SG10201702031RA - Workpiece evaluating method - Google Patents
Workpiece evaluating methodInfo
- Publication number
- SG10201702031RA SG10201702031RA SG10201702031RA SG10201702031RA SG10201702031RA SG 10201702031R A SG10201702031R A SG 10201702031RA SG 10201702031R A SG10201702031R A SG 10201702031RA SG 10201702031R A SG10201702031R A SG 10201702031RA SG 10201702031R A SG10201702031R A SG 10201702031RA
- Authority
- SG
- Singapore
- Prior art keywords
- workpiece
- evaluating method
- evaluating
- workpiece evaluating
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B27/00—Other grinding machines or devices
- B24B27/0023—Other grinding machines or devices grinding machines with a plurality of working posts
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/14—Measuring as part of the manufacturing process for electrical parameters, e.g. resistance, deep-levels, CV, diffusions by electrical means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B27/00—Other grinding machines or devices
- B24B27/0069—Other grinding machines or devices with means for feeding the work-pieces to the grinding tool, e.g. turntables, transfer means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B27/00—Other grinding machines or devices
- B24B27/0076—Other grinding machines or devices grinding machines comprising two or more grinding tools
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/07—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
- B24B37/10—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/005—Feeding or manipulating devices specially adapted to grinding machines
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/12—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving optical means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/228—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding thin, brittle parts, e.g. semiconductors, wafers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N22/00—Investigating or analysing materials by the use of microwaves or radio waves, i.e. electromagnetic waves with a wavelength of one millimetre or more
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N22/00—Investigating or analysing materials by the use of microwaves or radio waves, i.e. electromagnetic waves with a wavelength of one millimetre or more
- G01N22/02—Investigating the presence of flaws
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/322—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to modify their internal properties, e.g. to produce internal imperfections
- H01L21/3221—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to modify their internal properties, e.g. to produce internal imperfections of silicon bodies, e.g. for gettering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
- H01L22/24—Optical enhancement of defects or not directly visible states, e.g. selective electrolytic deposition, bubbles in liquids, light emission, colour change
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N1/00—Sampling; Preparing specimens for investigation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2201/00—Features of devices classified in G01N21/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016064621A JP6704275B2 (en) | 2016-03-28 | 2016-03-28 | Device wafer evaluation method |
Publications (1)
Publication Number | Publication Date |
---|---|
SG10201702031RA true SG10201702031RA (en) | 2017-10-30 |
Family
ID=59814394
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10201702031RA SG10201702031RA (en) | 2016-03-28 | 2017-03-14 | Workpiece evaluating method |
Country Status (7)
Country | Link |
---|---|
US (1) | US10157802B2 (en) |
JP (1) | JP6704275B2 (en) |
KR (1) | KR102235432B1 (en) |
CN (1) | CN107234525B (en) |
DE (1) | DE102017205104B4 (en) |
SG (1) | SG10201702031RA (en) |
TW (1) | TWI718251B (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6887722B2 (en) * | 2016-10-25 | 2021-06-16 | 株式会社ディスコ | Wafer processing method and cutting equipment |
US11874101B2 (en) | 2018-04-12 | 2024-01-16 | Faro Technologies, Inc | Modular servo cartridges for precision metrology |
US10969760B2 (en) * | 2018-04-12 | 2021-04-06 | Faro Technologies, Inc. | Coordinate measurement system with auxiliary axis |
CN109333222B (en) * | 2018-11-01 | 2023-06-27 | 浙江中晶新材料研究有限公司 | Full-automatic silicon wafer chamfering processing equipment and processing technology thereof |
JP7118558B2 (en) * | 2019-01-17 | 2022-08-16 | 株式会社ディスコ | Workpiece processing method |
KR20210114028A (en) * | 2019-01-24 | 2021-09-17 | 도쿄엘렉트론가부시키가이샤 | Processing device and processing method |
JP7345379B2 (en) * | 2019-12-06 | 2023-09-15 | 株式会社ディスコ | Gettering property evaluation device |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5897835A (en) * | 1981-12-07 | 1983-06-10 | Hitachi Ltd | Semiconductor substrate and manufacture thereof |
JP2508530B2 (en) * | 1987-04-25 | 1996-06-19 | 三菱マテリアル株式会社 | Evaluation method of gettering ability of warped wafer |
JP3121938B2 (en) * | 1992-05-14 | 2001-01-09 | 株式会社神戸製鋼所 | Semiconductor wafer minority carrier lifetime measurement system |
JP3327289B2 (en) * | 2000-03-29 | 2002-09-24 | 株式会社ニコン | Process end point measuring device, measuring method, polishing device, semiconductor device manufacturing method, and recording medium recording signal processing program |
HUP9902355A2 (en) | 1999-07-12 | 2001-07-30 | SEMILAB Félvezető Fizikai Laboratórium Rt. | High sensitivity method and apparatus for the measurement of the lifetime of minority charge carriers in semiconductors |
WO2002029883A1 (en) * | 2000-10-06 | 2002-04-11 | Aoti Operating Company, Inc. | Method to detect surface metal contamination |
JP4071476B2 (en) * | 2001-03-21 | 2008-04-02 | 株式会社東芝 | Semiconductor wafer and method for manufacturing semiconductor wafer |
TWI352645B (en) * | 2004-05-28 | 2011-11-21 | Ebara Corp | Apparatus for inspecting and polishing substrate r |
JP4733934B2 (en) * | 2004-06-22 | 2011-07-27 | 株式会社ディスコ | Wafer processing method |
EP2037288B1 (en) * | 2007-09-11 | 2011-06-22 | S.O.I. TEC Silicon on Insulator Technologies | Volume lifetime measurement |
JP2009094326A (en) | 2007-10-10 | 2009-04-30 | Disco Abrasive Syst Ltd | Method of grinding wafer |
JP5358373B2 (en) * | 2009-09-24 | 2013-12-04 | 株式会社神戸製鋼所 | Semiconductor thin film crystallinity evaluation method and crystallinity evaluation apparatus |
JP2011253983A (en) | 2010-06-03 | 2011-12-15 | Disco Abrasive Syst Ltd | Method for adding gettering layer to silicon wafer |
JP5350345B2 (en) * | 2010-09-22 | 2013-11-27 | 株式会社神戸製鋼所 | Apparatus and method for evaluating crystallinity of thin film semiconductor |
JP5793341B2 (en) | 2011-05-12 | 2015-10-14 | 株式会社ディスコ | Wafer processing method |
JP5916513B2 (en) | 2012-05-23 | 2016-05-11 | 株式会社ディスコ | Processing method of plate |
JP6037688B2 (en) * | 2012-07-09 | 2016-12-07 | 東京エレクトロン株式会社 | Anomaly detection method in microwave introduction module |
JP6060016B2 (en) * | 2013-03-28 | 2017-01-11 | ブラザー工業株式会社 | Film forming apparatus, film forming method, and film forming program |
US9685906B2 (en) * | 2013-07-03 | 2017-06-20 | Semilab SDI LLC | Photoluminescence mapping of passivation defects for silicon photovoltaics |
US10230003B2 (en) * | 2013-09-03 | 2019-03-12 | Joled Inc. | Method of evaluating thin-film transistor, method of manufacturing thin-film transistor, and thin-film transistor |
US9299537B2 (en) * | 2014-03-20 | 2016-03-29 | Applied Materials, Inc. | Radial waveguide systems and methods for post-match control of microwaves |
JP6410490B2 (en) * | 2014-06-27 | 2018-10-24 | 株式会社ディスコ | Device wafer evaluation method |
JP6366383B2 (en) * | 2014-06-27 | 2018-08-01 | 株式会社ディスコ | Processing equipment |
-
2016
- 2016-03-28 JP JP2016064621A patent/JP6704275B2/en active Active
-
2017
- 2017-02-17 TW TW106105328A patent/TWI718251B/en active
- 2017-03-14 SG SG10201702031RA patent/SG10201702031RA/en unknown
- 2017-03-17 US US15/461,784 patent/US10157802B2/en active Active
- 2017-03-23 KR KR1020170037017A patent/KR102235432B1/en active IP Right Grant
- 2017-03-23 CN CN201710176705.2A patent/CN107234525B/en active Active
- 2017-03-27 DE DE102017205104.3A patent/DE102017205104B4/en active Active
Also Published As
Publication number | Publication date |
---|---|
JP6704275B2 (en) | 2020-06-03 |
KR102235432B1 (en) | 2021-04-01 |
TW201736857A (en) | 2017-10-16 |
CN107234525A (en) | 2017-10-10 |
DE102017205104A1 (en) | 2017-09-28 |
US10157802B2 (en) | 2018-12-18 |
US20170278759A1 (en) | 2017-09-28 |
CN107234525B (en) | 2021-01-12 |
DE102017205104B4 (en) | 2019-08-01 |
JP2017181111A (en) | 2017-10-05 |
TWI718251B (en) | 2021-02-11 |
KR20170113216A (en) | 2017-10-12 |
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