TW200641956A - Two dimensional stationary beam profile and angular mapping - Google Patents

Two dimensional stationary beam profile and angular mapping

Info

Publication number
TW200641956A
TW200641956A TW094116753A TW94116753A TW200641956A TW 200641956 A TW200641956 A TW 200641956A TW 094116753 A TW094116753 A TW 094116753A TW 94116753 A TW94116753 A TW 94116753A TW 200641956 A TW200641956 A TW 200641956A
Authority
TW
Taiwan
Prior art keywords
rods
crossover
horizontal
measurement points
measurements
Prior art date
Application number
TW094116753A
Other languages
English (en)
Inventor
Victor Benveniste
Original Assignee
Axcelis Tech Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Axcelis Tech Inc filed Critical Axcelis Tech Inc
Publication of TW200641956A publication Critical patent/TW200641956A/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24507—Intensity, dose or other characteristics of particle beams or electromagnetic radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24507—Intensity, dose or other characteristics of particle beams or electromagnetic radiation
    • H01J2237/24514—Beam diagnostics including control of the parameter or property diagnosed
    • H01J2237/24528—Direction of beam or parts thereof in view of the optical axis, e.g. beam angle, angular distribution, beam divergence, beam convergence or beam landing angle on sample or workpiece
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/304—Controlling tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31701—Ion implantation
    • H01J2237/31703—Dosimetry

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Measurement Of Radiation (AREA)
TW094116753A 2004-05-20 2005-05-23 Two dimensional stationary beam profile and angular mapping TW200641956A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/850,298 US6872953B1 (en) 2004-05-20 2004-05-20 Two dimensional stationary beam profile and angular mapping

Publications (1)

Publication Number Publication Date
TW200641956A true TW200641956A (en) 2006-12-01

Family

ID=34314286

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094116753A TW200641956A (en) 2004-05-20 2005-05-23 Two dimensional stationary beam profile and angular mapping

Country Status (5)

Country Link
US (1) US6872953B1 (zh)
EP (1) EP1883946A1 (zh)
JP (1) JP2008546141A (zh)
TW (1) TW200641956A (zh)
WO (1) WO2006126997A1 (zh)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6989545B1 (en) * 2004-07-07 2006-01-24 Axcelis Technologies, Inc. Device and method for measurement of beam angle and divergence
US7394073B2 (en) * 2005-04-05 2008-07-01 Varian Semiconductor Equipment Associates, Inc. Methods and apparatus for ion beam angle measurement in two dimensions
US7435977B2 (en) * 2005-12-12 2008-10-14 Axcelis Technologies, Inc. Ion beam angle measurement systems and methods for ion implantation systems
US7476876B2 (en) * 2005-12-21 2009-01-13 Axcelis Technologies, Inc. Ion beam angle measurement systems and methods employing varied angle slot arrays for ion implantation systems
US20080073553A1 (en) * 2006-02-13 2008-03-27 Ibis Technology Corporation Ion beam profiler
US7663125B2 (en) * 2006-06-09 2010-02-16 Varian Semiconductor Equipment Associates, Inc. Ion beam current uniformity monitor, ion implanter and related method
US7683348B2 (en) * 2006-10-11 2010-03-23 Axcelis Technologies, Inc. Sensor for ion implanter
NL2001369C2 (nl) * 2007-03-29 2010-06-14 Ims Nanofabrication Ag Werkwijze voor maskerloze deeltjesbundelbelichting.
US7897944B2 (en) * 2008-07-21 2011-03-01 Axcelis Technologies, Inc. Method and apparatus for measurement of beam angle in ion implantation
GB201401892D0 (en) * 2014-02-04 2014-03-19 Welding Inst System and method for measuring properties of a charges particle beam
JP6579985B2 (ja) * 2016-03-18 2019-09-25 住友重機械イオンテクノロジー株式会社 イオン注入装置および測定装置
JP6985951B2 (ja) * 2018-02-08 2021-12-22 住友重機械イオンテクノロジー株式会社 イオン注入装置および測定装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3911280A (en) * 1974-04-11 1975-10-07 Us Energy Method of measuring a profile of the density of charged particles in a particle beam
US3989946A (en) * 1975-03-31 1976-11-02 Texas Instruments Incorporated Arrays for infrared image detection
JPS5691366A (en) * 1979-12-26 1981-07-24 Fujitsu Ltd Ion injector
US4829243A (en) * 1988-02-19 1989-05-09 Microelectronics And Computer Technology Corporation Electron beam testing of electronic components
US4992742A (en) * 1988-12-22 1991-02-12 Mitsubishi Denki Kabushiki Kaisha Charged-particle distribution measuring apparatus
US5198676A (en) 1991-09-27 1993-03-30 Eaton Corporation Ion beam profiling method and apparatus
US5218210A (en) 1992-02-18 1993-06-08 Eaton Corporation Broad beam flux density control
US6677598B1 (en) 2003-04-29 2004-01-13 Axcelis Technologies, Inc. Beam uniformity and angular distribution measurement system

Also Published As

Publication number Publication date
JP2008546141A (ja) 2008-12-18
EP1883946A1 (en) 2008-02-06
US6872953B1 (en) 2005-03-29
WO2006126997A1 (en) 2006-11-30

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