TW200732799A - Laminated structure, and electrode for electric circuit using the same - Google Patents

Laminated structure, and electrode for electric circuit using the same

Info

Publication number
TW200732799A
TW200732799A TW096102359A TW96102359A TW200732799A TW 200732799 A TW200732799 A TW 200732799A TW 096102359 A TW096102359 A TW 096102359A TW 96102359 A TW96102359 A TW 96102359A TW 200732799 A TW200732799 A TW 200732799A
Authority
TW
Taiwan
Prior art keywords
thin film
molybdenum
film
ito
breaking
Prior art date
Application number
TW096102359A
Other languages
English (en)
Other versions
TWI427378B (zh
Inventor
Satoshi Umeno
Katsunori Honda
Kazuyoshi Inoue
Masato Matsubara
Original Assignee
Idemitsu Kosan Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Idemitsu Kosan Co filed Critical Idemitsu Kosan Co
Publication of TW200732799A publication Critical patent/TW200732799A/zh
Application granted granted Critical
Publication of TWI427378B publication Critical patent/TWI427378B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
    • C23C28/023—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material only coatings of metal elements only
    • C23C28/025—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material only coatings of metal elements only with at least one zinc-based layer
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G02F1/13439—Electrodes characterised by their electrical, optical, physical properties; materials therefor; method of making
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B13/00—Apparatus or processes specially adapted for manufacturing conductors or cables
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
    • H01B5/02—Single bars, rods, wires, or strips
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
    • H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136286—Wiring, e.g. gate line, drain line
    • G02F1/13629—Multilayer wirings
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/805—Electrodes
    • H10K50/81—Anodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/805—Electrodes
    • H10K50/81—Anodes
    • H10K50/813—Anodes characterised by their shape
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/805—Electrodes
    • H10K50/81—Anodes
    • H10K50/816—Multilayers, e.g. transparent multilayers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Non-Insulated Conductors (AREA)
  • Electroluminescent Light Sources (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
TW096102359A 2006-01-25 2007-01-22 Laminated structure and the use of its electrical circuit electrode TWI427378B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006016974 2006-01-25

Publications (2)

Publication Number Publication Date
TW200732799A true TW200732799A (en) 2007-09-01
TWI427378B TWI427378B (zh) 2014-02-21

Family

ID=38309075

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096102359A TWI427378B (zh) 2006-01-25 2007-01-22 Laminated structure and the use of its electrical circuit electrode

Country Status (7)

Country Link
US (1) US8957313B2 (zh)
EP (1) EP1978400B1 (zh)
JP (1) JP5165388B2 (zh)
KR (1) KR101345022B1 (zh)
CN (1) CN101375204A (zh)
TW (1) TWI427378B (zh)
WO (1) WO2007086280A1 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5165388B2 (ja) 2006-01-25 2013-03-21 出光興産株式会社 積層構造及びそれを用いた電気回路用電極
JP2013122903A (ja) * 2011-11-10 2013-06-20 Nitto Denko Corp 有機ｅｌデバイス、および、有機ｅｌデバイスの製造方法
KR20140055097A (ko) 2012-10-30 2014-05-09 삼성디스플레이 주식회사 터치 스크린 패널의 제조방법

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5366588A (en) * 1992-03-13 1994-11-22 U.S. Philips Corporation Method of manufacturing an electrically conductive pattern of tin-doped indium oxide (ITO) on a substrate
JPH06130405A (ja) * 1992-10-21 1994-05-13 Fujitsu Ltd 液晶表示装置の製造方法
JPH06177082A (ja) * 1992-12-02 1994-06-24 Hitachi Ltd Ｉｔｏ膜のエッチング方法
JPH0764112A (ja) 1993-08-30 1995-03-10 Sanyo Electric Co Ltd 液晶表示装置とその製造方法
WO1997046054A1 (fr) * 1996-05-29 1997-12-04 Idemitsu Kosan Co., Ltd. Dispositif organique electroluminescent
KR100238795B1 (ko) * 1997-03-03 2000-01-15 구본준 액정 표시 장치의 구조 및 그 액정 표시 장치의 제조 방법
JPH1117188A (ja) * 1997-06-23 1999-01-22 Sharp Corp アクティブマトリクス基板
KR100320661B1 (ko) * 1998-04-17 2002-01-17 니시무로 타이죠 액정표시장치, 매트릭스 어레이기판 및 그 제조방법
JP3422272B2 (ja) * 1998-12-17 2003-06-30 日本板硝子株式会社 Ｉｔｏ透明導電膜付き基板とその製造方法
JP2000238178A (ja) * 1999-02-24 2000-09-05 Teijin Ltd 透明導電積層体
JP3420135B2 (ja) * 1999-10-26 2003-06-23 日本電気株式会社 アクティブマトリクス基板の製造方法
US6838696B2 (en) * 2000-03-15 2005-01-04 Advanced Display Inc. Liquid crystal display
JP4249886B2 (ja) * 2000-07-25 2009-04-08 シャープ株式会社 薄膜半導体装置の製造方法
JP4212025B2 (ja) * 2002-07-04 2009-01-21 Ｈｏｙａ株式会社 反射型マスクブランクス及び反射型マスク並びに反射型マスクの製造方法
WO2004013372A1 (ja) * 2002-08-02 2004-02-12 Idemitsu Kosan Co.,Ltd. スパッタリングターゲット及び焼結体及びそれらを利用して製造した導電膜、並びに有機ｅｌ素子及びそれに用いる基板
JP4448648B2 (ja) 2002-08-02 2010-04-14 出光興産株式会社 スパッタリングターゲット及び焼結体それらを利用して製造した導電膜。
KR100980015B1 (ko) * 2003-08-19 2010-09-03 삼성전자주식회사 박막 트랜지스터 표시판 및 그 제조 방법
JP2005277402A (ja) * 2004-02-25 2005-10-06 Mitsubishi Gas Chem Co Inc 反射電極膜を含む積層膜のエッチング組成物および積層配線構造の形成方法
SG114747A1 (en) * 2004-02-25 2005-09-28 Mitsubishi Gas Chemical Co Etching composition for laminated film including reflective electrode and method for forming laminated wiring structure
JP2007191761A (ja) 2006-01-19 2007-08-02 Idemitsu Kosan Co Ltd 積層構造、それを用いた電気回路用電極及びその製造方法
JP5165388B2 (ja) 2006-01-25 2013-03-21 出光興産株式会社 積層構造及びそれを用いた電気回路用電極

Also Published As

Publication number Publication date
WO2007086280A1 (ja) 2007-08-02
TWI427378B (zh) 2014-02-21
US20090008124A1 (en) 2009-01-08
JPWO2007086280A1 (ja) 2009-06-18
JP5165388B2 (ja) 2013-03-21
KR20080087134A (ko) 2008-09-30
CN101375204A (zh) 2009-02-25
EP1978400B1 (en) 2012-08-08
EP1978400A4 (en) 2010-03-03
US8957313B2 (en) 2015-02-17
EP1978400A1 (en) 2008-10-08
KR101345022B1 (ko) 2013-12-26

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MM4A Annulment or lapse of patent due to non-payment of fees