TW200815801A - Color filter substrate and manufacturing method thereof and liquid crystal display panel incorporating the same - Google Patents
Color filter substrate and manufacturing method thereof and liquid crystal display panel incorporating the same Download PDFInfo
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.W2805PA 200815801 九、發明說明: 【發明所屬之技術領域】 本發明是有關於一種彩色濾、光片基板及其製造方法 和應用其之液晶顯示面板,且特別是有關於一種黑色矩陣 之開口内外具有不同表面特性之彩色濾光片基板及其製 造方法和應用其之液晶顯示面板。 【先前技術】 _ 傳統之液晶顯示面板包括一薄膜電晶體基板、一彩色 濾光片基板及一液晶層,液晶層設置於相互平行設置之薄 膜電晶體基板與彩色濾光片基板之間。 在薄膜電晶體基板中,於一玻璃基板上形成一主動矩 陣晝素陣列。主動矩陣晝素陣列具有多個晝素,每一畫素 係由相互平行之二掃描線及相互平行之二資料線垂直交 錯而定義。每一晝素包括一薄膜電晶體及一晝素電極,薄 膜電晶體與對應之一掃描線及一資料線電悻連接,晝素電 ^ 極與薄膜電晶體電性連接。掃描驅動電路透過掃描線開啟 每一列晝素之薄膜電晶體,資料驅動電路透過資料線提供 每一行晝素所需之晝素電壓。其中,於薄膜電晶體開啟之 情況下,畫素電極經由開啟之薄膜電晶體獲得所需之晝素 電壓。 在彩色濾光片基板中,於一玻璃基板上依序形成黑色 矩陣、彩色濾光片及共同電極。共同電極係連續且整面地 形成於彩色濾光片基板中,並被施加一固定電壓。上述之BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a color filter, a light sheet substrate, a method of manufacturing the same, and a liquid crystal display panel using the same, and more particularly to an inner and outer opening of a black matrix. A color filter substrate having different surface characteristics, a method of manufacturing the same, and a liquid crystal display panel using the same. [Prior Art] The conventional liquid crystal display panel includes a thin film transistor substrate, a color filter substrate, and a liquid crystal layer, and the liquid crystal layer is disposed between the thin film transistor substrate and the color filter substrate disposed in parallel with each other. In the thin film transistor substrate, an active matrix element array is formed on a glass substrate. The active matrix pixel array has a plurality of pixels, each of which is defined by two scan lines parallel to each other and two data lines parallel to each other. Each element includes a thin film transistor and a halogen electrode, and the thin film transistor is electrically connected to one of the scanning lines and one of the data lines, and the halogen electrode is electrically connected to the thin film transistor. The scan driving circuit turns on each of the thin film transistors through the scanning line, and the data driving circuit supplies the pixel voltage required for each row of pixels through the data line. Wherein, in the case where the thin film transistor is turned on, the pixel electrode obtains a desired pixel voltage via the opened thin film transistor. In the color filter substrate, a black matrix, a color filter, and a common electrode are sequentially formed on a glass substrate. The common electrode is continuously and entirely formed in the color filter substrate, and a fixed voltage is applied. Above
rW2805PA 200815801 . 黑色矩陣對應於掃描線、資料線及薄膜電晶體設置。透過 共同電極及晝素電極之間的跨壓,以轉動液晶層之液晶分 子的排列方向。 然而,在以噴墨列印法(ink jet printing )喷出彩色 墨滴於黑色矩陣之多個開口處而形成不同顏色的彩色濾 光片時,由於彩色墨滴具有高擴散能力,導致黑色矩陣之 相鄰開口處之不同顏色的彩色墨滴容易產生往開口外溢 流的現象。因此,進而造成不同顏色的彩色墨滴於黑色矩 ⑩ 陣之相鄰開口之間發生相互混色的問題,嚴重地影響彩色 濾光片的色彩純度及對比。如此一來,將會大大地降低液 晶顯示面板之實用性。 【發明内容】rW2805PA 200815801 . The black matrix corresponds to the scan line, data line and thin film transistor settings. The direction of alignment of the liquid crystal molecules of the liquid crystal layer is rotated by the cross-pressure between the common electrode and the halogen electrode. However, when ink jets are ejected by ink jet printing at a plurality of openings of the black matrix to form color filters of different colors, the black matrix is caused by the high diffusion ability of the color ink droplets. Color ink droplets of different colors at adjacent openings are prone to overflow outside the opening. Therefore, the problem that color ink droplets of different colors are mixed with each other between adjacent openings of the black matrix 10 is seriously affected, which seriously affects the color purity and contrast of the color filter. As a result, the practicality of the liquid crystal display panel will be greatly reduced. [Summary of the Invention]
有鑑於此,本發明的目的就是在提供一種彩色濾光片 基板及其製造方法和應用其之液晶顯示面板。其在黑色矩 陣之開口内外進行不同表面特性之設計,可以讓不同顏色 之彩色墨滴透過噴墨列印法喷入黑色矩陣之開口處而形 成不同顏色的彩色濾光片時,更容易集中於黑色矩陣的開 口處。因此,不僅可以避免黑色矩陣之相鄰開口處之不同 顏色的彩色墨魅生往開口外溢流的現象,更可解決傳統 上不同顏色的彩色墨滴於黑色矩陣之相鄰開σ之間產生 相互混色㈣題。如此—來,可以維持耗縣片之色彩 純度及對比’且大大地提昇液晶顯㈤板之實雜。 根據本發明的一第一目的,提出—種彩色渡光片基In view of the above, an object of the present invention is to provide a color filter substrate, a method of manufacturing the same, and a liquid crystal display panel using the same. The design of different surface characteristics inside and outside the opening of the black matrix enables the color ink droplets of different colors to be more easily concentrated when inkjet printing is sprayed into the opening of the black matrix to form color filters of different colors. The opening of the black matrix. Therefore, it is possible to avoid not only the phenomenon that the color inks of different colors at the adjacent openings of the black matrix overflow to the outside of the opening, but also to solve the problem that the color ink droplets of different colors are traditionally generated between the adjacent opening σ of the black matrix. Mixed color (four) questions. In this way, it is possible to maintain the purity and contrast of the color of the consumption film, and greatly improve the solidity of the liquid crystal display (five) board. According to a first object of the present invention, a color light-emitting substrate is proposed
20081580LW2805PA - 板,包括底材、一黑色矩陣、一絕緣層、一彩色渡光片、 一弟一自組裝單層(self_assembled monolayer,SAM)及 一第二自組裝單層。黑色矩陣設置於底材上,並具有—開 口’開口暴露部分之底材。絕緣層設置於底材之上,並耳 有至少一第一區域,第一區域覆蓋黑色矩陣。彩色濾光片 設置於開口處,並具有一第一表面特性。第一自組裝單層 設置於第一區域上,並具有一第二表面特性,第二表面特 性異於第一表面特性。第二自組裝單層設置於開口處,並 • 位於彩色濾光片及底材之間,第二自組裝層具有第一表面 特性。 根據本發明的一第二目的’提出一^種液晶顯示面板, 包括一薄膜電晶體基板、一彩色濾光片基板及一液晶層。 彩色濾光片基板與薄膜電晶體基板平行設置,並包括一底 材、一黑色矩陣、一絕緣層、一彩色濾光片、一第一自組 裝單層及一第二自組裝單層。黑色矩陣設置於底材上,並 具有一開口,開口暴露部分之底材。絕緣層設置於底材之 龜 上’並具有至少一第一區域,第一區域覆蓋黑色矩陣。彩 色濾光片設置於開口處,並具有一第一表面特性。第一自 組裝單層設置於第一區域上,並具有一第二表面特性,第 二表面特性異於第一表面特性。第二自組裝單層設置於開 口處,並位於彩色濾光片及底材之間,第二自組裝層具有 第一表面特性。液晶層設置於薄膜電晶體基板及彩色濾光 片基板之間。 根據本發明的一第三目的,提出一種彩色濾光片基板20081580LW2805PA - A board comprising a substrate, a black matrix, an insulating layer, a color light-emitting sheet, a self-assembled monolayer (SAM), and a second self-assembled single layer. The black matrix is disposed on the substrate and has a substrate that is open to the exposed portion of the opening. The insulating layer is disposed on the substrate and has at least one first region, and the first region covers the black matrix. The color filter is disposed at the opening and has a first surface characteristic. The first self-assembled monolayer is disposed on the first region and has a second surface characteristic, the second surface characteristic being different from the first surface characteristic. A second self-assembled monolayer is disposed at the opening and is located between the color filter and the substrate, and the second self-assembled layer has a first surface characteristic. According to a second object of the present invention, a liquid crystal display panel comprising a thin film transistor substrate, a color filter substrate and a liquid crystal layer is provided. The color filter substrate is disposed in parallel with the thin film transistor substrate and includes a substrate, a black matrix, an insulating layer, a color filter, a first self-assembled single layer, and a second self-assembled single layer. The black matrix is disposed on the substrate and has an opening through which the exposed portion of the substrate is exposed. The insulating layer is disposed on the turtle of the substrate and has at least a first region, the first region covering the black matrix. The color filter is disposed at the opening and has a first surface characteristic. The first self-assembled monolayer is disposed on the first region and has a second surface characteristic, the second surface characteristic being different from the first surface characteristic. A second self-assembled monolayer is disposed at the opening between the color filter and the substrate, and the second self-assembled layer has a first surface characteristic. The liquid crystal layer is disposed between the thin film transistor substrate and the color filter substrate. According to a third object of the present invention, a color filter substrate is proposed
fW2805PA 200815801fW2805PA 200815801
λλ. ——U . 之製造方法。首先’提供一底材。接著,形成一黑色矩陣 於底材上。黑色矩陣具有一開口,開口暴露部分之底材。 然後,形成一絕緣層於底材之上。絕緣層具有一第一區域 及一第二區域,第一區域及第二區域分別覆蓋黑色矩陣和 開口内的底材’絕緣層具有一第一表面特性。接著,浸置 底材於一表面改質溶液中,以形成一自組裝單層於絕緣層 上。第一自組裝單層具有一第二表面特性,第二表面特性 異於該第一表面待性。 • 根據本發明的一第四目的,提出一種彩色濾光片基板 之製造方法。首先,提供一底材。底材具有一第一表面特 性。接著,形成一遮光材料層於底材上。然後,形成一感 光材料層於遮光材料層上,感光材料層具有第一表面特 性。接著,利用一第一紫外光照射底材,使部分之感光材 料層形成一絕緣層。絕緣層具有一第一開口,第一開口暴 露部分之遮光材料層。然後,去除部分之遮光材料層,以 形成一黑色矩陣。黑色矩陣及絕緣層具有一第二開口,第 _ 二開口暴露部分之底材。接著,浸置底材於一表面改質溶 液中,以形成一自組裝單層於絕緣層上及第二開口處。第 一自組裝單層具有一第二表面特性,第二表面特性異於第 一表面特性。 為讓本發明之上述目的、特徵、和優點能更明顯易 懂,下文特舉一較佳實施例,並配合所附圖式,作詳細說 明如下:Λλ. ——U. Manufacturing method. First, provide a substrate. Next, a black matrix is formed on the substrate. The black matrix has an opening that exposes a portion of the substrate. Then, an insulating layer is formed on the substrate. The insulating layer has a first region and a second region, the first region and the second region respectively covering the black matrix and the substrate in the opening. The insulating layer has a first surface characteristic. Next, the substrate is immersed in a surface modifying solution to form a self-assembled monolayer on the insulating layer. The first self-assembled monolayer has a second surface characteristic that is different from the first surface. According to a fourth object of the present invention, a method of manufacturing a color filter substrate is proposed. First, a substrate is provided. The substrate has a first surface characteristic. Next, a layer of light shielding material is formed on the substrate. Then, a layer of photosensitive material is formed on the layer of light-shielding material, and the layer of photosensitive material has a first surface characteristic. Next, the substrate is irradiated with a first ultraviolet light to form a portion of the photosensitive material layer to form an insulating layer. The insulating layer has a first opening, and the first opening exposes a portion of the light shielding material layer. Then, a portion of the light shielding material layer is removed to form a black matrix. The black matrix and the insulating layer have a second opening, and the second opening exposes a portion of the substrate. Next, the substrate is immersed in a surface modifying solution to form a self-assembled monolayer on the insulating layer and at the second opening. The first self-assembled monolayer has a second surface characteristic that is different from the first surface characteristic. The above described objects, features, and advantages of the present invention will become more apparent and understood.
2〇〇815801W2S05PA 有 【實施方式】 實施例一 請參照第1圖,其繪示乃依照本發明之實施例一之液 晶顯示面板的剖面示意圖。如第1圖所示,液晶顯示面板 1包括一薄膜電晶體基板2、一彩色濾光片基板3及一液 晶層4。彩色濾光片基板3與薄膜電晶體基板2平行設置, 並包括一底材5、一黑色矩陣6、一絕緣層7、一彩色濾光 片8、一第一自組裝單層9及一第二自組裝單層10。黑色 φ 矩陣6設置於底材5上,並具有一開口 6a,開口 6a暴露 部分之底材5。絕緣層7設置於底材5之上,並具有至少 一第一區域7a,第一區域7a覆蓋黑色矩陣6。彩色濾光片 8設置於開口 6a處,並具有一第一表面特性。第一自組裝 單層9設置於第一區域7 a上,而屬於單分子層,並具有 一第二表面特性,第二表面特性異於第一表面特性。第二 自組裝單層10設置於開口 6a處,並位於彩色濾光片8及 底材5之間。第二自組裝層10屬於單分子層,並具有第 • 一表面特性。液晶層4設置於薄膜電晶體基板2及彩色濾 光片基板3之間,並具有多個液晶分子4a。絕緣層7更覆 蓋開口 6a之内緣,並具有至少一第二區域7b。第二區域 7b設置於開口 6a處,並位於第二自組裝單層10及底材5 之間。此外,彩色濾光片基板更包括一護層17及一共同 電極18,護層17覆蓋彩色濾光片8及第一自組裝單層9, 共同電極18覆蓋護層17。另外,薄膜電晶體基板包括一 晝素電極19,晝素電極19對應於彩色濾光片8設置。[Embodiment] Embodiment 1 Referring to Fig. 1, there is shown a schematic cross-sectional view of a liquid crystal display panel according to a first embodiment of the present invention. As shown in Fig. 1, the liquid crystal display panel 1 includes a thin film transistor substrate 2, a color filter substrate 3, and a liquid crystal layer 4. The color filter substrate 3 is disposed in parallel with the thin film transistor substrate 2, and includes a substrate 5, a black matrix 6, an insulating layer 7, a color filter 8, a first self-assembled single layer 9 and a first Two self-assembled single layer 10. The black φ matrix 6 is disposed on the substrate 5 and has an opening 6a which exposes a portion of the substrate 5. The insulating layer 7 is disposed above the substrate 5 and has at least a first region 7a covering the black matrix 6. The color filter 8 is disposed at the opening 6a and has a first surface characteristic. The first self-assembled monolayer 9 is disposed on the first region 7a and belongs to the monolayer and has a second surface characteristic which is different from the first surface characteristic. The second self-assembled monolayer 10 is disposed at the opening 6a and between the color filter 8 and the substrate 5. The second self-assembled layer 10 is a monomolecular layer and has a first surface characteristic. The liquid crystal layer 4 is provided between the thin film transistor substrate 2 and the color filter substrate 3, and has a plurality of liquid crystal molecules 4a. The insulating layer 7 further covers the inner edge of the opening 6a and has at least a second region 7b. The second region 7b is disposed at the opening 6a and is located between the second self-assembled monolayer 10 and the substrate 5. In addition, the color filter substrate further includes a cover layer 17 and a common electrode 18, the cover layer 17 covers the color filter 8 and the first self-assembled single layer 9, and the common electrode 18 covers the cover layer 17. Further, the thin film transistor substrate includes a halogen electrode 19 which is provided corresponding to the color filter 8.
fW2805PA 200815801 — 在本實施例中,絕緣層7包含二氧化矽(Si〇2)、二 氧化鈦(Ti〇2)或三氧化二録(Ga2⑹。底材5包2含玻; 基板、塑膠基板、絕緣基板、陶曼基板或可撓性基板。里 色矩陣6包含鉻或有機樹脂。此外,第一表面特性及第^ 表面特性可分別為親水性(hydr〇philic)及疏水性 (hydrophobic)。另外,第一表面特性及第二表面特性亦 可刀別為疏水性及親水性。第一自組裝單層9包含多個上 述之第一分子,第二自組農單層10包含多個上述之第一 • 分子。 至於本實施例之彩色濾光片基板1的製程為何,將舉 例附圖說明如下,但本實施例之技術並不侷限於此。fW2805PA 200815801 - In this embodiment, the insulating layer 7 comprises cerium oxide (Si 〇 2), titanium dioxide (Ti 〇 2) or oxidized aluminum dioxide (Ga 2 (6). The substrate 5 package 2 contains glass; substrate, plastic substrate, insulation a substrate, a terracotta substrate or a flexible substrate. The chromatic matrix 6 comprises chromium or an organic resin. Further, the first surface property and the surface property may be hydrophilic and hydrophobic, respectively. The first surface characteristic and the second surface characteristic may be hydrophobic and hydrophilic. The first self-assembled monolayer 9 includes a plurality of the first molecules, and the second self-assembled agricultural single layer 10 includes a plurality of the above-mentioned First molecule. As for the process of the color filter substrate 1 of the present embodiment, the following description will be given by way of example, but the technique of the embodiment is not limited thereto.
請同時參照第2圖及第3A〜3F圖,第2圖繪示乃依 照本發明之實施例一之彩色濾光片基板的製程示意圖,第^ 3A〜3F圖繪示乃依照本發明之實施例一之彩色濾光片其 板的製程剖面圖。首先,在步驟21中,如第3A=圖所^, 提供一底材5。接著,進入步驟22中,又如第3八圖所矛, 形成一黑色矩陣6於底材5上。黑色矩陣6具有一開口如, 開口 6a暴露部分之底材5。 緣 a 區 第 在 之 然後,進入步驟23中,如第3B圖所示,形成1 層7於底材5之上。、絕緣層7覆蓋黑色矩陣6和開口、6 的内緣,並具有一第一表面特性。絕緣層7具有一第一 域7a及一第二區域7b,第一區域%覆蓋黑色矩陣 二區域7b設置於開口 6a處並覆蓋開口以内之底材5。 本實施例中,絕緣層7包含二氣切。其中,絕緣層7 πReferring to FIG. 2 and FIG. 3A to FIG. 3F, FIG. 2 is a schematic view showing the process of the color filter substrate according to the first embodiment of the present invention, and FIGS. 3A to 3F are diagrams showing the implementation according to the present invention. The color filter of the first example is a process profile view of the board. First, in step 21, a substrate 5 is provided as in Fig. 3A = Fig. Next, proceeding to step 22, as shown in Fig. 3, a black matrix 6 is formed on the substrate 5. The black matrix 6 has an opening such as a substrate 5 in which the opening 6a is exposed. The edge a region is first, and then proceeds to step 23, and as shown in Fig. 3B, a layer 7 is formed on the substrate 5. The insulating layer 7 covers the black matrix 6 and the inner edges of the openings 6, and has a first surface characteristic. The insulating layer 7 has a first region 7a and a second region 7b, and the first region % covers the black matrix. The second region 7b is disposed at the opening 6a and covers the substrate 5 within the opening. In this embodiment, the insulating layer 7 comprises a two gas cut. Wherein, the insulating layer 7 π
rW2805PA 200815801 表面碰到水汽容易與It基鍵結。由於經基屬於親水性,因 此使絕緣層7所具有之第一表面特性例如為親水性。rW2805PA 200815801 The surface is exposed to moisture and is easily bonded to the It base. Since the radical is hydrophilic, the first surface characteristic of the insulating layer 7 is, for example, hydrophilic.
接著,進入步驟24中,如第3C圖所示,浸置底材$ 及其上結構於一表面改質溶液U中,以形成一自組裝單 層15於絕緣層7上。自組裝單層15具有一第二表面特性, 第二表面特性異於第-表面特性’第二表面特性例如為疏 水性。至於自組裝單層15怎樣形成,在此舉例說明。在 本實施例中,表面改質溶液11包含一苯基三氯石夕烧 (phenyltdchlorosilane,PTCS )及一無水甲苯(麵 toluene),苯基三氯石夕烧於表面改質溶液u中之體積百分 比為lvol%。如下反應式所示,苯基三氯矽烷遇水會產生 羥化(hydroxylation) ’苯基三氯梦烷之三個氯基將被三個 經基取代而與矽原子脫離’因此產生笨基三經基石夕烧 (phenyltrihydroxysilane,PTHS)及三個氣化氫( HC1)Next, proceeding to step 24, as shown in Fig. 3C, the immersion substrate $ and its upper structure are structured in a surface modifying solution U to form a self-assembled monolayer 15 on the insulating layer 7. The self-assembled monolayer 15 has a second surface characteristic which is different from the first surface characteristic. The second surface characteristic is, for example, hydrophobic. As for how the self-assembled monolayer 15 is formed, it is exemplified herein. In this embodiment, the surface modification solution 11 comprises a phenyltdchlorosilane (PTCS) and an anhydrous toluene (toluene), and the volume of the phenyl triclosan in the surface modification solution u The percentage is lvol%. As shown in the following reaction formula, phenyl trichloromethane will produce hydroxylation in the presence of water. The three chlorine groups of the phenyl trichloromethane will be replaced by three trans-groups and will be detached from the ruthenium atom. By phenyltrihydroxysilane (PTHS) and three hydrogenated hydrogens (HC1)
0101
SiSi
HydroxylationHydroxylation
Si ........· · · ......+ 3麵Si ........· · · ... + 3 faces
PTCSPTCS
尋PTHSLooking for PTHS
OH 其中,在大氣為氮氣之狀況下,浸置底材5於表面改 質溶液11中約5分鐘,讓苯基三經基矽烷及絕緣層7的 羥基共同交互作用,而在絕緣層7上形成化學鍵連接的、 取向排列的以及緊密的二維有序單分子層,即自組裝單層 15。自組裝單層15包含多個第一分子,各第一分子包含 12OH wherein, under the condition that the atmosphere is nitrogen, the substrate 5 is immersed in the surface modifying solution 11 for about 5 minutes, and the phenyl tri-perylene and the hydroxyl groups of the insulating layer 7 are mutually interacted, and on the insulating layer 7 A chemically bonded, oriented, and compact two-dimensional ordered monolayer, i.e., a self-assembled monolayer 15, is formed. The self-assembled monolayer 15 comprises a plurality of first molecules, each of the first molecules comprising 12
rW2805PA 200815801 . 一矽原子、——疏水端及至少一含氧耦合端。矽原子連接疏 水端及含氧搞合端。含氧輕合端係與第一區域7a及第二 區域7b鍵結。相鄰之石夕原子係透過氧原子鍵結。疏水端 包含烧基(alkyl)或芳香基(aromatic group ),在此以苯 基為例做說明。因此,使得自組裝單層15所具有之第二 表面特性為疏水性。 然後,進入步驟25中,如第3D圖所示,取出底材5 於表面改質溶液11外。 • 接著,進入步驟26中,又如第30圖所示,烘乾底 材5。在本實施例中,以溫度為12(rCi空氣烘乾底材$ 約5分鐘。 癌 然後,進入步驟27中,又如第3D圖所示,利用一 紫外光12照射底材5 ’使自組裝單層15區分為一 組裝單層9及一第二自組裝單層1〇。第-自組裝單層9覆 盍弟一區域7a並具有第二表面特性,例如是疏水性。第 :自組裝單層1G位於開口 6a處而覆蓋第二區域7bn ^一表面特性’例如是親水性,如第3E圖所示。第Γ 穿ΐ 層之9八形子成^第一區域7a上,其分子結構與自組 = 第二自組裝單層,形成於第 ^ ^ 〜刀子結構異於自組裝單層15之分子妗 古本只%例中,紫外光12透過黑色矩 =方式照射底材5,且紫外光12將穿透:面二 其,,被紫外編匕 曰 77 $笨基將被縣取代’而形成第二自組 13rW2805PA 200815801 . A germanium atom, a hydrophobic end and at least one oxygen-containing coupling end. The helium atom is connected to the hydrophobic end and the oxygen is combined. The oxygen-containing light end is bonded to the first region 7a and the second region 7b. The adjacent Shishi atomic system is bonded through an oxygen atom. The hydrophobic end contains an alkyl group or an aromatic group, and a phenyl group is exemplified herein. Therefore, the second surface characteristic of the self-assembled monolayer 15 is made hydrophobic. Then, the process proceeds to step 25, and as shown in Fig. 3D, the substrate 5 is taken out of the surface modifying solution 11. • Next, proceed to step 26 and, as shown in Fig. 30, dry the substrate 5. In the present embodiment, the temperature is 12 (rCi air drying the substrate for about 5 minutes. The cancer then proceeds to step 27, and as shown in Fig. 3D, the substrate 5' is irradiated with an ultraviolet light 12 The assembled single layer 15 is divided into an assembled single layer 9 and a second self-assembled single layer 1 . The first self-assembled single layer 9 covers a region 7a and has a second surface characteristic, for example, hydrophobicity. The assembled single layer 1G is located at the opening 6a to cover the second region 7bn. A surface characteristic 'is hydrophilic, for example, as shown in Fig. 3E. The 9th octagonal layer of the second layer is formed on the first region 7a. Molecular structure and self-assembly = second self-assembled monolayer, formed in the first ^ ^ ~ knife structure is different from the self-assembled monolayer 15 molecular only in the case of the example, the ultraviolet light 12 through the black moment = way to illuminate the substrate 5, And the ultraviolet light 12 will penetrate: face two, it will be replaced by the ultraviolet coded 77 $ stupid will be replaced by the county' to form the second self-group 13
rW2805PA 200815801 裝層10之第二分子,使得第 性 第二自組裝單層10包含多個第H有親^ 包含一石夕原子、一親水端及至少一含各弟二刀子 原子係透過氧原子鍵結。虱耦5端。相鄰之矽 端,含氧搞合端係與第二親水端及含氧搞合 接著,進入步驟2δ中域如 濾光片8於開口 6a處。彩色 所;形1-:色rW2805PA 200815801 The second molecule of the layer 10 is such that the second self-assembled monolayer 10 comprises a plurality of H-th members comprising a stone atom, a hydrophilic end and at least one atomic system of each of the two knives. Knot.虱couple 5 end. Adjacent to the end, the oxygen-containing end is engaged with the second hydrophilic end and the oxygen, and then proceeds to step 2δ, such as the filter 8 at the opening 6a. Color; shape 1-: color
層10並具有第-表面特性,即親水性,2一;/且裝早 片8係由不同顏色之彩色墨滴透過一嘴墨列印法恤㈣The layer 10 has a first-surface characteristic, that is, hydrophilicity, 2; and the early film 8 is made up of colored ink droplets of different colors through a mouth-printing shirt (4)
Pdnting)喷在開口 6a處後完成。之後’更可依序形成一 護層17及-共同電極18於底材5之上’又如第i圖之彩 色濾光片基板3所示。護層17覆蓋彩色濾光片8及第一 自組裝單層9,共同電極18覆蓋護層17。 至於步驟27亦可透過紫外光以其他曝光方式照射底 材5。請參照第4圖,其繚示乃第2圖之步驟27中紫外光 透過光罩照射底材的示意圖。如第4圖所示,提供一光罩 13,以正向曝光之方式’利用一紫外光12a照射底材5。 因此,紫外光12a透過光罩13以正面曝光之方式照射底 材5,光罩13之透光區對應於第二區域7b,光罩13之非 透光區對應於第一區域7a。 至於彩色濾光片8所具有之第一表面特性為疏水性 時,彩色濾光片基板3之製程為何,將附圖說明如後。請 同時參照第5A〜5C圖,其繪示乃本發明,之實施例一中彩 色濾光片具有疏水性時之彩色濾光片基板的後段製程剖 200815801„ _ 面圖。彩色濾光片8具有疏水性時之彩色濾光片基板的前 段製程亦如第3A〜3D圖所示,在此不再贅述。待自組裝 單層15形成後,首先,如第5A圖所示,提供一光罩14, 以正向曝光之方式,利用一紫外光12a照射底材5,使自 組裝單層15區分為一第一自組裝單層9及一第二自組裝 單層10。如第5B圖所示,第一自組裝單層9覆蓋第一區 域7a並具有第一表面特性,例如為親水性。第二自組裝 單層10位於開口 6a處而覆蓋第二區域7b,並具有第二表 • 面特性,例如為疏水性。第一自組裝單層9形成於第一區 域7a上,其分子結構異於自組裝單層15之分子結構。第 二自組裝單層10形成於第二區域7b上,其分子結構與自 組裝單層15之分子結構相同。在本實施例中,光罩14之 透光區對應於第一區域7a,光罩14之非透光區對應於第 二區域7b。紫外光12透過光罩14以正面曝光之方式照射 底材5,且紫外光12將穿透光罩14之透光區照射部分之 自組裝單層15。其中,被紫外光照到之自組裝單層15之 _ 第一分子的苯基將被羥基取代,而形成第一自組裝層9之 第二分子,使得第一自組裝單層9具有親水性。第一自組 裝單層9包含多個第二分子\各第二分子包含一石夕原子、 一親水端及至少一含氧耦合端。發原子連接親水端及含氧 耦合端,含氧耦合端係與第一區域7a鍵結。相鄰之矽原 子係透過氧原子鍵結。親水端包含羥基。接著,如第5C 圖所示,形成一彩色濾光片8於開口 6a處,彩色濾光片8 覆蓋第二區域10並具有第二表面特性,例如是疏水性。 15 200815801眶隱 _ 由於第一自組裝單層9具有第二表面特性,而第二自 組裝單層10具有第一表面特性,使不同顏色之具有第一 表面特性之彩色墨滴透過喷墨列印法喷入黑色矩陣6之開 口 6a處時,更容易集中於黑色矩陣6的開口 6a處而不會 往外溢流。因此,本實施例在黑色矩陣6之開口 6a内外 進行不同表面特性之設計,可以讓不同顏色之彩色墨滴形 成不同顏色的彩色濾光片8時,避免黑色矩陣之開口處之 不同顏色的彩色墨滴產生往開口外溢流的現象,更可解決 ⑩ 不同顏色的彩色墨滴於黑色矩陣相鄰開口之間相互混色 的問題。如此一來,可以維持不同顏色之彩色濾光片其本 身原有之色彩純度及所有彩色濾光片之色彩對比,且大大 地提昇液晶顯示面板之實用性。 實施例二 請參照第6圖,其繪示乃依照本發明之實施例二之液 晶顯示面板的剖面示意圖。本實施例之液晶顯示面板61 _ 與實施例一之液晶顯示面板1不同之處在於彩色濾光片基 板63,其餘相同之構成要件繼續沿用標號,並不再贅述。 如第6圖所示,彩色濾光片基板63包括一底材65、一黑 色矩陣66、——絕緣層67、一彩色濾光片68、一第一自組 裝單層69及一第二自組裝單層70。黑色矩陣66設置於底 材65上,並具有一開口 66a,開口66&暴露部分之底材65。 絕緣層67設置於底材65之上,並覆蓋黑色矩陣66。彩色 濾光片68設置於開口 66a處,並具有一第一表面特性。 16Pdnting) is completed after spraying at the opening 6a. Thereafter, a protective layer 17 and a common electrode 18 are formed on the substrate 5 in turn, as shown in the color filter substrate 3 of Fig. i. The cover layer 17 covers the color filter 8 and the first self-assembled single layer 9, and the common electrode 18 covers the cover layer 17. As for step 27, the substrate 5 can also be illuminated by ultraviolet light through other exposure means. Referring to Figure 4, there is shown a schematic view of the ultraviolet light transmitted through the reticle to illuminate the substrate in step 27 of Figure 2. As shown in Fig. 4, a photomask 13 is provided to illuminate the substrate 5 with an ultraviolet light 12a in a forward exposure manner. Therefore, the ultraviolet light 12a is irradiated to the substrate 5 by the front cover through the mask 13, the light transmitting region of the mask 13 corresponds to the second region 7b, and the non-light transmitting region of the mask 13 corresponds to the first region 7a. As to the case where the first surface characteristic of the color filter 8 is hydrophobic, the process of the color filter substrate 3 is as described later. Please refer to FIG. 5A to FIG. 5C simultaneously, which is a cross-sectional process of the color filter substrate in the first embodiment of the present invention, in which the color filter is hydrophobic, and the color filter 8 is used. The front-end process of the color filter substrate having hydrophobicity is also shown in FIGS. 3A to 3D, and will not be described herein. After the self-assembled single layer 15 is formed, first, as shown in FIG. 5A, a light is provided. The cover 14 is irradiated to the substrate 5 by a UV light 12a in a forward exposure manner, so that the self-assembled single layer 15 is divided into a first self-assembled single layer 9 and a second self-assembled single layer 10. As shown in FIG. 5B As shown, the first self-assembled monolayer 9 covers the first region 7a and has a first surface characteristic, such as hydrophilicity. The second self-assembled monolayer 10 is located at the opening 6a to cover the second region 7b and has a second surface. • Surface characteristics, for example, hydrophobicity. The first self-assembled monolayer 9 is formed on the first region 7a, the molecular structure of which is different from the molecular structure of the self-assembled monolayer 15. The second self-assembled monolayer 10 is formed in the second region On 7b, the molecular structure is the same as that of the self-assembled monolayer 15. In the embodiment, the light-transmissive area of the reticle 14 corresponds to the first area 7a, and the non-light-transmissive area of the reticle 14 corresponds to the second area 7b. The ultraviolet light 12 illuminates the substrate 5 through the reticle 14 in a frontal exposure manner. And the ultraviolet light 12 will penetrate the self-assembled monolayer 15 of the light-transmitting portion of the light-shielding portion 14. The phenyl group of the first molecule of the self-assembled monolayer 15 which is irradiated with ultraviolet light will be replaced by a hydroxyl group to form The second molecule of the first self-assembled layer 9 is such that the first self-assembled monolayer 9 is hydrophilic. The first self-assembled monolayer 9 comprises a plurality of second molecules, each of the second molecules comprising a radix atom, a hydrophilic end, and The at least one oxygen-containing coupling end is connected to the hydrophilic end and the oxygen-containing coupling end, and the oxygen-containing coupling end is bonded to the first region 7a. The adjacent ruthenium atom is bonded through the oxygen atom, and the hydrophilic end contains the hydroxyl group. As shown in Fig. 5C, a color filter 8 is formed at the opening 6a, and the color filter 8 covers the second region 10 and has a second surface characteristic such as hydrophobicity. 15 200815801眶隐_ Since the first self The assembled single layer 9 has a second surface characteristic while the second self-assembled monolayer 10 The first surface characteristic is such that when the color ink droplets having the first surface characteristics of different colors are sprayed into the opening 6a of the black matrix 6 by the ink jet printing method, it is more likely to concentrate on the opening 6a of the black matrix 6 without Therefore, in this embodiment, different surface characteristics are designed inside and outside the opening 6a of the black matrix 6, so that when the color ink droplets of different colors form the color filter 8 of different colors, the opening of the black matrix is avoided. The color ink droplets of different colors generate overflow phenomenon outside the opening, and can solve the problem that the color ink droplets of different colors are mixed with each other in the adjacent openings of the black matrix. Thus, the color filters of different colors can be maintained. Its original color purity and color contrast of all color filters greatly improve the practicality of the liquid crystal display panel. Embodiment 2 Referring to Figure 6, there is shown a cross-sectional view of a liquid crystal display panel according to Embodiment 2 of the present invention. The liquid crystal display panel 61 of the present embodiment is different from the liquid crystal display panel 1 of the first embodiment in that the color filter substrate 63 is the same as the remaining constituent elements and will not be described again. As shown in FIG. 6, the color filter substrate 63 includes a substrate 65, a black matrix 66, an insulating layer 67, a color filter 68, a first self-assembled single layer 69, and a second self. A single layer 70 is assembled. The black matrix 66 is disposed on the substrate 65 and has an opening 66a, an opening 66 & an exposed portion of the substrate 65. The insulating layer 67 is disposed over the substrate 65 and covers the black matrix 66. A color filter 68 is disposed at the opening 66a and has a first surface characteristic. 16
W2805PA 200815801 • 第一自組裝單層69設置於絕緣層上,並具有一第二表面 特性’第二表面特性異於第一表面特性。第二自組裝單居 70設置於開口 66a處,並位於彩色濾光片68及底材65之 間,第二自組裝層70具有第一表面特性。 在本實施例中,底材63包含二氧化矽,絕緣層67包 含一^氧化發、一氧化欽或三氧化二嫁。此外,第一表面特 性及第二表面特性可以分別為親水性及疏水性,第—自組 裝單層69包含多個實施例一所述之第一分子,第二自組 # 裝單層7〇包含多個實施例一所述之第二分子。另外,第 一表面特性及第二表面特性亦可分別為疏水性及親水 性。第一自組裝單層69包含多個第二分子,第二自組裝 半層70包含多個第一分子。 至於本實施例之彩色濾、光片基板3之製程為何,將舉 例附圖說明如下,但本實施例之技術並不侷限於此。 請同時參照第7圖及第8A〜8G圖,第7圖繪示乃依 照本發明之實施例二之彩色濾光片基板的製程示意圖,第 ⑩ 8A〜8F圖繪示乃依照本發明之實施例二之彩色濾光片基 板的製程剖面圖。首先,在步驟71中,如第8A圖所示, 挺供一底材65 ’底材65具有一第一表面特性。底材65包 含一氧化石夕,使底材65所具有之第一表面特性例如為親 水性。 接著,進入步驟72中,又如第8A圖所示,形成一 遮光材料層86於底材65上。遮光材料層86包含鉻或有 機樹脂。 17W2805PA 200815801 • The first self-assembled monolayer 69 is disposed on the insulating layer and has a second surface characteristic. The second surface characteristic is different from the first surface characteristic. The second self-assembled single cell 70 is disposed at the opening 66a and between the color filter 68 and the substrate 65, and the second self-assembled layer 70 has a first surface characteristic. In the present embodiment, the substrate 63 comprises cerium oxide, and the insulating layer 67 comprises an oxidized hair, a oxidized sulphur or a triple oxidized. In addition, the first surface characteristic and the second surface characteristic may be hydrophilic and hydrophobic, respectively, and the first self-assembled single layer 69 includes a plurality of first molecules according to the first embodiment, and the second self-assembled single layer 7 A plurality of second molecules as described in the first embodiment are included. Further, the first surface property and the second surface property may be hydrophobic and hydrophilic, respectively. The first self-assembled monolayer 69 comprises a plurality of second molecules, and the second self-assembled half layer 70 comprises a plurality of first molecules. As for the process of the color filter and the optical sheet substrate 3 of the present embodiment, the drawings will be described below, but the technique of the embodiment is not limited thereto. Referring to FIG. 7 and FIGS. 8A-8G, FIG. 7 is a schematic diagram showing the process of a color filter substrate according to Embodiment 2 of the present invention, and FIGS. 10 8A-8F are diagrams according to the implementation of the present invention. A process profile view of the color filter substrate of Example 2. First, in step 71, as shown in Fig. 8A, a substrate 65' substrate 65 has a first surface characteristic. The substrate 65 contains a monohydrate such that the first surface characteristic of the substrate 65 is, for example, hydrophilic. Next, proceeding to step 72, as shown in Fig. 8A, a light shielding material layer 86 is formed on the substrate 65. The light shielding material layer 86 contains chromium or an organic resin. 17
TW2805PA 200815801 接著,進入步驟73中,又如第8A圖所示,形成一 感光材料層87於遮光材料層86上,感光材料層87具有 第一表面特性。感光材料層87包括感光性聚矽氧烷 (polysiloxane),使感光材料層87所具有的第一表面特性 例如為親水性。 然後,進入步驟74中,又如第8A圖所示,提供一 光罩83 〇TW2805PA 200815801 Next, proceeding to step 73, as shown in Fig. 8A, a photosensitive material layer 87 is formed on the light shielding material layer 86, and the photosensitive material layer 87 has a first surface characteristic. The photosensitive material layer 87 includes a photosensitive polysiloxane such that the first surface characteristic of the photosensitive material layer 87 is, for example, hydrophilic. Then, proceeding to step 74, as shown in Fig. 8A, a photomask 83 is provided.
接著,進入步驟75中,又如第8A圖所示,以正面 曝光之方式,利用一紫外光82照射底材65,使部分未被 知光之感光材料層87形成一絕緣層67。絕緣層67具有一 開口 67a,開口 67a暴露部分之遮光材料層86。其中,感 光材料層87依序經過預烤(pre-baking)、曝光/圖案化 (exposuring/patterning)、顯影(development)、漂白 (bleaching)及中烤(middle-baking)後形成絕緣層 67。 然後,進入步驟76中,如第8C圖所示,去除部分之 遮光材料層86,以形成一黑色矩陣66。例如以絕緣層67& 為钱刻中止層,透祕躲去_口 67a所暴露之遮光材 料層86。黑色矩陣66及絕緣層67共同具有一大於開口 67a之開口 66a ’開口 66a暴露部分之底材65。在本實施 例中,絕緣層67包含二氧化發。其中,絕緣層们之表面 容易與鍵結。由雜基屬於親水性,因此使 、、巴緣層6 7所具有之第一表面特性例如為親水性。 接著,進入步驟77中,如第8D圖所示,浸置底材Next, proceeding to step 75, as shown in Fig. 8A, the substrate 65 is irradiated with an ultraviolet light 82 in a front side exposure manner so that a portion of the photosensitive material layer 87 which is not known is formed into an insulating layer 67. The insulating layer 67 has an opening 67a which exposes a portion of the light shielding material layer 86. The photosensitive material layer 87 is sequentially subjected to pre-baking, exposure/patterning, development, bleaching, and middle-baking to form an insulating layer 67. Then, proceeding to step 76, as shown in Fig. 8C, a portion of the light shielding material layer 86 is removed to form a black matrix 66. For example, the insulating layer 67 & is used as a stop layer to remove the light-shielding material layer 86 exposed by the port 67a. The black matrix 66 and the insulating layer 67 collectively have a substrate 65 that is larger than the exposed portion 66a of the opening 67a. In the present embodiment, the insulating layer 67 contains oxidized hair. Among them, the surface of the insulating layer is easily bonded to the surface. Since the hetero group is hydrophilic, the first surface characteristic of the barrier layer 67 is, for example, hydrophilic. Then, proceeding to step 77, as shown in Fig. 8D, immersing the substrate
65於一表面改質溶液81中,以招士、 A 買冷液81中以形成一自組«單層85於絕 18 200815801τ„ 緣層67上及開口 66a處。自組裝單層覆蓋絕緣層67 及開口 66a内之底材65,並具有一第二表面特性,第二表 面特性異於第-表面特性,第二表面特性例如為疏水性。 至於自組裝單層85如何形成,將舉例說明如下。在本實 施例中,表面改質溶液81包含一苯基三氯矽烷 (phenyltdchl⑽silane,PTCS )及—無水甲苯(anhydr〇us toluene),苯基三氯矽烷於表面改質溶液81中之體積百分 比為1 vol%。如下反應式所示,苯基三氯矽烷遇水會產生 ⑩經化(hydr〇xylati〇n),苯基三氯矽烷之三個氯基將被三個 經基取代而與矽原子脫離,因此產生笨基三羥基矽烷 (phenyltrihydroxysilane,PTHS)及三個氯化氫(HC1)。65, in a surface modification solution 81, the cold liquid 81 is purchased by the sergeant, A to form a self-assembled «single layer 85 on the edge layer 67 and the opening 66a. Self-assembled single-layer insulating layer 67 and the substrate 65 in the opening 66a, and having a second surface characteristic, the second surface characteristic is different from the first surface characteristic, and the second surface characteristic is, for example, hydrophobic. As for how the self-assembled single layer 85 is formed, an example will be described. In the present embodiment, the surface modification solution 81 comprises phenyltdchl(10)silane, PTCS and anhydrous hydrazine toluene, and the volume of phenyltrichloromethane in the surface modification solution 81. The percentage is 1 vol%. As shown in the following reaction formula, phenyl trichloromethane will produce 10 hydration (hydr〇xylati〇n) when water is used, and the three chloro groups of phenyl trichloromethane will be replaced by three trans-groups. It is detached from the ruthenium atom, thus producing phenyltrihydroxysilane (PTHS) and three hydrogen chloride (HC1).
其中’在大氣為鼠氣之狀況下,浸置底材65於表面 改質溶液81中約5分鐘,讓苯基三經基石夕烧及絕緣層67 的羥基共同相互作用,而在絕緣層67上形成化學鍵連接 • . ' - : 的、取向排列的以及緊密的二維有序單分子層,即自組裝 單層85。自組裝單層85包含多個第一分子,各第一分子 包含一矽原子、一疏水端及至少一含氧耦合端。矽原子連 接疏水端及含氧耦合端。含氧輕合端係與開口 66a内之底 材65鍵結。相鄰之矽原子係透過氧原子鍵結。疏水端包 19Wherein, in the condition that the atmosphere is rat air, the substrate 65 is immersed in the surface modification solution 81 for about 5 minutes, and the phenyl group is subjected to the ketone and the hydroxyl groups of the insulating layer 67 to interact with each other, and in the insulating layer 67. A chemical bond is formed on the . - - : , oriented, and compact two-dimensional ordered monolayer, self-assembled monolayer 85. The self-assembled monolayer 85 comprises a plurality of first molecules, each of the first molecules comprising a germanium atom, a hydrophobic end and at least one oxygen-containing coupling end. The helium atom is connected to the hydrophobic end and the oxygen-containing coupling end. The oxygen-containing light end is bonded to the substrate 65 in the opening 66a. Adjacent helium atoms are bonded through oxygen atoms. Hydrophobic end pack 19
200815801 * —.^^Μ«3ί/ι* · TW2805PA 含烧基(alkyl)或芳香基(ar〇matic gr〇Up ),在此γ # 為例做說明。因此,使得自組裝單層85所具有之_乂苯基 面特性為疏水性。 、 弟二表 然後,進入步驟78中,如第8Ε圖所示,取 65於表面改質溶液81外。 底材 接著,進入步驟79中,又如第8Ε圖所示,扭护 65。在本實施例中,以溫度為12(TC之空氣棋乾底材 5分鐘。 死履材65約 然後,進入步驟8〇中,又如第8E圖所示, 外光8 2 a照射底材6 5,使自組裝單層8 5區分用—紫 組裝單層69及—第二自組裝單層7〇。如第郎弟—一自 -自組裝單層69覆蓋絕緣層67並具有第二表’第 如為疏水性。第一白么壯口口既 寻f生’例 1 組裝旱層70位於開口66a處而霜蓄 開口 66a内之底材65,並具有第—表面特性 ^盎 性。第一自組裝單層69形成於絕緣層67上,^為親水 與自組裝單層85之分子結構相同。第二自組ϋ子=構 成於開口 66a之底材65上,盆分子社禮 目 形 85之分子社播: ,、刀子、“冓異於自組裝單層 66以施紫外光^透過黑色矩陣 月面曝先之方式照射底材65,且紫外光8 读 開口 6如照射部分之自組裝單層85。其中,被紫外光日刀 之第一分子的苯基將被經基取代’二 =一自、裝層7G之第二分子,使得第二自組裝單居70 :有親水性。第二自組裝單層1〇包含多個第二分子了各 第二分子包含-㈣子…親水端及至少—含氧輕合端。 20 200815801.200815801 * —.^^Μ«3ί/ι* · TW2805PA Contains an alkyl or aromatic group (ar〇matic gr〇Up), as an example of γ#. Therefore, the self-assembled monolayer 85 has a 乂 phenyl surface characteristic which is hydrophobic. Then, the second table is then entered into step 78, as shown in Fig. 8 and taken 65 outside the surface modifying solution 81. Substrate Next, proceed to step 79, and as shown in Fig. 8, twist 65. In this embodiment, the temperature is 12 (the air of the TC is dried for 5 minutes. The dead material 65 is about, then, the process proceeds to step 8A, and as shown in Fig. 8E, the external light 8 2 a illuminates the substrate. 6 5, the self-assembled single layer 8 5 is divided into - purple assembled single layer 69 and - second self-assembled single layer 7 〇. For example, the first Lang-a self-assembled single layer 69 covers the insulating layer 67 and has a second The table is as hydrophobic as possible. The first white sturdy mouth is both sturdy. Example 1 The assembled dry layer 70 is located at the opening 66a and the substrate 65 in the frost storage opening 66a, and has the first surface characteristic. The first self-assembled monolayer 69 is formed on the insulating layer 67, and has the same molecular structure as the self-assembled monolayer 85. The second self-assembled tweezers = formed on the substrate 65 of the opening 66a, the basin molecule Molecular Society of Mesh 85: , Knife, "Different from the self-assembled monolayer 66 to apply ultraviolet light ^ through the black matrix moon surface exposure to illuminate the substrate 65, and the ultraviolet light 8 read opening 6 as the illumination portion Self-assembled monolayer 85. Among them, the phenyl group of the first molecule of the ultraviolet ray knife will be substituted by the base group, and the second molecule of the layer 7G The second self-assembled monolayer 70: is hydrophilic. The second self-assembled monolayer 1 〇 comprises a plurality of second molecules, each of the second molecules comprising - (iv) a... hydrophilic end and at least - an oxygen-containing light end. 200815801.
• —•cmroj/yu -W2805PA - 相鄰之矽原子係透過氧原子鍵結。矽原子連接親水端及含 氧耦合端,含氧耦合端係與開口 66a内之底材65鍵結。 親水端包含羥基。 接著,進入步驟81中,又如第8E圖所示,形成一彩 色濾光片68於開口 66a處,彩色濾光片68覆蓋第二自組 裝單層70,並具有第一表面特性,例如為親水性。其中, 彩色濾光片68係由彩色墨滴透過一噴墨列印法噴在開口 66a處後完成。彩色濾光片68係由不同顏色之彩色墨滴透 過一噴墨列印法責在開口 66a處後完成。之後,更可依序 形成一護層17及一共同電極18於底材65之上,又如第6 圖之彩色濾光片基板63所示。護層17覆蓋彩色渡光片68 及第一自組裝單層69,共同電極18覆蓋護層17。 至於步驟80亦可透過紫外光以其他曝光方式照射底 材65。請參照第9圖,其繪示乃第7圖之步驟80中紫外 光透過光罩照射底材的示意圖。在上述步驟80中,如黎9 圖所示,提供一光罩93,以正向曝光之方式,利用一紫外 光92照射底材65。因此,紫外光92透過光罩93以正面 曝光之方式照射底材65,光罩93之透光區對應於開口 66a,光罩93之非透光區對應於絕緣層67。紫外光92及 光罩93亦可分別與第8A圖之紫外光82及光罩83相同。 至於本實施例之彩色濾光片基板63之製程為何,將 舉例附圖說明如下,但本實施例之技術並不侷限於此。請 同時參照第10A〜10C圖,其繪示乃乃本發明之實施例二 中彩色濾光片具有疏水性時之彩色濾光片基板的後段製 21• —•cmroj/yu -W2805PA - Adjacent helium atoms are bonded through oxygen atoms. The helium atom is connected to the hydrophilic end and the oxygen-containing coupling end, and the oxygen-containing coupling end is bonded to the substrate 65 in the opening 66a. The hydrophilic end contains a hydroxyl group. Next, proceeding to step 81, as shown in FIG. 8E, a color filter 68 is formed at the opening 66a, and the color filter 68 covers the second self-assembled monolayer 70 and has a first surface characteristic, for example Hydrophilic. The color filter 68 is completed by spraying a color ink droplet through an inkjet printing method at the opening 66a. The color filter 68 is completed by color ink droplets of different colors passing through an ink jet printing method at the opening 66a. Thereafter, a protective layer 17 and a common electrode 18 are formed on the substrate 65 in sequence, as shown by the color filter substrate 63 of FIG. The cover layer 17 covers the color light guide sheet 68 and the first self-assembled single layer 69, and the common electrode 18 covers the cover layer 17. As for step 80, the substrate 65 can also be illuminated by ultraviolet light in other exposure modes. Referring to Figure 9, there is shown a schematic view of the ultraviolet light passing through the reticle to illuminate the substrate in step 80 of Figure 7. In the above step 80, as shown in Fig. 9, a mask 93 is provided to illuminate the substrate 65 with an ultraviolet light 92 in a forward exposure manner. Therefore, the ultraviolet light 92 is irradiated to the substrate 65 by the front cover through the mask 93. The light transmitting area of the mask 93 corresponds to the opening 66a, and the non-light transmitting area of the mask 93 corresponds to the insulating layer 67. The ultraviolet light 92 and the photomask 93 may be the same as the ultraviolet light 82 and the photomask 83 of Fig. 8A, respectively. As for the process of the color filter substrate 63 of the present embodiment, the following description will be given by way of example, but the technique of the embodiment is not limited thereto. Referring to FIG. 10A to FIG. 10C simultaneously, it is shown in the second embodiment of the present invention that the color filter substrate has a hydrophobic property when the color filter is hydrophobic.
PW2805PA 200815801 程剖面圖。彩色渡光片具有疏水性時之彩色據光片基板的 前段製程亦如UA〜8d圖所示,在此不再贅述 如第圖所示,提供—光罩103,以正向曝光之方式, 利用-紫外光102照射底材65,使自組裝 二 -第-自組裝單層69及一第二自組裝單層7〇。如= 圖所示,第-自趟單層69覆蓋絕緣層並 =覆=為:Γ。第二自組裝單層, ^而覆盍開口 66a之底材65’並具有第二表面特性,例如 為疏水性。第-自组襄單層69形成於絕緣層Ο上,盆八 子結構異於自組裝單層85之分子結構。第二自組裝單声刀 於開口 66a内之底材65上,其分子結構與自‘ 早層85之7刀子結構相同。在本實施例中,光罩103之透 光區對應於麟層67,光罩13之錢光輯應於開口 咖。紫外光102透過光罩1〇3以正面曝光之方式照射底 材65’且紫外光1〇2將穿透光罩1〇3之透光區照射部分之 自組裝單層85。其中,被紫外光照到之自組裝單層“之 第二分子的苯基將被羥基取代,而形成第一自組裝3層69 之第二分子’使得第一自組裝單層69具有親水性。第— 自組裝單層69包含多個第二分子’各第二分子包含一矽 原子、一親水端及至少一含氧耦合端。矽原子連接親水端 及含氧耦合端,含氧耦合端係與第一區域7a鍵結。相鄰 之矽原子係透過氧原子鍵結。親水端包含經基。 第耽圖所示,形成-細先片68於開口 66a:: 色濾光片68覆蓋第二自組裝單層7〇並具有第二表面特 22PW2805PA 200815801 Process profile. The process of the front side of the color light-receiving substrate is also as shown in the figure UA~8d. The substrate 65 is irradiated with ultraviolet light 102 to self-assemble the two-first self-assembled monolayer 69 and a second self-assembled monolayer. As shown in the figure =, the first-self-single layer 69 covers the insulating layer and = over = is: Γ. The second self-assembled monolayer, ^, covers the substrate 65' of the opening 66a and has a second surface characteristic, such as hydrophobicity. The first self-assembled monolayer 69 is formed on the insulating layer, and the basin structure is different from the molecular structure of the self-assembled monolayer 85. The second self-assembled mono knife has the same molecular structure as the 7-knife structure of the 'early layer 85' on the substrate 65 in the opening 66a. In the present embodiment, the light-transmitting area of the reticle 103 corresponds to the lining layer 67, and the light ray of the reticle 13 is integrated with the opening coffee. The ultraviolet light 102 illuminates the substrate 65' through the mask 1〇3 in a front side exposure and the ultraviolet light 1〇2 will penetrate the self-assembled monolayer 85 of the light-transmitting portion of the mask 1〇3. Wherein, the self-assembled monolayer "the phenyl group of the second molecule to be replaced by a hydroxyl group to form a second molecule of the first self-assembled 3 layer 69" is made hydrophilic by the first self-assembled monolayer 69. The self-assembled monolayer 69 comprises a plurality of second molecules each of the second molecules comprising a germanium atom, a hydrophilic end and at least one oxygen-containing coupling end. The germanium atom is connected to the hydrophilic end and the oxygen-containing coupling end, and the oxygen-containing coupling end is The first region 7a is bonded to the first region 7a. The adjacent germanium atom is bonded through the oxygen atom. The hydrophilic end contains the meridine. As shown in the figure, the thin precursor 68 is formed in the opening 66a:: the color filter 68 covers the Two self-assembled single layer 7 〇 and has a second surface special 22
W2805PA 200815801 性,例如是疏水性。 本發明上述實施例所揭露之彩色濾光片基板及其製 造方法和應用其之液晶顯示面板,其在黑色矩陣之門口 外進行不同表面特性之設計,可以讓不同顏色:内 ^ 、形色墨滴 透過喷墨列印法喷入黑色矩陣之開口處而形成不门 的彩色濾光片時,更容易集中於黑色矩陣的開口^顏色 此,不僅可以避免黑色矩陣之相鄰開口處之不同^因 色墨滴產生往開口外溢流的現象,更可解決不I顏色的彩 色墨滴之間相互混色的問題。如此一來,可p —顏色的彩 :之色彩純度及對比,且大大地提昇液晶 用性。 貝 綜上所述,雖然本發明已以—較佳實施例揭露如 ,並定Γ明。本發明所屬技術領域中㈣ 之更動與满飾。因此,本發圍内:當可作各種 專利範賴界定者轉》. 减附之申請 23W2805PA 200815801 Sex, for example, hydrophobic. The color filter substrate disclosed in the above embodiments of the present invention, the manufacturing method thereof and the liquid crystal display panel using the same have different surface characteristics outside the door of the black matrix, and can be made of different colors: inner color and color ink. When the droplets are sprayed into the opening of the black matrix by the inkjet printing method to form a color filter that is not gated, it is easier to concentrate on the opening of the black matrix, thereby not only avoiding the difference in the adjacent openings of the black matrix. The phenomenon that the color ink droplets overflow to the outside of the opening can solve the problem of color mixing between the color ink droplets of the non-I color. In this way, the color purity and contrast of p-color can be greatly improved, and the liquid crystal property is greatly improved. In view of the above, the present invention has been disclosed in the preferred embodiments. The modification and the full decoration of (4) in the technical field to which the present invention pertains. Therefore, within this hairline: when it can be used as a definition of various patents, the application for deduction is granted. 23
IW2805PA 200815801 ^ 【圖式簡單說明】 第1圖繪示乃依照本發明之實施例一之液晶顯示面 板的剖面示意圖。 第2圖繪示乃依照本發明之實施例一之彩色濾光片 基板的製程示意圖。 第3A〜3F圖繪示乃依照本發明之實施例一之彩色濾 光片基板的製程剖面圖。 第4圖繪示乃第2圖之步驟27中紫外光透過光罩照 ⑩ 射底材的示意圖。 第5A〜5C圖繪示乃本發明之實施例一中彩色濾光片 具有疏水性時之彩色濾光片基板的後段製程剖面圖。 第6圖繪示乃依照本發明之實施例二之液晶顯示面 板的剖面示意圖。 第7圖繪示乃依照本發明之實施例二之彩色濾光片 基板的製程示意圖。 第8A〜8G圖繪示乃依照本發明之實施例二之彩色濾 ® 光片基板的製程剖面圖。 第9圖繪示乃第7圖之步驟80中紫外光透過光罩照 射底材的不意圖。 第10A〜10C圖繪示乃本發明之實施例二中彩色濾光 片具有疏水性時之彩色濾光片基板的後段製程剖面圖。 24 200815801,IW2805PA 200815801 ^ BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a cross-sectional view showing a liquid crystal display panel according to a first embodiment of the present invention. FIG. 2 is a schematic view showing the process of a color filter substrate according to Embodiment 1 of the present invention. 3A to 3F are cross-sectional views showing the process of a color filter substrate according to Embodiment 1 of the present invention. Fig. 4 is a schematic view showing the ultraviolet light passing through the photomask in step 27 of Fig. 2; 5A to 5C are cross-sectional views showing the process of the color filter substrate in the case where the color filter has hydrophobicity in the first embodiment of the present invention. Figure 6 is a cross-sectional view showing a liquid crystal display panel according to a second embodiment of the present invention. Figure 7 is a schematic view showing the process of a color filter substrate according to Embodiment 2 of the present invention. 8A to 8G are cross-sectional views showing the process of the color filter wafer substrate according to the second embodiment of the present invention. Figure 9 is a schematic illustration of the ultraviolet light transmitted through the reticle to illuminate the substrate in step 80 of Figure 7. 10A to 10C are cross-sectional views showing the process of the color filter substrate in the case where the color filter of the second embodiment of the present invention has hydrophobicity. 24 200815801,
~ 一* xW2805PA . 【主要元件符號說明】 I、 61 ·液晶顯不面板 2 :薄膜電晶體基板 3 :彩色濾光片基板 4 :液晶層 4a ·液晶分子 5、 65 :底材 6、 66 :黑色矩陣 參 6a、66a、67a ··開口 7、 67 :絕緣層 7a :第一區域 7b :第二區域 8、 68 :彩色濾光片 9、 69 :第一自組裝單層 10、 70 ··第二自組裝單層 II、 81 :表面改質溶液 • 12、12a、82、82a、92、102 :紫外光 13、14、83、93、103 ··光罩 15、85 ··自组裝單層 17 :護層 18 :共同電極 19 :晝素電極 86 :遮光材料層 87 :感光材料層 25~ One * xW2805PA . [Main component symbol description] I, 61 · Liquid crystal display panel 2 : Thin film transistor substrate 3 : Color filter substrate 4 : Liquid crystal layer 4a · Liquid crystal molecules 5, 65 : Substrate 6, 66 : Black matrix reference 6a, 66a, 67a · Opening 7, 67: insulating layer 7a: first region 7b: second region 8, 68: color filter 9, 69: first self-assembled single layer 10, 70 · Second self-assembled single layer II, 81: surface modification solution • 12, 12a, 82, 82a, 92, 102: ultraviolet light 13, 14, 83, 93, 103 · · reticle 15, 85 · self-assembly Single layer 17: sheath 18: common electrode 19: halogen electrode 86: light shielding material layer 87: photosensitive material layer 25
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Cited By (2)
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TWI510837B (en) * | 2008-11-18 | 2015-12-01 | Samsung Display Co Ltd | Thin film transistor substrate and a fabricating method thereof |
TWI646374B (en) * | 2013-06-17 | 2019-01-01 | 蘋果公司 | Display with color mixing prevention structure |
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TWI510837B (en) * | 2008-11-18 | 2015-12-01 | Samsung Display Co Ltd | Thin film transistor substrate and a fabricating method thereof |
TWI646374B (en) * | 2013-06-17 | 2019-01-01 | 蘋果公司 | Display with color mixing prevention structure |
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