PL1742307T3 - Przyrząd wpływający na polaryzację wiązki laserowej - Google Patents
Przyrząd wpływający na polaryzację wiązki laserowejInfo
- Publication number
- PL1742307T3 PL1742307T3 PL05014867T PL05014867T PL1742307T3 PL 1742307 T3 PL1742307 T3 PL 1742307T3 PL 05014867 T PL05014867 T PL 05014867T PL 05014867 T PL05014867 T PL 05014867T PL 1742307 T3 PL1742307 T3 PL 1742307T3
- Authority
- PL
- Poland
- Prior art keywords
- polarisation
- controlling
- laser beam
- phase shift
- shift element
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
- B23K26/0643—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising mirrors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/12—Working by laser beam, e.g. welding, cutting or boring in a special atmosphere, e.g. in an enclosure
- B23K26/123—Working by laser beam, e.g. welding, cutting or boring in a special atmosphere, e.g. in an enclosure in an atmosphere of particular gases
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
- G02B27/286—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising for controlling or changing the state of polarisation, e.g. transforming one polarisation state into another
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Laser Beam Processing (AREA)
- Lasers (AREA)
- Laser Surgery Devices (AREA)
- Semiconductor Lasers (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP05014867A EP1742307B1 (de) | 2005-07-08 | 2005-07-08 | Vorrichtung zur Beeinflussung der Polarisation einer Laserstrahlung |
Publications (1)
Publication Number | Publication Date |
---|---|
PL1742307T3 true PL1742307T3 (pl) | 2009-01-30 |
Family
ID=35344674
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PL05014867T PL1742307T3 (pl) | 2005-07-08 | 2005-07-08 | Przyrząd wpływający na polaryzację wiązki laserowej |
Country Status (6)
Country | Link |
---|---|
US (1) | US7573636B2 (pl) |
EP (1) | EP1742307B1 (pl) |
AT (1) | ATE405975T1 (pl) |
DE (1) | DE502005005117D1 (pl) |
ES (1) | ES2313155T3 (pl) |
PL (1) | PL1742307T3 (pl) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20130032580A1 (en) * | 2010-11-29 | 2013-02-07 | Mitsubishi Electric Corporation | Optical path structure of laser processing machine |
CN103192179B (zh) * | 2013-04-26 | 2015-06-17 | 云南玉溪水松纸厂 | 激光打孔设备的偏振装置 |
EP3362839B1 (de) | 2015-10-14 | 2021-01-27 | TRUMPF Lasersystems for Semiconductor Manufacturing GmbH | Polarisatoranordnung, euv-strahlungserzeugungsvorrichtung damit und verfahren zur linearen polarisation eines laserstrahls |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3192824A (en) * | 1960-12-20 | 1965-07-06 | Kollsman Instr Corp | Scanning system for light tracking device |
CA1189576A (en) * | 1980-12-15 | 1985-06-25 | William G. Fredrick, Jr. | Laser cutting apparatus and method |
DE3149004A1 (de) | 1981-12-10 | 1983-06-16 | Grünzweig + Hartmann und Glasfaser AG, 6700 Ludwigshafen | Durch pressen verdichteter waermedaemmkoerper aus einem hochdispersen daemmaterial |
US4643576A (en) * | 1984-04-19 | 1987-02-17 | Ricoh Company Ltd. | Fringe scanning shearing interferometer |
DE3829708A1 (de) * | 1988-09-01 | 1990-03-15 | Zeiss Carl Fa | Umschaltbarer winkelspiegel fuer periskope |
US5483342A (en) * | 1993-06-25 | 1996-01-09 | Hughes Aircraft Company | Polarization rotator with frequency shifting phase conjugate mirror and simplified interferometric output coupler |
TW245669B (pl) | 1993-09-27 | 1995-04-21 | Mitsubishi Electric Machine | |
ES2116500T3 (es) * | 1993-10-18 | 1998-07-16 | Denyo Co Ltd | Soldadora por arco accionada a motor. |
JPH07211972A (ja) * | 1994-01-20 | 1995-08-11 | Fanuc Ltd | レーザ発振器 |
US5878067A (en) * | 1994-08-10 | 1999-03-02 | Fanuc Ltd. | Laser oscillator |
US5469236A (en) * | 1995-01-19 | 1995-11-21 | Roessel/Cpt, Inc. | Snorkel lens system |
WO1996029765A1 (en) * | 1995-03-23 | 1996-09-26 | Coherent, Inc. | Prism folded laser cavity with controlled intracavity beam polarization |
JP3224718B2 (ja) * | 1995-08-15 | 2001-11-05 | レーザーテック株式会社 | 干渉計 |
JP2871623B2 (ja) * | 1996-07-11 | 1999-03-17 | 日本電気株式会社 | 半導体レーザ装置 |
US6020992A (en) * | 1997-06-16 | 2000-02-01 | Laser Power Corporation | Low absorption coatings for infrared laser optical elements |
TW524966B (en) * | 1998-02-05 | 2003-03-21 | Nat Science Council | Image capturing type optical wavefront measurement device |
US6342981B1 (en) * | 1999-09-21 | 2002-01-29 | Rose Research, Llc | Zero-displacement phase retarder device and method |
-
2005
- 2005-07-08 AT AT05014867T patent/ATE405975T1/de not_active IP Right Cessation
- 2005-07-08 EP EP05014867A patent/EP1742307B1/de active Active
- 2005-07-08 DE DE502005005117T patent/DE502005005117D1/de active Active
- 2005-07-08 ES ES05014867T patent/ES2313155T3/es active Active
- 2005-07-08 PL PL05014867T patent/PL1742307T3/pl unknown
-
2006
- 2006-07-07 US US11/483,405 patent/US7573636B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
EP1742307B1 (de) | 2008-08-20 |
EP1742307A1 (de) | 2007-01-10 |
US20070024969A1 (en) | 2007-02-01 |
ES2313155T3 (es) | 2009-03-01 |
ATE405975T1 (de) | 2008-09-15 |
DE502005005117D1 (de) | 2008-10-02 |
US7573636B2 (en) | 2009-08-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2005069081A3 (en) | Polarization-modulating optical element | |
WO2009034109A3 (en) | Illumination system of a microlithographic projection exposure apparatus | |
WO2016020630A3 (en) | Waveguide laser illuminator incorporating a despeckler | |
EP1746451A3 (de) | Fernoptische Einrichtung mit grossem Sehfeld und hoher Vergrösserung | |
WO2007016199A3 (en) | Polarizing beam splitter with lens function | |
WO2006039645A3 (en) | Optical delay | |
WO2007061997A3 (en) | System, method and device for rapid, high precision, large angle beam steering | |
TW200604697A (en) | AOM modulation techniques employing an upstream BRAGG adjustment device | |
AU2003270546A1 (en) | Image projection system with a polarizing beam splitter | |
DE60229935D1 (de) | Kompensation der doppelbrechung in kubisch kristallinen projektionslinsen und optischen systemen | |
WO2005121889A3 (en) | Aom modulation techniques for improving laser system performance | |
EP1850100A3 (en) | Optical measuring system | |
TW200717046A (en) | Optical system, in particular illumination system or projection lens of a microlithographic exposure system | |
WO2004114325A3 (en) | Beam conditioning system | |
WO2004068656A3 (de) | Faltvorrichtung zur strahlführung in einem laser | |
DE602006004154D1 (de) | Hebel mit variabler Drehachse | |
PL1742307T3 (pl) | Przyrząd wpływający na polaryzację wiązki laserowej | |
WO2007044188A3 (en) | Methods and apparatus providing improved visual capabilities of optical instruments | |
AU2002364460A1 (en) | Optical instrument for observation from a satellite, with two telescopes | |
EP1653268A3 (de) | Farblängsfehler verringerndes Optiksystem, insbesondere für Mikroskop | |
WO2006116142A3 (en) | Image rotator | |
PL2050574T3 (pl) | Przyrząd i proces do opisywania struktury obrazów iluzji | |
WO2004031816A3 (en) | Laser system | |
DK1772206T3 (da) | Tyndplade samt fremgangsmåde og apparat til fremstilling af en tynd plade | |
TW200717082A (en) | Device and method for liquid crystal photo-alignment |