SG87484G - Photosensitive composition and element useful for producing soldering masks - Google Patents

Photosensitive composition and element useful for producing soldering masks

Info

Publication number
SG87484G
SG87484G SG874/84A SG87484A SG87484G SG 87484 G SG87484 G SG 87484G SG 874/84 A SG874/84 A SG 874/84A SG 87484 A SG87484 A SG 87484A SG 87484 G SG87484 G SG 87484G
Authority
SG
Singapore
Prior art keywords
photosensitive composition
element useful
soldering masks
producing soldering
producing
Prior art date
Application number
SG874/84A
Other languages
English (en)
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP55131322A external-priority patent/JPS5923723B2/ja
Priority claimed from JP13793080A external-priority patent/JPS601885B2/ja
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Publication of SG87484G publication Critical patent/SG87484G/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/06—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyurethanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/06—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyurethanes
    • C08F299/065—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyurethanes from polyurethanes with side or terminal unsaturations
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67—Unsaturated compounds having active hydrogen
    • C08G18/671—Unsaturated compounds having only one group containing active hydrogen
    • C08G18/672—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Materials For Photolithography (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
SG874/84A 1980-09-19 1984-12-05 Photosensitive composition and element useful for producing soldering masks SG87484G (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP55131322A JPS5923723B2 (ja) 1980-09-19 1980-09-19 感光性樹脂組成物および感光性エレメント
JP13793080A JPS601885B2 (ja) 1980-10-01 1980-10-01 感光性樹脂組成物および感光性エレメント

Publications (1)

Publication Number Publication Date
SG87484G true SG87484G (en) 1985-06-07

Family

ID=26466183

Family Applications (1)

Application Number Title Priority Date Filing Date
SG874/84A SG87484G (en) 1980-09-19 1984-12-05 Photosensitive composition and element useful for producing soldering masks

Country Status (6)

Country Link
US (1) US4499163A (fr)
KR (1) KR850001379B1 (fr)
DE (1) DE3136818C2 (fr)
FR (1) FR2490838B1 (fr)
GB (1) GB2085023B (fr)
SG (1) SG87484G (fr)

Families Citing this family (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5764734A (en) * 1980-10-08 1982-04-20 Hitachi Chem Co Ltd Photosensitive resin composition and photosensitive element
US4752553A (en) * 1982-04-01 1988-06-21 M&T Chemicals Inc. High resolution solder mask photopolymers for screen coating over circuit traces
JPS58183720A (ja) * 1982-04-22 1983-10-27 Daicel Chem Ind Ltd 感光性樹脂組成物
US4789625A (en) * 1982-09-20 1988-12-06 Morton Thiokol, Inc. Radiation curable coating for photographic laminate, and development process
AU1911383A (en) * 1982-09-20 1984-03-29 Thiokol Corp. Radiation curable coating for photographic laminate
JPS59204837A (ja) * 1983-05-09 1984-11-20 Asahi Chem Ind Co Ltd 光重合性積層体及びそれを用いたレジスト像形成方法
US4666821A (en) * 1984-02-23 1987-05-19 W. R. Grace & Co. Photopolymer for use as a solder mask
EP0153520A1 (fr) * 1984-03-02 1985-09-04 Morton Thiokol, Inc. Revêtement radiodurcissable pour laminé photographique
US4786586A (en) * 1985-08-06 1988-11-22 Morton Thiokol, Inc. Radiation curable coating for photographic laminate
US4710445A (en) * 1986-04-22 1987-12-01 Minnesota Mining And Manufacturing Company Resist imageable photopolymerizable compositions
AU7553987A (en) * 1986-07-25 1988-01-28 Glidden Company, The Ethylenically unsaturated urethanes for gel coat compositions
US5089376A (en) * 1986-12-08 1992-02-18 Armstrong World Industries, Inc. Photoimagable solder mask coating
US5536529A (en) * 1989-05-11 1996-07-16 Borden, Inc. Ultraviolet radiation-curable coatings for optical fibers and optical fibers coated therewith
US5352712A (en) * 1989-05-11 1994-10-04 Borden, Inc. Ultraviolet radiation-curable coatings for optical fibers
CA1321671C (fr) * 1989-05-11 1993-08-24 Paul J. Shustack Revetements reticulables sans rayonnement ultraviolet pour fibres optiques; les fibres ainsi obtenues
DE4027971A1 (de) * 1990-09-04 1992-03-05 Bayer Ag Acryloylgruppen enthaltende, aliphatische polyurethane, ein verfahren zu ihrer herstellung und ihre verwendung
JPH08234432A (ja) * 1994-11-11 1996-09-13 Taiyo Ink Mfg Ltd ソルダーレジストインキ組成物
TW424172B (en) 1995-04-19 2001-03-01 Hitachi Chemical Co Ltd Photosensitive resin composition and photosensitive element using the same
JP3254572B2 (ja) 1996-06-28 2002-02-12 バンティコ株式会社 光重合性熱硬化性樹脂組成物
EP0860742B1 (fr) * 1997-02-25 2001-04-04 E.I. Du Pont De Nemours And Company Composition photopolymérisable, flexible et ignifuge, pour le revêtement de circuits imprimés
US5952153A (en) * 1997-12-01 1999-09-14 Morton International, Inc. Photoimageable composition having improved flexibility, adhesion and stripping characteristics
US5939238A (en) * 1998-06-02 1999-08-17 Morton International, Inc. Photoimageable composition having improved photoinitiator system
US5952154A (en) * 1998-05-29 1999-09-14 Morton International, Inc. Photoimageable composition having improved flexibility
DE10104726A1 (de) * 2001-02-02 2002-08-08 Siemens Solar Gmbh Verfahren zur Strukturierung einer auf einem Trägermaterial aufgebrachten Oxidschicht
JP4512281B2 (ja) 2001-02-22 2010-07-28 富士フイルム株式会社 ネガ型平版印刷版原版
JP4266077B2 (ja) 2001-03-26 2009-05-20 富士フイルム株式会社 平版印刷版原版及び平版印刷方法
KR100483895B1 (ko) * 2002-09-03 2005-04-19 주식회사 코오롱 드라이필름 포토레지스트 조성물
JP4137577B2 (ja) * 2002-09-30 2008-08-20 富士フイルム株式会社 感光性組成物
JP2004126050A (ja) * 2002-09-30 2004-04-22 Fuji Photo Film Co Ltd 平版印刷版原版
DE60327141D1 (de) * 2002-09-30 2009-05-28 Fujifilm Corp Polymerisierbare Zusammensetzung und Flachdruckplattenvorläufer
CN100590525C (zh) * 2002-12-18 2010-02-17 富士胶片株式会社 可聚合组合物和平版印刷版前体
JP4150261B2 (ja) * 2003-01-14 2008-09-17 富士フイルム株式会社 平版印刷版原版の製版方法
JP2004252201A (ja) * 2003-02-20 2004-09-09 Fuji Photo Film Co Ltd 平版印刷版原版
JP2004252285A (ja) * 2003-02-21 2004-09-09 Fuji Photo Film Co Ltd 感光性組成物及びそれを用いた平版印刷版原版
JP4048134B2 (ja) * 2003-02-21 2008-02-13 富士フイルム株式会社 平版印刷版原版
JP4048133B2 (ja) * 2003-02-21 2008-02-13 富士フイルム株式会社 感光性組成物及びそれを用いた平版印刷版原版
JP4299639B2 (ja) * 2003-07-29 2009-07-22 富士フイルム株式会社 重合性組成物及びそれを用いた画像記録材料
JP2005099284A (ja) * 2003-09-24 2005-04-14 Fuji Photo Film Co Ltd 感光性組成物及び平版印刷版原版
US8293459B2 (en) * 2006-09-14 2012-10-23 Bridgestone Corporation Photo-curable transfer sheet, process for the preparation of optical information recording medium using the sheet, and optical information recording medium
EP2182786B1 (fr) * 2008-11-04 2011-07-13 Rohm and Haas Electronic Materials LLC Compositions thermofusibles améliorées
US9453139B2 (en) 2013-08-20 2016-09-27 Rohm And Haas Electronic Materials Llc Hot melt compositions with improved etch resistance
US11343918B2 (en) * 2017-12-20 2022-05-24 Sumitomo Electric Industries, Ltd. Method of making printed circuit board and laminated structure

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3850770A (en) * 1969-10-24 1974-11-26 Kansai Paint Co Ltd Radiation curable compositions from acrylurethane resins
US4088498A (en) * 1970-12-28 1978-05-09 Hoechst Aktiengesellschaft Photopolymerizable copying composition
DE2064079C2 (de) * 1970-12-28 1982-09-09 Hoechst Ag, 6000 Frankfurt Photopolymerisierbares Gemisch
DE2064742C3 (de) * 1970-12-31 1980-02-07 Hoechst Ag, 6000 Frankfurt Photopolymerisierbare Verbindungen
JPS4827801A (fr) * 1971-08-06 1973-04-12
US4210713A (en) * 1973-02-01 1980-07-01 Nippon Paint Co., Ltd. Photo-curable composition for coating containing an unsaturated urethane modified polymer
US3954584A (en) * 1973-06-20 1976-05-04 Kansai Paint Company Photopolymerizable vinylurethane liquid composition
DE2361041C3 (de) * 1973-12-07 1980-08-14 Hoechst Ag, 6000 Frankfurt Photopolymerisierbares Gemisch
DE2363806B2 (de) * 1973-12-21 1979-05-17 Hoechst Ag, 6000 Frankfurt Lichtempfindliches Gemisch
JPS50125805A (fr) * 1974-03-19 1975-10-03
SU609796A1 (ru) * 1976-03-31 1978-06-05 Всесоюзный Научно-Исследовательский Институт Легкого И Текстильного Машиностроения Механизм управлени ремизоподъемной каретки ткацкого станка
CA1116919A (fr) * 1976-10-27 1982-01-26 Joseph E. Gervay Element retardateur de flammes, sensible au rayonnement, constitue d'une matiere photopolymerisable contenant des halogenes et un liant polymerique contenant de l'acrylonitrile
US4129667A (en) * 1977-12-29 1978-12-12 Gaf Corporation Radiation curable coating composition comprising an acryl urethane oligomer and an ultra-violet absorber
JPS54110002A (en) * 1978-02-16 1979-08-29 Mitsubishi Rayon Co Ultraviolettrayysetting ink
DE2822190A1 (de) * 1978-05-20 1979-11-22 Hoechst Ag Photopolymerisierbares gemisch
GB2030584B (en) * 1978-10-03 1983-03-23 Lankro Chem Ltd Photopolymerisable solder resist compositions
US4228232A (en) * 1979-02-27 1980-10-14 Minnesota Mining And Manufacturing Company Photopolymerizable composition containing ethylenically unsaturated oligomers
US4247576A (en) * 1979-03-09 1981-01-27 Hercules Incorporated Process for preparing silicate coated polypropylene film
JPS561878A (en) * 1979-06-19 1981-01-10 Japan Tobacco & Salt Public Improvement of tobacco smoking taste

Also Published As

Publication number Publication date
DE3136818A1 (de) 1982-06-16
US4499163A (en) 1985-02-12
DE3136818C2 (de) 1990-08-02
FR2490838A1 (fr) 1982-03-26
GB2085023A (en) 1982-04-21
FR2490838B1 (fr) 1987-11-13
KR850001379B1 (ko) 1985-09-24
KR830008196A (ko) 1983-11-16
GB2085023B (en) 1984-07-04

Similar Documents

Publication Publication Date Title
SG87484G (en) Photosensitive composition and element useful for producing soldering masks
DE3277035D1 (en) Lithographic masks
GB2100453B (en) Controlled exposure
DE3174017D1 (en) Photosensitive compositions
JPS55162294A (en) Solder mask composition
JPS5760329A (en) Photosensitive composition
GB2077112B (en) Face mask
GB8309539D0 (en) Making photographic mask
GB2128365B (en) Photomask
GB8421176D0 (en) Three o'clock welding method
GB8522077D0 (en) Solder mask photopolymers
GB2118316B (en) Photochromic photosensitive composition
DE3170637D1 (en) Photomask and photomask blank
DE3173769D1 (en) Photomask blank and photomask
JPS56143429A (en) Photosensitive composition
GB2092773B (en) Photomasks
GB2088084B (en) Pattern exposure mask
DE3169809D1 (en) Photosensitive composition and pattern forming process using same
GB8410828D0 (en) Eye-beautifying mask
EP0042704A3 (en) Photosensitive composition and method of forming a pattern employing the composition
JPS5743756A (en) Simple mask and its manufacture
JPS567493A (en) Metal mask
DE3364516D1 (en) Photosensitive composition and pattern forming process using same
JPS57110498A (en) Method of patterning picture
JPS57172343A (en) Manufacture of photo-mask