MY192764A - Laser processing method, apparatus for sapphire and storage medium - Google Patents
Laser processing method, apparatus for sapphire and storage mediumInfo
- Publication number
- MY192764A MY192764A MYPI2016703988A MYPI2016703988A MY192764A MY 192764 A MY192764 A MY 192764A MY PI2016703988 A MYPI2016703988 A MY PI2016703988A MY PI2016703988 A MYPI2016703988 A MY PI2016703988A MY 192764 A MY192764 A MY 192764A
- Authority
- MY
- Malaysia
- Prior art keywords
- sapphire
- laser processing
- processing method
- storage medium
- crack
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/38—Removing material by boring or cutting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/351—Working by laser beam, e.g. welding, cutting or boring for trimming or tuning of electrical components
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/50—Working by transmitting the laser beam through or within the workpiece
- B23K26/53—Working by transmitting the laser beam through or within the workpiece for modifying or reforming the material inside the workpiece, e.g. for producing break initiation cracks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/0006—Working by laser beam, e.g. welding, cutting or boring taking account of the properties of the material involved
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/03—Observing, e.g. monitoring, the workpiece
- B23K26/032—Observing, e.g. monitoring, the workpiece using optical means
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
- C03C23/0025—Other surface treatment of glass not in the form of fibres or filaments by irradiation by a laser beam
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
-
- H10P72/0436—
-
- H10P72/0604—
-
- H10P74/23—
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/40—Semiconductor devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Laser Beam Processing (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Dicing (AREA)
Abstract
A laser processing method for a sapphire (18) includes: acquiring an image of the sapphire (18) during processing; performing an edge detection to the image to acquire a coordinate of a crack (5, 50); determining an offset parameter according to the coordinate of the crack (5, 50); adjusting a laser processing position according to the offset parameter; and further processing the sapphire (18) in accordance with the adjusted laser processing position.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510239300.XA CN104827191A (en) | 2015-05-12 | 2015-05-12 | Laser cutting method for sapphire |
| PCT/CN2016/080638 WO2016180246A1 (en) | 2015-05-12 | 2016-04-29 | Laser machining method and device for sapphires, and storage medium |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| MY192764A true MY192764A (en) | 2022-09-07 |
Family
ID=53805584
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MYPI2016703988A MY192764A (en) | 2015-05-12 | 2016-04-29 | Laser processing method, apparatus for sapphire and storage medium |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US10625375B2 (en) |
| JP (1) | JP6371862B2 (en) |
| CN (1) | CN104827191A (en) |
| DE (1) | DE112016000051B4 (en) |
| MY (1) | MY192764A (en) |
| WO (1) | WO2016180246A1 (en) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104827191A (en) | 2015-05-12 | 2015-08-12 | 大族激光科技产业集团股份有限公司 | Laser cutting method for sapphire |
| CN106256477A (en) * | 2016-08-31 | 2016-12-28 | 安徽芯瑞达电子科技有限公司 | Dark portion determining method laser cutting method |
| CN106449900B (en) * | 2016-08-31 | 2020-06-05 | 导装光电科技(深圳)有限公司 | Cutting process and device for LED white light chip |
| JP7123583B2 (en) * | 2018-03-14 | 2022-08-23 | 株式会社ディスコ | Wafer production method and wafer production apparatus |
| US10562130B1 (en) * | 2018-12-29 | 2020-02-18 | Cree, Inc. | Laser-assisted method for parting crystalline material |
| JP7286464B2 (en) * | 2019-08-02 | 2023-06-05 | 株式会社ディスコ | Laser processing equipment |
| CN112775539A (en) * | 2019-11-07 | 2021-05-11 | 大族激光科技产业集团股份有限公司 | Laser processing method and apparatus |
| CN111778561B (en) * | 2020-06-22 | 2021-11-02 | 福建晶安光电有限公司 | A kind of sapphire substrate, processing method and preparation method of light emitting diode |
| JP7657047B2 (en) * | 2020-12-18 | 2025-04-04 | 株式会社ディスコ | Laser processing equipment |
| CN115377264B (en) * | 2022-06-01 | 2025-12-16 | 福建晶安光电有限公司 | Sapphire substrate, processing method thereof and preparation method of light-emitting diode |
| CN119928255B (en) * | 2025-04-08 | 2025-07-08 | 武汉芯享光电科技有限公司 | Adhesive film treatment process and device |
Family Cites Families (33)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5727433A (en) * | 1995-09-08 | 1998-03-17 | Gerber Garment Technology, Inc. | Method for cutting sheet material |
| JP2001210905A (en) * | 1995-12-04 | 2001-08-03 | Nichia Chem Ind Ltd | Method for manufacturing nitride semiconductor light emitting device |
| JPH10323780A (en) * | 1997-05-26 | 1998-12-08 | Hitachi Constr Mach Co Ltd | Method and device for laser processing |
| US6420245B1 (en) * | 1999-06-08 | 2002-07-16 | Kulicke & Soffa Investments, Inc. | Method for singulating semiconductor wafers |
| JP4659300B2 (en) * | 2000-09-13 | 2011-03-30 | 浜松ホトニクス株式会社 | Laser processing method and semiconductor chip manufacturing method |
| AU2002219847A1 (en) * | 2000-11-15 | 2002-05-27 | Real Time Metrology, Inc. | Optical method and apparatus for inspecting large area planar objects |
| JP2003088975A (en) * | 2001-09-12 | 2003-03-25 | Hamamatsu Photonics Kk | Laser beam machining method |
| KR100537684B1 (en) * | 2001-09-19 | 2005-12-20 | 올림푸스 가부시키가이샤 | Semiconductor wafer inspection system |
| US6580054B1 (en) * | 2002-06-10 | 2003-06-17 | New Wave Research | Scribing sapphire substrates with a solid state UV laser |
| US6960813B2 (en) * | 2002-06-10 | 2005-11-01 | New Wave Research | Method and apparatus for cutting devices from substrates |
| KR100906543B1 (en) * | 2004-12-08 | 2009-07-07 | 가부시키가이샤 레이져 솔루션즈 | Method of forming split originating point on object to be split, method of splitting object to be split, and method of processing object to be processed by pulse laser beam |
| US8331019B2 (en) * | 2007-01-26 | 2012-12-11 | New York University | Holographic microscopy of holographically trapped three-dimensional nanorod structures |
| JP5203787B2 (en) * | 2008-04-17 | 2013-06-05 | 株式会社日立ハイテクノロジーズ | Data analysis device |
| JP5414467B2 (en) * | 2009-11-09 | 2014-02-12 | キヤノン株式会社 | Laser processing method |
| JP2011181909A (en) * | 2010-02-02 | 2011-09-15 | Mitsubishi Chemicals Corp | Method of manufacturing semiconductor chip |
| JP5645432B2 (en) * | 2010-03-19 | 2014-12-24 | キヤノン株式会社 | Image processing apparatus, image processing system, image processing method, and program for causing computer to execute image processing |
| JP5378314B2 (en) * | 2010-07-15 | 2013-12-25 | 株式会社レーザーシステム | Laser cutting method |
| JP5201185B2 (en) * | 2010-09-14 | 2013-06-05 | オムロン株式会社 | Observation optical system and laser processing apparatus |
| US8722516B2 (en) * | 2010-09-28 | 2014-05-13 | Hamamatsu Photonics K.K. | Laser processing method and method for manufacturing light-emitting device |
| JP2012089709A (en) * | 2010-10-20 | 2012-05-10 | Disco Abrasive Syst Ltd | Method for dividing workpiece |
| US9462272B2 (en) * | 2010-12-13 | 2016-10-04 | Electronics And Telecommunications Research Institute | Intra prediction method and apparatus |
| JP5886603B2 (en) * | 2011-11-11 | 2016-03-16 | 株式会社ディスコ | Processing method of optical device wafer |
| US9746422B2 (en) * | 2012-07-05 | 2017-08-29 | Gemological Appraisal Association, Inc. | Gemstone registration and recovery system, and systems for evaluating the light performance of a gemstone and capturing forensic characteristics of a gemstone |
| JP2014041925A (en) * | 2012-08-22 | 2014-03-06 | Hamamatsu Photonics Kk | Method for cutting workpiece |
| JP2014041926A (en) * | 2012-08-22 | 2014-03-06 | Hamamatsu Photonics Kk | Method for cutting workpiece |
| JP2014041927A (en) * | 2012-08-22 | 2014-03-06 | Hamamatsu Photonics Kk | Method for cutting workpiece |
| US9610653B2 (en) * | 2012-09-21 | 2017-04-04 | Electro Scientific Industries, Inc. | Method and apparatus for separation of workpieces and articles produced thereby |
| JP6064519B2 (en) * | 2012-10-29 | 2017-01-25 | 三星ダイヤモンド工業株式会社 | Laser processing apparatus and processing condition setting method for patterned substrate |
| KR102070087B1 (en) * | 2013-04-29 | 2020-01-30 | 삼성전자주식회사 | Method for manufacturing semiconductor device |
| US10005152B2 (en) * | 2013-11-19 | 2018-06-26 | Rofin-Sinar Technologies Llc | Method and apparatus for spiral cutting a glass tube using filamentation by burst ultrafast laser pulses |
| US10396244B2 (en) * | 2014-01-21 | 2019-08-27 | Soko Kagaku Co., Ltd. | Nitride semiconductor light emitting element |
| CN106662674B (en) * | 2014-07-15 | 2019-03-29 | 王子控股株式会社 | Optical element |
| CN104827191A (en) * | 2015-05-12 | 2015-08-12 | 大族激光科技产业集团股份有限公司 | Laser cutting method for sapphire |
-
2015
- 2015-05-12 CN CN201510239300.XA patent/CN104827191A/en active Pending
-
2016
- 2016-04-29 JP JP2016569063A patent/JP6371862B2/en active Active
- 2016-04-29 US US15/321,946 patent/US10625375B2/en active Active
- 2016-04-29 WO PCT/CN2016/080638 patent/WO2016180246A1/en not_active Ceased
- 2016-04-29 MY MYPI2016703988A patent/MY192764A/en unknown
- 2016-04-29 DE DE112016000051.0T patent/DE112016000051B4/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| US20170151632A1 (en) | 2017-06-01 |
| US10625375B2 (en) | 2020-04-21 |
| CN104827191A (en) | 2015-08-12 |
| JP2017520405A (en) | 2017-07-27 |
| DE112016000051T5 (en) | 2017-02-16 |
| JP6371862B2 (en) | 2018-08-08 |
| DE112016000051B4 (en) | 2025-10-23 |
| WO2016180246A1 (en) | 2016-11-17 |
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