SG10201504321SA - Peroxide-vapor treatment for enhancing photoresist-strip performance and modifying organic films - Google Patents

Peroxide-vapor treatment for enhancing photoresist-strip performance and modifying organic films

Info

Publication number
SG10201504321SA
SG10201504321SA SG10201504321SA SG10201504321SA SG10201504321SA SG 10201504321S A SG10201504321S A SG 10201504321SA SG 10201504321S A SG10201504321S A SG 10201504321SA SG 10201504321S A SG10201504321S A SG 10201504321SA SG 10201504321S A SG10201504321S A SG 10201504321SA
Authority
SG
Singapore
Prior art keywords
peroxide
organic films
vapor treatment
modifying organic
strip performance
Prior art date
Application number
SG10201504321SA
Inventor
Bayu Atmaja Thedjoisworo
Bradley Jon Jacobs
Ivan Berry
David Cheung
Original Assignee
Lam Res Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lam Res Corp filed Critical Lam Res Corp
Publication of SG10201504321SA publication Critical patent/SG10201504321SA/en

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3105—After-treatment
    • H01L21/311—Etching the insulating layers by chemical or physical means
    • H01L21/31127—Etching organic layers
    • H01L21/31133—Etching organic layers by chemical means
    • H01L21/31138—Etching organic layers by chemical means by dry-etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67069—Apparatus for fluid treatment for etching for drying etching
SG10201504321SA 2014-06-10 2015-06-03 Peroxide-vapor treatment for enhancing photoresist-strip performance and modifying organic films SG10201504321SA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US14/301,155 US9514954B2 (en) 2014-06-10 2014-06-10 Peroxide-vapor treatment for enhancing photoresist-strip performance and modifying organic films

Publications (1)

Publication Number Publication Date
SG10201504321SA true SG10201504321SA (en) 2016-01-28

Family

ID=54770163

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201504321SA SG10201504321SA (en) 2014-06-10 2015-06-03 Peroxide-vapor treatment for enhancing photoresist-strip performance and modifying organic films

Country Status (4)

Country Link
US (1) US9514954B2 (en)
KR (1) KR20150141906A (en)
SG (1) SG10201504321SA (en)
TW (1) TWI686866B (en)

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US9741585B1 (en) * 2016-04-12 2017-08-22 Taiwan Semiconductor Manufacturing Co., Ltd. Reactive radical treatment for polymer removal and workpiece cleaning
US11289323B2 (en) * 2017-12-15 2022-03-29 Beijing E-Town Semiconductor Co, , Ltd. Processing of semiconductors using vaporized solvents
US11721541B2 (en) * 2021-03-03 2023-08-08 Taiwan Semiconductor Manufacturing Company Limited Semiconductor arrangement formation

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US9514954B2 (en) 2016-12-06
US20150357202A1 (en) 2015-12-10
TW201611120A (en) 2016-03-16
KR20150141906A (en) 2015-12-21

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