TW200511390A - Exposure method and exposure apparatus, stage unit, and device manufacturing method - Google Patents
Exposure method and exposure apparatus, stage unit, and device manufacturing methodInfo
- Publication number
- TW200511390A TW200511390A TW093123599A TW93123599A TW200511390A TW 200511390 A TW200511390 A TW 200511390A TW 093123599 A TW093123599 A TW 093123599A TW 93123599 A TW93123599 A TW 93123599A TW 200511390 A TW200511390 A TW 200511390A
- Authority
- TW
- Taiwan
- Prior art keywords
- wafer
- exposure
- wafer stage
- interchange
- device manufacturing
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003288919 | 2003-08-07 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200511390A true TW200511390A (en) | 2005-03-16 |
TWI343594B TWI343594B (zh) | 2011-06-11 |
Family
ID=34131533
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW093123599A TW200511390A (en) | 2003-08-07 | 2004-08-06 | Exposure method and exposure apparatus, stage unit, and device manufacturing method |
Country Status (9)
Country | Link |
---|---|
US (3) | US20060187431A1 (zh) |
EP (2) | EP1995769A1 (zh) |
JP (2) | JP4552146B2 (zh) |
KR (2) | KR101205263B1 (zh) |
CN (2) | CN100468624C (zh) |
AT (1) | ATE429031T1 (zh) |
DE (1) | DE602004020634D1 (zh) |
TW (1) | TW200511390A (zh) |
WO (1) | WO2005015615A1 (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI737181B (zh) * | 2019-02-22 | 2021-08-21 | 大陸商上海微電子裝備(集團)股份有限公司 | 光罩對準感測器及光刻機 |
Families Citing this family (52)
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JP4720743B2 (ja) * | 2004-02-19 | 2011-07-13 | 株式会社ニコン | 露光装置及び露光方法、デバイス製造方法 |
US7034917B2 (en) | 2004-04-01 | 2006-04-25 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and device manufactured thereby |
EP1890325B1 (en) * | 2005-05-18 | 2014-01-01 | Murata Manufacturing Co., Ltd. | Aligning stage, bump forming apparatus and bump forming method using such aligning stage |
KR101254796B1 (ko) * | 2005-12-29 | 2013-04-15 | 엘지전자 주식회사 | 노광장치 및 그 제어방법 |
CN100456138C (zh) * | 2006-06-13 | 2009-01-28 | 上海微电子装备有限公司 | 浸没式光刻机浸液流场维持系统 |
JP2008021748A (ja) * | 2006-07-11 | 2008-01-31 | Canon Inc | 露光装置 |
JP5151989B2 (ja) * | 2006-11-09 | 2013-02-27 | 株式会社ニコン | 保持装置、位置検出装置及び露光装置、並びにデバイス製造方法 |
US7973910B2 (en) * | 2006-11-17 | 2011-07-05 | Nikon Corporation | Stage apparatus and exposure apparatus |
JP2008140992A (ja) * | 2006-12-01 | 2008-06-19 | Canon Inc | 露光装置 |
US8194232B2 (en) | 2007-07-24 | 2012-06-05 | Nikon Corporation | Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, position control method and position control system, and device manufacturing method |
JP4992668B2 (ja) * | 2007-10-31 | 2012-08-08 | 旭硝子株式会社 | 容器交換装置および容器交換方法 |
JP2009284608A (ja) * | 2008-05-20 | 2009-12-03 | Canon Inc | パルスモータ、位置決め装置、露光装置及びデバイス製造方法 |
US8508735B2 (en) | 2008-09-22 | 2013-08-13 | Nikon Corporation | Movable body apparatus, movable body drive method, exposure apparatus, exposure method, and device manufacturing method |
US8325325B2 (en) * | 2008-09-22 | 2012-12-04 | Nikon Corporation | Movable body apparatus, movable body drive method, exposure apparatus, exposure method, and device manufacturing method |
US8994923B2 (en) * | 2008-09-22 | 2015-03-31 | Nikon Corporation | Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method |
US8760629B2 (en) | 2008-12-19 | 2014-06-24 | Nikon Corporation | Exposure apparatus including positional measurement system of movable body, exposure method of exposing object including measuring positional information of movable body, and device manufacturing method that includes exposure method of exposing object, including measuring positional information of movable body |
US8599359B2 (en) | 2008-12-19 | 2013-12-03 | Nikon Corporation | Exposure apparatus, exposure method, device manufacturing method, and carrier method |
US8773635B2 (en) * | 2008-12-19 | 2014-07-08 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
US8902402B2 (en) | 2008-12-19 | 2014-12-02 | Nikon Corporation | Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method |
CN101551599B (zh) * | 2009-04-03 | 2011-07-20 | 清华大学 | 一种光刻机硅片台双台交换系统 |
CN101551598B (zh) | 2009-04-03 | 2010-12-01 | 清华大学 | 一种光刻机硅片台双台交换系统 |
CN101571676B (zh) | 2009-04-03 | 2010-12-01 | 清华大学 | 一种光刻机硅片台双台交换系统 |
US8970820B2 (en) * | 2009-05-20 | 2015-03-03 | Nikon Corporation | Object exchange method, exposure method, carrier system, exposure apparatus, and device manufacturing method |
US8553204B2 (en) * | 2009-05-20 | 2013-10-08 | Nikon Corporation | Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method |
US8792084B2 (en) * | 2009-05-20 | 2014-07-29 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
US8446569B2 (en) * | 2009-06-19 | 2013-05-21 | Nikon Corporation | Exposure apparatus, exposure method and device manufacturing method |
IT1399285B1 (it) * | 2009-07-03 | 2013-04-11 | Applied Materials Inc | Sistema di lavorazione substrato |
US20110096306A1 (en) * | 2009-09-28 | 2011-04-28 | Nikon Corporation | Stage apparatus, exposure apparatus, driving method, exposing method, and device fabricating method |
US20110102761A1 (en) * | 2009-09-28 | 2011-05-05 | Nikon Corporation | Stage apparatus, exposure apparatus, and device fabricating method |
US20110096312A1 (en) * | 2009-09-28 | 2011-04-28 | Nikon Corporation | Exposure apparatus and device fabricating method |
US20110096318A1 (en) * | 2009-09-28 | 2011-04-28 | Nikon Corporation | Exposure apparatus and device fabricating method |
US20110128523A1 (en) * | 2009-11-19 | 2011-06-02 | Nikon Corporation | Stage apparatus, exposure apparatus, driving method, exposing method, and device fabricating method |
US20110123913A1 (en) * | 2009-11-19 | 2011-05-26 | Nikon Corporation | Exposure apparatus, exposing method, and device fabricating method |
CN101727019B (zh) * | 2009-12-15 | 2011-05-11 | 清华大学 | 光刻机硅片台双台交换系统及其交换方法 |
CN101963763B (zh) * | 2010-08-03 | 2012-06-06 | 哈尔滨工业大学 | 一种基于双驱双桥换台工位的双工件台高精度交换装置 |
CN102789143A (zh) * | 2011-05-17 | 2012-11-21 | 川宝科技股份有限公司 | 曝光机标靶影像对位装置及使用该装置的曝光机 |
TW201921166A (zh) * | 2011-08-30 | 2019-06-01 | 日商尼康股份有限公司 | 基板處理裝置、元件製造方法、及平板顯示器之製造方法 |
TWI518839B (zh) | 2012-04-19 | 2016-01-21 | 因特瓦克公司 | 製造太陽能電池使用之雙遮罩配置 |
CN104582863B (zh) | 2012-04-26 | 2016-09-21 | 因特瓦克公司 | 用于真空处理的系统结构 |
US10062600B2 (en) | 2012-04-26 | 2018-08-28 | Intevac, Inc. | System and method for bi-facial processing of substrates |
JP6082884B2 (ja) * | 2012-06-12 | 2017-02-22 | サンエー技研株式会社 | 露光装置、露光方法 |
TWM523958U (zh) * | 2014-08-01 | 2016-06-11 | 應用材料股份有限公司 | 用於執行光刻製程的處理系統 |
SG11201700675UA (en) | 2014-08-05 | 2017-02-27 | Intevac Inc | Implant masking and alignment |
JP6655925B2 (ja) * | 2015-09-24 | 2020-03-04 | 東京エレクトロン株式会社 | ステージ装置及びプローブ装置 |
CN105607428B (zh) * | 2015-12-30 | 2018-04-17 | 深圳市鑫富宝科技有限公司 | 一种自动曝光机机构 |
JP6353487B2 (ja) * | 2016-05-26 | 2018-07-04 | 株式会社サーマプレシジョン | 投影露光装置及びその投影露光方法 |
JP6207671B1 (ja) * | 2016-06-01 | 2017-10-04 | キヤノン株式会社 | パターン形成装置、基板配置方法及び物品の製造方法 |
CN110520798B (zh) * | 2017-03-31 | 2021-11-16 | 株式会社尼康 | 物体交换装置、物体处理装置、平板显示器的制造方法、元件制造方法、物体交换方法、以及物体处理方法 |
CN109240048A (zh) * | 2018-11-06 | 2019-01-18 | 无锡影速半导体科技有限公司 | 一种多工位工件台一次曝光成型直写光刻系统 |
DE102018132001A1 (de) | 2018-12-12 | 2020-06-18 | Laser Imaging Systems Gmbh | Vorrichtung zum Belichten von plattenförmigen Werkstücken mit hohem Durchsatz |
CN110133470A (zh) * | 2019-06-06 | 2019-08-16 | 德淮半导体有限公司 | 晶圆验收处理方法及装置 |
CN116314001B (zh) * | 2023-05-18 | 2023-07-21 | 合肥安德科铭半导体科技有限公司 | 一种衬底封装设备及其封装方法 |
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US634007A (en) * | 1898-03-14 | 1899-10-03 | Alfred B Lawther | Apparatus for measuring frictional resistances between bodies in sliding contact. |
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US4780617A (en) | 1984-08-09 | 1988-10-25 | Nippon Kogaku K.K. | Method for successive alignment of chip patterns on a substrate |
NL8600785A (nl) * | 1986-03-27 | 1987-10-16 | Asm Lithography Bv | Positioneerinrichting met een z-manipulator en een o-manipulator. |
JPH01314247A (ja) * | 1988-06-13 | 1989-12-19 | Fuji Plant Kogyo Kk | プリント基板の自動露光装置 |
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JP2847883B2 (ja) | 1990-03-30 | 1999-01-20 | 株式会社ニコン | 反射屈折縮小投影光学系 |
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JP2832673B2 (ja) * | 1993-10-29 | 1998-12-09 | 株式会社オーク製作所 | 露光装置およびワークの露光方法 |
JP3559999B2 (ja) * | 1994-07-29 | 2004-09-02 | 株式会社オーク製作所 | マスク整合機構付露光装置およびワークの整合、露光、ならびに搬送方法。 |
EP0722123B1 (en) * | 1995-01-12 | 1999-04-14 | Orc Manufacturing Co., Ltd. | Apparatus and method for exposing of workpiece |
JP4029181B2 (ja) | 1996-11-28 | 2008-01-09 | 株式会社ニコン | 投影露光装置 |
DE69738910D1 (de) * | 1996-11-28 | 2008-09-25 | Nikon Corp | Ausrichtvorrichtung und belichtungsverfahren |
USRE40043E1 (en) * | 1997-03-10 | 2008-02-05 | Asml Netherlands B.V. | Positioning device having two object holders |
JP3704890B2 (ja) * | 1997-06-24 | 2005-10-12 | 神鋼電機株式会社 | 搬送装置 |
JPH11191585A (ja) * | 1997-12-26 | 1999-07-13 | Canon Inc | ステージ装置、およびこれを用いた露光装置、ならびにデバイス製造方法 |
AU2747999A (en) | 1998-03-26 | 1999-10-18 | Nikon Corporation | Projection exposure method and system |
US6788385B2 (en) * | 2001-06-21 | 2004-09-07 | Nikon Corporation | Stage device, exposure apparatus and method |
JP2003173958A (ja) * | 2001-12-06 | 2003-06-20 | Nikon Corp | 露光方法及び露光装置 |
-
2004
- 2004-08-05 AT AT04771271T patent/ATE429031T1/de not_active IP Right Cessation
- 2004-08-05 JP JP2005512952A patent/JP4552146B2/ja not_active Expired - Fee Related
- 2004-08-05 DE DE602004020634T patent/DE602004020634D1/de not_active Expired - Fee Related
- 2004-08-05 EP EP08163444A patent/EP1995769A1/en not_active Withdrawn
- 2004-08-05 CN CNB2004800225368A patent/CN100468624C/zh not_active Expired - Fee Related
- 2004-08-05 CN CN2009100099073A patent/CN101504512B/zh not_active Expired - Fee Related
- 2004-08-05 WO PCT/JP2004/011244 patent/WO2005015615A1/ja active Application Filing
- 2004-08-05 EP EP04771271A patent/EP1655765B1/en not_active Not-in-force
- 2004-08-05 KR KR1020117017639A patent/KR101205263B1/ko active IP Right Grant
- 2004-08-05 KR KR1020067002484A patent/KR101181684B1/ko active IP Right Grant
- 2004-08-06 TW TW093123599A patent/TW200511390A/zh not_active IP Right Cessation
-
2006
- 2006-02-03 US US11/346,205 patent/US20060187431A1/en not_active Abandoned
-
2009
- 2009-03-27 JP JP2009077995A patent/JP5152067B2/ja not_active Expired - Fee Related
- 2009-05-28 US US12/453,996 patent/US20090251679A1/en not_active Abandoned
-
2010
- 2010-02-26 US US12/714,084 patent/US20100177295A1/en not_active Abandoned
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI737181B (zh) * | 2019-02-22 | 2021-08-21 | 大陸商上海微電子裝備(集團)股份有限公司 | 光罩對準感測器及光刻機 |
Also Published As
Publication number | Publication date |
---|---|
KR101181684B1 (ko) | 2012-09-19 |
JP2009147385A (ja) | 2009-07-02 |
KR101205263B1 (ko) | 2012-11-27 |
JPWO2005015615A1 (ja) | 2007-10-04 |
CN101504512A (zh) | 2009-08-12 |
KR20060054426A (ko) | 2006-05-22 |
CN100468624C (zh) | 2009-03-11 |
US20090251679A1 (en) | 2009-10-08 |
EP1655765B1 (en) | 2009-04-15 |
EP1655765A4 (en) | 2008-01-30 |
TWI343594B (zh) | 2011-06-11 |
US20060187431A1 (en) | 2006-08-24 |
DE602004020634D1 (de) | 2009-05-28 |
JP5152067B2 (ja) | 2013-02-27 |
ATE429031T1 (de) | 2009-05-15 |
KR20110106424A (ko) | 2011-09-28 |
CN1833309A (zh) | 2006-09-13 |
EP1995769A1 (en) | 2008-11-26 |
JP4552146B2 (ja) | 2010-09-29 |
CN101504512B (zh) | 2012-11-14 |
WO2005015615A1 (ja) | 2005-02-17 |
EP1655765A1 (en) | 2006-05-10 |
US20100177295A1 (en) | 2010-07-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |