NL8220224A - Inrichting voor het projecteren van een reeks beelden op vormplaatsen van een halfgeleiderwafel. - Google Patents

Inrichting voor het projecteren van een reeks beelden op vormplaatsen van een halfgeleiderwafel. Download PDF

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Publication number
NL8220224A
NL8220224A NL8220224A NL8220224A NL8220224A NL 8220224 A NL8220224 A NL 8220224A NL 8220224 A NL8220224 A NL 8220224A NL 8220224 A NL8220224 A NL 8220224A NL 8220224 A NL8220224 A NL 8220224A
Authority
NL
Netherlands
Prior art keywords
wafer
image
lens
reticle
curvature
Prior art date
Application number
NL8220224A
Other languages
English (en)
Dutch (nl)
Original Assignee
Gen Signal Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US06/378,370 external-priority patent/US4425037A/en
Application filed by Gen Signal Corp filed Critical Gen Signal Corp
Publication of NL8220224A publication Critical patent/NL8220224A/nl

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
NL8220224A 1981-05-15 1982-05-17 Inrichting voor het projecteren van een reeks beelden op vormplaatsen van een halfgeleiderwafel. NL8220224A (nl)

Applications Claiming Priority (8)

Application Number Priority Date Filing Date Title
US26417181A 1981-05-15 1981-05-15
US26424981A 1981-05-15 1981-05-15
US26424981 1981-05-15
US26417181 1981-05-15
US06/378,370 US4425037A (en) 1981-05-15 1982-05-14 Apparatus for projecting a series of images onto dies of a semiconductor wafer
US37837082 1982-05-14
PCT/US1982/000668 WO1982004133A1 (en) 1981-05-15 1982-05-17 Apparatus for projecting a series of images onto dies of a semiconductor wafer
US8200668 1982-05-17

Publications (1)

Publication Number Publication Date
NL8220224A true NL8220224A (nl) 1983-04-05

Family

ID=27401672

Family Applications (1)

Application Number Title Priority Date Filing Date
NL8220224A NL8220224A (nl) 1981-05-15 1982-05-17 Inrichting voor het projecteren van een reeks beelden op vormplaatsen van een halfgeleiderwafel.

Country Status (8)

Country Link
EP (3) EP0146670B1 (cs)
JP (1) JPS58500730A (cs)
CH (1) CH678666A5 (cs)
DE (2) DE3249686C2 (cs)
GB (1) GB2121552B (cs)
NL (1) NL8220224A (cs)
SE (4) SE450979B (cs)
WO (1) WO1982004133A1 (cs)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5212500A (en) * 1991-03-15 1993-05-18 Eastman Kodak Company Writing beam focusing utilizing light of a different wavelength
WO1995034025A1 (en) * 1994-06-02 1995-12-14 Philips Electronics N.V. Method of repetitively imaging a mask pattern on a substrate, and apparatus for performing the method
US5739964A (en) * 1995-03-22 1998-04-14 Etec Systems, Inc. Magnification correction for small field scanning
US5757469A (en) * 1995-03-22 1998-05-26 Etec Systems, Inc. Scanning lithography system haing double pass Wynne-Dyson optics
JP2565149B2 (ja) * 1995-04-05 1996-12-18 キヤノン株式会社 回路の製造方法及び露光装置
DE29705870U1 (de) * 1997-04-07 1998-08-20 Fehlert, Gerd-P., Dr.-Ing., 42115 Wuppertal Flachbildschirm

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US198159A (en) * 1877-12-11 Improvement in bottles for promoting vegetation
US419159A (en) * 1890-01-07 Signments
US3809050A (en) * 1971-01-13 1974-05-07 Cogar Corp Mounting block for semiconductor wafers
US3796497A (en) * 1971-12-01 1974-03-12 Ibm Optical alignment method and apparatus
US3818327A (en) * 1972-09-05 1974-06-18 Industrial Nucleonics Corp Measuring gauge with support for holding measured sheet and discharging foreign matter
US3951546A (en) * 1974-09-26 1976-04-20 The Perkin-Elmer Corporation Three-fold mirror assembly for a scanning projection system
US3917399A (en) * 1974-10-02 1975-11-04 Tropel Catadioptric projection printer
FR2330030A1 (fr) * 1975-10-31 1977-05-27 Thomson Csf Nouvel appareil photorepeteur de masques de haute precision
JPS5264932A (en) * 1975-11-25 1977-05-28 Hitachi Ltd Automatic focus adjusting device
US4103989A (en) * 1977-02-07 1978-08-01 Seymour Rosin Unit-power concentric optical systems
US4171870A (en) * 1977-05-06 1979-10-23 Bell Telephone Laboratories, Incorporated Compact image projection apparatus
US4171871A (en) * 1977-06-30 1979-10-23 International Business Machines Corporation Achromatic unit magnification optical system
US4190352A (en) * 1977-06-30 1980-02-26 Bell Telephone Laboratories, Incorporated Method and apparatus for continuously patterning a photosensitive tape
US4131267A (en) * 1978-06-02 1978-12-26 Disco Kabushiki Kaisha Apparatus for holding workpiece by suction
FR2429447A1 (fr) * 1978-06-23 1980-01-18 Thomson Csf Systeme optique de projection muni d'un positionneur de plaque
GB2063523B (en) * 1978-10-20 1982-12-15 Hitachi Ltd Wafer position setting apparatus
US4198159A (en) * 1978-12-29 1980-04-15 International Business Machines Corporation Optical alignment system in projection printing
DE2905635C2 (de) * 1979-02-14 1987-01-22 Perkin-Elmer Censor Anstalt, Vaduz Einrichtung zum Positionieren eines Werkstückes in Z-Richtung beim Projektionskopieren
FR2450470A1 (fr) * 1979-02-27 1980-09-26 Thomson Csf Systeme optique de projection en photorepetition
US4232969A (en) * 1979-05-30 1980-11-11 International Business Machines Corporation Projection optical system for aligning an image on a surface

Also Published As

Publication number Publication date
SE8700053L (sv) 1987-01-08
SE450979B (sv) 1987-09-07
SE8700051D0 (sv) 1987-01-08
SE8700051L (sv) 1987-01-08
SE450978B (sv) 1987-09-07
GB2121552B (en) 1985-12-18
GB2121552A (en) 1983-12-21
SE451411B (sv) 1987-10-05
SE8700052D0 (sv) 1987-01-08
EP0078323B1 (en) 1987-01-14
EP0078323A1 (en) 1983-05-11
EP0078323A4 (en) 1983-08-09
DE3249686C2 (de) 1986-11-13
SE459771B (sv) 1989-07-31
EP0354148A2 (en) 1990-02-07
EP0354148A3 (en) 1990-06-20
SE8700052L (sv) 1987-01-08
DE3249685C2 (cs) 1987-09-24
SE8300183D0 (sv) 1983-01-14
EP0146670B1 (en) 1989-07-19
CH678666A5 (cs) 1991-10-15
WO1982004133A1 (en) 1982-11-25
JPH0313574B2 (cs) 1991-02-22
JPS58500730A (ja) 1983-05-06
EP0146670A3 (en) 1985-11-27
EP0146670A2 (en) 1985-07-03
SE8300183L (sv) 1983-01-14
SE8700053D0 (sv) 1987-01-08

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