TW201122412A - Coating apparatus and method for real-time monitoring thickness change of coating film - Google Patents

Coating apparatus and method for real-time monitoring thickness change of coating film Download PDF

Info

Publication number
TW201122412A
TW201122412A TW98144207A TW98144207A TW201122412A TW 201122412 A TW201122412 A TW 201122412A TW 98144207 A TW98144207 A TW 98144207A TW 98144207 A TW98144207 A TW 98144207A TW 201122412 A TW201122412 A TW 201122412A
Authority
TW
Taiwan
Prior art keywords
optical fiber
light
fiber sensor
method
coating
Prior art date
Application number
TW98144207A
Inventor
Yu-Chia Tsao
Chung-Pei Lee
Ko-Shao Chen
Jia-Huey Tsao
Chun-Chih Lin
Ren-Kun Liang
Original Assignee
Forward Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Forward Electronics Co Ltd filed Critical Forward Electronics Co Ltd
Priority to TW98144207A priority Critical patent/TW201122412A/en
Publication of TW201122412A publication Critical patent/TW201122412A/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55Specular reflectivity
    • G01N21/552Attenuated total reflection
    • G01N21/553Attenuated total reflection and using surface plasmons

Abstract

A method for real-time monitoring thickness change of a coating film is disclosed. In the method, a coating module having a chamber and a film thickness monitoring module containing an SPR optical fiber sensor, a light source, a light-receiving detector, and optical fibers are first provided. The optical fibers are used to connect the SPR optical fiber sensor with the light source and the light-receiving detector. The SPR optical fiber sensor has a sensing area and is arranged in the chamber. The light source provides the SPR optical fiber sensor with light. Then, a substrate is put into the chamber. While coating process is performed on the substrate, a film also formed on the sensing area of the SPR optical fiber sensor. the light-receiving detector receives signals output from the sensing area of the SPR optical fiber sensor and then outputs signals of light intensity change.
TW98144207A 2009-12-22 2009-12-22 Coating apparatus and method for real-time monitoring thickness change of coating film TW201122412A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW98144207A TW201122412A (en) 2009-12-22 2009-12-22 Coating apparatus and method for real-time monitoring thickness change of coating film

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
TW98144207A TW201122412A (en) 2009-12-22 2009-12-22 Coating apparatus and method for real-time monitoring thickness change of coating film
US12/662,546 US8377503B2 (en) 2009-12-22 2010-04-22 Method for real-time monitoring thickness chance of coating film
US13/552,933 US20120279447A1 (en) 2009-12-22 2012-07-19 Coating apparatus and method for real-timely monitoring thickness change of coating film

Publications (1)

Publication Number Publication Date
TW201122412A true TW201122412A (en) 2011-07-01

Family

ID=44151490

Family Applications (1)

Application Number Title Priority Date Filing Date
TW98144207A TW201122412A (en) 2009-12-22 2009-12-22 Coating apparatus and method for real-time monitoring thickness change of coating film

Country Status (2)

Country Link
US (2) US8377503B2 (en)
TW (1) TW201122412A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2641241A1 (en) * 2006-02-06 2007-08-16 Conformis, Inc. Patient selectable joint arthroplasty devices and surgical tools
CN103673905B (en) * 2013-12-31 2017-04-12 合波光电通信科技有限公司 A magnetron sputtering method of an optical film thickness monitoring
MX2018008322A (en) * 2016-01-07 2018-09-21 Arkema Inc Object position independent method to measure the thickness of coatings deposited on curved objects moving at high rates.

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5327225A (en) * 1993-01-28 1994-07-05 The Center For Innovative Technology Surface plasmon resonance sensor
US6172363B1 (en) * 1996-03-05 2001-01-09 Hitachi, Ltd. Method and apparatus for inspecting integrated circuit pattern
US6278809B1 (en) * 1997-05-30 2001-08-21 Ion Optics, Inc. Fiber optic reflectance apparatus for in situ characterization of thin films
US6215943B1 (en) * 1998-06-23 2001-04-10 Luna Innovations, Inc. Optical fiber holder
US6888639B2 (en) * 2001-09-24 2005-05-03 Applied Materials, Inc. In-situ film thickness measurement using spectral interference at grazing incidence
US7247345B2 (en) * 2002-03-25 2007-07-24 Ulvac, Inc. Optical film thickness controlling method and apparatus, dielectric multilayer film and manufacturing apparatus thereof
TWI272383B (en) 2004-11-02 2007-02-01 Univ Nat Formosa Optical fiber biosensor
US20070037462A1 (en) * 2005-05-27 2007-02-15 Philbrick Allen Optical fiber substrate useful as a sensor or illumination device component
US7277819B2 (en) * 2005-10-31 2007-10-02 Eastman Kodak Company Measuring layer thickness or composition changes
US7408647B2 (en) * 2005-12-19 2008-08-05 Stanley Electric Co., Ltd. Surface plasmon resonance sensor device
TWI294963B (en) * 2006-01-03 2008-03-21 Forward Electronics Co Ltd
CN1877298A (en) 2006-07-05 2006-12-13 中国科学院上海光学精密机械研究所 Real-time measurement apparatus and measurement method for film layer spectrum
TWI301008B (en) * 2006-09-12 2008-09-11 Hanlong Ind Co Ltd Signal connector
US7576863B2 (en) * 2007-02-15 2009-08-18 Gwc Technologies, Inc. Horizontal surface plasmon resonance sensor apparatus
CN101424683A (en) * 2007-10-31 2009-05-06 株式会社精工技研 Biosensor, method for producing the same and sensor measurement system
US7630590B2 (en) * 2007-11-05 2009-12-08 Anisur Rahman Optical sensor for measuring thin film disposition in real time

Also Published As

Publication number Publication date
US20120279447A1 (en) 2012-11-08
US20110151107A1 (en) 2011-06-23
US8377503B2 (en) 2013-02-19

Similar Documents

Publication Publication Date Title
SG143215A1 (en) A scatterometer, a lithographic apparatus and a focus analysis method
EP2249136A3 (en) Light sensing device having a color sensor and a clear sensor for infrared rejection
TWI280349B (en) Spectrum measurement apparatus
TW200840030A (en) Ambient light detectors using conventional CMOS image sensor process
GB201320077D0 (en) Laser tracker that combines two different wavelengths with a fiber-optic coupler
WO2009009714A3 (en) Fiber array unit with integrated optical power monitor
WO2007041591A3 (en) Detecting vulnerable plaque
WO2007098034A3 (en) Mid-ir laser instrument for analyzing a gaseous sample and method for using the same
GB2458592A (en) Water detection and 3-phase fraction measurement systems
WO2009090511A3 (en) Method and apparatus for light intensity control
WO2006137902A3 (en) Thermal selectivity multivariate optical computing
WO2008070408A3 (en) Curved focal plane receiver for concentrating light in a photovoltaic system
WO2011011885A4 (en) Light-guide solar module, method of fabrication thereof, and panel made therefrom
WO2009128977A3 (en) Fiber optic sensor system using white light interferometery
CA2571772A1 (en) Corrected dts measurements based on raman-stokes signals
EA014745B1 (en) Photonic crystal security device
TW201144793A (en) Apparatus for single-molecule detection
TW200731444A (en) Image sensor testing method and apparatus
TW201432528A (en) Input device and method for manufacturing the same
WO2010062860A3 (en) Fiber-based interferometer system for monitoring an imaging interferometer
TWI403756B (en) 3d optical coherent tomography with confocal imaging apparatus
TW201028678A (en) Detection apparatus for fiber optics localized plasmon resonance and the system thereof
EA028306B1 (en) Fibre optic distributed sensing
WO2008040939A3 (en) Measuring brillouin backscatter from an optical fibre using a tracking signal
MX337476B (en) X-ray inspection using wavelength-shifting fiber-coupled scintillation detectors.