 石夕塊(w)之加工步驟(第16發明)。 /早曰曰 ⑹之在研1il16發明中,在平面部(F)之研磨加工前進行角部 1 σ工之原因在於’與該多晶石夕塊(w)相同在單晶 石夕塊(W)之情形中’在角部(〇與平面部⑺接合部位附近: 20 201231219 往存在有微裂縫,只要研 磨加工平面部(F),就可以將該微 裂縫加以除去。 本發明,例如被加卫ίι 勿係以線鑛將石夕鍵切斷而形成之 四角柱狀之矽塊(W)之情形,由於具備: ⑴將5玄石夕塊(W)加工成例如一 $ 125叫稱為:5叶)、 一邊l56mm(稱為:6°寸)、—邊2Η)麵(稱為:8时),其尺 寸公差具有±〇·5mm之剖面圮4 μ „ “ 寸’並且將其平面部(F)彼此交 叉形成之角部(C)之直角片/入ϋ A Λ β以X罝用度么差加工成±〇1度之剖面形狀之 研削功能、以及 ⑺將該石夕塊(W)之表層之微裂縫除去,使表面粗度為 微細之研磨功能之兩功能, (3)從進行加工之矽塊(w)被搬入本發明之研削/研磨 加工裝置,至結束研削/研磨加工搬出之各步驟可進行自動 化, 因此,可確實進行研削/研磨加工,並且可謀求省力化。 又在石夕塊(W)之製造線中之石夕錢之切斷步驟中,即使 剖面尺寸與直角度偏離規格之矽塊搬入本發明之研削I 研磨加工裝置時,使用研磨石作為研削手段(3),藉此可將 剖面尺寸及剖面形狀加工在公差内。另外,使用研磨刷作 為研磨手段(4),藉此可進行除去微裂縫。結果,在下一步 驟中,使用線鋸,將矽塊(w)進行切割加工成數百μηι之厚 度’藉此形成石夕晶圓時’可將石夕晶圓之外形尺寸加工在公 差内,並且可抑制切割加工矽晶圓時所發生之裂縫、缺損, 可減低不良品之發生率。 21 201231219 又,由於在把持矽塊(W)之把持手段(1)之夾軸(丨3)(π) 設置有使該失軸(13)(13)「間歇旋轉」或「連續旋轉」之旋 轉機構(14),因此可對矽塊(W)之角部(c)之形狀作成c面(平 坦之倒角面)形狀之多晶矽塊(W)、及作成圓弧形狀之單晶矽 塊(W)兩者進行研削/研磨加工。因此,對多晶石夕塊(w)及單 晶矽塊(W)兩者之加工步驟可進行自動化。 【實施方式】 使用圖式,針對本發明之多角柱狀構件之研肖彳/研磨裝 置之構成與其操作步驟,以加工四角柱狀矽塊為例加以說 明。 本發明之矽塊之研肖彳/研磨裝置係如圖1所示,具備: 把持手段(1) ’用以把持四角柱狀之石夕塊(W); 測量手段(2) ’用以進行該矽塊(W)之剖面尺寸之測量、 該把持手段(1)把持矽塊(W)之位置之定心之測量、及為算出 把研削手段(3)與研磨手段(4)之切入量當作「零」之基點位 置所需之測量; 研削手段(3) ’將該矽塊(W)之平面部及角部(c)加以 研削加工,研削成為一邊125mm(稱為:5吋)、一邊156mm(稱 為:6吋)、一邊2丨0mm(稱為:8吋)中之任一剖面尺寸; 研磨手段(4) ’將結束該研削加工之石夕塊(%)之平面部 (F)及角部(C)加以研磨加工,用以除去存在於其表層之微裂 縫; 移送手段(5),為將被該把持手段把持之矽塊 平面部(F)及角部(C)進行測量、研削、研磨,將把持該矽塊 22 201231219 (W)之把持手段(1)移送至配置有該測量手段(2)、研削手段 (3)、研磨手段(4)之位置;以及 控制手段(6)’依據開始加工前所輸入之初始設定項目 及該測量手段(2)之測量訊號’進行運算處理,對該各手段 輸出動作訊號。 開始加工前’將該初始設定項目輸入控制手段(6),該 初始設定項目包含:形成於基準塊(丨5)兩側之基準面之間隔 尺寸(已知)、進行加工之矽塊(W)之種類(多晶或單晶)、該 矽塊(W)之研肖lj /研磨加工後之剖面尺寸及其公差、加工單晶 矽塊(W)之角部(c)時之旋轉機構(14)之旋轉速度、研削手段 (3 )及研磨手段(4)之外形尺寸、研磨粒之粒度、旋轉速度、 及藉由移送手段(5)之研肖彳/研磨加工中之矽塊(w)之移送速 度。 輸入該控制手段(6)之研肖彳/研磨加工中之矽塊(W)之移 送速度必須設定在不殘留研削加工或研磨加工痕之範圍, 當加工多晶矽塊(W)之平面部(F)與角部(C)、及單晶矽塊(W) 之平面部(F)時’設定在1 〇〜40mm/秒,當加工單晶石夕塊(W) 之角部(C)時,設定在1 〇mm/秒以下。為設定適當之移送速 度’必須考量研削/研磨加工之研磨粒之粒度、切入量、旋 轉速度之設定條件,例如,若研磨粒之粒度較粗,就必須 將移送速度設定在該範圍之慢區域,若研磨粒之粒度較 細’就必須將移送速度設定在該範圍之快區域。 將設置於該控制手段(6)之開始加工開關開啟(ON),藉 此進行加工之矽塊(W)從搬入用輸送機(V )透過未圖示之移 23 201231219 載裝置,設置於圖2所示之把持手段(1)之基台(u)i。然 後’從該石夕塊(W)之兩側,圖1及圖2所示之按壓呈(1 2)各 自前進,定位於連接夾軸線(1 3)與配置於兩側之研削手段(3) 與研磨手段(4)之中央(圖1所示之Y方向之中央)之線上。 此種狀態中’夾軸(1 3)之一方係向X方向即石夕塊(w)側前 進,藉由該夾軸(13)把持矽塊(W)。 該把持手段(1)係藉由移送手段(5)移送至配置有研削手 段(3)與研磨手段(4)之位置’使研削手段(3)之研磨粒部(32) 之前端接觸於載置於該把持手段(1)之基準塊(1 5)兩側之基 準面’並且使分別接觸研磨手段(4)之粗研磨用及精研磨用 之刷毛材(42)之前端。藉此,將該研削手段(3)之研磨粒部(32) 與研磨手段(4)之粗研磨用及精研磨用之刷毛材(42)之切入 量當做「零」之基點位置儲存於控制手段(6&quot;所謂切入量, 係表示把矽塊(W)之表面(被加工面)當做「零(基點)」,研 削手段(3)之研磨粒部(32)及研磨手段(4)之刷毛材(42)前端 之從該基點往柱軸方向之移動量。亦即,藉由研削手段(3) 及研磨手段(4)之切入量決定矽塊(w)之切削量。 以上’係說明矽塊(W)之種類於多晶、單晶共通之操作 步驟’以下,針對研削/研磨加工多晶矽塊(W)時之操作步驟 加以說明。 接著’該把持手段(1)移送至配置有測量手段(2)之位 置’如圖4所示,藉由測量具A(21)測量多晶矽塊(W)之兩 側彼此相對向之1對平面部(F),1對平面部(F)之Y方向位 置被儲存於控制手段(6)’用以運算該多晶矽塊(W)之Y方 24 201231219 向之厚度尺寸。依據其厚度實際尺寸與事先輸人設定之 旦』 尺寸」’自動設定研削手段(3)之切入 $,該研肖彳手段(3)係由研磨粒部⑽形成於圓5 之旋轉盤A(31)之研磨石構成。 不 。亥把持手段⑴藉由移送手段(5)被移送至配置有研削手 段(3)之位置,i #平面部(F)藉由研削手段⑺進行研削加 工。研削加工後,藉由測量具仰),確認剖面尺寸為該加 寸之A差内後,II由疑轉機構(J 4),使把持手段⑴之失 軸⑴)間歇旋# 90度,與該i對平面部之研肖彳加工相 同’將剩下之1對平面部(F)進行研削加工,結束4平 (F)之研削加工。 ° 接著,該把持手段(1)再被移送至配置有測量手段之 位置,藉由旋轉機構(14)使夾軸(13)間歇旋轉C度,藉此 被該夾軸(13)把持之多晶矽塊(w)之彼此相對向之丨對角部 (c)於水平方向相對向。在此狀態,藉由測量具A(2〇測量1 對角部(C)之兩面位置,i對角部(c)之間隔實際尺寸被進行 運算’並且研削手段(3)之切入量被自動設定。 該把持手段(1)藉由移送手段(5)再被移送至配置有研削 手段(3)之位置’將i對角部(c)進行研削加工,藉由測量具 A(2 1)確s忍剖面尺寸為該加工尺寸之公差内。然後,藉由旋 轉機構(14) ’使把持手段(1)之夾軸(13)間歇旋轉90度,與 s亥1對角部(C)之研削加工相同,將剩下之1對角部進行 研削加工’將該多晶矽塊(W)之剖面尺寸加以研削加工成為 該加工尺寸之公差内。 25 201231219 ”。束研削加工之多晶矽塊(w)係依照以下所示之操作 步驟,藉由研磨手段(4)進行研磨加工。藉由該研磨加工, 將4平面部(f)表層之微裂縫加以除去並且進行加工使 面尺寸成為該加工尺寸之公差内。 該研磨手段(4)使用由研磨粒之粒度不同之粗研磨加工 用席j毛材(42)與精研磨.加工用刷毛材(42)構成之研磨刷。將 該刷毛材(42)表示於圖7及圖8。此處,進行研磨加工之平 面。卩(F)之剖面尺寸之測量方法 '粗研磨加工用及精研磨加 工用之研磨刷之切入量之設定方法、粗研磨加工及精研磨 加工之研磨加工之操作步驟係與該研削加工之操作步驟相 同。另外,在多晶矽塊(W)之研磨加工中,如前所述’僅到 4平面部(F)之研磨加工即結束,不進行角部(c)之研磨加工。 結束研削加工與研磨加工之該多晶矽塊(w)藉由移送 手段(5) ’與把持手段(1)一起返回原來位置,藉由夾軸(13) 與按壓具(12)之把持狀態被解除。然後,藉由未圖示之移載 裝置,加工完成之多晶矽塊(W)被移載至圖丨所示之搬出用 輸送機(口)並加以搬出。 以上’已將多晶矽塊(W)之研削/研磨加工之操作步驟加 以說明。接著,說明單晶矽塊(W)情形之研肖&quot;研磨加工 作步驟。 $ 右使该控制手段(6)之開始加工開關啟動(〇N),進行研 削/研磨加工之單晶矽塊(W)係被設置於把持手段之美△ (11)上’藉由按壓具(1 2)將其兩側加以把持,* * 业五錯由失轴 (13)把持兩端面。由於該單晶矽塊(W)之角部之带狀伏隻 26 201231219 留石夕鍵一部分所形成之圓弧狀,因此研肖彳/研磨加工角部(c) 時’必須使該單晶矽塊(w)連續旋轉。因此,必須進行定位 (疋。),以使把持單晶石夕塊(w)之夾軸(丨3)之軸芯與石夕塊(w) 之柱轴一致。 測1手段(2)係如圖4所示,藉由γ方向之測量具A(2 i ) 與z方向之測量具B(22)之兩者,可測量單晶矽塊之各 側面之位置。而且,依照其測量結果,可進行單晶矽塊(W) 之定心,使夾軸(13)之軸芯與矽塊(w)之柱軸一致,該夾軸 (13)把持矽塊(w)。 接著,該把持手段(1)被移送至配置有測量手段之位 置’藉由測量具A(2 1) ’如圖4所示,運算單晶石夕塊(w)之 兩側彼此相對向之丨對平面部(F)之γ方向之厚度尺寸。研 削手段(3)之切人量被自動設定後,丨對平面部(f)被進行研 削加工。然後’把持進行加工之單晶矽塊(W)之該把持手段 ⑴’在測量剩下之丨對平面部(F)之同時,單晶石夕塊㈤在 配置有測莖手段(2)與研削手段(3)之位置間纟回移冑,與該 1對平面部(F)相同,剩下之1對平面部(F)亦被進行研削加 工,結束4平面部(F)之研削加工。上述加工順序係與該多 晶硬塊(W)相同。 接著、玄把持手段⑴再被移送至配置有測量手段⑺之 位置’藉由旋轉機構(14),使夹轴(13)間歇旋轉45度使單 晶石夕塊(W)之彼此相對向之一對角部(c)配置成於水平方向 相對向。接著,藉由測量具A(21)測量該角部(〇之兩側, 運算1對角部(C)間之間)¾ p , h尺寸’藉此研削手段(3)之切入量 27 201231219 被自動設定。 該把持手段(1)藉由移送手段(5)再被移送至配置有研削 手段(3)之位置後,藉由事先輸入設定之旋轉機構之旋轉 速度,使夾軸(13)連續旋轉,開始單晶矽塊(w)之角部(c) 之研削加工。角部(C)之研削加工結束後,同樣地,藉由事 先輸入設定之旋轉機構(1 4)之旋轉速度,使把持手段(丨)之夾 軸(13)連續旋轉,依序進行4角部(c)之粗研磨加工與精研 磨加工。 結束該角部(c)之研削加工後,藉由該旋轉機構(14)使 夾軸(1 3)旋轉,使進行研磨加工之單晶矽塊(W)之彼此相對 向之1對平面部(F)配置成於水平方向相對向,進行研磨加 工。然後,藉由知:轉機構(14)使夾軸(丨3)旋轉9 0度,藉此 剩下之1對平面部(F)同樣被進行研磨加工,所有之研磨步 驟便結束。 載置所有之研削/研磨加工結束之該單晶矽塊(W)之把 持手段(1)返回原來位置,將夾軸(丨3)與按壓具(12)之把持狀 態解除後’從把持手段(1)之基台(Π )上,單晶矽塊(w)透過 未圖示之移載裴置’往圖1所示之搬出用輸送機(口)移載並 加以搬出。 接著’針對藉由本發明之裝置及方法,用線鋸,將進 行研削/研磨加工後之矽塊(W)進行切割加工形成矽晶圓 時,可減低因該矽晶圓之裂縫、缺損等所引起不良品之發 生率之實施例,加以說明。 另外’此處所使用之石夕塊(W)係被切成四角柱狀之多晶 28 201231219 矽塊(W)及單晶矽塊(W),藉由本發明之研削手段(3)研削此 等矽塊(W)之4平面部(F)與4角部(C),藉此將剖面尺寸研 削加工成為公差内之後,藉由研磨手段(4)研磨單晶矽塊(W) 之表層,藉此將微裂縫加以除去。 實施例1 在本實施例1中,進行加工之石夕塊(W)係如圖9所示, 從1個矽錠切出者。當從矽錠切出時,使用作為固定研磨 粒方式之新線鋸,將由4平面部(F)與直角形狀之4角部(C) 構成之四角柱狀之多晶石夕塊(W)切成5行x5行=合計25根。 實施例1所使用之矽塊(W)係從圖9及圖1 0所示之矽錠之4 個角部切出之矽塊A,在該矽塊A中,在兩個平面部形成 有凸出部。 將開始加工前輸入控制手段(6)之初始設定項目之内容 表示於表1及表2。 【表1】 設定條件 基準塊之基準面間之實際尺寸 100mm 矽塊 種類 _ _ -.(實施例1)多晶 (實施例2)單晶 (被加工物) 研削/研磨結束後之尺寸 (剖面X長度) (實施例 1)口156±0. 5mmx500fl· 0mm (實施例2)口125±0· 5mmx300±l. 0mm 加工單晶之稜角部時之旋轉速度 (基準周速度) 105min_1 (0· 5〜1. lm/秒) 【表2】 29 201231219 研削手段(研磨石) 研磨手段:粗研磨 (研磨刷) 研磨手段:精研磨 (研磨刷) 外形尺寸 φ250mm φ210mm φ270mm 研磨粒之粒度 (實施例1)F100 (實施例2)F180 #240 #800 旋轉速度 2700min'' 1300min_1 1300min'' (基準周速度) (30 〜40m/秒) (10〜20m/秒) (10〜20m/秒) 藉由採用雷射法之測量具A(21)預先測量該表1所示之 初始設定項目之内、基準塊(15)之基準面之間隔尺寸 (1 00mm),將其測量結果儲存於控制手段(6)。 接著,該多晶矽塊A係稱為:6吋之剖面一邊156mm(長 度為500mm),如圖4所示,使用該測量具A(2 1)測量多晶 矽塊A(W)之剖面彼此相對向之1對平面部之高度方向3部 位X長邊方向3部位(合計9部位)與剩下之1對平面部之9 部位合計18部位。結果,多晶矽塊A之剖面一邊尺寸為 156.9〜157.6mm(平均:157.1mm),表面粗度為 Ry21〜 27μηι(平均:24μπι),另外,長度為 499.6mm。 研削手段(3)係採用圖5及圖6所示之杯型研磨石,進 行研削/研磨加工之多晶矽塊A(W)之測量之平均剖面尺寸 相對於稱為:6 σ寸之一邊1 56mm,為+ 1.1 mm。因此,必須 藉由研削手段(3)加以研削單側=0.55mm。形成研削手段(3) 之研磨粒部(32)之研磨粒之粒度係從表3選擇粗研磨粒,選 擇相當於F100(JISR6001 : 1998)之粒度之鑽石研磨粒。又, 該研磨粒部(32)之寬度設定為 8mm,外形尺寸設定為0 250mm,切入量設定為0.7mm,旋轉速度設定為2700min_1(相 當於研削加工之基準周速度30〜40m/秒)。使該多晶矽塊 A(W)以20mm/秒之速度通過配置有該研削手段(3)之位置, 30 201231219 研削1對平面部(F)後,藉由旋轉機構(14)使夾軸(13)旋轉 9 0度等剩下《i對平面部與上述同樣進行研削,結束* 平面部(F)之研削加工。 【表3】 (研磨石)研磨粒之粒度 〈JISR6GQ1 :刚8、 矽塊 研磨後之表面粗度:Ry(ym) &lt;JISB0601 : F100 _5.0 〜10.0 4.0 〜6.0 ^Γ80~ #320 3.0〜5 D #500 ’2.ϋ 〜4.0 結束該4平面部(F)之研削加工後,藉由旋轉機構(14), 使把持該多晶矽塊A(w)之夾軸〇3)旋轉45度,使與一對2 角部(C)於水平方向相對向’設置於與兩側之研削手段⑺相 對向之位置。 角部(C)之研削手段(3)之研磨粒之粒度與多晶矽塊 A(W)之移送速度在設定與研削該平面部(f)時相同條件進 行研削後,在平面部(F)與角部(c)之接合部位發現稱為碎屑 (chipping)之裂縫,因此將該研削手段(3)之研磨粒之粒度變 更為精細之#500(JISR6001 : 1998)之研磨石’將多晶矽塊 MW)之移送速度變更為3〇mm/秒,進行研削之結果阳研削 量雖變少’但不產生如上述之碎屬,可形成角部(c)之倒角 部。 因此,剩下之1對角部(c)之研削亦將研削手段之研 磨粒之粒度設定為#500,藉由該旋轉機構(14),使夾軸 旋轉901’與上述相同進行研削,結束4角部⑹之研削加 工。結果,平面部(F)彼此相對向之2對平面部(f)之合計μ 31 201231219 部位之間隔尺寸為㈤〜⑽麵(平均·丨56 2_) 2對 平面。_之研削加工量(=以測量值/2算出之結果)為390〜 48〇μΐΏ(平均:43〇_,表面粗度為Ry5〜8μηι(平均:7_。 ;將4研削加工後(研磨加工前)之乡晶石夕塊增)切斷, 確。有‘、’、微裂縫之結果,存在於離表面深度〜之位 置。又’為確認將該多晶矽塊A(w)切割加工為晶圓等效品 時之裂縫、缺損等之發生率作為參考,使用線鋸將該多晶 石夕塊A(W)切割加工為厚度2〇_之結果,其裂縫缺損等 之發生率為3.8%。 在下研磨手段中之粗研磨步驟與精研磨步驟中,採 用如圖7及圖8之杯型研磨刷,其刷毛材(42),使用以金屬 管將安裝基部加以紮束’以自由拆裝之方式安裝於旋轉盤 B(41),當磨損時,可替換之扇形刷(segment心^讣)。 在該粗研磨用之研磨刷中,熔融固定於其刷毛材(42) 上之研磨粒之粒度係使用表2所示之#240(JISR6001 : 1998) 之鑽石研磨粒。將研磨刷之外形尺寸設定為021〇mm,切入 量设定為〇.5mm,從研磨加工之基準周速度1〇〜2〇m/秒換 算’旋轉速度設定為UOOmin-1,將進行研磨之多晶矽塊A(w) 之移送速度設定為2〇mm/秒,進行粗研磨加工。 【表4】 研削年段 (研磨刷)研磨粒之粒度 &lt;JISR6001 : 1998&gt; Ά 研磨後之表面粗度:Ry(pm) &lt;JISB0601 : 1994&gt; #240 3.0 〜5.0 #500 1.0 〜3.0 #800 0.5 〜1.0 #1000 0.3 〜0.5 32 201231219 結束粗研磨加工之結果,測量平面部(F)彼此相對向之 2對平面部(F)之合計18部位之間隔尺寸之結果,為156.0 〜1 56.4mm(平均:1 56_ 1 mm),研削加工量為 75〜78 μηι(平 均:77μηι),表面粗度為 Ry2.9〜4.0μηι(平均:3.4μηι)。 在該精研磨用之研磨刷中,熔融固定於該刷毛材(42) 之研磨粒之粒度係使用表4所示之#800之鑽石研磨粒。將 研磨刷之外形尺寸設定為0 270mm,切入量設定為0.8mm, 從研磨加工之基準周速度10〜20m/秒換算,旋轉速度設定 為1 300min_l,藉由移送手段(5),以20mm/秒之移送速度, 使進行研磨之多晶矽塊A(W)通過該精研磨用之研磨刷之 間,將4平面部(F)進行研磨加工,結束所有之加工。 結束精研磨加工之結果,平面部(F)彼此相對向之2對 平面部(F)之合計18部位之間隔尺寸為155.9〜156.4mm(平 均:1 56.1 mm),研削加工量為1 6〜1 9μηι(平均:1 8μΓη),表 面粗度為Ry0.9〜Ι.ίμηι(平均:Ι.Ομηι)。 將以上所說明之實施例1之多晶矽塊A(W)施以研削加 工、粗研磨加工、及精研磨加工之加工結果匯總,則如以 下之表5所示。 【表5】 研削加工後 粗研磨加工後 精研磨加工後 剖面外形尺寸 156.1 〜156.6mm (平均:156.2mm) 156.0 〜156.4mm (平均:156.1mm) 155.9 〜156.4mm (平均:156.1mm) 切削量 390 〜480μηι (平均:43〇um) 75 〜78μηι (平均:77um) 16 〜19μηι (平均:18_) 表面粗度 (半面畜ίΟ Ry5 〜8μιη (平均:7_) Ry2.9 〜4.0μηα (平均:3.4um) Ry0.9 〜Ι.ίμηι (平均:1.0口m) 又,用線鋸,將該研削加工與研磨加工全部結束之多 33 201231219 晶石夕塊A(W)進行切割加工,切割成晶圓,調查因該矽晶圓 之裂缝、缺損等所弓丨起之不良品發生率。 如上所述,將研削加工後之該多晶矽塊A(w)進行切割 加工,切割成晶圓時之裂縫、缺損等所引起之不良品發生 率雖為3〜4%,但如表5所示,進行粗研磨加工與精研磨 加工,其研磨量合計為85μηι,其表面粗度之Ry平均: 1 .Ομιτι ’藉此可將其發生率減低到1 2%。 實施例2 本實施例2中’進行加卫之我(w)係將藉由拉晶法所 製造之圆柱狀單晶矽錠切成之單晶矽塊(w)。將該單晶矽錠 之上下端部加以切除,將長度(圖n中,與紙面垂直之方向) 切成299.0〜301.〇mm之範圍(稱為:3〇〇mm)後,如圖!所 示,將5行X5行=合計25根垂直固定於固定治具。 使用以該實施例丨所用之固定研磨粒方式之新線鋸, 將该25根之單晶矽錠之各單晶矽錠之胴體之外周部分加以 切除。此時’外周之一部分被加工成為寬度約25軸之圓弧 狀之4角部(C)。同時切成分別成為大致直角之4平面部 (F)’作為單晶⑪塊(W),從所切成之25根該單晶#塊中, 隨機抽取1根,作為研削 '研磨加工用之樣本。其外形尺 寸之剖面為一邊125mm(稱為:5吋)&gt;(長度3〇〇mm。 本實施例2所使用之單晶矽塊(w)之形狀係由4平面部 (F)與圓弧狀之4角部(C)構成之四角柱狀,與該實施例1相 同實施其剖面外形尺寸之測量。亦即,測量彼此相對向之2 對平面部(F)之間隔合計ι8部位之結果,平面部⑺之間隔 34 201231219 尺寸為125.4〜126_5mm(平均:126 lmm),長度為 300.8職,表面粗度為Ry22〜28_(平均:25㈣。 關於研削/研磨之規格’除了將研削手段所使用之杯型 研磨石之研磨粒之粒度變更為從表3選擇設定之ρΐ8〇以 外,與該實施例i相同(參照4 2)。將研削手段之研磨粒之 粒度變更4 F180之理由在於,由於相對於進行研削/研磨加 工之單晶矽塊(w)之平均剖面尺寸係稱為:5吋之一邊 125mm’實測尺寸為+〇.7_,單側=〇 ^纏之切削量,因 此使用較該實施例i所用之| 3所示之测為細粒度之 F180(JISR6001 : 1998)者。 研削加工中’以夾軸(13)把持準備之單晶矽塊(W),設 定為1對平面部(F)於水平方向兩側相對向之狀態,使通過 該:對研削手段(3)之間,與該實施實例丨之多晶碎塊(w) 相同,結束2對平面部(ρ)之研削。 接者,依據預先輸入設定之表1所示之旋轉機構(14) 之運轉條件,_面在轴芯周圍以iQ5min|之旋轉速度使夹 Μ )連’旋轉’ 一面以2mm/秒之低速度使單晶矽塊(w) 通過由-對研磨石構成之研削手段(3)之間,結束2對角部 (C)之研削加工。 、’°果平面部(F)彼此相對向之2對平面部(F)之合計1 8 部位之間隔尺寸為124.9〜125 8麵(平均:125 4—,4平 面部之切削量為283〜354μηι(平均:Μ—),4平面部(f) 與4角部(C)之表面粗度為Ry4〜—(平均:。 其··人之研磨加工,係與上述相同,一面藉由旋轉機構(丨4) 35 201231219 使進行研磨加工之單晶矽塊(w)連續旋轉,一面藉由移送手 段(5)以2mm/秒之低速度使單晶石夕塊(W)通過由粗研磨用之 研磨刷與精研磨用之研磨刷構成之研磨手段(4)之間,結束 4角部(C)之研磨加工。 然後,與該實施例1相同,藉由移送手段(5),以20mm/ 秒之移送速度,使該單晶矽塊(W)之2對平面部(F)之研磨加 工通過研磨手段(4)之間,結束2對平面部(F)之研磨加工, 結束全部加工。 在該研磨加工中,與上述相同,測量結束粗研磨加工 時點之平面部(F)彼此相對向之2對平面部(F)之間隔合計1 8 部位之結果為1 24.8〜1 25 · 6mm(平均:1 25.3 mm),研磨加工 量為69〜75μηι(平均:73μτη),表面粗度為Ry2.8〜3·8μιη(平 均:3.3 μηι)。又,測量結束精研磨加工時點之平面部彼此相 對向之2對平面部(F)之間隔合計18部位之結果為124.7〜 125.5mm(平均:125.2mm),研磨加工量為17〜25μΓη(平均: 20μηι),表面粗度為 Ry0.8 〜Ι.ΟμΓη(平均:0·9μηΊ)。 將結束以上所說明之實施例2之單晶矽塊(W)之研削加 工、粗研磨加工、及精研磨加工後之剖面外形尺寸與表面 粗度加以匯總,則成為以下表6所示之結果。 【表6】 研削加工後 粗研磨加工後 精研磨加工後 剖面外形尺寸 124.9 〜125.8mm (平均:125.4mm) 124.8 〜125.6mm (平均:125.3mm) 124.7 〜125.5mm (平均:125.2mm) 切削量 283 〜354μηι (平均:316_) 69 〜75μπι (平均:73μηι) 17 〜25μιη (平均:20um) 表面粗度 (平面部與仿角部) Ry4 〜6μπι (平均:5um) Ry2.8 〜3.8μιη (平均:3.3um) Ry0.8 〜Ι.Ομιη (平均:0.9_) 36 201231219 又,以線鋸,將該研削加工與研磨加工全部結束之單 晶矽塊(w)進行切割加工’切割成矽晶圓,檢查該矽晶圓之 裂縫、缺損#所引起之不良品發生率之結果,與該實施例j 之多晶矽塊(W)相同,藉由研削加工後之粗研磨加工與精研 磨加工,將其研磨加工量合計設定為135μη1,將表面粗度 設定為Ry平均:〇.9μηι,藉此可將其發生率減低至i 〇%。 本發明係針對有關矽塊之研削/研磨之發明加以說明, 但並非限定於矽塊,亦可適用於例如玻璃、石材、陶瓷肥 粒鐵專所有硬脆材料。 【圖式簡單說明】 圖1係本發明之研削/研磨裝置之俯視圖。 圖2係表示將矽塊載置於本發明之把持手段之基台上 狀態之前視圖。 圖3係表示將石夕塊載置於本發明之把持手段之基台上 之狀態圖’表示按壓具被解除狀態之側視圖。 圖4係表不本發明之測量手段之測量具配置之側視圖。 圖5係作為本發明之研削手段所使用之研磨石之前視 圖。 圖 6 係圖 $ m * -r· 口)之研磨石之仰視圖。 圖7係作為本發明之研磨手段所使用之研磨刷之前視 圖。 圖8係圖7之研磨刷之仰視圖。 圖9係用線鋸將多晶矽錠切斷,形成矽塊(A)(B)(C)時 之立體圖。 37 201231219 圖10係多晶矽塊(A)(B)(C)之立體圖。 圖1 1係從俯視觀察用線鋸將單晶矽錠切斷狀態之說明 圖1 2係單晶矽塊之立體圆。 圖1 3係說明多晶矽塊與單晶矽塊之加工步驟之流程 【主要元件符號說明】 C 矽塊之角部 F 矽塊之平面部 W 矽塊 1 把持手段 2 測量手段 3 研削手段 4 研磨手段 5 移送手段 6 控制手段 11 基台 12 按壓具 13 夾軸 14 旋轉機構 15 基準塊冉 Two 8 inches with a side of 210mm ± 0.5mm A, depending on the situation, there is a tolerance of the left I, or the shape of the four-column 4 stone block (W) $ __ 13⁄4. . The straight angle of each corner (C) is 90±0. The angle of the angle is allowed to be outside the tolerance ^ ^ 卜 It rises y. In this case, according to the third invention, the fifth invention, the surface size and the cross-sectional shape of the section size + life are set within the tolerance. 10 201231219 There is a choice of coarse grain division of F90 to F220 and #24〇~#5 The precision grinding of 〇〇 区分 优点 区分 精密 精密 F F F F F F F F F F F F F F 精密 精密 精密 精密 精密 精密 精密 精密 精密 精密 精密 精密 精密 精密 精密 精密 精密 精密 精密 精密 精密 精密 精密 精密 精密 精密 240 240 240 In the grinding process of cracks and defects (polycrystalline block (w): corner (C), etc.), it is possible to prevent the occurrence of such chips and perform grinding. Further, when the abrasive grain portion (32) of the grinding device (3) is applied to the melt-solidified abrasive grains having two kinds of particle sizes, for example, a circular or ring-shaped inner ring (four) is provided on the ground surface of the abrasive grain portion, And a ring-shaped outer ring region disposed outside the inner ring region, or 'melting and solidifying the fine-grained abrasive grains in the inner ring region, refining and solidifying the coarse-grained abrasive grains in the outer ring region, and making the inner The loop area protrudes by more than the outer ring area, and the amount of protrusion can be formed as a fine abrasive cut amount. = As the abrasive grains of the polishing means (4), the particle size of #240 to #5〇〇 prescribed by JISR6〇〇丨:Η% is applied to the abrasive brush for rough grinding, and #800〜#12G( The particle size is suitable for the abrasive brush for fine polishing, and has two kinds of abrasive brushes. By virtue of the high grinding ability of the abrasive brush for rough grinding, there will be micro cracks in the surface layer of the moxibustion block (processed object). After the high efficiency is removed, the surface roughness of the surface layer portion which is coarsened by the rough polishing is finely ground by the fine grinding ability of the polishing brush for fine polishing, and the crack occurring in the subsequent step can be eliminated or Defect. The side-measuring method (2) is composed of a reference block (15), a measuring tool eight (1), and a measuring tool B (22); and a sea reference block (15) is formed on both sides and has The reference plane of the interval; in order to make the direction of the column axis of the reference block (1)) parallel to the direction of the axis of the workpiece to be reinforced, 201231219, in the direction of the clamping axis (13) of the holding means (1); A (21) (21), measuring the position of the reference datum of the reference block (15) in the horizontal direction from both sides orthogonal to the column axis direction of the object to be reinforced, and opposing the workpiece The position of the flat portion (F) or the position of the opposite corner portion, thereby measuring the outer shape of the workpiece; the measuring tool B (22), and measuring the upper side flat portion (7) or the upper side of the workpiece The height position of the corner portion (C) in the vertical direction (the sixth invention). According to the sixth aspect of the invention, for example, the case where the workpiece is a square column-shaped stone block (5) is described as an example, and the direction orthogonal to the column axis direction (the Y direction of FIGS. i and 4) is used by The measuring tool a (21) (21) measures the position of the reference surface of the reference block (15) of the holding means (1) and the position of the plane portion (7) or the corner portion (c) of the money (w) by measuring the money ( w) The actual size of the interval between the plane portion (7) or the corner portion (6) (the size of the figure and the direction of the figure): and the center position of the plane portion (F) relative to the plane can be measured. Further, by measuring the position of the B, the height position of the upper side plane portion (F) or the upper side corner portion (6) of the money (W) (the direction of the second direction of FIGS. 2 and 4) can be measured to thereby measure the vertical position. The center position of the stone block (5) in the direction (the direction of 2 in Fig. 2 and Fig. 4). The function of the measuring means (7) disclosed in the third invention is supplemented by the constituent elements disclosed in the measuring method (2) of the invention of the sixth invention. &lt;1&gt; The measurement of the cross-sectional dimension is measured by the measurement A(21)(7)), and the cross-sectional dimension of the plane portion (7) or the 2 corner portion of the stone block (5) is measured, and the result is stored in the control. Means (6), 12 201231219 &lt; 2〉^ When the holding means (1) holds the stone block (w), the center of the center position of the holding position is placed on the base of the holding means (1) The center position of the γ direction shown in Fig. 1 and Fig. 4 of the block (W). The center position is calculated based on the measured value of the measuring tool a(2 1) of the measuring means (2). Further, in order to match the center position of the calculated block (W) with the center of the gripping means (1), the pressing members (12) and (12) shown in Figs. 1 and 3 are moved back and forth to perform the block (W). ) Positioning. Further, the center position in the z direction shown in Figs. 2 and 4 is calculated based on the measured value of the measuring tool B (22) of the measuring means (2). Further, in order to make the calculated center position in the height direction of the block (W) coincide with the holding means (the center of the height direction of the cymbal, the base (11) moves up and down and is positioned. In this way, the έ 矽 block is The center position of both end faces of the column axis direction of W) coincides with the center position of the clamp shaft (13) (13) so that the grip can be performed. &lt;3&gt; The following processing is performed to store the position of the base point corresponding to the position where the cutting amount (3) and the cutting means (4) are "zero". First, the spacing dimension of the reference plane (15) relative to the reference plane is measured by the measuring tool A (21) (21) of the measuring means (7) shown in Figures i and 4 (the spacing dimension is known, in advance It is input to the control means (6)) and stored in the control means (6). Then, the front end of the grinding means (3) and the section (4) are respectively touched to the reference plane of the reference block (15), and the storage position is controlled by the <&gt; The actual size between the planar portion (7) or the two corner portions (c) of the sentence block (W) before the grinding/grinding of the means (6), the cutting means (3) and the grinding means (4) The position of the quantity becomes "zero": 13 201231219 The position is calculated and calculated, and the result is stored in the control means (6). Further, in the measuring means (2), there is a contact type which allows direct contact with the measurement site for measurement, and a non-contact type which emits laser light for measurement, but any of them may be used. Also, according to the input, it is revealed in the first! The initial setting of the control means (6) of the invention: the measurement signal of the item and the measuring means (2), and the control means (6) is used for the arithmetic processing, and the holding means (1)' measuring means is controlled by the action signal according to the calculation result ( 2), means for grinding (3), polishing means (4), and means for transferring (5). That is, as described in the supplementary description of the role of the above-mentioned measuring means (7) &lt; 1 &gt;&lt; 2 &gt; In each of the steps of &lt; 3 &gt;, the control means (6) performs the arithmetic processing 'and stores the result, and automatically sets the grinding according to the result of the (4) storage and the section size after the grinding/grinding of the control means (6). The cutting amount of the means (3) and the grinding means (4). When the type (polycrystal or early crystal) of the block (w) to be processed is polycrystalline, in order to be a processing step disclosed in the third invention described later, a means for holding and holding the block (w) by transfer is used. (1) The transfer means (5) operates, and when it is a single crystal, it is used as a processing step disclosed in the fourth invention described later, and the transfer means (1) for transferring and holding the block (w) is used. Hand (5) action. Further, in the case of the single crystal block (w), the processing of the corner portion (c) is also input as described in the description of "continuous rotation" of the rotating mechanism (14). X is set at the rotation speed of the control means (6) to continuously rotate the clamping shaft (13) holding the single crystal block (w). Further, the control means (6) includes: 201231219 The front end of the grinding means (3) and the front end of the polishing means (4) are respectively brought into contact with the reference faces on both sides of the reference block (15), and the grinding device (3) is at the front end. And a function of performing arithmetic processing on the base point of the front end of the grinding means (4) (the position of the cutting amount "zero"); by using the measuring tool A (21), measuring the reference surface on both sides of the reference block (15) and being processed The position of the two plane portions (F) or the two corner portions (c) on both sides of the object, the function of calculating the cross-sectional dimension of the workpiece; and placing the workpiece on the base of the holding means (1) ( 11), by pressing the 02) to position the two sides thereof, and by measuring the side position of the workpiece by the measuring tool eight (21) and the measuring tool B (22), the holding of the workpiece is performed. The function of the operation of the axial position of the clamping shaft (13) on both ends and the positioning of the column axis of the workpiece; and the initial setting item and the measuring means (2) input by starting the machining The output measurement signal is processed and processed, and the means for grinding/grinding the processing device is lost. The function of the action signal (the seventh invention). • The frequency of the arithmetic processing of the grinding method disclosed in the seventh invention of the invention and the base point (the position where the cutting amount is "zero") at the front end of the polishing means will be described. When the grinding method is used for grinding, the grinding method is terminated before the grinding means, and the reference surface on both sides of the reference block is subjected to the transfer processing of the position of the cutting amount "zero", and then the cutting amount is set, and the grinding and polishing means is performed only. When replacing the new abrasive brush, the front end of the polishing means is brought into contact with the reference surface on both sides of the reference block, and the operation of cutting into the position of "贲»零" is performed. Therefore, the setting of the amount of cutting of the polishing brush in the polishing process is calculated by the number of times of grinding by the grinding machine 15 201231219, and the cutting amount of the tip end of the brush material is adjusted to perform the grinding process. «Seventh Invention" Since the control means (6) is provided (4) to automate the functions of the grinding/grinding apparatus for the horn-shaped member of the present invention, the flat portion (f) and the corner portion (6) of the workpiece can be surely performed. Grinding and grinding, and labor saving. In addition, the profile of the workpiece is a quadrangular shape, and the cross-sectional dimension and the tolerance of the four-column column-shaped object to be ground/grinding can be set to 125 sides of the soil _5_ (referred to as: 5 servant - side 156_ The gemstone 5 (referred to as: 6-inch), - it 2H) nostalgia. 5mm (referred to as: 8 leaves) may also cross the two planar portions (7) of the four-corner workpiece. The straight angle of the corner portion (9) is set to be 1 degree ± 1 degree (the eighth invention). According to the eighth invention, the workpiece can be ground in the initial setting item of the input control means (6) before starting the machining. /The size of the section after the grinding process and its tolerances are carried out. The holding means (1) is provided with: a base (11), which can place the workpiece into its column axis. And moving up and down in the vertical direction; the pressing device (12) moves forward and backward across the base (1), and moves to the side perpendicular to the column axis of the workpiece, and presses both sides of the workpiece. Positioning the column axis of the workpiece on the center of the abutment (丨丨); clamping shaft (13) (13), the core Positioned in the same direction as the column axis of the workpiece, and placed on both ends of the column axis direction of the workpiece, so that the clamping shaft (13) is advanced to the base. (1)) Both ends of the workpiece to be processed at the center; and 16 201231219 Red-turn mechanism (14) 'The clamp shaft (13) (13) is intermittently rotated or continuously rotated about its axis (ninth invention). The clamping shaft. 3) (13) has a function of holding both ends of the workpiece in the direction of the column axis and measuring the dimension of the column axis direction of the workpiece so as to be stored in the control means (6). According to the dimensional measurement result of the column axis direction of the workpiece, the measurement, the grinding process, and the polishing process of the workpiece are transferred to the positions where the means for measuring (2), the grinding means (7), and the polishing means (4) are disposed. Further, the transfer shaft (13) (13) is connected to the rotating mechanism (14), and the workpiece is rotatably driven. The other side is the driven side clamp shaft. (14) "Intermittent rotation", which is to make the workpiece should be machined 'Becomes so that the grinding means (3) or the grinding means relative to the position ⑷' direction for performing alignment by rotation. That is, the processing order is determined in accordance with the type of the stone block (w) of the input control means (6) before the start of processing, and the motion signal is output to the rotating mechanism (10) in accordance with the processing sequence. Rotating mechanism (10): According to the motion signal, the clamper 3) is rotated, so that the two blocks or corners (C) of the grinding block (W) which are held by the lost shaft (10) should be subjected to grinding or grinding. It is placed at a position opposite to the grinding means (3) or the grinding means (4). Hereinafter, the case of processing the polycrystalline germanium block (w) will be described as an example. When the 邵 邵 ( (F) plus animal relative to the ' ~ 利 利 1 pair of plane parts (F) processing, the 矽 block (w) is rotated 9 degrees, processing the remaining 1 pair of plane parts (F) After that, after the processing of the two pairs of plane portions (F), that is, the four plane portions (7), the block (W) is rotated by 45 degrees, and the opposite direction is processed to the i-corner portion (〇. Next, the block (w) Rotating 90 degrees and performing the remaining i diagonal portion (4)) 17 201231219 Processing 'All the flat portions (F) and corners (C) are finished. The "continuous rotation" of the rotating mechanism (14), The corner (c) of the object to be processed (for example, a single crystal block (W)) having a shape of a circular surface is studied. In the case of force or grinding, the workpiece is continuously rotated while being processed on one side. The clamp shaft (13) holding the workpiece is continuously rotated in accordance with the rotational speed set by the input. According to the ninth aspect of the invention, the force month b of the measuring means (2) of the sixth invention is used to perform the positive and horizontal orientation with respect to the column axis direction of the workpiece placed on the base (11) (Fig. 1). After the centering of the vertical direction (the direction of FIG. 2 and the Z direction), the clamping axis (丨3) (1 3) can be surely held at the center position of the both end faces of the column axis of the workpiece. χWhen grinding or grinding the workpiece, the workpiece can be "intermittently rotated" or "continuously rotated" as described above. In the first aspect of the invention, the workpiece may be a square columnar block (first invention). Further, the grinding/grinding method of the polygonal columnar member of the polygonal columnar member of the polygonal columnar member is provided with a holding means (1) for holding a hard and brittle material having a polygonal column shape as a workpiece; Measuring means (2) 'Used to measure the cross-sectional dimension of the workpiece, the centering measurement of the position of the workpiece by the holding means (1), and the grinding means (3) and the grinding means (4) The cutting amount is taken as the measurement of the base point position of "zero"; the grinding means (3) 'the plane part (?) for grinding the workpiece and 18 201231219 corner part (c); the plane part of the workpiece ( F) and grinding means (4) for grinding the position of the cornered portion (C); and 'manufacturing slave (6)' according to the initial setting item input before starting the processing and the measuring means (2 The measured value 'measured processing' is used to output an operation signal to each means; and the multi-angle columnar member is used in the grinding/grinding apparatus. The grinding means (3) grinds the workpiece, and then grinds the workpiece by the polishing means (4) (u invention).曰 Again. In the invention of the first aspect of the invention, the cross-section of the workpiece is a quadrangular shape, and the particle size of the abrasive grains of the grinding stone used in the grinding device (3) is set to f9〇F2〇(JISR6001:1998)&amp;#24〇 ~#5〇〇(jisr6〇〇i: 1998); the particle size of the abrasive grains used for the polishing brush for rough grinding of the polishing means is set to #24〇~#500 (JISR6〇〇丨:丨998), The particle size of the abrasive grains used in the polishing brush for polishing the polishing means (4) is set to 〇〇 # # # # # # # # # # 116 116 116 116 116 116 116 116 116 # # # # # # # # # # # # # # # # # # # The section size and its tolerance are set to one side of 125 claws + 0.5 mm (referred to as: 5 吋), one side of 156 mm ± 〇 5 mm (referred to as: 6 吋), _ side of 21 〇 mm ± 0.5 mm (referred to as: 8 吋) In either case, the straight angle of the corner portion (c) where the two planar portions (F) of the four-corner workpiece are intersected is set as a tolerance of the cross-sectional shape to 90 degrees of soil 1 degree (12th) invention). 19 201231219 In the 3rd invention, or the i2nd invention, the cutting amount in the grinding means (7) is set to 20/zm to 700 &quot;m, and the surface roughness of the workpiece is measured in the grinding means (7). After grinding into A Ry2.〇~10." _ brain 06〇1:1994), the cutting amount in the polishing method (4) is set to 75 ρ or more. In the polishing means (4), one object is added. The surface roughness grinding process is Ryl. Um (JISB 〇 6 〇 1 : 丨 994) or less (the third invention). In the first invention, the shai processed object is a four-corner column-shaped stone 第 第 14th invention. Further, in the thirteenth invention, the workpiece is a polycrystalline block (5), and the flat portion (F) is ground and the corner portion (c) is ground. The flat portion (7) ▲ Processing step (15th invention) In the 15th invention of the invention, only the 4 plane portion (7) is subjected to the polishing process, and the corner portion (6)' is not polished and reinforced because the portion where the micro-I slit is formed is substantially flat. Part (F), in the corner (in the middle, there is a micro crack in the vicinity of the joint with the plane portion (7), so if the 4 plane portion (F) is used ".5 or more, the micro-cracks existing in the vicinity of the joint portion between the corner portion (C) and the flat portion (F) may be simultaneously removed. Further, in the U-th invention, the workpiece may be in accordance with the plane Processing step of the grinding process of the part (7), the grinding process of the corner part (6), the grinding process of the corner part (C), and the grinding process of the flat part (F), the processing step of the single stone block (w) (the 16th invention) In the invention of 1il16, the reason for performing the corner 1 σ before the polishing process of the plane portion (F) is that it is the same as the polycrystalline stone block (w) in the single crystal stone. In the case of the block (W), the microcrack can be removed in the corner portion (near the joint portion of the crucible and the flat portion (7): 20 201231219, and the micro crack can be removed as long as the flat portion (F) is polished. For example, if you are defended by 线 勿 勿 勿 勿 勿 勿 勿 勿 勿 勿 勿 勿 勿 ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί Called: 5 leaves), one side l56mm (called: 6 ° inch), - side 2 Η) face (called: 8 hours), its size is public The right angle piece/input ϋ A Λ β with a section of ±〇·5mm 圮4 μ „“ inch' and the plane part (F) intersecting each other is formed by X 罝The grinding function of the cross-sectional shape of 1 degree and (7) the removal of the micro-cracks of the surface layer of the stone block (W), so that the surface roughness is two functions of the fine grinding function, and (3) the block from the processing ( w) When the grinding/grinding apparatus of the present invention is carried out, the steps of finishing the grinding/grinding and unloading can be automated, so that the grinding/grinding can be surely performed, and labor saving can be achieved. In the cutting step of Shi Xi Qian in the manufacturing line of Shi Xi block (W), even if the cross-sectional dimension and the straight angle deviate from the specifications, the grinding stone is used as the grinding means when carrying the grinding I grinding device of the present invention. (3) By this, the cross-sectional dimension and the cross-sectional shape can be machined within tolerances. Further, an abrasive brush is used as the polishing means (4), whereby microcracks can be removed. As a result, in the next step, the wire saw is used to cut the block (w) into a thickness of several hundred μm, thereby forming a stone wafer, and the outer dimensions of the stone wafer can be processed within the tolerance. Moreover, it is possible to suppress cracks and defects which occur when the wafer is processed, and the incidence of defective products can be reduced. 21 201231219 Further, since the clamping shaft (丨3) (π) of the gripping means (1) of the gripping block (W) is provided with the "intermittent rotation" or "continuous rotation" of the lost shaft (13) (13) Since the rotating mechanism (14) is formed, a polycrystalline block (W) having a c-plane (flat chamfered surface) shape and a single-crystal block formed into an arc shape can be formed on the shape of the corner portion (c) of the block (W). (W) Both are ground/grinding. Therefore, the processing steps for both the polycrystalline block (w) and the single crystal block (W) can be automated. [Embodiment] The construction of the ridge/grinding apparatus of the polygonal columnar member of the present invention and the operation steps thereof will be described with reference to the processing of the rectangular columnar block. As shown in FIG. 1 , the grinding device/grinding device of the present invention has: a holding means (1) 'for holding a square column-shaped stone block (W); and measuring means (2) 'for The measurement of the cross-sectional dimension of the block (W), the measurement of the centering of the position of the holding block (W) by the gripping means (1), and the calculation of the cutting amount of the grinding means (3) and the grinding means (4) Measurement required for the base point position of "zero"; Grinding means (3) 'The flat part and the corner part (c) of the block (W) are ground and ground to a side of 125 mm (referred to as: 5吋) One of the cross-sectional dimensions of one side of 156 mm (referred to as: 6吋) and one side of 2丨0 mm (referred to as: 8吋); the polishing means (4) 'will end the plane portion of the stone block (%) of the grinding process (F) and the corner portion (C) are ground to remove micro cracks present on the surface layer thereof; the transfer means (5) are the flat portion (F) and the corner portion (C) of the block to be held by the holding means The measurement, grinding, and grinding are performed, and the holding means (1) for holding the block 22 201231219 (W) is transferred to the measuring device (2) and the grinding hand is disposed. The position of the segment (3) and the polishing means (4); and the control means (6)' perform an arithmetic processing based on the initial setting item input before the start of processing and the measurement signal of the measuring means (2), and output the means Action signal. Before starting the machining, the initial setting item is input to the control means (6), which includes the interval size (known) of the reference faces formed on both sides of the reference block (丨5), and the machining block (W) Type (polycrystalline or single crystal), the slab of the slab (W) / the cross-sectional dimension after grinding and its tolerance, and the rotating mechanism when processing the corner portion (c) of the single crystal slab (W) (14) Rotation speed, grinding means (3), and the size of the grinding means (4), the particle size of the abrasive grains, the rotation speed, and the enthalpy in the grinding/grinding process by the transfer means (5) w) Transfer speed. The transfer speed of the enthalpy block (W) input to the control means (6) must be set to a range where the grinding process or the grinding process mark is not left, and the plane portion of the polycrystalline block (W) is processed (F) ) when the corner portion (C) and the flat portion (F) of the single crystal block (W) are set to 1 〇 to 40 mm/sec, when the corner portion (C) of the single crystal block (W) is processed. Set to 1 〇mm/sec or less. In order to set an appropriate transfer speed, it is necessary to consider the setting conditions of the particle size, the cutting amount, and the rotation speed of the grinding/grinding abrasive. For example, if the particle size of the abrasive grain is coarse, the transfer speed must be set in the slow region of the range. If the particle size of the abrasive particles is thinner, the transfer speed must be set in a fast region of the range. The processing switch (W) provided at the start of the control means (6) is turned ON, and the processing block (W) is transported from the loading conveyor (V) through a not-shown shift 23 201231219 carrier device. The base station (u) i of the holding means (1) shown in 2. Then, from both sides of the Shishi block (W), the pressing shown in Figs. 1 and 2 advances in each of (1 2), and is positioned on the connecting clamp axis (13) and the grinding means disposed on both sides (3). ) and the center of the polishing means (4) (the center of the Y direction shown in Fig. 1). In this state, one of the 'clamp shafts (13) advances toward the X direction, i.e., the stone block (w) side, and the block (W) is held by the clamp shaft (13). The holding means (1) is transferred to the position where the grinding means (3) and the polishing means (4) are disposed by the transfer means (5), and the front end of the abrasive grain portion (32) of the grinding means (3) is brought into contact with the load. The reference surface ' on both sides of the reference block (15) of the holding means (1) is placed in contact with the front end of the brushing material (42) for rough grinding and fine polishing of the polishing means (4). Thereby, the amount of cutting of the abrasive grain portion (32) of the grinding means (3) and the rough grinding material for polishing means (4) and the brush material (42) for fine polishing is stored as a base point of "zero" in the control. Means (6&quot; The amount of cut-in refers to the surface (the surface to be processed) of the block (W) as "zero (base point)", the abrasive grain portion (32) of the grinding means (3), and the grinding means (4) The amount of movement of the tip end of the brush material (42) from the base point in the direction of the column axis, that is, the amount of cutting of the block (w) is determined by the amount of cutting of the grinding means (3) and the grinding means (4). The operation steps of the type of the block (W) in the case of polycrystalline or single crystal common will be described below. The operation steps for grinding/grinding the polycrystalline block (W) will be described. Next, the holding means (1) is transferred to the configuration. The position of the measuring means (2) is as shown in FIG. 4, and the pair of plane portions (F), one pair of plane portions (F), which are opposite to each other on both sides of the polycrystalline germanium block (W), are measured by the measuring tool A (21). The Y-direction position is stored in the control means (6)' for calculating the Y-square of the polycrystalline block (W) 24 201231219 The thickness is determined by automatically setting the grinding means (3) according to the thickness of the actual size and the previously set size of the input. The cutting means (3) is formed by the abrasive grain portion (10) formed on the circle 5 The grinding stone of the disk A (31) is formed. The sea holding means (1) is transferred to the position where the grinding means (3) is disposed by the transfer means (5), and the i # plane part (F) is ground by the grinding means (7) After the grinding process, after confirming that the section size is within the A difference of the inch by the measurement, the II is caused by the suspect mechanism (J 4), and the axis (1) of the holding means (1) is intermittently rotated by 90 degrees. This is the same as the processing of the flat portion of the i-plane. The remaining one pair of flat portions (F) is ground, and the four-flat (F) grinding process is completed. Then, the holding means (1) is again transferred to a position where the measuring means is disposed, and the rotating shaft (13) intermittently rotates the clamping shaft (13) by C degrees, whereby the polycrystalline silicon held by the clamping shaft (13) is held. The blocks (w) are opposed to each other with respect to the opposite corners (c) in the horizontal direction. In this state, by measuring the position of both sides of the diagonal portion (C) of the measuring piece A (2〇, the actual size of the interval of the i diagonal portion (c) is calculated 'and the cutting amount of the grinding means (3) is automatically The holding means (1) is transferred to the position where the grinding means (3) is disposed by the transfer means (5), and the i diagonal portion (c) is ground by the measuring tool A (2 1) It is true that the cross-sectional dimension is within the tolerance of the machining size. Then, the clamping mechanism (1) of the holding means (1) is intermittently rotated by 90 degrees by the rotating mechanism (14), and the diagonal portion (C) of the shai 1 The grinding process is the same, and the remaining 1 diagonal part is ground. The cross-sectional dimension of the polycrystalline block (W) is ground to the tolerance of the machined size. 25 201231219 ”. The polycrystalline block of the beam grinding process (w The polishing process is performed by the polishing means (4) according to the operation steps shown below. By the grinding process, the micro-cracks of the surface layer of the 4 plane portion (f) are removed and processed to make the surface size the processing size. Within the tolerances. The grinding means (4) uses the particle size of the abrasive particles. The polishing brush composed of the rough grinding processing mat j (42) and the fine polishing and processing bristle material (42). The bristle material (42) is shown in Fig. 7 and Fig. 8. Here, the grinding process is performed. Plane. Measurement method of the cross-sectional dimension of 卩(F) 'The setting method of the cutting amount of the grinding brush for rough grinding processing and fine grinding processing, the operation procedure of the grinding processing of the rough grinding processing and the fine grinding processing, and the grinding operation In the polishing process of the polycrystalline germanium block (W), as described above, the polishing process is completed only to the four plane portions (F), and the polishing process of the corner portion (c) is not performed. The polycrystalline block (w) subjected to the grinding and polishing process is returned to the original position by the transfer means (5)' together with the holding means (1), and the gripping state by the clamp shaft (13) and the pressing tool (12) is released. Then, the processed polycrystalline block (W) is transferred to the carry-out conveyor (port) shown in Fig. 并 by a transfer device (not shown) and carried out. The above-mentioned polycrystalline germanium block (W) The operation steps of the grinding/grinding process are explained. Next, a description will be given of the case of the single crystal germanium block (W). The grinding and working steps are performed. $ Right the starting of the control means (6) to start the processing switch (〇N), and the single crystal block for grinding/grinding is performed. (W) is set on the beauty of the holding means △ (11) 'The two sides of the holding device (1 2) are held by the pressing device, and the two sides are held by the missing shaft (13). The band-shaped volts of the corner of the block (W) is only 26 201231219. The arc-shaped part formed by the part of the stone-shield key is used. Therefore, when the corner portion (c) is ground, the single-crystal block must be made. Continuous rotation. Therefore, positioning (疋.) must be performed so that the axis of the clamping shaft (丨3) holding the single crystal stone block (w) coincides with the column axis of the stone block (w). The measuring means (2) is as shown in Fig. 4. The position of each side of the single crystal block can be measured by the measurement of the gamma direction A(2 i ) and the measuring tool B (22) in the z direction. . Moreover, according to the measurement result, the centering of the single crystal block (W) can be performed such that the axis of the clamping shaft (13) coincides with the column axis of the block (w), and the clamping shaft (13) holds the block ( w). Then, the holding means (1) is transferred to the position where the measuring means is disposed. 'With the measuring tool A(2 1)' as shown in FIG. 4, the two sides of the single crystal block (w) are operated opposite to each other.厚度 The thickness dimension of the plane portion (F) in the γ direction. After the cutting amount of the grinding means (3) is automatically set, the flat portion (f) is ground. Then, 'the holding means (1)' of the single crystal block (W) that is processed is used to measure the remaining portion to the plane portion (F), and the single crystal stone block (5) is provided with the measuring means (2) and The position of the grinding means (3) is moved back and forth, similar to the pair of plane parts (F), and the remaining pair of plane parts (F) are also ground, and the grinding of the 4 plane parts (F) is finished. . The above processing sequence is the same as that of the polycrystalline hard block (W). Then, the meta-grip means (1) is further transferred to the position where the measuring means (7) is disposed. By rotating the mechanism (14), the clamping shaft (13) is intermittently rotated by 45 degrees so that the single crystal blocks (W) are opposed to each other. The pair of corner portions (c) are disposed to face each other in the horizontal direction. Next, the angle is measured by the measuring tool A (21) (between the two sides of the cymbal, the distance between the diagonal portions (C) of the operation 1) 3⁄4 p , h size 'the cutting amount of the grinding means (3) 27 201231219 It is automatically set. After the gripping means (1) is transferred to the position where the grinding means (3) is disposed by the transfer means (5), the grip shaft (13) is continuously rotated by inputting the rotational speed of the set rotating mechanism in advance. Grinding of the corner portion (c) of the single crystal block (w). After the grinding process of the corner portion (C) is completed, the rotation speed of the rotating mechanism (14) is input in advance, and the clamping shaft (13) of the gripping means (?) is continuously rotated to sequentially perform the four corners. Part (c) rough grinding and fine grinding. After the grinding of the corner portion (c) is completed, the clamping shaft (13) is rotated by the rotating mechanism (14), and the single crystal block (W) subjected to the polishing process is opposed to the pair of plane portions. (F) Arranged to face in the horizontal direction and perform polishing processing. Then, by knowing that the rotating mechanism (14) rotates the clamping shaft (丨3) by 90 degrees, the remaining one pair of flat portions (F) are also subjected to grinding processing, and all the polishing steps are completed. The holding means (1) for placing the single crystal block (W) at the end of all the grinding/grinding processing is returned to the original position, and the gripping state of the clamping shaft (丨3) and the pressing tool (12) is released. On the base (Π) of (1), the single crystal block (w) is transferred to the carry-out conveyor (port) shown in Fig. 1 through a transfer device (not shown) and carried out. Then, the apparatus and method of the present invention can reduce the cracks and defects of the tantalum wafer by cutting the saw block (W) after the grinding/polishing process with a wire saw to form a tantalum wafer. An example of the incidence of defective products will be described. In addition, the stone block (W) used herein is a tetragonal column-shaped polycrystal 28 201231219 block (W) and a single crystal block (W), which are ground by the grinding means (3) of the present invention. After the planar portion (F) and the four corner portions (C) of the block (W) are ground, the cross-sectional size is ground into a tolerance, and then the surface layer of the single crystal block (W) is ground by the polishing means (4). Thereby the microcracks are removed. [Embodiment 1] In the first embodiment, the stone block (W) subjected to processing is cut out from one bismuth ingot as shown in Fig. 9 . When cutting from a bismuth ingot, using a new wire saw as a fixed abrasive grain method, a four-corner columnar polycrystalline stone block (W) composed of four plane portions (F) and four corner portions (C) of a right-angled shape is used. Cut into 5 rows x 5 rows = total 25 pieces. The block (W) used in the first embodiment is a block A cut out from the four corners of the bismuth ingot shown in Figs. 9 and 10, and the block A is formed in two flat portions. Protrusion. The contents of the initial setting items of the input control means (6) before starting the machining are shown in Tables 1 and 2. [Table 1] The actual size between the reference planes of the conditional reference block is set to 100 mm. The type of the block _ _ -. (Example 1) Polycrystalline (Example 2) Single crystal (worked object) Size after grinding/grinding ( Section X length) (Example 1) Port 156±0. 5mmx500fl· 0mm (Example 2) Port 125±0·5mmx300±l. 0mm Rotation speed at the corner of single crystal (reference cycle speed) 105min_1 (0 · 5~1. lm/sec) [Table 2] 29 201231219 Grinding means (grinding stone) Grinding means: rough grinding (abrasive brush) Grinding means: fine grinding (abrasive brush) Dimensions φ250mm φ210mm φ270mm Particle size of abrasive grains Example 1) F100 (Example 2) F180 #240 #800 Rotation speed 2700min'' 1300min_1 1300min'' (reference week speed) (30 to 40m/sec) (10~20m/sec) (10~20m/sec) The distance between the reference surface of the reference block (15) and the interval dimension (1 00 mm) within the initial setting item shown in Table 1 is measured in advance by the measuring instrument A (21) using the laser method, and the measurement result is stored in the control means. (6). Next, the polycrystalline block A is referred to as: 6 剖面 a side of 156 mm (length is 500 mm), as shown in FIG. 4, the cross section of the polycrystalline block A (W) is measured relative to each other using the measuring tool A (21). In the height direction of the plane portion, the three portions in the longitudinal direction of the X portion (the total of nine portions) and the nine portions of the remaining one pair of the flat portions are combined into eight portions. As a result, the cross-sectional side of the polycrystalline block A had a size of 156.9 to 157.6 mm (average: 157.1 mm), a surface roughness of Ry21 to 27 μm (average: 24 μm), and a length of 499.6 mm. The grinding means (3) is a cup-shaped grinding stone shown in Figs. 5 and 6, and the average cross-sectional dimension of the polycrystalline block A (W) subjected to the grinding/grinding process is relative to a side called 6 σ inch 1 56 mm , is + 1.1 mm. Therefore, it is necessary to grind one side = 0.55 mm by means of grinding (3). The particle size of the abrasive grains of the abrasive grain portion (32) forming the grinding means (3) was selected from Table 3 to select coarse abrasive grains, and diamond abrasive grains having a particle size equivalent to F100 (JISR6001: 1998) were selected. Further, the width of the abrasive grain portion (32) was set to 8 mm, the outer dimension was set to 0 250 mm, the amount of cut was set to 0.7 mm, and the rotational speed was set to 2700 min_1 (corresponding to the reference peripheral speed of the grinding process of 30 to 40 m/sec). The polycrystalline block A (W) is passed through the position where the grinding means (3) is disposed at a speed of 20 mm/sec, and 30 pairs of plane portions (F) are ground by 30 201231219, and the clamping shaft (13) is rotated by the rotating mechanism (14). ) The rotation of 90 degrees and the like is left, and the i-plane is ground in the same manner as described above, and the grinding of the * flat portion (F) is finished. [Table 3] Particle size of (grinding stone) abrasive grain <JISR6GQ1 : Just 8, 矽 block Surface roughness after grinding: Ry(ym) &lt;JISB0601 : F100 _5.0 ~10.0 4.0 ~6.0 ^Γ80~ #320 3.0~5 D #500 '2.ϋ ~4.0 After the grinding of the 4 plane part (F), the rotation mechanism (14) The grip shaft 〇 3) holding the polycrystalline block A (w) is rotated by 45 degrees so as to be disposed opposite to the grinding means (7) on both sides with respect to the pair of 2 corner portions (C) in the horizontal direction. In the corner portion (C), the particle size of the abrasive grains (3) and the transfer speed of the polycrystalline block A (W) are ground under the same conditions as when the flat portion (f) is ground, and then in the plane portion (F) and When the joint portion of the corner portion (c) is found to be a crack known as chipping, the grain size of the abrasive grains of the grinding method (3) is changed to the fine stone #500 (JISR6001: 1998). The transfer speed of MW) was changed to 3 mm/sec, and the result of the grinding was reduced, but the chamfered portion of the corner portion (c) was formed without causing the above-described fragmentation. Therefore, the grinding of the remaining one diagonal portion (c) also sets the particle size of the abrasive grains of the grinding means to #500, and the rotation mechanism 901' rotates the clamping shaft 901' in the same manner as described above, and ends. 4 Corner (6) grinding processing. As a result, the plane portions (F) are opposed to each other, and the total of the pair of plane portions (f) is μ 31 201231219. The interval between the portions is (5) to (10) planes (average 丨 56 2_) 2 pairs of planes. The grinding amount (= calculated by the measured value / 2) is 390~48〇μΐΏ (average: 43〇_, the surface roughness is Ry5~8μηι (average: 7_.; after 4 grinding (grinding) The former) is the result of the ', ' and micro-cracks, which exist at a depth of ~ from the surface. In order to confirm the cutting of the polycrystalline block A(w) into crystal The incidence of cracks, defects, etc. in the round equivalent is used as a reference. The result of cutting the polycrystalline stone block A(W) into a thickness of 2〇 using a wire saw, the incidence of crack defects, etc. is 3.8%. In the rough grinding step and the fine grinding step in the lower grinding method, the cup type abrasive brush of FIG. 7 and FIG. 8 is used, and the brush material (42) is used to bundle the mounting base with a metal tube to be freely disassembled. The method is mounted on the rotary disk B (41), and when it is worn, the replaceable fan-shaped brush is used. In the abrasive brush for coarse grinding, the abrasive particles fixed on the brush material (42) are melted. The particle size is the diamond abrasive grain of #240 (JISR6001: 1998) shown in Table 2. The inch is set to 021 〇mm, the cutting amount is set to 〇.5mm, and the grinding speed is set to UOOmin-1 from the reference cycle speed of the grinding process of 1〇~2〇m/sec. The polycrystalline block A (w) will be ground. The transfer speed is set to 2〇mm/sec for rough grinding. [Table 4] Grinding grain size of grinding stage (abrasive brush) &lt;JISR6001 : 1998&gt; 表面 Surface roughness after grinding: Ry(pm) &lt;JISB0601 : 1994&gt;#240 3.0 〜 5.0 #500 1.0 〜3.0 #800 0.5 〜1.0 #1000 0.3 〜0.5 32 201231219 As a result of the rough grinding process, the measuring plane portions (F) are opposed to each other in two pairs of plane portions ( F) The total size of the 18-part spacing is 156.0 to 1 56.4mm (average: 1 56_ 1 mm), the grinding amount is 75~78 μηι (average: 77μηι), and the surface roughness is Ry2.9~4.0 Μηι (average: 3.4 μηι). In the polishing brush for fine polishing, the particle size of the abrasive grains melt-fixed to the bristle material (42) was the diamond abrasive grains #800 shown in Table 4. The outer shape of the polishing brush was set to 0 270 mm, and the amount of cut was set to 0.8 mm. The rotation speed was set to 1 300 min_l from the reference peripheral speed of the polishing process of 10 to 20 m/sec, and the transfer means (5) was 20 mm/ In the second transfer speed, the polished polycrystalline block A (W) is passed between the polishing brushes for polishing, and the four flat portions (F) are polished to complete all the processing. As a result of the completion of the finish grinding process, the interval between the flat portions (F) facing each other and the total of the two flat portions (F) is 155.9 to 156.4 mm (average: 1 56.1 mm), and the grinding amount is 1 6~ 1 9μηι (average: 1 8μΓη), the surface roughness is Ry0.9~Ι.ίμηι (average: Ι.Ομηι). The results of the processing of the grinding process, the rough grinding process, and the finish grinding process of the polycrystalline block A (W) of the first embodiment described above are summarized in Table 5 below. [Table 5] After rough grinding processing after grinding, the cross-sectional dimensions of the finished section are 156.1 to 156.6 mm (average: 156.2 mm) 156.0 to 156.4 mm (average: 156.1 mm) 155.9 to 156.4 mm (average: 156.1 mm) 390 ~ 480μηι (Average: 43〇um) 75 ~ 78μηι (Average: 77um) 16 ~ 19μηι (Average: 18_) Surface roughness (half-faced animal Ο Ry5 ~ 8μιη (Average: 7_) Ry2.9 ~ 4.0μηα (Average: 3.4um) Ry0.9 ~Ι.ίμηι (Average: 1.0 mouth m) Also, using a wire saw, the grinding and grinding processes are all completed. 33 201231219 The spar block A (W) is cut and cut into Wafer, investigate the incidence of defective products due to cracks, defects, etc. of the wafer. As described above, the polycrystalline block A (w) after the grinding process is cut and cut into wafers. Although the incidence of defective products caused by cracks, defects, etc. is 3 to 4%, as shown in Table 5, the rough grinding process and the finish grinding process are performed, and the total amount of the polishing is 85 μm, and the Ry of the surface roughness is: 1 .Ομιτι 'This will reduce its incidence to 12%. Example 2 In the second embodiment, I (w) is a single crystal crucible (w) which is cut into a cylindrical single crystal crucible ingot by a crystal pulling method. The upper end portion is cut off, and the length (the direction perpendicular to the paper surface in FIG. n) is cut into a range of 299.0 to 301. 〇mm (referred to as: 3〇〇mm), as shown in FIG. X5 rows = a total of 25 pieces are vertically fixed to the fixed jig. Using the new wire saw of the fixed abrasive grain method used in this embodiment, the peripheral portion of the carcass of each of the 25 single crystal bismuth ingots At this time, one part of the outer circumference is processed into an arc-shaped four-corner portion (C) having a width of about 25 axes, and is cut into four flat portions (F)' which are substantially right angles as a single crystal 11 block (W). One of the 25 cut single crystal blocks was randomly selected and used as a sample for grinding 'grinding. The cross section of the outer shape was 125 mm on one side (referred to as: 5 吋)&gt; (length 3) 〇〇mm. The shape of the single crystal block (w) used in the second embodiment is a quadrangular columnar shape composed of four planar portions (F) and arcuate four corner portions (C), and In the same manner, the measurement of the cross-sectional dimensions of the cross-section was carried out in the same manner as in Example 1. That is, the result of measuring the interval between the two opposing flat portions (F) and the portion ι8, the interval of the flat portion (7) 34 201231219 was 125.4 to 126 mm (average: 126). Lmm), the length is 300.8, the surface roughness is Ry22~28_ (average: 25 (four). The specification of grinding/grinding is the same as that of the example i except that the particle size of the abrasive grains of the cup-shaped grinding stone used in the grinding means is changed to ρ ΐ 8 选择 selected from Table 3 (refer to 4 2). The reason why the particle size of the abrasive grains of the grinding means is changed 4 F180 is that the average cross-sectional dimension of the single crystal block (w) relative to the grinding/grinding process is called: 5 125 one side 125 mm' measured size is + 〇 .7_, one side = 〇 ^ entangled cutting amount, so the use of the fine-grained F180 (JISR6001: 1998) measured by | 3 used in the example i is used. In the grinding process, the single crystal block (W) prepared by the clamp shaft (13) is set to a state in which the pair of plane portions (F) are opposed to each other in the horizontal direction, so that the pass: the grinding means (3) In the same manner as the polycrystalline fragments (w) of this embodiment, the two pairs of plane portions (ρ) are ground. In accordance with the operating conditions of the rotating mechanism (14) shown in Table 1 of the pre-input setting, the _ plane is rotated at a speed of iQ5min| around the axis, and the 'rotating' side is at a low speed of 2 mm/sec. The single-crystal block (w) is passed between the grinding means (3) composed of - the pair of grinding stones, and the grinding of the two diagonal portions (C) is completed. , '° fruit plane portion (F) facing each other, the total of two pairs of flat portions (F), the spacing between the two parts is 124.9~125 8 faces (average: 125 4 -, the cutting amount of the 4 plane portion is 283~ 354μηι (average: Μ-), the surface roughness of the 4th plane portion (f) and the 4th corner portion (C) is Ry4~—(Average: The grinding process of the person is the same as above, while rotating by one side Mechanism (丨4) 35 201231219 The single crystal block (w) subjected to the grinding process is continuously rotated, and the single crystal stone block (W) is passed through the coarse grinding at a low speed of 2 mm/sec by the transfer means (5). The polishing process of the four corners (C) is completed between the polishing means (4) using the polishing brush and the polishing brush for fine polishing. Then, in the same manner as in the first embodiment, by the transfer means (5), At a transfer speed of 20 mm/sec, the polishing process of the two pairs of flat portions (F) of the single crystal block (W) is passed between the polishing means (4), and the polishing process of the two pairs of flat portions (F) is completed, and all the ends are completed. In this polishing process, as in the above, the flat portion (F) at the point where the rough grinding process is finished is measured, and the pair of plane portions are opposed to each other. The result of the total area of (F) is 1 24.8~1 25 · 6mm (average: 1 25.3 mm), the amount of polishing is 69~75μηι (average: 73μτη), and the surface roughness is Ry2.8~3· 8μηη (average: 3.3 μηι). Further, when the measurement is completed, the flat portion of the point where the flat portion is opposed to each other, and the interval between the two flat portions (F) is 18, and the result is 124.7 to 125.5 mm (average: 125.2 mm). The processing amount is 17 to 25 μΓη (average: 20 μηι), and the surface roughness is Ry 0.8 Ι.ΟμΓη (average: 0·9 μηΊ). The grinding of the single crystal block (W) of the second embodiment described above is completed. The outline dimensions and surface roughness of the processing, rough grinding, and finish grinding are summarized as shown in Table 6. [Table 6] Cross-sectional dimensions of the finished grinding after rough grinding after grinding 124.9 ~ 125.8mm (Average: 125.4mm) 124.8 ~ 125.6mm (Average: 125.3mm) 124.7 ~ 125.5mm (Average: 125.2mm) Cutting amount 283 ~ 354μηι (Average: 316_) 69 ~ 75μπι (Average: 73μηι) 17 ~ 25μιη (average: 20um) surface roughness (flat Ry4 ~ 6μπι (Average: 5um) Ry2.8 ~ 3.8μιη (Average: 3.3um) Ry0.8 ~ Ι.Ομιη (Average: 0.9_) 36 201231219 Again, with a wire saw, the grinding The single crystal block (w) which has been processed and polished is subjected to a cutting process to cut into a silicon wafer, and the result of the occurrence of defective products caused by cracks and defects of the germanium wafer is examined, and the result of the embodiment j is The polycrystalline germanium block (W) is the same, and the rough grinding process and the finish grinding process after the grinding process are set to a total of 135 μη 1 and the surface roughness is set to Ry average: 〇.9 μηι, whereby it can be generated. The rate is reduced to i 〇%. The present invention is directed to the invention relating to the grinding/grinding of the block, but is not limited to the block, and can be applied to all hard and brittle materials such as glass, stone, and ceramic. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a plan view of a grinding/grinding apparatus of the present invention. Fig. 2 is a front view showing the state in which the dam is placed on the base of the holding means of the present invention. Fig. 3 is a side view showing the state in which the stone block is placed on the base of the holding means of the present invention. Figure 4 is a side elevational view showing the configuration of the measuring instrument without the measuring means of the present invention. Fig. 5 is a front view of a grinding stone used as a grinding means of the present invention. Figure 6 is a bottom view of the grindstone of the $ m * -r· port). Fig. 7 is a front view of the abrasive brush used as the polishing means of the present invention. Figure 8 is a bottom plan view of the abrasive brush of Figure 7. Fig. 9 is a perspective view showing a state in which a polycrystalline tantalum ingot is cut by a wire saw to form a block (A) (B) (C). 37 201231219 Figure 10 is a perspective view of a polycrystalline block (A) (B) (C). Fig. 1 is a view showing a state in which a single crystal crucible is cut by a wire saw in a plan view. Fig. 1 is a three-dimensional circle of a single crystal crucible. Fig. 1 is a flow chart showing the processing steps of the polycrystalline germanium block and the single crystal germanium block. [Main component symbol description] C 矽 block corner portion F 矽 block flat portion W 矽 block 1 holding means 2 measuring means 3 grinding means 4 grinding means 5 Transfer means 6 Control means 11 Base 12 Presser 13 Clamping axis 14 Rotating mechanism 15 Reference block

21 測量具A21 measuring tool A

22 測量具B 31 旋轉盤A 38 201231219 32 研磨粒部22 Measuring tool B 31 Rotating disc A 38 201231219 32 Abrasive grain

33 旋轉軸A 41 旋轉盤B 4 2 刷毛材 43 旋轉轴B33 Rotary axis A 41 Rotating plate B 4 2 Brush material 43 Rotary axis B

Claims (1)

201231219 七申味專利範圍: 種夕角柱狀構件之研削/研磨加 於’具備: 4置’其特徵名 把持手段’用以把持被加工物 測量手段,用以進㈣姑, 角柱狀構件,· a堤仃s亥被加工物 用以進行該把持手段彳 °尺寸之測量、 位置之測量、及==物之位置之定心之中心 里及研削手段與研磨手段之切入 γ 置即基點位置之測量; 里為零」位 研削手段,將該被加工物之平面部及角— 工,使其剖面尺寸及剖面形狀成為公差内·。仃研削加 研磨手段’將該研削加工結束之被加工 角部進行研磨加工,用以除去 及 … 于牡y、具表層之微裂縫; 移送手段’為將被該把持手段把持之被加工物之平 部及角部進行測量、研削 '研磨 ,;肝把待該被加工物之扣 持手段移达至該測量手段、研削手段'研磨手段;以及 控制手段,依據開始加工前所輸入之初始設定項 該測量手段之測量訊號,進行運算處理,對該各手段輸出 動作訊號。 2.如申請專利範圍第1項之多角柱狀構件之研削/研磨 加工裝置,其中, 將該研削手段作為研磨石,該研磨石係由將研磨教炫 融固定所形成之研磨粒部表面與該被加工物之加工面接角蜀 進行旋轉之旋轉盤A、及對該旋轉盤A傳達旋轉驅動源之 旋轉之旋轉軸A構成; 40 201231219 將該研磨手段作為研磨刷,該研磨刷係由將研磨粒炫 融固定之刷毛材之毛端部與該被加工物之加工面接觸進行 旋轉之方式植設之旋轉盤B、及對該旋轉盤B傳達旋轉驅 動源之旋轉之旋轉軸B構成。 ^如申請專利範圍第2項之多角柱狀構件之研削/研磨 加工凌置’其巾’該研削手段之研磨石,將熔融固定於該 研磨粒部之研磨粒之粒度設定為1種或2種以上; 該研磨手段之研磨刷,將熔融固定於該刷毛材之研磨 粒之粒度設定為2種以上。 4. 如申請專利範圍第2項之多角柱狀構件之研削/研磨 加工裝置,其中,該研磨手段之研磨刷,將熔融固定於該 刷毛材之研磨粒之粒度設定為2種以上; 將該研磨粒之粒度粗之刷毛材植設於靠近旋轉盤B之 旋轉中心之内圈部,並且將該研磨粒之粒度細之刷毛材植 設於離旋轉盤B之旋轉中心較遠之外圈部。 5. 如申w專利範圍第3或4項之多角柱狀構件之研削/ 研磨加工裝置,其中,將該研削手段作為研磨石;該研磨 石由研磨粒之粒度為F90〜F22〇(JISR6〇〇1 : 1998)及#24〇〜 #500(JISR6001 : 1998)構成; &quot;亥研磨手段具備:由研磨粒之粒度為#24〇〜 #500(JISR6001 ·· 1998)構成之粗研磨用之研磨刷、及研磨粒 之粒度為#800〜#1200(JISR6001 : 1998)構成之精研磨用之 研磨刷。 6.如申請專利範圍第5項之多角柱狀構件之研削/研磨 41 201231219 加工製置,其中 S具B構成; 。玄測量手段係由基準塊、測量具A、及測 門隔基準面,其係形成於兩側,具有已知 轴方μ 塊之柱軸方向與進行加卫之被加工物之扫 軸方向平行,在把持手段之夾軸卜方設置成一體型; 測量具Α’係從與該被加工物之柱轴方向正交之兩側方 。在水平方向測量該基準塊之對向基準面之位置、及被加 Γ物之平面部位置或相對向之角部位置,藉此測量被加工 物之外形尺寸; 、量&quot;Β係' 測量遠被加卫物之上面側平面部或上面側 角部之垂直方向之高度位置。 申明專利範圍帛6項之多角柱狀構件之研削/研磨 加工裝置’其中,該控制手段具備: 使研削手段之前端及研磨手段之前端分別接觸該基準 塊兩側之基準面’將該研削手段之前端及研磨手段之前端 土 (切入里零」之位置)進行運算處理之功能; 錯由該測量具Α’測量該基準塊兩側之基準面與被加工 物兩側之2平面部&lt; 2角部位置,將被加工物之剖面尺寸 進行運算處理之功能; 將泫被加工物載置於把持手段之基台,藉由按壓具將 八兩側疋位之狀態,藉由該測量具Α及測量具Β,同時測 曰^被加工物之側面位置,進行使把持被加工物之兩端面 之該夾軸之軸心位置與該被加工物之柱軸一致之定心之運 算處理之功能;以及 42 201231219 藉由開始加工前輸入之該初始設定項目與該測量手段 輸出之測里汛號進行運算處理,並對該研削/研磨加工裝置 之各手段輸出動作訊號之功能。 8 ·如申凊專利範圍第7項之多角柱狀構件之研削/研磨 加工裝置,其中,該被加工物之剖面係四角形, 將進行該研削/研磨加工之四角柱狀之被加工物之剖面 尺寸與其公差設定為一邊l25mm±0.5mm(稱為:5吋)、一邊 156mm±〇.5mm(稱為:6 吋)、一邊 21〇mm±〇.5mm(稱為:8 吋)中之任一種, 將°亥四角柱狀之被加工物之2平面部彼此交叉之角部 之直角度作為剖面形狀之公差,設定於9〇度±〇」度。 9.如申請專利範圍第8項之多角柱狀構件之研削/研磨 加工裝置,其中,該把持手段具備: 基台,能將被加工物載置成其柱軸成水平而在垂直方 向上下移動; . 按壓具’在隔著該基台之兩側進退移動於與該被加工 物之柱轴正交之方向’將被加工物之兩側按壓,使被加工 物之枉轴定位於該基台中心; 爽軸’將軸怒配置於與該被加工物之柱軸相同之方 向,配置於該被加工物之柱軸方向兩端側,使該失轴一方 前進’用以把持定位於該基台中心之被加工物之兩端面. 以及 ’ 中心進行間歇旋轉或 旋轉機構,使該夾軸以其軸芯為 連續旋轉。 43 201231219 加工f置V:利範圍第1項之多角柱狀構件之研削/研磨 裝置,其中,該被加工物係四角柱狀之石夕塊。 11 ·種多角柱狀構件之研削/研磨加工方法,於具備. 把持手段,用以把持被加工物即多角柱狀構件; 測量手段’用以進行該被加工物之剖面尺寸之測量、 :把持手段把持被加工物之位置之定心之測量、及以研削 手段與研磨手段之a人量當作「零」之基點位置之測量; 研削手段,用以研削加工該被加工物之平面部及角部; 研磨手段,用以研磨加工該被加工物之平面部及角部; 移送手段,用以將被該把持手段把持之被加工物移送 至配置有該測量手段、研削手段、研磨手段之位置;以及 控制手段,依據開始加工前所輸入之初始設定項目及 泫測量手段所測量之測量值,進行運算處理對該各手段 輸出動作訊號;之多角柱狀構件之研肖,丨/研磨加工裝置中, 藉由該研削手段將該被加工物進行研削加工後,藉由 該研磨手段進行該被加工物之研磨加工。 1 2.如申請專利範圍第n項之多角柱狀構件之研削/研 磨加工方法,其中,該被加工物之剖面係四角形, 該研削手段所使用之研磨石之研磨粒之粒度設定為 F90〜F220(JISR6001: 1998)及 #240〜#500(JISR6001: 1998); 該研磨手段之粗研磨用之研磨刷所使用之研磨粒之粒 度設定為#240〜#500(JISR6001 : 1998) ’該研磨手段之精研 磨用之研磨刷所使用之研磨粒之粒度設定為#800〜 #1200(JISR6001 : 1998),進行研削/研磨加工之四角柱狀之 44 201231219 被加工物之剖面尺寸與其公差設定為一邊125mm + 0.51^(稱為:5吋)、一邊1561^±〇5〇1111(稱為:6吋)、—'· 邊210mm±0.5mm(稱為:8吋)中之任一種, 將該四角柱狀之被加工物之2平面部彼此交又之角部 之直角度作為剖面形狀之公差,設定為9〇度±〇·丨度。 13.如申請專利範圍第u或12項之多角柱狀構件之研 削/研磨加工方法,其中,該研削手段中之切削量設定為 am〜700 &quot;m,在研削手段中,將被加工物之表面粗度研削 加工成為Ry2.0〜1〇_〇&quot; m(JISB〇6〇1 : 1994)後,該研磨手段 中之切削量設定為75 // m以上,在研磨手段中,將被加工 物之表面粗度研磨加工成為Ryl丨以m(JiSB0601 : 1994)以 下。 14·如申請專利範圍第u項之多角柱狀構件之研削/研 磨加工方法,其中,該被加工物係四角柱狀之矽塊。 …15.如申請專利範圍第13項之多角柱狀構件之研削/研 磨加工方法,其中,該被加工物係多晶矽塊,依照平面部 之研削加工、角部之研削加工、平面部之研磨加工之順序, 進行該多晶矽塊之加工步驟。 〜1 6.如申明專利範圍第13項之多角柱狀構件之研削/研 磨加工方法,其中,該被加工物係單晶矽塊,依照平面部 之研削加工、角部之研削加工、角部之研磨加工、平面部 之研磨加以順序,進行該單日日日料之加工步驟。 45201231219 Seven patent scope: The grinding/grinding of the column-shaped column members is provided with '4: 'The feature name holding means' is used to hold the measuring method of the workpiece, and is used to enter (4) the corner column member. a dike 仃 被 被 用以 用以 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该Measurement; The zero-point grinding method is used to make the plane and angle of the workpiece into a tolerance.仃 grinding and grinding means 'grinding the processed corner portion to finish the grinding process for removing and smearing the micro cracks in the surface layer; the transfer means 'is the workpiece to be held by the holding means The flat portion and the corner portion are measured and grounded, and the liver is used to transfer the holding means of the workpiece to the measuring means, the grinding means "grinding means", and the control means, according to the initial setting input before starting the processing. The measurement signal of the measuring means is subjected to arithmetic processing, and an operation signal is output to each means. 2. The grinding/grinding apparatus of the polygonal columnar member according to claim 1, wherein the grinding means is a grinding stone which is formed by polishing the surface of the abrasive grain formed by the polishing and polishing The rotating disk A that rotates the machined surface of the workpiece and rotates, and the rotating shaft A that transmits the rotation of the rotating drive source to the rotating disk A; 40 201231219 The polishing means is used as a polishing brush, and the polishing brush is The rotating disk B, in which the hair end portion of the abrasive grain and the fixed brush material is rotated in contact with the processing surface of the workpiece, and the rotating shaft B that transmits the rotation of the rotary driving source to the rotating disk B are configured. ^ Grinding/grinding of the polygonal columnar member of the second paragraph of the patent application section 2, the grinding stone of the grinding means, the particle size of the abrasive grains melt-fixed to the abrasive grain portion is set to 1 or 2 In the polishing brush of the polishing method, the particle size of the abrasive grains melted and fixed to the bristle material is set to two or more. 4. The grinding/grinding apparatus of the polygonal columnar member according to the second aspect of the invention, wherein the polishing brush of the polishing means sets the particle size of the abrasive grains melted and fixed to the bristle material to two or more types; The coarse-grained brush material of the abrasive grain is implanted in the inner ring portion near the rotation center of the rotary disk B, and the fine-grained brush material of the abrasive grain is implanted at a distance from the rotation center of the rotary disk B. . 5. The grinding/grinding apparatus for a polygonal columnar member according to the third or fourth aspect of the invention, wherein the grinding means is used as a grinding stone; and the grinding stone has a particle size of F90 to F22 (JISR6〇) 〇1: 1998) and #24〇~#500(JISR6001: 1998); &quot;Hai grinding means: used for coarse grinding by the particle size of abrasive grains #24〇~#500(JISR6001 ·· 1998) The abrasive brush and the abrasive grain have a particle size of #800 to #1200 (JISR6001: 1998). 6. Grinding/grinding of a polygonal columnar member according to item 5 of the patent application scope of claim 5 201231219 Processing, wherein S is composed of B; The metaphysical measurement method is composed of a reference block, a measuring tool A, and a measuring door partitioning plane, which are formed on both sides, and the column axis direction of the known axis square block is parallel to the sweeping direction of the workpiece to be processed. The clamping means of the gripping means are integrally formed; the measuring means is formed on both sides orthogonal to the direction of the column axis of the workpiece. Measuring the position of the reference datum of the reference block in the horizontal direction, and the position of the flat portion of the object to be twisted or the position of the opposite corner portion, thereby measuring the outer shape of the workpiece; and the quantity &quot;Β" measurement The height position in the vertical direction of the upper side plane portion or the upper side corner portion of the upper object. A grinding/grinding apparatus for a polygonal columnar member of the patent scope of the sixth aspect, wherein the control means includes: a front surface of the grinding means and a front end of the polishing means respectively contacting a reference surface on both sides of the reference block - the grinding means The front end and the front end of the grinding means (the position of zero in the cut-in) are subjected to arithmetic processing; the measurement is carried out by measuring the reference plane on both sides of the reference block and the two plane portions on both sides of the workpiece &lt; 2 corner position, the function of calculating the cross-sectional dimension of the workpiece; the workpiece to be placed on the base of the holding means, and the state of the eight sides being clamped by the pressing device, by the measuring tool Α 测量 测量 测量 测量 Β 测量 测量 测量 测量 测量 测量 测量 测量 测量 测量 测量 测量 测量 测量 测量 测量 测量 测量 测量 测量 被 被 被 被 被 被 被 被 被 被 被 被 被 被 被 被 被 被 被 被 被 被 被 被 被 被Function; and 42 201231219, the initial setting item input before starting the processing and the measurement nickname output by the measuring means are processed, and each of the grinding/grinding processing devices is Segment output signals of motor function. 8. The grinding/grinding apparatus for a polygonal columnar member according to the seventh aspect of the invention, wherein the workpiece has a quadrangular cross section, and the section of the quadrangular workpiece to be subjected to the grinding/grinding process is performed. The size and tolerance are set to one side of l25mm±0.5mm (referred to as: 5吋), one side of 156mm±〇.5mm (referred to as: 6 吋), and one side of 21〇mm±〇.5mm (referred to as: 8 吋) In one case, the straight angle of the corner portion at which the planar portions of the workpieces of the rectangular column-shaped workpiece are intersected is set to a tolerance of 9 degrees ± 〇. 9. The grinding/grinding apparatus of the polygonal columnar member according to the eighth aspect of the invention, wherein the holding means comprises: a base, capable of placing the workpiece so that the column axis is horizontal and moving up and down in the vertical direction The pressing device 'moves in a direction orthogonal to the column axis of the workpiece through the both sides of the base, and presses both sides of the workpiece to position the yoke of the workpiece on the base The center of the table; the axis of the shaft is disposed in the same direction as the column axis of the workpiece, and is disposed on both end sides of the column axis direction of the workpiece, and advances the lost axis to be used for holding and positioning Both ends of the workpiece in the center of the abutment and the center are intermittently rotated or rotated to continuously rotate the axis with its axis. 43 201231219 Machining f: V: The grinding/grinding apparatus of the polygonal columnar member of the first item, wherein the workpiece is a square column-shaped stone block. 11 · A grinding/grinding method for a multi-corner column member, which is provided with a gripping means for gripping a workpiece, that is, a polygonal columnar member; and a measuring means for measuring a cross-sectional dimension of the workpiece: The method of measuring the centering of the position of the workpiece and measuring the position of the base of the grinding means and the grinding means as "zero"; the grinding means for grinding and processing the flat portion of the workpiece and a polishing means for polishing a flat portion and a corner portion of the workpiece; and a transfer means for transferring the workpiece held by the holding means to the measuring means, the grinding means, and the grinding means Position and control means, according to the initial setting items input before starting the processing and the measured values measured by the measuring means, performing arithmetic processing to output the action signals to the respective means; the multi-angle columnar member is studied, 丨/grinding In the apparatus, the workpiece is subjected to grinding processing by the grinding means, and then the workpiece is polished by the polishing means. 1 2. The grinding/grinding method of the polygonal columnar member according to the nth aspect of the patent application, wherein the workpiece has a quadrangular cross section, and the granularity of the abrasive grains of the grinding stone used in the grinding method is set to F90~ F220 (JISR6001: 1998) and #240 to #500 (JISR6001: 1998); The particle size of the abrasive grains used in the polishing brush for rough grinding is set to #240 to #500 (JISR6001: 1998) 'The grinding The particle size of the abrasive grains used in the polishing brush for the fine polishing method is set to #800 to #1200 (JISR6001: 1998), and the square shape of the grinding/grinding processing is performed. 44 201231219 The cross-sectional dimension of the workpiece and its tolerance are set to One side of 125mm + 0.51^ (referred to as: 5吋), one side of 1561^±〇5〇1111 (referred to as: 6吋), —'· side 210mm±0.5mm (referred to as: 8吋), The straight angle of the corner portion where the planar portions of the two-corner workpiece are intersected with each other is set to a tolerance of 9 degrees ± 〇 · 丨. 13. The grinding/grinding method of a polygonal columnar member according to claim u or 12, wherein the cutting amount in the grinding means is set to am~700 &quot;m, in the grinding means, the workpiece is to be processed After the surface roughness grinding process is Ry2.0~1〇_〇&quot; m (JISB〇6〇1: 1994), the cutting amount in the polishing means is set to 75 // m or more, and in the polishing means, The surface roughness of the workpiece is ground to a ratio of Ryl丨 to m (JiSB0601: 1994) or less. 14. The grinding/grinding method of a polygonal columnar member according to the scope of claim U, wherein the workpiece is a square columnar block. The method of grinding/grinding a polygonal columnar member according to claim 13, wherein the workpiece is a polycrystalline block, and is subjected to grinding processing at a flat portion, grinding at a corner portion, and grinding at a flat portion. In the order, the processing steps of the polycrystalline block are performed. 〜1 6. The grinding/grinding method of the polygonal columnar member according to the thirteenth aspect of the patent scope, wherein the workpiece is a single crystal block, according to a grinding process of a flat portion, a grinding process of a corner portion, and a corner portion. The polishing process and the polishing of the flat portion are sequentially performed, and the processing steps of the one-day daily material are performed. 45
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