NL6504295A - - Google Patents
Info
- Publication number
- NL6504295A NL6504295A NL6504295A NL6504295A NL6504295A NL 6504295 A NL6504295 A NL 6504295A NL 6504295 A NL6504295 A NL 6504295A NL 6504295 A NL6504295 A NL 6504295A NL 6504295 A NL6504295 A NL 6504295A
- Authority
- NL
- Netherlands
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G9/00—Developers
- G03G9/08—Developers with toner particles
- G03G9/09—Colouring agents for toner particles
- G03G9/0926—Colouring agents for toner particles characterised by physical or chemical properties
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
- C08L61/04—Condensation polymers of aldehydes or ketones with phenols only
- C08L61/06—Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L71/00—Compositions of polyethers obtained by reactions forming an ether link in the main chain; Compositions of derivatives of such polymers
- C08L71/02—Polyalkylene oxides
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US357265A US3231382A (en) | 1964-04-03 | 1964-04-03 | Printing plate compositions |
Publications (1)
Publication Number | Publication Date |
---|---|
NL6504295A true NL6504295A (US07368562-20080506-C00013.png) | 1965-10-04 |
Family
ID=23404928
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL6504295A NL6504295A (US07368562-20080506-C00013.png) | 1964-04-03 | 1965-04-05 |
Country Status (5)
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1447592A1 (de) * | 1964-12-24 | 1969-02-13 | Agfa Gevaert Ag | Lichtvernetzbare Schichten |
US3535193A (en) * | 1968-08-20 | 1970-10-20 | Grace W R & Co | Offset blanket and process therefor |
US3883784A (en) * | 1972-02-15 | 1975-05-13 | Robert L Peck | Electrical device with high dielectric constant |
US3837858A (en) * | 1972-09-11 | 1974-09-24 | Lith Kem Corp | Printing plate and method of making the same |
US3836366A (en) * | 1972-09-11 | 1974-09-17 | Lith Kem Corp | Planographic printing plates and method for their preparation |
US4196003A (en) * | 1974-02-01 | 1980-04-01 | Fuji Photo Film Co., Ltd. | Light-sensitive o-quinone diazide copying composition |
US4047963A (en) * | 1976-06-17 | 1977-09-13 | Hercules Incorporated | Photopolymer compositions |
US4756988A (en) * | 1982-09-29 | 1988-07-12 | Minnesota Mining And Manufacturing Company | Multilayer dry-film negative-acting photoresist |
US5693257A (en) * | 1995-12-06 | 1997-12-02 | Betzdearborn Inc. | Compositions and method for breaking water-in-oil emulsions |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3125544A (en) * | 1964-03-17 | Chjcho | ||
US1575143A (en) * | 1922-11-18 | 1926-03-02 | Wadsworth Watch Case Co | Photographic sensitizer |
BE332469A (US07368562-20080506-C00013.png) * | 1922-11-24 | |||
US2848327A (en) * | 1953-02-19 | 1958-08-19 | Screen Engineering Co | Glass fabric resin impregnated base coated with a light sensitive layer |
US2894931A (en) * | 1955-09-23 | 1959-07-14 | Shell Dev | Compositions containing polyhydroxy ethers of phenol-aldehyde resins and polymethylol phenol ethers |
FR1154510A (fr) * | 1956-06-08 | 1958-04-11 | Procédé d'obtention d'images sur supports en toute matière sensibilisée et présentant une forme ou une surface non développable | |
US3074897A (en) * | 1960-02-17 | 1963-01-22 | Borden Co | Aqueous alkaline adhesive comprising phenol-formaldehyde condensate and homopolymers of ethylene oxide |
FR1292577A (fr) * | 1960-07-06 | 1962-05-04 | Union Carbide Corp | Compositions photosensibles pour clichés |
-
1964
- 1964-04-03 US US357265A patent/US3231382A/en not_active Expired - Lifetime
-
1965
- 1965-04-02 BE BE662009D patent/BE662009A/xx unknown
- 1965-04-02 GB GB14172/65A patent/GB1115027A/en not_active Expired
- 1965-04-03 DE DEU11596A patent/DE1297469B/de active Pending
- 1965-04-05 NL NL6504295A patent/NL6504295A/xx unknown
Also Published As
Publication number | Publication date |
---|---|
US3231382A (en) | 1966-01-25 |
BE662009A (US07368562-20080506-C00013.png) | 1965-08-02 |
GB1115027A (en) | 1968-05-22 |
DE1297469B (de) | 1969-06-12 |