SU1696397A1 - Method of regeneration of solution for removing dry aqueous alkali photoresist film - Google Patents
Method of regeneration of solution for removing dry aqueous alkali photoresist film Download PDFInfo
- Publication number
- SU1696397A1 SU1696397A1 SU884641197A SU4641197A SU1696397A1 SU 1696397 A1 SU1696397 A1 SU 1696397A1 SU 884641197 A SU884641197 A SU 884641197A SU 4641197 A SU4641197 A SU 4641197A SU 1696397 A1 SU1696397 A1 SU 1696397A1
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- SU
- USSR - Soviet Union
- Prior art keywords
- solution
- regeneration
- photoresist film
- aqueous alkali
- removing dry
- Prior art date
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Description
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Изобретение относитс к химической технологии, преимущественно к способам нейтрализации химических растворов, и может быть использовано при регенерации рабочих растворов сн ти сухого пленочного всдощелочного фоторезиста при изготовлении схем печатного монтажа (СПФ ВЩ).The invention relates to chemical technology, mainly to methods for neutralizing chemical solutions, and can be used in the regeneration of working solutions for removing dry film alkaline photoresist in the manufacture of printed wiring diagrams (SPF VShS).
Исходный раствор сн ти СПФ ВЩ содержит 100 г/л едкого натра. После поступлени органических соединений в раствор рН снижаетс до 10,6 и требует регенерации или очистки.The stock solution for the removal of the SPF VSH contains 100 g / l of sodium hydroxide. After the organic compounds enter the solution, the pH drops to 10.6 and requires regeneration or purification.
Целью изобретений вл етс упрощение способа регенерации, увеличение длительности использовани раствора сн ти СПФ ВЩ.The aim of the invention is to simplify the method of regeneration, increasing the duration of use of the solution for removing the SPF of VShV.
Дл осуществлений способа раствор, насыщаемый растаорением СПФ ВЩ, фильтруют , нерастворивша с часть композиции остаетс на фильтре, а в фильтрат добавл ют серную кислоту до рН 12,0-12,1.For the implementation of the method, the solution saturated with the dissolution of the SPF of VS is filtered, the part that is insoluble in the composition remains on the filter, and sulfuric acid is added to the filtrate to pH 12.0-12.1.
Пример. Провод т Фильтрование отработанного раствора с рН 106, насыщенного СПФ ВЩ через бумажный напорный фильтр. Коррекцию рН ведут зз счет дозировани серной кислэтн в фильтрат до рН 12,0-12,1, При повторном использовании полученного раствора скорость сн ти СПФ не уменьшаетс . При многократном использовании раствора содержание щелочи снижаетс до 50 г/л за счет выноса, ще- лочи детал ми из рабочего раствора. Поэтому добавление щелочи производ т в раствор до фильтра до концентрации более 50 г/л.Example. Conduct Filtration of the spent solution with a pH of 106, saturated with SPF VSH through a pressure filter paper. The pH is adjusted by dosing sulfuric acid into the filtrate to a pH of 12.0-12.1. When the resulting solution is reused, the removal rate of the SPF does not decrease. With repeated use of the solution, the alkali content is reduced to 50 g / l due to the removal of alkali by parts from the working solution. Therefore, the addition of alkali is carried out in solution to the filter to a concentration of more than 50 g / l.
Критерием оценки пригодности раствора дл повторного использовани вл етс врем . Свежеприготовленный раствор сни- мает пленку фоторезиста за 30-40 с Рас- гвор считаетс непригодным, когда скорость сн ти превышает 2 мин, .The criterion for assessing the suitability of a solution for reuse is time. A freshly prepared solution removes the photoresist film in 30-40 seconds. The expansion pattern is considered unsuitable when the removal rate exceeds 2 minutes.
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GJ О XIGJ O XI
На производстве дл сн ти фоторезиста примен ют специальные модули, в которых регулируетс скорость движени конвейера. При максимальной скорости конвейера деталь находитс в зоне обработки 20-25 с, при минимальной 2 мин. После первой регенерации скорость сн ти фоторезиста составл ет 35-40 с.In production, special modules are used to remove the photoresist, in which the speed of the conveyor is regulated. At the maximum conveyor speed, the part is in the working area for 20-25 seconds, with a minimum of 2 minutes. After the first regeneration, the removal rate of the photoresist is 35-40 seconds.
Использование предлагаемого способа регенерации раствора по сравнению с известным сокращает потребление щелочи дл приготовлени свежего раствора и серной кислоты за счет отсутстви иейтрализаUsing the proposed method of solution regeneration as compared with the known method reduces the consumption of alkali for the preparation of fresh solution and sulfuric acid due to the absence of neutralization
ции щелочи исключает использование солей алюмини и поступление концентрировани сбросов на очистные сооружени .Alkali prevents the use of aluminum salts and the concentration of discharges to the treatment plant.
Claims (1)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| SU884641197A SU1696397A1 (en) | 1988-11-01 | 1988-11-01 | Method of regeneration of solution for removing dry aqueous alkali photoresist film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| SU884641197A SU1696397A1 (en) | 1988-11-01 | 1988-11-01 | Method of regeneration of solution for removing dry aqueous alkali photoresist film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SU1696397A1 true SU1696397A1 (en) | 1991-12-07 |
Family
ID=21424539
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SU884641197A SU1696397A1 (en) | 1988-11-01 | 1988-11-01 | Method of regeneration of solution for removing dry aqueous alkali photoresist film |
Country Status (1)
| Country | Link |
|---|---|
| SU (1) | SU1696397A1 (en) |
-
1988
- 1988-11-01 SU SU884641197A patent/SU1696397A1/en active
Non-Patent Citations (1)
| Title |
|---|
| Раствор дл сн ти сухого пленочного фоторезиста. ОСТ 107.4600092.004.01-86. * |
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