SU793412A3 - Способ получени монокристаллов кремни - Google Patents
Способ получени монокристаллов кремни Download PDFInfo
- Publication number
- SU793412A3 SU793412A3 SU762418282A SU2418282A SU793412A3 SU 793412 A3 SU793412 A3 SU 793412A3 SU 762418282 A SU762418282 A SU 762418282A SU 2418282 A SU2418282 A SU 2418282A SU 793412 A3 SU793412 A3 SU 793412A3
- Authority
- SU
- USSR - Soviet Union
- Prior art keywords
- rod
- peripheral
- silicon
- diameter
- silicon single
- Prior art date
Links
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 13
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 13
- 239000010703 silicon Substances 0.000 title claims abstract description 13
- 238000000034 method Methods 0.000 title claims abstract description 6
- 239000013078 crystal Substances 0.000 title claims description 5
- 239000012535 impurity Substances 0.000 claims description 9
- 239000000155 melt Substances 0.000 claims description 8
- 238000004857 zone melting Methods 0.000 claims description 5
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 3
- 229910052698 phosphorus Inorganic materials 0.000 claims description 3
- 239000011574 phosphorus Substances 0.000 claims description 3
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 230000002093 peripheral effect Effects 0.000 abstract 4
- 239000002019 doping agent Substances 0.000 abstract 2
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 abstract 1
- 238000009826 distribution Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000003723 Smelting Methods 0.000 description 1
- 229930182558 Sterol Natural products 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 125000004437 phosphorous atom Chemical group 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- SBEQWOXEGHQIMW-UHFFFAOYSA-N silicon Chemical compound [Si].[Si] SBEQWOXEGHQIMW-UHFFFAOYSA-N 0.000 description 1
- 150000003432 sterols Chemical class 0.000 description 1
- 235000003702 sterols Nutrition 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/06—Single-crystal growth by zone-melting; Refining by zone-melting the molten zone not extending over the whole cross-section
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Recrystallisation Techniques (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19752551301 DE2551301C3 (de) | 1975-11-14 | 1975-11-14 | Verfahren zum Herstellen von phosphordotierten Siliciumeinkristallen mit in radialer Richtung gezielter randlicher Ahreicherung des Dotierstoffes |
| DE19752551281 DE2551281A1 (de) | 1975-11-14 | 1975-11-14 | Verfahren zum herstellen von phosphordotierten siliciumeinkristallen mit in radialer richtung gezielter randlicher anreicherung des dotierstoffes |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SU793412A3 true SU793412A3 (ru) | 1980-12-30 |
Family
ID=25769618
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SU762418282A SU793412A3 (ru) | 1975-11-14 | 1976-11-11 | Способ получени монокристаллов кремни |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US4126509A (https=) |
| JP (1) | JPS6046072B2 (https=) |
| CA (1) | CA1085703A (https=) |
| DK (1) | DK512476A (https=) |
| FR (1) | FR2331378A1 (https=) |
| GB (1) | GB1542868A (https=) |
| SU (1) | SU793412A3 (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| RU2441838C1 (ru) * | 2010-10-15 | 2012-02-10 | Общество с ограниченной ответственностью Научно-инновационное предприятие СКГМИ (ГТУ) "Стройкомплект-Инновации" | Способ получения кремния |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4270972A (en) * | 1980-03-31 | 1981-06-02 | Rockwell International Corporation | Method for controlled doping semiconductor material with highly volatile dopant |
| GB2082933B (en) * | 1980-09-03 | 1984-10-03 | Westinghouse Electric Corp | High voltage semiconductor materials and structures and method for their |
| JPS63115766U (https=) * | 1987-01-20 | 1988-07-26 | ||
| RU2202655C1 (ru) * | 2002-04-23 | 2003-04-20 | Московский государственный институт стали и сплавов (технологический университет) | Способ получения резистентного кремния |
| CN100351435C (zh) * | 2005-09-29 | 2007-11-28 | 天津市环欧半导体材料技术有限公司 | 区熔气相掺杂太阳能电池硅单晶的制备方法 |
| CN100339513C (zh) * | 2006-04-19 | 2007-09-26 | 天津市环欧半导体材料技术有限公司 | 区熔硅单晶炉电气控制系统 |
| CN1325702C (zh) * | 2006-04-26 | 2007-07-11 | 天津市环欧半导体材料技术有限公司 | 区熔气相掺杂太阳能电池硅单晶的生产方法 |
| CN1325701C (zh) * | 2006-04-26 | 2007-07-11 | 天津市环欧半导体材料技术有限公司 | 气相预掺杂和中子辐照掺杂组合的区熔硅单晶的生产方法 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2854363A (en) * | 1953-04-02 | 1958-09-30 | Int Standard Electric Corp | Method of producing semiconductor crystals containing p-n junctions |
| DE1164680B (de) * | 1958-05-21 | 1964-03-05 | Siemens Ag | Verfahren zum Herstellen von stabfoermigen Halbleiterkoerpern hoher Reinheit |
| US3092462A (en) * | 1960-01-28 | 1963-06-04 | Philips Corp | Method for the manufacture of rods of meltable material |
| NL253184A (https=) * | 1960-06-28 | |||
| DE1303150B (https=) * | 1961-01-13 | 1971-05-13 | Philips Nv | |
| DE1519903A1 (de) * | 1966-09-24 | 1970-02-12 | Siemens Ag | Verfahren mit tiegelfreien Zonenschmelzen eines kristallinen Stabes |
| US3773499A (en) * | 1968-04-03 | 1973-11-20 | M Melnikov | Method of zonal melting of materials |
| BE788026A (fr) * | 1971-08-26 | 1973-02-26 | Siemens Ag | Procede et dispositif d'introduction dirigee de matieres de dopage dansdes cristaux semiconducteurs lors d'une fusion par zones sans creuset |
| DE2234512C3 (de) * | 1972-07-13 | 1979-04-19 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Verfahren zum Herstellen von (Umorientierten Halbleitereinkristallstäben mit zur Stabmitte abtauendem spezifischem Widerstand |
| DE2338338C3 (de) * | 1973-07-27 | 1979-04-12 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Vorrichtung zum Dotieren beim tiegelfreien Zonenschmelzen eines Halbleiterkristallstabes |
| FR2257998B1 (https=) * | 1974-01-10 | 1976-11-26 | Commissariat Energie Atomique |
-
1976
- 1976-10-01 GB GB40740/76A patent/GB1542868A/en not_active Expired
- 1976-10-13 CA CA263,236A patent/CA1085703A/en not_active Expired
- 1976-10-26 US US05/735,583 patent/US4126509A/en not_active Expired - Lifetime
- 1976-11-09 FR FR7633738A patent/FR2331378A1/fr active Granted
- 1976-11-11 SU SU762418282A patent/SU793412A3/ru active
- 1976-11-12 DK DK512476A patent/DK512476A/da not_active Application Discontinuation
- 1976-11-15 JP JP51137197A patent/JPS6046072B2/ja not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| RU2441838C1 (ru) * | 2010-10-15 | 2012-02-10 | Общество с ограниченной ответственностью Научно-инновационное предприятие СКГМИ (ГТУ) "Стройкомплект-Инновации" | Способ получения кремния |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2331378A1 (fr) | 1977-06-10 |
| JPS5261955A (en) | 1977-05-21 |
| JPS6046072B2 (ja) | 1985-10-14 |
| CA1085703A (en) | 1980-09-16 |
| GB1542868A (en) | 1979-03-28 |
| FR2331378B3 (https=) | 1979-07-20 |
| DK512476A (da) | 1977-05-15 |
| US4126509A (en) | 1978-11-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| SU793412A3 (ru) | Способ получени монокристаллов кремни | |
| CA1336061C (en) | High-oxygen-content silicon monocrystal substrate for semiconductor devices and production method therefor | |
| EP0247297B1 (en) | Semiconductor crystal growth via variable melt rotation | |
| EA017453B1 (ru) | Способ и устройство для получения монокристалла | |
| US2961305A (en) | Method of growing semiconductor crystals | |
| CA1045523A (en) | N-conductivity silicon mono-crystals produced by neutron irradiation | |
| US3076732A (en) | Uniform n-type silicon | |
| CA1100390A (en) | N-conductivity silicon monocrystals produced by neutron irradiation | |
| US2730470A (en) | Method of making semi-conductor crystals | |
| DE3216850A1 (de) | Verfahren und vorrichtung zum thermischen behandeln von halbleitermaterialien | |
| US4025365A (en) | Method of producing homogeneously doped p-conductive semiconductor materials | |
| US3124633A (en) | Certificate of correction | |
| JP2005035816A (ja) | シリコン単結晶製造方法及びシリコン単結晶 | |
| JPS57177507A (en) | Heat treatment of amorphous material | |
| US4094730A (en) | Method for fabrication of high minority carrier lifetime, low to moderate resistivity, single crystal silicon | |
| GB1095587A (https=) | ||
| US4277307A (en) | Method of restoring Si crystal lattice order after neutron irradiation | |
| US4072556A (en) | Device for crucible-free floating-zone melting of a crystalline rod and method of operating the same | |
| US4048508A (en) | Apparatus for doping a semiconductor crystalline rod | |
| US3607109A (en) | Method and means of producing a large diameter single-crystal rod from a polycrystal bar | |
| US3563810A (en) | Method for reducing the cross section of semiconductor rods by molten-zone stretching | |
| US3539305A (en) | Zone refining method with plural supply rods | |
| JP6565810B2 (ja) | 中性子照射シリコン単結晶の製造方法 | |
| CN112210819A (zh) | 一种晶棒的制备方法和设备 | |
| GB1164940A (en) | A Method of Melting a Rod of Crystalline Material Zone-by-Zone. |