NL7103380A - - Google Patents

Info

Publication number
NL7103380A
NL7103380A NL7103380A NL7103380A NL7103380A NL 7103380 A NL7103380 A NL 7103380A NL 7103380 A NL7103380 A NL 7103380A NL 7103380 A NL7103380 A NL 7103380A NL 7103380 A NL7103380 A NL 7103380A
Authority
NL
Netherlands
Application number
NL7103380A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to NL7103380A priority Critical patent/NL7103380A/xx
Priority to DE19722209749 priority patent/DE2209749A1/de
Priority to GB1130672A priority patent/GB1325974A/en
Priority to FR7208632A priority patent/FR2130168A1/fr
Publication of NL7103380A publication Critical patent/NL7103380A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/0163—Non ionic diazonium compounds, e.g. diazosulphonates; Precursors thereof, e.g. triazenes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
NL7103380A 1971-03-13 1971-03-13 NL7103380A (enrdf_load_stackoverflow)

Priority Applications (4)

Application Number Priority Date Filing Date Title
NL7103380A NL7103380A (enrdf_load_stackoverflow) 1971-03-13 1971-03-13
DE19722209749 DE2209749A1 (de) 1971-03-13 1972-03-01 Verfahren zur Herstellung einer negativen lichtempfindlichen Masse
GB1130672A GB1325974A (en) 1971-03-13 1972-03-10 Photosensitive compositions
FR7208632A FR2130168A1 (enrdf_load_stackoverflow) 1971-03-13 1972-03-13

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7103380A NL7103380A (enrdf_load_stackoverflow) 1971-03-13 1971-03-13

Publications (1)

Publication Number Publication Date
NL7103380A true NL7103380A (enrdf_load_stackoverflow) 1972-09-15

Family

ID=19812678

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7103380A NL7103380A (enrdf_load_stackoverflow) 1971-03-13 1971-03-13

Country Status (4)

Country Link
DE (1) DE2209749A1 (enrdf_load_stackoverflow)
FR (1) FR2130168A1 (enrdf_load_stackoverflow)
GB (1) GB1325974A (enrdf_load_stackoverflow)
NL (1) NL7103380A (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4055425A (en) * 1975-03-10 1977-10-25 Gaf Corporation Diazotype material and graphic reproduction processes employing the same
DE2916877A1 (de) 1979-04-26 1980-11-06 Hoechst Ag Phenolgruppen enthaltende epoxidharze, ihre herstellung und verwendung
DE69223730T2 (de) * 1991-10-15 1998-04-23 Canon Kk Elektrophotographisches, lichtempfindliches Element, elektrophotographisches Gerät, Vorrichtungseinheit und Faksimile-Gerät
US8383320B2 (en) * 2007-10-31 2013-02-26 Nissan Chemical Industries, Ltd. Resist underlayer film forming composition and method of forming resist pattern using the same
SG11202100517VA (en) 2018-09-05 2021-02-25 Merck Patent Gmbh Positive working photosensitive material

Also Published As

Publication number Publication date
GB1325974A (en) 1973-08-08
FR2130168A1 (enrdf_load_stackoverflow) 1972-11-03
DE2209749A1 (de) 1972-11-09

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