TW201015652A - Separating device and method - Google Patents
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- TW201015652A TW201015652A TW097138594A TW97138594A TW201015652A TW 201015652 A TW201015652 A TW 201015652A TW 097138594 A TW097138594 A TW 097138594A TW 97138594 A TW97138594 A TW 97138594A TW 201015652 A TW201015652 A TW 201015652A
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- 239000000758 substrate Substances 0.000 claims abstract description 75
- 238000004140 cleaning Methods 0.000 claims abstract description 34
- 230000005540 biological transmission Effects 0.000 claims abstract description 15
- 239000002904 solvent Substances 0.000 claims abstract description 12
- 238000000926 separation method Methods 0.000 claims description 26
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 18
- 238000005192 partition Methods 0.000 claims description 15
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67706—Mechanical details, e.g. roller, belt
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/6776—Continuous loading and unloading into and out of a processing chamber, e.g. transporting belts within processing chambers
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10S156/918—Delaminating processes adapted for specified product, e.g. delaminating medical specimen slide
- Y10S156/93—Semiconductive product delaminating, e.g. delaminating emiconductive wafer from underlayer
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/11—Methods of delaminating, per se; i.e., separating at bonding face
- Y10T156/1111—Using solvent during delaminating [e.g., water dissolving adhesive at bonding face during delamination, etc.]
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/11—Methods of delaminating, per se; i.e., separating at bonding face
- Y10T156/1168—Gripping and pulling work apart during delaminating
- Y10T156/1189—Gripping and pulling work apart during delaminating with shearing during delaminating
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/19—Delaminating means
- Y10T156/1928—Differential fluid pressure delaminating means
- Y10T156/1933—Spraying delaminating means [e.g., atomizer, etc.
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/19—Delaminating means
- Y10T156/1961—Severing delaminating means [e.g., chisel, etc.]
- Y10T156/1967—Cutting delaminating means
- Y10T156/1972—Shearing delaminating means
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- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Description
201015652 九、發明說明: 【發明所屬之技術領域】 本發明是有關於-齡轉置,綱是有騎水平移動電子 本體及基板贿行分離及轉自動絲序之技術領》 【先前技術】 ❹ 主-般傳統電子本體(例如半導體·、太陽能電池或面板)之 1方式伽顧手臂駐清祕清洗, 以f戒手臂雜乾歧乾電子賴上讀體,絲 之電子本體_械手臂原封不_送_存區儲存。 存寻t,先前技術自電子本體準備清洗、供乾至儲 存£裝填元成的-連串之作業匕 法將所有過程整合為—個連續”::立作動而不連貫’無 錢成本續 成過多時間之花費,金 錢成本之“及_費用之增加,並 作僅作動於單-晶圓,而作業上其母動 率大幅下降。 …'沄刀批及大1處理晶圓,使得整體效 體 =外’面對電子本體日趨薄化’導致日後薄形化之電子本 上必須添加一黏附之基板,以防止搬$ 子本體作树賴,而現有電 月洗裝置,並無使電子本體及基板分離之製置。 有鑑於習知技藝之各項問題,台丄 人基於多年從事研究開發與諸多二=解 方法,以作狀善上祕狀實現方式魏紗離裝置及 201015652 【發明内容】 有鑑於此,根據本發明之一目❸,提出—種分 利用具有溶解部、清洗部、烘乾部及收細之、= 離相黏合的電子本體及基板。 。了大置勿 本發明之另一目的,提出一種分離 一 清洗狀分__,_目齡之電子本部及 ❹ 緣是,為達上述目的,本發服[齡離裝置, =-柿合之電子本體及基板,此分離裝置包括一平楼、一傳ς ;浴解部、—清洗部及—第—分隔板。傳動部配置於平檯i =移動電子本體及基板。溶解部配置於平檯上,伽以喷灑—、、容 3於電子本體及基板。清洗雜置於平檯上,制崎洗電子本 體。第-分隔㈣位於溶解部及清洗部之間,此第—純板 =少一第通孔,健使電子本財越,藉由電子本體穿越第一 、孔,而基板無法通财—通孔,使電子本體及基板分離。 此外i本發蚊如—種分離綠,肋分離—姆合 子本體及基板,分離方法包括下列步驟: 电 1)配置-平檯、-傳動部、—溶解部、—基板推移部、 洗部、n隔板’且該第—分隔板魏該溶解部及 洗部之間; β 第 u)利用該傳動部帶動相黏合之該電子本體及該基板往該 分隔板移動; ,,卿嫩條所黏狄 6 201015652 清洗Ϊ HI—其t隔板上之—第―通孔使該電子本體穿越至該 本财該基=通過第一抓’藉此讓相黏合之該電子 V)利用該基板推移部之引導,使已分離 分隔板上之—第二通孔⑽清洗部;⑽錢«越該第一 洗el细該清洗部所儒之去料錢麵__加以清 洗已刀離之魏子本體及該絲,叫除 ❹ 〇 所黏附之轉劑。 针本體及絲板上 【實施方式】 圖。二閱? 1 11 ’其係為本發明之分離裝置之立體結構示意 12,雷$7離裝置1伽以分離—她合之電子本體11及基板 人後而八ϋ體^係_、太陽㈣池、面板或任何可以與基板黏 之電子本體u。於此實施例中係以晶圓加以表示,但 邱22 Ϊ限。分離裝置1包含一平檯2、一傳動部2卜-溶解 乾=f轉部23、—清洗部24、—第—分隔板25、一洪 ^ %、-第二分隔板27及一收集部28。傳動部21係配置於平 ,具有滾輪組211及利用平檯2上所灌注之水流212,以 ”子本體11及基板12,其中滾輪組211係配置於溶 ==及,部26,而平檯2上所灌注之水請,係配置於 。及/胃洗°卩24,當所灌注之水流212未覆蓋電子本體11 土板12時’ T以利用滚輪組211及滾輪組211下方之第一喷嘴 冰、:第—喷,242加以帶動電子本體n及基板12。當所灌注之 机212覆蓋電子本體n及基板π時,除了可以利用滾輪組如 201015652 ί 外’亦可以利用水流212帶動電子本體11及基板 12,於此 、化例中係利用滾輪組211及水流212加以帶動電子本體11及基 板12,但不以此為限。 _ 解部22配置於平檯2上,具有溶劑供應裝置221及複數個 ❹ f 一喷嘴222 ’利用溶劑供應裝置221之溶劑221加以供應至第 一喷嘴222 ,而噴灑溶劑221於電子本體u及基板12上,以溶 電子本體11及基板12上之黏著劑13 ,此部份之第一喷嘴222 係以斜向賴方式,可以順勢帶動電子描u絲板12移動。 基板推移部23係位於第—分隔板25前,係使基板12引導至第二 通^ 252。^洗部24配置於平檯2上,具有去離子水供應裝置⑷ 及稷數個第二噴嘴242 ’係用以清洗電子本體11及基板12,以去 除電子本體11及基板12上賴附之黏著劑13。 —第一分隔板25係位於溶解部22及清洗部24之間,此第一名 隔板25具有至少__第—通孔251及至少—第二通孔攻,此第— 通孔251的位置僅提供電子本體丨丨穿越,此第二通孔252之位遷 僅提供基板12穿越。由於電子本體11及基板12之_黏著齊 =已被溶齊J 221溶解’因此透過傳動部21之帶動,以及第一ί 嘴222以斜向喷灑溶劑221的帶動之下,使得基板12被第一分嗎 板25擋住,而電子本體u繼續穿過第一通孔⑸。藉此,電子 本體11及基板12可在贿巾彼此分離,而雜烘乾部%。第— 孔251及第一通孔252之位置高度可根據不同厚度的電子本體 11及基板12而設計。 烘乾部26係烘乾電子本體u及基板12。第二分隔板π 位於清洗部24及烘乾部26之間,此第碎隔板27具有一第三 201015652 .v 離:水供應裝置-之去離子 其扨 而噴灑去離子水243於電子本體11 11及基板12 集部28係各別收集電子本雜. 上述所陳之分離裝置卜視需要 設備32。挾持琴31仫田丨、,4+4士1 狄幵斋w夂排乱 至秘h 9。用挟持相黏合之電子本體11及基板12 。排乳设備32係位於平檯2上方,藉 ❹1於一系列作動過程中所產生之化學氣體。 離裝置 作:=閱第2圖至第9圖,其係為本發明之分離裝置之第 意圖、第五作動示意圖、第::動動:意圖、第四作動示 離方法之步驟流程圖。圖中,作動示意圖及分 之,牛嗷㈣此方去之流程由步驟S20展開,繼 =步驟S20係係配置一平檯2、一傳動部2卜一溶解部a、_ 二:推=7一清洗部24、一第一分隔板25、-烘乾部26、 〇二第二隔板27、-收集部28以及視需要所增加之挟持器^及 排軋设備32(請參閱第1圖),其巾# 實施例中 柘m卫心持相黏合之電子本體11及基 ^2至平檯2上之溶解部22。並且藉由步驟 =且211及水流212(請參閱第1圖) 基板i2由溶解部22往第-分隔板移動。再以步驟防第一噴 201015652 嘴222喷射之溶劑,(如贿、異猶等溶劑⑽溶解晶圓上所黏 附之黏著劑13。然後,利用步驟S24第一噴嘴222之嘴射戋水节 212之帶動,而使電子本體11穿越第一分隔板25上之苐二通孔 251至清洗部24,而基板12因其本身無法通過第一通孔251,使 原本黏合之t子本體11及基板12分離,並且、纟軸基峰移部23 之引導,使分離之基板12穿越第一分隔板25上之第二通 至清洗部24。
之後,利用步驟S25第二喷嘴%戶斤喷射之去離子水加以产 洗電子本體11及基板12,以絲電子本體u及基板12上^ 附之黏著劑(圖中未示),藉由步驟S26傳動部21之滾輪組211及 樣212 ’使已分離之電子本體u及基板12各別由清洗部μ往 第二分隔板27移動,並且利用步驟827第二噴嘴2 細之帶動,而使電子本體n穿越第二分隔板27上:= 孔27卜基板12穿越第二分隔板27上之第四通孔2乃至焕$ 接續著,藉由步驟S28烘乾部26备舰乾電子本體u及其 板12 ’並且利用傳動部21之滾輪組211,使已分離之電子本^ 11及基板12各別由烘乾部26往收集部28移動。 最後利用步驟S29收集部28,使移動之電子本體u及 1 圖2)3至,再藉由步驟_以排氣設備32(請參閱土第1 於各個作動過程中所產生之化學氣體,而完成 電子本體1及基板12分離之一系列動作。 於傳動部2卜溶解部22、基祕移部23、清洗部24、第 刀隔板25太共乾部26、第二分隔板27及收集部28皆設置於平 201015652 檯2,因此相黏合之電子本體u及基板12可在平檯上進行一貫 化及自動化的流程,相黏合之電子本體H及基板12可水平式移 動70成上述的分離及收触序,而且亦可同步處理分離後的電子 本體11及基板12,藉此大幅提產量並降低設備的製造成本。 以上所述僅為舉例性,而非為限制性者。任何未脫離本發明 之=與_ ’㈣魏行之等效修改或變更,均應包含於後附 之申凊專利範圍中。 ❹【圖式解說明】 第1圖係為本發明之分離裝置之立體結構示意圖; 第2圖係為本發明之分離裝置之第一作動示意圖; 第3圖係為本發明之分離裝置之第二作動示意圖; 第4圖係為本發明之分離裝置之第三作動示意圖; 帛5圖係為本發明之分轉置之第四作動示意圖; ❹第6圖係為本發明之分轉置之第五作動示意圖; 帛7圖係為本發明之分離裝置之第六作動示意圖; 第8圖係為本發明之分離裳置之第七作動示意圖 ;以及 第9圖係為本發明之分離方法之步驟流程圖。 201015652
【主要元件符號說明】 1 :分離裝置; 11 :電子本體; 12 :基板; 13 :黏著劑; 2 :平檯; 21 :傳動部; 211 :滾輪組; 212 :水流; 22 :溶解部; 221 :溶劑供應裝置; 222 :第一喷嘴; 223 :溶劑; 23 :基板推移部; 24清洗部; 241 :去離子水供應裝置; 242 :第二喷嘴; 243 :去離子水; 25 :第一分隔板; 251 :第一通孔; 252:第二通孔; 26 :烘乾部; 27 :第二分隔板; 271 :第三通孔; 272 :第四通孔; 28 :收集部; 31 :挾持器; 32 :排氣設備;以及 S20〜S30 :步驟流程。
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Claims (1)
- 201015652 、申請專利範圍: 該分離 一種分離裴置,係用以分離一相黏合之電子本體及基板, 裝置包括: 平檯; 2動部’配置於該平檯上’以移動該電子本體及該基板; ’合解部,配置於該平檯上’係甩以喷灑一溶劑於該 體及該基板; ❺ ❹ 二清洗部,配置於該平檯上,侧以清洗該電子本體;以及 5 一第—分隔板’係位於該溶解部及該清洗部之間,該第一分 ::具有产少一第一通孔’該第一通孔之高度係僅使該電子本體 分離。而5亥基板無法通過該第一通孔,致使該電子本體及該基板 Hi專利範圍第1項所述之分離裝置,其中該轉部具有-基料賴該湖,赌辆電子本體及該 3.如概11第1項所述之分離裝置,其中該清洗部具有-第 基板其中之-移tr 麗進—步帶動該電子本體及該 4 第1項所述之分離裝置,其中該傳動部係為- 乾雜報上,用峨乾該電子本财該基板其中 置於軒棱上’肋收_電子本财魏板其中 13 201015652 义一 邱圍第1項所述之分離装置,其中更包括一基板推移 二=板推移部係設置於該平檯上韻使已分離之該基板引 導至一第二通孔。 圓申第1項所述之分離裝查,其巾該電子本體係為晶 0、太%能電池及面板其中之一。 9方種法丨’ #彻分離—相黏合之電子本體絲板,該分離 方法包括下列步驟: 魯 ❹ 部、、—傳動部、—溶轉、—基錄卿、一清洗 刀隔板’且該第一分隔板係設置於該溶解部及該洗 邵之間; 利用該傳動部㈣相黏合之該電子本體及該基板往一 分隔板移動; &利祕解部噴射—軸,赠賴奸本體上所_之黏著 J 9 立利用第-分隔板上之—第—通孔使該電子本體穿越至該清 洗部,且使該基板無法通過第一通孔,藉此讓相黏合之該電子 體及該基板分離; 利用絲板推移部之引導,使已分離之該基板穿越該第一分 隔板上之一第二通孔至該清洗部;以及 5用該清洗部所仙之去離子水加清洗已分離之該電子本 體及及基板’以去除該電子本體及該基板上所_彳之黏著劑。 10.如申請專利範圍第9項所述之分離方法,更包含下列步驟: 7用該清洗部射射之去離子水帶動該電子本财越該第二分 隔板上之一第三通孔、該基板穿越第二分隔板上之一第四通孔至 14 201015652 烘乾部。 11. 如申π細範料9 方 設置-供乾部於 之刀離方法,更包含下列步驟: 板。 Λ #各別烘乾已分離之該電子本體及該基 12. 如申請專利範圍第 設置一收集部柯平於上田之刀離方法,更包含下列步驟: 板。 …托用Μ轉⑽狀該電子本體及該基 ❹ Ο 13·ί:3=第9項所述之分離方法,其中該溶解部具有一 、嘴,藉由該第一喷嘴噴灑該溶 基板間之黏著劑。 ㈤〜解雜子本體及該 I申^咖第9項所述之分離方法,其中該清洗部具有-該基板其中之-移動。嘴嚴以進一步帶動該電子本體及 15. 如申請專利翻第9綱述之分離方法,其中該傳動部係為一 滾輪組或一水流,以移動該電子本體及該基板其中之一。 16. 如申請專鄕圍第9稿述之錄方法,其巾該電 晶圓、太陽能電池及面板其中之一。 15
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US6685795B1 (en) * | 2001-08-10 | 2004-02-03 | Adco Products, Inc. | Device and method of separating adhered layers |
US6843298B1 (en) * | 2003-09-30 | 2005-01-18 | Hitachi Global Storage Technologies Netherlands, B.V. | Apparatus for automatically debonding, processing, and handling fragile slider rows |
JP4693696B2 (ja) * | 2006-06-05 | 2011-06-01 | 株式会社東京精密 | ワーク処理装置 |
JP2008119587A (ja) * | 2006-11-10 | 2008-05-29 | Tokyo Electron Ltd | 洗浄装置および洗浄方法 |
JP2008153337A (ja) * | 2006-12-15 | 2008-07-03 | Tokyo Electron Ltd | 貼り合せ基板の分離方法、貼り合せ基板の分離装置及びプログラムを記録したコンピュータ読み取り可能な記録媒体 |
-
2008
- 2008-10-07 TW TW097138594A patent/TW201015652A/zh unknown
-
2009
- 2009-08-12 US US12/539,811 patent/US8012307B2/en not_active Expired - Fee Related
- 2009-08-26 SG SG200905687-0A patent/SG160278A1/en unknown
- 2009-09-28 KR KR1020090091684A patent/KR20100039222A/ko not_active Application Discontinuation
- 2009-09-29 JP JP2009224589A patent/JP2010093251A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
KR20100039222A (ko) | 2010-04-15 |
SG160278A1 (en) | 2010-04-29 |
JP2010093251A (ja) | 2010-04-22 |
US8012307B2 (en) | 2011-09-06 |
US20100084093A1 (en) | 2010-04-08 |
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