TW200849259A - NAND flash memory cell array and method with adaptive memory state partitioning - Google Patents

NAND flash memory cell array and method with adaptive memory state partitioning Download PDF

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Publication number
TW200849259A
TW200849259A TW096149041A TW96149041A TW200849259A TW 200849259 A TW200849259 A TW 200849259A TW 096149041 A TW096149041 A TW 096149041A TW 96149041 A TW96149041 A TW 96149041A TW 200849259 A TW200849259 A TW 200849259A
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Taiwan
Prior art keywords
memory
bit
group
bits
data
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TW096149041A
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Chinese (zh)
Inventor
Farookh Moogat
Teruhiko Kamei
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Sandisk Corp
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Priority claimed from US11/618,498 external-priority patent/US7489548B2/en
Priority claimed from US11/618,482 external-priority patent/US7489547B2/en
Application filed by Sandisk Corp filed Critical Sandisk Corp
Publication of TW200849259A publication Critical patent/TW200849259A/en

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    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/34Determination of programming status, e.g. threshold voltage, overprogramming or underprogramming, retention
    • G11C16/3418Disturbance prevention or evaluation; Refreshing of disturbed memory data
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/10Programming or data input circuits

Abstract

A NAND type flash memory is organized into NAND strings with each being a chain of memory cells in series and connected via select transistors on both ends of the string to either a bit line or a source line. The memory cells adjacent both ends of a NAND string are particularly susceptible to errors due to program disturb. An adaptive memory-state partitioning scheme is employed to overcome the errors, in which each memory cells are generally partitioned to store multiple bits of data, except for the ones adjacent both ends where relatively less bits are stored. In this way, the storage of relatively less bits in the memory cells adjacent both ends of a NAND string affords sufficient margin to overcome the errors. For example, in a memory designed to store 2-bit data, the cells adjacent both ends of a NAND string would each be configured to store one bit of the 2-bit data.

Description

200849259 九、發明說明: 【發明所屬之技術領域】 本發明一般而言係關於快閃EEPROM(電子可抹除可程式 化唯讀記憶體)類型之非揮發性半導體記憶體,而且更特 定言之’其關於操作反及類型記憶體單元陣列並且處置靠 近一反及串之邊緣之程式化干擾之結構與方法。 【先前技術】 如今使用許多商用之成功非揮發性記憶體產品,尤其具 有小形狀因數卡之形式,其使用快閃EEProm(電子可抹除 及可程式化唯讀記憶體)單元的一陣列。 一快閃記憶體系統之一範例使用反及結構,其包括配置 多個電荷儲存電晶體以充當串聯之記憶體單元,並夾在兩 選擇閘極之間。一反及陣列具有若干記憶體單元(例如8、 16或甚至32),其當作一串之記憶體單元(反及串)而連接於 一位元線與經過在任一端之選擇電晶體之一參考電位之 間。將子線與不同串聯串中的單元之控制閘極連接。 為了程式化一快閃記憶體單元,將一程式化電壓施加於 制閘極並將5亥位元線接地,造成該單元之臨限電壓 升向。因為將程式化電壓施加於連接至一字線之全部單 兀,可忐無意間程式化該字線上的一未選擇單元(不希望 程式化的—單元)。該已選擇字線上之未選擇單元的偶然 程式化稱為”程式化干擾,,。 持續之努力刻正進行中’以改良反及記憶體單元之程式 技術以便可有效地儲存更多冑訊,而且避免程式化干 127626.doc 200849259 擾。 所以,通常需要高效能而且高容量非揮發性記憶體。尤 其,需要一種具有增強之讀取與程式化效能之緊密非揮發 性記憶體,其具有一緊密且有效又高度適用於處理該等讀 取/寫入電路間之資料之改良式處理器。 貝 【發明内容】 一種反及類型快閃記憶體係組織成反及串,其中個別:、 Ο 串聯之記憶體單元的-鏈,而且經由該串之兩端之選擇=200849259 IX. Description of the Invention: TECHNICAL FIELD OF THE INVENTION The present invention generally relates to a non-volatile semiconductor memory of the type of flash EEPROM (Electrically Erasable Programmable Read Only Memory), and more specifically 'Structure and method for operating a reversed type memory cell array and handling stylized interference near the edge of a string. [Prior Art] Many commercially available non-volatile memory products are used today, especially in the form of small form factor cards that use an array of flash EEProm (Electrically Erasable and Programmable Read Only Memory) units. One example of a flash memory system uses an inverse structure that includes configuring a plurality of charge storage transistors to act as a series of memory cells sandwiched between two select gates. In contrast, the array has a plurality of memory cells (eg, 8, 16, or even 32) that are connected as a string of memory cells (reverse and string) to one bit line and one of the selected transistors through either end Between potentials. The subwires are connected to the control gates of the cells in different series strings. To program a flash memory cell, a stylized voltage is applied to the gate and the 5 GHz line is grounded, causing the threshold voltage of the cell to rise. Because a stylized voltage is applied to all of the cells connected to a word line, an unselected cell on the word line (which does not wish to be programmed) can be unintentionally programmed. The accidental stylization of unselected cells on the selected word line is called "stylized interference, and continuous efforts are being carried out" to improve the program technology of the memory unit so that more information can be stored efficiently. And avoid stylized 127626.doc 200849259. Therefore, high performance and high capacity non-volatile memory is usually required. In particular, there is a need for a compact non-volatile memory with enhanced read and program performance, which has a An improved processor that is compact, efficient, and highly suitable for processing data between such read/write circuits. [Invention] A reverse-type flash memory system is organized into inverse strings, each of which: Ο series The chain of the memory unit, and the selection of the two ends of the string =

晶體連接至可能一位元線或一源極線。特定言之,緊鄰L 反及串之兩端之記憶體單元易於遭受程式化干擾所致:錯 誤。利用一適應性記憶體狀態切割方案克服該等錯誤,= 中一般而言將每一記憶體單元切割,以儲存多位元之資 料,緊鄰儲存相對較少位元之兩端之記憶體單元除外。以 此方式4緊鄰-反及串之兩端之記憶體單元中儲存相對 較少位兀足以提供充分容限以克服該等錯誤。 在-具體實施例中,其中一記憶體係設計 兩位元,此二位元所成的一單元將為:該二位元:: 於盥一及另生 匕< 儲存 、/、夂及串之一端相鄰的一記憶體單元,而且該二位元 之另一者儲存於緊鄰該另一端之另一記憶體單元。 在另-具體實施例中,其中—記憶體係設計成每單元儲 存三位元,,14· - , 二位元所成的一皁元將為:一端記憶 儲存該位元之_ ^ 匕餸早兀 ^之一,而且該另一端記憶體單元儲存該等位元 之'° 本發 一優點在於容易修改一現存記憶體系統,以 調 127626.doc 200849259 節該適應性方案。對於一2位元或3位元記憶體系統,需要 將至多一額外記憶體單元新增至一現存反及串,以便維護 相同記憶體電容。 從下面本發明之較佳具體實施例的說明中將會瞭解本發 明的額外特點與優點,參考該說明時應該配合附圖。 【實施方式】 欲促使對該較佳具體實施例的瞭解,將說明一反及串的 ζ\ 一般架構與操作。隨後將參考該一般架構而說明該較佳具 體實施例的特殊架構與操作。 該反及結構之一般說明 圖1Α顯示一反及結構的一俯視圖,其中串聯之多電晶體 夾在兩選擇閘極之間。串聯之電晶體及該等選擇閘極稱為 反及串。(電晶體及閘極亦稱為非揮發性儲存元件。)圖 1A顯示一 4記憶體單元反及串。圖1B顯示圖1A的一等效電 路。 1/ 圖1 A與18中所繪示之反及串包含串聯並且夾在一第一 選擇閉極120與一第二選擇閘極122間之四電晶體1〇〇、 102、104與1〇6。選擇閘極12〇將該反及串連接至位元線 126。選擇閘極122將該反及串連接至源極線。選擇閘 . 極120係藉由將該等適當電壓施加於選擇閘極120之控制閘 極120CG所控制。選擇閘極122係藉由將該等適當電壓施 加於選擇閘極122之控制閘極122CG所控制。每一電晶體 100、102、104與106具有一控制閘極與一浮動閘極。例 如,電晶體100包含控制閘極100CG與浮動閘極1〇〇F(}。電 127626.doc 200849259 晶體102包含控制閘極i〇2CG與一浮動閘極1〇2FG。電晶體 104包含控制閘極104CG與浮動閘極1〇4FG。電晶體1〇6包 έ控制閘極106CG與浮動閘極106FG。控制閘極ioocg係 連接至子線WL3 ’控制閘極102CG係連接至字線WL2,控 制閘極104CG係連接至字線WL1,而且控制閘極1〇6CG係 連接至字線WL0。 圖1C係上述反及串142的一斷面圖。如圖1C中所緣示, P 該反及串之電晶體(亦稱為單元或記憶體單元)係在P井區 140中形成。每一電晶體包含一堆疊式閘極結構,其由控 制閘極(100CG、102CG、104CG與106CG)及浮動閘極 (100FG、102FG、104FG與106FG)所組成。該等浮動閘極 係形成於一氧化物膜之頂部上的P井區14〇之表面。控制閘 極位於該浮動閘極之上,其中一氧化層分離該控制閘極與 浮動閘極。 應注意,圖1C似乎繪示電晶體120與122的一控制閘極與 浮動閘極。然而,對於電晶體120與122,該控制閘極與該 浮動閘極係連接在一起。記憶體單元(1〇〇、1〇2、1〇4與 106)之控制閘極形成該等字線。擴散層13〇、132、 • 134、136與138在鄰近單元間共享,藉此將該等單元彼此 • 串聯連接,以形成一反及串。此等N+擴散層形成每一單元 之源極與汲極。例如,N+擴散層130用作電晶體122之汲極 與電晶體106之源極,N+擴散層132用作電晶體1〇6之汲極 與電晶體104之源極,N+擴散層134用作電晶體1〇4之汲極 與電晶體1〇2之源極,N+擴散層136用作電晶體1〇2之汲極 127626.doc -10- 200849259 與電晶體100之源極,而且N+擴散層138用作電晶體100之 汲極與電晶體120之源極。N+擴散層126連接至該反及串之 位元線,同時N+擴散層128連接至多反及串的一共同源極 線。 應注意,雖然圖1A至1C顯示該反及串中之四記憶體單 元,不過使用四電晶體僅作為一範例。一反及串可具有少 於四之纟己彳思體早元或多於四之記憶體單元。例如,某些反 及串將包含8記憶體單元(以下相對於圖2B至2F所示及所 f、 述)、16記憶體單元、32記憶體單元等。本文之討論未被 限制在一反及串中存在任何特定數目之記憶體單元。 圖2 A顯示具有更多反及串之一記憶體陣列的三反及串 202、204與206。圖2A之每一反及串包含兩選擇電晶體與 四記憶體單元。例如,反及串202包含選擇電晶體220與 230,及記憶體單元222、224、226與228。反及串204包含 選擇電晶體240與250,及記憶體單元242、244、246與 〇 248。每一串係藉由其選擇電晶體(例如:選擇電晶體230 與選擇電晶體250)而連接至該源極線。一選擇線SGS用以 控制該等源極側選擇閘極。各種反及串係藉由選擇線SGD • 所控制之選擇電晶體220、240等而連接至個別位元線。 在其他具體實施例中,該等選擇線未必必需共用。字線 WL3係連接至記憶體單元222及記憶體單元242之控制閘 極。子線WL2係連接至記憶體單元224及記憶體單元244之 控制閘極。字線WL1係連接至記憶體單元226、記憶體單 元246及纪憶體單元250之控制閘極。字線WL〇係連接至記 127626.doc -11 - 200849259 憶體單元228及記憶體單元248之控制閘極。如可見到,每 一位元線與該個別反及串包括記憶體單元之陣列之行。該 等字線(WL3、WL2、WL1與WL0)包括該陣列之列,而且 如以上所述,每一字線連接該列中之每一記憶體單元之控 制閘極。 圖2B顯示一 8記憶體單元反及串的一範例。該額外字線 、 係以WL4SWL7(用於記憶體單元222A至228A)所顯示,並 ^ 且具有如字線WL0至WL3之類似功能性。 每一記憶體單元可儲存資料(類比或數位)。當儲存數位 貝料的一位元時,該記憶體單元之可能臨限電壓之範圍係 分割成兩範圍,其被指派邏輯資料,,1"與,,〇,,。在一反及類 型快閃記憶體之一範例中,於抹除該記憶體單元後該電壓 臨限為負,而且定義為邏輯” i ”。於一程式化操作後之臨 限電壓為正,而且定義為邏輯,,〇”。當該臨限電壓為負而 且嘗試一讀取時,該記憶體單元將接通,以指示儲存邏輯 U —。當臨限電壓為正而且嘗試-讀取操作時,該記憶體單 凡將未接通,其指示儲存邏輯零。 一記憶體單元亦可儲存資訊(或,,資料”)之多位準,例 如,數位貧料之多位元。在儲存資料之多位準之情況下, ’ 彳能臨限電壓之範圍係分割成資料之位準數目。例如,若 儲存資訊之四位準,將存在指派給該等資料值”1Γ,、 10”、”01”及”00”之四臨限電壓範圍。在一反及類型記憶 體之一範例中,於一抹除操作後之臨限電壓為負,而且定 義為u”。正臨限電壓用於,,10,,、,,〇1,,與,,〇〇”之狀態。 127626.doc -12- 200849259 反及類型快閃記憶體及其操作之相關範例係提供於下列 美國專利案/專利巾請案中,其全部以引时式併入本文 中.美國專利第 5,570,315 ' 5,774,397、、 6,456,528與 6,522,580號。 程式化干擾 當程式化-快閃記憶體單元時’將—程式化電壓施加於 該控制_ ’並將該位元線接地。將來自?井之電子注入 該浮動閘極中。當電子累積在該浮動閘極中時,該浮動閑 極欠成π負電’並且升南該單元之臨限電壓。為了將該程 :化電壓施加於已程式化單元之控制閘極,將該程式化電 壓施加於適當字線ρ如以上所討論,該字線亦連接至利 用相同字線之每-其他反及串的—單元。例如,當程式化 圖A之單元224%,该程式化電壓亦施加於單元244之控制 閘極’因為兩單元共享相同字線。 ^希望程式化-字線上之—單元而不程式化連接至該類 似子線之其他單元時出現一問題,例如,當希望程式化單 元=4而非單元244時。因為將該程式化電壓施加於連接至 子線之王邛單元,可能無意間程式化該字線上的一未選 擇單疋(不程式化的一單元)。例如,當程式化單元224時, 考里· 了犯無思間程式化單元244。該已選擇字線 上之未選擇單元之偶然程式化稱為,,程式化干擾,,。 胃可利用若干技術防止程式化干擾。在一種稱為,,自行升 r之方法中,於程式化期間將未選擇位元線電絕緣並將 一通過電壓(如10伏特)施加於該等未選擇字線。該等未選 127626.doc 200849259 擇子線耦合至該等未選擇位元線,造成一電壓(如8伏特)存 在於該等未選擇位元線之通道中,而傾向減少程式化干 擾。自行升壓造成一電壓升壓存在於該通道中,而傾向降 低橫跨該隧道氧化物之電壓,因此減少程式化干擾。圖2C 顯示使用一升壓通道252之自行升壓技術的一範例。 通吊(但非永遠)一反及串係從該源極側至該汲極側加以 程式化,例如,從記憶體單元228至記憶體單元228a。當 p 該程式化程序已備妥程式化該反及串之最後(或接近最後) 吕己憶體單元時,若程式化禁止之串(如串2〇4)上之全部或大 部分先前已程式化單元,則該等先前已程式化單元之浮動 閘極中存在負電荷。因為該等浮動閘極上之此負電荷,該 升壓電位無法夠高,而可能在最後少數字線上仍存在程式 化干擾。例如,當程式化單元222時,若程式化單元248、 246與244,則該等電晶體(244、246與248)之每一者在其浮 動閘極具有一負電荷,而將限制自行升壓程序之升壓位 準,而且可能在單元242造成程式化干擾。 局部自我升壓(,,LSB”)及已抹除區域自我升壓(f,EASB,f) 以上所討論有關自我升壓之問題已藉由兩其他方案加以 ’ 因應··局部自我升壓(,,LSB”)及已抹除區域自我升壓 (EASB ),LSB及EASB兩者嘗試隔離先前已程式化單元之 通道與受抑制單元之通道。例如,若程式化圖2A(或圖2b) 之單元224,則LSB與EASB嘗試藉由隔離單元2料之通道與 先前已程式化單元(246與248)而抑制單元244中之程式化。 使用該LSB技術,將程式化之單元之位元線接地,而且 127626.doc -14- 200849259 具有該受抑制單元之串之位元線處於Vdd。該程式化電壓 Vpgm(例如,20伏特)係於該已選擇字線上驅動。鄰近該已 選擇字線之字線處於零伏特,而且剩餘非選擇字線處於 Vpass。例如,檢視圖2A,位元線202處於零伏特,而且位 元線204處於Vdd。汲極選擇SGD處於Vdd,而且源極選擇 SGS處於零伏特。已選擇字線WL2 (用於程式化單元224)處 於Vpgm。鄰近字線WL1與WL3處於零伏特,而且其他字 線(例如,WL0)處於Vpass。對於一 8記憶體單元反及串, 該相同情形顯示於圖2B中。 EASB類似於LSB,其中該例夕卜在於僅有該源極側鄰近字 線處於零伏特。圖2D顯示EASB的一範例。當程式化WL5 時,WL4處於零伏特,其截止該通道,而且WL3處於 Vpass。在一具體實施例中,Vpass係7至10伏特。若Vpass 太低,則該通道中之升壓不足以防止程式化干擾。若 Vpass太高,則將程式化未選擇字線。 閘極感應汲極洩漏(GIDL) 雖然LSB與EASB提供自行升壓的一改良,其亦顯現端視 是否程式化或抹除該源極側鄰近單元(單元246係單元244 之源極側鄰近單元)的一問題。若程式化該源極侧鄰近單 元,則在該源極側鄰近單元之浮動閘極存在一負電荷。將 零伏特施加於該控制閘極。因此,該帶負電閘極底下存在 一高度反向偏壓接面,其可造成閘極感應汲極洩漏 (GIDL)。GIDL牽涉由於帶至帶(B至B穿隧)而洩漏至該升 壓通道中之電子。GIDL隨著該接面中的一大偏壓及一低 127626.doc -15- 200849259 或負閘極電壓而發生,即為當程式化該源極側鄰近單元而 且使該汲極接面升壓時之情況。GIDL將造成該已升壓電 壓提前洩漏,導致一程式化錯誤。GIDL隨著按比例調整 單元大小所要求之突然且鬲度摻雜接面而更嚴重。若該茂 漏電流夠高,則該通道區之升壓電位將往下,而且可存在 程式化干擾。該程式化之字線愈接近該汲極,該已升壓接 . 面中存在愈少電荷。因此,該已升壓接面中之電壓將快速 下降,造成一程式化干擾。即使該洩漏電流並非夠高,在 該閘極與該通道間的一高電場中易於將GIDL感應之電子 注入至該浮動閘極中。其亦將造成程式化干擾。 圖2D顯示當將Vpgm施加於WL5,WL4處於零伏特,而 且Vpass施加於其他字線時之GIDL的一範例。其顯示正電 荷已茂漏至p井中,並且顯示已將剩餘電子注入至該浮動 閘極中。The crystal is connected to a possible one or a source line. In particular, memory cells that are immediately adjacent to L and the ends of the string are susceptible to stylized interference: errors. Overcoming such errors with an adaptive memory state cutting scheme, in which each memory cell is typically cut to store multi-bit data, except for memory cells that are stored at opposite ends of a relatively small number of bits. . In this manner, the storage of relatively few bits in the memory cells immediately adjacent to and opposite the strings is sufficient to provide sufficient margin to overcome such errors. In a specific embodiment, one of the memory systems is designed to have two elements, and one unit formed by the two bits will be: the two bits:: one and the other ones < storage, /, 夂 and string One of the memory cells adjacent to one end, and the other of the two bits is stored in another memory cell adjacent to the other end. In another embodiment, wherein the memory system is designed to store three bits per unit, 14·-, a soap element formed by the two bits will be: one end memory stores the bit _ ^ 匕餸 early One of the ,^, and the other end memory unit stores the ''bit' of the bit. One advantage is that it is easy to modify an existing memory system to adjust the adaptive scheme of 127626.doc 200849259. For a 2-bit or 3-bit memory system, at most one additional memory unit needs to be added to an existing inverse string to maintain the same memory capacitance. Additional features and advantages of the invention will be apparent from the description of the preferred embodiments of the invention. [Embodiment] To clarify the understanding of the preferred embodiment, a general architecture and operation of a reversed string will be described. The particular architecture and operation of the preferred embodiment will be described with reference to the general architecture. General Description of the Inverse Structure Figure 1A shows a top view of a reverse structure in which a plurality of transistors in series are sandwiched between two selected gates. The series connected transistors and the selected gates are referred to as inverse and string. (Transistors and gates are also referred to as non-volatile storage elements.) Figure 1A shows a 4 memory cell inverse and string. Fig. 1B shows an equivalent circuit of Fig. 1A. 1/ The reverse and string shown in Figures 1A and 18 comprise four transistors 1〇〇, 102, 104 and 1〇 connected in series and sandwiched between a first selected closed pole 120 and a second selected gate 122. 6. The gate 12 is selected to connect the inverse string to bit line 126. Selecting gate 122 connects the inverse string to the source line. The gate 120 is controlled by applying the appropriate voltage to the control gate 120CG of the selection gate 120. Select gate 122 is controlled by applying the appropriate voltage to control gate 122CG of select gate 122. Each of the transistors 100, 102, 104 and 106 has a control gate and a floating gate. For example, the transistor 100 includes a control gate 100CG and a floating gate 1〇〇F(}. 127626.doc 200849259 The crystal 102 includes a control gate i〇2CG and a floating gate 1〇2FG. The transistor 104 includes a control gate. The pole 104CG and the floating gate 1〇4FG. The transistor 1〇6 includes the control gate 106CG and the floating gate 106FG. The control gate ioocg is connected to the sub-line WL3. The control gate 102CG is connected to the word line WL2, and is controlled. The gate 104CG is connected to the word line WL1, and the control gate 1〇6CG is connected to the word line WL0. Fig. 1C is a cross-sectional view of the reverse line 142. As shown in Fig. 1C, the P is reversed. A string of transistors (also referred to as cells or memory cells) are formed in the P-well region 140. Each transistor includes a stacked gate structure that is controlled by gates (100CG, 102CG, 104CG, and 106CG) and Floating gates (100FG, 102FG, 104FG and 106FG) are formed on the surface of the P well 14 on top of an oxide film. The control gate is located above the floating gate. One of the oxide layers separates the control gate from the floating gate. It should be noted that Figure 1C seems to indicate electricity. A control gate and a floating gate of the bodies 120 and 122. However, for the transistors 120 and 122, the control gate is connected to the floating gate. Memory cells (1〇〇, 1〇2, 1) The control gates of 〇4 and 106) form the word lines. The diffusion layers 13〇, 132, • 134, 136 and 138 are shared between adjacent cells, whereby the cells are connected in series to each other to form a reverse The N+ diffusion layers form the source and drain of each cell. For example, the N+ diffusion layer 130 serves as the drain of the transistor 122 and the source of the transistor 106, and the N+ diffusion layer 132 serves as the transistor. The drain of 6 is the source of the transistor 104, the N+ diffusion layer 134 is used as the drain of the transistor 1〇4 and the source of the transistor 1〇2, and the N+ diffusion layer 136 is used as the drain of the transistor 1〇2 127626.doc -10- 200849259 and the source of the transistor 100, and the N+ diffusion layer 138 is used as the drain of the transistor 100 and the source of the transistor 120. The N+ diffusion layer 126 is connected to the bit line of the inverted string At the same time, the N+ diffusion layer 128 is connected to a common source line of the multi-reverse and the string. It should be noted that although FIGS. 1A to 1C show the four memories in the inverse string. Unit, but the use of four transistors is only an example. A reverse string can have less than four memory cells or more than four memory cells. For example, some inverse strings will contain 8 memory. Units (hereinafter shown with respect to Figures 2B through 2F and f, described), 16 memory units, 32 memory units, etc. The discussion herein is not limited to the presence of any particular number of memory units in a reverse string. Figure 2A shows three inverted strings 202, 204 and 206 with more memory arrays of inverted strings. Each of the inverse strings of Figure 2A includes two select transistors and four memory cells. For example, the inverse string 202 includes select transistors 220 and 230, and memory cells 222, 224, 226, and 228. The inverse string 204 includes select transistors 240 and 250, and memory cells 242, 244, 246 and 248. Each string is connected to the source line by its selection transistor (eg, select transistor 230 and select transistor 250). A select line SGS is used to control the source side select gates. The various inverse and string are connected to the individual bit lines by selecting the selected transistors 220, 240, etc. controlled by the line SGD. In other embodiments, the select lines do not necessarily have to be shared. Word line WL3 is coupled to the control gates of memory unit 222 and memory unit 242. The sub-line WL2 is connected to the control unit of the memory unit 224 and the memory unit 244. Word line WL1 is coupled to the control gates of memory unit 226, memory unit 246, and memory unit 250. The word line WL is connected to the control gate of the memory unit 228 and the memory unit 248. As can be seen, each of the meta-lines and the individual anti-strings comprise a row of arrays of memory cells. The word lines (WL3, WL2, WL1, and WL0) include the array of columns, and as described above, each word line connects the control gates of each of the memory cells in the column. Fig. 2B shows an example of an 8 memory cell inverse and string. The extra word lines are shown with WL4SWL7 (for memory cells 222A through 228A) and have similar functionality as word lines WL0 through WL3. Each memory unit can store data (analog or digital). When storing a single element of a digital material, the range of possible threshold voltages of the memory cell is divided into two ranges, which are assigned logical data, 1" and,, 〇,,. In one example of a type of inverted flash memory, the voltage threshold is negative after erasing the memory cell and is defined as a logical "i". After a stylized operation, the threshold voltage is positive and is defined as logic, 〇". When the threshold voltage is negative and a read is attempted, the memory unit will be turned on to indicate the storage logic U - When the threshold voltage is positive and the try-read operation, the memory will not be turned on, and the indication stores the logic zero. A memory unit can also store the information (or, data) multi-level For example, a number of bits of poor material. In the case of multiple levels of stored data, the range of threshold voltages is divided into the number of levels of data. For example, if the four levels of information are stored, there will be four threshold voltage ranges assigned to the data values "1", 10", "01", and "00". In one example of a type-inversion memory, the threshold voltage after a erase operation is negative and is defined as u". The positive threshold voltage is used for, 10,,,,, 〇1,,,, , 〇〇" state. 127626.doc -12- 200849259 Examples of anti-type flash memory and its operation are provided in the following U.S. Patent/Patent Towels, all of which are incorporated herein by reference. U.S. Patent No. 5,570,315 5,774,397, 6,456,528 and 6,522,580. Stylized Interference When stylized-flash memory cells, a stylized voltage is applied to the control _ and the bit line is grounded. Will come from? The electrons of the well are injected into the floating gate. When electrons accumulate in the floating gate, the floating idler is less than π negative and rises to the threshold voltage of the cell. In order to apply the pass voltage to the control gate of the programmed cell, the stylized voltage is applied to the appropriate word line ρ as discussed above, and the word line is also connected to each of the same word lines. String - unit. For example, when the unit of program A is 224%, the stylized voltage is also applied to the control gate of unit 244 because the two units share the same word line. ^ There is a problem with the desire to stylize - the word on the word line and not programmatically connect to other units of the similar line, for example, when you want the stylized unit = 4 instead of unit 244. Since the stylized voltage is applied to the king unit connected to the sub-line, an unselected unit (unprogrammed unit) on the word line may be inadvertently programmed. For example, when stylizing unit 224, Cowley has no intertextualization unit 244. The accidental stylization of unselected cells on the selected word line is called, stylized interference, . The stomach can use several techniques to prevent stylized interference. In a method known as self-extension, the unselected bit lines are electrically insulated during stylization and a pass voltage (e.g., 10 volts) is applied to the unselected word lines. The unselected 127626.doc 200849259 coupler lines are coupled to the unselected bit lines, causing a voltage (e.g., 8 volts) to be present in the channels of the unselected bit lines, with a tendency to reduce stylized interference. Self-boosting causes a voltage boost to be present in the channel and tends to reduce the voltage across the oxide of the tunnel, thereby reducing stylized interference. Figure 2C shows an example of a self boosting technique using a boost channel 252. The hang (but not always) and the string are programmed from the source side to the drain side, for example, from the memory unit 228 to the memory unit 228a. When p the stylized program has been programmed to program the last (or near the last) Lv Yi recall unit, if all or most of the stylized prohibited strings (such as string 2〇4) have been previously A stylized unit has a negative charge in the floating gates of the previously programmed units. Because of this negative charge on these floating gates, the boost potential cannot be high enough, and there may be stylized interference on the last few digit lines. For example, when the unit 222 is programmed, if the units 248, 246, and 244 are programmed, each of the transistors (244, 246, and 248) has a negative charge at its floating gate and will limit itself. The boost level of the program is programmed and may cause stylized interference at unit 242. Local self-boosting (, LSB) and erased area self-boosting (f, EASB, f) The problem of self-boosting discussed above has been solved by two other schemes: 'According to local self-boosting ( , LSB") and erased area self-boost (EASB), both LSB and EASB attempt to isolate the channel of the previously programmed unit and the channel of the suppressed unit. For example, if the unit 224 of Figure 2A (or Figure 2b) is programmed, the LSB and EASB attempt to suppress the stylization in unit 244 by the channel of the isolation unit 2 and the previously programmed units (246 and 248). Using the LSB technique, the bit line of the stylized cell is grounded, and the bit line of the string with the suppressed cell is at VDD. 127626.doc -14- 200849259. The stylized voltage Vpgm (e.g., 20 volts) is driven on the selected word line. The word line adjacent to the selected word line is at zero volts and the remaining unselected word lines are at Vpass. For example, to view view 2A, bit line 202 is at zero volts and bit line 204 is at Vdd. The drain selects SGD at Vdd and the source selects SGS at zero volts. The selected word line WL2 (for the stylizing unit 224) is at Vpgm. The adjacent word lines WL1 and WL3 are at zero volts, and other word lines (e.g., WL0) are at Vpass. For an 8-memory unit inverse and string, the same situation is shown in Figure 2B. The EASB is similar to the LSB, where the example is that only the source side adjacent word line is at zero volts. Figure 2D shows an example of an EASB. When stylizing WL5, WL4 is at zero volts, it is off the channel, and WL3 is at Vpass. In a specific embodiment, the Vpass is 7 to 10 volts. If Vpass is too low, the boost in this channel is not sufficient to prevent stylized interference. If Vpass is too high, the word line will not be programmed. Gate Inductive Drain Leakage (GIDL) Although LSB and EASB provide an improvement in self-boosting, it also appears to be whether to program or erase the source side neighboring cell (the source side adjacent cell of cell 246 system cell 244) ) a question. If the source side neighboring cell is programmed, there is a negative charge on the floating gate of the adjacent cell on the source side. Apply zero volts to the control gate. Therefore, there is a highly reverse bias junction under the negatively charged gate which can cause gate induced drain leakage (GIDL). GIDL involves electrons leaking into the booster channel due to banding (B to B tunneling). GIDL occurs with a large bias voltage in the junction and a low voltage of 127626.doc -15-200849259 or a negative gate voltage, that is, when the source side adjacent unit is programmed and the drain junction is boosted The situation at the time. GIDL will cause the boosted voltage to leak early, resulting in a stylized error. GIDL is more severe with the abrupt and moderately doped junctions required to scale the unit size. If the leakage current is high enough, the boost potential of the channel region will go down and there may be stylized interference. The closer the stylized word line is to the buck, the less charge is present in the boosted junction. Therefore, the voltage in the boosted junction will drop rapidly, causing a stylized disturbance. Even if the leakage current is not high enough, it is easy to inject the GIDL-induced electrons into the floating gate in a high electric field between the gate and the channel. It will also cause stylized interference. Figure 2D shows an example of GIDL when Vpgm is applied to WL5, WL4 is at zero volts, and Vpass is applied to other word lines. It shows that the positive charge has leaked into the p-well and shows that the remaining electrons have been injected into the floating gate.

Ik著進一步收縮該字線間隔以達成較小晶粒尺寸,更多 Q 課題將出現於微影術、WL至SG耦合所致之雜訊(字線與選 擇閘極間之耦合)以及GIDL造成之程式化干擾等某些點。 例如’隨著字線收縮’該WL至SG耦合電容將增加。此將 _ 於該耦合雜訊消退前導致較長等待時間。 ' 同時,因為隨著該字線收縮,電場濃度將變得較高,當 程式化定位在一反及串之兩端之記憶體單元時,將更加突 顯GIDL錯誤。 在先前途徑中,使該選擇閘極電晶體(例如,圖2A中之 選擇電晶體230)與該相鄰記憶體電晶體(例如,記憶體單元 127626.doc -16- 200849259 228)間之間隔較寬,以緩解電場濃度而且降低WL至SG耦 合雜訊。然而,其使該反及串長度較長,而且與晶粒尺寸 收縮之希望背道而馳。同時,由於相對於WL至WL,在SG 至WL之突然線/空間改變,將產生較嚴重微影術問題。 美國專利公告案第US-2006-0198195-A1號揭示提供用以 降低GIDL之方式之改良式自我升壓方法。該技術係將以 VGP顯示之另一電壓施加於該程式化單元之下一記憶體單 元。此顯示於圖2E中,其中程式化WL5、將VGP施加於 WL4並將零伏特施加於WL3。以此方式,逐漸降低圍繞所 選出WL之WL電壓(VPGM)。例如,¥卩〇]\/1(24¥)-VPASS(10 V)-VGP(4 V)-VISO(0 V)。此降低GIDL,同時程 式化WL1至WLN,其中N係該最後字線。然而,當程式化 WL0時此技術失效,因為在該選擇電晶體側以外並無鄰近 字線。圖2F顯示在該串之末端之GIDL問題仍然存在。例 如,當將Vpgm施加於WL0時,而且由於帶至帶(B至B)穿 隧仍然發生GIDL。 標題’’用於快閃記憶體裝置之方法與系統’’於2006年4月 20曰申請之美國專利申請案第11/407,816號因應在該串之 末端之GIDL問題,其係藉由在定位於該串之末端之記憶 體單元與該處之選擇閘極間插入一虛設記憶體單元。該虛 設記憶體單元將為:其控制閘極耦合至一虛設字線(WL)。 藉由控制虛設WL之偏壓,可以如US_2006-0198195-A1中 揭示之相同方式降低GIDL。同時該等虛設WL可防護SG至 WL間之雜訊。為了降低汲極側GIDL以及源極側GIDL,將 127626.doc 200849259 需在一反及串之每一端新增具有兩WL之兩虛設記憶體單 元。該等虛設記憶體單元並未儲存任何資科,而且此具有 進一步增加該反及串之尺寸之缺點。 一反及串中之適應性記憶體狀態切割 一反及類型快閃記憶體係組織成反及串,其中個別為串 聯之記億體單元的一鏈,而且經由在該串之兩端之選擇電 晶體連接至可能一位元線或一源極線。特定言之,緊鄰一 反及串之兩端之記憶體單元易於遭受程式化干擾所致之錯 誤。 曰 根據本發明之-通用態樣,利用一適應性記憶體狀態切 割方案克服在-反及串之兩端之錯誤。一般而言將一反及 串中之記憶體單元加以切割,以錯存一位元以上之資料, 緊鄰相對於其他單元儲存較少位元之兩端之記憶體單元除 卜乂此方式’在緊鄰一反及串之兩端之記憶體單元中儲 存相對較少位元^以提供充分容限以克服該等錯誤。例 如’在設計成每單元健存兩位元之一記憶體中,此二位元 :、田作個别位元而個別儲存於緊鄰兩端之兩記憶體單 元中。 快閃記憶體系統 :3广係一種可用以實施本發明之快閃記憶體系統之一具 "1的彳塊圖。記憶體單元陣列302係由行控制電 路304、列控制電路3〇 路·所控制。行控制電Γ 電路训與^控制電 電路304係連接至記憶體單元陣列 302之位元線,其用於 貝取儲存於該等記憶體單元之資 127626.doc -18- 200849259 :、在-程式化操作期間用於決定該記憶體單元的一狀 態,以及用於控制該等位元線之電位位準以促進該程式化 或抑制該程式化。龍制電物6係連接至該等字線,以 選擇字線之-、施加讀取„、施加與行㈣電路3〇4所 控制之位元線電位位準組合的—程式化電廢,及施加一抹 除電麼。C-源極控制電路310控制連接至該等記憶體單元 的一共同源極線(圖3B中標示為"C_源極,vp井控制電路 3〇8控制該p井電壓。 儲存於該等記憶體單元之資料係由該行控制電路3〇4加Ik further shrinks the wordline spacing to achieve smaller grain sizes, and more Q topics will occur in lithography, WL to SG coupling due to noise (coupling between word lines and select gates) and GIDL Some points such as stylized interference. For example, the WL-to-SG coupling capacitance will increase as the word line shrinks. This will cause a longer wait time before the coupled noise fades. At the same time, as the word line shrinks, the electric field concentration will become higher, and the GIDL error will be more prominent when stylized to locate the memory cells at the opposite ends of the string. In a prior approach, the spacing between the select gate transistor (e.g., select transistor 230 in FIG. 2A) and the adjacent memory transistor (eg, memory cell 127626.doc -16-200849259 228) It is wider to alleviate the electric field concentration and reduce the WL to SG coupling noise. However, it makes the length of the reverse string longer and runs counter to the hope of shrinking the grain size. At the same time, due to the sudden line/space change between SG and WL relative to WL to WL, a more severe lithography problem will result. U.S. Patent Publication No. US-2006-0198195-A1 discloses an improved self-boosting method for reducing the GIDL. This technique applies another voltage displayed by the VGP to a memory cell below the stylizing unit. This is shown in Figure 2E, where WL5 is programmed, VGP is applied to WL4 and zero volts is applied to WL3. In this way, the WL voltage (VPGM) around the selected WL is gradually reduced. For example, ¥卩〇]\/1(24¥)-VPASS(10 V)-VGP(4 V)-VISO(0 V). This lowers the GIDL while modulating WL1 through WLN, where N is the last word line. However, this technique fails when staging WL0 because there are no adjacent word lines other than the selected transistor side. Figure 2F shows that the GIDL problem at the end of the string still exists. For example, when Vpgm is applied to WL0, and GIDL still occurs due to tunneling to the band (B to B). U.S. Patent Application Serial No. 11/407,816, filed on Apr. 20, 2006, which is hereby incorporated herein by reference in its entirety in its entire entire entire entire entire entire disclosure A dummy memory cell is inserted between the memory cell at the end of the string and the selected gate at the location. The dummy memory cell will be such that its control gate is coupled to a dummy word line (WL). By controlling the bias voltage of the dummy WL, the GIDL can be lowered in the same manner as disclosed in US_2006-0198195-A1. At the same time, these dummy WLs can protect the noise between SG and WL. In order to reduce the GIDL on the drain side and the GIDL on the source side, 127626.doc 200849259 needs to add two dummy memory cells with two WLs at each end of the string. The dummy memory cells do not store any assets, and this has the disadvantage of further increasing the size of the inverse strings. In contrast, the adaptive memory state of the string is reversed and the type of the flash memory system is organized into a reverse string, wherein each of the chains is a chain of billions of cells, and the selection is made at both ends of the string. The crystal is connected to a possible one or a source line. In particular, memory cells that are immediately adjacent to both ends of the string are susceptible to errors caused by stylized interference.曰 In accordance with the general aspect of the present invention, an adaptive memory state cutting scheme is used to overcome errors at both ends of the inverse and the string. Generally speaking, the memory cells in the string are cut to store one or more pieces of data, and the memory cells of the two bits are stored in close proximity to the other cells. A relatively small number of bits are stored in the memory cells immediately adjacent to the ends of the string to provide sufficient tolerance to overcome such errors. For example, in a memory designed to store two bits per cell, the two bits: the fields are individually stored and stored in two memory cells immediately adjacent to each other. Flash Memory System: A block diagram of a flash memory system that can be used to implement the present invention. The memory cell array 302 is controlled by the row control circuit 304 and the column control circuit 3. The row control circuit and the control circuit 304 are connected to the bit line of the memory cell array 302, which is used to store the memory in the memory unit. 127626.doc -18- 200849259 : During the operation, a state of the memory cell is determined, and a potential level of the bit line is controlled to facilitate the stylization or to suppress the stylization. The dragon battery 6 is connected to the word lines to select the word line, the application read „, and the stylized electric waste combined with the bit line potential level controlled by the line (4) circuit 3〇4, And applying a wipe to remove power. The C-source control circuit 310 controls a common source line connected to the memory cells (labeled as "C_source in Figure 3B, and the vp well control circuit 3〇8 controls the p Well voltage. The data stored in the memory cells is controlled by the row control circuit 3〇4

以讀取,而錄由資料輸入/輸出㈣器312輸出至外部ι/〇 線。儲存於該等記憶體單元之程式化f料係經由該等外部 I/O線輸入至該資料輸入/輸出緩衝器3 12,而且傳輸至該行 控制電路304。該等外部1/0線係連接至控制器318。 用於控制該快閃記憶體裝置之命令資料係輸入至控制器 :18。該命令資料通知該快閃記憶體要求何操作。該輸入 :7係傳輸至狀態機3 16,其控制行控制電路、列控制 電路306、c-源極控制31〇、p_井控制電路及資料輸入/ 輸出緩衝$ 312。狀態機316亦可輸出該快閃記憶體之狀態 貧料’如 READY/BUSY或 PASS/FAIL。 位^制& 3 1 8係與例如—個人電腦、一數位相機或個人數 位:理等的一主機系統連接或可連接。其與用以啟動例如 將貝料儲存至或讀取自該記憶體陣列302之命令之主機進 :通彳5,而且提供或接收此類資料。控制器318將此類命 ▽轉換成可由命令電路314加以解譯及執行之命令信號, 127626.doc -19- 200849259 該等命令電路係與狀態機316進行通信。控制器318通常含 有用於寫入至或讀取自該記憶體陣列之使用者資料之緩衝 記憶體。一示範性記憶體系統包括一積體電路,其包含控 制器318 ;以及一或多個積體電路晶片,其各含有一記憶 體陣列與相關聯控制、輸入/輸出及狀態機電路。當然, 趨勢係將一系統之記憶體陣列及控制器電路一起整合於一 或多個積體電路晶片上。可嵌入該記憶體系統以當作該主 機系統之部分,或者將其包含於可移式地插入該等主機系 統的一 §己憶卡(或其他封裝)中。此一卡可包含該整個記憶 體系統(如包含該控制器),或者僅為具有關聯周邊電路之 記憶體陣列(其中該控制器係嵌入該主機中)。因此,可將 该控制器嵌入該主機或者包含於一可移式記憶體系統中。 參照圖3B,說明記憶體單元陣列3〇2的一範例結構。作 為一範例,其說明一反及快閃EEPR〇M,其係切割成^024 區塊。同時抹除儲存於每一區塊之資料。在一具體實施例 中,該區塊係同時抹除之單元之最小單元。此範例中,每 一區塊内存在8,512行,其係分割成偶行與奇行。該等位 7L線亦分割成偶位元線(BLe)與奇位元線(BL〇)。作為一範 一反及串之四記憶體單元。For reading, the data input/output (4) 312 is output to the external ι/〇 line. The stylized f-storage stored in the memory cells is input to the data input/output buffer 3 12 via the external I/O lines, and is transmitted to the row control circuit 304. These external 1/0 lines are connected to controller 318. The command data for controlling the flash memory device is input to the controller: 18. The command data informs the flash memory what to do. The input: 7 is transmitted to the state machine 3 16, which controls the row control circuit, the column control circuit 306, the c-source control 31, the p_well control circuit, and the data input/output buffer $312. State machine 316 can also output the state of the flash memory, such as READY/BUSY or PASS/FAIL. The bit system & 3 1 8 is connected or connectable to a host system such as a personal computer, a digital camera or a personal digital device. It is in conjunction with a host to initiate, for example, a command to store the batting to or read from the memory array 302, and to provide or receive such material. Controller 318 converts such commands into command signals that can be interpreted and executed by command circuitry 314, 127626.doc -19- 200849259 The command circuits are in communication with state machine 316. Controller 318 typically contains buffer memory for writing to or reading user data from the memory array. An exemplary memory system includes an integrated circuit including a controller 318; and one or more integrated circuit chips each including a memory array and associated control, input/output, and state machine circuits. Of course, the trend is to integrate a system of memory arrays and controller circuits together on one or more integrated circuit chips. The memory system can be embedded as part of the host system or included in a memory card (or other package) that can be movably inserted into the host systems. The card may include the entire memory system (e.g., including the controller) or just a memory array with associated peripheral circuitry (where the controller is embedded in the host). Therefore, the controller can be embedded in the host or included in a portable memory system. Referring to Fig. 3B, an exemplary structure of the memory cell array 3A2 will be described. As an example, the description is directed to flash EEPR〇M, which is cut into ^024 blocks. At the same time, erase the data stored in each block. In one embodiment, the block is the smallest unit of cells that are simultaneously erased. In this example, there are 8,512 rows in each block, which are split into even and odd rows. The bit line 7L is also divided into an even bit line (BLe) and an odd bit line (BL〇). As a paradigm and a string of four memory cells.

接至c _源極。 例,圖3B顯示串聯連接以形成一反 雖然顯示每一反及串中包含四單元 127626.doc -20- 200849259 :取及程式化操作期間,同時選擇記憶體單元的一頁 WL2-.、,,4,256)。選擇之記憶體單元具有相同字線(例如 丄&相同種類之位元線(例如偶位元線)。因此,可 5夺:取或私式化532位元組之資料。同時讀取或程式化 位元組貝料形成一邏輯頁。目此,一區塊可儲 子至少八胃。當每一記憶體單元儲#兩位元之資料(例 如,多位準單元)時,一區塊儲存16頁。Connect to c_source. For example, FIG. 3B shows a series connection to form a reverse one. Although each display includes four cells 127626.doc -20-200849259: during the stylization operation, a page WL2-., which selects the memory cell at the same time, is selected. , 4, 256). The selected memory cells have the same word line (for example, 丄 & the same kind of bit line (for example, even bit line). Therefore, it can take 5: take or privately 532 Bytes of data. Simultaneously read or The stylized byte group material forms a logical page. Therefore, one block can store at least eight stomachs. When each memory unit stores # two-dimensional data (for example, multi-level cells), one area The block stores 16 pages.

記憶體單㈣藉由將·井上升至—抹除電壓(例如職 特)並將"已選擇區塊之字線接地而抹除。該源極與位元 '、、象係浮動抹除可在该整個記憶體陣列、分離區塊或單元 之另一早70上執;^。電子係從該浮動閑極傳輸至該p井 區,而且該臨限電壓變成負。 在讀取及驗證操作中,將該等選擇閉極(湖與⑽)以 及未選擇字線(如WLG、WLmwL3)上升至—讀取通過電 壓(如4.5伏特),使該等電晶體當作通過閘極而操作。該已 選擇字線(如乳2)係連接至—電壓,對於每—讀取及驗證 操作指定該電壓的一位準’以便決定關注之記憶體單元的 -臨限電壓是否已達到此類位準。例如,在—讀取摔作 中’將該已選擇字線WL2接地,以便㈣該臨限電壓是否 高於〇 V。在-驗證操作中,例如,該已選擇字線机2係 連接2.4 V,以便驗證該臨限電壓是否已達到2·4 v或另一 臨限位準。該源極與p井處於零伏特。該f已選擇偶位元 線(BLe)係預充電至一位準,例如,〇 7 v。若該臨限電壓 高於該讀Μ㈣位準’則因為該非傳導記憶體單元,關 127626.doc -21 · 200849259The memory unit (4) is erased by raising the well to the erase voltage (for example, the user) and grounding the word line of the selected block. The source and bit ',, the floating erase can be performed on the other memory array, the separate block or the other 70 of the unit; The electron system is transferred from the floating idle to the p-well region, and the threshold voltage becomes negative. In read and verify operations, the selected closed poles (lake and (10)) and unselected word lines (eg, WLG, WLmwL3) are raised to - read through voltage (eg, 4.5 volts) to cause the transistors to be treated as Operate through the gate. The selected word line (eg, milk 2) is connected to the voltage, and a bit of the voltage is specified for each read and verify operation to determine whether the threshold voltage of the memory cell of interest has reached such a bit. quasi. For example, the selected word line WL2 is grounded in the "reading" to (4) whether the threshold voltage is higher than 〇V. In the verify operation, for example, the selected wordline machine 2 is connected to 2.4 V to verify whether the threshold voltage has reached 2·4 v or another threshold level. The source and p well are at zero volts. The f-selected even bit line (BLe) is pre-charged to a level, for example, 〇 7 v. If the threshold voltage is higher than the read (four) level, then because of the non-conductive memory unit, off 127626.doc -21 · 200849259

U 注之偶位元線(BLe)之電位位準維持該高位準。另一方 面’若該臨限電壓低於該讀取或驗證位準,則因為該傳導 記憶體單元,關注之偶位元線(BLe)之電位位準減小至一 低位準,例如小於〇·5 V。該記憶體單元之狀態係藉由連 接至該位元線的一感測放大器加以偵測。是否抹除或程式 化該記憶體單元間之差異端視該浮動閘極中是否儲存負電 荷。例如,若該浮動閘極中儲存負電荷,則該臨限電壓變 得較高,而且該電晶體可在增強模式。 上述之抹除、讀取及驗證操作係根據技術中已知之技術 加以執行。因此,熟諳此技術者可驗證所解釋之許多細The potential level of the even bit line (BLe) of the U note maintains the high level. On the other hand, if the threshold voltage is lower than the read or verify level, the potential level of the even bit line (BLe) of interest is reduced to a low level, for example, less than 〇 because of the conduction memory cell. · 5 V. The state of the memory cell is detected by a sense amplifier connected to the bit line. Whether to erase or program the difference between the memory cells depends on whether a negative charge is stored in the floating gate. For example, if a negative charge is stored in the floating gate, the threshold voltage becomes higher and the transistor can be in an enhanced mode. The above erase, read and verify operations are performed in accordance with techniques known in the art. Therefore, those skilled in the art can verify many of the details explained.

Ar/c 即 0 多狀態記憶體之讀取與程式化之範例 圖4A至4E與5A至5E個別說明用於一4狀態記憶體之多位 兀編碼之兩範例。在一 4狀態記憶體單元中,該四狀態可 藉由兩位元而代表。一現存技術係使用一 2遍程式化以程 式化此類記憶體。第一遍程式化一第一位元(下頁位元)。 隨後,在一第二遍中程式化該相同單元,以代表一所需第 二位元(上頁位元)。為了在第二遍中不改變該第一位元之 值,使該第二位元之記憶體狀態表示法端視該第一位元之 值。 圖4A至4E說明以一習知2位元格雷(Gary)碼加以編碼之* 狀態記憶體之程式化與讀取。該記憶體單元之可程式化臨 限電壓範圍(臨限窗)係切割成四區,代表一未程式化%” 狀態,及三其他遞增程式化狀態 ”A”、"B”與”C”。該四 127626.doc -22- 200849259 區係個別藉由分界臨限電壓DA、DB與Dc而分界。Ar/c is an example of reading and stylizing a multi-state memory. Figures 4A through 4E and 5A through 5E illustrate two examples of multi-bit encoding for a 4-state memory. In a 4-state memory cell, the four states can be represented by two bits. An existing technology uses a 2-pass stylization to program such memory. The first pass stylizes a first bit (the next page bit). The same unit is then programmed in a second pass to represent a desired second bit (upper page bit). In order to not change the value of the first bit in the second pass, the memory state representation of the second bit is treated as the value of the first bit. Figures 4A through 4E illustrate the stylization and reading of *state memory encoded by a conventional 2-bit Gray code. The programmable threshold voltage range (the threshold window) of the memory unit is cut into four zones, representing an unprogrammed %" state, and three other incremental stylized states "A", "B" and "C ". The four 127626.doc -22- 200849259 districts are individually demarcated by the boundary threshold voltages DA, DB and Dc.

圖4 A說明當母一 s己j思體早元儲存使用一習知格雷碼之兩 位元資料時該4狀態記憶體陣列之臨限電壓分布。該四分 布代表該四記憶體狀態:,,U,,、,,A”、”B”與,,c”之群體。於 程式化一記憶體單元前,先將其抹除成其,,U,,或”未程式化” 狀態。當逐漸地程式化該記憶體單元時,漸漸地達到該等 記憶體狀態"A”、"B”、與” C”。該格雷碼使用該(上位元, 下位元),以指定"U,,為(1,1)、,,A”為(1,0)、,,B,,為(〇, 〇)、 而且,,C”為(〇, 1)。 圖4B說明在一使用該格雷碼之現存、2遍程式化方案中 之下頁程式化。對於平行程式化之單元的一頁,該等上及 下位元將形成兩邏輯頁··由該等下位元所組成的一邏輯下 頁,及由該等上位元所組成的一邏輯上頁。一第一遍程式 化僅程式化該邏輯下頁位元。藉由適當編碼,在相同頁之 單几的一後續、第二遍程式化將程式化該等邏輯上頁位 几而未重置該等邏輯下頁位元。該格雷碼係一常用碼, 其中當變遷至-相鄰狀態時僅—位元改變。因&,此碼具 有較不要求錯誤校正之優點,因為僅牵涉一位元。 使用該袼雷碼的一通用方案係令” 代表一,,未程式化,,條 件:因此,該已抹除記憶體狀態▼係由(上頁位元,下頁 70) 〇, 1)所代表。在用以程式化該邏輯下頁的一第一遍 、儲存w亥位70 ”0’’之任何單元將因而使其邏輯狀態 攸(X,1)變遷至( 礓(,〇),其中,,X,,代表的係該上位元之,,不重 要’’值。然而,因為A 土』二、 為尚未程式化該上位元,為了一致性, 127626.doc -23- 200849259 亦可以”1”標示”x”。該(1,〇)邏輯 化成該記,隨態由㈣單元程式 前,τ之下位元值係藉由該記憶體狀= 圖4Q明在-使用該袼雷碼之現存、㉘程式化方案中 之上頁程式化。執行一第二遍程式 一 々八化以儲存該邏輯上頁 之位元。將僅程式化需要” 〇,, 一 一 上貝位兀值之該等單 元。於該第一遍後,該頁中之罝 宁早兀可此處於該邏輯狀態(1,Figure 4A illustrates the threshold voltage distribution of the 4-state memory array when the mother uses a two-dimensional data of a conventional Gray code. The four distributions represent the population of the four memory states:, U,,,,, A", "B", and, c". Before staging a memory unit, erase it to its U, or "unprogrammed" state. As the memory unit is gradually programmed, the memory states "A", "B", and "C" are gradually reached. The Gray code uses the (upper element, lower bit) to specify "U,, as (1,1),,,A" is (1,0),,,B,,((〇,〇), Moreover, C" is (〇, 1). Figure 4B illustrates the following page stylization in an existing, 2-pass stylized scheme using the Gray code. For a page of parallel stylized cells, the upper and lower bits will form two logical pages, a logical lower page consisting of the lower bits, and a logical upper page composed of the upper bits. A first pass stylizes only the next page bit of the logic. By proper encoding, a subsequent, second pass stylization of a single page of the same page will program the logical upper page bits without resetting the logical lower page bits. The Gray code is a commonly used code in which only the bit changes when transitioning to the -adjacent state. Because of &, this code has the advantage of not requiring error correction because only one bit is involved. A general scheme for using the 袼Ray code "represents one, unprogrammed, condition: therefore, the erased memory state is caused by (on the previous page, next page 70) 1, 1) Representation. Any unit that stores a first 70th "0" of the next page of the logic, thus shifting its logical state 攸(X,1) to (礓(,〇), Where, X,, represents the upper-level, and does not matter the '' value. However, because A soil is not programmed for the upper-level, for consistency, 127626.doc -23- 200849259 can also "1" indicates "x". The (1, 〇) is logically converted into the record. Before the state is preceded by the (4) unit program, the value of the τ under the bit is represented by the memory = Figure 4Q - use the 袼 code The existing page in the existing 28 programming scheme is programmed. A second pass of the program is executed to store the bits of the logical upper page. It will only be stylized to require "”,, The units. After the first pass, the page in the page can be here in the logic state (1,

Lj υ或(1,〇)。為了保留該第二遍中之下頁之值,必須區分 I或"!"之下位元值。對於從(1,〇)至(〇,〇)之變遷,討論 中之s己憶體單元係程式化至記憶體狀態Τ。料從(1 υ 至(〇, υ之變遷,討論中之記憶體單元係程式化至該記憶 體狀態”C”。以此方式’於讀取期間,藉由決定一單元中 所程式化之記憶體狀態’可解碼該τ頁位元與該上頁位 元0 私式化係藉由將_程式化脈衝交替地施加於平行之記憶 體Τ元的-頁繼而對每一單元進行感測或程式化驗證以決 定是否=將其任—者程^化至其目標狀態而完成。當已程 、^ 單元時,即使當繼續施加該等程式化脈衝以完 成4群中之其他單元之程式化時,其將被封鎖或程式化抑 制’、以免進一步程式化。可從圖4Β與4C見到··於該下頁 矛式化^間’必需相對於具有該分界臨限電壓DA之狀態 (乂 verifyA’’表示)執行程式化驗證。然而,對於該上 頁耘式化,必需相對於狀態,,B,,與,,C”執行程式化驗證。因 此該上頁驗證將要求,,verifyB”與”verifyC,,的一 2遍驗 127626.doc •24· 200849259 證,個別相對於該等分界臨限電壓化與Dc。Lj υ or (1, 〇). In order to preserve the value of the page in the second pass, you must distinguish between I or "! "Under the bit value. For the transition from (1, 〇) to (〇, 〇), the suffix unit in the discussion is stylized to the memory state Τ. From (1 υ to (〇, 变 change, the memory unit in the discussion is stylized to the memory state) C”. In this way, during the reading, by deciding the stylized in a unit The memory state 'decodes the τ page bit and the previous page bit 0. The privateization is performed by alternately applying a _stylized pulse to the -page of the parallel memory cell. Or stylized verification to determine whether = to complete its task to its target state. When the process, ^ unit, even when continue to apply the stylized pulse to complete the program of the other units in the group When it is changed, it will be blocked or stylized to suppress 'to avoid further stylization. It can be seen from Figure 4Β and 4C······································· (乂verifyA'' indicates) to perform stylized verification. However, for the above page, it is necessary to perform stylized verification with respect to the state, B,, and, C". Therefore, the previous page verification will require, verifyB" and "verifyC," one or two passes 127626.doc 24 * 200 849 259 certificate, the individual phases of the threshold voltage Dc for such boundaries.

U ㈣說明用以辨別以該格雷碼加以編碼之4狀態記憶體 =位:所要求之讀取操作。因為藉由(1,所編碼之記 心-狀恶A”及藉由(0,0)所編碼之”B"兩者具有當作其 下位兀,當將一記憶體單元程式化至狀態"A"或"B"時,則 谓測到該下位元"0"。反之,當—記憶體單元係未程式化 而在狀態"U"或程 < 化至狀態"c"時,貝ιΗ貞測到該下位元 ”1”。因此,該下頁讀取將要求的一 2遍讀 取,個別相對於該分界臨限電壓DA與Dc。 圖4E說明用以辨別以該格雷碼加以編碼之4狀態記憶體 之^位7G所要求之讀取操作。其將要求相對於該分界臨限 電壓DkreadB的一遍讀取。以此方式,將偵測到具有小 於以之程式化臨限電壓之任何單元處於記憶體狀態Μ", 而且反之亦然。 當該第二遍程式化錯誤時,該格雷碼、2遍程式化方案 可變成-問題。例#,該上頁位元被程式化為”〇,,同時該 下位元為”1”將造成從(1,υ變遷至(G,D。&要求將該記憶 體單元從”U”透過”A”與”B”漸漸地程式化至"c”。若於完成 該程式化前存在一電源中斷,則該記憶體單元將結束於該 變遷記憶體狀態之—,例如”A”。#讀取該記憶體單元 時,’’A”將解碼成該邏輯狀態(丨,〇)。此給予該等上與下位 兀兩者之不正確結果,因為其應為(〇,1}。類似地,若於 到達”B”時該程式化中斷,則其將對應於(〇, 〇)。雖然現存 該上位兀係正確,但該下位元仍然錯誤。此外,因為從該 127626.doc -25- 200849259 未程式化狀態”u”一直至該最程式化狀態"c”之可能變遷, 此碼方案具有加重在不同時間程式化之相鄰單元之電荷位 準間之電位差之效應。因此,其亦加重相鄰浮動閘極間之 場效搞合(’’Yupin效應π)。 圖5Α至5Ε說明以另一邏輯碼(”LM,,碼)加以編碼之4狀態 記憶體之程式化與讀取。此碼提供較多容錯,而且減輕該 Yupin效應所致之鄰近單元耦合。 圖5 A說明當每一記憶體單元儲存使用該lm碼之兩位元 資料時該4狀態記憶體陣列之臨限電壓分布。該LM編碼與 圖7A中所示之習知格雷碼相異,其中對於狀態,,A,,與,,c,,, 該等上與下位元係反轉。該”LM”碼已揭示於美國專利第 6,65 7,891號,而且有利於降低相鄰浮動閘極間之場效耦 合’其係藉由避免要求電荷之一大改變之程式化操作。如 圖5B與5 C中將見到,每一程式化操作導致該電荷儲存單 元之電荷之適度改變,如從該臨限電壓VT之適度改變明 顯可知。 該編碼係設計成使下與上之2位元可分開地程式化與讀 取。當程式化該下位元時,該單元之臨限位準可能仍然在 該未程式化區中,或者被移至該臨限窗的一 ”中下,,區。告 秋式化該上位元時,使此二區之任一者之臨限位準進一牛 前進至未超過該臨限窗之四分之一的一稍高位準。 圖5B說明在一使用該LM碼之現存、2回合程式化方案中 之下頁程式化。該容錯LM碼基本上避免任何上頁程式化 透過任何中間狀態而變遷。因此,該第一回合下頁程式化 127626.doc -26· 200849259 使該邏輯狀態(1,i)變遷至某中間狀態(x,0),如藉由將該 ”未程式化”記憶體狀態”U”程式化至以(x,〇)指定並具有廣 泛分布在大於DA但小於Dc間之一程式化臨限電壓的一,,中 間狀怨所代表。於程式化期間,該中間狀態係相對於一 分界DVA加以驗證。 圖5C說明在一使用該LM碼之現存、2回合程式化方案中 之上頁程式化。在將該上頁位元程式化至"〇"之第二回合 p 中,若该下頁位元處於”1 ,則如藉由將該,,未程式化,,記憶 體狀態”U”程式化至"Α”所代表,該邏輯狀態(1,丨)變遷至 (〇,1)。若該下頁位元處於”〇”,該邏輯狀態⑺,〇)係藉由從 該”中間”狀態程式化至”Β”所獲得。類似地,若該上頁仍 然處於"Γ’,同時已將該下頁程式化至”〇”,其將要求從該 中間狀態至(1,0)的一變遷,如藉由將該,,中間”狀態程式 化至”c”所代表。因為該上頁程式化僅牵涉程式化至該下 一相鄰記憶體狀態,並無大量之電荷從一回合變更至另一 υ 回合。從” U”至一粗略,,中間,,狀態之下頁程式化係設計成 節省時間。 圖5D說明用以辨別以該LM碼加以編碼之4狀態記憶體之 下位το所要求之讀取操作。該解碼將端視是否已程式化該 上頁。若已程式化該上頁,則讀取該下頁將要求相對於該 分界臨限電壓DB之readB的一遍讀取。另一方面,若尚未 程式化該上頁,則將該下頁程式化至該,,中間,,狀態(圖 5B),而且readB將造成錯誤。反而,讀取該下頁將要求相 對於該分界臨限電壓DA之readA的一遍讀取。為了區分該 127626.doc •27- 200849259 二情況,當程式化該上頁時’將一旗標(”lm"旗標)寫入至 該上頁中。於一讀取期間,將先假設:已程式化該上頁, 因而將執行—readB操作。若讀取該LM旗標,則該假設係 正確,並且進行該讀取操作。另一方面,若該第一讀取未 產生一旗標,則其將指示尚未程式化該上頁,因而將須藉 由一 readA操作讀取該下頁。 圖5E說明用以辨別以該LM碼加以編碼之4狀態記憶體之 上位兀所要求之讀取操作。如從該圖式很清楚,該上頁讀 取將要求咖dA與readC的一 2遍讀取,個別相對於該分^ 臨限電壓DA與Dc。類似地,若尚未程式化該上頁,則上 頁之解碼亦可被該,,中間"狀態所混淆。再次該LM旗標將 指示是否已程式化該上頁。若未程式化該上頁,則將該讀 取貧料重置為” 1 ",指示未程式化該上頁資料。 圖6A說明一習知反及串中之各種記憶體單元間之gidl 感應錯誤之效應。該範例顯示一反及串,其具有串聯之32 C/ §己憶體單元,而且與字線WL0至WL3 1相關。將每一記憶 體單7G加以切割,以儲存四可能記憶體狀態之一(藉由2位 疋所代表)。圖6A顯示該四記憶體狀態之臨限電壓之分 • 布,其係關於記憶體單元之一群體之反及串之記憶體單元 -之二定位。該三定位之二者係與該等選擇電晶體(或閘極) 相鄰。尤其,與該串之源極端相鄰之記憶體單元使其控制 閘極連接至字線WL0,而且與該串之沒極端相鄰之記憶體 單7L使其控制閘極連接至字線WL3丨。其餘記憶體單元常 駐於遠反及串之核心區,而且與字線WL1SWL3〇相關。 127626.doc -28- 200849259 從圖6Α將見到該四記憶體狀態之常態分布(中間圖)係由 常駐於該核心區(WL1至WL30)之記憶體單元所給定。然 而’由於在該反及串之末端所突顯之GIDL效應,與該源 極選擇電晶體相鄰之記憶體單元(WL〇)之分布(底部圖)被 移位至較高臨限電壓。此可產生錯誤,如同例如,可將該 已移位”01”狀態誤讀成一 "00”狀態。類似地,相同錯誤影 Ο Ο 響與該汲極選擇電晶體相鄰之記憶體單元(WL3丨)(見頂部 圖)。 圖6B說明關聯於圖6A之一典型反及串中之每一記憶體 單凡之記憶體狀態切割。在一記憶體陣列之行方向,給定 之範例係一 32單元反及串。在談列方向之反及串之一記憶 庫形成反及串的一頁。一字線係耦合至沿著每一列之每一 記憶體單元之全部控制閘極。因&,每一反及串將呈有字 線乳〇至WL31加上定位在反及串之記憶庫之任—端之二 列選擇電晶體之選擇線SGS與咖。記憶體單元的一頁係 平行地程式化或讀取。在一具體實施例中,一⑷頁係由 偶行間的-列記憶體單元所形成,而且—(奇)頁係由奇行 間的一列記憶體單元所形成。在另—具體實施例中,一全 頁係由沿著一列或盆一部八 ^邛刀的連縯運行之記憶體單元所形 成0 在圖6B所示之Μ方案中,將每-記憶體單元加以切 割,以儲存四可能記憶體狀態之-。如藉由圖4A至舰 圖5A至5E中給定之範例所說明’該四可能記憶體狀態係 以兩位元加以編碼°可將該二邏輯位元表示成-下位元 127626.doc -29- 200849259 ("L")及一上位元("u”)。囡 ,,,.,At 口此,一反及串中之每一記憶體 早兀係組怨成用以儲存二位元之資料,亦即"L/U,,。 圖7說明在—反及串中之記憶體單減之末端引入額外 憶體單元的—先前解決方案。因為該等虛設記憶體 早凡現在係緊鄰該等選擇電晶體與該反及串之末端,其將 經::大部分咖效應(見頂部與底部圖)。然*,在:等U (d) describes the 4 state memory = bit that is encoded by the Gray code: the required read operation. Because by (1, the encoded heart-like evil A) and the "B" encoded by (0,0) have both as their subordinates, when a memory unit is programmed to state &quot "A" or "B", when the lower bit is detected "0". Conversely, when the memory unit is not stylized and in the state "U" or program< to state"c&quot When the time is measured, the lower bit "1" is detected. Therefore, the next page read will require a 2-pass read, individually relative to the boundary threshold voltages DA and Dc. Figure 4E illustrates the The Gray code encodes the read operation required by bit 7G of the 4 state memory. It will require a read of the boundary threshold voltage DkreadB. In this way, it will detect that it has less than the program. Any cell of the threshold voltage is in the memory state ", and vice versa. When the second pass is stylized, the Gray code, 2-pass stylization scheme can become a problem. Example #, the upper page bit The meta is stylized as "〇, and the lower bit is "1" will cause a change from (1, metamorphosis) To (G, D. & requires that the memory unit is gradually programmed from "U" through "A" and "B" to "c". If there is a power interruption before the stylization is completed, then The memory unit will end in the state of the transition memory - for example "A". # When reading the memory unit, ''A' will be decoded into the logic state (丨, 〇). This gives the above and The lower one is not the correct result because it should be (〇, 1}. Similarly, if the stylized interrupt is reached when the "B" is reached, it will correspond to (〇, 〇). The code is correct, but the lower bit is still wrong. In addition, because of the possible unsynchronized state "u" from the 127626.doc -25- 200849259 until the possible change of the most stylized state "c", this code scheme has an emphasis on The effect of the potential difference between the charge levels of adjacent units stylized at different times. Therefore, it also increases the field effect between adjacent floating gates (''Yupin effect π). Figure 5Α to 5Ε illustrate another Logic code ("LM,, code") coded 4 state memory program And reading. This code provides more fault tolerance and mitigates the adjacent unit coupling caused by the Yupin effect. Figure 5A illustrates the 4-state memory array when each memory unit stores the two-dimensional data of the lmm code. The threshold voltage distribution. The LM code is different from the conventional Gray code shown in Fig. 7A, wherein for the state, A,, and, c,,, and so on are inverted. The LM" code has been disclosed in U.S. Patent No. 6,651,891, and it is advantageous to reduce the field effect coupling between adjacent floating gates by avoiding the stylized operation requiring a large change in charge. As will be seen in Figures 5B and 5C, each stylized operation results in a modest change in the charge of the charge storage unit, as is apparent from the modest change in the threshold voltage VT. The code is designed to program and read the lower and upper bits separately. When the lower bit is programmed, the threshold level of the unit may still be in the unprogrammed area, or moved to the middle and lower of the threshold window. The margin of any of the two zones is allowed to advance to a slightly higher level that does not exceed one quarter of the threshold window. Figure 5B illustrates an existing, two-round program using the LM code. The next page is stylized in the scheme. The fault-tolerant LM code basically prevents any upper page stylization from changing through any intermediate state. Therefore, the first round of the next page is stylized 127626.doc -26· 200849259 to make the logic state ( 1, i) transition to an intermediate state (x, 0), such as by stylizing the "unprogrammed" memory state "U" to (x, 〇) specified and having a broad distribution greater than DA but less than One of the stylized threshold voltages between Dc is represented by an intermediate grievance. During stylization, the intermediate state is verified against a boundary DVA. Figure 5C illustrates the existing, 2 rounds in use of the LM code. Stylized on the top page of the stylized scheme. Stylize the upper page bit In the second round p of "〇", if the next page bit is at "1, then by unsorting, the memory state "U" is stylized to the "quote" , the logic state (1, 丨) changes to (〇, 1). If the next page bit is at "〇", the logic state (7), 〇) is stylized from the "middle" state to "Β" Similarly, if the previous page is still in "Γ, and the next page has been programmed to "〇", it will require a transition from the intermediate state to (1,0), as by This, the intermediate "state" is represented by "c". Since the upper page stylization only involves stylization to the next adjacent memory state, there is not a significant amount of charge changing from one round to another. From "U" to a rough, intermediate, state, the page stylization system is designed to save time. Figure 5D illustrates the read operation required to identify the lower level τ of the 4-state memory encoded with the LM code. The decoding will look at whether the previous page has been programmed. If the previous page has been programmed, reading the next page will require a read of readB relative to the cutoff threshold DB. On the other hand, if the previous page has not been programmed, the next page is stylized to the , middle, state (Fig. 5B), and readB will cause an error. Instead, reading the next page will require a read of readA relative to the demarcation threshold voltage DA. In order to distinguish the 127626.doc • 27- 200849259 two cases, a flag ("lm" flag) is written to the previous page when the upper page is stylized. During a read, it is assumed that: The upper page has been programmed, and thus the -readB operation will be performed. If the LM flag is read, the assumption is correct and the read operation is performed. On the other hand, if the first read does not generate a flag Then, it will indicate that the upper page has not been programmed, so the next page will have to be read by a readA operation. Figure 5E illustrates the read required to identify the top state of the 4-state memory encoded with the LM code. Take the operation. As is clear from the figure, the upper page read will require a two-pass read of the coffee dA and readC, individually relative to the threshold voltages DA and Dc. Similarly, if not yet programmed On the previous page, the decoding of the previous page can also be confused by the middle "state. The LM flag will indicate whether the upper page has been programmed. If the upper page is not programmed, the reading will be poor. The material is reset to " 1 ", indicating that the previous page was not programmed. Figure 6A illustrates the effect of a conventional gidl sensing error between various memory cells in a string. This example shows a reverse string with 32 C/§ memory cells in series and associated with word lines WL0 through WL3 1. Each memory single 7G is cut to store one of four possible memory states (represented by 2 bits). Fig. 6A shows the threshold voltage of the four memory states, which is the memory cell of the one of the memory cells and the memory cell. Both of the three locations are adjacent to the select transistors (or gates). In particular, the memory cell that is extremely adjacent to the source of the string has its control gate connected to the word line WL0, and the memory bank 7L that is not extremely adjacent to the string has its control gate connected to the word line WL3. . The remaining memory cells are resident in the core region of the far-and-reverse string and are associated with the word line WL1SWL3〇. 127626.doc -28- 200849259 It will be seen from Fig. 6 that the normal distribution (middle) of the four memory states is given by the memory cells resident in the core regions (WL1 to WL30). However, due to the GIDL effect highlighted at the end of the inverse string, the distribution of the memory cells (WL〇) adjacent to the source selective transistor (bottom map) is shifted to a higher threshold voltage. This can generate an error, as for example, the shifted "01" state can be misread as a "00" state. Similarly, the same error affects the memory cell adjacent to the drain selective transistor ( WL3丨) (see the top figure) Figure 6B illustrates a memory state cut associated with each memory in a typical inverse of the string of Figure 6A. In the direction of the memory array, the given example is one 32-unit inverse and string. One of the memory banks forms a page opposite to the string in the direction of the column. A word line is coupled to all control gates of each memory cell along each column. ;, each reverse string will be presented with a word line nipple to WL31 plus a memory located in the opposite of the string - the second column of the selection transistor selection line SGS and coffee. One page of the memory unit Parallel to program or read. In one embodiment, one (4) page is formed by inter-row-column memory cells, and - (odd) pages are formed by a column of memory cells between odd rows. In another embodiment, a full page is made up of a column or a basin ^The memory unit of the continuous operation of the sickle is formed by 0. In the scheme shown in Fig. 6B, each memory unit is cut to store the four possible memory states - as shown by Figure 4A to the ship. The examples given in Figures 5A through 5E illustrate that the four possible memory states are encoded in two bits. The two logical bits can be represented as -lower bits 127626.doc -29- 200849259 ("L") And an upper bit ("u").囡 , , ,.,At mouth, one and every memory in the string. The early squad is used to store the information of the two bits, that is, "L/U,. Figure 7 illustrates the previous solution for introducing additional memory cells at the end of the memory subtraction in the string. Because these dummy memories are now in close proximity to the end of the selection transistor and the end of the string, it will pass:: Most of the coffee effect (see top and bottom). However, at:

單元之放應不重要,因為該等虛設單元未用以儲存任 何資料。同時,可卩類似於us_2〇〇6_〇i98i95-Ait建議之 方案的#式將中間電壓施加於該等虛設單元之字線,以 便減輕该GIDL效應。因此,連接至界£〇至131之記憶體 單元將不受影響(見中間圖)。 団谠月典型反及串中之每一記憶體單元之記憶體狀 悲切割’其中-虛設單元之新增類似於圖7 A。該反及串中 之正規記憶體單元(WL0至WL3丨)將各組態成用以儲存該2 一 >料之下與上位元兩者。該額外虛設單元將不加以程 式化。 圖7C說明一典型反及串中之每一記憶體單元之記憶體狀 怎切割,其中兩虛設單元之新增類似於圖7 A。該反及串中 之正規記憶體單元(WL0至WL3丨)將各組態成用以儲存該2 位元貝料之下與上位元兩者。在該記憶體單元鏈之兩端之 額外虛設單元將加以程式化。 適應性記憶體狀態切割 圖8 A說明根據本發明之一通用具體實施例的一種克服一 反及串之末端記憶體單元之gidl錯誤之方案。基本上, 127626.doc -30- 200849259 從圖6 A中所示之習知情況,需要一最小改變。該主要差異 在於在該反及串之末端之記憶體單元係組態成用以儲存二 進制貝料,取代多狀態資料。該末端記憶體單元(例如, WL0與WL32)以二狀態切割其臨限窗,其較該四狀態情況 間隔更開,所以該額外容限將允許該二狀態為可區分,不 管在該反及串之末端2GIDL感應錯誤。若該習知反及串 係指定成具有32單元,各能夠儲存一 2位元資料(每串 32x2 = 64位元),則該目前方案僅需將一額外記憶體單元新 增至該鏈,所以該相同64位元電容現在具備(每串 31x2+2x1 位元;)。 圖8B說明一典型反及串中之每一記憶體單元之記憶體狀 態切割,其係使用圖8 A之適應性記憶體狀態切割方案。正 常下,該反及串中之核心記憶體單元(^¥1^1至1乙31)將各組 態成用以儲存該2位元資料之下與上位元兩者。該兩端單 兀(WL0與WL32)將各組態成用以儲存二進制資料,相較於 該正常情況,該等狀態間具有一較大容限。 圖8C說明一種使用圖5八至5E中所述之2位元lm編碼之 交替較佳方案。在圖5A至5E所述之LM編碼中,該等2位元 可以分離之二遍程式化。該第一遍用於程式化該下邏輯位 元,而且該第二遍用於同時程式化在相同記憶體單元之上 途輯位元。该LM編碼之本質使該下位元切割且有_今上 位元或組合之2位元更寬的一容限。因此,相較於該1位 元,就干擾方面,該下位元程式化較穩健。為了從一現存 Z ^思體糸統獲得一最小改變,較佳地,一反及鍵中 山 127626.doc •31 - 200849259 單元之二進制位元之程式化利用該以碼之下位元(或頁)程 式化。然而,將瞭解,該二進制位元之一用以代表該2位 元LM碼之下位元’而且該另一二進制位元用以代表該2位 元LM碼之上位元。 圖9係一流程圖,其說明該適應性記憶體切割方案。 步驟300··提供一非揮發性記憶體,其具有組織成反及 _之記憶體單元的-陣列’每—記憶體單元係—電荷儲存 1晶體’其具有-源極與汲極、-電荷儲存元件以及一控 制閘極,每-反及串具有一源極端與一沒極端,而且由一 系列電荷健存電晶體所形成’該等電荷儲存電晶體藉由一 單元之汲極菊鏈至相鄰電荷儲存電晶體之源極,而且可藉 由一源極選擇電晶體切換至該源極端,而且可藉由一汲極 選擇電晶體切換至該汲極端; 步驟310:將每一反及串之記憶體單元區分成一第一群 組與一第二群組,該第二群組之記憶體單元係與可能該源 〇 極選擇電晶體或該汲極選擇電晶體相鄰,而且該第一群組 之記憶體單元係該第二群組之互補; 、 步驟320 ··在該第一群組之每一記憶體單元中儲存一第 • 一預定位元數之資料;以及 * 步在《二群組之每-記憶體單以儲存小於 該弟一預定數目的一第二預定位元數之資料。 在-具體實施例中’其中-記憶體係設計成每單元儲存 兩位元,此二位元的一單元將為:該二位元之一儲存於與 一反及串之一端相鄰的一記憶體單元,而且該二位元之另 127626.doc -32 · 200849259 一者儲存於緊鄰該另一 ,^ 鳊之另一記憶體單元。 在另一具體實施例中,Α 存三位元,此三位元的—單^憶體係設計絲單元儲 等位元之二,而且另_端:=?一端記憶體單元儲存該 ,. σ己隐體單凡儲存該等位元之一。 本文所引用的全部專利 肖案、文章、其他公止 案、文件及内容皆出於各 、“ 太 的而以引用的方式全文併入 本文中。在任何併入之公止安 ^ —士 Α 口木、文件或内容與本文件之本The placement of the units should not be important as they are not used to store any information. At the same time, an intermediate voltage can be applied to the word lines of the dummy cells in a manner similar to the scheme proposed by us_2〇〇6_〇i98i95-Ait to mitigate the GIDL effect. Therefore, the memory cells connected to the boundary 131 to 131 will not be affected (see the middle figure). The month of the month is typical of the memory of each memory cell in the string. The sadness of the memory cell is similar to that of Figure 7A. The normal memory cells (WL0 to WL3丨) in the inverted string are each configured to store both the underlying and upper bits. This extra dummy unit will not be programmed. Fig. 7C illustrates how the memory of each of the memory cells in a typical inverse and the string is cut, wherein the addition of the two dummy cells is similar to that of Fig. 7A. The normal memory cells (WL0 to WL3丨) in the inverted string are each configured to store both the underlying and the upper bits of the two bits. Additional dummy cells at both ends of the memory cell chain will be stylized. Adaptive Memory State Cutting FIG. 8A illustrates a scheme for overcoming the gidl error of a terminal memory cell in accordance with a general embodiment of the present invention. Basically, 127626.doc -30- 200849259 requires a minimal change from the conventional situation shown in Figure 6A. The main difference is that the memory cells at the end of the inverse string are configured to store binary beakers instead of multi-state data. The end memory cells (eg, WL0 and WL32) cut their threshold window in two states, which are more open than the four state condition, so the additional tolerance will allow the two states to be distinguishable, regardless of the inverse 2GIDL sensing error at the end of the string. If the conventional inverse string is specified to have 32 units, each capable of storing one 2-bit data (32x2 = 64 bits per string), then the current scheme only needs to add an additional memory unit to the chain. So the same 64-bit capacitor is now available (31x2+2x1 bits per string;). Figure 8B illustrates a memory state cut of each memory cell in a typical inverse and string using the adaptive memory state cutting scheme of Figure 8A. Normally, the core memory cells (^¥1^1 to 1B 31) in the reverse string are configured to store both the underlying data and the upper bit. The two ends (WL0 and WL32) are each configured to store binary data, which has a greater tolerance than the normal condition. Figure 8C illustrates an alternate preferred scheme using the 2-bit lm encoding described in Figures 5-8E. In the LM encoding described in Figures 5A through 5E, the two bits can be separated by two passes. The first pass is used to program the lower logical bit, and the second pass is used to simultaneously program the bit on the same memory cell. The nature of the LM code causes the lower bit to be cut and has a wider tolerance than the upper bit or the combined two bits. Therefore, compared to the 1 bit, the lower bit is more stable in terms of interference. In order to obtain a minimal change from an existing Z-Study system, preferably, a programmatic use of the binary bits of the key 127626.doc • 31 - 200849259 unit uses the sub-bit (or page) below the code. Stylized. However, it will be appreciated that one of the binary bits is used to represent the bit element below the 2-bit LM code and the other binary bit is used to represent the bit above the 2-bit LM code. Figure 9 is a flow chart illustrating the adaptive memory cutting scheme. Step 300··providing a non-volatile memory having an array-memory-memory cell-charge storage 1 crystal organized into a memory cell having a source and a drain and a charge a storage element and a control gate, each of which has a source terminal and a terminal, and is formed by a series of charge storage transistors. The charge storage transistors are daisy-chained by a unit to The source of the adjacent charge storage transistor is switched to the source terminal by a source selection transistor, and can be switched to the 汲 terminal by a drain selection transistor; Step 310: The memory unit of the string is divided into a first group and a second group, and the memory unit of the second group is adjacent to the source drain selection transistor or the drain selection transistor, and the first a group of memory units is complementary to the second group; step 320 · storing a data of a predetermined number of bits in each memory unit of the first group; and * stepping "Every group of two - memory is stored less than The younger brother has a predetermined number of information on a second predetermined number of bits. In a specific embodiment, the memory system is designed to store two bits per cell, and a unit of the two bits will be: one of the two bits is stored in a memory adjacent to one end of the inverted string The body unit, and the other two of the two bits 127626.doc -32 · 200849259 are stored in another memory unit next to the other one. In another embodiment, the three-bit memory is stored, and the three-bit system is designed to store the second element of the wire unit, and the other _ terminal: =? one end memory unit stores the sigma. One of the bits is stored in the hidden body. All patents, articles, other public notices, documents and contents cited in this article are hereby incorporated by reference in their entirety, and are incorporated herein in their entirety by reference. Mouth, file or content and the basis of this document

文間’右有一術語之定羞式 疋義或使用之任何不一致或衝突,本 文件中之術語之定義或使用應為優先。 '、上面已、”工參考各具體實施例來說明本發明,不過, =將會瞭解,可對本發明進行修改與修正而不會脫離僅 由化附中請專利範圍及其等效範圍所界定 本文所參考的所有參考資料均以引用的方式併人本文中。 【圖式簡單說明】 圖1A係一反及串的一俯視圖。 圖1B係该反及串的一等效電路圖。 圖1C係圖1A之反及串的一斷面圖。 圖2 A係缚示三反及串的一電路圖。 圖2B顯示一程式化之8單元反及串。 圖2C顯示用於—8單元反及串之—自我升壓技術之影 圖2D顯示一 8單元反及串之GIDL效應。 圖2E顯示當程式化一記憶體單元時中間電壓之施加。 圖2F顯示當程式化字線WL〇時之GIDL效應。 127626.doc -33- 200849259 圖3A係一非揮發性記憶體系統之一具體實施例的一方塊 圖,其中實施本發明之各種態樣。 圖3B顯示一記憶體陣列之一組織的一範例。 圖4A說明當每一記憶體單元儲存使用一習知格雷碼之兩 位元資料時該4狀態記憶體陣列之臨限電壓分布。 圖4B說明在一使用該格雷碼之現存、2遍程式化方案中 之下頁程式化。 /The definition or use of terms in this document shall take precedence if there is a misrepresentation or use of any inconsistency or conflict in the term. The present invention has been described with reference to the specific embodiments thereof, however, it will be understood that the invention may be modified and modified without departing from the scope of the invention as defined by the scope of the invention and its equivalents. All references are incorporated herein by reference. [FIG. 1A is a top view of a reversed string. Figure 1B is an equivalent circuit diagram of the inverted string. Figure 1C is a diagram 1A is a cross-sectional view of the string. Figure 2A is a circuit diagram showing the triple-reverse and string. Figure 2B shows a stylized 8-unit inverse and string. Figure 2C shows the -8 unit inverse and string Image 2D of the self-boosting technique shows the GIDL effect of an 8-cell inverse and string. Figure 2E shows the application of the intermediate voltage when staging a memory cell. Figure 2F shows the GIDL effect when the word line WL is programmed. 127626.doc -33- 200849259 Figure 3A is a block diagram of one embodiment of a non-volatile memory system in which various aspects of the invention are implemented. Figure 3B shows an example of organization of a memory array. Figure 4A illustrates when each memory unit The use of a conventional memory state two yuan 4 Gray code data of the temporary memory array threshold voltage distributions. FIG. 4B illustrates the use of a Gray code of the existing, 2-pass under a stylized embodiment in stylized page. /

圖4C說明在一使用該格雷碼之現存 之上頁程式化。 2遍程式化方案中 圖4D說明用以辨別以該格雷碼加以編碼之々狀態記憶體 之下位元所要求之讀取操作。 圖4E說明用以辨別以該才各雷碼力口以編碼之#狀態記憶體 之上位元所要求之f胃取操作。 +圖5A說明當每一記憶體單元儲存使用該lm碼之兩位元 資料時該4狀態記憶體陣列之臨限電壓分布。Figure 4C illustrates the stylization of an existing page using the Gray code. In the 2-pass stylization scheme, Figure 4D illustrates the read operation required to identify the bits below the state memory encoded by the Gray code. Figure 4E illustrates the f-gastric operation required to identify the upper bits of the #state memory encoded with the code. + Figure 5A illustrates the threshold voltage distribution of the 4-state memory array when each memory cell stores the two-dimensional data of the llm code.

圖5B說明在一使用該!^^碼之現存、2回合程式化方案中 之下頁程式化。 ^ 圖5C說明在—使用該LM碼之現存、2回合程式化方案中 之上頁程式化。 以編碼之4狀態記憶體之 以編碼之4狀態記憶體之 圖5D說明用以辨別以該lm碼加 下位元所要求之讀取操作。 圖5E說明用以辨別以該lm碼加 上位元所要求之讀取操作。 圖6A說明在一習知反及 串中之各種記憶體單元間之 127626.doc -34- 200849259 GIDL感應錯誤之效應。 圖6B說明關聯於圖6八之—典型反及串中之每 單元之記憶體狀態切割。 圖7 A說明在一反及串巾夕士卜立 一 久汉甲甲之,己fe體早凡鏈之末端弓丨入 虛設記憶體單元的一先前解決方案。 卜 “圖職明-典型反及串中之每一記憶體單元之記憶體狀 悲切割,其中一虛設單元之新增類似圖7A。Figure 5B illustrates the use of this! The ^^ code is in the existing, 2-round stylized scheme. ^ Figure 5C illustrates the top page stylization in the existing, 2-round stylization scheme using the LM code. Figure 5D, which illustrates the encoded 4-state memory of the encoded 4-state memory, is used to identify the read operations required to add the lower bits by the lm code. Figure 5E illustrates the read operation required to identify the bit in the lm code. Figure 6A illustrates the effect of GIDL sensing errors between various memory cells in a conventional inverse string. Figure 6B illustrates the memory state cut associated with each of the elements in the typical inverse and string of Figure 68. Fig. 7A illustrates a prior solution to the singularity of the singularity of the singularity of the singularity of the singularity of the singularity.卜 “Figures----------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------

L.J 圖7C說明一典型反及串中之每一 At <母σ己憶體早凡之記憶體狀 悲切吾彳,其中兩虛設單元之新增類似圖。 圖8Α說明才艮據本發明之一通用*體實施例的一種克服一 反及串之末端記憶體單元之gidl錯誤之方案。 π請說明一典型反及串中之每一記憶體單元之記憶體狀 態切割’其係、使用圖8八之適應性記憶體狀態切割方案。 圖8C說明一種使用圖从至沾中所述之2位元lm編碼之 交替較佳方案。 圖9係說明該適應性記憶體切割方案的一流程圖 【主要元件符號說明】 電晶體 控制閘極 浮動閘極L.J Figure 7C illustrates a typical inverse and a string of At < mother σ 忆 体 早 早 早 早 早 早 早 早 早 早 早 早 早 早 早 早 早 早 彳 彳 彳 彳 彳 彳 彳 彳 彳 彳 彳 彳 彳 彳 彳Figure 8 is a diagram showing a solution to overcome the gidl error of the end memory unit of the string according to one of the general embodiments of the present invention. π Please describe the memory state of each of the memory cells in a typical inverse and the system, using the adaptive memory state cutting scheme of Figure 8. Figure 8C illustrates an alternate preferred scheme for encoding from a 2-bit lm as described in the image. Figure 9 is a flow chart showing the adaptive memory cutting scheme. [Main component symbol description] Transistor Control gate Floating gate

100 、 102 、 104 、 106 100CG、102CG、104CG、 106CG、120CG、122CG 100FG、102FG、104FG、 106FG 120 第一選擇閘極 弟一選擇閘極 127626.doc -35 122100, 102, 104, 106 100CG, 102CG, 104CG, 106CG, 120CG, 122CG 100FG, 102FG, 104FG, 106FG 120 First selection gate First selection gate 127626.doc -35 122

200849259 126 128 130 、 132 、 134 、 136 、 138 140 142 、 202 、 204 > 206 220 > 230 > 240 > 250 222 > 224 > 226 、 228 > 242 > 244、246、248、222Α、224Α、 226Α、228Α 252 302 304 306 308 310 312 314 316 318200849259 126 128 130 , 132 , 134 , 136 , 138 140 142 , 202 , 204 > 206 220 > 230 > 240 > 250 222 > 224 > 226 , 228 > 242 > 244, 246, 248 , 222Α, 224Α, 226Α, 228Α 252 302 304 306 308 310 312 314 316 318

SGD、SGS WLO、WL1、WL2、WL3 位元線 源極線 N+擴散層 p井區 反及串 選擇電晶體 記憶體單元 升壓通道 記憶體單元陣列 行控制電路 列控制電路 P井控制電路 C源極控制電路 資料輸入/輸出緩衝器 命令電路 狀態機 控制器 選擇線 字線 127626.doc -36-SGD, SGS WLO, WL1, WL2, WL3 bit line source line N+ diffusion layer p well area inverse and string selection transistor memory unit boost channel memory cell array row control circuit column control circuit P well control circuit C source Pole control circuit data input/output buffer command circuit state machine controller select line word line 127626.doc -36-

Claims (1)

200849259 十、申請專利範圍: 1 · 種將資料儲存於一具有經組織成反及电一“ 一記惟辦置 元陣列之非揮發性記龍中的方法,每—記憶” -電荷儲存電晶體’其具有一源極與汲極…“ 元件以及-控制間極’每一反及串具有_源極端:儲: 極端且係由—系列電荷儲存電晶體所形成,該等電儲 存電晶體藉由-單元之汲極菊鏈至相鄰電荷儲存電= …,而且可藉由一源極選擇電晶體切換至該源極 鈿,而且可精由一汲極選擇電晶體 方法包括: 吳至4及極端,該 -將每-反及串之記憶體單元區分成—第一群組與一第 體::、:亥弟一群組之記憶體單元係與該源極選擇電晶 ㈣該=選擇電晶體相鄰,而且該第—群組之記憶體 早70係5亥弟二群組之互補; X第群、、且之每一兄憶體單元中儲存一第一預定位 元數之資料;以及 :第二群組之每一記憶體單元中儲存小於該第一預 疋數目的一第二預定位元數之資料。 2· Π求項1之方法,其中該健存係藉由平行程式化在反 之#應頁間具有一共同字線之記憶體單元的一 貝0 〜直\員2之方法,其中記憶體單元之該頁係藉由使電 氣:電荷儲存元件移除而被初始採除。 月长項1之方法,其_該第-預定位元數之資料係2位 127626.doc 200849259 元資料。 5·如請求項4之方法,其中:〜 兩記憶體單元,該$ 1該第二群組之記憶體單元含有 w两記恃 w _ 資料的一位元。 _早疋各自用於儲存該2位元 6·如請求項4之方法,其中· 名2位70資料由—邏輯第一 組成;以及 位凡及一邏輯第二位元所 該第二群組含有兩記情 第一位元,而且另— 早70,一者用於儲存該邏輯 7.如請求項6之方半 用於儲存該邏輯第二位元。 只0 t万法,其中兮# 一 元,該兩記憶體單元各u"且含有兩記憶體單 輯位元。 用於儲存該2位元資料的一邏 8·如明求項1之方法,其中該第——— 元資料。 —預定位元數之資料係3位 9.如請求項8之方法,其 兩記憶體單元,該兩記憶體^二群組之記憶體單元含有 資料的一或二位元。 -早7°各自用於儲存該3位元 1〇·如請求項8之方法,其中: 該3位元資料由一邏輯第* 一 -邏輯第三位元所組成;以&兀、-邏輯第二位元與 4第二群組含有兩記憶 第一位$,而且另_者田凡’一者用於儲存該邏輯 元。 用於儲存該邏輯第二與第三位 11·如請求項1〇之方法, /、中該第二群組含右A 3有兩記憶體單 127626.doc 200849259 元,該兩記憶體單元I自用於儲存該3位元資料的一或 一邏輯位元。 12. f 種將貧料儲存於一具有經組織成反及 一元陣之非揮發性記憶體中的方法,每一記憶體= 電何儲存電晶體,其具有-源極與-汲極、一電荷儲 存兀件以及一控制閘極,每一反及串具有一源極端與一 汲極端且係由_系列電荷㈣電晶體所形成,該等電荷 儲存電日日體藉由-單元之汲極菊鏈至相鄰電荷儲存電晶 體之源極,而且可藉由—源極選擇電晶㈣換至該源極 知’而且可藉由一汲極選擇電晶體切換至該汲極端,該 方法包括: 母反及串之5己憶體單元區分成一第一群組與一第 羊、’且°亥第一群組之記憶體單元係與該源極選擇電晶 ,或該沒極選擇電晶體相鄰’而且該第—群組之記憶體 早元係5亥弟一群組之互補; 組態該第-群組之每一記憶體單元,以儲存一第一預 定位元數之資料;以及 組態該第二群組之每一記憶體單元,以儲存小於該第 一預定數目的一第二預定位元數之資料。 明长項12之方法,其中該儲存係藉由平行程式化在反 及串之一對應頁間具有_共同字線之記憶體單元的一 頁。 如明求項13之方法,其中記憶體單元之該頁係藉由使電 荷從其電荷儲存元件移除而被初始抹除。 127626.doc 200849259 15.如請求項12之方法,其中該第一預定位元數之資料係2 位元資料。 16·如請求項15之方法,其中該第二群組之記憶體單元含有 兩記憶體單元,該兩記憶體單元各自用於儲存該2位元 資料的一位元。 17·如請求項15之方法,其中: 該2位元資料由一邏輯第一位元與一邏輯第二位元所 組成;以及 斤該第二群組含有兩記憶體單元’―者用於儲存該邏輯 第-位元,而且另-者用於儲存該邏輯第二位元。 18.如請求項17之方法,其中螻篦_ 、宁°亥弟—群組含有兩記憶體單 兀,該兩記憶體單元各自用於儲存 輯位元。 #存桃W料的一邏 19·如請求項12之方法,复 位元資料。 〃中預定位元數之資料係3 2〇·如請求項19之方法,其中嗲 兩記憶體單元,該兩記憶體單=、、且之記憶體單元含有 資料的—或二位元。 ⑦自用於儲存該3位元 21·如請求項19之方法,其中: 位元資料由一邏輯第一位元、_、 一邏輯第三位元所組成;以及 邏輯第二位元與 第 元 該第二群組含有兩記憶體單元 一位元’而且另-者用於儲存該邏二於儲存該邏輯 、饵弟二與第三位 127626.doc 200849259 22. 如凊求項21之方法,其中該第二群組含有兩記憶體單 凡,該兩記憶體單元各自用於儲存該3位元資料的一或 一邏輯位元。 23. —種非揮發性記憶體,其包括: 經組織成反及串之記憶體單元的一陣列, 每一記憶體單元係一電荷儲存電晶體,其具有一源極 與;及極、一電荷儲存元件以及一控制閘極, 每-反及串具有-源極端與一没極端且係由—系列電 荷儲存電晶體所形成,該等電荷儲存電晶體藉由一單元 之及極⑽至㈣電荷儲存電晶體之祕,而且可藉由 源極選擇電晶體切換至兮源J.-T , U, 、 7谀至该源極蝙,而且可藉由一汲極 選擇電晶體切換至該汲極端,且其中: 每一反及串由一第一群袓盥一 f、、且興弟一群組之記憶體單 兀所組成,其中該第二群組之 _ f、、之记隐體早70係與該源極選 擇電晶體或该》及極選擇雷曰辦士 Lj k擇冤日日體相鄰,而且該第一群組之 吞己憶體單元係該反及串中之篦- 甲T之弟一群組之互補; 用於在該第一群4且夕. 爷、、且之母一記憶體單元中儲存一第一 預定位元數之資料的儲存構件;以及 用於在ό亥弟_群組之每_印产轉W — ^ ^ ^ ^ °己丨思體早兀中儲存小於該 弟一預疋數目之一第二子舊定# - ^ 預疋位兀數之資料的儲存構件。 24·如凊求項23之記憶體,其中 卜 Τ用於儲存之該構件係藉由平 仃程式化在反及串之一對岸 了應頁間具有-共同字線之記憶 體早的*頁。 25·如請求項24之記憶體,其中 己k、體早儿之該頁係藉由使 127626.doc 200849259 電何從其電荷儲在_ 子兀件移除而被初始抹除。 2 6 ·如凊求項2 3之記怜辦 匕體,其中該第一預定位元數 f # # 2位元資料。 双炙貝枓係 2 7 ·如請求項2 6之記悟辦 ^ L 、體’其中該第二群組之記憶體單元含 有兩記憶體單亓,〜1 元次〜兩記憶體單元各自用於儲存該2位 兀貝料的一位元。 28.如請求項26之記憶體,其中·· 該2位元資料由一邏輯 組成,·以及 ' 该弟二群組含有兩記情 n u體早兀,一者用於儲存該邏輯 70,而且另—者用於儲存該邏輯第二位元。 29·如請求項28之記憶體,1中 - ^ 〇 '、中該弟一群組含有兩記憶體單 兀,4兩記憶體單元各自用 輯位元。 自用於儲存该2位元資料的一邏 3〇.如請求項23之記憶體,其中該第一預定 Ο 3位元資料。 U数之貝枓係 31.如請求項3〇之記憶體,其中該第二群組之記憶體… 有兩記憶體單元,該兩記悴 Μ _早兀各 元資料的一或二位元。L體早-各自用於儲存該3位 32·如請求項30之記憶體,其中· 該3位元資料由一邏极 今罘一位元、一邏辍楚― 一邏輯第三位元所組成;以及 一位7L與 該第二群組含有兩記憶體單元, 第一位元,而且另一者用於儲存該邏輯 者用於儲存該邏輯第二與第三位 127626.doc 200849259 元。 33. 如請求項32之記憬护,甘 一. " ”中垓第二群組含有兩記憶體單 凡,該兩記憶體單元久έ田# 用於儲存該3位元資料的一或 二邏輯位元。 貝Τ十扪忒 34. —種非揮發性記憶體,其包括: :組織成反及串之記憶體單元的一陣列, 每一記憶體單元係—雷丼冲六 η電何儲存電晶體,其具有一源極 極、—電荷儲存元件以及-控制閘極, 每-反及串具有一源極端與—沒極端且係由一系列電 荷儲存電晶體所形成,該等電荷儲存電晶體藉由一單元 之汲極菊鏈至該相鄰電荷儲存電晶體之源極,而且可藉 由一源極選擇電晶體切換至該源極端,而且可藉由一= 極選擇電晶體切換至該汲極端,且其中: 每-反及串由-第-群組與—第二群組之記憶體單 元所組成,其中該第二群組之記憶體單元係與該源極選 擇電晶體或該汲極選擇電晶體相鄰,而且該第一群組之 記憶體單元係該反及串中之第二群組之互補· 該第一群組之記憶體單元係組態成可程式化至一第 一預定數目之記憶體狀態之一;以及 該第二群組之記憶體單元係組態成可程式化至一第 二預定數目之記憶體狀態之-’該第二預定數目小於該 第一預定數目。 " 35·如請求項34之記憶體,其中在反及串之_對應頁間具有 127626.doc 200849259 化與讀取。 36. 如睛求項35之記憶體,豆中 " 版具Τ δ己憶體早兀之该頁係藉由使 “何從其電荷财元件移除而被初始抹除。 37.如請求項34之記憶體 2位元資料。 ,其中該第一預定位元數之資料係 38.如請求項37之記憶體,其中該第二群組之記憶體單元含 有兩記憶料元,該兩記憶體單元各自詩儲存該2位 元資料的一位元。 39.如請求項37之記憶體,其中·· 一邏輯第二位元所 該2位元資料由一邏輯第一位元與 組成;以及 該第二群組含有兩記憶體單元,一者用於儲存該邏輯 第一位元,而且另一者用於儲存該邏輯第二位元。 40. 如凊求項39之記憶體’其中該第二群組含有兩記憶體單 元’该兩s己丨思體早元各自用於儲存該2位元資料的一邏 輯位元。 41. 如請求項34之記憶體,其中該第一預定位元數之資料係 3位元資料。 42·如請求項41之記憶體,其中該第二群組之記憶體單元含 有兩記憶體單元,該兩記憶體單元各自用於儲存該3位 元資料的一或二位元。 43.如請求項41之記憶體’其中: 該3位元資料由一邏輯第一位元、一邏輯第二位元與 一邏輯第三位元所組成;以及 127626.doc 200849259 該第二群組含有兩記憶體單元,一者用於儲存該邏輯 第一位元,而且另一者用於儲存該邏輯第二與第三位 元0 44.如請求項43之記憶體,其中該第二群組含有兩記憶體單 元,該兩記憶體單元各自用於儲存該3位元資料的一或 二邏輯位元。 127626.doc200849259 X. The scope of application for patents: 1 · The method of storing data in a non-volatile recording dragon that has been organized into a counter-electrical system, each memory - charge storage transistor 'It has a source and a drain..." Components and - Control Interpoles Each of the inverse strings has a _ source terminal: a storage: extreme and is formed by a series of charge storage transistors, which From the unit's daisy chain to the adjacent charge storage electricity = ..., and can be switched to the source 钿 by a source selective transistor, and the method of selecting a transistor by a drain includes: Wu to 4 And extremes, the - the memory unit of each-reverse string is divided into - the first group and the first body::,: the memory unit of the group and the source selects the electro-crystal (4) Selecting the transistors adjacent to each other, and the memory of the first group is complementary to the group of the 7th group; the X group, and each of the brothers and the body units stores a first predetermined number of bits. Data; and: each memory unit of the second group stores less than the A pre-existing number of data of a second predetermined number of bits. 2. The method of claim 1, wherein the memory is stored in parallel by a memory unit having a common word line between pages A method of 0 to 2, wherein the page of the memory unit is initially removed by removing the electrical: charge storage element. The method of the term 1 of the month, the_predetermined bit The data of the number is 2 127626.doc 200849259 yuan. 5. The method of claim 4, wherein: ~ two memory units, the $1 memory unit of the second group contains w two records w _ data One yuan. _ early 疋 each used to store the two bits 6. The method of claim 4, wherein the name 2 bits 70 data consists of - logic first; The second group contains two first bits, and another - 70, one for storing the logic 7. The half of the request item 6 is used to store the second bit of the logic. Method, where 兮# is a unit, the two memory units are each u" and contain two memory singular bits. A method of storing the 2-bit data, such as the method of claim 1, wherein the first------------------ The memory unit of the two memory groups contains one or two bits of data. - 7 degrees early for storing the three bits. The method of claim 8, wherein: The bit data consists of a logical *--logic third bit; with &兀, - logical second bit and 4 second group containing two memory first digits, and another__Tian Fan' One is used to store the logic element. The method for storing the second and third bits of the logic 11·such as the request item 1〇, /, the second group containing the right A 3 has two memory sheets 127626.doc In 200849259, the two memory units I are used to store one or one logical bit of the 3-bit data. 12. f is a method of storing a poor material in a non-volatile memory having a microstructure and a matrix, each memory = electric storage transistor, having - source and - drain, one a charge storage element and a control gate, each of the reverse strings having a source terminal and a terminal electrode formed by a series of charge (four) transistors, the charge storage solar cells being dipped by a unit The daisy chain is connected to the source of the adjacent charge storage transistor, and can be switched to the source by the source-selective transistor (4) and can be switched to the gate terminal by a drain-selective transistor, the method comprising : The mother and the 5th memory unit of the string are divided into a first group and a first sheep, and the memory cell of the first group and the source selects the crystal, or the gateless selection transistor Having adjacent ones and the memory of the first group is complementary to a group of 5 haidi; configuring each memory unit of the first group to store data of a first predetermined number of bits; And configuring each memory unit of the second group to store less than the first pre- The number of data a second predetermined number of bits. The method of claim 12, wherein the storing is by parallel staging a page of memory cells having a common word line between the corresponding pages of one of the strings. The method of claim 13, wherein the page of the memory cell is initially erased by removing the charge from its charge storage element. 15. The method of claim 12, wherein the data of the first predetermined number of bits is 2-bit data. The method of claim 15, wherein the memory unit of the second group comprises two memory units, each of the two memory units for storing one bit of the two-bit data. 17. The method of claim 15, wherein: the 2-bit data consists of a logical first bit and a logical second bit; and the second group contains two memory cells' The logical first bit is stored, and the other is used to store the logical second bit. 18. The method of claim 17, wherein the 蝼篦_, 宁°海弟-group comprises two memory cells, each of which is for storing a location bit. #存桃W的一逻辑 19·If the method of claim 12, reset the metadata. The data of the predetermined number of bits in the frame is the method of claim 19, wherein the two memory cells, the two memory cells are =, and the memory cells contain data - or two bits. 7 is for storing the 3-bit 21. The method of claim 19, wherein: the bit data is composed of a logical first bit, _, a logical third bit; and a logical second bit and a third element The second group contains two memory unit ones 'and another one for storing the logic, storing the logic, the bait two and the third place 127626.doc 200849259 22. The method of claim 21, The second group contains two memory units, each of which is used to store one or one logical bit of the 3-bit data. 23. A non-volatile memory comprising: an array of memory cells organized into a plurality of memory cells, each memory cell being a charge storage transistor having a source and a pole a charge storage element and a control gate, each of which has a source terminal and a terminal electrode formed by a series of charge storage transistors, wherein the charge storage transistors are connected by a unit (10) to (4) The charge storage transistor is secret, and can be switched to the source source bat by the source selection transistor to the source J.-T, U, , 7 ,, and can be switched to the 藉 by a drain selection transistor. Extremely, and wherein: each of the reverse strings is composed of a memory group of a first group, a group, and a group of the group, wherein the second group is _f, The early 70 series is adjacent to the source selection transistor or the pole and the selection of the Thunder sergeant Lj k, and the first group of the immersed body unit is the opposite of the string. - A complement of a group of brothers of A T; used in the memory of the first group of 4 and eve. a storage means for storing data of a first predetermined number of bits in the unit; and for storing in each of the _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ One of the pre-existing numbers, the second sub-old, and the storage component of the data of the pre-clamping number. 24. The memory of claim 23, wherein the component used for storage is stored by flattening on one of the opposite sides of the string, and the memory having the common word line between the pages is *page of the * . 25. The memory of claim 24, wherein the page of the body is initially erased by causing the 127626.doc 200849259 to be removed from its charge storage. 2 6 · If you ask for the item 2 3, remember the body, where the first predetermined number of bits f # # 2 bit data. Double Mussels 2 7 · As requested in Item 2 6 ^ L, Body 'where the memory unit of the second group contains two memory units, ~1 yuan ~ two memory units For storing one bit of the two mussels. 28. The memory of claim 26, wherein the two-bit data consists of a logic, and that the two groups of the brothers have two nuances, one for storing the logic 70, and The other is used to store the second bit of the logic. 29. If the memory of claim 28, 1 - ^ 〇 ', the middle group contains two memory cells, and the two memory cells each use a bit. A memory for storing the 2-bit data. The memory of claim 23, wherein the first predetermined Ο 3 bit data. The memory of the U number is 31. The memory of the request item 3, wherein the memory of the second group... has two memory units, and the two records are one or two bits of the metadata. . L body early - each for storing the 3 bits 32. The memory of claim 30, wherein the 3 bit data is composed of a logic element, a bit, a logic, a logical third bit And a 7L and the second group contain two memory units, the first bit, and the other is used to store the logic for storing the second and third bits of the logic 127626.doc 200849259. 33. As requested in Item 32, Gan Yi. " "The second group of Lieutenant contains two memory singles, which are used to store the 3-bit data. Two logical bits. A variety of non-volatile memory, including: an array of memory cells organized into inverse and strings, each memory cell system - Thunder Chong six η How to store a transistor having a source pole, a charge storage element, and a control gate, each of the reverse strings having a source terminal and - not extreme and formed by a series of charge storage transistors, the charge storage The transistor is daisy-chained to the source of the adjacent charge storage transistor by a cell, and can be switched to the source terminal by a source selection transistor, and can be switched by a gate selection transistor. Up to the extreme, and wherein: each-reverse string consists of a --group and a second group of memory cells, wherein the second group of memory cells and the source-selective transistor Or the bungee selection transistor is adjacent, and the memory of the first group The unit is complementary to the second group of the string. The memory unit of the first group is configured to be programmable to one of a first predetermined number of memory states; and the second group The memory unit is configured to be programmable to a second predetermined number of memory states - the second predetermined number is less than the first predetermined number. < 35. The memory of claim 34, wherein In contrast, the _ corresponding page has 127626.doc 200849259 and read. 36. If the memory of the item 35, the bean " version of the Τ 己 己 体 兀 兀 兀 兀 该 该 该 该 该How to remove it from its charge component and be erased initially. 37. Memory 2 bit data as claimed in item 34. The data of the first predetermined number of bits is 38. The memory of claim 37, wherein the memory unit of the second group contains two memory cells, and the two memory cells store the two bits respectively One dollar of the data. 39. The memory of claim 37, wherein: a logical second bit of the binary data consists of a logical first bit; and the second group contains two memory cells, one of which The first bit of the logic is stored, and the other is used to store the second bit of the logic. 40. The memory of claim 39, wherein the second group contains two memory cells, each of which is used to store a logical bit of the 2-bit data. 41. The memory of claim 34, wherein the first predetermined number of bits of data is 3-bit data. 42. The memory of claim 41, wherein the memory unit of the second group comprises two memory units, each of the two memory units for storing one or two bits of the three-bit data. 43. The memory of claim 41 wherein: the 3-bit data consists of a logical first bit, a logical second bit, and a logical third bit; and 127626.doc 200849259 the second group The group contains two memory cells, one for storing the first bit of the logic and the other for storing the second and third bits of the logic 0. 44. The memory of claim 43, wherein the second The group contains two memory cells, each of which is used to store one or two logical bits of the 3-bit data. 127626.doc
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