TW200739058A - Chamber particle detection system - Google Patents

Chamber particle detection system

Info

Publication number
TW200739058A
TW200739058A TW096104560A TW96104560A TW200739058A TW 200739058 A TW200739058 A TW 200739058A TW 096104560 A TW096104560 A TW 096104560A TW 96104560 A TW96104560 A TW 96104560A TW 200739058 A TW200739058 A TW 200739058A
Authority
TW
Taiwan
Prior art keywords
chamber
laser light
particle
chamber particle
situ
Prior art date
Application number
TW096104560A
Other languages
English (en)
Other versions
TWI385377B (zh
Inventor
Mark Wright
Original Assignee
Lam Res Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lam Res Corp filed Critical Lam Res Corp
Publication of TW200739058A publication Critical patent/TW200739058A/zh
Application granted granted Critical
Publication of TWI385377B publication Critical patent/TWI385377B/zh

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N21/49—Scattering, i.e. diffuse reflection within a body or fluid
    • G01N21/53—Scattering, i.e. diffuse reflection within a body or fluid within a flowing fluid, e.g. smoke
    • G01N21/532—Scattering, i.e. diffuse reflection within a body or fluid within a flowing fluid, e.g. smoke with measurement of scattering and transmission
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
    • G01N15/02—Investigating particle size or size distribution
    • G01N15/0205—Investigating particle size or size distribution by optical means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
    • H01L22/24—Optical enhancement of defects or not directly visible states, e.g. selective electrolytic deposition, bubbles in liquids, light emission, colour change

Landscapes

  • Chemical & Material Sciences (AREA)
  • Immunology (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Pathology (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Dispersion Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Drying Of Semiconductors (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
TW096104560A 2006-02-08 2007-02-08 處理室粒子之監測組件、處理室及其資訊收集方法 TWI385377B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/350,999 US7417733B2 (en) 2006-02-08 2006-02-08 Chamber particle detection system

Publications (2)

Publication Number Publication Date
TW200739058A true TW200739058A (en) 2007-10-16
TWI385377B TWI385377B (zh) 2013-02-11

Family

ID=38333733

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096104560A TWI385377B (zh) 2006-02-08 2007-02-08 處理室粒子之監測組件、處理室及其資訊收集方法

Country Status (6)

Country Link
US (2) US7417733B2 (zh)
JP (1) JP5037532B2 (zh)
KR (1) KR101482278B1 (zh)
CN (1) CN101427123B (zh)
TW (1) TWI385377B (zh)
WO (1) WO2007092546A2 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI797174B (zh) * 2017-10-20 2023-04-01 美商蘭姆研究公司 使用電腦視覺系統的原位腔室清潔終點偵測系統及方法

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI254960B (en) * 2005-07-01 2006-05-11 Chunghwa Picture Tubes Ltd Plasma display device
US7417733B2 (en) * 2006-02-08 2008-08-26 Lam Research Corporation Chamber particle detection system
WO2013039280A1 (ko) * 2011-09-16 2013-03-21 You Young Sun 반도체 장비 진단용 측정장치
CN102706806A (zh) * 2012-01-04 2012-10-03 吴江市东泰电力特种开关有限公司 一种有载分接开关油室油质监测装置
KR20140088745A (ko) * 2013-01-03 2014-07-11 삼성전기주식회사 파티클 검사 장치
US9257030B2 (en) 2013-07-16 2016-02-09 Leeo, Inc. Electronic device with environmental monitoring
US9116137B1 (en) 2014-07-15 2015-08-25 Leeo, Inc. Selective electrical coupling based on environmental conditions
US9372477B2 (en) 2014-07-15 2016-06-21 Leeo, Inc. Selective electrical coupling based on environmental conditions
US9092060B1 (en) 2014-08-27 2015-07-28 Leeo, Inc. Intuitive thermal user interface
US20160070276A1 (en) 2014-09-08 2016-03-10 Leeo, Inc. Ecosystem with dynamically aggregated combinations of components
US10026304B2 (en) 2014-10-20 2018-07-17 Leeo, Inc. Calibrating an environmental monitoring device
US9445451B2 (en) 2014-10-20 2016-09-13 Leeo, Inc. Communicating arbitrary attributes using a predefined characteristic
US10805775B2 (en) 2015-11-06 2020-10-13 Jon Castor Electronic-device detection and activity association
US9801013B2 (en) 2015-11-06 2017-10-24 Leeo, Inc. Electronic-device association based on location duration
WO2018031193A1 (en) * 2016-08-12 2018-02-15 Applied Materials, Inc. Critical methodology in vacuum chambers to determine gap and leveling between wafer and hardware components
TWI746907B (zh) 2017-12-05 2021-11-21 日商斯庫林集團股份有限公司 煙霧判定方法、基板處理方法及基板處理裝置
KR102498059B1 (ko) * 2017-12-28 2023-02-10 (주)보부하이테크 배기관 내 부산물 측정 장치 모듈 및 부산물 측정 방법
KR101912240B1 (ko) * 2018-03-28 2018-10-26 주식회사 과학기술분석센타 미세먼지 측정 장치

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5255089A (en) * 1992-03-26 1993-10-19 International Business Machines Corporation Portable particle detector assembly
US5372673A (en) * 1993-01-25 1994-12-13 Motorola, Inc. Method for processing a layer of material while using insitu monitoring and control
JP2529661B2 (ja) * 1993-08-20 1996-08-28 アネルバ株式会社 粒子検出装置
US5605637A (en) * 1994-12-15 1997-02-25 Applied Materials Inc. Adjustable dc bias control in a plasma reactor
US5985032A (en) * 1995-05-17 1999-11-16 Matsushita Electric Industrial Co., Ltd. Semiconductor manufacturing apparatus
JPH09243549A (ja) * 1996-03-07 1997-09-19 Hitachi Ltd パーティクルモニタ方法およびワーク処理装置
US5691812A (en) * 1996-03-22 1997-11-25 Ade Optical Systems Corporation Calibration standard for calibrating a defect inspection system and a method of forming same
JPH09289240A (ja) * 1996-04-22 1997-11-04 Sony Corp 粒子計測器
JP2982720B2 (ja) * 1996-04-26 1999-11-29 日本電気株式会社 パーティクルモニター装置およびこれを具備した無塵化プロセス装置
US5997642A (en) * 1996-05-21 1999-12-07 Symetrix Corporation Method and apparatus for misted deposition of integrated circuit quality thin films
US5943130A (en) 1996-10-21 1999-08-24 Insitec, Inc. In situ sensor for near wafer particle monitoring in semiconductor device manufacturing equipment
US5940175A (en) * 1996-11-01 1999-08-17 Msp Corporation Method and apparatus for surface inspection in a chamber
US5909276A (en) * 1997-03-31 1999-06-01 Microtherm, Llc Optical inspection module and method for detecting particles and defects on substrates in integrated process tools
US6015718A (en) * 1997-08-14 2000-01-18 Cypress Semiconductor Corporation Indentification of the composition of particles in a process chamber
US6170429B1 (en) * 1998-09-30 2001-01-09 Lam Research Corporation Chamber liner for semiconductor process chambers
US6635114B2 (en) * 1999-12-17 2003-10-21 Applied Material, Inc. High temperature filter for CVD apparatus
US6490530B1 (en) * 2000-05-23 2002-12-03 Wyatt Technology Corporation Aerosol hazard characterization and early warning network
US6392745B1 (en) * 2000-06-13 2002-05-21 American Air Liquide, Inc. Method and apparatus for the fast detection of surface characteristics
JP2002057143A (ja) * 2000-08-07 2002-02-22 Hitachi Ltd 浮遊異物検出装置
US6825437B2 (en) * 2001-01-17 2004-11-30 Hitachi, Ltd. Apparatus enabling particle detection utilizing wide view lens
US6600138B2 (en) * 2001-04-17 2003-07-29 Mattson Technology, Inc. Rapid thermal processing system for integrated circuits
EP1432972A1 (en) 2001-09-07 2004-06-30 Inficon, Inc. Signal processing method for in-situ, scanned-beam particle monitoring
US6824666B2 (en) 2002-01-28 2004-11-30 Applied Materials, Inc. Electroless deposition method over sub-micron apertures
US6941791B1 (en) * 2002-12-23 2005-09-13 Alan Sanders Dash bridge and hook rescue device
US7471393B2 (en) 2004-03-06 2008-12-30 Michael Trainer Methods and apparatus for determining the size and shape of particles
US7417733B2 (en) * 2006-02-08 2008-08-26 Lam Research Corporation Chamber particle detection system

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI797174B (zh) * 2017-10-20 2023-04-01 美商蘭姆研究公司 使用電腦視覺系統的原位腔室清潔終點偵測系統及方法

Also Published As

Publication number Publication date
US7417733B2 (en) 2008-08-26
WO2007092546A2 (en) 2007-08-16
CN101427123B (zh) 2014-03-12
JP2009526229A (ja) 2009-07-16
CN101427123A (zh) 2009-05-06
KR101482278B1 (ko) 2015-01-13
WO2007092546A3 (en) 2008-09-04
US20080297797A1 (en) 2008-12-04
JP5037532B2 (ja) 2012-09-26
KR20080095248A (ko) 2008-10-28
US7626699B2 (en) 2009-12-01
US20070182963A1 (en) 2007-08-09
TWI385377B (zh) 2013-02-11

Similar Documents

Publication Publication Date Title
TW200739058A (en) Chamber particle detection system
TW200739652A (en) Sample surface inspecting method and inspecting apparatus
MX340262B (es) Metodo y sistema para determinar contenido de energia y detectar contaminantes en una corriente de fluido.
WO2004075011A3 (en) Methods and apparatus for data analysis
TW200801491A (en) System for testing a flat panel display device and method thereof
WO2008049134A3 (en) Method for s/tem sample analysis
WO2007101279A3 (en) Method and apparatus for compact spectrometer with fiber array spectral translator
TW200739110A (en) Hole inspection apparatus and hole inspection method using the same
WO2007120996A3 (en) Method and apparatus for compact spectrometer for detecting hazardous agents
WO2004105087A3 (en) Apparatus and methods for enabling robust separation between signals of interest and noise
WO2009140403A3 (en) Systems and methods for detecting defects on a wafer and generating inspection results for the wafer
MX345972B (es) Sistema, métodos y dispositivo de análisis de material.
EP1376651A3 (en) Mass spectrometric data processing method and apparatus
WO2009105384A3 (en) System and method for electronic inspection and record creation of assembly, repair and maintenance operations
TW200745771A (en) Adjustment method, substrate processing method, substrate processing apparatus, exposure apparatus, inspection apparatus, measurement and/or inspection system, processing apparatus, computer system, program and information recording medium
CN105518821A (zh) 带电粒子束装置以及试样图像取得方法
WO2012091494A3 (ko) 기판 검사방법
JP2012532458A5 (zh)
WO2004003572A3 (en) Methods and apparatus for test process enhancement
TW200714894A (en) Mask defect inspecting method, mask defect inspecting apparatus, and semiconductor device manufacturing method
HK1118337A1 (en) Methods for altering one or more parameters of a measurement system
WO2005081981A3 (en) Libs system and method for engine exhaust monitoring
TW200719397A (en) Analyzing apparatus, processing apparatus, measuring instrument, exposure apparatus, substrate processing system, analysis method, and program
CN105067572A (zh) 一种增强激光诱导等离子体信号的方法及装置
WO2007126901A3 (en) Apparatus and method for predicting disease

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees