SG75172A1 - Photoimageable composition having improved flexibility - Google Patents
Photoimageable composition having improved flexibilityInfo
- Publication number
- SG75172A1 SG75172A1 SG1999002239A SG1999002239A SG75172A1 SG 75172 A1 SG75172 A1 SG 75172A1 SG 1999002239 A SG1999002239 A SG 1999002239A SG 1999002239 A SG1999002239 A SG 1999002239A SG 75172 A1 SG75172 A1 SG 75172A1
- Authority
- SG
- Singapore
- Prior art keywords
- improved flexibility
- photoimageable composition
- photoimageable
- composition
- flexibility
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US8705398A | 1998-05-29 | 1998-05-29 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG75172A1 true SG75172A1 (en) | 2000-09-19 |
Family
ID=22202840
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG1999002239A SG75172A1 (en) | 1998-05-29 | 1999-05-12 | Photoimageable composition having improved flexibility |
Country Status (6)
Country | Link |
---|---|
EP (1) | EP0961171A1 (zh) |
KR (1) | KR100294548B1 (zh) |
CN (1) | CN1184535C (zh) |
CA (1) | CA2271370A1 (zh) |
SG (1) | SG75172A1 (zh) |
TW (1) | TW494277B (zh) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1008911A1 (en) * | 1998-12-11 | 2000-06-14 | Shipley Company LLC | Photoimageable compositions having improved flexibility and stripping ability |
EP1008910A1 (en) * | 1998-12-11 | 2000-06-14 | Shipley Company LLC | Photoimageable compositions having improved stripping ability and resolution |
DE10255664B4 (de) * | 2002-11-28 | 2006-05-04 | Kodak Polychrome Graphics Gmbh | Für lithographische Druckplatten geeignete Photopolymerzusammensetzung |
DE10255663B4 (de) * | 2002-11-28 | 2006-05-04 | Kodak Polychrome Graphics Gmbh | Strahlungsempfindliche Elemente |
JP4587865B2 (ja) * | 2004-04-22 | 2010-11-24 | 昭和電工株式会社 | 感光性樹脂組成物及びその硬化物並びにそれらを使用するプリント配線基板の製造方法 |
EP1783548B1 (en) | 2005-11-08 | 2017-03-08 | Rohm and Haas Electronic Materials LLC | Method of forming a patterned layer on a substrate |
DE102006000783B3 (de) | 2006-01-04 | 2007-04-26 | Kodak Polychrome Graphics Gmbh | Für lithographische Druckplatten geeignete Photopolymerzusammensetzungen |
JP6486672B2 (ja) * | 2013-12-20 | 2019-03-20 | 旭化成株式会社 | 感光性エレメント、及びその製造方法 |
TWI624295B (zh) * | 2016-12-29 | 2018-05-21 | 國立臺東專科學校 | 超音波震盪清洗淨水器 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2361041C3 (de) * | 1973-12-07 | 1980-08-14 | Hoechst Ag, 6000 Frankfurt | Photopolymerisierbares Gemisch |
DE4129284A1 (de) * | 1991-09-03 | 1993-03-04 | Agfa Gevaert Ag | Bilderzeugungselement mit einem fotopolymerisierbaren monomer |
EP0586743B1 (en) * | 1992-08-31 | 1998-02-11 | Agfa-Gevaert N.V. | Recording material comprising a photopolymerizable compostion containing reactive multifunctional monomers |
-
1999
- 1999-05-04 TW TW088107250A patent/TW494277B/zh not_active IP Right Cessation
- 1999-05-10 CA CA002271370A patent/CA2271370A1/en not_active Abandoned
- 1999-05-12 SG SG1999002239A patent/SG75172A1/en unknown
- 1999-05-27 KR KR1019990019153A patent/KR100294548B1/ko not_active IP Right Cessation
- 1999-05-28 EP EP99304214A patent/EP0961171A1/en not_active Withdrawn
- 1999-05-31 CN CNB991071433A patent/CN1184535C/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
CN1184535C (zh) | 2005-01-12 |
KR19990088586A (ko) | 1999-12-27 |
EP0961171A1 (en) | 1999-12-01 |
CA2271370A1 (en) | 1999-11-29 |
KR100294548B1 (ko) | 2001-07-03 |
CN1245909A (zh) | 2000-03-01 |
TW494277B (en) | 2002-07-11 |
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