SG130011A1 - Orientation dependent shielding for use with dipole illumination techniques - Google Patents
Orientation dependent shielding for use with dipole illumination techniquesInfo
- Publication number
- SG130011A1 SG130011A1 SG200303894-0A SG2003038940A SG130011A1 SG 130011 A1 SG130011 A1 SG 130011A1 SG 2003038940 A SG2003038940 A SG 2003038940A SG 130011 A1 SG130011 A1 SG 130011A1
- Authority
- SG
- Singapore
- Prior art keywords
- dipole illumination
- component mask
- oriented features
- orientation dependent
- illumination techniques
- Prior art date
Links
Abstract
A method of printing a pattern having vertically oriented features and horizontally oriented features on a substrate utilizing dipole illumination, which includes the steps of: identifying background areas contained in the pattern; generating a vertical component mask comprising non-resolvable horizontally oriented features in the background areas; generating a horizontal component mask comprising non-resolvable vertically oriented features in the background areas; illuminating said vertical component mask utilizing an X- pole illumination; and illuminating said horizontal component mask utilizing a Y- pole illumination.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US39857402P | 2002-07-26 | 2002-07-26 | |
US10395903A | 2003-03-25 | 2003-03-25 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG130011A1 true SG130011A1 (en) | 2007-03-20 |
Family
ID=38787658
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200303894-0A SG130011A1 (en) | 2002-07-26 | 2003-07-25 | Orientation dependent shielding for use with dipole illumination techniques |
Country Status (1)
Country | Link |
---|---|
SG (1) | SG130011A1 (en) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5841517A (en) * | 1993-08-03 | 1998-11-24 | Noritsu Koki Co., Ltd. | Printer system for printing combined images on a same photosensitive sheet |
EP1091252A2 (en) * | 1999-09-29 | 2001-04-11 | Asm Lithography B.V. | Lithographic method and apparatus |
-
2003
- 2003-07-25 SG SG200303894-0A patent/SG130011A1/en unknown
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5841517A (en) * | 1993-08-03 | 1998-11-24 | Noritsu Koki Co., Ltd. | Printer system for printing combined images on a same photosensitive sheet |
EP1091252A2 (en) * | 1999-09-29 | 2001-04-11 | Asm Lithography B.V. | Lithographic method and apparatus |
Non-Patent Citations (2)
Title |
---|
MASK TOPOGRAPHY EFFECTS IN PROJECTION PRINTING OF PHASE- SHIFTING MASKS * |
SPATIAL FREQUENCY DOUBLING LITHOGRAPHY (SFDL) OF PERIODIC STRUCTURES FOR INTEGRATED OPTICAL CIRCUIT TECHNOLOGY * |
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