TW200520055A - Illumination optical system and exposure apparatus - Google Patents
Illumination optical system and exposure apparatusInfo
- Publication number
- TW200520055A TW200520055A TW093133867A TW93133867A TW200520055A TW 200520055 A TW200520055 A TW 200520055A TW 093133867 A TW093133867 A TW 093133867A TW 93133867 A TW93133867 A TW 93133867A TW 200520055 A TW200520055 A TW 200520055A
- Authority
- TW
- Taiwan
- Prior art keywords
- optical system
- illumination optical
- exposure apparatus
- mirror
- reflection surface
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Light Sources And Details Of Projection-Printing Devices (AREA)
- Microscoopes, Condenser (AREA)
- Lenses (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003380075A JP2005141158A (ja) | 2003-11-10 | 2003-11-10 | 照明光学系及び露光装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200520055A true TW200520055A (en) | 2005-06-16 |
TWI270120B TWI270120B (en) | 2007-01-01 |
Family
ID=34431393
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW093133867A TWI270120B (en) | 2003-11-10 | 2004-11-05 | Illumination optical system and exposure apparatus |
Country Status (5)
Country | Link |
---|---|
US (1) | US20050105290A1 (zh) |
EP (1) | EP1530087A3 (zh) |
JP (1) | JP2005141158A (zh) |
KR (1) | KR20050045849A (zh) |
TW (1) | TWI270120B (zh) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI413852B (zh) * | 2006-03-24 | 2013-11-01 | 尼康股份有限公司 | 投影光學系統、曝光裝置以及元件製造方法 |
TWI417649B (zh) * | 2005-12-28 | 2013-12-01 | 尼康股份有限公司 | 十字標記運送裝置、曝光裝置、十字標記運送方法以及十字標記的處理方法 |
US8698174B2 (en) | 2006-04-13 | 2014-04-15 | Epistar Corporation | Semiconductor light emitting device |
TWI790304B (zh) * | 2017-10-26 | 2023-01-21 | 德商卡爾蔡司Smt有限公司 | 修復用於euv裝置之照明系統的方法以及偵測器模組 |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005235959A (ja) * | 2004-02-18 | 2005-09-02 | Canon Inc | 光発生装置及び露光装置 |
WO2007135587A2 (en) | 2006-05-16 | 2007-11-29 | Philips Intellectual Property & Standards Gmbh | A method of increasing the conversion efficiency of an euv and/or soft x-ray lamp and a corresponding apparatus |
DE102006039655A1 (de) * | 2006-08-24 | 2008-03-20 | Carl Zeiss Smt Ag | Beleuchtungssystem für eine Mikrolithographie-Projektionsbelichtungsanlage, Projektionsbelichtungsanlage mit einem derartigen Beleuchtungssystem, Verfahren zur Herstellung eines mikrostruktuierten Bauelements mit einer derartigen Projektionsbelichtungsanlage sowie durch dieses Verfahren hergestelltes mikrostrukturiertes Bauelement |
JP4989180B2 (ja) | 2006-10-13 | 2012-08-01 | キヤノン株式会社 | 照明光学系および露光装置 |
JP4986754B2 (ja) | 2007-07-27 | 2012-07-25 | キヤノン株式会社 | 照明光学系及びそれを有する露光装置 |
JP5241270B2 (ja) * | 2008-02-27 | 2013-07-17 | キヤノン株式会社 | 照明光学系、これを用いた露光装置及びデバイス製造方法 |
JP5142892B2 (ja) | 2008-09-03 | 2013-02-13 | キヤノン株式会社 | 照明光学系及び露光装置 |
JP5534910B2 (ja) * | 2009-04-23 | 2014-07-02 | ギガフォトン株式会社 | 極端紫外光源装置 |
CN107870417B (zh) * | 2017-11-08 | 2020-12-22 | 北京仿真中心 | 一种背景辐射可控的红外点源目标模拟器 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5486919A (en) * | 1992-04-27 | 1996-01-23 | Canon Kabushiki Kaisha | Inspection method and apparatus for inspecting a particle, if any, on a substrate having a pattern |
US5861952A (en) * | 1992-11-16 | 1999-01-19 | Canon Kabushiki Kaisha | Optical inspection method and apparatus including intensity modulation of a light beam and detection of light scattered at an inspection position |
JP3211538B2 (ja) * | 1994-01-13 | 2001-09-25 | キヤノン株式会社 | 検査装置及びそれを用いた半導体デバイスの製造方法 |
JPH07209202A (ja) * | 1994-01-21 | 1995-08-11 | Canon Inc | 表面状態検査装置、該表面状態検査装置を備える露光装置及び該露光装置を用いてデバイスを製造する方法 |
JP3183046B2 (ja) * | 1994-06-06 | 2001-07-03 | キヤノン株式会社 | 異物検査装置及びそれを用いた半導体デバイスの製造方法 |
JPH0815169A (ja) * | 1994-06-28 | 1996-01-19 | Canon Inc | 異物検査装置及びそれを用いた半導体デバイスの製造 方法 |
JPH09320952A (ja) * | 1996-05-29 | 1997-12-12 | Nikon Corp | 露光装置 |
JP3706691B2 (ja) * | 1996-08-26 | 2005-10-12 | キヤノン株式会社 | X線縮小投影露光装置及びこれを用いた半導体デバイス製造方法 |
JP3005203B2 (ja) * | 1997-03-24 | 2000-01-31 | キヤノン株式会社 | 照明装置、露光装置及びデバイス製造方法 |
US6398374B1 (en) * | 1998-12-31 | 2002-06-04 | The Regents Of The University Of California | Condenser for ring-field deep ultraviolet and extreme ultraviolet lithography |
US6392742B1 (en) * | 1999-06-01 | 2002-05-21 | Canon Kabushiki Kaisha | Illumination system and projection exposure apparatus |
JP3919419B2 (ja) * | 2000-03-30 | 2007-05-23 | キヤノン株式会社 | 照明装置及びそれを有する露光装置 |
DE10134387A1 (de) * | 2001-07-14 | 2003-01-23 | Zeiss Carl | Optisches System mit mehreren optischen Elementen |
US6919951B2 (en) * | 2001-07-27 | 2005-07-19 | Canon Kabushiki Kaisha | Illumination system, projection exposure apparatus and device manufacturing method |
JPWO2003050857A1 (ja) * | 2001-12-12 | 2005-04-21 | 株式会社ニコン | 反射型照明光学素子、反射型照明光学系、及びduv〜euv光露光装置 |
JP3564104B2 (ja) * | 2002-01-29 | 2004-09-08 | キヤノン株式会社 | 露光装置及びその制御方法、これを用いたデバイスの製造方法 |
JP3720788B2 (ja) * | 2002-04-15 | 2005-11-30 | キヤノン株式会社 | 投影露光装置及びデバイス製造方法 |
-
2003
- 2003-11-10 JP JP2003380075A patent/JP2005141158A/ja not_active Withdrawn
-
2004
- 2004-11-04 US US10/980,341 patent/US20050105290A1/en not_active Abandoned
- 2004-11-05 TW TW093133867A patent/TWI270120B/zh not_active IP Right Cessation
- 2004-11-08 EP EP04026463A patent/EP1530087A3/en not_active Withdrawn
- 2004-11-09 KR KR1020040090676A patent/KR20050045849A/ko active IP Right Grant
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI417649B (zh) * | 2005-12-28 | 2013-12-01 | 尼康股份有限公司 | 十字標記運送裝置、曝光裝置、十字標記運送方法以及十字標記的處理方法 |
TWI413852B (zh) * | 2006-03-24 | 2013-11-01 | 尼康股份有限公司 | 投影光學系統、曝光裝置以及元件製造方法 |
US8698174B2 (en) | 2006-04-13 | 2014-04-15 | Epistar Corporation | Semiconductor light emitting device |
TWI790304B (zh) * | 2017-10-26 | 2023-01-21 | 德商卡爾蔡司Smt有限公司 | 修復用於euv裝置之照明系統的方法以及偵測器模組 |
Also Published As
Publication number | Publication date |
---|---|
EP1530087A3 (en) | 2006-01-04 |
US20050105290A1 (en) | 2005-05-19 |
EP1530087A2 (en) | 2005-05-11 |
KR20050045849A (ko) | 2005-05-17 |
TWI270120B (en) | 2007-01-01 |
JP2005141158A (ja) | 2005-06-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |