SG11201912726RA - Balancing rf circuit and control for a cross-coupled simo distribution network - Google Patents

Balancing rf circuit and control for a cross-coupled simo distribution network

Info

Publication number
SG11201912726RA
SG11201912726RA SG11201912726RA SG11201912726RA SG11201912726RA SG 11201912726R A SG11201912726R A SG 11201912726RA SG 11201912726R A SG11201912726R A SG 11201912726RA SG 11201912726R A SG11201912726R A SG 11201912726RA SG 11201912726R A SG11201912726R A SG 11201912726RA
Authority
SG
Singapore
Prior art keywords
simo
balancing
coupled
circuit
cross
Prior art date
Application number
SG11201912726RA
Inventor
David Coumou
Dennis Brown
Jeongseok Jang
Jin Huh
Original Assignee
Mks Instr Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mks Instr Inc filed Critical Mks Instr Inc
Publication of SG11201912726RA publication Critical patent/SG11201912726RA/en

Links

Classifications

    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H7/00—Multiple-port networks comprising only passive electrical elements as network components
    • H03H7/42—Networks for transforming balanced signals into unbalanced signals and vice versa, e.g. baluns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H01J37/32183—Matching circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32889—Connection or combination with other apparatus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32899—Multiple chambers, e.g. cluster tools
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P5/00—Coupling devices of the waveguide type
    • H01P5/12—Coupling devices having more than two ports
    • H01P5/16—Conjugate devices, i.e. devices having at least one port decoupled from one other port
    • H01P5/19—Conjugate devices, i.e. devices having at least one port decoupled from one other port of the junction type
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H7/00—Multiple-port networks comprising only passive electrical elements as network components
    • H03H7/46—Networks for connecting several sources or loads, working on different frequencies or frequency bands, to a common load or source
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H7/00—Multiple-port networks comprising only passive electrical elements as network components
    • H03H7/48—Networks for connecting several sources or loads, working on the same frequency or frequency band, to a common load or source
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/332—Coating
    • H01J2237/3322—Problems associated with coating
    • H01J2237/3323—Problems associated with coating uniformity
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/334—Etching

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
SG11201912726RA 2017-08-29 2018-08-28 Balancing rf circuit and control for a cross-coupled simo distribution network SG11201912726RA (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201762551637P 2017-08-29 2017-08-29
US16/112,055 US10536130B2 (en) 2017-08-29 2018-08-24 Balancing RF circuit and control for a cross-coupled SIMO distribution network
PCT/US2018/048351 WO2019046305A1 (en) 2017-08-29 2018-08-28 Balancing rf circuit and control for a cross-coupled simo distribution network

Publications (1)

Publication Number Publication Date
SG11201912726RA true SG11201912726RA (en) 2020-01-30

Family

ID=65435644

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201912726RA SG11201912726RA (en) 2017-08-29 2018-08-28 Balancing rf circuit and control for a cross-coupled simo distribution network

Country Status (8)

Country Link
US (1) US10536130B2 (en)
EP (1) EP3676864B1 (en)
JP (1) JP7013567B2 (en)
KR (1) KR102360431B1 (en)
CN (1) CN111033681B (en)
SG (1) SG11201912726RA (en)
TW (1) TWI673953B (en)
WO (1) WO2019046305A1 (en)

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TW202130229A (en) * 2019-10-25 2021-08-01 美商蘭姆研究公司 Radio frequency (rf) power imbalancing in a multi-station integrated circuit fabrication chamber
KR20220106820A (en) * 2019-12-02 2022-07-29 램 리써치 코포레이션 Impedance conversion in RF (RADIO-FREQUENCY) assisted plasma generation
CN112992636B (en) * 2019-12-17 2023-09-29 中微半导体设备(上海)股份有限公司 RF power source device for plasma processing apparatus and RF power distribution method
US11994542B2 (en) 2020-03-27 2024-05-28 Lam Research Corporation RF signal parameter measurement in an integrated circuit fabrication chamber
DE102022111529A1 (en) * 2022-05-09 2023-11-09 TRUMPF Hüttinger GmbH + Co. KG Power supply arrangement, plasma generation device and method for controlling several plasma processes
CN117353260B (en) * 2023-11-02 2024-08-06 深圳市恒运昌真空技术股份有限公司 Energy overshoot suppression circuit based on balanced power amplifier and control method thereof

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AU2003195A (en) 1994-06-21 1996-01-04 Boc Group, Inc., The Improved power distribution for multiple electrode plasma systems using quarter wavelength transmission lines
US6046594A (en) 1997-02-11 2000-04-04 Advanced Energy Voorhees, Inc. Method and apparatus for monitoring parameters of an RF powered load in the presence of harmonics
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Also Published As

Publication number Publication date
EP3676864A1 (en) 2020-07-08
KR20200037430A (en) 2020-04-08
US10536130B2 (en) 2020-01-14
CN111033681B (en) 2023-03-10
CN111033681A (en) 2020-04-17
TWI673953B (en) 2019-10-01
WO2019046305A1 (en) 2019-03-07
KR102360431B1 (en) 2022-02-14
US20190068158A1 (en) 2019-02-28
JP7013567B2 (en) 2022-01-31
EP3676864A4 (en) 2021-08-04
JP2020532826A (en) 2020-11-12
EP3676864B1 (en) 2023-08-09
TW202019088A (en) 2020-05-16

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