SU240571A1 - - Google Patents
Info
- Publication number
- SU240571A1 SU240571A1 SU1085954A SU1085954A SU240571A1 SU 240571 A1 SU240571 A1 SU 240571A1 SU 1085954 A SU1085954 A SU 1085954A SU 1085954 A SU1085954 A SU 1085954A SU 240571 A1 SU240571 A1 SU 240571A1
- Authority
- SU
- USSR - Soviet Union
- Prior art keywords
- plate
- resin
- photosensitive layer
- heated
- novolak
- Prior art date
Links
- 150000001875 compounds Chemical group 0.000 claims description 6
- 239000000203 mixture Substances 0.000 claims description 6
- 229920003986 novolac Polymers 0.000 claims description 6
- 229920005989 resin Polymers 0.000 claims description 6
- 239000011347 resin Substances 0.000 claims description 6
- KETQAJRQOHHATG-UHFFFAOYSA-N 1,2-Naphthoquinone Chemical compound C1=CC=C2C(=O)C(=O)C=CC2=C1 KETQAJRQOHHATG-UHFFFAOYSA-N 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 229910052751 metal Inorganic materials 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 3
- 238000007645 offset printing Methods 0.000 claims description 3
- 229920003987 resole Polymers 0.000 claims description 3
- 230000002378 acidificating Effects 0.000 claims description 2
- 239000007864 aqueous solution Substances 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 claims description 2
- 239000000758 substrate Substances 0.000 claims description 2
- 238000007639 printing Methods 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- NBIIXXVUZAFLBC-UHFFFAOYSA-N phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- WSFSSNUMVMOOMR-UHFFFAOYSA-N formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 2
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 2
- 125000000614 1,2-naphthoquinonyl group Chemical group C1(C(C(=CC2=CC=CC=C12)*)=O)=O 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminum Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000002209 hydrophobic Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 229910000162 sodium phosphate Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Publications (1)
Publication Number | Publication Date |
---|---|
SU240571A1 true SU240571A1 (es) |
Family
ID=
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0059250B1 (de) | Lichtempfindliches Gemisch und daraus hergestelltes Kopiermaterial | |
CA1242920A (en) | Process for producing negative copies by means of a material based on 1,2-quinone diazides | |
DE1422474C3 (de) | Lichtempfindliches Gemisch | |
US4696891A (en) | Process for the production of negative relief copies using photosensitive composition having 1,2-quinone diazide and quaternary ammonium compound | |
CA1096221A (en) | Manufacture of imaged articles by laser irradiation of a non-photo sensitive material | |
JPS6356530B2 (es) | ||
JPH0455298B2 (es) | ||
DK144956B (da) | Fremgangsmaade til behandling af en straalingssoelsom plade | |
DE2512933A1 (de) | Lichtempfindliche planographische druckplatte | |
DE1114705C2 (de) | Lichtempfindliche Schichten fuer die photomechanische Herstellung von Druckformen | |
DE4013575C2 (de) | Verfahren zur Herstellung negativer Reliefkopien | |
US3640992A (en) | Naphthoquinone diazide sulfonic acid ester | |
JPH0121500B2 (es) | ||
US3493371A (en) | Radiation-sensitive recording material | |
SU240571A1 (es) | ||
US3406065A (en) | Process for the reversal development of reproduction coatings containing o-naphthoquinone diazide compounds | |
JPH01263647A (ja) | 感光性組成物、感光性複写材料及びネガチブレリーフ複写の製法 | |
JPS6356531B2 (es) | ||
SU448657A3 (ru) | Способ изготовлени офсетной печатной формы | |
JPS6397948A (ja) | 感光性混合物 | |
EP0178594B1 (de) | Verfahren zum Herstellen negativer Kopien mittels eines Materials auf Basis von 1,2-Chinondiaziden | |
DE1522495C3 (de) | Verfahren zur Herstellung von Druckformen | |
JPS59114535A (ja) | 感光性組成物、これから製造した感光性複写材料及び印刷版の製法 | |
US3050388A (en) | Presensitized printing plates and method for the production thereof | |
US20050277053A1 (en) | Increased sensitivity, IR, and UV imageable photographic elements |