201215462 六、發明說明： 【發明所屬之技術領域】 本發明係提供一種可分離氣水，並有效降低排水管内之壓 力，以防止其他設備之水液氣逆流，而提升使用便利性之氣水分 離裝置。 ' 【先前技術】 在現今，半導體晶圓、鏡片、玻璃、印刷電路板、面板戋醫 療，器等元件，於製作過程或使用一段時間後，元件之表面均會 附著有雜質、污垢等，進而影響元件之潔淨度及品質，為避免爹 響元件之製作良率及品質，業者係以清洗機於元件表面噴灑清= 流體（如水液或氣水等），用以清洗附著於元件表面之雜質，再將 使用過之清洗流體以排水管排出至集水設備。 、 、 月參閱第1圖，係為一種晶圓清洗機1 Q，其係於機台1 1 上設有一清洗槽12，該清洗槽12之底面係連通排水管i 3， 用以排出清洗流體，一裝配於清洗槽i 2下方之旋轉裝置i 4， 係連結驅動一旋轉台15旋轉，該旋轉台i 5則可承載待清洗之 i圓认if旋轉台15之上方設有噴管1 6，用以噴職水或水 液，於執仃清洗晶圓17作業時，可將待清洗之晶圓i 7置放於 旋轉台15上’該旋轉裝置14即帶動旋轉台15及待清洗之晶 圓土 7旋轉作動’此時，噴管i 6即對待清洗之晶H丄7表面喷 灑氣水，以清洗附著於晶圓1 γ表面之雜質，再利用旋轉a 1 5 旋，之離心力將晶圓！7表面之氣水向外甩出，而被甩出二水液 及乱體均流入至排水管i 3内，該排水管i 3則連通一集水設備 2 ? ί輪入管2 0 1，使排水管1 3可經由輸入管2 〇 1、將水液 及亂體人，集水設備2 Q ;惟，該清洗機i ◦僅於清洗槽丄2 之底面。又有單一排水管1 3 ,並無其他排放設計，導致排放之水 液及氣體必須由排水管丄3排出，使得排水管丄3且有較大壓 ί ’由於排水管1 3係連通集水設備2 0之輸入管2’0 ；l，輸入 =2 Ο 1又連通其他設備之財f，若清洗機丨Q之排水管工3 壓力大於其他設備之排水管的壓力情況τ，即會使其他設備之排⑸ 3 201215462 水管内的水液氣逆流，進而影響其他設備之潔淨度及排水順暢 性’工作人員亦必須費時清理逆流之污水，造成使用不便之缺失。 故’如何設計一種易於分離氣水，並有效防止其他設備之水 液氣逆流，而提升使用便利性之元件清洗機的氣水分離裝置，即 為業者研發之標的。 【發明内容】 本發明之目的一，係提供一種元件清洗機之氣水分離裝置， 該清洗機係設有具排放口之清洗槽’並於排放口處配設有氣水分 離裝置，該氣水分離裝置係設有具流道之本體，該本體係開設有 相通於清洗槽排放口之流入口，供清洗槽排出之水液及氣體流入 _ 於本體内，而本體於近底部處則設有排水口，該排水口並連通排 水管，用以排出水液，又於本體内設有至少一可導引氣體流動及 分離氣水之導流板，另於本體之後端設有排氣口，該排氣口之位 置係高於排水口之位置’且排氣口之口徑係不小於排水口之口 控’用以導引排出大量氣體；藉此，可利用位置較高且具適當口 控之排氣口導引大量氣體釋壓排出，而減少排水口之氣體流量， 以有效降低排水管内之壓力，而可防止連通於排水管之其他設備 的水液氣逆流，達到提升使用便利性及易於氣水分離之實用效益。 本發明之目的二，係提供一種元件清洗機之氣水分離裝置， 該本體可利用位置較高且具適當口徑之排氣口導引大量氣體釋壓 w 排出，以減少排水口之氣體流量，而降低排水管内之壓力，可防 止其他設備之排水管的水液氣逆流而污染作業空間，使得其他設 備之水液氣可順利排放，達到提升其他設備潔淨度之實用效益。 本發明之目的二，係提供一種元件清洗機之氣水分離裝置， 該本體係設有排水口及排氣口 ’用以分別導引水液及氣體排出， 以減少排水口之氣體流入，而降低排水管内之壓力，可防止其他 設備之排水管的水液氣逆流而污染作業空間，進而避免工作人員 耗時費力清理設備，達到提升作業便利性之實用效益。 【實施方式】 為使貴審查委員對本發明作更進一步之瞭解，兹舉一較佳 4 201215462 實施例並配合圖式，詳述如后： 清參閱第2、3、4、5圖，該清洗機可應用於清洗半導體 晶圓、鏡片、玻璃、印刷電路板、面板或醫療儀器等元件，本發 明之氣水分離裝置可裝配於不同領域之清洗機，於本實施例中， 該清洗機係配置有清洗槽3 〇、旋轉裝置4 0、旋轉台5 〇、風 扇6 0及喷灑吹乾裝置7 〇，該清洗槽3 0之内部係固設有導流 盤31及排水盤3 2，並開設有排放口 3 3，於本實施例中，係 於清洗槽3 0之侧面近底部開設有排放口 3 3，用以排出水液及 氣體，該旋轉裝置4 0係用以驅動一可承載待清洗元件之旋轉台 5 0旋轉，並帶動一位於旋轉台5 〇下方之風扇β 〇同步旋轉， φ 該喷濃吹乾裝置7 〇則可喷灑清洗流體（如水液、氣體或水氣 等）’用以清洗元件，另於清洗槽3 〇之外部配設有本發明之氣水 分離裝置8 0，該氣水分離裴置8 0係設有一具流道之本體8 1，該本體81係設有相通於清洗槽3 0排放口 3 3之流入口 8 11，於本實施例中，係於本體81之前端開設有一相通於清洗 槽3 0排放口 3 3之流入口 811，可供清洗槽3 〇排出之水液 及氣體流入於本體81内，又本體81於近底部處開設有排水口 812，用以排出水液，於本實施例中，該本體81係於底板上 開设有排水口812 ’並設有向下傾斜之導斜面813，用以導 引水液向下流入於排水口 812中，而排水口 812則裝配有排 • 水管8 2，用以將水液排放至集水設備（圖未示出），於本實施例 中，該排水管8 2係具有一呈υ型之彎管段8 21，用以阻絕其 他設備排放之異味逆流至清洗槽3 〇，又該本體81内設有至少 一導流板8 3 ’於本實施例中’係於本體81内部之頂、底面分 別固設有呈適當角度傾斜之導流板8 3，並使各導流板8 3間形 成一導引氣體流動之路徑，用以導流氣體及分離氣水，另於本體 81上設有排氣口 814，於本實施例中，該本體81係於後端 開設有排氣口 814，其中，該排氣口 81位置係高於排水 口 812之位置’且排氣口 814之口徑係不小於排水口 812 之口徑，用以導引大量氣體釋壓排出，又排氣口 8丄4可將氣體 m 201215462 面設有具通孔8丄6之固定板8、，集氣設備，該本體81之外侧 應本體81之通孔8 i 6位置王3，並T清洗槽3◦側面相對 可將本體8 1固設於清洗;^ 螺孔3 4，供栓具螺合，而 811對位於、^2 ΐ 之外部，並使本體81之流入口 水，氣體流二“8 3，以供清洗槽3 0排放之201215462 VI. Description of the Invention: [Technical Field] The present invention provides a gas-water separation that can separate gas and water and effectively reduce the pressure in the drain pipe to prevent backflow of water and liquid gas from other equipment, thereby improving convenience of use. Device. [Prior Art] In today's semiconductor wafers, lenses, glass, printed circuit boards, panels, medical devices, etc., after the manufacturing process or after a period of use, the surface of the components will be attached with impurities, dirt, etc. In order to avoid the cleanliness and quality of the components, in order to avoid the production yield and quality of the components, the cleaner sprays the fluid on the surface of the component (such as water or gas) to clean the impurities attached to the surface of the component. Then, the used cleaning fluid is discharged to the water collecting device by a drain pipe. Referring to FIG. 1 , a wafer cleaning machine 1 Q is provided on the machine table 1 1 and is provided with a cleaning tank 12 . The bottom surface of the cleaning tank 12 is connected to the drain pipe i 3 for discharging the cleaning fluid. a rotating device i 4 mounted under the cleaning tank i 2 is connected to drive a rotating table 15 to rotate, and the rotating table i 5 can carry the nozzle to be cleaned. For spraying water or water, when the wafer 17 is cleaned, the wafer i 7 to be cleaned can be placed on the rotating table 15 'the rotating device 14 drives the rotating table 15 and the liquid to be cleaned The wafer soil 7 is rotated. At this time, the nozzle i 6 is sprayed with gas water on the surface of the crystal H丄7 to be cleaned to clean the impurities adhering to the γ surface of the wafer 1, and then rotated by a rotation of a 1 5 . Will wafer! 7 The surface water is pumped out, and the distillate and the chaotic body flow into the drain pipe i 3 , and the drain pipe i 3 is connected to a water collecting device 2 ί wheel into the pipe 2 0 1, The drain pipe 13 can pass through the inlet pipe 2, the water liquid and the disordered person, and the water collecting device 2 Q; however, the washing machine i ◦ is only on the bottom surface of the washing tank 2 . There is also a single drain pipe 13 and there is no other discharge design, so that the discharged water and gas must be discharged from the drain pipe ,3, so that the drain pipe 丄3 has a larger pressure. The input pipe 2'0 of the device 20; l, input = 2 Ο 1 and the other equipment f, if the pressure of the drain pipe 3 of the washing machine 大于Q is greater than the pressure of the drain pipe of other equipment, it will make Rows of other equipment (5) 3 201215462 The reverse flow of water and liquid in the water pipes, which in turn affects the cleanliness and drainage of other equipments. The staff must also clean up the counter-current sewage, which causes the inconvenience of use. Therefore, how to design a gas-water separation device that is easy to separate gas and water, and effectively prevent the reverse flow of water and liquid from other equipment, and improve the convenience of use, is the standard developed by the industry. SUMMARY OF THE INVENTION One object of the present invention is to provide a gas-water separation device for a component cleaning machine, which is provided with a cleaning tank having a discharge port and is provided with a gas-water separation device at the discharge port. The water separating device is provided with a body having a flow channel. The system is provided with an inflow port communicating with the discharge port of the cleaning tank, and the water liquid and gas discharged from the cleaning tank flow into the body, and the body is disposed near the bottom. There is a drain port, and the drain port is connected to the drain pipe for discharging the water liquid, and at least one deflector for guiding the gas flow and separating the gas water is disposed in the body, and the exhaust port is provided at the rear end of the body. The position of the exhaust port is higher than the position of the drain port and the diameter of the exhaust port is not less than the mouth of the drain port to guide the discharge of a large amount of gas; thereby, the available position is high and the mouth is suitable The controlled exhaust port guides a large amount of gas release pressure discharge, and reduces the gas flow rate of the drain port, so as to effectively reduce the pressure in the drain pipe, and prevent the backflow of the water and liquid gas of other equipment connected to the drain pipe, thereby improving the convenience of use. and Practical benefits of separating the gas in the water. A second object of the present invention is to provide a gas-water separation device for a component cleaning machine, which can guide a large amount of gas release pressure w to be exhausted by using an exhaust port having a relatively high position and a proper diameter to reduce the gas flow rate of the drainage port. Reducing the pressure in the drain pipe can prevent the water and liquid gas of the drains of other equipment from colliding with the working space, so that the water and liquid gas of other equipment can be smoothly discharged, thereby achieving the practical benefit of improving the cleanliness of other equipment. A second object of the present invention is to provide a gas-water separation device for a component cleaning machine, wherein the system is provided with a drain port and an exhaust port for respectively guiding the discharge of water and gas to reduce the gas inflow of the drain port, and Reducing the pressure in the drain pipe can prevent the water and liquid gas of the drain pipe of other equipment from flowing back to pollute the working space, thereby avoiding the laborious and laborious cleaning of the equipment by the staff, and achieving the practical benefit of improving the convenience of the operation. [Embodiment] In order to make the reviewer further understand the present invention, a preferred embodiment of the present invention will be described in detail with reference to the following drawings: FIG. 2, FIG. 3, FIG. The machine can be applied to cleaning semiconductor wafers, lenses, glass, printed circuit boards, panels or medical instruments, etc. The gas-water separation device of the present invention can be assembled in different fields of cleaning machines. In this embodiment, the cleaning machine is The cleaning tank 3 〇, the rotating device 40, the rotating table 5 〇, the fan 60 and the spray drying device 7 are disposed, and the inside of the cleaning tank 30 is fixed with a deflector 31 and a drain pan 32, And the discharge port 3 3 is opened, in the embodiment, a discharge port 33 is arranged near the bottom of the cleaning tank 30 for discharging water and gas, and the rotating device 40 is used for driving The rotating table 50 carrying the component to be cleaned rotates, and drives a fan β 〇 under the rotating table 5 〇 to rotate synchronously, φ the blow drying device 7 喷洒 can spray the cleaning fluid (such as water, gas or moisture) Etc. 'to clean the components, and to clean the tank 3 The gas-water separation device 80 of the present invention is disposed outside the body, and the gas-water separation device 80 is provided with a body 8 1 for a flow channel, and the body 81 is provided with a discharge port 3 3 corresponding to the cleaning tank 30. In the embodiment, the inlet port 811 of the discharge port 3 is opened at the front end of the body 81, and the water and gas discharged from the cleaning tank 3 are flowed into the body. In the 81, the body 81 is provided with a drain 812 at the bottom to discharge the water. In the embodiment, the body 81 is provided with a drain 812 ′ on the bottom plate and is provided with a downward slanting guide. a slope 813 for guiding the water to flow downward into the drain port 812, and the drain port 812 is equipped with a drain pipe 8 2 for discharging the water to the water collecting device (not shown). In the embodiment, the drain pipe 82 has a curved section 8 21 of a meandering type for blocking the odor of other equipment from flowing back to the cleaning tank 3, and at least one deflector 8 is disposed in the body 81. 3 'in the present embodiment, the top and bottom surfaces of the main body 81 are respectively fixed at an appropriate angle. The flow plate 8 3 is formed with a path for guiding the gas to flow between the baffles 83 for guiding the gas and separating the gas, and the exhaust port 814 is disposed on the body 81, in this embodiment. The body 81 is provided with an exhaust port 814 at a rear end thereof, wherein the position of the exhaust port 81 is higher than the position of the drain port 812 and the diameter of the exhaust port 814 is not less than the diameter of the drain port 812. A large amount of gas is released and discharged, and the exhaust port 8丄4 can be provided with a fixing plate 8 having a through hole 8丄6 on the surface of the gas m 201215462, and a gas collecting device, and the outer side of the body 81 should be a through hole of the body 81 8 i 6 position king 3, and T cleaning tank 3 ◦ side can be opposite to the body 8 1 can be fixed to the cleaning; ^ screw hole 3 4, for the bolt to screw, and 811 pairs, ^ 2 ΐ outside, and The inlet water of the body 81, the gas flow two "8 3, for the discharge tank 30 discharge
9 〇，於本實施例中，該清洗機係應用於清洗晶圓 ^4^^日，圓，作業時’可將待清洗之日日日圓9〇置放 洗之曰'圓t f 〇ΐ由旋轉裝置4 0帶動旋轉台5 0、待清 0對J、生6。同步旋轉，接著可控制噴吹乾裝置7 9 o表面上之水液，以清洗附著於晶圓 離心質微拉或合物等，並使晶圓9 0利用旋轉之 噴流向外甩出，此時，可侧風扇6 Q於旋轉台5 入流動之導引氣流，導引晶圓9 ◦旋轉甩出之 引氣流流動路徑，經導流盤3 1及排水盤3 2而流動至 3 0之排放口 3 3 ’由於排放口 3 3係相通於氣水分離裝 at本體8 1的流入口8 1 1，進而可使清洗槽3 〇排放之 及乳體以大於正常壓力的方式經由排放口 3 3及流入口81 1 於氣水分離裝置8 0之本體8 1内部。 f參閱第6、7圖，當混流之水液及氣體以大於正常壓力的 方式流入於本體81後，該部份較大顆粒之水液因重量較重，而 可順沿本體81之導斜面813導引流入於排水口812中，再 巧水管8 2排放至集水設備，並可利用排水管8 2呈ϋ型之 彎管段8 21，阻絕其他設備之異味逆流至清洗槽3 〇，再者， 由於排氣口814之位置係高於排水口812之位置，且排氣口 814之口徑係不小於排水口812之口徑，而具有較大之排放 面積，可導引本體81内之大量氣體朝排氣口814的方向流 ^ ’而部份仍混流於氣體中之水液再受到導流板8 3的阻隔，而 才里擊附著於導流板8 3，使得氣體與水液分離，於水液凝結成較 [S] 6 2012154629 〇 In the present embodiment, the cleaning machine is applied to the cleaning wafer ^ 4 ^ ^ day, round, during the operation, 'the day of the day to be cleaned 9 〇 放 曰 ' round tf 〇ΐ The rotating device 40 drives the rotating table 50, and the pair is cleared to J and the raw 6. Synchronous rotation, and then the water on the surface of the spray drying device can be controlled to clean the galvanic micro-drawing or the like attached to the wafer, and the wafer 90 is ejected by the rotating jet. At the same time, the side fan 6 Q enters the flow guiding airflow on the rotating table 5, and guides the flow path of the illuminating flow that the wafer 9 ◦ rotates out, and flows to the 30 through the deflector 31 and the drain pan 32. The discharge port 3 3 ′ is connected to the inflow port 8 1 1 of the gas-water separation device at the body 8 1 , and the discharge port 3 〇 can be discharged and the milk body can be discharged through the discharge port 3 in a manner greater than normal pressure. 3 and the inlet port 81 1 are inside the body 8 1 of the gas-water separation device 80. f Referring to Figures 6 and 7, when the mixed liquid and gas flow into the body 81 in a manner greater than the normal pressure, the water of the larger particle is heavier than the weight, and can follow the inclined surface of the body 81. The 813 is guided into the water outlet 812, and then the water pipe 8 2 is discharged to the water collecting device, and the drain pipe 8 2 is used to form the curved pipe segment 8 21 of the ϋ type, and the odor of other devices is prevented from flowing back to the cleaning tank 3 〇. Moreover, since the position of the exhaust port 814 is higher than the position of the drain port 812, and the diameter of the exhaust port 814 is not smaller than the diameter of the drain port 812, and has a larger discharge area, the body 81 can be guided. A large amount of gas flows in the direction of the exhaust port 814, and a portion of the water still mixed in the gas is again blocked by the deflector 83, and is attached to the deflector 83 to make the gas and the liquid Separation, condensation in water to [S] 6 201215462
大顆粒後，即滴落流入於導斜面只彳q ^i + 中，接著使氣體由排氣口 排水口812 氣設備，進而使氣體及水液分別由 5 放至其他集 8 i 2排出，而減少排水σ ^ ^^口 8 i4及排水口 ^業ΐΐ;:ί作人貝亦毋須詩處理污水，進而提升排水其ΐϋί發”裴置不僅可分離氣水，並有效降低排 性，實為二二、他設備之水液氣逆流’而提升使用便利 刊物八^ η及進步性之設計，然未見有相同之產品及【圖付购申請要件，表依法提出申請。After the large particles, the dripping falls into the guiding inclined surface only ^q ^i + , and then the gas is discharged from the exhaust port 812 gas device, and then the gas and the liquid liquid are discharged from the other set 8 i 2 respectively. And reduce the drainage σ ^ ^ ^ mouth 8 i4 and the drainage port ^ industry ΐΐ;: 作 作 人 毋 毋 毋 毋 处理 处理 处理 处理 处理 处理 处理 处理 处理 处理 处理 处理 处理 处理 处理 处理 处理 处理 处理 处理 处理 处理 处理 处理 处理 处理 处理 处理 处理 处理 处理 处理 处理 处理For the second and second, the water and gas counterflow of his equipment, and the use of the convenience of the publication of the eight η and progressive design, but did not see the same product and [Figure purchase requirements, the form is submitted according to law.
第1圖 第2圖 第3圖 第4圖 第5圖 第6圖 第7圖 習式晶，清洗機及集水設備之配置圖。 本發明氣水分離裝置與元件清洗機之零件分賴。 ，發明，水分離1置與元件清洗機之級裝外觀圖。 f發明氣水分離裴置與元件清洗機之組裝剖視圖。 本發明氣水分離裝置之示意圖。 本發明氣水分離裝置之使用示細（-）。 本發明氣水分離裝置之使用示賴（二）。 【主要元件符號說明】 〔習式〕 晶圓清洗機1〇 清洗槽：12 旋轉裝置：14 喷管：1 6 集水設備：2 0 〔本發明〕 機台：1 1 排水管：13 旋轉台：15 晶圓：1 7 輸入管：2 01 清洗槽：3 0 排水盤：3 2 導流盤：31 排放口 ： 3 3 7 201215462 螺孔：3 4 旋轉裝置：4 0 旋轉台：5 0 風扇：6 0 喷灑吹乾裝置：7 0 氣水分離裝置：8 0 流入口：811 導斜面·· 8 1 3 固定板：815 排水管：8 2 鲁 導流板.8 3 晶圓· 9 0 本體：8 1 排水口：812 排氣口：814 通孔：816 彎管段：8 21Figure 1 Figure 2 Figure 3 Figure 4 Figure 5 Figure 6 Figure 7 Configuration diagram of the crystal, washing machine and water collecting equipment. The gas-water separation device of the present invention is separated from the components of the component cleaning machine. , invention, water separation 1 and the appearance of the component cleaning machine. fInventive sectional view of the gas-water separation device and the component cleaning machine. A schematic diagram of the gas-water separation device of the present invention. The use of the gas-water separation device of the present invention is shown in detail (-). The use of the gas-water separation device of the present invention is shown in (b). [Main component symbol description] [Literature] Wafer cleaning machine 1〇 Cleaning tank: 12 Rotating device: 14 Nozzle: 1 6 Water collecting equipment: 2 0 [Invention] Machine: 1 1 Drain: 13 Rotary table :15 Wafer: 1 7 Input tube: 2 01 Cleaning tank: 3 0 Drainage tray: 3 2 Guide disc: 31 Discharge port: 3 3 7 201215462 Screw hole: 3 4 Rotating device: 4 0 Rotating table: 5 0 Fan :6 0 Spray drying device: 7 0 Gas water separation device: 8 0 Inlet: 811 Leading bevel · · 8 1 3 Fixing plate: 815 Drain: 8 2 Lu deflector. 8 3 Wafer · 9 0 Body: 8 1 Drain: 812 Exhaust: 814 Through Hole: 816 Bend Section: 8 21