200822147 九、發明說明： 【發明所屬^技術領域】 發明領域 本毛月係有關於一種檢查諸如液晶顯示器（LCD)用之 5玻璃基板及半導體基板等各種基板，且最好是檢查大型基 板的外觀檢查裝置之基板支持裝置。 本申請案針對2006年9月8日所提出之日本專利申請案 第2006_2他4號线優先權，且在此沿用其内容。 【先前技術;j 10 背景技術 迄今，在諸如液晶顯示器（LCD)及電漿顯示器（PDP)等 平面顯示器的領域中，平面顯示器之製造步驟包括製造玻 离基板及進行缺p曰檢查。缺陷檢查方法包含以目視檢查基 板上之碎屑等異物或傷痕等缺陷的巨觀檢查·，及拍攝經由 15顯微鏡放大後之影像，再透過螢幕等進行觀察的微觀檢查。 當前述檢查之際，選擇性地使用將照明光照射至欲觀 察基板之表面的㈣照明（Incident lighting);或從基板之背 面照射照明光的透射照明來觀察有無缺陷或其缺陷程度。 此外’近幾年來，玻璃基板等逐漸大型化，甚至出現 20邊長超過2m之大尺寸基板，且由於此類大型基板呈薄型， 故基板剛性亦變小。檢查此類基板時，為水平地支持基板， 於載置基板之四角框狀基板托架之開口部，相隔預定間隔 架設棒狀支桿，且於各支桿埋設從背面支撐基板之銷。 在此情況下，如支桿數量過多，透射觀察基板時，支 5 200822147 桿會造成阻礙，故只能安裝必要最4 小限度的數量。再者，200822147 IX. OBJECTS OF THE INVENTION: TECHNICAL FIELD The present invention relates to a substrate for inspecting a glass substrate such as a liquid crystal display (LCD), a semiconductor substrate, and the like, and preferably for inspecting the appearance of a large substrate. Check the substrate support device of the device. The present application is directed to the priority of Japanese Patent Application No. 2006-2, No. 4, filed on Sep. 8, 2006, the content of which is incorporated herein. [Prior Art; j 10 Background Art Heretofore, in the field of flat panel displays such as liquid crystal displays (LCDs) and plasma display panels (PDPs), the manufacturing steps of the flat panel display have included manufacturing of a glass substrate and performing a defect inspection. The defect inspection method includes a macroscopic inspection for visually inspecting defects such as foreign matter or scratches on the substrate, and a microscopic examination of an image enlarged by a microscope and then observed through a screen. At the time of the foregoing inspection, the illumination of the illumination light to the surface of the substrate to be observed is selectively used; or the transmission illumination of the illumination light is irradiated from the back surface of the substrate to observe the presence or absence of defects or the degree of defects thereof. Further, in recent years, glass substrates and the like have been gradually enlarged, and even large-sized substrates having a length of more than 2 m on both sides have appeared, and since such large-sized substrates are thin, the rigidity of the substrate is also reduced. When such a substrate is inspected, the substrate is horizontally supported, and a rod-shaped strut is placed at a predetermined interval in the opening portion of the rectangular frame-shaped substrate holder on which the substrate is placed, and a pin supporting the substrate from the back surface is embedded in each of the stays. In this case, if the number of the rods is too large, the rods of the 200822147 rod will be hindered when the substrate is viewed through the observation, so that only the minimum amount necessary is installed. Furthermore,
亦可辨識，會有對觀察造成障礙的缺點。 為改善此類問題，已有諸如特開2000·7146號公報或特 10開·4·2議7號公報所揭示之基板支縣置的巾請宰。在 ，開2_-7146號公報所赫之外觀檢查裝置之基板支持 f置中’固定有將載置基板用的基板托架之開口部下端堵It can also be identified, and there are disadvantages that hinder the observation. In order to improve such problems, there is a towel that is placed in the substrate of the prefecture, such as the one disclosed in Japanese Patent Laid-Open No. 2000/7146 or the Japanese Patent Publication No. 7, No. 7. In the substrate support f of the appearance inspection apparatus of the Japanese Patent Publication No. 2-7-146, the lower end of the opening of the substrate holder for mounting the substrate is fixed.
塞之高剛性板狀透明平板，且藉由在透明平板上面直立設 置多數銷，以支撐基板。 X 15 又，在特開2004_2819〇7號公報所揭示之基板支持裝置 中，在並排架設於基板托架之開口部的多數個支柱中，將 棒狀之振動吸收構件直線狀地配置於相鄰支桿之間或支才曰 與基板托架之框狀部之間，藉以支撐基板。 但，在特開2000-7146號公報揭示之基板支持裝置中， 2〇若巨觀檢查時對基板表面採反射照明或從基板背面採透射 照明以進行觀察，則照明光不僅在基板上，亦會在透明平 板上產生反射或亂反射，會有對基板之檢查造成障礙的門 題。再者，在特開2004-281907號公報揭示之基板支持穿置 中’為了抑制振動，除了用以支撐銷之支桿以外，更設有 200822147 振動吸收構件，因此會產生遮蔽巨觀檢查時之透射光範圍 增大的缺點。 再者，巨觀檢查時，由於規格上要求使基板18〇度反轉 以檢查基板背面，因此當檢查基板背面之際，會有支桿及 5振動吸收構件對目視檢查造成阻礙的缺點。 有鑑於以上情形，本發明之目的係提供一種於微觀檢 查時抑制基板之振動，並且不會對透射照明檢查或背面檢 查造成阻礙之基板支持裝置。 【明内1 10 發明要旨 本發明之外觀檢查裝置之基板支持裝置係構造成一種 將基板載置於框架狀作業台以進行基板之檢查者，且其中 包含有框架狀作業台、支撐構件、及進退機構。該框架狀 作業台係用以支持前述基板之背面周緣部者，且該支撐構 15件係用以在前述作業台之開口部内支撐前述基板背面者， 而該進退機構係可選擇性地將前述支撐構件移至支撐前述 基板之支撐位置及退離前述基板之退離位置者。 根據本發明，當巨觀檢查前述基板之際，由於前述支 撐構件會退離前述基板，故不會阻礙觀察。又，當微觀檢 一之際，由於藉前述支撐構件支撐前述基板，故可在抑制 基板因周邊機器等的影響而產生振動或彎曲的狀態下進行 放大觀察。 再者’别述進退機構亦可構造成包含有用以支持前述 支撐構件之支持構件；及可使前述支持構件相對於前述基 7 200822147 板移動Γ乍動構件，且使前述支持構件利用前述作動構件 相對於如述基板進退。 雜、,=觀察時，藉由將前述支撐構件及前述支持構件退 5 10 15 離:述基板，使之與前述作業台之框狀部重疊，即可不受 遮蔽地觀察基板全體。微_碧 前述支持構«環論作動構件將 反上，亚以河述支撐構件支撐前 述基板。 人古Γ者本發明之外觀檢查裝置之基板支持裝置宜更包 m檢查部可相對於前 t板移動，俾在微觀檢查時，放大觀察前述基板之-部 2域’且該控制機構使隔著前述基板配設於前述放大檢 進構件’與前述放大檢查部之移動 進仃連動且移動至對應前述放大檢查部之位置。 微觀檢查時，將放大檢查部帶至基板上之一部分區 移動制機構讀取其座標後進行連動，使支撐構件 2至與基板上之-部分區域相對之位置，以從背面支樓 再者，前述切構件可為作動支撐基板之銷構件使之 2的致動當前述銷構件處於沒人致動器的狀態時， 不干相述作業台等之情況下㈣前述支撐構件；冬 h銷構件躲從致_突出的絲時，可切前述基板田。 再者’本發明之她檢查裝置之基板域裝置中，兑 錢退機構可為旋動機構，且該義機構 二 於料開口部之支桿上，使前述支撐構件相對於該tr 20 200822147 在剛述支揮位置及退離至前述支桿背面側之退離 動者。 、„在此清況下，别述支撐構件所形成之基板支撐區域雖 T到限制’但在構造上變得較為簡單，且可抑制在前述支 ♦冓件所$成之基板切區域及其周邊區域處之振動或彎 曲。 又，前述支撐構件在前述基板形成有之缺陷處或缺陷 處附近，從前述背面支撐前述基板。 稭别述支撐構件在缺陷處支撐前述基板時，可在確實 10抑制振動或f曲之狀態下進行微觀檢查，且藉在缺陷處附 近支撐前述基板，可抑制缺陷處附近的基板之振動等，並 且不會妨礙缺陷處的透射光，因此得以進行更明瞭、更精 確的檢查。 再者，前述進退機構亦可為突出沒入機構，且該突出 沒入機構係設置在架設於可在開σ部中移動之支持構件 上’使前述支撐構件相對於該支持構件，在支撐位置及退 離至下方之退離位置間突出沒入者。 根據本發明之外觀檢查裝置之基板支持裝置，巨觀檢 查時，由於支撐構件退離基板，故不會對基板之檢查造成 20阻礙，而微觀檢查時，由於藉支撐構件支撐基板，故可抑 制基板之振動或彎曲等，並進行詳細檢查。 圖式之簡單說明 第1圖係本發明第一實施型態之外觀檢查裝置的主要 部份說明圖。 9 200822147 第2圖係外觀檢查裝置之作業台的平面圖。 第3圖係外觀檢查裝置之作業台的背面圖。 第4圖係第2圖所示之作業台的A-A線縱截面圖。 第5圖係支撐銷呈突出狀態之與第4圖相同之圖。 5 第6圖係第5圖所示之支撐銷的部分放大圖。 第7圖係顯示第二實施型態之外觀檢查裝置之作業台 的主要部份平面圖。 第8圖係第7圖中的B-B線截面圖。 第9A圖、第9B圖係顯示第二實施型態之支撐銷變化例 10 的圖。 L實施方式3 較佳實施態樣 以下，關於本發明之實施型態，將邊參照圖式邊進行 詳細說明。 15 本發明第一實施型態之外觀檢查裝置，將藉由第1圖至 第6圖來說明。 第1圖係本發明第一實施型態之外觀檢查裝置的主要 部份說明圖，第2圖係作業台的平面圖，第3圖係背面圖， 第4圖係第2圖所示之作業台的A-A線縱截面圖，第5圖係支 20 撐銷呈突出狀態之與第4圖相同之圖，第6圖係第5圖的部分 放大圖。 第1圖所示之外觀檢查裝置1，具有設置在地板面之裝 置本體la，且係使製造諸如液晶顯示器（LCD)及電漿顯示器 (PDP)等時使用之母玻璃基板等薄型基板2可載置於作業台 10 200822147 3以進行外觀檢查者。基板2係以2mx2m以上的大型四角板 狀者為例，且如第2圖所示，作業台3形成具有面積略小於 基板2之開口部16的四角框狀，並且其開口部16之周緣部相 隔預定間隔設有用以吸著支持基板2之背面周緣部的真空 5 吸著孔3a。 第1圖中，作業台3安裝於旋動驅動機構4且受支撐而可 以馬達5之旋轉軸為中心旋動，俾取得立起狀態及水平狀 怨。作業台3受到设在旋動驅動機構4的反轉軸6支撐而可旋 10 15 20 轉，並得以觀察基板2的表面及背面。於與保持立起狀態的 作業台3相對之位置處配設有放大檢查機構8，且放大檢查 機構8由放大檢查部9及二次元移動機構1〇所構成。該放大 檢查部9係於顯微鏡上安裝數位相機所形成者，而該二 移動機構1G係由包含有可使放大檢查部9於义軸及γ轴方向 移動之垂直執道構件的線性馬達等所形成者。 〜又，裝置本體la的上部安裳有可對載置於保持立起狀 態之作業台3的基板2進行反射照明的第_照明機構^，且 裝置本體U的背面側安裝有可對魅於保持錢狀態之作 業台3的基板2進行透射照明的第二照明機構& 第2圖中，作業台3設有將所載置的基板2之各角落定位 且對齊的多數組整列構件15。另，於設置在作業台3之框内 的開口部16中，在與開口部16的相對内壁 和(參照瓣支桿—^ 2因本身重量而彎曲者，且當透視觀察基板a或使1反轉以 觀察背面之際’為了盡可能不造成阻礙，僅以狀間隔安 11 200822147 裝有必要最小限度的數量（圖中為2根）。 又，於各支桿17埋設有用以水平支撐基板2的多數固定 銷17a、···（圖中為4根），藉此可抑制基板2的彎曲。 其次說明基板支持機構11。 5 第3圖所示之作業台3的背面中，形成作業台3之四邊的 框狀部3b、…中，例如，在與作業台3的支桿17大略垂直之 一對框狀部3b、3b内配設有作為移動機構的帶式輸送機 2〇、20。該帶式輪送機2〇、2〇係用以使支持構件（以下稱為 支撐桿)24移動至開口部16之預定位置，且隔著開口部吩 1〇致平行者。；f式輸送機2〇、2〇的外側設有板狀之保護構件 18、18，且設置在各帶式輸送機2〇兩端的一對鏈輪2112化 之間捲繞有環狀輸送帶22。相對的兩組帶式輸送機2〇、2〇 之鏈輪21a、21a係以旋轉軸23連結，且旋轉軸23之一端連 結馬達Ml作為驅動源。 15 然後，藉由將支撐桿24連結於兩條輸送帶22、22,且 利用馬達Ml驅使輸送帶22、22進行圓周運動，可使支撐桿 24沿導軌3c、3c直線移動。於與作業台3大略垂直之方向 上，支撐桿24安裝有1根或多數根（圖中為3根）支撐構件（以 下稱為支撐銷)25。藉由以正逆驅動馬達厘丨而進行圓周運動 2〇的一對輸送帶22、22，可使支撐桿24進入開口部16内，且 後退至框狀部3b。 另，支撐銷25裝設有諸如氣壓缸等之致動器，且如第5 圖及第6圖所示，作為銷構件的活塞桿25b可相對於外筒 出沒。當活塞桿25b處於從外筒25a突出預定距離之狀態 12 200822147 下’可從背面支撐載置於作業台3的基板2，以抑制基板2的 振動或彎曲。 在活塞桿25b收容於外筒25a内部之狀態下，支撐銷25 可在不干涉支桿17或作業台3之情況下與支撐桿24一起移 5 動。 然後’支撐桿24及支撐銷25可藉控制機構26進行移動 及出沒。控制機構26電性地連接於馬達…丨與二次元移動機 構10 ’且可使放大檢查部9移動至缺陷處，同時可與該放大 檢查部9之移動進行連動，將支撐桿24移動至稍微偏離放大 10 檢查部9的檢查路線之處。 當藉由外觀檢查裝置1進行基板2之巨觀檢查時，支撐 桿24 ^退離至作業台3之框狀部儿的背面。微觀檢查之際， 支撐桿24會進入開口部16内，且藉支樓銷^在欲檢查之缺 陷K的所在處附近支撐基板2。 又本實施型悲之基板支持機構u中，帶狀輸送機2〇、 2〇、支撐桿24及馬達Ml等構成進退機構。 本κ施型態之外觀檢查裝置丨之基板支持機構丨丨具有 上述構造，其次說明作用。 首先，外觀檢查裝置1中，把欲檢查之基板2載置於呈 20水平狀態的作業台3，以整列構件15進行基板2之定位，並 以真空吸著孔3a吸著支持該基板2。首先，進行基板2之巨 觀檢查時’如第3圖所示，使支擇桿24從開口部16退離，並 移動至作業台3之框狀部3b的背面。藉旋動驅動機構4使作 業台3旋轉至適合目視觀察的敢角錢保持立起狀態，並 13 200822147 藉由來自第—照明機構12之反射照明來目視觀察基板2的 表=。透射觀察基板2時，將作業台3保持立起狀態，並藉 由第一照明機構13從基板2的背面側照射照明光來目視觀 察。進行該透射觀察時，亦可藉旋動驅動機構4使作業台3 5 j動至大略垂直之角度，例如85〜90度後保持立起狀態，並 藉由第一妝明機構13從基板2的背面側照射照明光以進行 目視觀察。由作業員進行目視巨觀觀察時，亦可事先使放 大私查機構8所包含之放大檢查部9及二次元移動機構1〇從 基板2退離。 1〇 又，觀察基板2的背面時，亦可使作業台3繞著旋動驅 動機構4的反轉軸6反轉180度後，與上述情形相同地在升起 狀態下進行觀察。 其次’對於以巨觀檢查找出的缺陷K進行微觀觀察時， 可藉二次元移動機構10使放大檢查部9相對於保持立起狀 15悲的作業台3於X軸及Y軸方向移動，並帶至與基板2的缺陷 κ相對之位置處。與此同時，以控制機構26讀取放大檢查部 9的座標位置，與放大檢查部9的移動進行連動，並驅動基 板支持機構11的馬達Ml，使支撐桿24移動至開口部16内。 令諸如傷痕或異物等缺陷K位於第2圖所示之位置，則 20將放大檢查部9安置於缺陷K上方後，藉控制機構26使支撐 桿24移動至與放大檢查部9的座標位置重疊的檢查路線上 或稍微偏離檢查路線之處後停止。接著，使安裝在支撐桿 24的各支撐銷25、…中之活塞桿25b突出後，活塞桿25b即 可在缺陷K的周邊從背面支撐基板2。 200822147 在此，由於支撐銷25固定於支撐桿24的預定位置，故 活塞桿25b不-定會位在缺陷K的附近，但若以支擇銷咖 接觸點為基準，在其半的範_，能夠抑制基 板2的微小振動或彎曲的話，設在切桿Μ的支撐銷^以二 5離2a麵之間隔設置即可’斜徑_尺寸係以基板2的大小 及板厚等來決定。A high rigidity plate-shaped transparent plate is plugged, and the substrate is supported by arranging a plurality of pins upright on the transparent plate. Further, in the substrate supporting device disclosed in Japanese Laid-Open Patent Publication No. 2004- 819 〇7, a rod-shaped vibration absorbing member is linearly arranged adjacent to each other in a plurality of pillars which are arranged side by side in the opening of the substrate holder. The support plate is supported between the support rods and between the support frame and the frame portion of the substrate holder. However, in the substrate supporting device disclosed in Japanese Laid-Open Patent Publication No. 2000-7146, if the surface of the substrate is illuminating or reflected from the back surface of the substrate for observation, the illumination light is not only on the substrate. It will produce reflection or disordered reflection on the transparent plate, and there will be a problem that hinders the inspection of the substrate. In addition, in the substrate supporting insertion disclosed in Japanese Laid-Open Patent Publication No. 2004-281907, in order to suppress vibration, in addition to the support rod for supporting the pin, the vibration-absorbing member of 200822147 is further provided, so that the shadow inspection is performed. The disadvantage of increased range of transmitted light. Further, in the case of the giant inspection, since the substrate 18 is reversed in order to inspect the back surface of the substrate, there is a disadvantage that the support rod and the vibration absorbing member are hindered by visual inspection when the back surface of the substrate is inspected. In view of the above circumstances, an object of the present invention is to provide a substrate supporting device which suppresses vibration of a substrate at the time of microscopic inspection and which does not hinder transmission illumination inspection or back inspection. [Mingyin 1 10] The substrate supporting device of the visual inspection device of the present invention is configured such that a substrate is placed on a frame-shaped work table to perform inspection of the substrate, and includes a frame-shaped work table, a support member, and Advance and retreat. The frame-shaped workbench is configured to support the peripheral edge portion of the back surface of the substrate, and the support structure 15 is configured to support the back surface of the substrate in the opening portion of the work table, and the advance and retreat mechanism can selectively The support member is moved to a support position for supporting the substrate and a retreat position of the substrate. According to the present invention, when the substrate is inspected by a giant sight, since the support member is separated from the substrate, the observation is not hindered. In addition, when the substrate is supported by the support member, it is possible to perform magnification observation while suppressing vibration or bending of the substrate due to influence of peripheral devices or the like. Furthermore, the advancing and retracting mechanism may be configured to include a supporting member for supporting the supporting member; and the supporting member may be moved relative to the base 7 200822147, and the supporting member may be configured by the activating member. Advance and retreat relative to the substrate as described. In the case of observation, when the support member and the support member are separated from the frame member and overlapped with the frame portion of the work table, the entire substrate can be observed without being shielded. Micro_Bi The aforementioned support structure «loop theory actuating member will be reversed, and the Ai River description support member supports the aforementioned substrate. The substrate support device of the visual inspection device of the present invention should be further moved with respect to the front t-plate, and the micro-inspection can be used to magnify and observe the -2 domain of the substrate and the control mechanism is separated. The substrate is disposed in a position in which the magnifying inspection member ' moves in conjunction with the movement of the magnifying inspection portion and moves to a position corresponding to the magnifying inspection portion. In the microscopic inspection, the magnifying inspection portion is brought to a portion of the substrate on the substrate, and the moving mechanism reads the coordinates and then interlocks the position of the supporting member 2 to the portion on the substrate opposite to the substrate. The cutting member may be a pin member that actuates the supporting substrate to actuate the pin member 2 when the pin member is in the state of the unmanned actuator, and does not dry the working table or the like (4) the supporting member; the winter pin member When hiding from the protruding wire, the substrate field can be cut. Furthermore, in the substrate field device of the inspection device of the present invention, the cash withdrawal mechanism may be a rotation mechanism, and the semantic mechanism is disposed on the support rod of the material opening portion, so that the support member is opposite to the tr 20 200822147 The retreat is just described as the support position and the retreat to the back side of the strut. „In this case, the support area of the substrate formed by the support member is T to limit, but the structure is relatively simple, and the substrate cut area of the above-mentioned support member can be suppressed. Further, the support member is supported by the back surface in the vicinity of a defect or a defect formed on the substrate. The support member may support the substrate at a defect. Microscopic inspection is performed in a state where vibration or f is suppressed, and by supporting the substrate in the vicinity of the defect, vibration or the like of the substrate in the vicinity of the defect can be suppressed, and the transmitted light at the defect is not hindered, so that it becomes clearer and more Further, the advancement and retraction mechanism may be a protruding immersion mechanism, and the protruding immersion mechanism is disposed on a support member that is erected in the σ-movable portion to make the support member relative to the support member , the indenter is protruded between the support position and the retreat position that is retracted to the lower side. The substrate support device of the visual inspection device according to the present invention, the giant inspection In this case, since the support member is separated from the substrate, the inspection of the substrate is not hindered by 20, and in the microscopic inspection, since the substrate is supported by the support member, vibration or bending of the substrate can be suppressed, and detailed inspection can be performed. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is an explanatory view of a main part of an appearance inspection apparatus according to a first embodiment of the present invention. 9 200822147 Fig. 2 is a plan view of a work table of an appearance inspection apparatus. Fig. 3 is a work table of an appearance inspection apparatus Fig. 4 is a longitudinal sectional view taken along line AA of the work table shown in Fig. 2. Fig. 5 is a view similar to Fig. 4 in which the support pin is in a protruding state. 5 Fig. 6 is a view shown in Fig. 5. Fig. 7 is a plan view showing a main part of a work table of the visual inspection device of the second embodiment. Fig. 8 is a cross-sectional view taken along line BB of Fig. 7. Fig. 9A, 9B is a view showing a variation of the support pin of the second embodiment. L Embodiment 3 Preferred Embodiments Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. Outside the first embodiment The inspection apparatus will be described with reference to Fig. 1 to Fig. 6. Fig. 1 is a front view showing the main part of the visual inspection apparatus according to the first embodiment of the present invention, and Fig. 2 is a plan view of the work table, and the third The rear view of the figure, Fig. 4 is a longitudinal section of the workbench shown in Fig. 2, and the fifth figure is the same as that of Fig. 4, and the sixth figure is the fifth. A partially enlarged view of the figure. The visual inspection device 1 shown in Fig. 1 has a device body 1a provided on a floor surface, and is used for manufacturing a mother glass such as a liquid crystal display (LCD) and a plasma display (PDP). The thin substrate 2 such as a substrate can be placed on the workbench 10 200822147 3 for visual inspection. The substrate 2 is exemplified by a large square plate having a size of 2 mx 2 m or more, and as shown in Fig. 2, the work table 3 is formed to have an area slightly. The opening portion 16 of the substrate 2 has a rectangular frame shape, and the peripheral portion of the opening portion 16 is provided with a vacuum 5 suction hole 3a for sucking the peripheral edge portion of the back surface of the support substrate 2 at predetermined intervals. In Fig. 1, the work table 3 is attached to the rotary drive mechanism 4 and is supported to be rotatable about the rotation axis of the motor 5 to obtain a standing state and a horizontal complaint. The work table 3 is supported by the reversing shaft 6 of the rotary drive mechanism 4 so as to be rotatable by 10 15 20 rpm, and the surface and the back surface of the substrate 2 can be observed. An enlargement inspection mechanism 8 is disposed at a position facing the work table 3 that is kept in an upright state, and the enlargement inspection mechanism 8 is composed of an enlargement inspection portion 9 and a secondary element moving mechanism 1A. The magnifying inspection unit 9 is formed by attaching a digital camera to a microscope, and the two moving mechanisms 1G are linear motors including a vertical armature member that can move the magnifying inspection unit 9 in the sense axis and the γ-axis direction. Former. Further, the upper portion of the apparatus main body 1a has a first illumination unit that can illuminate the substrate 2 placed on the work table 3 in a standing state, and the back side of the apparatus main body U is attached to the The second illumination mechanism for transmitting the illumination of the substrate 2 of the workbench 3 in a state of money is shown in Fig. 2, and the workbench 3 is provided with a multi-array alignment member 15 for positioning and aligning the respective corners of the substrate 2 placed thereon. Further, in the opening portion 16 provided in the frame of the work table 3, the inner wall opposite to the opening portion 16 and (refer to the flap struts - 2 are bent by their own weight, and when the substrate a is viewed or seen in perspective) Inverting to observe the back side 'In order to avoid obstacles as much as possible, only the interval is required. 200822147 is equipped with the necessary minimum number (two in the figure). Also, each of the poles 17 is embedded to support the substrate horizontally. The plurality of fixing pins 17a and 2 (four in the figure) can suppress the bending of the substrate 2. Next, the substrate supporting mechanism 11 will be described. 5 The operation is formed on the back surface of the work table 3 shown in Fig. 3 In the frame-like portions 3b, ... on the four sides of the table 3, for example, a belt conveyor 2 as a moving mechanism is disposed in one of the frame-like portions 3b and 3b which is substantially perpendicular to the strut 17 of the work table 3, 20. The belt pulleys 2, 2 are for moving a support member (hereinafter referred to as a support rod) 24 to a predetermined position of the opening portion 16, and are parallel to each other via the opening portion; The outer sides of the conveyors 2〇, 2〇 are provided with plate-shaped protective members 18, 18, and are arranged in each belt conveyor. An endless belt 22 is wound between a pair of sprockets 2112 at both ends. The opposite two sets of belt conveyors 2, 2, sprocket wheels 21a, 21a are coupled by a rotating shaft 23, and the rotating shaft A one-end connecting motor M1 is used as a driving source. 15 Then, by supporting the support rod 24 to the two conveyor belts 22, 22, and driving the belts 22, 22 in a circular motion by the motor M1, the support rod 24 can be guided along the guide rails 3c and 3c move linearly. In the direction substantially perpendicular to the work table 3, the support rod 24 is attached with one or a plurality of (three in the figure) support members (hereinafter referred to as support pins) 25. The pair of conveyor belts 22 and 22 that drive the motor centistate and perform a circular motion 2〇 allow the support rod 24 to enter the opening portion 16 and retreat to the frame portion 3b. Further, the support pin 25 is provided with a pneumatic cylinder or the like. Actuator, and as shown in Figures 5 and 6, the piston rod 25b as a pin member can be withdrawn relative to the outer cylinder. When the piston rod 25b is in a state of protruding a predetermined distance from the outer cylinder 25a, Supporting the substrate 2 placed on the workbench 3 from the back side to suppress vibration or bending of the substrate 2 In a state where the piston rod 25b is housed inside the outer cylinder 25a, the support pin 25 can be moved together with the support rod 24 without interfering with the strut 17 or the work table 3. Then, the support rod 24 and the support pin 25 can be The control mechanism 26 is electrically connected to the motor ... 丨 and the secondary moving mechanism 10 ′ and the magnification inspection unit 9 can be moved to the defect while being movable with the movement of the magnification inspection unit 9 . In conjunction, the support rod 24 is moved to a position slightly offset from the inspection path of the magnifying portion 10. When the visual inspection device 1 performs a giant inspection of the substrate 2, the support rod 24 is retracted to the frame of the work table 3. The back of the child. At the time of the microscopic inspection, the support rod 24 enters the opening portion 16, and the substrate 2 is supported by the support pin 2 near the position where the defect K to be inspected is located. Further, in the substrate support mechanism u of the present embodiment, the belt conveyors 2A, 2B, the support rod 24, and the motor M1 constitute an advance/retract mechanism. The substrate supporting mechanism of the visual inspection device of the present invention has the above-described structure, and the second embodiment will be explained. First, in the visual inspection device 1, the substrate 2 to be inspected is placed on the work table 3 in a horizontal state, the substrate 2 is positioned by the alignment member 15, and the substrate 2 is sucked and supported by the vacuum suction holes 3a. First, when the macroscopic inspection of the substrate 2 is performed, as shown in Fig. 3, the support rod 24 is retracted from the opening portion 16 and moved to the back surface of the frame portion 3b of the work table 3. By rotating the drive mechanism 4, the work table 3 is rotated to a state in which the dime is kept upright, and 13 200822147 visually observes the table 2 of the substrate 2 by the reflected illumination from the first illumination unit 12. When the observation substrate 2 is transmitted, the work table 3 is kept in an upright state, and is irradiated with illumination light from the back side of the substrate 2 by the first illumination mechanism 13 to be visually observed. When the transmission observation is performed, the operation table 3 5 can be moved to a substantially vertical angle by the rotary drive mechanism 4, for example, 85 to 90 degrees, and then held upright, and the substrate 12 is removed from the substrate 2 by the first makeup mechanism 13. The back side is illuminated with illumination light for visual observation. When the operator observes the macroscopic view, the enlargement inspection unit 9 and the secondary element moving mechanism 1 included in the amplification private inspection unit 8 may be retracted from the substrate 2 in advance. When the back surface of the substrate 2 is observed, the work table 3 may be reversed by 180 degrees around the reversing axis 6 of the rotary drive mechanism 4, and then observed in the raised state in the same manner as described above. Next, when microscopic observation is performed on the defect K found by the giant inspection, the magnification inspection unit 9 can be moved in the X-axis and Y-axis directions with respect to the work table 3 which is held upright by the secondary element moving mechanism 10, And brought to a position opposite to the defect κ of the substrate 2. At the same time, the control unit 26 reads the coordinate position of the enlargement inspection unit 9, interlocks with the movement of the enlargement inspection unit 9, drives the motor M1 of the substrate support mechanism 11, and moves the support rod 24 into the opening 16. When the defect K such as a flaw or a foreign matter is located at the position shown in FIG. 2, after the magnifying inspection portion 9 is placed over the defect K, the support lever 26 is moved by the control mechanism 26 to overlap with the coordinate position of the magnifying inspection portion 9. Stop on the inspection route or slightly off the inspection route. Next, after the piston rod 25b attached to each of the support pins 25, ... of the support rod 24 is protruded, the piston rod 25b can support the substrate 2 from the back surface around the defect K. 200822147 Here, since the support pin 25 is fixed to the predetermined position of the support rod 24, the piston rod 25b is not positioned in the vicinity of the defect K, but if it is based on the contact point of the pin, it is in the half of the range _ When the micro-vibration or the bending of the substrate 2 can be suppressed, the support pins provided on the dicing rods are disposed at intervals of two to two sides of the 2a surface. The slanting diameter _ size is determined by the size and thickness of the substrate 2.
藉此，即可在確實抑制缺陷尺的振動或彎曲之狀態下， 藉放大檢查部9拍攝放大影像，並可在縣晝面上觀察缺陷 K。尤其是透射觀察時，考量到照射透射光方面，最好是在 1〇偏離缺陷K的位置上以支撐銷25支撐基板2。又，反射觀察 時，雖可使支撐銷25置於缺陷K的正下方，但前述方法可Z 防止來自支撐銷25的反射光，故最好是在偏離缺陷&的位置 上以支撐銷25支撐基板2。 又，微觀觀察之缺陷K位置為與支桿17重疊之位置或位 15在附近時，與放大檢查部9的移動無關，不需使支撐桿24移 動至其座標位置，只要保持在退離狀態即可。另，亦可用 支撐桿24取代安裝在作業台3之開口部16的多數支桿17，並 將各支撐桿24設置成可在導軌3c、3c上移動，且可由藉綠 性馬達個別控制各支撐桿24的移動。 20 如上述，本實施型態之外觀檢查裝置1，在巨觀檢查 中，由於支撐桿24及支撐銷25處於退離至作業台3之框狀部 3b背面的狀態，故不會對反射及透射照明下的觀察造成阻 礙。又，微觀檢查中，由於支撐欲觀察之基板2的缺陷1^付 近，故可抑制基板2的微小振動或彎曲，並得以進行精度良 15 200822147 好的觀察、檢查 在弟:實施型態之外觀檢查裳置】之基板支持機構u 的變化例係可於域構件(支軸4)設㈣切支 5 撐桿24滑動 撐銷25)，縣祕馬料_«切肋配置成可沿支 若採用此類構造，切銷25㈣成可於帶式輸送機 烈、20的縱長方向及與其垂直之支撐桿24的縱長方向也 就是Χ-Υ方向㈣。而且，藉控制機構％，可使支撐銷Μ 移動至與缺陷κ對應之座標位置附近。藉此，可藉支撑銷25 Η)從基板2之背㈣支擇包含放大檢查部9所拍攝之基板以 的缺陷Κ在内的視野周邊。 又’如將支撐銷25的停止位置設定在稍微偏離基板2之 缺陷Κ的位置座標時，在透射照明下進行微觀檢查時不會遮 蔽透射光，故可進行更良好的透射放大觀察。另，藉由在 5作業台3之開口部16設置多數可移動的支撐桿24,尤其是在 目視觀察基板2之背面時，可藉由錯開各支撐桿24而得以目 視觀察基板2之背面全體。 其次說明本發明之其他實施型態，與上述實施型態同 或同樣的構件、零件將採用同一符號表示並省略說明。 ° 弟7圖及第8圖係顯示本發明第二實施型態之外觀檢杳 裝置之基板支持機構者，第7圖係作業台的平面圖，且第8 圖係第7圖的Β-Β線縱截面圖。 本實施型態中，基板支持機構11並未設有第一實施型 態的支撐桿24及支撐銷25。本實施型態之外觀檢查裝置丨之 16 200822147 基板支持機構11，在支桿17的背面亦即基板2的相反側設有 大略呈L字狀的底部27及導引構件28。導引構件28特別沿支 桿17的縱長方向形成連續板狀，藉此確保其剛性，防止支 桿17因受到自身重量或基板2的荷重而彎曲。 5 此外，於底部27設有可相對於基板2進退的支持構件 3〇。1根支桿17設有1個或多數個（圖中為8個）支持構件3〇， 且該支持構件30包含有安裝於底部27的支軸31、及可繞著 支軸31大略90度旋動的支撐構件（以下稱為支撐銷)32。支撐 銷32係由連結於支軸31且可旋轉的臂33、及大略垂直設置 10於臂33之前端的銷構件34所構成者。 因此，各支撐銷32如第8圖中的實線所示，可選擇性地 位於從基板2退離之導引構件28大略平行之朝下方垂下的 退離位置，及如虛線所示，與基板2大略平行且抵接並支撐 基板2之背面的支撐位置。支撐銷32在巨觀檢查時位於退離 15位置，微觀檢查時則位於支擇位置。另，設置於各支桿^ 的夕數支撐銷32係構造成，藉由未圖示之馬達等進退機構 使各支軸31—體地旋動至各支桿以的單側以進行進退者。 又，各支持構件30亦可藉由進退機構個別地旋動。 另，支持構件30相對於支桿17配設在其兩側（參照第7 2〇圖），但亦可僅配設在單側。此外，如第7圖所示，形成作 業台3的相對邊之一對框狀部3b、3b上，亦相隔適當間隔配 設有支持構件30。 本貫施型悲中，藉由各支撐銷32及設置在各支桿口的 口疋銷17a可各自在周圍半徑& 的範圍内抑制基板2的 17 200822147 微小振動或彎曲，故只要將各支撐銷32及固定銷17a以距離 大約2a mm之間隔加以設定，即得以對應位於基板】任意位 置之缺陷K的微觀觀察。 本實施型態之外觀檢查装置i之基板支持機構丨丨具有 5上述構造，且在巨觀檢查中，在使設置於各支桿17及框狀 43b之支持構件3〇的各支撐銷32，如第8圖中的實線所示， 退離至支桿17及框狀部3b之背面的狀態下，對作業台3上的 基板2進行目視觀察。故，各支持構件3()不會對反射或透射 照明狀態下的觀察造成阻礙。 1〇 另，微觀檢查中，如第7圖所示，透過支軸31使安裝在 位於基板2上欲觀察之缺抓附近之支桿17上的各支持構件 3〇旋轉，且敎撐_㈣在讀位置，藉此支撐基板2的 缺陷K附近。因此，微觀觀察之基板2的缺陷κ附近不會產 生微小振動或變形，故得以進行精度良好的觀察、檢查。 15 又，上述第一實施型態中，亦可藉由例如線性馬達等 直線致動器的其他致動器及滾珠螺桿等，使支撐桿Μ進行 進退移動，取代心使切桿24進退移動之帶式輸送機 20、20。 另，第二實施型態中’於臂33安裝1根鎖構件34即可使 2〇支撐鎖32得以支撐基板，但亦可增加扣的長度，以適當 間隔配設多數根銷構件34(參照第9Α圖）。又，活塞桿说及 銷構件34雖為棒狀，但亦可在前端部設置板狀或棒狀的頭 部，使其形成大略T字狀(參照第_)。此時可擴大相對於 基板2的振動抑制範圍。 200822147 又，基板2之周緣部受到作業台3支撐且剛性夠高，故 亦可不在框狀部3b設置支持構件30。 又，當然，本發明中，用以支撐基板2之支撐銷25、32 的數量，可按照以基板2的外型尺寸或板厚所產生之基板2 5 的強度等，設定為適當數量。 以上說明了本發明的較佳實施例，但本發明並不受限 於前述實施例。在不脫離本發明要旨的範圍内，構造可進 行添加、省略、置換及其他變更等。本發明不受限於前述 說明，僅受限於附加的申請專利範圍。 10 【圖式簡單說明】 第1圖係本發明第一實施型態之外觀檢查裝置的主要 部份說明圖。 第2圖係外觀檢查裝置之作業台的平面圖。 第3圖係外觀檢查裝置之作業台的背面圖。 15 第4圖係第2圖所示之作業台的A-A線縱截面圖。 第5圖係支撐銷呈突出狀態之與第4圖相同之圖。 第6圖係第5圖所示之支撐銷的部分放大圖。 第7圖係顯示第二實施型態之外觀檢查裝置之作業台 的主要部份平面圖。 20 第8圖係第7圖中的B-B線截面圖。 第9A圖、第9B圖係顯示第二實施型態之支撐銷變化例 的圖。 【主要元件符號說明】 1...外觀檢查裝置 la...裝置本體 19 200822147 2…胁 21a. · 3...作業台 21b···鏈輪 3a·.·真空吸著孔 22···輸送帶 3b...框狀部 23…旋轉軸 3c…導執 24…支撐桿 4…旋動驅動機構 25…支撐銷 5...馬達 25a…外筒 6···反轉軸 25b...活塞桿 8…放大檢查機構 26...控制機構 9...放大檢查部 27...底部 10…二次元移動機構 28...導引構件 11…綠支持機構 30…支持構件 12...第一照明機構 31···支軸 13...第二照明機構 32…支撐銷 15…整例構件 33···臂 16...開口部 34…銷構件 17…支桿 a...半徑 17a...固定銷 K...缺陷 18…板狀之保護構件 Ml···馬達 20…帶式輸送機 20Thereby, it is possible to take an enlarged image by the magnifying inspection unit 9 while suppressing the vibration or bending of the defective ruler, and to observe the defect K on the county side. In particular, in the case of transmission observation, it is preferable to support the substrate 2 with the support pin 25 at a position offset from the defect K in consideration of the irradiation of the transmitted light. Further, in the case of reflection observation, although the support pin 25 can be placed directly under the defect K, the above method can prevent the reflected light from the support pin 25, so it is preferable to support the pin 25 at a position deviating from the defect & Supporting the substrate 2. Further, when the position of the defect K of the microscopic observation is at a position overlapping with the strut 17 or the position 15 is in the vicinity, regardless of the movement of the magnifying inspection portion 9, it is not necessary to move the support rod 24 to its coordinate position as long as it remains in the retreat state. Just fine. Alternatively, a plurality of struts 17 mounted on the opening portion 16 of the work table 3 may be replaced by a support rod 24, and each support rod 24 may be disposed to be movable on the guide rails 3c, 3c, and each support may be individually controlled by a green motor The movement of the rod 24. As described above, in the visual inspection device 1 of the present embodiment, since the support rod 24 and the support pin 25 are in a state of being retreated to the back surface of the frame portion 3b of the work table 3, the reflection and the reflection are not performed. Observation under transillumination causes obstruction. Further, in the microscopic examination, since the defects of the substrate 2 to be observed are close to each other, the microvibration or the bending of the substrate 2 can be suppressed, and the accuracy can be improved. 15 200822147 Good observation and inspection: The appearance of the implementation type The change of the substrate support mechanism u of the inspection skirt can be set on the domain member (support shaft 4). (4) Cut support 5 Strut 24 slide support pin 25), the county secret horse material _ «cutting ribs can be arranged along the branch With this configuration, the cutting pin 25 (4) is formed in the longitudinal direction of the belt conveyor, the longitudinal direction of 20, and the longitudinal direction of the support rod 24 perpendicular thereto, that is, the Χ-Υ direction (four). Moreover, by the control mechanism %, the support pin 可使 can be moved to the vicinity of the coordinate position corresponding to the defect κ. Thereby, the periphery of the field of view including the defect Κ of the substrate imaged by the inspection unit 9 can be selected from the back (4) of the substrate 2 by the support pin 25 Η). Further, when the stop position of the support pin 25 is set to a position coordinate slightly deviated from the defect 基板 of the substrate 2, the transmitted light is not blocked when the microscopic inspection is performed under the transmission illumination, so that a better transmission magnification observation can be performed. Further, by providing a plurality of movable support bars 24 in the opening portion 16 of the fifth work table 3, in particular, when the back surface of the substrate 2 is visually observed, the entire back surface of the substrate 2 can be visually observed by shifting the support bars 24 . In the following, other embodiments of the present invention will be described with the same reference numerals, and the description thereof will be omitted. ° FIG. 7 and FIG. 8 show a substrate supporting mechanism of the visual inspection device according to the second embodiment of the present invention, and FIG. 7 is a plan view of the work table, and FIG. 8 is a Β-Β line of FIG. Longitudinal section. In the present embodiment, the substrate supporting mechanism 11 is not provided with the support rod 24 and the support pin 25 of the first embodiment. The visual inspection device of the present embodiment 16 200822147 The substrate supporting mechanism 11 is provided with a substantially L-shaped bottom portion 27 and a guide member 28 on the opposite side of the substrate 2, that is, on the back side of the support rod 17. The guide member 28 is formed in a continuous plate shape particularly in the longitudinal direction of the support 17, thereby ensuring rigidity thereof and preventing the support rod 17 from being bent by its own weight or the load of the substrate 2. Further, a support member 3A which is movable forward and backward with respect to the substrate 2 is provided at the bottom portion 27. One support rod 17 is provided with one or a plurality of (eight in the figure) support members 3, and the support member 30 includes a support shaft 31 mounted to the bottom portion 27 and approximately 90 degrees around the support shaft 31. A rotating support member (hereinafter referred to as a support pin) 32. The support pin 32 is composed of an arm 33 that is coupled to the support shaft 31 and rotatable, and a pin member 34 that is disposed substantially vertically at the front end of the arm 33. Therefore, as shown by the solid line in FIG. 8, each of the support pins 32 can be selectively located at a retreat position which is downwardly suspended from the guide member 28 which is retracted from the substrate 2, and as indicated by a broken line, The substrate 2 is substantially parallel and abuts and supports the support position of the back surface of the substrate 2. The support pin 32 is located at the retreat 15 position during the giant inspection and at the selective position during the microscopic inspection. Further, the eclipse support pins 32 provided on the respective struts 2 are configured such that the respective support shafts 31 are integrally rotated to one side of each of the struts by the advance/retract mechanism such as a motor (not shown) to advance and retreat . Further, each of the support members 30 may be individually rotated by the advancing and retracting mechanism. Further, the support member 30 is disposed on both sides of the support rod 17 (see FIG. 7B), but may be disposed only on one side. Further, as shown in Fig. 7, the supporting member 30 is disposed at an appropriate interval from one of the opposite sides of the forming table 3 to the frame portions 3b and 3b. In the present embodiment, the support pins 32 and the port pins 17a provided at the respective rod ports can suppress the slight vibration or bending of the substrate 2, 200822147, within the range of the surrounding radius & The support pin 32 and the fixing pin 17a are set at intervals of about 2 mm, that is, microscopic observation of the defect K at any position on the substrate. The substrate supporting mechanism 外观 of the visual inspection device i of the present embodiment has the above-described structure, and in the giant inspection, each of the support pins 32 provided on the support members 3 of the struts 17 and 43b is As shown by the solid line in Fig. 8, the substrate 2 on the work table 3 is visually observed while being retracted to the back surface of the strut 17 and the frame portion 3b. Therefore, each of the support members 3 () does not hinder the observation in the state of reflection or transmission illumination. 1. In the microscopic examination, as shown in Fig. 7, the support members 3 安装 mounted on the struts 17 located on the substrate 2 near the scratches to be observed on the substrate 2 are rotated by the fulcrum 31, and 敎 _ (4) At the reading position, the vicinity of the defect K of the substrate 2 is supported thereby. Therefore, microscopic vibration or deformation does not occur in the vicinity of the defect κ of the substrate 2 which is microscopically observed, so that accurate observation and inspection can be performed. Further, in the first embodiment described above, the support rod Μ can be moved forward and backward by other actuators such as a linear actuator such as a linear motor, and the ball screw, etc., and the cutting rod 24 can be moved forward and backward instead of the heart. Belt conveyors 20, 20. In the second embodiment, the mounting of one lock member 34 to the arm 33 allows the 2-inch support lock 32 to support the substrate, but the length of the buckle can be increased, and a plurality of pin members 34 are disposed at appropriate intervals (refer to Figure 9). Further, although the piston rod and the pin member 34 are in the form of a rod, a plate-like or rod-shaped head portion may be provided at the tip end portion to form a substantially T-shape (see _). At this time, the vibration suppression range with respect to the substrate 2 can be expanded. Further, since the peripheral portion of the substrate 2 is supported by the work table 3 and has a high rigidity, the support member 30 may not be provided in the frame portion 3b. Further, of course, in the present invention, the number of the support pins 25, 32 for supporting the substrate 2 can be set to an appropriate number in accordance with the strength of the substrate 25 generated by the outer size or thickness of the substrate 2. The preferred embodiments of the present invention have been described above, but the present invention is not limited to the foregoing embodiments. Structures may be added, omitted, replaced, and other changes, etc., without departing from the spirit of the invention. The invention is not limited by the foregoing description, but is limited only by the scope of the appended claims. [Brief Description of the Drawings] Fig. 1 is an explanatory view of a main part of an appearance inspection apparatus according to a first embodiment of the present invention. Fig. 2 is a plan view of a work table of the visual inspection device. Fig. 3 is a rear view of the work table of the visual inspection device. 15 Fig. 4 is a longitudinal sectional view taken along line A-A of the work table shown in Fig. 2. Fig. 5 is a view similar to Fig. 4 in which the support pin is in a protruding state. Fig. 6 is a partially enlarged view of the support pin shown in Fig. 5. Fig. 7 is a plan view showing the main part of the work table of the visual inspection device of the second embodiment. 20 Fig. 8 is a cross-sectional view taken along line B-B in Fig. 7. Fig. 9A and Fig. 9B are views showing a variation of the support pin of the second embodiment. [Description of main component symbols] 1... Appearance inspection device la... Device body 19 200822147 2... Threshold 21a. · 3...Workbench 21b···Sprocket 3a·.·Vacuum suction hole 22·· Conveyor belt 3b...frame-like portion 23...rotation shaft 3c...guide 24...support rod 4...spinning drive mechanism 25...support pin 5...motor 25a...outer cylinder 6···reverse shaft 25b. .. piston rod 8 ... enlargement inspection mechanism 26 ... control mechanism 9 ... enlargement inspection portion 27 ... bottom 10 ... secondary element movement mechanism 28 ... guide member 11 ... green support mechanism 30 ... support member 12 ...first illuminating mechanism 31··· fulcrum 13...second illuminating mechanism 32...support pin 15...whole member 33···arm 16...opening 34...pin member 17...strut a ...radius 17a...fixed pin K...defect 18...plate-shaped protective member M1···motor 20...belt conveyor 20