NL7506590A - Instellen van een elektronenbundel op een ele- ment van een plaatje. - Google Patents

Instellen van een elektronenbundel op een ele- ment van een plaatje.

Info

Publication number
NL7506590A
NL7506590A NL7506590A NL7506590A NL7506590A NL 7506590 A NL7506590 A NL 7506590A NL 7506590 A NL7506590 A NL 7506590A NL 7506590 A NL7506590 A NL 7506590A NL 7506590 A NL7506590 A NL 7506590A
Authority
NL
Netherlands
Prior art keywords
adjusting
plate
electron beam
electron
Prior art date
Application number
NL7506590A
Other languages
English (en)
Dutch (nl)
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Publication of NL7506590A publication Critical patent/NL7506590A/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
NL7506590A 1974-06-27 1975-06-04 Instellen van een elektronenbundel op een ele- ment van een plaatje. NL7506590A (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US483509A US3901814A (en) 1974-06-27 1974-06-27 Method and apparatus for detecting a registration mark on a target such as a semiconductor wafer

Publications (1)

Publication Number Publication Date
NL7506590A true NL7506590A (nl) 1975-12-30

Family

ID=23920345

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7506590A NL7506590A (nl) 1974-06-27 1975-06-04 Instellen van een elektronenbundel op een ele- ment van een plaatje.

Country Status (12)

Country Link
US (1) US3901814A (da)
JP (1) JPS5114272A (da)
BR (1) BR7504006A (da)
CA (1) CA1027255A (da)
CH (1) CH588066A5 (da)
DE (1) DE2525235C2 (da)
ES (1) ES438877A1 (da)
FR (1) FR2276689A1 (da)
GB (1) GB1508903A (da)
IT (1) IT1038109B (da)
NL (1) NL7506590A (da)
SE (1) SE408483B (da)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4039810A (en) * 1976-06-30 1977-08-02 International Business Machines Corporation Electron projection microfabrication system
US4056730A (en) * 1976-07-12 1977-11-01 International Business Machines Corporation Apparatus for detecting registration marks on a target such as a semiconductor wafer
DE2726173C2 (de) * 1977-06-08 1982-05-27 Siemens AG, 1000 Berlin und 8000 München Verfahren und Schaltung zur automatischen Positionierung eines Werkstückes relativ zu einem Abtastfeld bzw. zu einer Maske, sowie Verwendung des Verfahrens
JPS5585028A (en) * 1978-12-22 1980-06-26 Hitachi Ltd Mark detecting signal amplifier
EP0054710B1 (de) * 1980-12-19 1986-02-05 International Business Machines Corporation Verfahren zum Ausrichten und Prüfen eines mit Mustern versehenen Werkstücks, z.B. einer Maske für die Herstellung von Halbleiterelementen
US4357540A (en) * 1980-12-19 1982-11-02 International Business Machines Corporation Semiconductor device array mask inspection method and apparatus
JPS5946025A (ja) * 1982-09-09 1984-03-15 Hitachi Ltd パタ−ンエツジの検出方法及び装置
JPS6066428A (ja) * 1983-09-21 1985-04-16 Fujitsu Ltd 電子ビ−ム露光方法
US4803644A (en) * 1985-09-20 1989-02-07 Hughes Aircraft Company Alignment mark detector for electron beam lithography
US4977328A (en) * 1989-03-02 1990-12-11 U.S. Philips Corporation Method of detecting a marker provided on a specimen
JP3453009B2 (ja) * 1995-07-20 2003-10-06 富士通株式会社 電子ビーム露光装置及びこの装置に於けるマーク位置検出方法
US5734594A (en) * 1996-09-25 1998-03-31 Chartered Semiconductor Manufacturing Pte Ltd. Method and system for enhancement of wafer alignment accuracy
US5838013A (en) * 1996-11-13 1998-11-17 International Business Machines Corporation Method for monitoring resist charging in a charged particle system
CN102159120B (zh) 2008-11-28 2014-03-12 山崎将史 桌面电动搅拌器

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1804646B2 (de) * 1968-10-18 1973-03-22 Siemens AG, 1000 Berlin u. 8000 München Korpuskularstrahl-bearbeitungsgeraet
US3644700A (en) * 1969-12-15 1972-02-22 Ibm Method and apparatus for controlling an electron beam
US3745358A (en) * 1971-05-10 1973-07-10 Radiant Energy Systems Alignment method and apparatus for electron projection systems
US3832561A (en) * 1973-10-01 1974-08-27 Westinghouse Electric Corp Method and apparatus for electron beam alignment with a substrate by schottky barrier contacts

Also Published As

Publication number Publication date
US3901814A (en) 1975-08-26
JPS5114272A (en) 1976-02-04
GB1508903A (en) 1978-04-26
FR2276689A1 (fr) 1976-01-23
SE7507110L (sv) 1975-12-29
CH588066A5 (da) 1977-05-31
IT1038109B (it) 1979-11-20
SE408483B (sv) 1979-06-11
ES438877A1 (es) 1977-01-16
DE2525235C2 (de) 1984-06-28
BR7504006A (pt) 1976-07-06
JPS5333474B2 (da) 1978-09-14
FR2276689B1 (da) 1977-04-15
DE2525235A1 (de) 1976-01-15
CA1027255A (en) 1978-02-28

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Legal Events

Date Code Title Description
BA A request for search or an international-type search has been filed
BB A search report has been drawn up
BC A request for examination has been filed
A85 Still pending on 85-01-01
BV The patent application has lapsed