TW201039076A - Photoresist stripper - Google Patents

Photoresist stripper Download PDF

Info

Publication number
TW201039076A
TW201039076A TW99122461A TW99122461A TW201039076A TW 201039076 A TW201039076 A TW 201039076A TW 99122461 A TW99122461 A TW 99122461A TW 99122461 A TW99122461 A TW 99122461A TW 201039076 A TW201039076 A TW 201039076A
Authority
TW
Taiwan
Prior art keywords
photoresist
photoresist stripping
compound
stripping solution
amine
Prior art date
Application number
TW99122461A
Other languages
English (en)
Chinese (zh)
Other versions
TWI457725B (https=
Inventor
Bo-Quan Zhan
Original Assignee
Rong yi chemical co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rong yi chemical co ltd filed Critical Rong yi chemical co ltd
Priority to TW99122461A priority Critical patent/TW201039076A/zh
Publication of TW201039076A publication Critical patent/TW201039076A/zh
Application granted granted Critical
Publication of TWI457725B publication Critical patent/TWI457725B/zh

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
TW99122461A 2010-07-08 2010-07-08 Photoresist stripper TW201039076A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW99122461A TW201039076A (en) 2010-07-08 2010-07-08 Photoresist stripper

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW99122461A TW201039076A (en) 2010-07-08 2010-07-08 Photoresist stripper

Publications (2)

Publication Number Publication Date
TW201039076A true TW201039076A (en) 2010-11-01
TWI457725B TWI457725B (https=) 2014-10-21

Family

ID=44995295

Family Applications (1)

Application Number Title Priority Date Filing Date
TW99122461A TW201039076A (en) 2010-07-08 2010-07-08 Photoresist stripper

Country Status (1)

Country Link
TW (1) TW201039076A (https=)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10186680A (ja) * 1996-12-26 1998-07-14 Clariant Internatl Ltd リンス液
US6531436B1 (en) * 2000-02-25 2003-03-11 Shipley Company, L.L.C. Polymer removal
US20030138737A1 (en) * 2001-12-27 2003-07-24 Kazumasa Wakiya Photoresist stripping solution and a method of stripping photoresists using the same

Also Published As

Publication number Publication date
TWI457725B (https=) 2014-10-21

Similar Documents

Publication Publication Date Title
EP3599634B1 (en) Composition for titanium nitride hard mask removal and etch residue cleaning
CN102473638B (zh) 用于高级半导体应用的离子植入后剥离剂
US8357646B2 (en) Stripper for dry film removal
CN1724626B (zh) 用于从基片上除去光致抗蚀剂和/或蚀刻残留物的组合物及其应用
TWI280613B (en) Composition for cleaning semiconductor device and method for cleaning semiconductor device using the same
TW200919120A (en) Stripping liquid for semiconductor device, and stripping method
JP2013092776A (ja) エッチング残渣を除去するための組成物基板及びその使用
US9327966B2 (en) Semi-aqueous polymer removal compositions with enhanced compatibility to copper, tungsten, and porous low-K dielectrics
BRPI0808074A2 (pt) Formulações com base em oxometalato ativado por peróxido para remoção de resíduo de gravação à água forte
TW508478B (en) Resist stripper composition
CN102141743A (zh) 具有金属保护的光刻胶剥离液组合物
JP4252758B2 (ja) フォトレジスト残渣除去液組成物
JP7160238B2 (ja) ドライフィルムレジスト除去用剥離組成物及びこれを用いたドライフィルムレジストの剥離方法
TWI360729B (en) Photoresist residue remover composition and semico
TW201039076A (en) Photoresist stripper
Ashe et al. Evaluation of cleaning methods for multilayer diffraction gratings
CN101776853A (zh) 光刻胶残留物去除用组合物
CN108538814A (zh) 金属绝缘体金属元件的制造方法
CN102540776A (zh) 一种去除半导体工艺中残留光刻胶的剥离液
CN113113324B (zh) 一种钝化层制作方法
US20210157242A1 (en) Photoresist-removing liquid and photoresist-removing method
CN117590709A (zh) 去除半导体基材灰化后残留物与光阻剂的组合物及方法
CN101750913A (zh) 一种去除光阻层残留物的清洗液
JP2011516620A5 (https=)
KR100752446B1 (ko) 감광성 내식각막의 잔사제거용 조성물

Legal Events

Date Code Title Description
GD4A Issue of patent certificate for granted invention patent
MM4A Annulment or lapse of patent due to non-payment of fees