TW201227822A - Method for manufacturing nano-structure patterned substrate - Google Patents

Abstract

The present invention mainly provides a method for manufacturing a nano-structure patterned substrate, which includes the following steps: first growing an aluminum film directly on a substrate, then using an anodic oxidation method to process the aluminum film to an anodic oxidized aluminum layer with nanometer hole structures, further utilizing the anodic oxidized aluminum layer as an etching mask to transfer the pattern onto the substrate by the method of etching, finally removing the anodic oxidized aluminum layer from the substrate to form the nano-structure patterned substrate, such that a method for quickly manufacturing the nano-structure on larger area of any substrate at lower cost is provided.

Description

201227822 VI. Description of the Invention: [Technical Field of the Invention] The present invention relates to a method of manufacturing a nanostructure pattern substrate. In particular, the present invention discloses a method of fabricating a nanostructure pattern on any substrate to obtain a large area, low cost, rapid and processable nanostructure pattern on any substrate. τ''' [Prior Art] In the field of semiconductors and optoelectronic components, high conversion efficiency and high afterglow. Efficiency has always been the goal of components such as solar cells, light-emitting diodes and photodetectors. What is common is the need for a suitable substrate growth component. At present, the substrate for fabricating the nano structure pattern mainly utilizes a conventional yellow light developing process, which is mainly based on the Ray 丨 criterion (Ray 丨 dgh criterion) 'the minimum width that the optical system can distinguish, and is proportional to the wavelength of the light, and In contrast to the numerical aperture (NA), in order to obtain a smaller nanostructure, it is necessary to use a light source with a shorter wavelength to fabricate a substrate having a nanostructure pattern, but the disadvantages are increased cost and improved process difficulty. . Alternatively, an electron beam enthalpy method can be used to fabricate a substrate having a nanostructure pattern, which has the disadvantage of being inexpensive to fabricate and equipment. In summary, the conventional nanostructured substrate has a wide variety of manufacturing methods and is not identical in design and fabrication, and therefore the expected effects are not the same. How to obtain a large-area, low-cost, fast manufacturing method for fabricating nano-structure patterns on any substrate is an important technical problem that needs to be solved urgently by semiconductor optoelectronics. 201227822 SUMMARY OF THE INVENTION The present invention provides a nanostructure method which can produce a nanostructure. w By the following steps, the specific embodiment 'the manufacturing method of the nano structure, the first hundred, the bribe amount _ into the green plating, hot fine riding chemical city, etc. = plating, machine semiconductor, metal, ceramics _ 'This substrate can be stone money, glass, stainless steel, pe, PVa, etc.). Recording dish hole knot = Yang == = out - with nanopore number (electrolyte concentration, electrolyte, 7 = by. The surface of the surface emulsification method of the parameters of the parameters _ straight _ ^ degrees ~ Yu _, In the case of anodization, the step-by-step, anodizing, sulfuric acid, hydrochloric acid, etc.) are introduced into the barrier layer, and the barrier layer can be removed by the bottom of the hole. After that, the dry-type oxidized _ is used as a fresh, surface. (8) Wang transferred the pattern of the material to the substrate. The gas: the second return - the cost of the anode on the substrate. The block speed and the manufacturer of the nanostructure pattern on any substrate. 201227822 Method. The advantages and spirit of the present invention will be further understood from the following detailed description and the accompanying drawings. [Embodiment] Please - see Figure -, Figure 2, Figure 3, Figure 4, Figure 5 and Figure 6. As shown in the figure, the method for manufacturing the base plate 6 having the nano structure pattern includes the following steps: First, step S10 is performed to place the P substrate i' with an area of 2x2 cm2. The reaction chamber of the electron beam vaporization system grows an aluminum film 2. Step-by-step 'Execute step SU, put the test piece into a special mold made of Teflon'. The mold uses a copper plate as the substrate to contact the back surface of the electrode and pull the copper wire out of the f-anode end' Designed to allow the substrate! Only the exposed film 2 is exposed to the electrolyte. After that, the substrate is placed in a beaker filled with electrolyte, and the electrolyte is an oxalic acid (Post 2〇4) solution, and the _ power is supplied to the substrate and the liquid is biased between the liquid and the liquid. The electrolyte end uses a graphite rod as the cathode; the substrate lf faces the pole, and (4) the first anodizing treatment, and the treatment time is 2 to 1 minute. This step has been made on the Lai 2 to produce the anodized Lai 3 system. The barrier layer composed of the anodic oxide layer 3 is blocked by the brittle hole _ part, and the barrier layer will block the positive anodic oxidation (10), and the hole will continue to expand. Therefore, the nucleus layer is removed, and then the first person is anodized. . The first anodizing treatment step conditions and the first-man anodizing treatment. After the second anodizing treatment, the substrate 1 , 1 turns 2 (10) flag has a straight surface of about 50 nm of yang reduction. After 201227822, it has a negative anodic oxidation _, and its pore barrier layer is completely returned to the ^ ^ ^ 阳 ^ this _ then (four) Wei reward step will cover the mask. "Let the % polar oxide film 3 have a through-hole structure

Jll S12 j 1 engraved f, the shirt will be mixed with the ion "the bottle should be (four), carry out the eclipse... 2 疋 use gas for the printing / 〇 2, _ time is about 3 to 5 minutes. Anode oxygen like = step S13 'to the second The substrate 1 is placed in a scaly acid solution to remove oxidation _ 'Domain type electric etch to remove the surface of the anode emulsified film 3 on the surface of the recording board 1 to form a stone etch substrate having a surface diameter of about %, as shown in Fig. 6. The above-described embodiments are merely illustrative of the features of the present invention and are not intended to limit the scope of the technical scope of the present invention. Any person skilled in the art can do without departing from the spirit of the present invention. Under the fan dance, there are many decorations and changes to ^=^. Therefore, the scope of protection of the invention should be listed in the patent application scope described later by the woman. [Simple description of the diagram] The figure-based is based on this Figure 2 is a block diagram of a second portion of a specific embodiment in accordance with the present invention. Figure 4 is a block diagram of a second portion of a specific embodiment in accordance with the present invention. The block diagram of the third part of the example. 201227822 Figure 5 is based on this The fourth embodiment of a block diagram of one particular embodiment Ming. Figure VI of the present invention, according to one embodiment of the electron microscope of FIG nano structure patterned substrate specific embodiments.

[Main component symbol description] S10~S13 Flow step 4 Nanostructure 1 Substrate 5 #刻材料 2 Aluminium film 6 Nano structure pattern substrate 3 Anodic aluminum oxide film

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Claims (1)

201227822 VII. Patent application scope: 1. A method for manufacturing a nanostructure pattern substrate, the steps comprising: () using a substrate on which a long film is grown; (2) using a polar oxidation method, The film is made into an anodized surface having a nanoporous structure and the diameter and depth of the pore can be adjusted by extinguishing the anodizing method; ), /, there is a non-porous pore / the same & The cover is etched to transfer the pattern of the mask to a surface of the substrate; and (4) the anodized material is removed to form a substrate having a nano-pattern. L. The method for manufacturing a nanostructure pattern substrate as described in the scope of the patent scope includes, after the anodization process, the hole (4) generates an anodized film and forms an early layer of concealer, and a rice must be utilized. The material is removed for removal. 1 The method for producing a nanostructure pattern substrate as described in the scope of the patent application, wherein the parameters of the anodizing method are the Wei liquid concentration, the electrolyte/Jm degree, the extreme oxidation bias, and the anodization time. The method for manufacturing a substrate of the nanostructures according to the first aspect of the invention, wherein the substrate can be a substrate such as a semiconductor, a metal, a ceramic or a polymer. The method for manufacturing a nanostructure pattern substrate, wherein the semiconductor, metal or ceramic substrate can be a material such as germanium, gallium arsenide, sapphire, tantalum carbide, glass, stainless steel, PE, PVA or the like. 6. The method of manufacturing a nanostructure pattern substrate according to claim 1, wherein the method for growing a film and the method for chemically immersing the method. The rider bundle continuation, the lining, the hot steaming ore 7·Γ The nanostructure described in the first item of the range _ substrate manufacturing method The two octapole oxidation method is one or more times. The method for producing a nanostructure pattern substrate according to Item 2, wherein the I insect engraving material is phosphoric acid, hydrochloric acid or sulfuric acid. 9^ The manufacturer of the nanostructure pattern substrate described in the first application of the patent scope 1 = the mask pattern transfer used _ technology can be a dry type of engraving or a sample of the patent of the first item of the patent range The method for manufacturing a structural pattern substrate, wherein the shifting of the oxidized nano fresh turn can be a dry or wet residual engraving