MY186470A - Plating bath and method for electroless deposition of nickel layers - Google Patents
Plating bath and method for electroless deposition of nickel layersInfo
- Publication number
- MY186470A MY186470A MYPI2017701361A MYPI2017701361A MY186470A MY 186470 A MY186470 A MY 186470A MY PI2017701361 A MYPI2017701361 A MY PI2017701361A MY PI2017701361 A MYPI2017701361 A MY PI2017701361A MY 186470 A MY186470 A MY 186470A
- Authority
- MY
- Malaysia
- Prior art keywords
- plating bath
- electroless deposition
- nickel layers
- nickel
- deposition
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1646—Characteristics of the product obtained
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
- C23C18/34—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents
- C23C18/36—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents using hypophosphites
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/48—Coating with alloys
- C23C18/50—Coating with alloys with alloys based on iron, cobalt or nickel
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemically Coating (AREA)
Abstract
The present invention relates to aqueous plating bath compositions and methods for deposition of nickel and nickel alloys utilizing mixtures of stabilizing agents comprising ions of group IIIA metals and iodine containing, inorganic compounds in order to en-hance bath stability.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP14194890.1A EP3026143A1 (en) | 2014-11-26 | 2014-11-26 | Plating bath and method for electroless deposition of nickel layers |
PCT/EP2015/076822 WO2016083195A1 (en) | 2014-11-26 | 2015-11-17 | Plating bath and method for electroless deposition of nickel layers |
Publications (1)
Publication Number | Publication Date |
---|---|
MY186470A true MY186470A (en) | 2021-07-22 |
Family
ID=51999271
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MYPI2017701361A MY186470A (en) | 2014-11-26 | 2015-11-17 | Plating bath and method for electroless deposition of nickel layers |
Country Status (10)
Country | Link |
---|---|
US (1) | US20170335462A1 (en) |
EP (2) | EP3026143A1 (en) |
JP (1) | JP6667525B2 (en) |
KR (1) | KR102497590B1 (en) |
CN (1) | CN107109654B (en) |
CA (1) | CA2968437C (en) |
ES (1) | ES2705430T3 (en) |
MY (1) | MY186470A (en) |
TW (1) | TWI683927B (en) |
WO (1) | WO2016083195A1 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20180209047A1 (en) * | 2015-07-17 | 2018-07-26 | Coventya, Inc. | Electroless nickel-phosphorous plating baths with reduced ion concentration and methods of use |
DE102019112883B4 (en) * | 2019-05-16 | 2024-05-16 | Pac Tech - Packaging Technologies Gmbh | Coating bath for electroless coating of a substrate |
JP2022185929A (en) * | 2021-06-03 | 2022-12-15 | 東洋鋼鈑株式会社 | Nickel phosphorus alloy coated substrate, solution for electroless plating nickel phosphorus alloy film, and method for manufacturing nickel phosphorus alloy coated substrate |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2658841A (en) | 1950-11-08 | 1953-11-10 | Gen Am Transport | Process of chemical nickel plating and bath therefor |
US2658842A (en) | 1951-01-04 | 1953-11-10 | Gen Am Transport | Process of chemical nickel plating and bath therefor |
US2762723A (en) | 1953-06-03 | 1956-09-11 | Gen American Transporation Cor | Processes of chemical nickel plating and baths therefor |
US2935425A (en) | 1954-12-29 | 1960-05-03 | Gen Am Transport | Chemical nickel plating processes and baths therefor |
US3338726A (en) | 1958-10-01 | 1967-08-29 | Du Pont | Chemical reduction plating process and bath |
US3597266A (en) | 1968-09-23 | 1971-08-03 | Enthone | Electroless nickel plating |
US3915716A (en) | 1969-04-17 | 1975-10-28 | Schering Ag | Chemical nickel plating bath |
US3719508A (en) * | 1971-11-16 | 1973-03-06 | Shipley Co | Electroless nickel solution |
US3953654A (en) | 1973-08-13 | 1976-04-27 | Rca Corporation | Temperature-stable non-magnetic alloy |
US4189324A (en) | 1978-06-02 | 1980-02-19 | Michael Gulla | Stabilized electroless plating solutions |
US4780342A (en) | 1987-07-20 | 1988-10-25 | General Electric Company | Electroless nickel plating composition and method for its preparation and use |
JP3455709B2 (en) * | 1999-04-06 | 2003-10-14 | 株式会社大和化成研究所 | Plating method and plating solution precursor used for it |
CN1132963C (en) * | 2000-03-03 | 2003-12-31 | 北京航空航天大学 | Formula for chemical plating nickel and application thereof |
US6800121B2 (en) * | 2002-06-18 | 2004-10-05 | Atotech Deutschland Gmbh | Electroless nickel plating solutions |
JP2005194562A (en) | 2004-01-06 | 2005-07-21 | Murata Mfg Co Ltd | Electroless nickel plating liquid, and method for producing ceramic electronic component |
CN100476026C (en) * | 2005-07-11 | 2009-04-08 | 佛山市顺德区汉达精密电子科技有限公司 | Copper-alloy chemical nickeling process |
WO2010045559A1 (en) | 2008-10-16 | 2010-04-22 | Atotech Deutschland Gmbh | Metal plating additive, and method for plating substrates and products therefrom |
JP5297171B2 (en) * | 2008-12-03 | 2013-09-25 | 上村工業株式会社 | Electroless nickel plating bath and electroless nickel plating method |
US8404369B2 (en) * | 2010-08-03 | 2013-03-26 | WD Media, LLC | Electroless coated disks for high temperature applications and methods of making the same |
KR101365457B1 (en) * | 2012-03-15 | 2014-02-21 | 한국기계연구원 | Method of Manufacturing Ni-coated Nano- carbons |
EP2671969A1 (en) * | 2012-06-04 | 2013-12-11 | ATOTECH Deutschland GmbH | Plating bath for electroless deposition of nickel layers |
CN103952687B (en) * | 2014-05-05 | 2017-02-15 | 广东东硕科技有限公司 | Plating penetration prevention method for chemical nickel-plating of printed circuit board |
CN104103433B (en) * | 2014-07-21 | 2016-02-17 | 南通万德科技有限公司 | Switch contact of a kind of arc ablation resistance and preparation method thereof |
-
2014
- 2014-11-26 EP EP14194890.1A patent/EP3026143A1/en not_active Withdrawn
-
2015
- 2015-11-17 ES ES15797992T patent/ES2705430T3/en active Active
- 2015-11-17 US US15/520,558 patent/US20170335462A1/en not_active Abandoned
- 2015-11-17 MY MYPI2017701361A patent/MY186470A/en unknown
- 2015-11-17 KR KR1020177014492A patent/KR102497590B1/en active IP Right Grant
- 2015-11-17 EP EP15797992.3A patent/EP3224388B1/en active Active
- 2015-11-17 JP JP2017528538A patent/JP6667525B2/en active Active
- 2015-11-17 CN CN201580058168.0A patent/CN107109654B/en active Active
- 2015-11-17 WO PCT/EP2015/076822 patent/WO2016083195A1/en active Application Filing
- 2015-11-17 CA CA2968437A patent/CA2968437C/en active Active
- 2015-11-26 TW TW104139483A patent/TWI683927B/en active
Also Published As
Publication number | Publication date |
---|---|
JP6667525B2 (en) | 2020-03-18 |
TWI683927B (en) | 2020-02-01 |
CA2968437A1 (en) | 2016-06-02 |
CN107109654B (en) | 2019-08-27 |
ES2705430T3 (en) | 2019-03-25 |
EP3224388B1 (en) | 2018-10-17 |
EP3026143A1 (en) | 2016-06-01 |
WO2016083195A1 (en) | 2016-06-02 |
JP2017535674A (en) | 2017-11-30 |
EP3224388A1 (en) | 2017-10-04 |
KR20170086051A (en) | 2017-07-25 |
US20170335462A1 (en) | 2017-11-23 |
CN107109654A (en) | 2017-08-29 |
CA2968437C (en) | 2022-11-22 |
TW201623686A (en) | 2016-07-01 |
KR102497590B1 (en) | 2023-02-07 |
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