TW201129792A - Ingot inspection apparatus and method for inspection an ingot - Google Patents

Ingot inspection apparatus and method for inspection an ingot

Info

Publication number
TW201129792A
TW201129792A TW100105000A TW100105000A TW201129792A TW 201129792 A TW201129792 A TW 201129792A TW 100105000 A TW100105000 A TW 100105000A TW 100105000 A TW100105000 A TW 100105000A TW 201129792 A TW201129792 A TW 201129792A
Authority
TW
Taiwan
Prior art keywords
ingot
illuminator
inspection
inspection apparatus
camera
Prior art date
Application number
TW100105000A
Other languages
English (en)
Inventor
Jeong-Soo Yoo
Young-Il Ko
Chang-Keun Koo
Sang-Soo Noh
Original Assignee
Hanmi Semiconductor Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hanmi Semiconductor Co Ltd filed Critical Hanmi Semiconductor Co Ltd
Publication of TW201129792A publication Critical patent/TW201129792A/zh

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/1717—Systems in which incident light is modified in accordance with the properties of the material investigated with a modulation of one or more physical properties of the sample during the optical investigation, e.g. electro-reflectance
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N5/00—Details of television systems
    • H04N5/30—Transforming light or analogous information into electric information
    • H04N5/33—Transforming infrared radiation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N2021/1765—Method using an image detector and processing of image signal
    • G01N2021/177—Detector of the video camera type
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G01N2021/8812—Diffuse illumination, e.g. "sky"

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Immunology (AREA)
  • Biochemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
TW100105000A 2010-02-17 2011-02-16 Ingot inspection apparatus and method for inspection an ingot TW201129792A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR20100014315 2010-02-17
KR1020100037291A KR101519476B1 (ko) 2010-02-17 2010-04-22 잉곳 검사 장치 및 방법

Publications (1)

Publication Number Publication Date
TW201129792A true TW201129792A (en) 2011-09-01

Family

ID=44930996

Family Applications (1)

Application Number Title Priority Date Filing Date
TW100105000A TW201129792A (en) 2010-02-17 2011-02-16 Ingot inspection apparatus and method for inspection an ingot

Country Status (2)

Country Link
KR (1) KR101519476B1 (zh)
TW (1) TW201129792A (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10324044B2 (en) 2014-12-05 2019-06-18 Kla-Tencor Corporation Apparatus, method and computer program product for defect detection in work pieces

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101273942B1 (ko) * 2011-10-18 2013-06-12 비아이신소재 주식회사 잉곳 검사 지그
KR101241840B1 (ko) * 2012-11-15 2013-03-11 뉴마테크 주식회사 사파이어 잉곳의 ｒ면 측정장치
US9754365B2 (en) 2014-02-21 2017-09-05 Applied Materials, Inc. Wafer inspection method and software
JP6797481B2 (ja) * 2017-03-01 2020-12-09 株式会社ディスコ 半導体インゴットの検査方法、検査装置及びレーザー加工装置
CN115931908B (zh) * 2022-12-28 2024-05-07 杭州中为光电技术有限公司 一种硅棒缺陷自动检测系统及检测方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10324044B2 (en) 2014-12-05 2019-06-18 Kla-Tencor Corporation Apparatus, method and computer program product for defect detection in work pieces
US10935503B2 (en) 2014-12-05 2021-03-02 Kla Corporation Apparatus, method and computer program product for defect detection in work pieces
US11105839B2 (en) 2014-12-05 2021-08-31 Kla Corporation Apparatus, method and computer program product for defect detection in work pieces
US11726126B2 (en) 2014-12-05 2023-08-15 Kla Corporation Apparatus, method and computer program product for defect detection in work pieces
US11892493B2 (en) 2014-12-05 2024-02-06 Kla Corporation Apparatus, method and computer program product for defect detection in work pieces

Also Published As

Publication number Publication date
KR20110095091A (ko) 2011-08-24
KR101519476B1 (ko) 2015-05-14

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