NL130712C - - Google Patents

Info

Publication number
NL130712C
NL130712C NL130712DA NL130712C NL 130712 C NL130712 C NL 130712C NL 130712D A NL130712D A NL 130712DA NL 130712 C NL130712 C NL 130712C
Authority
NL
Netherlands
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of NL130712C publication Critical patent/NL130712C/xx

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/016Diazonium salts or compounds
    • G03F7/021Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/016Diazonium salts or compounds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Materials For Photolithography (AREA)
NL130712D 1959-07-29 NL130712C (US07816562-20101019-C00012.png)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEK38316A DE1134887B (de) 1959-07-29 1959-07-29 Kopierschichten zur Herstellung von Druckformen auf photomechanischem Wege

Publications (1)

Publication Number Publication Date
NL130712C true NL130712C (US07816562-20101019-C00012.png)

Family

ID=7221339

Family Applications (2)

Application Number Title Priority Date Filing Date
NL254350D NL254350A (US07816562-20101019-C00012.png) 1959-07-29
NL130712D NL130712C (US07816562-20101019-C00012.png) 1959-07-29

Family Applications Before (1)

Application Number Title Priority Date Filing Date
NL254350D NL254350A (US07816562-20101019-C00012.png) 1959-07-29

Country Status (6)

Country Link
US (1) US3199981A (US07816562-20101019-C00012.png)
BE (1) BE593423A (US07816562-20101019-C00012.png)
CH (1) CH389406A (US07816562-20101019-C00012.png)
DE (1) DE1134887B (US07816562-20101019-C00012.png)
GB (1) GB941835A (US07816562-20101019-C00012.png)
NL (2) NL130712C (US07816562-20101019-C00012.png)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7109179A (US07816562-20101019-C00012.png) * 1970-07-13 1972-01-17
GB1347759A (en) * 1971-06-17 1974-02-27 Howson Algraphy Ltd Light sensitive materials
JPS585798B2 (ja) * 1977-06-30 1983-02-01 富士写真フイルム株式会社 平版印刷版用不感脂化液およびそれを用いる平版印刷版の製造方法
FR2452729A1 (fr) * 1979-03-28 1980-10-24 Rhone Poulenc Syst Article pour la realisation d'auxiliaires visuels tels que films de montage pour l'impression phonographique
FR2452731A1 (fr) * 1979-03-28 1980-10-24 Rhone Poulenc Syst Compositions photopolymerisables filmogenes developpables a l'eau
US4408532A (en) * 1980-04-30 1983-10-11 Minnesota Mining And Manufacturing Company Lithographic printing plate with oleophilic area of radiation exposed adduct of diazo resin and sulfonated polymer
US5223376A (en) * 1986-06-20 1993-06-29 Toyo Soda Manufacturing Co., Ltd. Method for producing fine patterns utilizing specific polymeric diazonium salt, or diazonium salt/sulfone group containing polymer, as photobleachable agent

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE262558C (US07816562-20101019-C00012.png) *
US2679498A (en) * 1954-05-25 Atent office
NL143691B (nl) * 1947-12-17 Schenck Gmbh Carl Schuifgewichtweegtoestel met een inrichting voor het verstellen van het schuifgewicht.
BE506677A (US07816562-20101019-C00012.png) * 1950-10-31
NL230099A (US07816562-20101019-C00012.png) * 1957-08-01
NO98358A (US07816562-20101019-C00012.png) * 1958-01-18

Also Published As

Publication number Publication date
US3199981A (en) 1965-08-10
CH389406A (de) 1965-03-15
GB941835A (en) 1963-11-13
BE593423A (US07816562-20101019-C00012.png)
NL254350A (US07816562-20101019-C00012.png)
DE1134887B (de) 1962-08-16

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