SG121818A1
(en)
*
|
2002-11-12 |
2006-05-26 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
US10503084B2
(en)
|
2002-11-12 |
2019-12-10 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
EP1420299B1
(en)
|
2002-11-12 |
2011-01-05 |
ASML Netherlands B.V. |
Immersion lithographic apparatus and device manufacturing method
|
CN100568101C
(zh)
|
2002-11-12 |
2009-12-09 |
Asml荷兰有限公司 |
光刻装置和器件制造方法
|
US7372541B2
(en)
*
|
2002-11-12 |
2008-05-13 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US9482966B2
(en)
|
2002-11-12 |
2016-11-01 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
WO2004053955A1
(ja)
*
|
2002-12-10 |
2004-06-24 |
Nikon Corporation |
露光装置及びデバイス製造方法
|
DE10261775A1
(de)
*
|
2002-12-20 |
2004-07-01 |
Carl Zeiss Smt Ag |
Vorrichtung zur optischen Vermessung eines Abbildungssystems
|
KR101381538B1
(ko)
|
2003-02-26 |
2014-04-04 |
가부시키가이샤 니콘 |
노광 장치, 노광 방법 및 디바이스 제조 방법
|
KR101238142B1
(ko)
*
|
2003-04-10 |
2013-02-28 |
가부시키가이샤 니콘 |
액침 리소그래피 장치용 운반 영역을 포함하는 환경 시스템
|
KR101364928B1
(ko)
|
2003-04-10 |
2014-02-19 |
가부시키가이샤 니콘 |
액침 리소그래피 장치용 진공 배출을 포함하는 환경 시스템
|
SG10201404132YA
(en)
*
|
2003-04-11 |
2014-09-26 |
Nippon Kogaku Kk |
Apparatus having an immersion fluid system configured to maintain immersion fluid in a gap adjacent an optical assembly
|
US7213963B2
(en)
|
2003-06-09 |
2007-05-08 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
EP2261742A3
(en)
*
|
2003-06-11 |
2011-05-25 |
ASML Netherlands BV |
Lithographic apparatus and device manufacturing method.
|
KR20180112884A
(ko)
|
2003-06-13 |
2018-10-12 |
가부시키가이샤 니콘 |
노광 방법, 기판 스테이지, 노광 장치, 및 디바이스 제조 방법
|
US6867844B2
(en)
|
2003-06-19 |
2005-03-15 |
Asml Holding N.V. |
Immersion photolithography system and method using microchannel nozzles
|
TWI536430B
(zh)
|
2003-06-19 |
2016-06-01 |
尼康股份有限公司 |
An exposure apparatus, an exposure method, and an element manufacturing method
|
US6809794B1
(en)
*
|
2003-06-27 |
2004-10-26 |
Asml Holding N.V. |
Immersion photolithography system and method using inverted wafer-projection optics interface
|
EP1491956B1
(en)
|
2003-06-27 |
2006-09-06 |
ASML Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7236232B2
(en)
*
|
2003-07-01 |
2007-06-26 |
Nikon Corporation |
Using isotopically specified fluids as optical elements
|
WO2005006416A1
(ja)
*
|
2003-07-09 |
2005-01-20 |
Nikon Corporation |
結合装置、露光装置、及びデバイス製造方法
|
WO2005006418A1
(ja)
*
|
2003-07-09 |
2005-01-20 |
Nikon Corporation |
露光装置及びデバイス製造方法
|
EP2264531B1
(en)
|
2003-07-09 |
2013-01-16 |
Nikon Corporation |
Exposure apparatus and device manufacturing method
|
JP4524669B2
(ja)
*
|
2003-07-25 |
2010-08-18 |
株式会社ニコン |
投影光学系の検査方法および検査装置
|
EP1503244A1
(en)
|
2003-07-28 |
2005-02-02 |
ASML Netherlands B.V. |
Lithographic projection apparatus and device manufacturing method
|
CN102323724B
(zh)
|
2003-07-28 |
2014-08-13 |
株式会社尼康 |
液浸曝光装置及其制造方法、曝光装置、器件制造方法
|
US7779781B2
(en)
|
2003-07-31 |
2010-08-24 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7370659B2
(en)
|
2003-08-06 |
2008-05-13 |
Micron Technology, Inc. |
Photolithographic stepper and/or scanner machines including cleaning devices and methods of cleaning photolithographic stepper and/or scanner machines
|
TWI263859B
(en)
|
2003-08-29 |
2006-10-11 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
SG10201607457PA
(en)
|
2003-08-29 |
2016-10-28 |
Nikon Corp |
Exposure apparatus, exposure method and device manufacturing method
|
KR101419192B1
(ko)
*
|
2003-08-29 |
2014-07-15 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
CN100472713C
(zh)
*
|
2003-09-03 |
2009-03-25 |
株式会社尼康 |
曝光设备和装置制造方法
|
JP4288426B2
(ja)
*
|
2003-09-03 |
2009-07-01 |
株式会社ニコン |
液浸リソグラフィのための流体の供給装置及び方法
|
WO2005029559A1
(ja)
*
|
2003-09-19 |
2005-03-31 |
Nikon Corporation |
露光装置及びデバイス製造方法
|
TWI497565B
(zh)
|
2003-09-29 |
2015-08-21 |
尼康股份有限公司 |
An exposure apparatus and an exposure method, and an element manufacturing method
|
US7369217B2
(en)
|
2003-10-03 |
2008-05-06 |
Micronic Laser Systems Ab |
Method and device for immersion lithography
|
EP1672682A4
(en)
|
2003-10-08 |
2008-10-15 |
Zao Nikon Co Ltd |
SUBSTRATE TRANSPORT DEVICE AND METHOD, EXPOSURE DEVICE AND METHOD AND COMPONENT MANUFACTURING METHOD
|
KR101111364B1
(ko)
|
2003-10-08 |
2012-02-27 |
가부시키가이샤 자오 니콘 |
기판 반송 장치 및 기판 반송 방법, 노광 장치 및 노광방법, 디바이스 제조 방법
|
JP2005136364A
(ja)
*
|
2003-10-08 |
2005-05-26 |
Zao Nikon Co Ltd |
基板搬送装置、露光装置、並びにデバイス製造方法
|
TW201738932A
(zh)
|
2003-10-09 |
2017-11-01 |
Nippon Kogaku Kk |
曝光裝置及曝光方法、元件製造方法
|
US7352433B2
(en)
|
2003-10-28 |
2008-04-01 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
JP4295712B2
(ja)
*
|
2003-11-14 |
2009-07-15 |
エーエスエムエル ネザーランズ ビー.ブイ. |
リソグラフィ装置及び装置製造方法
|
KR101394764B1
(ko)
*
|
2003-12-03 |
2014-05-27 |
가부시키가이샤 니콘 |
노광 장치, 노광 방법 및 디바이스 제조 방법, 그리고 광학 부품
|
JPWO2005057635A1
(ja)
*
|
2003-12-15 |
2007-07-05 |
株式会社ニコン |
投影露光装置及びステージ装置、並びに露光方法
|
US20070081133A1
(en)
*
|
2004-12-14 |
2007-04-12 |
Niikon Corporation |
Projection exposure apparatus and stage unit, and exposure method
|
KR101941351B1
(ko)
|
2003-12-15 |
2019-01-22 |
가부시키가이샤 니콘 |
스테이지 장치, 노광 장치, 및 노광 방법
|
KR101636632B1
(ko)
*
|
2004-01-05 |
2016-07-05 |
가부시키가이샤 니콘 |
노광 장치, 노광 방법 및 디바이스 제조 방법
|
US7589822B2
(en)
*
|
2004-02-02 |
2009-09-15 |
Nikon Corporation |
Stage drive method and stage unit, exposure apparatus, and device manufacturing method
|
US7990516B2
(en)
|
2004-02-03 |
2011-08-02 |
Nikon Corporation |
Immersion exposure apparatus and device manufacturing method with liquid detection apparatus
|
JP4466647B2
(ja)
*
|
2004-02-20 |
2010-05-26 |
株式会社ニコン |
露光装置、液体処理方法、露光方法、及びデバイス製造方法
|
TWI606485B
(zh)
|
2004-03-25 |
2017-11-21 |
尼康股份有限公司 |
曝光裝置、曝光方法、及元件製造方法
|
US7034917B2
(en)
*
|
2004-04-01 |
2006-04-25 |
Asml Netherlands B.V. |
Lithographic apparatus, device manufacturing method and device manufactured thereby
|
US8054448B2
(en)
|
2004-05-04 |
2011-11-08 |
Nikon Corporation |
Apparatus and method for providing fluid for immersion lithography
|
US7616383B2
(en)
*
|
2004-05-18 |
2009-11-10 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7486381B2
(en)
*
|
2004-05-21 |
2009-02-03 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
JP4845880B2
(ja)
|
2004-06-04 |
2011-12-28 |
カール・ツァイス・エスエムティー・ゲーエムベーハー |
光学結像系の像品質測定システム
|
JP4760708B2
(ja)
*
|
2004-06-09 |
2011-08-31 |
株式会社ニコン |
露光装置、露光方法、及びデバイス製造方法、メンテナンス方法
|
EP2605068A3
(en)
*
|
2004-06-10 |
2013-10-02 |
Nikon Corporation |
Exposure apparatus, exposure method, and method for producing device
|
JP4543767B2
(ja)
*
|
2004-06-10 |
2010-09-15 |
株式会社ニコン |
露光装置及びデバイス製造方法
|
JP4565272B2
(ja)
*
|
2004-07-01 |
2010-10-20 |
株式会社ニコン |
液浸リソグラフィのための動的流体制御システム
|
US7463330B2
(en)
|
2004-07-07 |
2008-12-09 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
KR101342330B1
(ko)
*
|
2004-07-12 |
2013-12-16 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
EP3048485B1
(en)
|
2004-08-03 |
2017-09-27 |
Nikon Corporation |
Exposure apparatus, exposure method, and method for producing device
|
US7701550B2
(en)
*
|
2004-08-19 |
2010-04-20 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US20060044533A1
(en)
*
|
2004-08-27 |
2006-03-02 |
Asmlholding N.V. |
System and method for reducing disturbances caused by movement in an immersion lithography system
|
JP4772306B2
(ja)
*
|
2004-09-06 |
2011-09-14 |
株式会社東芝 |
液浸光学装置及び洗浄方法
|
CN100539019C
(zh)
*
|
2004-09-17 |
2009-09-09 |
株式会社尼康 |
曝光装置、曝光方法以及器件制造方法
|
KR101506100B1
(ko)
|
2004-09-17 |
2015-03-26 |
가부시키가이샤 니콘 |
노광 장치, 노광 방법 및 디바이스 제조 방법
|
US7133114B2
(en)
*
|
2004-09-20 |
2006-11-07 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7411657B2
(en)
*
|
2004-11-17 |
2008-08-12 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7362412B2
(en)
*
|
2004-11-18 |
2008-04-22 |
International Business Machines Corporation |
Method and apparatus for cleaning a semiconductor substrate in an immersion lithography system
|
US7256121B2
(en)
*
|
2004-12-02 |
2007-08-14 |
Texas Instruments Incorporated |
Contact resistance reduction by new barrier stack process
|
US7446850B2
(en)
*
|
2004-12-03 |
2008-11-04 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7196770B2
(en)
*
|
2004-12-07 |
2007-03-27 |
Asml Netherlands B.V. |
Prewetting of substrate before immersion exposure
|
US7397533B2
(en)
*
|
2004-12-07 |
2008-07-08 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7365827B2
(en)
|
2004-12-08 |
2008-04-29 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7352440B2
(en)
|
2004-12-10 |
2008-04-01 |
Asml Netherlands B.V. |
Substrate placement in immersion lithography
|
US7403261B2
(en)
*
|
2004-12-15 |
2008-07-22 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7528931B2
(en)
|
2004-12-20 |
2009-05-05 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7880860B2
(en)
|
2004-12-20 |
2011-02-01 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7491661B2
(en)
*
|
2004-12-28 |
2009-02-17 |
Asml Netherlands B.V. |
Device manufacturing method, top coat material and substrate
|
US7405805B2
(en)
|
2004-12-28 |
2008-07-29 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US20060147821A1
(en)
|
2004-12-30 |
2006-07-06 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
SG124359A1
(en)
*
|
2005-01-14 |
2006-08-30 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
SG124351A1
(en)
|
2005-01-14 |
2006-08-30 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
EP2506289A3
(en)
|
2005-01-31 |
2013-05-22 |
Nikon Corporation |
Exposure apparatus and method for manufacturing device
|
US8692973B2
(en)
|
2005-01-31 |
2014-04-08 |
Nikon Corporation |
Exposure apparatus and method for producing device
|
CN102360170B
(zh)
|
2005-02-10 |
2014-03-12 |
Asml荷兰有限公司 |
浸没液体、曝光装置及曝光方法
|
JP4807086B2
(ja)
*
|
2005-02-21 |
2011-11-02 |
株式会社ニコン |
露光装置、露光方法、及びデバイス製造方法
|
JP5343958B2
(ja)
*
|
2005-02-21 |
2013-11-13 |
株式会社ニコン |
露光装置、露光方法、及びデバイス製造方法
|
US7224431B2
(en)
*
|
2005-02-22 |
2007-05-29 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7378025B2
(en)
|
2005-02-22 |
2008-05-27 |
Asml Netherlands B.V. |
Fluid filtration method, fluid filtered thereby, lithographic apparatus and device manufacturing method
|
US8018573B2
(en)
*
|
2005-02-22 |
2011-09-13 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7428038B2
(en)
|
2005-02-28 |
2008-09-23 |
Asml Netherlands B.V. |
Lithographic apparatus, device manufacturing method and apparatus for de-gassing a liquid
|
US7282701B2
(en)
|
2005-02-28 |
2007-10-16 |
Asml Netherlands B.V. |
Sensor for use in a lithographic apparatus
|
US8067525B2
(en)
*
|
2005-06-17 |
2011-11-29 |
Eastman Chemical Company |
Film(s) and/or sheet(s) comprising polyester compositions which comprise cyclobutanediol and have a certain combination of inherent viscosity and high glass transition temperature
|
JP4262252B2
(ja)
*
|
2005-03-02 |
2009-05-13 |
キヤノン株式会社 |
露光装置
|
US7786252B2
(en)
*
|
2005-03-02 |
2010-08-31 |
Eastman Chemical Company |
Preparation of transparent multilayered articles
|
US7324185B2
(en)
|
2005-03-04 |
2008-01-29 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7684010B2
(en)
*
|
2005-03-09 |
2010-03-23 |
Asml Netherlands B.V. |
Lithographic apparatus, device manufacturing method, seal structure, method of removing an object and a method of sealing
|
WO2006101120A1
(ja)
*
|
2005-03-23 |
2006-09-28 |
Nikon Corporation |
露光装置及び露光方法、並びにデバイス製造方法
|
US7330238B2
(en)
*
|
2005-03-28 |
2008-02-12 |
Asml Netherlands, B.V. |
Lithographic apparatus, immersion projection apparatus and device manufacturing method
|
US7411654B2
(en)
|
2005-04-05 |
2008-08-12 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
USRE43576E1
(en)
|
2005-04-08 |
2012-08-14 |
Asml Netherlands B.V. |
Dual stage lithographic apparatus and device manufacturing method
|
US7291850B2
(en)
*
|
2005-04-08 |
2007-11-06 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US20060232753A1
(en)
*
|
2005-04-19 |
2006-10-19 |
Asml Holding N.V. |
Liquid immersion lithography system with tilted liquid flow
|
US7433016B2
(en)
|
2005-05-03 |
2008-10-07 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7317507B2
(en)
*
|
2005-05-03 |
2008-01-08 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US8248577B2
(en)
*
|
2005-05-03 |
2012-08-21 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7315033B1
(en)
|
2005-05-04 |
2008-01-01 |
Advanced Micro Devices, Inc. |
Method and apparatus for reducing biological contamination in an immersion lithography system
|
CN100445872C
(zh)
*
|
2005-05-09 |
2008-12-24 |
浙江大学 |
浸没式光刻系统中的液体传送及气密封装置
|
JP4884708B2
(ja)
*
|
2005-06-21 |
2012-02-29 |
株式会社ニコン |
露光装置及びデバイス製造方法
|
US7751027B2
(en)
|
2005-06-21 |
2010-07-06 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7652746B2
(en)
*
|
2005-06-21 |
2010-01-26 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7474379B2
(en)
|
2005-06-28 |
2009-01-06 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7468779B2
(en)
*
|
2005-06-28 |
2008-12-23 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7834974B2
(en)
|
2005-06-28 |
2010-11-16 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7583358B2
(en)
*
|
2005-07-25 |
2009-09-01 |
Micron Technology, Inc. |
Systems and methods for retrieving residual liquid during immersion lens photolithography
|
US8054445B2
(en)
*
|
2005-08-16 |
2011-11-08 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7456928B2
(en)
|
2005-08-29 |
2008-11-25 |
Micron Technology, Inc. |
Systems and methods for controlling ambient pressure during processing of microfeature workpieces, including during immersion lithography
|
JP2007096050A
(ja)
*
|
2005-09-29 |
2007-04-12 |
Canon Inc |
露光装置
|
US7411658B2
(en)
*
|
2005-10-06 |
2008-08-12 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
JP4125315B2
(ja)
*
|
2005-10-11 |
2008-07-30 |
キヤノン株式会社 |
露光装置及びデバイス製造方法
|
JP2007142366A
(ja)
*
|
2005-10-18 |
2007-06-07 |
Canon Inc |
露光装置及びデバイス製造方法
|
US7656501B2
(en)
*
|
2005-11-16 |
2010-02-02 |
Asml Netherlands B.V. |
Lithographic apparatus
|
US7804577B2
(en)
|
2005-11-16 |
2010-09-28 |
Asml Netherlands B.V. |
Lithographic apparatus
|
US7864292B2
(en)
|
2005-11-16 |
2011-01-04 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7633073B2
(en)
*
|
2005-11-23 |
2009-12-15 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7773195B2
(en)
*
|
2005-11-29 |
2010-08-10 |
Asml Holding N.V. |
System and method to increase surface tension and contact angle in immersion lithography
|
US20070124987A1
(en)
*
|
2005-12-05 |
2007-06-07 |
Brown Jeffrey K |
Electronic pest control apparatus
|
US20070126999A1
(en)
*
|
2005-12-07 |
2007-06-07 |
Nikon Corporation |
Apparatus and method for containing immersion liquid in immersion lithography
|
US7420194B2
(en)
*
|
2005-12-27 |
2008-09-02 |
Asml Netherlands B.V. |
Lithographic apparatus and substrate edge seal
|
US7839483B2
(en)
*
|
2005-12-28 |
2010-11-23 |
Asml Netherlands B.V. |
Lithographic apparatus, device manufacturing method and a control system
|
US7649611B2
(en)
*
|
2005-12-30 |
2010-01-19 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US8472004B2
(en)
|
2006-01-18 |
2013-06-25 |
Micron Technology, Inc. |
Immersion photolithography scanner
|
US7893047B2
(en)
*
|
2006-03-03 |
2011-02-22 |
Arch Chemicals, Inc. |
Biocide composition comprising pyrithione and pyrrole derivatives
|
US8045134B2
(en)
*
|
2006-03-13 |
2011-10-25 |
Asml Netherlands B.V. |
Lithographic apparatus, control system and device manufacturing method
|
CN100590173C
(zh)
*
|
2006-03-24 |
2010-02-17 |
北京有色金属研究总院 |
一种荧光粉及其制造方法和所制成的电光源
|
US9477158B2
(en)
*
|
2006-04-14 |
2016-10-25 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7701551B2
(en)
*
|
2006-04-14 |
2010-04-20 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7969548B2
(en)
*
|
2006-05-22 |
2011-06-28 |
Asml Netherlands B.V. |
Lithographic apparatus and lithographic apparatus cleaning method
|
US7656502B2
(en)
*
|
2006-06-22 |
2010-02-02 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US8208116B2
(en)
*
|
2006-11-03 |
2012-06-26 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Immersion lithography system using a sealed wafer bath
|
US8045135B2
(en)
|
2006-11-22 |
2011-10-25 |
Asml Netherlands B.V. |
Lithographic apparatus with a fluid combining unit and related device manufacturing method
|
JP4758977B2
(ja)
*
|
2006-12-07 |
2011-08-31 |
エーエスエムエル ネザーランズ ビー.ブイ. |
リソグラフィ投影装置、デバイス製造方法
|
US9632425B2
(en)
*
|
2006-12-07 |
2017-04-25 |
Asml Holding N.V. |
Lithographic apparatus, a dryer and a method of removing liquid from a surface
|
US8634053B2
(en)
|
2006-12-07 |
2014-01-21 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7791709B2
(en)
*
|
2006-12-08 |
2010-09-07 |
Asml Netherlands B.V. |
Substrate support and lithographic process
|
US11136667B2
(en)
*
|
2007-01-08 |
2021-10-05 |
Eastman Kodak Company |
Deposition system and method using a delivery head separated from a substrate by gas pressure
|
US8004651B2
(en)
*
|
2007-01-23 |
2011-08-23 |
Nikon Corporation |
Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
|
US8817226B2
(en)
|
2007-02-15 |
2014-08-26 |
Asml Holding N.V. |
Systems and methods for insitu lens cleaning using ozone in immersion lithography
|
US8654305B2
(en)
*
|
2007-02-15 |
2014-02-18 |
Asml Holding N.V. |
Systems and methods for insitu lens cleaning in immersion lithography
|
JP2008218653A
(ja)
*
|
2007-03-02 |
2008-09-18 |
Canon Inc |
露光装置及びデバイス製造方法
|
CN100462848C
(zh)
*
|
2007-03-15 |
2009-02-18 |
浙江大学 |
浸没式光刻系统中的液体供给及回收的密封控制装置
|
US8011377B2
(en)
*
|
2007-05-04 |
2011-09-06 |
Asml Netherlands B.V. |
Cleaning device and a lithographic apparatus cleaning method
|
US8947629B2
(en)
|
2007-05-04 |
2015-02-03 |
Asml Netherlands B.V. |
Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
|
US7866330B2
(en)
*
|
2007-05-04 |
2011-01-11 |
Asml Netherlands B.V. |
Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
|
US9013672B2
(en)
*
|
2007-05-04 |
2015-04-21 |
Asml Netherlands B.V. |
Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
|
EP2023207A1
(en)
*
|
2007-08-10 |
2009-02-11 |
Canon Kabushiki Kaisha |
Exposure apparatus and device manufacturing method
|
US8681308B2
(en)
*
|
2007-09-13 |
2014-03-25 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US8654306B2
(en)
*
|
2008-04-14 |
2014-02-18 |
Nikon Corporation |
Exposure apparatus, cleaning method, and device fabricating method
|
NL1036709A1
(nl)
*
|
2008-04-24 |
2009-10-27 |
Asml Netherlands Bv |
Lithographic apparatus and a method of operating the apparatus.
|
EP2128703A1
(en)
|
2008-05-28 |
2009-12-02 |
ASML Netherlands BV |
Lithographic Apparatus and a Method of Operating the Apparatus
|
EP2131242A1
(en)
*
|
2008-06-02 |
2009-12-09 |
ASML Netherlands B.V. |
Substrate table, lithographic apparatus and device manufacturing method
|
EP2159304A1
(en)
*
|
2008-08-27 |
2010-03-03 |
Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO |
Apparatus and method for atomic layer deposition
|
SG159467A1
(en)
*
|
2008-09-02 |
2010-03-30 |
Asml Netherlands Bv |
Fluid handling structure, lithographic apparatus and device manufacturing method
|
NL2003333A
(en)
*
|
2008-10-23 |
2010-04-26 |
Asml Netherlands Bv |
Fluid handling structure, lithographic apparatus and device manufacturing method.
|
US8896806B2
(en)
*
|
2008-12-29 |
2014-11-25 |
Nikon Corporation |
Exposure apparatus, exposure method, and device manufacturing method
|
JP2010205914A
(ja)
*
|
2009-03-03 |
2010-09-16 |
Nikon Corp |
露光装置、露光方法、及びデバイス製造方法
|
JP5482784B2
(ja)
*
|
2009-03-10 |
2014-05-07 |
株式会社ニコン |
露光装置、露光方法、及びデバイス製造方法
|
US8953143B2
(en)
*
|
2009-04-24 |
2015-02-10 |
Nikon Corporation |
Liquid immersion member
|
US20100323303A1
(en)
*
|
2009-05-15 |
2010-12-23 |
Nikon Corporation |
Liquid immersion member, exposure apparatus, exposing method, and device fabricating method
|
JP5016705B2
(ja)
*
|
2009-06-09 |
2012-09-05 |
エーエスエムエル ネザーランズ ビー.ブイ. |
流体ハンドリング構造
|
NL2005207A
(en)
*
|
2009-09-28 |
2011-03-29 |
Asml Netherlands Bv |
Heat pipe, lithographic apparatus and device manufacturing method.
|
WO2011044412A1
(en)
|
2009-10-09 |
2011-04-14 |
Cree, Inc. |
Multi-rotation epitaxial growth apparatus and reactors incorporating same
|
US20110134400A1
(en)
*
|
2009-12-04 |
2011-06-09 |
Nikon Corporation |
Exposure apparatus, liquid immersion member, and device manufacturing method
|
CN103135365A
(zh)
|
2009-12-28 |
2013-06-05 |
株式会社尼康 |
液浸构件、液浸构件的制造方法、曝光装置、及元件制造方法
|
AU2010343143A1
(en)
*
|
2009-12-28 |
2012-06-28 |
Pioneer Hi-Bred International, Inc. |
Sorghum fertility restorer genotypes and methods of marker-assisted selection
|
NL2005951A
(en)
*
|
2010-02-02 |
2011-08-03 |
Asml Netherlands Bv |
Lithographic apparatus and a device manufacturing method.
|
NL2006076A
(en)
*
|
2010-03-04 |
2011-09-06 |
Asml Netherlands Bv |
A lithographic apparatus and a method of manufacturing a device using a lithographic apparatus.
|
EP2381310B1
(en)
|
2010-04-22 |
2015-05-06 |
ASML Netherlands BV |
Fluid handling structure and lithographic apparatus
|
CN102338987A
(zh)
*
|
2010-07-16 |
2012-02-01 |
中芯国际集成电路制造(上海)有限公司 |
光刻设备
|
JP5232901B2
(ja)
*
|
2011-07-22 |
2013-07-10 |
株式会社ニコン |
露光装置及びデバイス製造方法
|
NL2009472A
(en)
|
2011-10-24 |
2013-04-25 |
Asml Netherlands Bv |
A fluid handling structure, a lithographic apparatus and a device manufacturing method.
|
NL2009692A
(en)
*
|
2011-12-07 |
2013-06-10 |
Asml Netherlands Bv |
A lithographic apparatus and a device manufacturing method.
|
CN103186056B
(zh)
*
|
2011-12-31 |
2016-01-06 |
中芯国际集成电路制造(上海)有限公司 |
浸没式光刻系统的投影系统
|
US9494870B2
(en)
|
2012-10-12 |
2016-11-15 |
Nikon Corporation |
Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
|
US9651873B2
(en)
*
|
2012-12-27 |
2017-05-16 |
Nikon Corporation |
Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
|
US9352073B2
(en)
|
2013-01-22 |
2016-05-31 |
Niko Corporation |
Functional film
|
US9057955B2
(en)
|
2013-01-22 |
2015-06-16 |
Nikon Corporation |
Functional film, liquid immersion member, method of manufacturing liquid immersion member, exposure apparatus, and device manufacturing method
|
WO2014132923A1
(ja)
|
2013-02-28 |
2014-09-04 |
株式会社ニコン |
摺動膜、摺動膜が形成された部材、及びその製造方法
|
CN104950585B
(zh)
*
|
2014-03-25 |
2017-06-27 |
上海微电子装备有限公司 |
一种浸液限制机构
|
NL2017128A
(en)
|
2015-07-16 |
2017-01-23 |
Asml Netherlands Bv |
A lithographic apparatus, a projection system, a last lens element, a liquid control member and a device manufacturing method
|
CN107315322B
(zh)
|
2017-07-20 |
2018-09-07 |
京东方科技集团股份有限公司 |
一种曝光距离调整方法及装置
|
CN107219730B
(zh)
*
|
2017-07-28 |
2020-04-14 |
京东方科技集团股份有限公司 |
一种掩膜板装载系统及曝光机
|