NL7317670A - - Google Patents
Info
- Publication number
- NL7317670A NL7317670A NL7317670A NL7317670A NL7317670A NL 7317670 A NL7317670 A NL 7317670A NL 7317670 A NL7317670 A NL 7317670A NL 7317670 A NL7317670 A NL 7317670A NL 7317670 A NL7317670 A NL 7317670A
- Authority
- NL
- Netherlands
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32733—Means for moving the material to be treated
- H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
- H01J37/32761—Continuous moving
- H01J37/3277—Continuous moving of continuous material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3464—Sputtering using more than one target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/541—Heating or cooling of the substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US323133A US3884787A (en) | 1973-01-12 | 1973-01-12 | Sputtering method for thin film deposition on a substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
NL7317670A true NL7317670A (fr) | 1974-07-16 |
Family
ID=23257860
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL7317670A NL7317670A (fr) | 1973-01-12 | 1973-12-27 |
Country Status (15)
Country | Link |
---|---|
US (1) | US3884787A (fr) |
JP (1) | JPS5747267B2 (fr) |
AT (1) | AT341335B (fr) |
BE (1) | BE809464A (fr) |
CA (1) | CA1018475A (fr) |
CH (1) | CH597622A5 (fr) |
DD (1) | DD109035A5 (fr) |
DE (1) | DE2400587A1 (fr) |
FR (1) | FR2322667A1 (fr) |
GB (1) | GB1461921A (fr) |
IL (1) | IL43966A (fr) |
IT (1) | IT1002650B (fr) |
LU (1) | LU69122A1 (fr) |
NL (1) | NL7317670A (fr) |
SE (1) | SE392919B (fr) |
Families Citing this family (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3939052A (en) * | 1975-01-15 | 1976-02-17 | Riley Leon H | Depositing optical fibers |
GB2010676B (en) * | 1977-12-27 | 1982-05-19 | Alza Corp | Diffusional drug delivery device with block copolymer as drug carrier |
US4331526A (en) * | 1979-09-24 | 1982-05-25 | Coulter Systems Corporation | Continuous sputtering apparatus and method |
US4290877A (en) * | 1980-09-08 | 1981-09-22 | The United States Of America As Represented By The Secretary Of The Interior | Sputtering apparatus for coating elongated tubes and strips |
US4384532A (en) * | 1980-10-31 | 1983-05-24 | Staff Arthur B | Table extension for the handicapped |
US4343881A (en) * | 1981-07-06 | 1982-08-10 | Savin Corporation | Multilayer photoconductive assembly with intermediate heterojunction |
US4389295A (en) * | 1982-05-06 | 1983-06-21 | Gte Products Corporation | Thin film phosphor sputtering process |
JPS5976571A (ja) * | 1982-10-25 | 1984-05-01 | Natl House Ind Co Ltd | 塗布装置 |
GB8332394D0 (en) * | 1983-12-05 | 1984-01-11 | Pilkington Brothers Plc | Coating apparatus |
NL8602759A (nl) * | 1986-10-31 | 1988-05-16 | Bekaert Sa Nv | Werkwijze en inrichting voor het behandelen van een langwerpig substraat, dat van een deklaag voorzien is; alsmede volgens die werkwijze behandelde substraten en met deze substraten versterkte voorwerpen uit polymeermateriaal. |
US5219668A (en) * | 1986-10-31 | 1993-06-15 | N.V. Bekaert S.A. | Process and apparatus for the treatment of coated, elongated substrate, as well as substrates thus treated and articles of polymeric material reinforced with these substrates |
US4849087A (en) * | 1988-02-11 | 1989-07-18 | Southwall Technologies | Apparatus for obtaining transverse uniformity during thin film deposition on extended substrate |
EP0364619B1 (fr) * | 1988-10-19 | 1993-12-29 | Ibm Deutschland Gmbh | Dispositif de gravure ionique réactive ou par plasma et procédé de gravure de substrats mauvais conducteurs thermiques |
DE29600991U1 (de) * | 1996-01-20 | 1997-05-22 | Strämke, Siegfried, Dr.-Ing., 52538 Selfkant | Plasmareaktor |
US5725706A (en) * | 1996-03-12 | 1998-03-10 | The Whitaker Corporation | Laser transfer deposition |
US6066826A (en) * | 1998-03-16 | 2000-05-23 | Yializis; Angelo | Apparatus for plasma treatment of moving webs |
ATE326556T1 (de) * | 2002-03-15 | 2006-06-15 | Vhf Technologies Sa | Vorrichtung und verfahren zur herstellung von flexiblen halbleiter-einrichtungen |
CH696013A5 (de) * | 2002-10-03 | 2006-11-15 | Tetra Laval Holdings & Finance | Vorrichtung zur Behandlung eines bandförmigen Materials in einem Plasma-unterstützten Prozess. |
US6906008B2 (en) * | 2003-06-26 | 2005-06-14 | Superpower, Inc. | Apparatus for consecutive deposition of high-temperature superconducting (HTS) buffer layers |
US7169232B2 (en) * | 2004-06-01 | 2007-01-30 | Eastman Kodak Company | Producing repetitive coatings on a flexible substrate |
ES2344904T3 (es) * | 2004-12-29 | 2010-09-09 | Sca Hygiene Products Ab | Dispensador de toallas de papel "manos libres" y un sistema dispensador. |
DE102005058869A1 (de) * | 2005-12-09 | 2007-06-14 | Cis Solartechnik Gmbh & Co. Kg | Verfahren und Vorrichtung zur Beschichtung von Bändern |
KR100750654B1 (ko) * | 2006-09-15 | 2007-08-20 | 한국전기연구원 | 장선 테이프 증착장치 |
KR100928222B1 (ko) * | 2007-10-31 | 2009-11-24 | 한국전기연구원 | 가이드 롤러가 구비된 장선 증착 장치 |
WO2009094622A2 (fr) * | 2008-01-24 | 2009-07-30 | Microcontinuum, Inc. | Techniques de revêtement sous vide |
EP2113585A1 (fr) * | 2008-04-29 | 2009-11-04 | Applied Materials, Inc. | Dispositif et procédé de revêtement de bandes sous vide par tordre et guider la bande à plusiers reprises le long d'un cylindre devant un région de traitement |
TW201110831A (en) * | 2009-09-03 | 2011-03-16 | Chunghwa Picture Tubes Ltd | Plasma apparatus and method of fabricating nano-crystalline silicon thin film |
PL2508315T3 (pl) | 2011-04-07 | 2014-02-28 | Gedore Werkzeugfabrik Gmbh & Co Kg | Klin rozszczepiający |
EP2909355B1 (fr) * | 2012-10-22 | 2018-09-26 | Proportional Technologies, Inc. | Procédé et appareil permettant de recouvrir une mince feuille avec un revêtement de bore |
KR20140061808A (ko) * | 2012-11-14 | 2014-05-22 | 삼성디스플레이 주식회사 | 유기물 증착 장치 |
US10112836B2 (en) * | 2012-11-26 | 2018-10-30 | The Regents Of The University Of Michigan | Continuous nanosynthesis apparatus and process |
WO2022040075A1 (fr) * | 2020-08-21 | 2022-02-24 | Applied Materials, Inc. | Système de traitement pour traiter un substrat souple et procédé de mesure d'au moins l'une d'une propriété d'un substrat souple et d'une propriété d'un ou plusieurs revêtements sur le substrat souple |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2249710A (en) * | 1935-02-18 | 1941-07-15 | Ind Rayon Corp | Apparatus for continuously processing thread or the like |
BE485884A (fr) * | 1947-11-20 | |||
US3068510A (en) * | 1959-12-14 | 1962-12-18 | Radiation Res Corp | Polymerizing method and apparatus |
BE599444A (fr) * | 1960-02-03 | |||
US3343207A (en) * | 1963-10-14 | 1967-09-26 | Monsanto Co | Novelty yarn apparatus |
US3272175A (en) * | 1965-05-12 | 1966-09-13 | Heraeus Gmbh W C | Vapor deposition means for strip-coating continuously moving, helically wound ribbon |
US3477902A (en) * | 1965-10-14 | 1969-11-11 | Radiation Res Corp | Process for making tires by exposure to an ionized gas and treatment with resorcinol-formaldehyde/latex composition and the product |
DE1802932B2 (de) * | 1968-10-14 | 1974-11-14 | W.C. Heraeus Gmbh, 6450 Hanau | Verfahren zur Herstellung eines elektrischen Schaltkontaktes |
US3598639A (en) * | 1968-12-09 | 1971-08-10 | Bror Olov Nikolaus Hansson | Method of continuously producing metal wire and profiles |
US3700489A (en) * | 1970-07-30 | 1972-10-24 | Ethicon Inc | Process for applying a thin coating of polytetrafluoroethylene |
-
1973
- 1973-01-12 US US323133A patent/US3884787A/en not_active Expired - Lifetime
- 1973-12-27 NL NL7317670A patent/NL7317670A/xx not_active Application Discontinuation
-
1974
- 1974-01-07 BE BE139580A patent/BE809464A/fr not_active IP Right Cessation
- 1974-01-07 JP JP49005003A patent/JPS5747267B2/ja not_active Expired
- 1974-01-07 DE DE2400587A patent/DE2400587A1/de not_active Withdrawn
- 1974-01-07 IL IL43966A patent/IL43966A/en unknown
- 1974-01-07 FR FR7400468A patent/FR2322667A1/fr active Granted
- 1974-01-07 AT AT9674A patent/AT341335B/de not_active IP Right Cessation
- 1974-01-07 CH CH22474A patent/CH597622A5/xx not_active IP Right Cessation
- 1974-01-07 LU LU69122A patent/LU69122A1/xx unknown
- 1974-01-07 GB GB64474A patent/GB1461921A/en not_active Expired
- 1974-01-07 CA CA189,611A patent/CA1018475A/en not_active Expired
- 1974-01-10 DD DD175932A patent/DD109035A5/xx unknown
- 1974-01-11 SE SE7400351A patent/SE392919B/xx unknown
- 1974-01-14 IT IT47682/74A patent/IT1002650B/it active
Also Published As
Publication number | Publication date |
---|---|
DD109035A5 (fr) | 1974-10-12 |
ATA9674A (de) | 1977-05-15 |
SE392919B (sv) | 1977-04-25 |
GB1461921A (en) | 1977-01-19 |
IL43966A (en) | 1976-12-31 |
FR2322667B1 (fr) | 1978-10-27 |
JPS5747267B2 (fr) | 1982-10-08 |
IL43966A0 (en) | 1974-06-30 |
FR2322667A1 (fr) | 1977-04-01 |
BE809464A (fr) | 1974-07-08 |
AT341335B (de) | 1978-02-10 |
JPS49104972A (fr) | 1974-10-04 |
CA1018475A (en) | 1977-10-04 |
CH597622A5 (fr) | 1978-04-14 |
IT1002650B (it) | 1976-05-20 |
LU69122A1 (fr) | 1975-12-09 |
US3884787A (en) | 1975-05-20 |
DE2400587A1 (de) | 1974-07-18 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
BA | A request for search or an international-type search has been filed | ||
BB | A search report has been drawn up | ||
BC | A request for examination has been filed | ||
A85 | Still pending on 85-01-01 | ||
BV | The patent application has lapsed |