NL2005208A - Heat pipe, lithographic apparatus and device manufacturing method. - Google Patents

Heat pipe, lithographic apparatus and device manufacturing method. Download PDF

Info

Publication number
NL2005208A
NL2005208A NL2005208A NL2005208A NL2005208A NL 2005208 A NL2005208 A NL 2005208A NL 2005208 A NL2005208 A NL 2005208A NL 2005208 A NL2005208 A NL 2005208A NL 2005208 A NL2005208 A NL 2005208A
Authority
NL
Netherlands
Prior art keywords
liquid
condensing surface
substrate
transporter
heat pipe
Prior art date
Application number
NL2005208A
Other languages
English (en)
Inventor
Johannes Jacobs
Nicolaas Kate
Joost Ottens
Gerrit Donk
Johannes Es
Hrishikesh Patel
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of NL2005208A publication Critical patent/NL2005208A/en

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28—HEAT EXCHANGE IN GENERAL
    • F28D—HEAT-EXCHANGE APPARATUS, NOT PROVIDED FOR IN ANOTHER SUBCLASS, IN WHICH THE HEAT-EXCHANGE MEDIA DO NOT COME INTO DIRECT CONTACT
    • F28D15/00—Heat-exchange apparatus with the intermediate heat-transfer medium in closed tubes passing into or through the conduit walls ; Heat-exchange apparatus employing intermediate heat-transfer medium or bodies
    • F28D15/02—Heat-exchange apparatus with the intermediate heat-transfer medium in closed tubes passing into or through the conduit walls ; Heat-exchange apparatus employing intermediate heat-transfer medium or bodies in which the medium condenses and evaporates, e.g. heat pipes
    • F28D15/04—Heat-exchange apparatus with the intermediate heat-transfer medium in closed tubes passing into or through the conduit walls ; Heat-exchange apparatus employing intermediate heat-transfer medium or bodies in which the medium condenses and evaporates, e.g. heat pipes with tubes having a capillary structure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature

Claims (1)

1. Een lithografieinrichting omvattende: een belichtinginrichting ingericht voor het leveren van een stralingsbundel; een drager geconstrueerd voor het dragen van een patroneerinrichting, welke patroneerinrichting in staat is een patroon aan te brengen in een doorsnede van de stralingsbundel ter vorming van een gepatroneerde stralingsbundel; een substraattafel geconstrueerd om een substraat te dragen; en een projectieinrichting ingericht voor het projecteren van de gepatroneerde stralingsbundel op een doelgebied van het substraat, met het kenmerk, dat de substraattafel is ingericht voor het positioneren van het doelgebied van het substraat in een brandpuntsvlak van de projectieinrichting.
NL2005208A 2009-09-28 2010-08-11 Heat pipe, lithographic apparatus and device manufacturing method. NL2005208A (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US24627609P 2009-09-28 2009-09-28
US24627609 2009-09-28
US29613810P 2010-01-19 2010-01-19
US29613810 2010-01-19

Publications (1)

Publication Number Publication Date
NL2005208A true NL2005208A (en) 2011-03-29

Family

ID=44015029

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2005208A NL2005208A (en) 2009-09-28 2010-08-11 Heat pipe, lithographic apparatus and device manufacturing method.

Country Status (3)

Country Link
US (1) US20110232878A1 (nl)
JP (1) JP5323789B2 (nl)
NL (1) NL2005208A (nl)

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* Cited by examiner, † Cited by third party
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NL2005207A (en) * 2009-09-28 2011-03-29 Asml Netherlands Bv Heat pipe, lithographic apparatus and device manufacturing method.
US8746975B2 (en) 2011-02-17 2014-06-10 Media Lario S.R.L. Thermal management systems, assemblies and methods for grazing incidence collectors for EUV lithography
DE102011005885A1 (de) * 2011-03-22 2012-09-27 Carl Zeiss Smt Gmbh Lithographievorrichtung
US8731139B2 (en) 2011-05-04 2014-05-20 Media Lario S.R.L. Evaporative thermal management of grazing incidence collectors for EUV lithography
NL2008751A (en) 2011-06-06 2012-12-10 Asml Netherlands Bv Temperature sensing probe, burl plate, lithographic apparatus and method.
JP6219227B2 (ja) 2014-05-12 2017-10-25 東京エレクトロン株式会社 ヒータ給電機構及びステージの温度制御方法
WO2017104819A1 (ja) * 2015-12-18 2017-06-22 株式会社フジクラ ベーパーチャンバー
EP3978978A1 (en) * 2020-10-02 2022-04-06 Soter Technology, LLC Isothermalized mirror assembly

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Also Published As

Publication number Publication date
US20110232878A1 (en) 2011-09-29
JP5323789B2 (ja) 2013-10-23
JP2011069608A (ja) 2011-04-07

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Legal Events

Date Code Title Description
WDAP Patent application withdrawn

Effective date: 20111024