TW200515482A - Heating unit - Google Patents

Heating unit

Info

Publication number
TW200515482A
TW200515482A TW093121185A TW93121185A TW200515482A TW 200515482 A TW200515482 A TW 200515482A TW 093121185 A TW093121185 A TW 093121185A TW 93121185 A TW93121185 A TW 93121185A TW 200515482 A TW200515482 A TW 200515482A
Authority
TW
Taiwan
Prior art keywords
heat
heating unit
plate
light
retaining body
Prior art date
Application number
TW093121185A
Other languages
English (en)
Chinese (zh)
Other versions
TWI313487B (https=
Inventor
Yoichi Mizukawa
Koji Miyauchi
Original Assignee
Ushio Electric Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Electric Inc filed Critical Ushio Electric Inc
Publication of TW200515482A publication Critical patent/TW200515482A/zh
Application granted granted Critical
Publication of TWI313487B publication Critical patent/TWI313487B/zh

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H10P95/90—Thermal treatments, e.g. annealing or sintering
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0431—Apparatus for thermal treatment
    • H10P72/0436—Apparatus for thermal treatment mainly by radiation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/0033—Heating devices using lamps
    • H05B3/0038—Heating devices using lamps for industrial applications
    • H05B3/0047—Heating devices using lamps for industrial applications for semiconductor manufacture
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0431—Apparatus for thermal treatment
    • H10P72/0432—Apparatus for thermal treatment mainly by conduction

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Resistance Heating (AREA)
  • Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
TW093121185A 2003-10-24 2004-07-15 Heating unit TW200515482A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003364398A JP4321213B2 (ja) 2003-10-24 2003-10-24 加熱ユニット

Publications (2)

Publication Number Publication Date
TW200515482A true TW200515482A (en) 2005-05-01
TWI313487B TWI313487B (https=) 2009-08-11

Family

ID=34510108

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093121185A TW200515482A (en) 2003-10-24 2004-07-15 Heating unit

Country Status (5)

Country Link
US (1) US7218847B2 (https=)
JP (1) JP4321213B2 (https=)
KR (1) KR100811390B1 (https=)
CN (1) CN1610081A (https=)
TW (1) TW200515482A (https=)

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US7695564B1 (en) * 2005-02-03 2010-04-13 Hrl Laboratories, Llc Thermal management substrate
JP4852852B2 (ja) * 2005-02-17 2012-01-11 ウシオ電機株式会社 加熱ユニット
KR100684584B1 (ko) 2005-07-15 2007-02-22 주식회사 아트라스비엑스 합성수지체 접합용 융착기의 열판
JP2007115926A (ja) * 2005-10-20 2007-05-10 Tokyo Univ Of Agriculture & Technology サーマルヘッドおよび熱処理装置
US7804148B2 (en) * 2006-02-16 2010-09-28 International Business Machines Corporation Opto-thermal mask including aligned thermal dissipative layer, reflective layer and transparent capping layer
TWI290777B (en) * 2006-02-27 2007-12-01 Guei-Fang Chen Lighting device with light emitting diode
US8691017B2 (en) * 2008-04-11 2014-04-08 National University Corporation Tohoku University Heat equalizer and organic film forming apparatus
JP4840437B2 (ja) * 2008-12-03 2011-12-21 東京エレクトロン株式会社 基板加熱装置、基板加熱方法及び記憶媒体
CN103088288A (zh) * 2011-11-03 2013-05-08 北京北方微电子基地设备工艺研究中心有限责任公司 基片处理设备及其腔室装置
CN103374698A (zh) * 2012-04-23 2013-10-30 北京北方微电子基地设备工艺研究中心有限责任公司 加热腔室以及等离子体加工设备
US9842753B2 (en) * 2013-04-26 2017-12-12 Applied Materials, Inc. Absorbing lamphead face
CN104333922B (zh) * 2014-11-21 2016-01-20 连云港市盛昌照明电器有限公司 一种石英玻璃加热管及其制备方法和热水器
CN106898567B (zh) * 2015-12-17 2020-03-31 北京北方华创微电子装备有限公司 一种透明介质窗、基片处理腔室和基片处理系统
US10495369B2 (en) * 2016-12-02 2019-12-03 Bsh Hausgeraete Gmbh Refrigeration device comprising a fan with an heat-conducting element
US20230338993A1 (en) * 2022-04-22 2023-10-26 Semes Co., Ltd. Apparatus for heating chemical liquid and system for treating substrate including the same
KR102906176B1 (ko) * 2023-11-20 2026-01-02 피에스케이홀딩스 (주) 레이저 기반 척 히팅 장치 및 척 히팅 방법
KR102827380B1 (ko) * 2024-04-25 2025-07-01 피에스케이홀딩스 (주) 레이저 기반 척 히팅 장치 및 이를 포함하는 기판 처리 장치

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US3395631A (en) * 1965-06-24 1968-08-06 Gaf Corp Thermal developing apparatus
US3798415A (en) * 1972-08-25 1974-03-19 Graham Corp M Electrically heated cooking utensil
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JPS6363773A (ja) * 1986-09-04 1988-03-22 Nippon Telegr & Teleph Corp <Ntt> 接着方法
DE3703768A1 (de) * 1987-02-07 1988-08-18 Fissler Gmbh Vorrichtung zum erfassen der temperatur einer mittels heizwicklungen oder halogenlampen aufgeheizten glaskeramikplatte
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JP2927877B2 (ja) * 1990-04-09 1999-07-28 エム・セテック株式会社 半導体製造装置の均一加熱構造
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JPH04275417A (ja) * 1991-03-04 1992-10-01 Nec Corp 熱処理装置
US5220155A (en) * 1992-03-12 1993-06-15 Emerson Electric Co. Heating and sensing apparatus for range top
JP3046446B2 (ja) 1992-03-17 2000-05-29 三菱電機株式会社 半導体製造装置
JPH06132233A (ja) 1992-10-20 1994-05-13 Nippon Sanso Kk 薄膜製造装置用加熱装置の均熱板
JPH06260422A (ja) 1993-03-08 1994-09-16 Kokusai Electric Co Ltd ガラス基板加熱方法及びその装置
US5410162A (en) 1993-10-15 1995-04-25 Texas Instruments Incorporated Apparatus for and method of rapid testing of semiconductor components at elevated temperature
JPH07172996A (ja) 1993-12-20 1995-07-11 Matsushita Electric Ind Co Ltd 誘電体薄膜の製造方法及びその製造装置
JP3578872B2 (ja) * 1995-10-26 2004-10-20 三菱電機株式会社 Ｘ線マスクの製造方法および加熱装置
JP3442935B2 (ja) 1996-08-27 2003-09-02 株式会社東芝 気相成長用基板及びその加熱方法
JPH10321547A (ja) 1997-05-22 1998-12-04 Kokusai Electric Co Ltd 熱処理装置
JP2000321907A (ja) * 1999-05-17 2000-11-24 Konica Corp 定着装置
US6345169B1 (en) * 1999-07-01 2002-02-05 Konica Corporation Fixing apparatus with heat ray generating device
JP2001027860A (ja) * 1999-07-13 2001-01-30 Konica Corp 定着装置
SE515785C2 (sv) * 2000-02-23 2001-10-08 Obducat Ab Anordning för homogen värmning av ett objekt och användning av anordningen
JP2001332607A (ja) 2000-05-25 2001-11-30 Canon Inc 基板加熱装置および均熱板

Also Published As

Publication number Publication date
JP2005129385A (ja) 2005-05-19
KR100811390B1 (ko) 2008-03-10
CN1610081A (zh) 2005-04-27
US20050089317A1 (en) 2005-04-28
TWI313487B (https=) 2009-08-11
JP4321213B2 (ja) 2009-08-26
US7218847B2 (en) 2007-05-15
KR20050039545A (ko) 2005-04-29

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees