SG130011A1 - Orientation dependent shielding for use with dipole illumination techniques - Google Patents

Orientation dependent shielding for use with dipole illumination techniques

Info

Publication number
SG130011A1
SG130011A1 SG200303894-0A SG2003038940A SG130011A1 SG 130011 A1 SG130011 A1 SG 130011A1 SG 2003038940 A SG2003038940 A SG 2003038940A SG 130011 A1 SG130011 A1 SG 130011A1
Authority
SG
Singapore
Prior art keywords
dipole illumination
component mask
oriented features
orientation dependent
illumination techniques
Prior art date
Application number
SG200303894-0A
Inventor
Hsu Duan-Fu Stephen
Noel Corcoran
Chen Jang Fung
Original Assignee
Asml Masktools Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Masktools Bv filed Critical Asml Masktools Bv
Publication of SG130011A1 publication Critical patent/SG130011A1/en

Links

Abstract

A method of printing a pattern having vertically oriented features and horizontally oriented features on a substrate utilizing dipole illumination, which includes the steps of: identifying background areas contained in the pattern; generating a vertical component mask comprising non-resolvable horizontally oriented features in the background areas; generating a horizontal component mask comprising non-resolvable vertically oriented features in the background areas; illuminating said vertical component mask utilizing an X- pole illumination; and illuminating said horizontal component mask utilizing a Y- pole illumination.
SG200303894-0A 2002-07-26 2003-07-25 Orientation dependent shielding for use with dipole illumination techniques SG130011A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US39857402P 2002-07-26 2002-07-26
US10395903A 2003-03-25 2003-03-25

Publications (1)

Publication Number Publication Date
SG130011A1 true SG130011A1 (en) 2007-03-20

Family

ID=38787658

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200303894-0A SG130011A1 (en) 2002-07-26 2003-07-25 Orientation dependent shielding for use with dipole illumination techniques

Country Status (1)

Country Link
SG (1) SG130011A1 (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5841517A (en) * 1993-08-03 1998-11-24 Noritsu Koki Co., Ltd. Printer system for printing combined images on a same photosensitive sheet
EP1091252A2 (en) * 1999-09-29 2001-04-11 Asm Lithography B.V. Lithographic method and apparatus

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5841517A (en) * 1993-08-03 1998-11-24 Noritsu Koki Co., Ltd. Printer system for printing combined images on a same photosensitive sheet
EP1091252A2 (en) * 1999-09-29 2001-04-11 Asm Lithography B.V. Lithographic method and apparatus

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
MASK TOPOGRAPHY EFFECTS IN PROJECTION PRINTING OF PHASE- SHIFTING MASKS *
SPATIAL FREQUENCY DOUBLING LITHOGRAPHY (SFDL) OF PERIODIC STRUCTURES FOR INTEGRATED OPTICAL CIRCUIT TECHNOLOGY *

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