SG11201808961QA - Methods for in situ monitoring and control of defect formation or healing - Google Patents

Methods for in situ monitoring and control of defect formation or healing

Info

Publication number
SG11201808961QA
SG11201808961QA SG11201808961QA SG11201808961QA SG11201808961QA SG 11201808961Q A SG11201808961Q A SG 11201808961QA SG 11201808961Q A SG11201808961Q A SG 11201808961QA SG 11201808961Q A SG11201808961Q A SG 11201808961QA SG 11201808961Q A SG11201808961Q A SG 11201808961QA
Authority
SG
Singapore
Prior art keywords
international
healing
sheet
maryland
bethesda
Prior art date
Application number
SG11201808961QA
Inventor
Jacob L Swett
Peter V Bedworth
Original Assignee
Lockheed Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lockheed Corp filed Critical Lockheed Corp
Priority to PCT/US2016/027583 priority Critical patent/WO2017180133A1/en
Priority to US15/099,056 priority patent/US10203295B2/en
Publication of SG11201808961QA publication Critical patent/SG11201808961QA/en

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00Investigating or analysing materials by the use of electric, electro-chemical, or magnetic means
    • G01N27/02Investigating or analysing materials by the use of electric, electro-chemical, or magnetic means by investigating the impedance of the material
    • G01N27/04Investigating or analysing materials by the use of electric, electro-chemical, or magnetic means by investigating the impedance of the material by investigating resistance
    • G01N27/20Investigating the presence of flaws
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22Investigating or analysing materials by the use of wave or particle radiation not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225Investigating or analysing materials by the use of wave or particle radiation not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N25/00Investigating or analyzing materials by the use of thermal means
    • G01N25/72Investigating presence of flaws
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00Investigating or analysing materials by the use of electric, electro-chemical, or magnetic means
    • G01N27/02Investigating or analysing materials by the use of electric, electro-chemical, or magnetic means by investigating the impedance of the material
    • G01N27/04Investigating or analysing materials by the use of electric, electro-chemical, or magnetic means by investigating the impedance of the material by investigating resistance
    • G01N27/041Investigating or analysing materials by the use of electric, electro-chemical, or magnetic means by investigating the impedance of the material by investigating resistance of a solid body
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N33/00Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00Manufacture or treatment of nanostructures
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N33/00Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
    • G01N2033/0095Semiconductive materials
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/60Specific applications or type of materials
    • G01N2223/603Specific applications or type of materials superlattices
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/60Specific applications or type of materials
    • G01N2223/646Specific applications or type of materials flaws, defects
    • G01N2223/6462Specific applications or type of materials flaws, defects microdefects

Abstract

WO 17 / 180 133 Al (12) INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property Organization International Bureau (43) International Publication Date 19 October 2017 (19.10.2017) WIPO I PCT (10) International Publication Number WO 2017/180133 Al 111111111111110111011111111111010111110111011111101111111111011011111111111110111111 (51) International Patent Classification: GO1N 21/89 (2006.01) GO1N 21/65 (2006.01) (21) International Application Number: PCT/US2016/027583 (22) International Filing Date: 14 April 2016 (14.04.2016) (25) Filing Language: English (26) Publication Language: English (30) Priority Data: 15/099,056 14 April 2016 (14.04.2016) US (71) Applicant: LOCKHEED MARTIN CORPORATION [US/US]; 6801 Rockledge Drive, Bethesda, Maryland 20817 (US). (72) Inventors: SWETT, Jacob L.; 6801 Rockledge Drive, Bethesda, Maryland 20817 (US). BEDWORTH, Peter V.; 6801 Rockledge Drive, Bethesda, Maryland 20817 (US). (74) Agents: THOMPSON, Eley 0. et al.; C/o Foley & Lard- ner LLP, 3000 K Street N.W., Suite 600, Washington, Dis- trict of Columbia 20007 (US). (81) Designated States (unless otherwise indicated, for every kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, [Continued on next page] (54) Title: METHODS FOR IN SITU MONITORING AND CONTROL OF DEFECT FORMATION OR HEALING (57) : Production of perforated two-dimensional la materials with holes of a desired size range, a narrow size distribution, and a high and uniform density remains a chal- 1.2 lenge, at least partially, due to physical and chemical incon- sistencies from sheet-to-sheet of the two-dimensional mater- ial and surface contamination. This disclosure describes methods for monitoring and adjusting perforation or healing conditions in real-time to address inter- and intra-sheet vari- ability. In situ or substantially simultaneous feedback on de- fect production or healing may be provided either locally or globally on a graphene or other two-dimensional sheet. The feedback data can be used to adjust perforation or healing parameters, such as the total dose or efficacy of the perforat- ing radiation, to achieve the desired defect state. FIG. 1 WO 2017/180133 Al MIDEDIMOMOIDERMEMOMOVEM0111100MOVOIMIE LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, Published: SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG). with international search report (Art. 21(3))
SG11201808961QA 2016-04-14 2016-04-14 Methods for in situ monitoring and control of defect formation or healing SG11201808961QA (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
PCT/US2016/027583 WO2017180133A1 (en) 2016-04-14 2016-04-14 Methods for in situ monitoring and control of defect formation or healing
US15/099,056 US10203295B2 (en) 2016-04-14 2016-04-14 Methods for in situ monitoring and control of defect formation or healing

Publications (1)

Publication Number Publication Date
SG11201808961QA true SG11201808961QA (en) 2018-11-29

Family

ID=60038093

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201808961QA SG11201808961QA (en) 2016-04-14 2016-04-14 Methods for in situ monitoring and control of defect formation or healing

Country Status (5)

Country Link
US (1) US10203295B2 (en)
EP (1) EP3443329A1 (en)
KR (1) KR20180133430A (en)
SG (1) SG11201808961QA (en)
WO (1) WO2017180133A1 (en)

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